JP2005243969A - Imaging apparatus - Google Patents

Imaging apparatus Download PDF

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JP2005243969A
JP2005243969A JP2004052540A JP2004052540A JP2005243969A JP 2005243969 A JP2005243969 A JP 2005243969A JP 2004052540 A JP2004052540 A JP 2004052540A JP 2004052540 A JP2004052540 A JP 2004052540A JP 2005243969 A JP2005243969 A JP 2005243969A
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insulating substrate
hole
main surface
protrusions
imaging device
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Toshiyuki Chitose
敏幸 千歳
Yosuke Moriyama
陽介 森山
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Kyocera Corp
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Kyocera Corp
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<P>PROBLEM TO BE SOLVED: To provide an imaging apparatus that allows light to precisely enter the light reception of an imaging element and accurately converts the incident light to an electric signal by the imaging element. <P>SOLUTION: The imaging apparatus 1 comprises an insulating substrate 2 made of ceramics in which a through hole 2a is formed; an electrode pad formed around the through hole 2a on the main surface at the lower side of the insulating substrate 2; a plurality of projections 8 that are provided at the outer periphery side of the electrode pad on the lower main surface of the insulating substrate 2 and at the outer periphery of the opening edge of the through hole 2a at least by 0.05 mm; a rectangular solid imaging element 3 in which a light reception section 3a is opposingly mounted to the through hole 2a on the lower surface of the projections 8, and an electrode 7 is electrically connected to the electrode pad; and a window member 4 that is mounted to the periphery of the through hole 2a on the upper main surface of the insulating substrate 2 while covering the through hole 2a. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、CCD型,CMOS型等の撮像素子を用いた、光学センサ等に適用される撮像装置に関する。   The present invention relates to an imaging apparatus applied to an optical sensor or the like using an imaging element such as a CCD type or a CMOS type.

従来、CCD型,CMOS型等の撮像素子を収納するための撮像装置としては、セラミック製のものが知られている。近年の携帯性を重視した電子機器では、その市場において小型化や薄型化が要求されることから、これらの要求に充分に応えるべく、例えば図8に示すような断面形状を有し、配線板22、撮像素子23およびシール材24によって主に構成された撮像装置21が提案されている。   2. Description of the Related Art Conventionally, ceramic devices are known as image pickup devices for housing CCD or CMOS image pickup devices. In recent years, electronic devices with an emphasis on portability are required to be reduced in size and thickness in the market. For this reason, in order to fully meet these requirements, for example, a cross-sectional shape as shown in FIG. 22, an imaging device 21 mainly composed of an imaging element 23 and a sealing material 24 has been proposed.

配線板22はセラミックスや樹脂などから成り、薄い平板として成形され、その下側主面に配線エリア27が形成されている。配線板22には、光を通過させる開口22aが形成されるとともに、配線板22の下側主面に枠状の基台28が設けられている。基台28は配線板22の下側主面に対してほぼ直交する向きで接合されており、基台28の下端部には外部接続用の端子29が形成されている。そして、この基台28によって配線板22が外部回路基板上に支持固定される。   The wiring board 22 is made of ceramics or resin and is formed as a thin flat plate, and a wiring area 27 is formed on the lower main surface thereof. In the wiring board 22, an opening 22 a through which light passes is formed, and a frame-like base 28 is provided on the lower main surface of the wiring board 22. The base 28 is joined in a direction substantially orthogonal to the lower main surface of the wiring board 22, and a terminal 29 for external connection is formed at the lower end of the base 28. The base board 28 supports and fixes the wiring board 22 on the external circuit board.

また、配線板22の下側主面に、開口22aに受光部23aが対向するように撮像素子23が配置される。なお、撮像素子23はシリコンの基板の上面の中央部にCCD型,CMOS型の受光部23aが形成されたチップであり、撮像素子23の上面の外周部には電極パッドが形成されている。   In addition, the imaging element 23 is disposed on the lower main surface of the wiring board 22 so that the light receiving portion 23a faces the opening 22a. The image pickup device 23 is a chip in which a CCD type and CMOS type light receiving portion 23a is formed at the center of the upper surface of a silicon substrate, and an electrode pad is formed on the outer peripheral portion of the upper surface of the image pickup device 23.

また、電極パッド上には金等から成る突起電極(導体バンプ)27が形成されている。その突起電極27は、配線エリア25に接続されて、配線エリア25から配線板22および基台28の内部に形成された配線導体(図示せず)を介して端子29に導出されている。また、配線板22上側主面には、開口22aを塞ぐようにガラス等から成る透明なシール材24が樹脂接着材等によって接着されている(例えば、下記の特許文献1参照)。   A protruding electrode (conductor bump) 27 made of gold or the like is formed on the electrode pad. The protruding electrode 27 is connected to the wiring area 25 and led out to the terminal 29 from the wiring area 25 through a wiring conductor (not shown) formed inside the wiring board 22 and the base 28. Further, a transparent sealing material 24 made of glass or the like is bonded to the upper main surface of the wiring board 22 with a resin adhesive or the like so as to close the opening 22a (see, for example, Patent Document 1 below).

このようなセラミック製の撮像装置21において、配線板22および基台28は、セラミックグリーンシート(以下、グリーンシートともいう)積層法により製作される。具体的には、セラミックスから成る配線板22用のグリーンシートと、セラミックスから成る基台28用のグリーンシートとを準備し、これらのグリーンシートに配線板22の配線エリア25から端子29に配線導体を導出させるための貫通孔や光を通過させる開口22aをグリーンシートの上下面に垂直に打ち抜く。   In such a ceramic imaging device 21, the wiring board 22 and the base 28 are manufactured by a ceramic green sheet (hereinafter also referred to as green sheet) lamination method. Specifically, a green sheet for the wiring board 22 made of ceramics and a green sheet for the base 28 made of ceramics are prepared, and wiring conductors from the wiring area 25 of the wiring board 22 to the terminals 29 are provided on these green sheets. A through hole for deriving light and an opening 22a for allowing light to pass through are vertically punched on the upper and lower surfaces of the green sheet.

次に、配線板22の配線エリア25、基台28の端子29、および配線板22や基台28の内部に形成されて端子29に導出される配線導体用として、タングステン(W)やモリブデン(Mo)などの高融点金属粉末から成る金属ペーストを従来周知のスクリーン印刷法等により塗布する。そして、配線板22用のグリーンシートと基台28用のグリーンシートとを上下に重ねて接合し、これらを高温で焼成して焼結体と成す。   Next, tungsten (W) or molybdenum (for wiring conductors 25 formed on the wiring area 22 of the wiring board 22, the terminals 29 of the base 28, and the wiring conductors formed inside the wiring board 22 and the base 28 and led out to the terminals 29. A metal paste made of a refractory metal powder such as Mo) is applied by a conventionally known screen printing method or the like. And the green sheet for wiring boards 22 and the green sheet for base 28 are piled up and down and joined, and these are baked at high temperature to form a sintered body.

その後、配線エリア25および配線導体が導出される端子29の露出表面に、ニッケル(Ni)や金(Au)等の金属から成るめっき金属層を無電解めっき法や電解めっき法により被着させている。   Thereafter, a plated metal layer made of a metal such as nickel (Ni) or gold (Au) is deposited on the exposed surfaces of the wiring area 25 and the terminal 29 from which the wiring conductor is led out by an electroless plating method or an electrolytic plating method. Yes.

図9は、図8の撮像装置21をモジュール化してなる光学センサ装置の断面図である。撮像装置21においては、配線板22の下側主面に枠状の基台28が設けられ、基台28の下端部に外部接続用の端子29が設けられており、端子29を外部回路基板36の配線導体等に接続し、半田30によりその接続がなされるとともに補強される。また、撮像装置21における配線板22の上側主面でシール材24よりも外周側に、レンズ鏡筒31が接着固定されている。   FIG. 9 is a cross-sectional view of an optical sensor device obtained by modularizing the imaging device 21 of FIG. In the imaging device 21, a frame-like base 28 is provided on the lower main surface of the wiring board 22, and a terminal 29 for external connection is provided at the lower end of the base 28. The terminal 29 is connected to an external circuit board. The wiring conductor 36 is connected to the wiring conductor 36 and the like, and is connected and reinforced by the solder 30. In addition, a lens barrel 31 is bonded and fixed on the upper main surface of the wiring board 22 in the imaging device 21 on the outer peripheral side of the sealing material 24.

上記の構成において、撮像装置21は、外部回路基板36に実装されることから、撮像装置21と外部回路基板36との間に実装スペース32が形成される。実装スペース32に面する外部回路基板36の上面には、IC,LSI等の半導体素子やコネクタなどの電子部品33が取付けられる。   In the above configuration, since the imaging device 21 is mounted on the external circuit board 36, a mounting space 32 is formed between the imaging device 21 and the external circuit board 36. On the upper surface of the external circuit board 36 facing the mounting space 32, an electronic component 33 such as a semiconductor element such as an IC or LSI or a connector is attached.

そして、外部よりモジュールに入射する光は、レンズ鏡筒31の窓34からレンズ35を通って、透明なシール材34を通過する。シール材34を通過した光は、配線板22に形成された開口22aを通り、撮像素子23の受光部23aに入射する。撮像素子23の受光部23aで受光された光は電気信号に変換され、突起電極27を介して配線板22へ伝送される。配線板22へ伝送された電気信号は、配線板22および基台28の内部の配線導体を通り、基台28の端子29を介して撮像装置21の外部へ出力される。   Then, light incident on the module from the outside passes through the lens 35 from the window 34 of the lens barrel 31 and passes through the transparent sealing material 34. The light that has passed through the sealing material 34 passes through the opening 22 a formed in the wiring board 22 and enters the light receiving portion 23 a of the image sensor 23. The light received by the light receiving unit 23 a of the image sensor 23 is converted into an electric signal and transmitted to the wiring board 22 through the protruding electrode 27. The electrical signal transmitted to the wiring board 22 passes through the wiring conductors inside the wiring board 22 and the base 28 and is output to the outside of the imaging device 21 via the terminal 29 of the base 28.

上記のように、撮像素子23の周囲に端子29が形成された基台28が設けられることにより、モジュールの外部回路基板36に撮像装置21を実装すると、撮像装置21と外部回路基板36との間に実装スペース32を確保することができ、実装スペース32を活用してそこに電子部品33を実装することができる。したがって、撮像装置21を有するモジュールの小型化を達成することができる(例えば、下記の特許文献1参照)。なお、撮像素子23が平面視で四角形の場合、その2辺のみに沿って基台28が設けられている場合もある。
特開2002−299592号公報
As described above, when the imaging device 21 is mounted on the external circuit board 36 of the module by providing the base 28 having the terminals 29 formed around the imaging device 23, the imaging device 21 and the external circuit board 36 are The mounting space 32 can be secured in between, and the electronic component 33 can be mounted there by utilizing the mounting space 32. Therefore, it is possible to reduce the size of the module having the imaging device 21 (see, for example, Patent Document 1 below). In addition, when the image pick-up element 23 is a rectangle by planar view, the base 28 may be provided along only the two sides.
JP 2002-299592 A

しかしながら、上記従来の撮像装置21によると、配線板22は、セラミックスより形成されているので、配線板22の開口付近では、反りや変形等の影響が大きく発生しやすく、撮像素子23を配線板22に平行かつ精度良く接合することが困難になるという問題点を有していた。従って、被写体を撮影する場合にレンズ35を通過する光が撮像素子23の受光部23aへ精度よく入射せず、入射した光を撮像素子23により正確に電気信号に変換して取り出せないという問題点を有していた。   However, according to the conventional imaging device 21, since the wiring board 22 is formed of ceramics, the influence of warpage or deformation is likely to occur near the opening of the wiring board 22, and the imaging element 23 is connected to the wiring board. 22 has a problem that it is difficult to join the wire 22 with high accuracy. Therefore, when the subject is photographed, the light passing through the lens 35 does not accurately enter the light receiving portion 23a of the image sensor 23, and the incident light cannot be accurately converted into an electrical signal by the image sensor 23 and extracted. Had.

また、撮像装置21の小型化に伴って、配線板22が、非常に薄いものとなってくると、開口22aの縁部は、変形等が発生しやすくなり、開口22aの縁部が下側主面側に凸となるように変形していると、撮像素子23を配線板22に取着する際に、開口22aの縁部が撮像素子23に接触して、撮像素子23が割れたりするという問題点を有していた。   If the wiring board 22 becomes very thin as the image pickup device 21 is downsized, the edge of the opening 22a is likely to be deformed, and the edge of the opening 22a is on the lower side. If the image sensor 23 is deformed so as to be convex toward the main surface side, the edge of the opening 22a contacts the image sensor 23 when the image sensor 23 is attached to the wiring board 22, and the image sensor 23 is cracked. It had the problem that.

従って、本発明は上記従来の問題点に鑑み完成されたものであり、その目的は、撮像素子の受光部に光を精度よく入射させ、その入射した光を撮像素子で正確に電気信号に変換して取り出せる撮像装置を提供することにある。   Accordingly, the present invention has been completed in view of the above-mentioned conventional problems, and its purpose is to make light incident accurately on the light receiving portion of the image sensor, and to accurately convert the incident light into an electrical signal by the image sensor. It is to provide an imaging device that can be taken out.

本発明の撮像装置は、貫通孔が形成されたセラミックスから成る絶縁基板と、該絶縁基板の下側主面の前記貫通孔の周囲に形成された電極パッドと、前記絶縁基板の下側主面の前記電極パッドよりも外周側で前記貫通孔の開口縁から0.05mm以上外周側に設けられた複数の突起と、該突起の下面に前記貫通孔に受光部を対向させて当接されるとともに電極が前記電極パッドに電気的に接続された直方体状の撮像素子と、前記絶縁基板の上側主面の前記貫通孔の周囲に、前記貫通孔を覆って取着された窓部材とを具備していることを特徴とする。   An image pickup apparatus according to the present invention includes an insulating substrate made of ceramics with a through hole formed therein, an electrode pad formed around the through hole on the lower main surface of the insulating substrate, and the lower main surface of the insulating substrate. A plurality of protrusions provided on the outer peripheral side of the through hole from the opening edge of the through hole on the outer peripheral side of the electrode pad, and a lower surface of the protrusion abutting the light receiving portion against the through hole And a rectangular parallelepiped imaging element having an electrode electrically connected to the electrode pad, and a window member attached around the through hole on the upper main surface of the insulating substrate so as to cover the through hole. It is characterized by that.

本発明の撮像装置は、好ましくは、前記複数の突起は、前記撮像素子側の側面と上面との間に段差を有する2つの第一の突起と残りの第二の突起とから成り、前記撮像素子の上面の角部の両側が前記2つの第一の突起の前記段差にそれぞれ当接していることを特徴とする。   In the imaging apparatus according to the aspect of the invention, it is preferable that the plurality of projections include two first projections having a step between a side surface and an upper surface on the imaging element side, and the remaining second projections. Both sides of the corner of the upper surface of the element are in contact with the steps of the two first protrusions, respectively.

本発明の撮像装置は、好ましくは、前記第二の突起は、前記2つの第一の突起が形成された前記角部に対向する角部に形成されていることを特徴とする。   In the imaging apparatus according to the aspect of the invention, it is preferable that the second protrusion is formed at a corner portion opposite to the corner portion where the two first protrusions are formed.

本発明の撮像装置は、好ましくは、前記絶縁基板は、下側主面の対向する2辺部に、外部回路基板の上面に前記絶縁基板を支持固定するための側壁部がそれぞれ形成されており、前記第二の突起は、前記側壁部が形成されていない側の辺に沿って形成されていることを特徴とする。   In the imaging device according to the aspect of the invention, it is preferable that the insulating substrate is formed with two side portions opposed to the lower main surface and side wall portions for supporting and fixing the insulating substrate on the upper surface of the external circuit substrate. The second protrusion is formed along a side on which the side wall portion is not formed.

本発明の撮像装置は、貫通孔が形成されたセラミックスから成る絶縁基板と、絶縁基板の下側主面の貫通孔の周囲に形成された電極パッドと、絶縁基板の下側主面の電極パッドよりも外周側で貫通孔の開口縁から0.05mm以上外周側に設けられた複数の突起と、突起の下面に貫通孔に受光部を対向させて当接されるとともに電極が電極パッドに電気的に接続された直方体状の撮像素子と、絶縁基板の上側主面の貫通孔の周囲に、貫通孔を覆って取着された窓部材とを具備していることから、複数の突起の高さにより、撮像素子は開口の縁部より離間した状態となるので、開口の縁部が絶縁基板の下側主面側に凸となるように変形していたとしても、開口の縁部が撮像素子に接触するのを低減することができるとともに撮像素子と絶縁基板との熱膨張係数差によってこれらの接合部に加わる応力を複数の突起により分散することができ、撮像素子が割れるのを有効に低減することができる。また、撮像素子を絶縁基板に平行に取着しやすくなり、撮像素子を精度良く絶縁基板に取着することができる。   An imaging device according to the present invention includes an insulating substrate made of ceramics with a through hole formed therein, an electrode pad formed around a through hole in the lower main surface of the insulating substrate, and an electrode pad on the lower main surface of the insulating substrate A plurality of protrusions provided on the outer peripheral side of the outer peripheral side of the through hole more than 0.05 mm from the opening edge of the through hole, and the lower surface of the protrusion are brought into contact with the light receiving portion facing the through hole and the electrode is electrically connected to the electrode pad. A rectangular parallelepiped imaging device and a window member attached around the through hole in the upper main surface of the insulating substrate so as to cover the through hole. As a result, the image sensor is in a state of being separated from the edge of the opening. Even if the edge of the opening is deformed so as to protrude toward the lower main surface of the insulating substrate, the edge of the opening is imaged. Image sensor and insulating substrate that can reduce contact with element The stress applied to the junction of the thermal expansion coefficient difference can be dispersed by a plurality of projections, it is possible to effectively reduce a imaging element cracking. In addition, the image sensor can be easily attached in parallel to the insulating substrate, and the image sensor can be attached to the insulating substrate with high accuracy.

本発明の撮像装置は、好ましくは、複数の突起は、撮像素子側の側面と上面との間に段差を有する2つの第一の突起と残りの第二の突起とから成り、撮像素子の上面の角部の両側が2つの第一の突起の段差にそれぞれ当接していることから、複数の突起により、撮像素子を絶縁基板に平行に取着するとともに、2つの第一の突起の段差にて撮像素子の位置合わせを行うことができ、撮像素子をきわめて精度良く絶縁基板に取着することができる。   In the image pickup apparatus of the present invention, preferably, the plurality of protrusions includes two first protrusions having a step between the side surface on the image pickup element side and the upper surface, and the remaining second protrusion, and the upper surface of the image pickup element. Since both sides of the corners of the two abuts against the steps of the two first protrusions, the plurality of protrusions attach the image sensor in parallel to the insulating substrate and Thus, the image sensor can be aligned, and the image sensor can be attached to the insulating substrate with extremely high accuracy.

本発明の撮像装置は、好ましくは、第二の突起は、2つの第一の突起が形成された角部に対向する角部に形成されていることから、撮像素子は、角部を含む3つ以上の突起上に載置されるので、撮像素子を平坦に取着しやすくなる。   In the imaging apparatus of the present invention, preferably, the second protrusion is formed at a corner portion opposite to the corner portion where the two first protrusions are formed. Since it mounts on two or more protrusions, it becomes easy to attach an image pick-up element flatly.

本発明の撮像装置は、好ましくは、絶縁基板は、下側主面の対向する2辺部に、外部回路基板の上面に絶縁基板を支持固定するための側壁部がそれぞれ形成されており、第二の突起は、側壁部が形成されていない側の辺に沿って形成されていることから、絶縁基板に側壁部を接合する際の影響による変形等が大きく発生することを抑制するとともに、変形等の影響が第二の突起に伝わり難くなり、撮像素子と絶縁基板との平行度を良好に維持することができる。   In the image pickup apparatus of the present invention, preferably, the insulating substrate is formed with side wall portions for supporting and fixing the insulating substrate on the upper surface of the external circuit substrate on two opposite sides of the lower main surface. Since the second protrusion is formed along the side on which the side wall portion is not formed, it is possible to suppress the occurrence of a large deformation due to the influence when the side wall portion is joined to the insulating substrate, and the deformation. This makes it difficult for the influence of the above and others to be transmitted to the second protrusion, and the parallelism between the imaging element and the insulating substrate can be maintained well.

本発明の撮像装置を以下に詳細に説明する。図1は本発明の撮像装置について実施の形態の一例を示す断面図であり、図2は図1の撮像装置における絶縁基板の下面図を示しており、これらの図において、2は絶縁基板、3は撮像素子、4は窓部材、5は配線導体であり、これらで撮像装置1が主に構成されている。   The imaging apparatus of the present invention will be described in detail below. FIG. 1 is a cross-sectional view showing an example of an embodiment of an image pickup apparatus of the present invention. FIG. 2 is a bottom view of an insulating substrate in the image pickup apparatus of FIG. Reference numeral 3 denotes an image pickup element, 4 denotes a window member, and 5 denotes a wiring conductor, and the image pickup apparatus 1 is mainly composed of these elements.

本発明の絶縁基板2は、酸化アルミニウム質焼結体(アルミナセラミックス),窒化アルミニウム質焼結体等のセラミックスから成り、薄い平板として成型され、その表面および内部に、WやMo等の金属粉末メタライズから成り、撮像素子3の電気信号を伝送する機能を有する配線導体5が形成されており、中央部には光を通過させる貫通孔2aが形成され、貫通孔2aの下側には、受光部3aを貫通孔2aに対向させるとともに電極7(例えば、導体バンプ等の突起電極から成る)が配線導体5に電気的に接続された撮像素子3が取着されている。また、絶縁基板2の上側には撮像素子3の受光部3aを保護するための窓部材4が樹脂接着材等で取着されている。   The insulating substrate 2 of the present invention is made of a ceramic such as an aluminum oxide sintered body (alumina ceramics) or an aluminum nitride sintered body, and is molded as a thin flat plate, and a metal powder such as W or Mo is formed on the surface and inside thereof. A wiring conductor 5 made of metallization and having a function of transmitting an electrical signal of the image sensor 3 is formed. A through hole 2a that allows light to pass through is formed at the center, and a light receiving light is formed below the through hole 2a. An image pickup device 3 is attached in which the portion 3a is opposed to the through hole 2a and an electrode 7 (for example, formed of a protruding electrode such as a conductor bump) is electrically connected to the wiring conductor 5. A window member 4 for protecting the light receiving portion 3a of the image sensor 3 is attached to the upper side of the insulating substrate 2 with a resin adhesive or the like.

絶縁基板2は、例えば酸化アルミニウム質焼結体から成る場合、酸化アルミニウム,酸化珪素,酸化マグネシウム,酸化カルシウム等の原料粉末に適当な有機バインダ,溶剤等を添加混合して泥漿状となし、これを従来周知のドクターブレード法やカレンダーロール法等によりシート状に成形してグリーンシート(セラミック生シート)を得る。次に、グリーンシートに配線導体5形成用の貫通孔や貫通孔2aを形成するための貫通孔を打ち抜き加工で形成するとともに、配線導体5となる金属ペーストを所定パターンに印刷塗布する。しかる後、これらのグリーンシートを積層し切断して絶縁基板2用のグリーンシートの成形体を得、最後にこの成形体を高温(約1600℃)で焼結させることによって製作される。   When the insulating substrate 2 is made of, for example, an aluminum oxide sintered body, a suitable organic binder, solvent, etc. are added to and mixed with raw material powders such as aluminum oxide, silicon oxide, magnesium oxide, and calcium oxide to form a slurry. Is formed into a sheet by a conventionally known doctor blade method, calendar roll method, or the like to obtain a green sheet (ceramic raw sheet). Next, a through hole for forming the wiring conductor 5 and a through hole for forming the through hole 2a are formed in the green sheet by punching, and a metal paste that becomes the wiring conductor 5 is printed and applied in a predetermined pattern. Thereafter, these green sheets are laminated and cut to obtain a green sheet molded body for the insulating substrate 2, and finally the molded body is sintered at a high temperature (about 1600 ° C.).

絶縁基板2に被着形成されている配線導体5は、撮像素子3の電気信号を外部接続用の端子6に伝送させる導電路として機能し、配線導体5の一部は、絶縁基板2の下側主面の貫通孔2aの周囲に形成され、撮像素子3の電極7に接続される電極パッドとして形成される。また、配線導体5は、例えばWやMo等の高融点金属粉末に適当な有機溶剤,溶媒を添加混合して得た金属ペーストを、絶縁基板2となるグリーンシートに予めスクリーン印刷法により所定パターンに印刷塗布しておくことによって、絶縁基板2の所定位置に被着形成される。   The wiring conductor 5 deposited on the insulating substrate 2 functions as a conductive path for transmitting the electric signal of the image sensor 3 to the terminal 6 for external connection, and a part of the wiring conductor 5 is below the insulating substrate 2. It is formed around the through hole 2 a on the side main surface and is formed as an electrode pad connected to the electrode 7 of the image sensor 3. In addition, the wiring conductor 5 is formed by applying a metal paste obtained by adding and mixing an appropriate organic solvent and solvent to a refractory metal powder such as W or Mo on a green sheet to be the insulating substrate 2 by a screen printing method in advance. By being printed and coated on the insulating substrate 2, it is deposited on a predetermined position of the insulating substrate 2.

なお、配線導体5の露出する表面にニッケルや金等の耐蝕性に優れる金属を1〜20μm程度の厚みに被着させておくと、配線導体5が酸化腐蝕するのを有効に防止できるとともに、配線導体5と撮像素子3の電極7との接合を強固なものとすることができる。したがって、配線導体5の露出表面には、厚み1〜10μm程度のニッケルめっき層と厚み0.1〜3μm程度の金メッキ層とが電解めっき法や無電解めっき法により順次被着されているのが好ましい。   In addition, when a metal having excellent corrosion resistance such as nickel or gold is deposited on the exposed surface of the wiring conductor 5 to a thickness of about 1 to 20 μm, the wiring conductor 5 can be effectively prevented from being oxidized and corroded, The connection between the wiring conductor 5 and the electrode 7 of the imaging device 3 can be made strong. Therefore, a nickel plating layer having a thickness of about 1 to 10 μm and a gold plating layer having a thickness of about 0.1 to 3 μm are sequentially deposited on the exposed surface of the wiring conductor 5 by an electrolytic plating method or an electroless plating method. preferable.

また、絶縁基板2の中央部の貫通孔2aの下側には、シリコンの基板上にCCD型,CMOS型の受光部3aを形成した撮像素子3が配置される。撮像素子3の外周部には金などの電極7が形成され、電極7が配線導体5に接続されており、撮像素子3は、配線導体5を介して、外部電気回路に接続される端子6に電気的に接続されている。   Further, below the through hole 2a at the center of the insulating substrate 2, an image pickup device 3 in which a CCD type and CMOS type light receiving part 3a is formed on a silicon substrate is disposed. An electrode 7 such as gold is formed on the outer periphery of the image sensor 3, and the electrode 7 is connected to the wiring conductor 5. The image sensor 3 is connected to the external electric circuit via the wiring conductor 5. Is electrically connected.

また、絶縁基板2の上側主面の貫通孔2aの周囲には、ガラスやサファイア等から成る透明な窓部材4が配置接合されており、窓部材4はエポキシ樹脂等の樹脂接着剤によって絶縁基板2の貫通孔2aの周囲に接着されて、撮像素子3のCCD型,CMOS型などの受光部3aを保護している。   A transparent window member 4 made of glass, sapphire or the like is disposed and bonded around the through hole 2a on the upper main surface of the insulating substrate 2, and the window member 4 is insulated by a resin adhesive such as epoxy resin. 2 is bonded to the periphery of the through hole 2a to protect the light receiving portion 3a of the image sensor 3 such as a CCD type or a CMOS type.

撮像素子3は、電極7が絶縁基板2のニッケルや金などでメッキ処理された配線導体5に、例えば超音波接合法によりフリップチップ接合される。超音波接合法によるフリップチップ接合は、室温で接合部を加圧しつつ0.5秒前後の超音波振動を接合部に加えることにより接合させる接合法である。撮像素子3の接合部の周囲には、接合を補強するとともに封止を行なう樹脂から成る封止樹脂層であるダム(図示せず)が塗布形成してある。このダムは、エポキシ系樹脂の粘度を大きくしたものであり、樹脂の形状維持の強さの指標であるチキソ比も1.7以上と大きいのがよい。   The imaging element 3 is flip-chip bonded to the wiring conductor 5 whose electrode 7 is plated with nickel, gold, or the like of the insulating substrate 2 by, for example, an ultrasonic bonding method. The flip chip bonding by the ultrasonic bonding method is a bonding method in which bonding is performed by applying ultrasonic vibration of about 0.5 seconds to the bonding portion while pressurizing the bonding portion at room temperature. A dam (not shown), which is a sealing resin layer made of a resin that reinforces the joint and seals it, is applied and formed around the joint of the image sensor 3. This dam is obtained by increasing the viscosity of the epoxy resin, and the thixo ratio, which is an index of the strength of maintaining the shape of the resin, should be as large as 1.7 or more.

そして、絶縁基板2の下側主面の電極パッドよりも外周側で貫通孔2aの開口縁から0.05mm以上外周側に設けられた複数の突起8が形成されており、撮像素子3が、突起8の下面に貫通孔2aに受光部3aを対向させて当接されている。これにより、複数の突起8により、撮像素子3は、開口の縁部より離間した状態となるので、開口の縁部が絶縁基板2の下側主面側に凸となるように撮像素子3と絶縁基板2との熱膨張係数差によってこれらの接合部に加わる応力を複数の突起8により分散することができ、撮像素子3が割れるのを有効に低減することができる。また、撮像素子3を絶縁基板2に平行に取着しやすくなり、撮像素子3を精度良く絶縁基板2に取着することができる。   And the some protrusion 8 provided in the outer peripheral side 0.05 mm or more from the opening edge of the through-hole 2a in the outer peripheral side rather than the electrode pad of the lower main surface of the insulated substrate 2 is formed, and the image pick-up element 3 is the following. The light receiving portion 3a is brought into contact with the lower surface of the protrusion 8 so as to face the through hole 2a. Accordingly, the imaging element 3 is separated from the edge of the opening by the plurality of protrusions 8, and thus the imaging element 3 and the imaging element 3 are protruded to the lower main surface side of the insulating substrate 2. Stress applied to these joints due to a difference in thermal expansion coefficient with the insulating substrate 2 can be dispersed by the plurality of protrusions 8, and cracking of the image sensor 3 can be effectively reduced. Moreover, it becomes easy to attach the image sensor 3 in parallel to the insulating substrate 2, and the image sensor 3 can be attached to the insulating substrate 2 with high accuracy.

このような突起8は、タングステンやモリブデン、銅、銀等から成るメタライズ層や絶縁基板2と実質的に同様な材料から成る絶縁層から成り、突起8がメタライズ層から成る場合は、タングステンやモリブデン、銅、銀等から成る金属粉末に適当な有機バインダ、溶剤、可塑剤および分散剤等を添加混合して得たメタライズペーストを従来周知のスクリーン印刷法により絶縁基板2用のセラミックグリーンシートに所定のパターンに印刷塗布し、これを絶縁基板2用の生セラミック成形体とともに焼成することによって、絶縁基板2の下側主面に所定のパターンに形成される。また、突起8がメタライズ層から成る場合は、突起8が酸化腐食するのを有効に防止するために、例えば、厚みが1〜10μm程度のニッケルめっき層および厚みが0.1〜3μm程度の金めっき層が被着されているのがよい。   Such a protrusion 8 is made of a metallized layer made of tungsten, molybdenum, copper, silver or the like, or an insulating layer made of a material substantially the same as that of the insulating substrate 2, and when the protrusion 8 is made of a metallized layer, tungsten or molybdenum. A metallized paste obtained by adding and mixing a suitable organic binder, solvent, plasticizer, dispersant, etc. to metal powder composed of copper, silver, etc. is applied to a ceramic green sheet for the insulating substrate 2 by a conventionally known screen printing method. This pattern is printed and applied and fired together with the green ceramic molded body for the insulating substrate 2 to form a predetermined pattern on the lower main surface of the insulating substrate 2. Further, when the protrusion 8 is made of a metallized layer, for example, in order to effectively prevent the protrusion 8 from being oxidatively corroded, for example, a nickel plating layer having a thickness of about 1 to 10 μm and a gold layer having a thickness of about 0.1 to 3 μm are used. A plating layer is preferably applied.

また、突起8は、貫通孔2aの開口縁から0.05mm未満の部位に形成されていると、突起8が貫通孔2aの開口縁の変形による影響を受けやすくなって、撮像素子3を絶縁基板2に平行に取着するのが困難になる。また、絶縁基板2の形成時に突起8の影響により貫通孔2aの開口縁がより大きく変形しやすくなる。さらに、突起8を形成する際に、印刷ずれ等により、貫通孔2aの内周面に塗布されてしまうと、貫通孔2aの上側開口より入射された光を遮ってしまったりすることがある。このため、突起8は、貫通孔2aの開口縁から0.05mm以上外周側に形成されている。   Further, if the protrusion 8 is formed at a portion of less than 0.05 mm from the opening edge of the through hole 2a, the protrusion 8 is easily affected by the deformation of the opening edge of the through hole 2a, and the image sensor 3 is insulated. It becomes difficult to attach in parallel to the substrate 2. Further, the opening edge of the through hole 2a is more easily deformed due to the influence of the protrusion 8 when the insulating substrate 2 is formed. Further, when the protrusion 8 is formed, if it is applied to the inner peripheral surface of the through hole 2a due to printing misalignment or the like, the light incident from the upper opening of the through hole 2a may be blocked. For this reason, the protrusion 8 is formed on the outer peripheral side by 0.05 mm or more from the opening edge of the through hole 2a.

また、複数の突起8は、平面視で配線導体5と重なり合わない位置に形成されているのが好ましく、これにより、複数の突起8を絶縁基板2の下側主面に同じ高さで形成しやすくなり、撮像素子3を絶縁基板2に良好に取着することができるようになる。   The plurality of protrusions 8 are preferably formed at positions that do not overlap with the wiring conductor 5 in plan view, whereby the plurality of protrusions 8 are formed at the same height on the lower main surface of the insulating substrate 2. Thus, the image pickup device 3 can be satisfactorily attached to the insulating substrate 2.

また、複数の突起8は、図3に撮像装置1の断面図、図4に図3の撮像装置1における絶縁基板2の下面図で示すように、撮像素子3側の側面と上面との間に段差を有する2つの第一の突起8aと残りの第二の突起8bとから成り、撮像素子3の下面の角部の両側が2つの第一の突起8aの段差にそれぞれ当接しているのがよい。これにより、複数の突起8により、撮像素子3を絶縁基板2に平行に取着するとともに、2つの第一の突起8aの段差にて撮像素子3の位置合わせを行うことができ、撮像素子3を精度良く絶縁基板2に取着することができる。従って、撮像素子3の受光部3aに光を精度よく入射させ、その入射した光を撮像素子3で正確に電気信号に変換して取り出すことができる。   Further, as shown in the cross-sectional view of the image pickup apparatus 1 in FIG. 3 and the bottom view of the insulating substrate 2 in the image pickup apparatus 1 in FIG. The two first protrusions 8a and the remaining second protrusions 8b are provided on both sides of the bottom surface of the image pickup device 3 and are in contact with the steps of the two first protrusions 8a. Is good. As a result, the imaging element 3 can be attached in parallel to the insulating substrate 2 by the plurality of protrusions 8, and the imaging element 3 can be aligned at the level difference between the two first protrusions 8 a. Can be attached to the insulating substrate 2 with high accuracy. Accordingly, it is possible to make light incident on the light receiving portion 3a of the image pickup device 3 with high accuracy, and to convert the incident light into an electrical signal accurately by the image pickup device 3 and take it out.

また、第二の突起8bは、2つの第一の突起8aが形成された角部に対向する角部に形成されているのがよい。これにより、撮像素子3は、角部を含む3つの突起8上に載置されるので、撮像素子3を平坦に取着しやすくなる。   The second protrusion 8b is preferably formed at a corner portion opposite to the corner portion where the two first protrusions 8a are formed. Thereby, since the image pick-up element 3 is mounted on the three protrusions 8 including a corner | angular part, it becomes easy to attach the image pick-up element 3 flatly.

このような第二の突起8bは、2つの第一の突起8aが形成された撮像素子3の角部に対向する撮像素子3の角部の頂点に当接するように形成されていても良いし、2つの第一の突起8aが形成された撮像素子3の角に対向する撮像素子3の角部の両側のうち少なくとも一方の辺部に形成されていても構わない。   Such a second protrusion 8b may be formed so as to be in contact with the apex of the corner of the image sensor 3 facing the corner of the image sensor 3 on which the two first protrusions 8a are formed. You may form in the at least one side part of the both sides of the corner | angular part of the image pick-up element 3 facing the corner of the image pick-up element 3 in which the two 1st protrusions 8a were formed.

また、図5に撮像装置1の断面図、図6に図5の撮像装置1における絶縁基板2の下面図、図7に図5の撮像装置1を用いて構成した光学センサ装置の断面図で示すように、絶縁基板2は、下側主面の対向する2辺部に、外部回路基板16の上面に絶縁基板2を支持固定するための側壁部2bがそれぞれ形成されていてもよい。   5 is a cross-sectional view of the imaging device 1, FIG. 6 is a bottom view of the insulating substrate 2 in the imaging device 1 of FIG. 5, and FIG. 7 is a cross-sectional view of an optical sensor device configured using the imaging device 1 of FIG. As shown, the insulating substrate 2 may be formed with side wall portions 2b for supporting and fixing the insulating substrate 2 on the upper surface of the external circuit substrate 16, respectively, on two opposing sides of the lower main surface.

好ましくは、絶縁基板2は、下側主面の対向する2辺部に、外部回路基板16の上面に絶縁基板2を支持固定するための側壁部2bがそれぞれ形成されており、第二の突起8bは、側壁部2bが形成されていない側の辺に沿って形成されているのがよい。これにより、絶縁基板2に側壁部2bを接合する際の影響による変形等が大きく発生することを抑制するとともに、変形等の影響が第二の突起8bに伝わり難くなり、撮像素子3と絶縁基板2との平行度を良好に維持することができる。   Preferably, the insulating substrate 2 is formed with side wall portions 2b for supporting and fixing the insulating substrate 2 on the upper surface of the external circuit substrate 16 on the two opposing sides of the lower main surface, respectively, and the second protrusions. 8b is good to be formed along the edge | side of the side in which the side wall part 2b is not formed. As a result, it is possible to suppress the occurrence of large deformation due to the effect of joining the side wall 2b to the insulating substrate 2, and it is difficult for the influence of the deformation or the like to be transmitted to the second protrusion 8b. The parallelism with 2 can be maintained well.

このような側壁部2bは、絶縁基板2と同材質の酸化アルミニウム質焼結体(アルミナセラミックス)、窒化アルミニウム質焼結体等のセラミックスから成り、撮像素子3の電気信号を配線導体5を介して外部へ取り出すためのものである。そのため、側壁部2bの内部または表面には、配線層(図示せず)が形成され、この配線層は、配線導体5と同材質である例えばW,Mo等の高融点金属粉末に適当な有機溶剤、溶媒を添加混合して得た金属ペーストを、側壁部2bとなるグリーンシートに予めスクリーン印刷法により所定パターンに印刷塗布しておくことによって、側壁部2bの所定位置に被着形成される。そして、配線層の一端は配線導体5と電気的に接続されるように被着形成されており、他端は、側壁部2bの下端に配線層と同材質で同様の方法で被着形成された端子9に接続するように導出されている。   Such a side wall 2b is made of ceramics such as an aluminum oxide sintered body (alumina ceramics) and an aluminum nitride sintered body, which are the same material as that of the insulating substrate 2, and an electric signal of the image pickup device 3 is passed through the wiring conductor 5. It is for taking out outside. For this reason, a wiring layer (not shown) is formed inside or on the surface of the side wall 2b. This wiring layer is an organic material suitable for refractory metal powders such as W and Mo, which are made of the same material as the wiring conductor 5. A metal paste obtained by adding and mixing a solvent and a solvent is preliminarily printed and applied in a predetermined pattern on the green sheet to be the side wall 2b by a screen printing method, thereby being deposited on a predetermined position on the side wall 2b. . One end of the wiring layer is formed so as to be electrically connected to the wiring conductor 5, and the other end is formed on the lower end of the side wall portion 2b by the same method using the same material as the wiring layer. It is derived so as to be connected to the terminal 9.

また、側壁部2bは、絶縁基板2の支持体としても機能し、その下端の端子9が外部回路基板16の配線導体等に接続されて撮像装置1が実装されると、撮像装置1と外部回路基板16との間に実装スペース12が形成され、実装スペース12に対応する外部回路基板16の上面や絶縁基板2の下側主面にIC,LSI,コネクタなどの電子部品13を搭載することができる。そのため、撮像装置1を外部回路基板16等に実装して成る光学センサ装置として使用する際に、光学センサ装置の小型化が達成される。   The side wall portion 2b also functions as a support for the insulating substrate 2. When the imaging device 1 is mounted with the terminal 9 at the lower end thereof connected to a wiring conductor or the like of the external circuit substrate 16, the imaging device 1 and the outside are mounted. A mounting space 12 is formed between the circuit board 16 and an electronic component 13 such as an IC, LSI, or connector is mounted on the upper surface of the external circuit board 16 corresponding to the mounting space 12 or the lower main surface of the insulating substrate 2. Can do. Therefore, when the imaging device 1 is used as an optical sensor device mounted on the external circuit board 16 or the like, the optical sensor device can be reduced in size.

また、側壁部2bは、絶縁基板2と同様のグリーンシートに、端子9に接続される配線層を形成するための貫通孔を打ち抜き加工で形成するとともに、配線層および端子9となる金属ペーストを所定パターンに印刷塗布する。しかる後、これらのグリーンシートを絶縁基板2となるグリーンシートへ順次積層し切断することで絶縁基板2用のグリーンシートと一体化された成型体を得、最後に、この成形体を高温(約1600℃)で焼結させて製作される。   The side wall 2b is formed by punching through holes for forming a wiring layer connected to the terminals 9 in a green sheet similar to the insulating substrate 2, and a metal paste that becomes the wiring layers and the terminals 9 is formed. A predetermined pattern is printed and applied. Thereafter, these green sheets are sequentially laminated on the green sheet to be the insulating substrate 2 and cut to obtain a molded body integrated with the green sheet for the insulating substrate 2. Finally, the molded body is heated to a high temperature (about 1600 ° C.).

なお、側壁部2bの配線層および端子9の露出表面は、酸化腐食するのを有効に防止するとともに、絶縁基板2の配線導体5と側壁部2bの配線層との接合状態、端子9と外部回路基板16の配線導体との接合状態を良好なものとするために、電解めっき法または無電解めっき法により、1〜20μm程度の厚みの銅めっき層,ニッケルめっき層,金めっき層が被着されているか、またはこれらのめっき層が順次被着されているのがよい。   The wiring layer of the side wall 2b and the exposed surface of the terminal 9 effectively prevent oxidative corrosion, and the bonding state between the wiring conductor 5 of the insulating substrate 2 and the wiring layer of the side wall 2b, the terminal 9 and the outside In order to improve the bonding state of the circuit board 16 with the wiring conductor, a copper plating layer, nickel plating layer, or gold plating layer having a thickness of about 1 to 20 μm is deposited by electrolytic plating or electroless plating. These plating layers may be applied sequentially.

そして、撮像装置1をレンズ15を備えたモジュールとした際に、大きな変形や反りによる撮像素子3の絶縁基板2に対する傾きやがたつきが抑制されるため、撮像素子3の受光部3aとレンズ15との光軸を精度良く調整することが可能となり、レンズ鏡筒11の窓14を介してレンズ15を通過する光を撮像素子3の受光部3aへ精度よく入射させることができ、入射した光を撮像素子3により正確に電気信号に変換して取り出せるようになる。   When the imaging device 1 is a module including the lens 15, the light receiving unit 3 a and the lens of the imaging device 3 are suppressed because tilting and rattling of the imaging device 3 with respect to the insulating substrate 2 due to large deformation and warping are suppressed. 15 can be adjusted with high accuracy, and light passing through the lens 15 through the window 14 of the lens barrel 11 can be accurately incident on the light receiving portion 3a of the image pickup device 3 and is incident. Light can be accurately converted into an electrical signal by the image pickup device 3 and extracted.

かくして、本発明の撮像装置1は、側壁部2bの下端に外部回路基板16を半田10等を介して接続し、絶縁基板2の上側主面で窓部材4より外側の外周部にレンズ鏡筒11が接着固定されて光学センサ装置となる。   Thus, in the imaging apparatus 1 of the present invention, the external circuit board 16 is connected to the lower end of the side wall part 2b via the solder 10 or the like, and the lens barrel is provided on the outer peripheral part outside the window member 4 on the upper main surface of the insulating board 2. 11 is bonded and fixed to form an optical sensor device.

本発明の撮像装置を以下の実施例にて評価した。   The imaging device of the present invention was evaluated in the following examples.

まず、アルミナセラミックスのセラミックグリーンシートに打ち抜き加工を行なって3mm角の貫通孔2aを形成した後、W粉末を含む金属ペーストを印刷して配線導体5および電極パッドを形成した。   First, after punching a ceramic green sheet of alumina ceramics to form a 3 mm square through hole 2a, a metal paste containing W powder was printed to form a wiring conductor 5 and an electrode pad.

さらに、この金属ペーストを印刷して、厚さ0.01mmの突起8を貫通孔2aの開口縁から種々の距離(0.02mm、0.04mm、0.05mm、0.08mmおよび0.10mm)の部位に複数形成した。   Further, this metal paste is printed, and the protrusion 8 having a thickness of 0.01 mm is variously spaced from the opening edge of the through hole 2a (0.02 mm, 0.04 mm, 0.05 mm, 0.08 mm and 0.10 mm). A plurality were formed at the sites.

そして、このセラミックグリーンシートを1600℃で焼成することにより、絶縁基板2(試料No.1〜5)を形成した。   And this ceramic green sheet was baked at 1600 degreeC, and the insulated substrate 2 (sample No. 1-5) was formed.

そして、これらの5種類の絶縁基板2のそれぞれの貫通孔2aの開口縁の変形状態と、複数の突起8の平行状態を評価した。なお、貫通孔2aの開口縁の変形状態としては、開口縁と電極パッドとの高さの差が0.01mm以下であるものを良品として判定を行った。また、複数の突起8の平行状態としては、複数の突起8で形成される面に対する絶縁基板の平行度が0.01mm以下であるものを良品として判定を行った。その結果を表1に示す。

Figure 2005243969
And the deformation state of the opening edge of each through-hole 2a of these five types of insulating substrates 2 and the parallel state of the plurality of protrusions 8 were evaluated. In addition, as a deformation | transformation state of the opening edge of the through-hole 2a, what the difference in height of an opening edge and an electrode pad is 0.01 mm or less was determined as a non-defective product. Further, the parallel state of the plurality of protrusions 8 was determined as a good product when the parallelism of the insulating substrate with respect to the surface formed by the plurality of protrusions 8 was 0.01 mm or less. The results are shown in Table 1.
Figure 2005243969

表1より、突起8が貫通孔2aの開口縁から0.05mm以上の距離の部位に形成された試料No.3〜No.5では、開口縁の変形状態が0.01mm以下となるとともに、突起8の平行状態が0.01mm以下となり、優れていることがわかった(表中に○で示す)。   According to Table 1, the sample No. 8 in which the protrusion 8 is formed at a site at a distance of 0.05 mm or more from the opening edge of the through hole 2a. 3-No. 5, the deformation state of the opening edge was 0.01 mm or less, and the parallel state of the protrusion 8 was 0.01 mm or less, which was found to be excellent (indicated by a circle in the table).

また、突起8が貫通孔2aの開口縁から0.05mmの距離よりも短い部位に形成された試料No.1およびNo.2では、開口縁の変形が0.01mmを超えるようになるとともに、突起8の平行状態が0.01mmを超えることとなった(表中に×で示す)。   In addition, the sample No. 8 in which the protrusion 8 is formed at a portion shorter than the distance of 0.05 mm from the opening edge of the through hole 2a. 1 and no. 2, the deformation of the opening edge exceeded 0.01 mm, and the parallel state of the protrusion 8 exceeded 0.01 mm (indicated by x in the table).

従って、突起8を貫通孔2aの開口縁から0.05mm以上の距離の部位に形成することで、開口縁の変形による影響を小さくすることができるとともに、開口縁の変形を小さいものとすることができ、撮像素子3を、突起8に受光部3aが貫通孔2aと対向するように当接して絶縁基板2に平行に取着することができることがわかった。   Therefore, by forming the protrusions 8 at a portion having a distance of 0.05 mm or more from the opening edge of the through hole 2a, the influence of the deformation of the opening edge can be reduced and the deformation of the opening edge can be reduced. It was found that the image pickup device 3 can be attached in parallel to the insulating substrate 2 by contacting the projection 8 so that the light receiving portion 3a faces the through hole 2a.

なお、本発明は上述の実施の形態および実施例に限定されるものではなく、本発明の要旨を逸脱しない範囲内で種々の変更を施すことは何等差し支えない。   Note that the present invention is not limited to the above-described embodiments and examples, and various modifications may be made without departing from the scope of the present invention.

本発明の撮像装置について実施の形態の一例を示す断面図である。It is sectional drawing which shows an example of embodiment about the imaging device of this invention. 図1の撮像装置における絶縁基板の下面図である。It is a bottom view of the insulating substrate in the imaging device of FIG. 本発明の撮像装置について実施の形態の他の例を示す断面図である。It is sectional drawing which shows the other example of embodiment about the imaging device of this invention. 図3の撮像装置における絶縁基板の下面図である。FIG. 4 is a bottom view of an insulating substrate in the imaging device of FIG. 3. 本発明の撮像装置について実施の形態の他の例を示す断面図である。It is sectional drawing which shows the other example of embodiment about the imaging device of this invention. 図5の撮像装置における絶縁基板の下面図である。FIG. 6 is a bottom view of an insulating substrate in the imaging device of FIG. 5. 図5の撮像装置を用いて構成した光学センサ装置の断面図である。It is sectional drawing of the optical sensor apparatus comprised using the imaging device of FIG. 従来の撮像装置の断面図である。It is sectional drawing of the conventional imaging device. 図8の撮像装置を用いて構成した光学センサ装置の断面図である。It is sectional drawing of the optical sensor apparatus comprised using the imaging device of FIG.

符号の説明Explanation of symbols

1:撮像装置
2:絶縁基板
2a:貫通孔
2b:側壁部
3:撮像素子
3a:受光部
4:窓部材
5:配線導体
7:電極
8:突起
8a:第一の突起
8b:第二の突起
1: Image pickup device 2: Insulating substrate 2a: Through hole 2b: Side wall portion 3: Image pickup element 3a: Light receiving portion 4: Window member 5: Wiring conductor 7: Electrode 8: Protrusion 8a: First protrusion 8b: Second protrusion

Claims (4)

貫通孔が形成されたセラミックスから成る絶縁基板と、該絶縁基板の下側主面の前記貫通孔の周囲に形成された電極パッドと、前記絶縁基板の下側主面の前記電極パッドよりも外周側で前記貫通孔の開口縁から0.05mm以上外周側に設けられた複数の突起と、該突起の下面に前記貫通孔に受光部を対向させて当接されるとともに電極が前記電極パッドに電気的に接続された直方体状の撮像素子と、前記絶縁基板の上側主面の前記貫通孔の周囲に、前記貫通孔を覆って取着された窓部材とを具備していることを特徴とする撮像装置。 An insulating substrate made of ceramics with a through hole formed thereon, an electrode pad formed around the through hole on the lower main surface of the insulating substrate, and an outer periphery than the electrode pad on the lower main surface of the insulating substrate And a plurality of protrusions provided on the outer peripheral side of 0.05 mm or more from the opening edge of the through hole on the side, and the lower surface of the protrusion is brought into contact with the light receiving portion facing the through hole and the electrode is attached to the electrode pad A rectangular parallelepiped imaging device electrically connected, and a window member attached around the through hole on the upper main surface of the insulating substrate so as to cover the through hole. An imaging device. 前記複数の突起は、前記撮像素子側の側面と上面との間に段差を有する2つの第一の突起と残りの第二の突起とから成り、前記撮像素子の上面の角部の両側が前記2つの第一の突起の前記段差にそれぞれ当接していることを特徴とする請求項1記載の撮像装置。 The plurality of protrusions includes two first protrusions having a step between the side surface and the upper surface on the image sensor side and the remaining second protrusion, and both sides of the corners on the upper surface of the image sensor are The imaging apparatus according to claim 1, wherein the imaging device is in contact with the step of the two first protrusions. 前記第二の突起は、前記2つの第一の突起が形成された前記角部に対向する角部に形成されていることを特徴とする請求項2記載の撮像装置。 The imaging apparatus according to claim 2, wherein the second protrusion is formed at a corner portion opposite to the corner portion where the two first protrusions are formed. 前記絶縁基板は、下側主面の対向する2辺部に、外部回路基板の上面に前記絶縁基板を支持固定するための側壁部がそれぞれ形成されており、前記第二の突起は、前記側壁部が形成されていない側の辺に沿って形成されていることを特徴とする請求項1乃至請求項3記載の撮像装置。 In the insulating substrate, side walls for supporting and fixing the insulating substrate on the upper surface of the external circuit board are formed on two opposing sides of the lower main surface, and the second protrusion is formed on the side wall. The imaging apparatus according to claim 1, wherein the imaging device is formed along a side on which the portion is not formed.
JP2004052540A 2004-02-26 2004-02-26 Imaging apparatus Pending JP2005243969A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007165749A (en) * 2005-12-16 2007-06-28 Acme System Technologies Corp Assembly for video detection chip and circuit board bonded to inside
JP2010271725A (en) * 2005-12-27 2010-12-02 Samsung Electro-Mechanics Co Ltd Camera module package

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007165749A (en) * 2005-12-16 2007-06-28 Acme System Technologies Corp Assembly for video detection chip and circuit board bonded to inside
JP2010271725A (en) * 2005-12-27 2010-12-02 Samsung Electro-Mechanics Co Ltd Camera module package

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