JP2005243904A5 - - Google Patents

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Publication number
JP2005243904A5
JP2005243904A5 JP2004051442A JP2004051442A JP2005243904A5 JP 2005243904 A5 JP2005243904 A5 JP 2005243904A5 JP 2004051442 A JP2004051442 A JP 2004051442A JP 2004051442 A JP2004051442 A JP 2004051442A JP 2005243904 A5 JP2005243904 A5 JP 2005243904A5
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JP
Japan
Prior art keywords
optical
prism
illumination optical
illumination
optical device
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Pending
Application number
JP2004051442A
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English (en)
Japanese (ja)
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JP2005243904A (ja
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Publication date
Application filed filed Critical
Priority to JP2004051442A priority Critical patent/JP2005243904A/ja
Priority claimed from JP2004051442A external-priority patent/JP2005243904A/ja
Publication of JP2005243904A publication Critical patent/JP2005243904A/ja
Publication of JP2005243904A5 publication Critical patent/JP2005243904A5/ja
Pending legal-status Critical Current

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JP2004051442A 2004-02-26 2004-02-26 照明光学装置、露光装置及び露光方法 Pending JP2005243904A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004051442A JP2005243904A (ja) 2004-02-26 2004-02-26 照明光学装置、露光装置及び露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004051442A JP2005243904A (ja) 2004-02-26 2004-02-26 照明光学装置、露光装置及び露光方法

Publications (2)

Publication Number Publication Date
JP2005243904A JP2005243904A (ja) 2005-09-08
JP2005243904A5 true JP2005243904A5 (zh) 2008-03-21

Family

ID=35025321

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004051442A Pending JP2005243904A (ja) 2004-02-26 2004-02-26 照明光学装置、露光装置及び露光方法

Country Status (1)

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JP (1) JP2005243904A (zh)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3226073A3 (en) 2003-04-09 2017-10-11 Nikon Corporation Exposure method and apparatus, and method for fabricating device
TWI457712B (zh) 2003-10-28 2014-10-21 尼康股份有限公司 照明光學裝置、投影曝光裝置、曝光方法以及元件製造方法
TWI612338B (zh) 2003-11-20 2018-01-21 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法
TWI494972B (zh) 2004-02-06 2015-08-01 尼康股份有限公司 偏光變換元件、光學照明裝置、曝光裝置以及曝光方法
JP4535260B2 (ja) 2004-10-19 2010-09-01 株式会社ニコン 照明光学装置、露光装置、および露光方法
EP2660852B1 (en) 2005-05-12 2015-09-02 Nikon Corporation Projection optical system, exposure apparatus and exposure method
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
CN102221785A (zh) * 2010-04-14 2011-10-19 上海微电子装备有限公司 一种使用汞灯光源的光刻照明装置
JP5459399B2 (ja) * 2010-06-03 2014-04-02 株式会社ニコン 顕微鏡装置

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