JP2005223296A - Apparatus for transferring substrate - Google Patents

Apparatus for transferring substrate Download PDF

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JP2005223296A
JP2005223296A JP2004032646A JP2004032646A JP2005223296A JP 2005223296 A JP2005223296 A JP 2005223296A JP 2004032646 A JP2004032646 A JP 2004032646A JP 2004032646 A JP2004032646 A JP 2004032646A JP 2005223296 A JP2005223296 A JP 2005223296A
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holding
substrate
arm
pair
transport direction
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JP4334369B2 (en
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Takeyoshi Isogai
武義 磯貝
Yasunori Kametani
泰範 亀谷
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Fuji Corp
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Fuji Machine Manufacturing Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a transferring apparatus for which realizes simplification and miniaturization of structure, where an interval between a pair of holding arms for holding a substrate can be adjusted, without changing the center position, and the pair of holding arms can be rotated between a holding position for holding the substrate and a retreating position turned from the holding position by substantially 90°. <P>SOLUTION: The pair of holding arms 25 and 26 are borne, respectively rotatably by a pair of arm supporters 15 and 16 mounted to a base 10 in a state of being movable in a transport direction. The respective holding arms 25 and 26 are rotated, by a rotating apparatus between the holding position for holding the substrate projecting in a horizontal direction, nearly vertical to the transport direction and the retreating position rotated from the holding position by nearly 90°. The respective arm supporters 15 and 16 are moved in linkage by the same distance, in mutually opposite directions of the transport direction by an arm supporter connection and disconnection apparatus 50. The pair of supporters 15 and 16, holding the substrate, are moved integrally in the transport direction by a transporting-moving apparatus. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、基板を装置間で搬送する搬送装置に関する。   The present invention relates to a transfer apparatus that transfers a substrate between apparatuses.

特許文献1には、LCD用基板Sの下面を一対のロードアーム26(背景技術及び発明の課題の項では、特許文献1に示され参照番号を付す。)で保持し、アーム26上に水平状態で保持された基板Sをアーム26上面に開口されて負圧装置に接続された孔38に吸着して検査装置10に搬入出する搬送装置14が開示されている。搬送装置40は、基台32にXテーブル31がX方向に移動可能に装架され、Xテーブル31上に回転体30が回転駆動可能に装架され、回転体30に昇降可能に装架された支持板28上に一対のアーム26が固定された連結部材39がY方向移動可能に支持されている。検査装置10は、互いに直角なX,Y方向に直線移動可能で、垂直なθ軸線回りに回転可能な基板載置台44上に載置された基板Sの電極パッドをプローブ針に接触させて電気的検査を行うものである。基板Sを収納するカセットCがXテーブル31の移動方向に沿って載置されている。搬送装置40は、基板Sを一対のアーム26上に載置させて基板SをカセットCと検査装置の基板載置台44との間で搬送する。
特開平8−264619号公報(第5,6頁、図3,4)
In Patent Document 1, the lower surface of the LCD substrate S is held by a pair of load arms 26 (in the background art and the subject of the invention, the reference numerals are given in Patent Document 1 and are attached with reference numerals), and are horizontally mounted on the arms 26. A transfer device 14 is disclosed in which the substrate S held in a state is sucked into a hole 38 opened on the upper surface of the arm 26 and connected to a negative pressure device, and is carried into and out of the inspection device 10. The transport device 40 is mounted on the base 32 so that the X table 31 can move in the X direction, and the rotating body 30 is mounted on the X table 31 so as to be able to be driven to rotate, and is mounted on the rotating body 30 so as to be movable up and down. A connecting member 39 having a pair of arms 26 fixed thereto is supported on the support plate 28 so as to be movable in the Y direction. The inspection apparatus 10 is capable of moving linearly in the X and Y directions perpendicular to each other and bringing the electrode pads of the substrate S placed on the substrate placing table 44 rotatable about the vertical θ axis line into contact with the probe needles. To perform a physical inspection. A cassette C for storing the substrate S is placed along the moving direction of the X table 31. The transport device 40 places the substrate S on the pair of arms 26 and transports the substrate S between the cassette C and the substrate mounting table 44 of the inspection device.
JP-A-8-264619 (5th and 6th pages, FIGS. 3 and 4)

特許文献1に記載された搬送装置では、LCD用基板Sを一対のアーム26に載置させて搬送するので、基板Sの撓み量を小さく抑えることができるが、一対のアーム26の間隔を中心位置を変えることなく変更することができないので、大きさの異なる基板Sに応じてアーム26の間隔を調整すると、一対のアーム26間の中心位置が変わってしまい、この中心位置のズレだけ搬送装置の位置を補正しなければならなかった。    In the transfer device described in Patent Document 1, since the LCD substrate S is placed on the pair of arms 26 and transferred, the amount of bending of the substrate S can be reduced, but the distance between the pair of arms 26 is centered. Since the position cannot be changed without changing the position, if the distance between the arms 26 is adjusted according to the substrates S having different sizes, the center position between the pair of arms 26 is changed, and the transfer device is shifted by this center position shift. Had to correct the position.

また、連結部材39をY方向に移動させることにより一対のアーム26を、アーム26が検査装置10に向かって突出する保持位置と、アーム26が検査装置10から後退する後退位置との間で進退移動させているので、装置が大型化する問題がある。    Further, by moving the connecting member 39 in the Y direction, the pair of arms 26 are moved forward and backward between a holding position where the arms 26 protrude toward the inspection apparatus 10 and a retreat position where the arms 26 retract from the inspection apparatus 10. Since it is moved, there is a problem that the apparatus becomes large.

本発明はかかる従来の不具合を解消するためになされたもので、基板を保持する一対の保持アームの間隔を中心位置を変えることなく調整可能とし、一対の保持アームを基板を保持する保持位置と、保持位置から略90度旋回した退避位置との間で旋回可能とした構造が簡単で小型化が可能な搬送装置を提供することである。    The present invention has been made to solve such a conventional problem, and can adjust the distance between a pair of holding arms that hold a substrate without changing the center position, and the pair of holding arms can hold a substrate. Another object of the present invention is to provide a transport device that is simple and can be miniaturized in a structure that can be swung between a retraction position that is swung approximately 90 degrees from a holding position.

上記の課題を解決するため、請求項1に記載の発明の構成上の特徴は、基板の下面を一対の保持アームで保持し、基板を水平状態で搬送する搬送装置において、前記一対の保持アームが夫々旋回可能に支承されベースに搬送方向に移動可能に装架された一対のアーム支持体と、前記一対の保持アームを、各保持アームが前記搬送方向と略直角な水平方向に突出して前記基板を保持する保持位置と、前記保持位置から略90度旋回する退避位置との間で旋回させる旋回装置と、各アーム支持体を前記搬送方向に互いに反対向きに等距離だけ連動して移動させるアーム支持体接離装置と、一対のアーム支持体を前記搬送方向に一体的に移動させる搬送移動装置とを備えたことである。   In order to solve the above-described problem, the structural feature of the invention described in claim 1 is that the pair of holding arms is provided in a transfer device that holds the lower surface of the substrate with a pair of holding arms and transfers the substrate in a horizontal state. And a pair of arm supports mounted on the base so as to be movable in the transport direction, and the pair of holding arms, each holding arm projecting in a horizontal direction substantially perpendicular to the transport direction, and A revolving device that revolves between a holding position that holds the substrate and a retreat position that revolves approximately 90 degrees from the holding position, and each arm support that moves in an opposite direction in the transport direction in an equidistant manner. An arm support contacting / separating device; and a transport moving device that integrally moves the pair of arm supports in the transport direction.

請求項2に記載の発明の構成上の特徴は、請求項1において、前記搬送方向に延在するガイドを前記ベース上に設け、前記一対のアーム支持体を該ガイドに摺動可能に装架し、スライドを前記一対のアーム支持体の間で前記ガイドに摺動可能に装架し、前記アーム支持体接離装置により前記スライドと各アーム支持体とを連結し、前記搬送移動装置は、前記スライドを搬送方向に移動させることにより前記一対のアーム支持体を前記アーム支持体接離装置を介して搬送方向に移動させることである。   According to a second aspect of the present invention, there is provided a structural feature according to the first aspect, wherein a guide extending in the transport direction is provided on the base, and the pair of arm supports are slidably mounted on the guide. Then, a slide is slidably mounted on the guide between the pair of arm supports, and the slide and each arm support are connected by the arm support contact / separation device. The pair of arm supports is moved in the transport direction via the arm support contact / separation device by moving the slide in the transport direction.

請求項3に記載の発明の構成上の特徴は、前記旋回装置は、各保持アームを各アーム支持体に水平面内で垂直軸線回りに旋回可能に支承し、各保持アームを、各保持アームが搬送方向と略直角で水平方向に突出して基板を保持する保持位置と、各保持アームが搬送方向と平行になるまで互いに反対方向に開いた退避位置との間で、ゼネバ機構を介して旋回させる回動駆動装置を備えたことである。 According to a third aspect of the present invention, the swiveling device supports each holding arm on each arm support so that the holding arm can turn about a vertical axis in a horizontal plane, and each holding arm is supported by each holding arm. It is swung via a Geneva mechanism between a holding position that holds the substrate by projecting in a horizontal direction substantially perpendicular to the transport direction and a retracted position that opens in opposite directions until each holding arm is parallel to the transport direction. A rotation drive device.

請求項4に記載の発明の構成上の特徴は、請求項1乃至3のいずれか1項において、前記各保持アームの上面に負圧装置に接続されて基板を吸着する吸着部材を複数個開口し、各吸着部材を基板の大きさに応じて開閉する開閉弁を設けたことである。   According to a fourth aspect of the present invention, in any one of the first to third aspects, a plurality of suction members that are connected to a negative pressure device and suck a substrate are opened on the upper surface of each holding arm. In addition, an on-off valve is provided for opening and closing each adsorbing member according to the size of the substrate.

上記のように構成した請求項1係る発明においては、保持アームが支承されたアーム支持体を、アーム支持体接離装置により互いに反対向きに連動して等距離だけ移動できるので、適切な間隔に調整した一対の保持アームにより基板を下面2箇所で撓み量を小さく抑制して保持することができる。また、搬送する基板が変わったとき、一対の保持アームの間隔を中心位置を変えることなく基板の大きさに応じて調整でき、基板を搬入出される装置の搬入位置、搬出位置を変更する必要がなく、段取り替えを容易に行うことができる。また、一対の保持アームを、保持アームが搬送方向と略直角で水平方向に突出して基板を保持する保持位置と、該保持位置から略90度旋回した退避位置との間で旋回させることができる構造が簡単で小型化が可能な搬送装置を提供することができる。    In the invention according to claim 1 configured as described above, the arm support on which the holding arm is supported can be moved by an equal distance in conjunction with each other in the opposite directions by the arm support contact / separation device. With the adjusted pair of holding arms, the substrate can be held at two locations on the lower surface with a small amount of bending. In addition, when the substrate to be transferred changes, the distance between the pair of holding arms can be adjusted according to the size of the substrate without changing the center position, and it is necessary to change the loading position and unloading position of the apparatus for loading and unloading the substrate. Therefore, setup change can be easily performed. Further, the pair of holding arms can be swung between a holding position where the holding arm protrudes in a horizontal direction substantially perpendicular to the transport direction and holds the substrate, and a retreat position rotated about 90 degrees from the holding position. It is possible to provide a transport device that has a simple structure and can be miniaturized.

上記のように構成した請求項2に係る発明においては、ベース上に搬送方向に延在されたガイドに一対のアーム支持体を装架し、各アーム支持体にアーム支持体接離装置により両側で連結されたスライドをガイドに装架し、スライドを搬送移動装置により移動させて一対のアーム支持体を搬送方向に移動させ、保持アームに保持された基板を搬送する。このように、一対のアーム支持体と、アーム支持体の間に配置されたスライドとを同一のガイドに摺動可能に装架したので、装置を簡素にして小型化し、コストを低減することができる。   In the invention according to claim 2 configured as described above, a pair of arm supports is mounted on a guide extending in the transport direction on a base, and both arm supports are separated by arm support contacting / separating devices. The slide connected in the above is mounted on the guide, the slide is moved by the transfer movement device, the pair of arm supports are moved in the transfer direction, and the substrate held by the holding arm is transferred. As described above, since the pair of arm supports and the slide arranged between the arm supports are slidably mounted on the same guide, the apparatus can be simplified, downsized, and the cost can be reduced. it can.

上記のように構成した請求項3に係る発明においては、各保持アームを各アーム支持体に垂直軸線回りに旋回可能に支承し、各保持アームをゼネバ機構を介して旋回駆動するので、一対の保持アームを、各保持アームが搬送方向と略直角で水平方向に突出して基板を保持する保持位置と、搬送方向と平行になるまで互いに反対方向に開いた退避位置との間で、始動時及び停止時のショックを低減して高速で旋回することができる。   In the invention according to claim 3 configured as described above, each holding arm is supported on each arm support so as to be pivotable about a vertical axis, and each holding arm is pivotally driven via a Geneva mechanism. The holding arms are arranged between a holding position in which each holding arm protrudes in a horizontal direction substantially perpendicular to the transport direction and holds the substrate, and a retracted position that opens in opposite directions until parallel to the transport direction. It is possible to turn at high speed with reduced shock when stopping.

上記のように構成した請求項4に係る発明においては、基板は、負圧装置に接続されて各保持アームの上面に開口する複数の吸着部材により下面を吸着されて一対の保持アームに確実に保持される。小さい基板を搬送する場合、基板が対向しない吸着部材は開閉弁により閉止されるので、基板と対向しない吸着部材からエアが流入して負圧が低下することを防止できる。   In the invention according to claim 4 configured as described above, the substrate is securely attached to the pair of holding arms by being sucked at the lower surface by a plurality of suction members that are connected to the negative pressure device and open to the upper surface of each holding arm. Retained. When a small substrate is transported, the suction member that does not face the substrate is closed by the on-off valve, so that it is possible to prevent the negative pressure from being lowered due to air flowing in from the suction member that does not face the substrate.

以下、本発明に係る基板搬送装置を図面に基づいて説明する。図1において、1は液晶パネル(以下、基板という。)にチップ又はフィルムを装着して液晶表示装置を生産する生産ラインで、基板Pの端子をクリーニングするクリーニング装置2、異方性導電フィルム(ACF)を基板Pに貼り付けるACF張付け装置3、チップ又は回路を印刷したフィルム(FPC)を搭載する搭載装置4、搭載されたチップ又はFPCを押圧して基板Pに本圧着する圧着装置5から構成され、基板をクリーニング装置2から圧着装置5に順次搬送するために、隣接する装置に跨って基板搬送装置6が配置されている。各装置2乃至5は、基台7上にステージ8が夫々装架され、各ステージ8は互いに直角なX,Y,Z方向に直線移動されるとともに、垂直軸θ回りに回転割出しされるようになっている。基板搬送装置6からステージ8上に水平状態で搬入された基板Pは、ステージ8上面に開口され負圧装置に連通された吸着穴の負圧に吸引されステージ8に吸着される。各装置2乃至5のステージ8の上方には、作業部が夫々装備され、ステージ8に吸着されて所定位置に割出された基板Pに対し、端子のクリーニング、ACFの張付け等の各作業が行われる。    Hereinafter, a substrate transfer apparatus according to the present invention will be described with reference to the drawings. In FIG. 1, reference numeral 1 denotes a production line for producing a liquid crystal display device by mounting a chip or film on a liquid crystal panel (hereinafter referred to as a substrate), a cleaning device 2 for cleaning the terminals of the substrate P, an anisotropic conductive film ( The ACF tensioning device 3 for attaching the ACF) to the substrate P, the mounting device 4 for mounting a film (FPC) on which a chip or a circuit is printed, and the pressure bonding device 5 for pressing the mounted chip or FPC to the substrate P for final pressure bonding. In order to sequentially convey the substrate from the cleaning device 2 to the pressure bonding device 5, a substrate conveyance device 6 is disposed across adjacent devices. In each of the devices 2 to 5, a stage 8 is mounted on the base 7, and each stage 8 is linearly moved in the X, Y, and Z directions perpendicular to each other and is rotationally indexed about the vertical axis θ. It is like that. The substrate P carried in a horizontal state on the stage 8 from the substrate transfer device 6 is sucked by the negative pressure of the suction hole that is opened on the upper surface of the stage 8 and communicated with the negative pressure device, and is sucked to the stage 8. Above the stage 8 of each apparatus 2 to 5, a working unit is provided, and each operation such as cleaning of terminals and attaching ACF to the substrate P attracted to the stage 8 and indexed to a predetermined position is performed. Done.

図1,3に示すように、装置2乃至5の前方正面側には、基板搬送装置6のベース10が隣接する2台の装置に跨ってX方向に延在され、支持スタンド11を介して床面に固定されている。ベース10の上面には、ガイドレール12がX方向に固定され、ガイドレール12にスライド13の下面に固定された摺動係合部13aが摺動可能に係合されている。スライド13の後方端面に垂下された支持部13bには、スライド13をX方向に搬送移動させるリニアモータ14の一対のリニアモータマグネットコイル14aがX軸方向に水平に固定され、ベース10の下面には、リニアモータ14の一対のリニアモータマグネット14bが各リニアモータマグネットコイル14aに磁極面を夫々対向させてX方向に水平に固定されている。    As shown in FIGS. 1 and 3, on the front front side of the apparatuses 2 to 5, a base 10 of the substrate transfer apparatus 6 extends in the X direction across two adjacent apparatuses, and is interposed via a support stand 11. It is fixed on the floor. A guide rail 12 is fixed to the upper surface of the base 10 in the X direction, and a sliding engagement portion 13 a fixed to the lower surface of the slide 13 is slidably engaged with the guide rail 12. A pair of linear motor magnet coils 14 a of a linear motor 14 that conveys and moves the slide 13 in the X direction is fixed horizontally in the X-axis direction to the support portion 13 b that is suspended from the rear end surface of the slide 13, and is attached to the lower surface of the base 10. The pair of linear motor magnets 14b of the linear motor 14 is fixed horizontally in the X direction with the magnetic pole surfaces facing each linear motor magnet coil 14a.

図2,4に示すように、ガイドレール12には、一対のアーム支持体15,16がスライド13の両側に摺動可能に装架され、アーム支持体15,16にはX方向に延在するラック17,18が互いに対向して固定されている。ラック17,18はピニオン19に噛合され、ピニオン19はスライド13に垂直軸線回りに回転可能に支承されている。アーム支持体15,16の間隔が基板Pの大きさに合わせて調整されると、スライド13に設けられたクランプ装置20が締結作動され、ラック17,18が夫々ピニオン19に向かって締め付けられ、アーム支持体15,16の相対移動が規制される。アーム支持体15,16の間隔を示すために、スケール21が後側のアーム支持体15にX方向に延在して固定され、ポインタ22がスケール21に向かってスライド13に取付けられている。   As shown in FIGS. 2 and 4, a pair of arm supports 15 and 16 are slidably mounted on both sides of the slide 13 on the guide rail 12, and extend in the X direction on the arm supports 15 and 16. Racks 17 and 18 are fixed to face each other. The racks 17 and 18 are meshed with a pinion 19, and the pinion 19 is supported on the slide 13 so as to be rotatable about a vertical axis. When the distance between the arm supports 15 and 16 is adjusted in accordance with the size of the substrate P, the clamping device 20 provided on the slide 13 is fastened and the racks 17 and 18 are tightened toward the pinion 19, respectively. The relative movement of the arm supports 15 and 16 is restricted. In order to indicate the distance between the arm supports 15 and 16, the scale 21 is fixed to the rear arm support 15 extending in the X direction, and the pointer 22 is attached to the slide 13 toward the scale 21.

このように、スライド13と各アーム支持体15,16との間に装着されピニオン19、ラック17,18、クランプ装置20等により、アーム支持体15,16を搬送方向であるX方向に互いに反対向きに等距離だけ連動して移動させるアーム支持体接離装置50が構成されている。そして、リニアモータ14、スライド13、ピニオン19、ラック17,18、クランプ装置20等により、一対のアーム支持体15,16を搬送方向に一体的に移動させる搬送移動装置51が構成され、搬送移動装置51は、スライド13をリニアモータ14によって搬送方向に移動させることにより一対のアーム支持体15,16をアーム支持体接離装置50を介して搬送方向に移動させる。   Thus, the arm supports 15 and 16 are opposed to each other in the X direction, which is the conveying direction, by the pinion 19, the racks 17 and 18, the clamp device 20 and the like mounted between the slide 13 and the arm supports 15 and 16. An arm support body contacting / separating device 50 is configured to move in an interlocking manner with an equal distance. The linear motor 14, the slide 13, the pinion 19, the racks 17 and 18, the clamp device 20, and the like constitute a transport movement device 51 that integrally moves the pair of arm supports 15 and 16 in the transport direction. The device 51 moves the pair of arm supports 15 and 16 in the transport direction via the arm support contact / separation device 50 by moving the slide 13 in the transport direction by the linear motor 14.

アーム支持体15,16には、旋回中心軸23,24が垂直に固定され、各旋回中心軸23,24には保持アーム25,26が、X方向と略直角で水平方向に突出して基板Pを保持する保持位置と、X方向と平行になるまで互いに反対方向に開いた退避位置との間で旋回するように旋回可能に支承されている。保持アーム25,26の旋回中心軸23,24に支承された基端部からは従動腕部25a,26aが保持アーム25,26に対して直角に水平に突設されている。保持アーム25,26が保持位置に位置すると、従動腕部25a,26aは外側に向かって互いに反対方向に突出し、従動腕部25a,26aの下面に端面から基端部に向かって刻設された長溝25b,26bがX方向に延在する。アーム支持体15,16に旋回中心軸23,24より前方で垂直に固定された支持軸27,28には、駆動アーム29,30が垂直軸線回りに回動可能に支承され、駆動アーム29,30の先端には、保持アーム25,26及び駆動アーム29,30がX方向と直角に後方に突出するとき、長溝25b,26bの開口端部に嵌合するローラ31,32が自由回転可能に支承されている。駆動アーム29,30の前端部に形成されたセクタ歯車33,34は、可動体35,36にX方向に固定されたラック37,38に噛合され、可動体35,36はアーム支持体15,16にX方向に摺動可能に装架されてエアシリンダ39,40によりX方向に往復動される。   The swing support shafts 23 and 24 are fixed vertically to the arm supports 15 and 16, and the support arms 25 and 26 protrude from the swing support shafts 23 and 24 in a horizontal direction substantially perpendicular to the X direction. Is supported so as to be swiveled so as to swivel between a holding position for holding and a retracted position opened in opposite directions until parallel to the X direction. Driven arm portions 25 a, 26 a are projected horizontally at right angles to the holding arms 25, 26 from the base end portions supported on the turning center shafts 23, 24 of the holding arms 25, 26. When the holding arms 25 and 26 are located at the holding positions, the driven arm portions 25a and 26a protrude outward in opposite directions, and are engraved on the lower surface of the driven arm portions 25a and 26a from the end surface to the base end portion. The long grooves 25b and 26b extend in the X direction. Drive arms 29 and 30 are supported on the support shafts 27 and 28 fixed vertically to the arm supports 15 and 16 in front of the turning center shafts 23 and 24 so as to be rotatable about the vertical axis. When the holding arms 25 and 26 and the drive arms 29 and 30 protrude rearward at a right angle to the X direction, rollers 31 and 32 fitted to the open ends of the long grooves 25b and 26b are freely rotatable at the tip of 30. It is supported. Sector gears 33 and 34 formed at the front end portions of the drive arms 29 and 30 are meshed with racks 37 and 38 fixed to the movable bodies 35 and 36 in the X direction, and the movable bodies 35 and 36 are arm support bodies 15 and 36. 16 is slidably mounted in the X direction and is reciprocated in the X direction by air cylinders 39 and 40.

駆動アーム29,30、ローラ31,32、長溝25b,26b、従動腕部25a,25b等によりゼネバ機構52が構成されている。エアシリンダ39,40、ラック37,38、セクタ歯車33,34、支持軸27,28、ゼネバ機構52等により、一対の保持アーム25,26を保持位置と退避位置との間でゼネバ機構52を介して旋回させる回動駆動装置53が構成されている。そして、一対の保持アーム25,26を、保持アーム25,26が搬送方向と略直角な水平方向に突出して基板Pを保持する保持位置と、保持位置から略90度旋回する退避位置との間で旋回させる旋回装置54は、各保持アーム25,26を各アーム支持体15,16に水平面内で垂直軸線回りに旋回可能に支承し、各保持アーム25,26を、各保持アームが搬送方向と略直角で水平方向に突出して基板Pを保持する保持位置と、各保持アームが搬送方向と平行になるまで互いに反対方向に開いた退避位置との間で、ゼネバ機構52を介して旋回させる回動駆動装置53を備えている。 The Geneva mechanism 52 is constituted by the drive arms 29 and 30, the rollers 31 and 32, the long grooves 25b and 26b, the driven arm portions 25a and 25b, and the like. The air cylinders 39 and 40, the racks 37 and 38, the sector gears 33 and 34, the support shafts 27 and 28, the geneva mechanism 52, etc. are used to move the pair of holding arms 25 and 26 between the holding position and the retracted position. A rotation driving device 53 is configured to be rotated. The pair of holding arms 25 and 26 are arranged between a holding position where the holding arms 25 and 26 protrude in a horizontal direction substantially perpendicular to the transport direction and hold the substrate P, and a retreat position where the holding arm 25 and 26 turn about 90 degrees from the holding position. The swivel device 54 that swivels is supported by the arm supports 15 and 16 so that the holding arms 25 and 26 can be swung around the vertical axis in the horizontal plane. Between the holding position that protrudes in the horizontal direction at a substantially right angle to hold the substrate P, and the retracted position that opens in opposite directions until each holding arm is parallel to the transport direction, through the Geneva mechanism 52. A rotation driving device 53 is provided.

なお、旋回装置54は、保持アーム25,26の基端部に旋回中心軸23,24と同心に歯車を形成し、該歯車を支持軸27,28に支承した歯車と噛合させて連結するようにしてもよく、又は保持アーム25,26の基端部に形成した歯車をエアシリンダにより往復動されるラックで直接回動させるようにしてもよい。   The swivel device 54 is formed so that gears are formed concentrically with the swivel center shafts 23 and 24 at the base end portions of the holding arms 25 and 26, and the gears are engaged with and coupled to the gears supported on the support shafts 27 and 28. Alternatively, the gears formed at the base end portions of the holding arms 25 and 26 may be directly rotated by a rack reciprocated by an air cylinder.

図5に示すように、一対の保持アーム25,26には、複数の吸着パッド41(吸着部材)が上面に開口して設けられ、各吸着パッド41は保持アーム25、26に穿設された共通通路42を通って負圧装置43に接続されている。共通通路42と各吸着パッド41とを連通する各分岐路44には、開閉弁45が夫々設けられている。開閉弁45の弁体46は、分岐路44と交差するように保持アーム25,26に回転可能に支承され、弁体46の操作部46aが保持アーム25,26の外側面から側方に突出されている。操作部46aが回転され、弁体46の分岐路44と交差する部分に直径方向に貫通して穿設された弁穴46bと分岐路44とが連通状態になると、開閉弁45が開かれて吸着パッド41に負圧が供給され、不連通状態になると開閉弁45が閉じられて吸着パッド41が負圧装置43から遮断される。   As shown in FIG. 5, a plurality of suction pads 41 (suction members) are provided on the upper surface of the pair of holding arms 25 and 26, and each suction pad 41 is formed in the holding arms 25 and 26. The negative pressure device 43 is connected through the common passage 42. Open / close valves 45 are provided in the respective branch paths 44 that communicate the common passage 42 and the respective suction pads 41. The valve body 46 of the on-off valve 45 is rotatably supported by the holding arms 25 and 26 so as to intersect the branch path 44, and the operation portion 46 a of the valve body 46 protrudes laterally from the outer surface of the holding arms 25 and 26. Has been. When the operating portion 46a is rotated and the valve hole 46b formed in a diametrical direction at a portion intersecting the branch passage 44 of the valve body 46 and the branch passage 44 are in communication with each other, the on-off valve 45 is opened. When a negative pressure is supplied to the suction pad 41 and the communication pad is disconnected, the on-off valve 45 is closed and the suction pad 41 is shut off from the negative pressure device 43.

次に、本実施形態の作動を、基板Pをクリーニング装置2から搬出してACF張付け装置3に搬入する場合を例にして説明する。基板搬送装置6のスライド13及びスライド13にラック17,18、ピニオン19を介して連結されたアーム支持体15,16は、クリーニング装置2の搬出位置に対向する位置にリニアモータ14により移動される。このとき保持アーム25,26は、X方向と平行になるまで互いに反対方向に開いた退避位置に位置されている。端子のクリーニングが終了すると、クリーニング装置2のステージ8は、ステージ8に吸着された基板Pが保持アーム25、26上面と干渉しない上昇位置までZ方向に上昇され、次いでX、Y方向に移動されて搬出位置に割出される。   Next, the operation of the present embodiment will be described by taking as an example the case where the substrate P is unloaded from the cleaning device 2 and loaded into the ACF tensioning device 3. The arm support 15 and 16 connected to the slide 13 and the slide 13 of the substrate transfer device 6 via racks 17 and 18 and a pinion 19 are moved by the linear motor 14 to a position opposite to the unloading position of the cleaning device 2. . At this time, the holding arms 25 and 26 are positioned at a retracted position opened in opposite directions until parallel to the X direction. When the terminal cleaning is completed, the stage 8 of the cleaning device 2 is lifted in the Z direction to a raised position where the substrate P adsorbed on the stage 8 does not interfere with the upper surfaces of the holding arms 25 and 26, and then moved in the X and Y directions. Indexed to the unloading position.

ステージ8が搬出位置に停止されると、可動体35,36に固定されたラック37,38がエアシリンダ39,40により前進され、ラック37,38に噛合されたセクタ歯車33,34により駆動アーム29,30が回動され、ローラ31,32と長溝25b,26bとの係合により保持アーム25,26は旋回中心軸23,24に支承されてX方向と略直角な保持位置に旋回される。駆動アーム29,30の回動は、ゼネバ機構52を構成するローラ31,32と長溝25b,26bとの係合を介して保持アーム25,26に伝達されるので、保持アーム25,26を始動時と停止時のショックを低減して高速で旋回することができる。保持アーム25,26が保持位置に旋回されると、ステージ8は基板P受け渡し高さ位置までZ方向に下降し、その高さ位置に一時停止する。そして保持アーム25,26上面に開口する吸着パッド41が負圧装置43に連通され、基板Pが保持アーム25,26上に吸着される。保持アーム25,26上への吸着が完了すると、ステージ8上面に開口された吸着穴が大気に連通されて基板Pがアンクランプされる。このとき基板Pは、適切な間隔に調整された一対の保持アーム25,26により下面2箇所で保持されるので、基板Pの撓み量を小さく抑制することができる。また、基板Pと対向しない吸着パッド41は、開閉弁45により分岐路44を閉鎖されて負圧装置43との連通を事前に閉止されているので、基板Pと対向しない吸着パッド41からのエア漏れにより負圧が低下することがない。基板Pをアンクランプすると、クリーニング装置2のステージ8は、保持アーム25、26下面と干渉しない下降位置までZ方向に下降された後、クリーニング装置2の搬出位置から基板Pが搬出終了するまで待機する。   When the stage 8 is stopped at the unloading position, the racks 37 and 38 fixed to the movable bodies 35 and 36 are advanced by the air cylinders 39 and 40 and the drive arms are driven by the sector gears 33 and 34 meshed with the racks 37 and 38. The holding arms 25 and 26 are supported on the turning center shafts 23 and 24 by the engagement between the rollers 31 and 32 and the long grooves 25b and 26b, and are turned to a holding position substantially perpendicular to the X direction. . The rotation of the drive arms 29 and 30 is transmitted to the holding arms 25 and 26 through the engagement between the rollers 31 and 32 constituting the Geneva mechanism 52 and the long grooves 25b and 26b, so that the holding arms 25 and 26 are started. It is possible to turn at high speed with reduced shock at the time and stop. When the holding arms 25 and 26 are turned to the holding position, the stage 8 descends in the Z direction to the substrate P transfer height position, and temporarily stops at the height position. Then, the suction pad 41 opened on the upper surfaces of the holding arms 25 and 26 is communicated with the negative pressure device 43, and the substrate P is sucked onto the holding arms 25 and 26. When the suction onto the holding arms 25 and 26 is completed, the suction hole opened on the upper surface of the stage 8 is communicated with the atmosphere, and the substrate P is unclamped. At this time, since the substrate P is held at two positions on the lower surface by the pair of holding arms 25 and 26 adjusted to an appropriate interval, the amount of bending of the substrate P can be suppressed small. Further, since the suction pad 41 that does not face the substrate P is closed in advance by the opening / closing valve 45 and the communication with the negative pressure device 43 is closed, air from the suction pad 41 that does not face the substrate P is closed. The negative pressure does not decrease due to leakage. When the substrate P is unclamped, the stage 8 of the cleaning device 2 is lowered in the Z direction to a lowered position that does not interfere with the lower surfaces of the holding arms 25 and 26, and then waits until the substrate P is completely unloaded from the unloading position of the cleaning device 2. To do.

スライド13及びスライド13にラック17,18、ピニオン19を介して連結されたアーム支持体15,16はACF張付け装置3の搬入位置に対向する位置までリニアモータ14により移動される。ACF張付け装置3のステージ8は、下降位置までZ方向に下降された状態でX,Y方向に移動されて搬入位置に停止される。スライド13及びアーム支持体15,16が搬入位置に停止していることを確認後、ステージ8は基板P受け渡し高さ位置までZ方向に上昇し、その高さ位置に一時停止する。そしてステージ8上面に開口する吸着穴が負圧装置に連通されて基板Pがステージ8上に吸着保持され、保持アーム25,26上面に開口する吸着パッド41が大気に連通されて基板Pが保持アーム25,26から解放される。搬入位置での基板Pの受け渡し作業が終了後、ACF貼り付け装置3のステージ8は、保持アーム25、26上面に開口する吸着パッド41と基板Pの下面と干渉しない位置まで基板P受け渡し高さ位置よりZ方向に上昇する。その後ラック37,38がエアシリンダ39,40により後退され、ラック37,38、セクタ歯車33,34を介して駆動アーム29,30が逆転され、ローラ31,32と長溝25b,26bとの係合により保持アーム25,26はX方向と平行になるまで互いに反対方向に開いた退避位置に旋回される。   The arm supports 15 and 16 connected to the slide 13 and the slide 13 via racks 17 and 18 and a pinion 19 are moved by the linear motor 14 to a position facing the loading position of the ACF tensioning device 3. The stage 8 of the ACF tensioning device 3 is moved in the X and Y directions while being lowered in the Z direction to the lowered position, and is stopped at the loading position. After confirming that the slide 13 and the arm supports 15 and 16 are stopped at the carry-in position, the stage 8 moves up to the substrate P transfer height position in the Z direction and temporarily stops at the height position. Then, the suction hole opened on the upper surface of the stage 8 is communicated with the negative pressure device so that the substrate P is sucked and held on the stage 8, and the suction pad 41 opened on the upper surfaces of the holding arms 25 and 26 is communicated with the atmosphere to hold the substrate P. It is released from the arms 25 and 26. After the transfer operation of the substrate P at the carry-in position is completed, the stage 8 of the ACF adhering apparatus 3 has the substrate P transfer height to a position where it does not interfere with the suction pads 41 opened on the upper surfaces of the holding arms 25 and 26 and the lower surface of the substrate P. It rises in the Z direction from the position. Thereafter, the racks 37 and 38 are retracted by the air cylinders 39 and 40, the drive arms 29 and 30 are reversely rotated via the racks 37 and 38 and the sector gears 33 and 34, and the rollers 31 and 32 are engaged with the long grooves 25b and 26b. As a result, the holding arms 25 and 26 are turned to the retracted positions opened in opposite directions until they become parallel to the X direction.

保持アーム25,26が退避位置に旋回されると、ACF張付け装置3のステージ8は作動位置に移動され、スライド13及びスライド13にラック17,18、ピニオン19を介して連結されたアーム支持体15,16はクリーニング装置2の搬出位置に対向する位置までリニアモータ14により移動され、クリーニング装置2の作動が終了するまで待機する。このとき、一対の保持アーム25,26は、X方向と平行になるまで互いに反対方向に開いた退避位置に旋回されているので、クリーニング装置2のステージ8と干渉することがない。これにより、クリーニング装置2などのステージ8のY方向のストロークを保持アーム25,26との干渉を避けるために長くする必要がなくなり、各装置2乃至5を小型化することができる。   When the holding arms 25 and 26 are turned to the retracted position, the stage 8 of the ACF tensioning device 3 is moved to the operating position, and the arm support body connected to the slide 13 and the slide 13 via the racks 17 and 18 and the pinion 19. 15 and 16 are moved by the linear motor 14 to a position facing the carry-out position of the cleaning device 2 and wait until the operation of the cleaning device 2 is completed. At this time, the pair of holding arms 25 and 26 are pivoted to the retreat positions opened in opposite directions until they become parallel to the X direction, and thus do not interfere with the stage 8 of the cleaning device 2. Accordingly, it is not necessary to lengthen the stroke in the Y direction of the stage 8 such as the cleaning device 2 in order to avoid interference with the holding arms 25 and 26, and each device 2 to 5 can be miniaturized.

搬送する基板Pの大きさが変わった場合、クランプ装置20を弛めてラック17,18のピニオン19に向かう締付けを解除し、アーム支持体15,16の一方を移動させて一対の保持アーム25,26の間隔を基板Pの長さに合わせて撓み量が小さくなるように適切に調整する。このとき、アーム支持体15,16はラック17,18のピニオン19により連動されて搬送方向に互いに反対向きに等距離だけ移動され、一対の保持アーム25,26間の中心位置が変動しないので、基板Pの大きさが変わったとき、各装置2乃至5の搬入位置、搬出位置を変更する必要がなく、段取り替えが容易である。保持アーム25,26の間隔調整が終了すると、クランプ装置20を締結してラック17,18をピニオン19に向かって締め付け、アーム支持体15,16の相対移動を規制する。   When the size of the substrate P to be transferred changes, the clamping device 20 is loosened to release the tightening of the racks 17 and 18 toward the pinion 19, and one of the arm supports 15 and 16 is moved to move the pair of holding arms 25. , 26 is adjusted appropriately so as to reduce the amount of bending according to the length of the substrate P. At this time, the arm supports 15 and 16 are interlocked by the pinions 19 of the racks 17 and 18 and moved in the transport direction by an equal distance in opposite directions, and the center position between the pair of holding arms 25 and 26 does not change. When the size of the substrate P is changed, it is not necessary to change the loading position and the unloading position of each of the devices 2 to 5, and the setup change is easy. When the adjustment of the distance between the holding arms 25 and 26 is completed, the clamp device 20 is fastened, the racks 17 and 18 are tightened toward the pinion 19, and the relative movement of the arm supports 15 and 16 is restricted.

上記実施形態では、アーム支持体接離装置50において、スライド13に支承されたピニオン19とアーム支持体15,16に固定されたラック17,18とを噛合させてスライド13とアーム支持体15,16とを連結しているが、スライド13とアーム支持体15,16とをリンク機構により連結してアーム支持体15,16を搬送方向に互いに反対向きに等距離だけ連動して移動させるようにしてもよい。   In the above embodiment, in the arm support body separating / separating device 50, the pinion 19 supported on the slide 13 and the racks 17 and 18 fixed to the arm support bodies 15 and 16 are engaged with each other to engage the slide 13 and the arm support body 15, 16, but the slide 13 and the arm supports 15, 16 are connected by a link mechanism so that the arm supports 15, 16 are moved in conjunction with each other in the opposite direction in the transport direction by an equal distance. May be.

また、上記実施形態では、各保持アームを各アーム支持体に垂直線回りに旋回可能に支承しているが、各保持アームをX方向に延在する水平軸線回りに旋回可能に各アーム支持体に支承し、一対の保持アームを、各保持アームが搬送方向と略直角で水平方向に突出する保持位置と、各保持アームがY方向と平行になるまで下方向に旋回した退避位置との間で、旋回させるようにしてもよい。   In the above embodiment, each holding arm is supported on each arm support so as to be pivotable about a vertical line. However, each arm support is pivotable about a horizontal axis extending in the X direction. And a pair of holding arms between a holding position where each holding arm protrudes in a horizontal direction substantially perpendicular to the transport direction and a retreat position where each holding arm pivots downward until it is parallel to the Y direction. Then, it may be made to turn.

上記実施形態では、液晶パネルを搬送する場合について説明したが、エレクトロルミネッセンスパネル、プラズマディスプレイパネル等の搬送にも使用することができる。   Although the case where the liquid crystal panel is transported has been described in the above embodiment, the present invention can also be used for transporting an electroluminescence panel, a plasma display panel, and the like.

本実施形態に係る基板搬送装置を装備された液晶表示装置の生産ラインを示す図。The figure which shows the production line of the liquid crystal display device equipped with the board | substrate conveyance apparatus which concerns on this embodiment. 基板搬送装置の要部を上方から見た平面図。The top view which looked at the principal part of the board | substrate conveyance apparatus from upper direction. 図2のA−A線に沿って見た図。The figure seen along the AA line of FIG. 図3のB−B線に沿って見た図。The figure seen along the BB line of FIG. 保持アームの吸着パッド部分を切断した拡大断面図。The expanded sectional view which cut | disconnected the suction pad part of the holding arm.

符号の説明Explanation of symbols

1…液晶表示装置の生産ライン 、2…端子クリーニング装置、3…ACF張付け措置、4…搭載装置、5…圧着装置、6…基板搬送装置、7…基台、8…ステージ、10…ベース、11…支持スタンド、12…ガイドレール、13…スライド、14…リニアモータ、15,16…アーム支持体、17,18…ラック、19…ピニオン、20…クランプ装置、21…スケール、22…ポインタ、23,24…旋回中心軸、25,26…保持アーム、25a,26a…従動腕部、25b,26b…長溝、27,28…支持軸、29,30…駆動アーム、31,32…ローラ、33,34…セクタ歯車、35,36…可動体、37,38…ラック、39,40…エアシリンダ、41…吸着パッド、42…共通通路、43…負圧装置、44…分岐路、45…開閉弁、46…弁体、46a…操作部、46b…弁穴、50…アーム支持体接離装置、51…搬送移動装置、52…ゼネバ機構、53…回動駆動装置、54…旋回装置。
DESCRIPTION OF SYMBOLS 1 ... Production line of liquid crystal display device, 2 ... Terminal cleaning device, 3 ... ACF sticking measure, 4 ... Mounting device, 5 ... Crimping device, 6 ... Substrate conveyance device, 7 ... Base, 8 ... Stage, 10 ... Base, DESCRIPTION OF SYMBOLS 11 ... Support stand, 12 ... Guide rail, 13 ... Slide, 14 ... Linear motor, 15, 16 ... Arm support, 17, 18 ... Rack, 19 ... Pinion, 20 ... Clamping device, 21 ... Scale, 22 ... Pointer, 23, 24 ... turning center axis, 25, 26 ... holding arm, 25a, 26a ... driven arm, 25b, 26b ... long groove, 27, 28 ... support shaft, 29, 30 ... drive arm, 31, 32 ... roller, 33 34, sector gear, 35, 36, movable body, 37, 38 ... rack, 39, 40 ... air cylinder, 41 ... suction pad, 42 ... common passage, 43 ... negative pressure device, 44 ... branch passage, 45 ... Opening / closing valve, 46 ... Valve body, 46a ... Operation part, 46b ... Valve hole, 50 ... Arm support body separating / separating device, 51 ... Transfer and movement device, 52 ... Geneva mechanism, 53 ... Turning drive device, 54 ... Turning apparatus.

Claims (4)

基板の下面を一対の保持アームで保持し、基板を水平状態で搬送する搬送装置において、
前記一対の保持アームが夫々旋回可能に支承されベースに搬送方向に移動可能に装架された一対のアーム支持体と、
前記一対の保持アームを、各保持アームが前記搬送方向と略直角な水平方向に突出して前記基板を保持する保持位置と、前記保持位置から略90度旋回する退避位置との間で旋回させる旋回装置と、
各アーム支持体を前記搬送方向に互いに反対向きに等距離だけ連動して移動させるアーム支持体接離装置と、
一対のアーム支持体を前記搬送方向に一体的に移動させる搬送移動装置と、
を備えたことを特徴とする基板搬送装置。
In the transfer device that holds the lower surface of the substrate with a pair of holding arms and transfers the substrate in a horizontal state,
A pair of arm supports, each of which is rotatably supported by the pair of holding arms, and is movably mounted on the base in the transport direction;
Swing that turns the pair of holding arms between a holding position where each holding arm protrudes in a horizontal direction substantially perpendicular to the transport direction to hold the substrate and a retreat position that turns about 90 degrees from the holding position. Equipment,
An arm support contact / separation device for moving each arm support in an interlocking manner in the opposite direction to each other in the transport direction;
A transport moving device that integrally moves a pair of arm supports in the transport direction;
A substrate transfer device comprising:
請求項1において、
前記搬送方向に延在するガイドを前記ベース上に設け、
前記一対のアーム支持体を該ガイドに摺動可能に装架し、
スライドを前記一対のアーム支持体の間で前記ガイドに摺動可能に装架し、
前記アーム支持体接離装置により前記スライドと各アーム支持体とを連結し、
前記搬送移動装置は、前記スライドを搬送方向に移動させることにより前記一対のアーム支持体を前記アーム支持体接離装置を介して搬送方向に移動させることを特徴とする基板搬送装置。
In claim 1,
A guide extending in the transport direction is provided on the base;
The pair of arm supports are slidably mounted on the guide,
A slide is slidably mounted on the guide between the pair of arm supports,
Connecting the slide and each arm support by the arm support contacting / separating device;
The substrate transfer apparatus, wherein the transfer moving device moves the pair of arm supports in the transfer direction via the arm support contacting / separating device by moving the slide in the transfer direction.
請求項1又は2において、
前記旋回装置は、各保持アームを各アーム支持体に水平面内で垂直軸線回りに旋回可能に支承し、
各保持アームを、各保持アームが搬送方向と略直角で水平方向に突出して基板を保持する保持位置と、各保持アームが搬送方向と平行になるまで互いに反対方向に開いた退避位置との間で、ゼネバ機構を介して旋回させる回動駆動装置を備えたことを特徴とする基板搬送装置。
In claim 1 or 2,
The swivel device supports each holding arm on each arm support so that it can swivel around a vertical axis in a horizontal plane,
Each holding arm is located between a holding position where each holding arm protrudes in a horizontal direction substantially perpendicular to the transport direction and holds the substrate, and a retracted position opened in opposite directions until each holding arm is parallel to the transport direction. A substrate transport apparatus comprising a rotation drive device for turning through a Geneva mechanism.
請求項1乃至3のいずれか1項において、
前記各保持アームの上面に負圧装置に接続されて基板を吸着する吸着部材を複数個開口し、
各吸着部材を基板の大きさに応じて開閉する開閉弁を設けたことを特徴とする基板搬送装置。

In any one of Claims 1 thru | or 3,
A plurality of suction members that are connected to a negative pressure device and suck the substrate are opened on the upper surface of each holding arm,
A substrate transfer apparatus comprising an opening / closing valve that opens and closes each adsorbing member according to the size of the substrate.

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JP2007099466A (en) * 2005-10-06 2007-04-19 Hitachi High-Technologies Corp Panel processing device and processing method
WO2010052773A1 (en) * 2008-11-06 2010-05-14 株式会社島津製作所 Palletized conveyance mechanism and substrate inspection apparatus
CN110193479A (en) * 2019-06-27 2019-09-03 东莞弓叶互联科技有限公司 Garbage sorting clamp device and automatic garbage sorting equipment
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CN101339316B (en) * 2007-07-02 2010-07-28 显示器生产服务株式会社 Substrate conveyer device
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JP2007099466A (en) * 2005-10-06 2007-04-19 Hitachi High-Technologies Corp Panel processing device and processing method
WO2010052773A1 (en) * 2008-11-06 2010-05-14 株式会社島津製作所 Palletized conveyance mechanism and substrate inspection apparatus
CN111483809A (en) * 2019-01-28 2020-08-04 三星显示有限公司 Substrate turnover device
CN111483809B (en) * 2019-01-28 2023-08-18 三星显示有限公司 Substrate turnover device
CN110193479A (en) * 2019-06-27 2019-09-03 东莞弓叶互联科技有限公司 Garbage sorting clamp device and automatic garbage sorting equipment
CN110193479B (en) * 2019-06-27 2023-10-10 广东弓叶科技有限公司 Garbage sorting clamping device and garbage automatic sorting equipment

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