JP2005207963A - Fluid supply monitoring device and substrate processing apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a fluid supply monitoring device capable of monitoring fluid supply conditions concerning a plurality of pipes, and dealing easily with a change in the number of pipes to be monitored, by a simple and low-cost composition. <P>SOLUTION: This fluid supply supervising device 21 is provided in a substrate processing apparatus 1, and includes area type flow meters 23a-23d interposed into the middle of pipes 9a-9d for supplying fluids being supervising objects; an imaging camera 25 for imaging pictures of the flow meters 23a-23d; and a monitoring portion 27 for monitoring the supply conditions of the fluids on the basis of the imaged pictures by the imaging camera 25. By the monitoring portion 27, a picture imaged by the imaging camera 25 at each monitor timing set beforehand and a memorized picture registered beforehand and corresponding to that point of time are compared, whether or not the height position of a float picture of each flow meter 23a-23d in the imaged picture is within a predetermined permissible range, with respect to a reference position of the float picture in the corresponding memorized picture is determined, and it is determined whether or not there are any abnormalities in the supply conditions (flow rate, etc.) of each fluid. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to a fluid supply monitoring apparatus that monitors a fluid supply status and a substrate processing apparatus using the fluid supply monitoring apparatus.

  In the substrate processing apparatus, fluid supply detection means for detecting the supply status of fluid (for example, flow rate or pressure) is provided in a pipe for supplying various processing liquids, and the pipe is used based on the detection result of the fluid supply detection means. Some monitor the fluid supply status. As a specific example, an area-type flow meter that detects the flow rate of the fluid in the pipe is used as the fluid supply detection means, the float position of the flow meter is detected by a line sensor, and the flow rate is monitored based on the detection result. There is a thing (for example, patent document 1).

JP-A-10-332447

  However, in the technique of monitoring the detection result of the fluid supply detection means using the above line sensor, when monitoring a plurality of pipes, an expensive line sensor is provided for each fluid supply detection means provided in each pipe. It is necessary to provide it, which leads to a complicated device configuration and high cost.

  Further, it is necessary to perform a hardware configuration such as changing the number of installed line sensors in response to a change in the number of pipes and fluid supply detection means to be monitored, and it is not easy to cope with it.

  Therefore, the problem to be solved by the present invention is that it is possible to monitor the fluid supply status for a plurality of pipes with a simple and low-cost configuration, and to change the number of pipes and fluid supply detection means for monitoring. To provide a fluid supply monitoring apparatus that can easily cope with the problem and a substrate processing apparatus using the same.

  The means for solving the above-mentioned problem is connected to a pipe for fluid supply, detects the supply status of the fluid by the pipe, and at least one fluid supply detection means for expressing the detection result by the state of the display unit; An imaging unit that images the display unit of the at least one fluid supply detection unit, and a state of the display unit of the fluid supply detection unit in a captured image captured by the imaging unit, and based on the recognition result Monitoring means for monitoring the supply status of the fluid through the pipe.

  Preferably, a plurality of the fluid supply detection means are provided, and the imaging means images the display section of the plurality of fluid supply detection means.

  Preferably, the fluid supply detection means detects the flow rate of the fluid flowing in the corresponding pipe as the supply state of the fluid.

  Preferably, the monitoring unit recognizes the state of the display unit of the fluid supply detection unit based on the captured image, and compares the recognition result with a preset reference for the state of the display unit. Accordingly, it is preferable to determine whether or not there is an abnormality in the supply status of the fluid flowing through the pipe.

  Preferably, the display unit of the fluid supply detection unit includes an indicator unit whose position changes according to the flow rate of the fluid flowing through the corresponding pipe, and the monitoring unit is based on the captured image. And recognizing the position of the indicator of the fluid supply detecting means, and comparing the recognized position with a preset reference position to determine whether there is an abnormality in the supply state of the fluid flowing through the pipe. It is good to do.

  Preferably, the monitoring means further outputs a signal indicating the occurrence of an abnormality when detecting an abnormality in the supply state of the fluid through the pipe.

  Preferably, the monitoring means is an imaging camera that performs imaging with a semiconductor imaging device.

  The means for solving the problem is a substrate processing apparatus having at least one pipe for supplying a fluid for substrate processing, and monitors the supply status of the fluid through the pipe. The fluid supply monitoring device according to any one of the above.

  According to the invention described in claims 1 and 8, the display unit of the fluid supply detection unit is imaged by the imaging unit, the monitoring unit recognizes the state of the display unit of the fluid supply detection unit based on the captured image, and Since the configuration is such that the supply status of the fluid through the piping is monitored based on the recognition result, even when monitoring the supply status of the fluid through the plurality of piping, the display unit of the plurality of fluid supply detection devices is imaged by one imaging device. However, it is possible to monitor based on the captured image, and it is not necessary to provide an expensive line sensor for each fluid supply detection means provided in each pipe as in the prior art, which simplifies the device configuration and reduces the cost. I can plan.

  Further, it is possible to easily cope with a change in the number of pipes to be monitored and the number of fluid supply detection means only by changing only the contents of processing performed by the monitoring means (that is, a software configuration). .

  According to the second aspect of the present invention, it is possible to monitor the supply status of the fluid by a plurality of pipes using one imaging means.

  According to invention of Claim 3, the flow volume of the fluid which flows through each piping can be monitored.

  According to the invention described in claim 4, the monitoring unit recognizes the state of the display unit of the fluid supply detection unit based on the captured image, and compares the recognition result with a reference set in advance for the state of the display unit. Thus, since it is determined whether there is an abnormality in the supply status of the fluid flowing in the pipe, it is possible to easily determine whether there is an abnormality in the supply status of the fluid based on the captured image.

  According to the fifth aspect of the present invention, the monitoring unit recognizes the state of the indicator portion of the fluid supply detection unit based on the captured image, and compares the recognized position with a preset reference position. Since it is determined whether there is an abnormality in the supply status of the fluid flowing through the pipe, it is possible to easily determine whether there is an abnormality in the supply status of the fluid based on the captured image.

  According to the invention described in claim 6, when an abnormality in the supply status of the fluid by the pipe is detected, a signal indicating the occurrence of the abnormality is output, so that an alarm is issued based on the signal, The operation of the equipment related to the piping can be stopped.

  According to the seventh aspect of the present invention, since the image pickup means is an image pickup camera that picks up an image with the semiconductor image pickup device, the image pickup means can be configured in a small size.

  FIG. 1 is a diagram schematically showing a configuration of a substrate processing apparatus in which a fluid supply monitoring apparatus according to an embodiment of the present invention is used. In addition, the edge part to which the below-mentioned piping 9a-9d in FIG. 1 was attached | subjected * 1- * 4 is connected with the edge part to which the same mark * 1- * 4 was attached | subjected.

As shown in FIG. 1, the substrate processing apparatus 1 performs at least development processing (for example, a developer) on a substrate W, and supplies a predetermined fluid into a chamber 3 that accommodates the substrate W. The developer supply unit 5a, the pure water supply unit 5b, the back rinse solution supply unit 5c, and the N ₂ gas supply unit 5d are provided. Examples of the substrate W include a semiconductor substrate, a glass substrate for a liquid crystal display, a glass substrate for a photomask, and an optical disc.

In the chamber 3, there are provided nozzle portions 7a to 7d for discharging developer, pure water, back rinse liquid (pure water) and N ₂ gas supplied from these supply portions 5a to 5d. Various fluids supplied from the supply parts 5a to 5d are given to the nozzle parts 7a to 7d via the pipes 9a to 9d. Each of the supply units 5a to 5b includes a tank and a pump as necessary in addition to a solenoid valve (not shown), and controls the supply state of the fluid under the control of the control unit 11. Here, the pure water supplied by the pure water supply unit 5b is for cleaning the upper surface of the substrate W, and the back rinse liquid (pure water) supplied by the back rinse liquid supply unit 5b is for cleaning the lower surface of the substrate W. Is to do. Further, N ₂ gas supplied is N ₂ gas supply unit 5d is for purging the inside of the chamber 3.

  The control unit 11 performs overall control of the substrate processing apparatus 1 and also controls the supply status of various fluids (for example, on / off and flow rate control) by the supply units 5a to 5d. Yes.

  In addition, a rotation holding unit 13 such as a spin chuck that holds and rotates the loaded substrate W is provided in the chamber 3, so that the cleaning process and the drying process (shaking drying) after the development process are provided. The substrate W is rotationally driven. A cup 15 is provided in the chamber 3 so as to surround the substrate 3 in order to prevent the processing liquid from scattering. Further, the chamber 3 is provided with a discharge portion 17 for draining and exhausting.

As an operation of the substrate processing apparatus 1, when the substrate W is carried into the chamber 3, the developing solution is supplied onto the substrate W by the developing solution supply unit 5a via the nozzle unit 7a to perform the developing process. When the development processing is completed, the substrate W is rotated by the rotation holding unit 13, and the pure water supply unit 5b and the back rinse liquid supply unit 5c are directed toward the upper surface side and the lower surface side of the substrate W through the nozzle portions 7b and 7c. Pure water for cleaning and a back rinse solution are supplied, whereby the developer and the dissolved resist component are removed (cleaning process). Subsequently, the supply of pure water and the back rinse liquid is stopped while the substrate W is rotated, and moisture remaining on the substrate W is removed by utilizing the centrifugal force due to the rotation (shake-off drying). Then, the substrate W after being shaken and dried is carried out of the chamber 3. Here, N ₂ gas supply unit 5d supplies at least over the end of the cleaning from the start of developing the N ₂ gas for purging through the nozzle portion 7d chamber 1.

  Such a substrate processing apparatus 1 incorporates a fluid supply monitoring device 21 that monitors the supply status of various fluids. As shown in FIG. 1, the fluid supply monitoring device 21 includes flow meters (fluid supply detection means) 23 a to 23 d, an imaging camera (imaging means) 25 that images the flow meters 23 a to 23 d, and an imaging camera 25. And a monitoring unit (monitoring means) 27 for monitoring the fluid supply status based on the image. For example, the monitoring unit 27 is integrated into the control unit 11, and the control unit 11 also functions as the monitoring unit 27.

Each flow meter 23a-23d is inserted in each piping 9a-9d of the fluid which needs monitoring, respectively, and detects the flow rate (supply condition) per unit time of the fluid which flows through each piping 9a-9d. In this embodiment, flow meters 23a to 23d are inserted in all of the pipes 9a to 9d for supplying the developer, pure water, back rinse liquid and N ₂ gas, and the substrate processing apparatus as shown in FIG. 1 is arranged in one place (flow meter installation part) in 1.

  As the flow meters 23a to 23d, for example, area type flow meters are used, and corresponding pipes 9a are arranged depending on the height position of a float 33 (corresponding to a display unit and an indicator unit) disposed in the light-transmitting tapered tube 31. The flow rate of the fluid flowing through ˜9d is represented. That is, in the flowmeters 23a to 23d, the float 33 receives the upward force corresponding to the flow rate from the fluid flowing upward in the tapered tube 31, and rises in the tube 31, but the tapered tube 31 faces upward. Therefore, the more the float 33 is located above the tapered tube 31, the larger the gap area between the float 33 and the inner periphery of the tapered tube 31, and the upward force that the float 33 receives from the fluid is increased. Get smaller. Further, since a downward force due to gravity also acts on the float 33, the height position of the float 33 is determined such that the downward force due to the gravity and the upward force received from the fluid are balanced. Therefore, the float 33 moves in the tapered tube 31 upward from the lower limit position as the flow rate per unit time of the fluid flowing in the tapered tube 31 increases. 2 and 3, reference numeral 35 denotes a flow rate adjusting valve.

  The imaging camera 25 is configured to include a semiconductor imaging device such as a CCD that performs imaging, and as shown in FIG. 3, once the part provided with the floats 33 of the four flow meters 23 a to 23 d in the substrate processing apparatus 1 is provided. The image is picked up by the control of the monitoring unit 27. The captured image is given to the monitoring unit 27. FIG. 4 shows an example of a captured image 41 of the imaging camera 25, and the captured image 41 includes a float image 43 of the float 33 of each of the flow meters 23a to 23d.

  The monitoring unit 27 recognizes the behavior of the float image 43 of the flow meters 23a to 23d in the captured image 41 captured by the imaging camera 25 through image processing, and supplies the fluid flowing through the pipes 9a to 9d based on the recognition result. Monitor the situation.

  More specifically, as shown in FIG. 5, a reference position L <b> 1 with respect to the height position of the float 33 of each flow meter 23 a to 23 d at each time point in the processing process is registered in the monitoring unit 27 in advance. Then, at each time point in the processing process, the monitoring unit 27 recognizes the height position L2 of the float image 43 of each flow meter 23a to 23d in the captured image 41 by image processing, and the recognized height position L2 Each pipe 9a is compared by comparing with the corresponding reference position L1 at that time point and determining whether or not the deviation dL between the recognized height position L2 and the reference position L1 is within a preset allowable range. It is determined whether there is an abnormality in the fluid supply status through .about.9d.

  For example, the registration of the reference position L1 of the float 33 of each of the flow meters 23a to 23d is performed by storing the captured image 41 during normal operation at each time point in the processing process in a storage unit (memory, hard disk, etc.) (not shown) of the monitoring unit 27. This is done by storing it as an image. In this case, at each time point in the processing step, the monitoring unit 27 performs image processing on the height position L2 of the float image 43 of each of the flow meters 23a to 23d in the captured image 41 at that time point obtained by actual imaging. The reference position L1, which is the height position of the float image 43a in the corresponding memory image at that time, is recognized, and the positions L1 and L2 are compared. Then, by determining whether or not the amount of deviation dL between the positions L1 and L2 is within a preset allowable range, it is determined whether or not there is an abnormality in the fluid supply status of each of the pipes 9a to 9d. It has come to be. This more specific operation will be described later.

  Moreover, the monitoring part 27 outputs the signal which shows abnormality generation, when the abnormality of the supply condition of the fluid by each piping 9a-9d is detected. When the monitoring unit 27 detects that an abnormality has occurred in any one of the four pipes 9a to 9d, the control unit 11 notifies a not-shown notification means (buzzer, warning light, image display). Or the like, or the operation of the part of the device 1 related to the pipes 9a to 9d where the abnormality has occurred or the operation of the entire device 1 is stopped.

  FIG. 6 is a timing chart showing supply states of various supply fluids in the substrate processing apparatus 1 of FIG. FIG. 6 shows a timing chart for supplying various fluids when the substrate processing apparatus 1 processes one substrate W.

As shown in FIG. 6, the developer is supplied in the period from time t2 to time t3, the pure water is supplied in the period from time t5 to time t6, and the back rinse liquid is supplied in the period from time t4 to time t7. The N ₂ gas is supplied in a period from time t1 to time t8. Accordingly, the monitoring unit 27 has switching timings (t1 to t8) at which the supply of each fluid of developer, pure water, back rinse liquid and N ₂ gas is turned on and off, and switching timings (t1 to t1). A captured image (memory image) of the imaging camera 25 in a normal state is registered in advance during the period t8) and within each period T1 to T9 before and after that. For example, in the memory image in the period T1, since none of the four types of fluids to be monitored is supplied, the float images 43a of all the flow meters 23a to 23d are located at the lower limit position. In the memory image in the period T2, only the N ₂ gas of the four types of fluid is supplied, so the float image 43a of the flow meter 23d corresponding to the N ₂ gas has a height position corresponding to the appropriate flow rate. The float images 43a of the flow meters 23a to 23c corresponding to other fluids are located at the lower limit position. That is, the float images 43a of the flow meters 23a to 23d in the memory images in the periods T1 to T9 are located at the lower limit position when the corresponding fluid is in the supply stop state in the periods T1 to T9. When the corresponding fluid is being supplied, it is located at a height position corresponding to the appropriate flow rate, and the height position of each float image 43a in each memory image becomes the reference position L1.

  And the monitoring part 27 is the time of every switching timing (t1-t8) when supply of each symmetric fluid of monitoring is turned on and off (that is, every time supply of each fluid is switched on or off). By comparing the captured image 41 of the imaging camera 25 and the memory images in the periods T1 to T9 corresponding to the time point, whether or not there is an abnormality in the supply status of each fluid is monitored. The monitoring of each fluid by the monitoring unit 27 is not limited to each switching timing at which the supply of each fluid to be monitored is turned on and off, but before the processing operation of the substrate processing apparatus 1 is disclosed (or the monitoring target is monitored). It may be performed at a plurality of timings (before the start of supply of all fluids) (within the period T1) or within the periods T1 to T9.

As a specific example of the determination of the presence or absence of abnormality, for example, any fluid is erroneously supplied during the period T1 during which any fluid to be monitored should not be supplied, and any of the flow meters 23a to 23d When the height position L2 of the float image 43 has moved upward beyond the allowable range from the corresponding reference position L1 (lower limit position) at that time, the supply status of the fluid that has been erroneously supplied is abnormal. On the other hand, if any fluid is not supplied and the float images 43 of the flow meters 23a to 23d are located at the lower limit position, it is determined that the supply status of each fluid is normal. Further, corresponding in the period 2 to the supply of the N ₂ gas is performed, N is successful _second supply of gas at a proper flow rate, the height position L2 of the float image 43 of the flow meter 23d is at that time If the reference position L1 is within a predetermined allowable range with respect to the reference position L1, the N ₂ gas supply state is determined to be normal, while the N ₂ gas supply is normally performed at an appropriate flow rate within the period T2. It is not performed (for example, supply is not performed at all, flow rate is excessive or low), and the height position L2 of the float image 43 of the flow meter 23d exceeds the allowable range from the corresponding reference position L1 at that time. If it is out of the upper or lower direction, it is determined that the N ₂ gas supply status is abnormal.

  FIG. 7 is a flowchart showing the monitoring operation by the monitoring unit 27. When this substrate processing apparatus 1 is activated, the process proceeds to step S1, where it is determined whether or not a preset monitoring timing has been reached for the fluid supply status, and if the monitoring timing has not arrived, the process waits until it arrives. If the monitoring timing has come, the process proceeds to step S2.

  In step S2, the captured image 41 of the imaging camera 25 is captured. Note that the imaging camera 25 may perform imaging whenever the substrate processing apparatus 1 is activated, or may perform imaging only when the monitoring timing comes.

  In the subsequent step S3, the captured image 41 of the imaging camera 25 at that time is compared with the memory images in the periods T1 to T9 corresponding to that time. Specifically, as described above, the height position L2 of the float image 43 of each of the flow meters 23a to 23d in the captured image 41 is recognized by image processing, and the height of the float image 43a in the corresponding memory image is recognized. The reference position L1, which is a position, is recognized, the two positions L1 and L2 are compared, and a deviation dL between the two positions L1 and L2 is derived.

  In subsequent step S4, it is determined whether or not the shift amount dL of the float image 43 of each of the flow meters 23a to 23d derived in step S3 is within a preset allowable range, so that the fluid by the pipes 9a to 9d is determined. It is determined whether there is an abnormality in the supply status. When the deviation dL of the float image 43 of any of the flow meters 23a to 23d is within the allowable range, it is determined that there is no abnormality in any fluid supply status, and the monitoring operation at the monitoring timing is completed. Is done. On the other hand, if the deviation dL of the float image 43 of any of the flow meters 23a to 23d derived in step S3 is outside the allowable range, it is determined that there is an abnormality in the fluid supply status, and the process proceeds to step S5.

  In step S5, a signal indicating that an abnormality has occurred in the fluid supply status of each of the pipes 9a to 9d is output by the monitoring unit 27, and an abnormality handling process is performed by the control unit 11 based on the signal. As the abnormality handling process, for example, as described above, the control unit 11 issues a warning via notifying means (buzzer, warning light, image display unit, etc.) not shown, or the pipes 9a to 9d in which an abnormality has occurred. The operation of the portion of the device 1 related to the above or the operation of the entire device 1 is stopped.

  Then, while the substrate processing apparatus 1 is being activated, the monitoring unit 27 monitors the supply status of each fluid by repeating the processes in steps S1 to S5 described above.

  As described above, according to the present embodiment, the part of the four flow meters 23 a to 23 d provided with the float 33 is imaged by the imaging camera 25, and the monitoring unit 27 is based on the captured image 41. Since the configuration is such that the behavior of the float 33 of 23d is recognized and the supply status of the fluid through the four pipes 9a to 9d is monitored based on the recognition result, one imaging of the supply status of the fluid through the four pipes 9a to 9d is taken. It is possible to monitor based on the captured image 41 by the camera 25, and there is no need to provide an expensive line sensor for each of the flow meters 23 a to 23 d provided in the pipes 9 a to 9 d as in the prior art, and the configuration of the substrate processing apparatus 1. Simplification and cost reduction.

  In addition, it is easy to change only the contents of processing performed by the monitoring unit 27 (that is, the software configuration) in response to the change in the number of the pipes 9a to 9d and the flow meters 23a to 23d to be monitored. Can respond.

  In addition, the monitoring unit 27 compares the captured image 41 of the imaging camera 25 at each preset monitoring timing in the processing step with the memory image in the periods T1 to T9 corresponding to the timing, and the captured image 41 It is determined whether or not the height position L2 of the float image 43 of each of the flow meters 23a to 23d is within a predetermined allowable range with respect to the reference position L1 of the float image 43a in the corresponding memory image. Therefore, it is possible to easily determine whether there is an abnormality in the fluid supply status based on the captured image 41.

  In addition, when an abnormality is detected in the fluid supply status of each of the pipes 9a to 9d, a signal indicating the occurrence of the abnormality is output from the monitoring unit 27. Therefore, an alarm is issued based on the signal, It is possible to stop the operation of the device 1 related to the above.

  In addition, since the imaging camera 25 is configured to perform imaging with the semiconductor imaging device, the imaging camera 25 can be configured in a small size.

In the present embodiment, the supply status (flow rate, etc.) of the four types of fluids of the developer, pure water, back rinse liquid, and N ₂ gas flowing through the four pipes 9a to 9d provided in the substrate processing apparatus 1 is monitored. However, the number of pipes 9a to 9d to be monitored is not limited to four, and may be one, two, three, or five or more, for example.

Further, the type of fluid to be monitored is not limited to the developer, pure water, back rinse liquid, and N ₂ gas, but the supply status of other types of fluid may be monitored.

  For example, when the fluid supply monitoring apparatus 21 according to the present embodiment is applied to a substrate processing apparatus (for example, a coater) that applies a resist to the substrate W, the fluid supply monitoring apparatus 21 cleans the lower surface of the substrate W. The supply status of the back rinse liquid and the edge cleaning liquid for cleaning the edge portion of the substrate W is monitored. In this case, as shown in FIG. 8, during the processing step for one substrate W, the back rinse liquid is supplied into the chamber in the period from time t11 to time 14, and the edge cleaning liquid is supplied to the chamber in the period from time 12 to time t13. Supplied in. Along with this, the monitoring unit 27 is switched between the switching timings (t11 to t14) when the supply of each of the back rinse liquid and the edge cleaning liquid is turned on and off, and between the switching timings (t11 to t14) and before and after the switching timings (t11 to t14). A captured image (memory image) of the imaging camera 25 in a normal state within each period T11 to T15 is registered in advance. Then, the monitoring unit 27 monitors the fluid supply based on the registered contents and the captured image 41 in which the flowmeter of each fluid to be monitored is captured.

Further, when the fluid supply monitoring device 21 according to the present embodiment is applied to a substrate processing apparatus (for example, a scrub cleaning device) that performs scrub cleaning on the substrate W, the fluid supply monitoring device 21 causes the upper surface of the substrate W to be removed. The supply status of pure water to be cleaned, back rinse liquid for cleaning the lower surface of the substrate W, soft spray liquid for cleaning the surface of the substrate W, and N ₂ gas for purging in the chamber is monitored. In this case, as shown in FIG. 9, during the processing step for one substrate W, pure water is supplied into the chamber during the period from time t22 to time t26, and the back rinse liquid is supplied to the chamber during the period from time t22 to time t25. The soft spray liquid is supplied into the chamber during a period from time t23 to time t24, and N ₂ gas is supplied into the chamber at least during a period from time t21 to time t27. Along with this, the monitoring unit 27 has switching timings (t21 to t27) at which the supply of pure water, back rinse liquid, soft spray liquid, and N ₂ gas is turned on and off, and switching timings (t21). To t27) and the captured images (memory images) of the imaging camera 25 in a normal state in the periods T21 to T28 before and after that. Then, the monitoring unit 27 monitors the fluid supply based on the registered contents and the captured image 41 in which the flowmeter of each fluid to be monitored is captured.

  In this embodiment, the flow rate of each fluid to be monitored and the appropriateness of supply / non-supply are monitored. The pressure of the fluid supplied to each of the pipes 9a to 9d is measured by a pressure gauge (fluid supply detection means). May be detected, and the display unit of the pressure gauge may be imaged by the imaging camera 25 to monitor the appropriateness of the pressure.

  Further, in the present embodiment, the flow meters 23a to 23d are imaged by the fixed imaging camera 25 in which the imaging direction is fixed. However, the oscillation can be changed by the oscillation drive by a predetermined electric drive unit. You may make it image each flow meter 23a-23d with an imaging camera of a formula.

It is a figure which shows roughly the structure of the substrate processing apparatus with which the fluid supply monitoring apparatus which concerns on one Embodiment of this invention was used. It is a front view of a flow meter installation part. It is a side view of a flow meter installation part and an imaging camera. It is a figure which shows the picked-up image of an imaging camera. It is a principal part enlarged view of the captured image of FIG. It is a timing chart which shows the supply condition of the various supply fluids in the substrate processing apparatus of FIG. It is a flowchart which shows the monitoring operation | movement by a monitoring part. It is a timing chart which shows the supply condition of the various supply fluids in another substrate processing apparatus. It is a timing chart which shows the supply situation of various supply fluids in still another substrate processing apparatus.

Explanation of symbols

1 the substrate processing apparatus 3 chambers 5a developer supply unit 5b deionized water supply unit 5c back rinse liquid supply portion 5d N ₂ gas supply unit 9a~9d pipe 11 control unit 21 fluid supply monitor 23a~23d flowmeter 25 imaging camera 27 monitors Part 31 Tapered tube 33 Float 41 Captured image 43, 43a Float image W substrate

Claims (8)

At least one fluid supply detection means connected to the fluid supply piping, detecting the fluid supply status by the piping, and expressing the detection result by the state of the display unit;
Imaging means for imaging the display section of the at least one fluid supply detection means;
Monitoring means for recognizing the state of the display unit of the fluid supply detection means in the captured image captured by the imaging means, and monitoring the supply status of the fluid by the piping based on the recognition result;
A fluid supply monitoring device comprising: The fluid supply monitoring device according to claim 1,
A plurality of the fluid supply detection means are provided,
The fluid supply monitoring apparatus, wherein the imaging means images the display section of the plurality of fluid supply detection means. The fluid supply monitoring device according to claim 1,
The fluid supply detection unit detects a flow rate of the fluid flowing through the corresponding pipe as a supply state of the fluid. In the fluid supply monitoring device according to any one of claims 1 to 3,
The monitoring means includes
Based on the captured image, the state of the display unit of the fluid supply detection unit is recognized, and by comparing the recognition result with a reference set in advance for the state of the display unit, the fluid flowing through the pipe A fluid supply monitoring apparatus characterized by determining whether there is an abnormality in a supply status. In the fluid supply monitoring apparatus according to claim 3,
The display unit of the fluid supply detection means includes an indicator unit whose position changes according to the flow rate of the fluid flowing in the corresponding pipe.
The monitoring means includes
Based on the captured image, the position of the indicator portion of the fluid supply detection unit is recognized, and the recognized position is compared with a preset reference position, whereby the supply status of the fluid flowing through the pipe is determined. A fluid supply monitoring apparatus characterized by determining the presence or absence of an abnormality. In the fluid supply monitoring device according to any one of claims 1 to 5,
The monitoring means further includes
A fluid supply monitoring apparatus that outputs a signal indicating the occurrence of an abnormality when an abnormality in a supply state of the fluid by the pipe is detected. In the fluid supply monitoring device according to any one of claims 1 to 6,
The fluid supply monitoring apparatus according to claim 1, wherein the monitoring unit is an imaging camera that performs imaging with a semiconductor imaging device. A substrate processing apparatus having at least one pipe for supplying a fluid for substrate processing,
A substrate processing apparatus comprising the fluid supply monitoring apparatus according to claim 1, wherein the supply condition of the fluid by the pipe is monitored.

Images