JP2005244012A5 - - Google Patents

Download PDF

Info

Publication number
JP2005244012A5
JP2005244012A5 JP2004053238A JP2004053238A JP2005244012A5 JP 2005244012 A5 JP2005244012 A5 JP 2005244012A5 JP 2004053238 A JP2004053238 A JP 2004053238A JP 2004053238 A JP2004053238 A JP 2004053238A JP 2005244012 A5 JP2005244012 A5 JP 2005244012A5
Authority
JP
Japan
Prior art keywords
temperature
zero crossing
mirror
exposure apparatus
exposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004053238A
Other languages
English (en)
Japanese (ja)
Other versions
JP4393226B2 (ja
JP2005244012A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2004053238A priority Critical patent/JP4393226B2/ja
Priority claimed from JP2004053238A external-priority patent/JP4393226B2/ja
Priority to US11/067,072 priority patent/US7295284B2/en
Priority to EP05251193A priority patent/EP1569036B1/en
Publication of JP2005244012A publication Critical patent/JP2005244012A/ja
Publication of JP2005244012A5 publication Critical patent/JP2005244012A5/ja
Application granted granted Critical
Publication of JP4393226B2 publication Critical patent/JP4393226B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2004053238A 2004-02-27 2004-02-27 光学系及びそれを用いた露光装置、デバイスの製造方法 Expired - Fee Related JP4393226B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2004053238A JP4393226B2 (ja) 2004-02-27 2004-02-27 光学系及びそれを用いた露光装置、デバイスの製造方法
US11/067,072 US7295284B2 (en) 2004-02-27 2005-02-25 Optical system, exposure apparatus using the same and device manufacturing method
EP05251193A EP1569036B1 (en) 2004-02-27 2005-02-28 Exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004053238A JP4393226B2 (ja) 2004-02-27 2004-02-27 光学系及びそれを用いた露光装置、デバイスの製造方法

Publications (3)

Publication Number Publication Date
JP2005244012A JP2005244012A (ja) 2005-09-08
JP2005244012A5 true JP2005244012A5 (cg-RX-API-DMAC10.html) 2009-11-05
JP4393226B2 JP4393226B2 (ja) 2010-01-06

Family

ID=35025411

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004053238A Expired - Fee Related JP4393226B2 (ja) 2004-02-27 2004-02-27 光学系及びそれを用いた露光装置、デバイスの製造方法

Country Status (1)

Country Link
JP (1) JP4393226B2 (cg-RX-API-DMAC10.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008002403A1 (de) * 2008-06-12 2009-12-17 Carl Zeiss Smt Ag Verfahren zum Herstellen einer Mehrlagen-Beschichtung, optisches Element und optische Anordnung
TWI501046B (zh) 2010-07-30 2015-09-21 卡爾蔡司Ｓｍｔ有限公司 超紫外線曝光裝置
DE102012213671A1 (de) * 2012-08-02 2014-02-06 Carl Zeiss Smt Gmbh Spiegelanordnung für eine EUV-Lithographieanlage und Verfahren zur Herstellung derselben

Similar Documents

Publication Publication Date Title
JP2005175255A5 (cg-RX-API-DMAC10.html)
JP5032397B2 (ja) シームレスマスタ
WO2005031467A3 (en) Microlithographic projection exposure
JP2005197447A5 (cg-RX-API-DMAC10.html)
CN103038708B (zh) Euv曝光设备
JP2005530128A5 (cg-RX-API-DMAC10.html)
TWI284359B (en) Lithographic apparatus, an apparatus comprising an illumination system, an apparatus comprising a projection system, an optical element for a lithographic apparatus and device manufacturing method
JP2017507358A5 (cg-RX-API-DMAC10.html)
TWI497230B (zh) 微影裝置及冷卻微影裝置中元件之方法
JP2016535318A5 (cg-RX-API-DMAC10.html)
TW200846841A (en) Device manufacturing method, computer readable medium and lithographic apparatus
ATE529781T1 (de) Beleuchtungssystem mit zoomobjetiv
TW202129432A (zh) 半導體微影的投影曝光設備
JP5334945B2 (ja) リソグラフィ方法および装置
JP4239082B2 (ja) 周期配列構造のパターン形成方法および形成装置
TW200846844A (en) Illumination system for illuminating a patterning device and method for manufacturing an illumination system
JP2005141158A5 (cg-RX-API-DMAC10.html)
JP2011503870A5 (cg-RX-API-DMAC10.html)
JP2001043562A5 (cg-RX-API-DMAC10.html)
JP2004158786A5 (cg-RX-API-DMAC10.html)
JP2006269941A5 (cg-RX-API-DMAC10.html)
JP2014220471A5 (cg-RX-API-DMAC10.html)
JP2010181861A5 (cg-RX-API-DMAC10.html)
JP2006073895A5 (cg-RX-API-DMAC10.html)
CN206282079U (zh) 基于非对称金属包覆介质波导的多层亚波长结构刻写装置