JP3060136B2 - Semiconductor manufacturing equipment - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0010]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor manufacturing apparatus which uses a predetermined amount of a processing liquid every time a predetermined processing is performed. The present invention relates to a device for monitoring a storage amount and a collection status.

[0020]

2. Description of the Related Art An example of this type of processing apparatus is an apparatus for applying a resist on a semiconductor wafer in a semiconductor manufacturing process. In general, in an apparatus for applying a resist on a semiconductor wafer, a predetermined amount of a resist solution is supplied from a resist nozzle above the wafer while the wafer is rotated while the wafer is mounted and fixed on a spin head arranged inside a processing chamber. The resist solution is dropped on the surface, and the resist solution is diffused by centrifugal force to apply the resist solution to a uniform thickness.

In such a resist coating apparatus, the resist liquid before use is stored in a processing liquid supply container such as a bottle or a tank, and every time the coating processing for one wafer is performed, a substantially constant amount of the resist liquid is removed from this container. The resist solution is supplied to a coating processing unit in the processing chamber by a resist solution sending mechanism. Then, the resist solution scattered from the wafer end in this coating process is guided to the bottom after hitting the inner wall of the processing chamber, and is sent from a drain port to a drain or a drain recovery container such as a bottle via a drain pipe. Has become. In addition, as a post-processing of the coating process, a process of cleaning the back surface of the wafer is usually performed, and the cleaning liquid used in the cleaning process is also supplied from the drain port at the bottom of the processing chamber to the drain recovery container via a drain pipe. It is to be collected.

[0040]

When the resist solution in the processing solution supply container is almost exhausted, it is necessary to replace it with a container filled with the resist solution. In the conventional apparatus, the weight of the processing liquid supply container is measured by a weight sensor in order to notify an operator of the time of the container replacement, and an alarm is issued when the weight decreases to a reference value.
On the other hand, when the drainage in the drainage collection container is full of the container, it is necessary to replace it with an empty container.
In order to inform the operator of the timing of the replacement of the container, the weight of the drainage collection container is also measured by a weight sensor, and an alarm is issued when the weight increases to a reference value.

However, when the amount of the resist solution in the processing solution supply container is reduced, the weight of the container is reduced. There is a possibility that the weight of the container is not accurately transmitted to the sensor, and a malfunction such as no alarm is generated even when the container is empty. Teflon pipes with excellent chemical resistance are used for this type of pipes.However, Teflon pipes are hard and have high resistance to bending. Sometimes leaning or rising.

In general, the drainage collecting container is provided below the processing container, and an operator opens the drawer to replace the container. However, if the container is not properly placed at the time of replacement, a new (empty) container may not be correctly placed on the weight sensor. Then, the weight of the container is not accurately transmitted to the weight sensor, and even if the waste liquid collected from the processing unit is filled up to the full container, an alarm is not sounded and the waste liquid may overflow from the container. Since this type of wastewater is an organic solvent, if it spills out of the container, a fire may occur,
It was extremely dangerous.

The present invention has been made in view of the above problems, and more accurately monitors the remaining amount or supply state in a processing liquid supply container, or monitors the remaining amount or collection state in a waste liquid collection container. It is an object of the present invention to provide a semiconductor manufacturing apparatus with improved reliability by more accurately monitoring the semiconductor device .

[0080]

To achieve the above object, according to the Invention The first semiconductor manufacturing apparatus of the present invention, a semiconductor manufacturing a predetermined amount of the processing solution in each processing operation a container containing a treatment liquid
Semiconductor manufacturing equipment to be supplied to the processing unit for the process
In location, the treatment liquid remaining amount measuring means for measuring a remaining amount of the processing liquid, the processing liquid supply quantity determination for setting the supply amount of the processing solution in the processing operation in the container is weighed on the weight of said container Means, processing control means for generating a predetermined signal each time the processing liquid is supplied in the processing operation, and setting of the processing liquid supply amount each time the processing liquid is supplied from the processing control means a treatment liquid remaining capacity estimating means for estimating the remaining amount of the treatment liquid in the container based on the value, the processing liquid remaining
The measured value of the remaining amount of the processing liquid obtained by the amount measuring means and the processing liquid
Relative difference from estimated value of remaining amount of processing liquid obtained by remaining amount estimating means
Generates a first signal for an alarm when is expanded to a predetermined value
And a first monitoring means .

In the above configuration, the processing liquid remaining amount measuring means
Processing obtained from the weight of the container containing the processing liquid from the column
The processing operation is performed while the remaining liquid measurement value is given.
The number of executions of the processing operation or
Is based on the number of processing solution supplies or the amount of processing solution supply.
The remaining amount of the processing liquid in the existing processing liquid supply container is estimated.
You. The first monitoring means comprises a processing solution remaining amount measurement value and a processing solution remaining amount.
Compared with the estimated value, the relative difference between the two has expanded to a predetermined value
At that time, the first signal for alarm is generated,
Notify the situation.

In the above-mentioned first semiconductor manufacturing apparatus,
Or the limit value of the remaining amount of the processing solution in the container.
Means for setting the remaining amount of the processing solution, and measuring the remaining amount of the processing solution.
Means for measuring the remaining amount of the processing solution obtained by
Either one of the estimated values of the remaining amount of the processing liquid obtained by the
One for the alarm when the processing solution remaining limit value is reached.
A second monitoring means for generating a signal;
It may be. In such a configuration, the above-described abnormality monitoring
In addition to the functions, the reliability of the processing solution remaining in the container is high.
New limit warning function.

Further , the second semiconductor manufacturing apparatus of the present invention
Predetermined amount for each processing operation from processing unit for semiconductor manufacturing process
Semiconductor that collects the drainage of wastewater into a wastewater collection container
In the manufacturing apparatus, the weight of the container is measured and the container is weighed.
A drainage reservoir measuring means for measuring the drainage reservoir in the container;
Drainage time for setting the amount of wastewater to be collected in the processing operation
Yield setting means, predetermined each time the processing operation is executed
Processing control means for generating a signal of
Every time the predetermined signal is generated.
Estimating the volume of the drainage in the container based on a constant value
A drainage reservoir estimating unit, and a wastewater reservoir amount measuring unit.
Obtained from the drainage volume measurement value and the drainage volume estimation means.
A warning is issued when the relative difference from the estimated drainage volume increases to a predetermined value.
First monitoring means for generating a first signal for information
Configuration.

In the above arrangement, the drainage amount measuring means
Measuring the drainage volume obtained from the weight value of the wastewater collection container
Value, while draining each time a processing operation is performed.
The number of executions of the processing operation or the supply of the processing liquid is
Current drainage collection based on number of feeds or amount of processing liquid collection
The amount of drainage stored in the container is estimated. First watchman
The stage compares the measured drainage volume with the estimated drainage volume,
When the relative difference between the participants has increased to a predetermined value, an alarm is issued at that point.
A first signal is generated to notify an abnormal situation.

In the above second semiconductor manufacturing apparatus,
Alternatively, a limit value for the amount of drainage in the container is set.
And a drainage limit value setting means for determining the
The measured drainage amount obtained or the drainage amount estimating means
Either one of the estimated values of the drainage volume obtained from
Generates a second alarm signal when the reservoir limit is reached
The configuration may further include a second monitoring unit.
In such a configuration, in addition to the abnormality monitoring function described above,
Highly reliable limit warning function for drainage volume in the container
can get.

In the second semiconductor manufacturing apparatus,
Preferably, the processing liquid to be supplied to the processing unit is
A processing liquid supply container to be accommodated, and the processing liquid supply container
A pipe connecting the drainage collection container, and a pipe connected to the pipe.
The opening and closing valve may be further provided.
According to this configuration, when the processing liquid supply container is replaced, the on-off valve
By opening the processing liquid from the new container via the piping.
Flow to the waste liquid collection container,
The air (bubbles) contained can be removed.

[0150]

[0160]

[0170]

[0180]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the accompanying drawings. FIG. 1 is a diagram showing an overall configuration of a resist coating apparatus according to one embodiment of the present invention, FIG. 2 is a block diagram showing a configuration of a resist liquid monitoring section according to one embodiment of the present invention, and FIG. FIG. 3 is a block diagram showing a configuration of a drainage monitoring unit according to the first embodiment.

In FIG. 1, the resist coating apparatus of this embodiment has a coating processing section 11 provided inside a cup 10, and a spin chuck 12 disposed at the center of the cup 10.
One semiconductor wafer 14 is placed on the object to be processed.

The spin chuck 12 is rotated at a predetermined speed by the rotational driving force of the motor 16 in a state where the wafer 14 is fixedly held by vacuum suction. A resist nozzle 18 is provided above the wafer 14 held by the spin chuck 12, and a predetermined amount of resist liquid is dropped from the nozzle 18 onto the center of the wafer 14. Then, the resist liquid spreads to the outer peripheral side of the wafer due to centrifugal force and is uniformly applied on the wafer surface. At this time, the resist solution scattered from the outer peripheral end of the wafer 14 hits the inner wall of the cup 10 and is guided to the bottom, and is sent from the outlet 10a to the drain tank 22 for drain recovery via the drain pipe 20.

When the above-described resist coating operation is completed, a predetermined cleaning liquid is applied for a predetermined time from the cleaning nozzle 26 disposed on the upper surface of the mounting flange 24 of the motor 16 toward the back surface of the rotating wafer 14. Injected and wafer 14
The resist solution wrapping around the back surface is washed away.
The drainage from the back surface washing is also collected at the bottom of the cup 10 and then sent from the outlet 10a to the drain tank 22 for drainage recovery via the drain pipe 20.

[0220] The drain tank 22 is placed on a weight sensor 28 provided at a predetermined position below the cup 10. The weight sensor 28 measures the weight of the drain tank 22 containing the collected drainage, and outputs a measurement signal WD.
To the drainage monitoring unit 32 via the cable 30.

The resist solution dropped from the resist nozzle 18 is supplied to a resist solution delivery mechanism 42 comprising a pipe 34, a buffer tank 36, an opening / closing valve 38 and a pipe 40.
Is supplied from the resist solution storage bottle 44 via the The resist liquid storage bottle 44 is connected to the pipe 28 and a pipe 46 for supplying N2 gas for pressure-feeding the resist liquid.
Is placed on a weight sensor 48 disposed at a predetermined position on the side of the cup 10 in a state of being placed in the bottle.
The weight sensor 48 measures the weight of the resist solution storage bottle 44 containing the resist solution to be supplied to the coating processing unit 11, and sends a measurement signal WA to the resist solution monitoring unit 52 via the cable 50.

In the resist solution delivery mechanism 42, the opening / closing valve 38 is opened for a predetermined time by the resist solution discharge signal RS from the control unit 54 every time the discharge processing unit 11 performs the coating operation on the wafer 14. I have.
The pipes 34 and 40 are both Teflon pipes. The buffer tank 36 is for temporarily storing the resist solution pumped from the resist solution storage bottle 44 and supplying the resist solution to the nozzle 18 at a constant pressure.

In this resist coating apparatus, the output port of the buffer tank 36 is connected to the drain tank 22 via a manual on-off valve 56 and a pipe 58. This bypass line is a so-called bubble removal line. When the resist solution storage bottle 44 is replaced, air enters the pipe 34. Therefore, an operator opens the on-off valve 56 and discharges the resist solution from the resist solution storage bottle 44 to the drain tank 22 via the pipe 58 so that air (bubbles) in the pipe 34 is removed.

In such a resist coating apparatus, when the weight of the pipes 34 and 40 acts on the resist liquid storage bottle 44 and the like, the weight sensor 48 cannot detect the resist liquid in the bottle 44 even if it runs out. There is.
Also, failure of the resist solution delivery mechanism 42 and N2
A predetermined amount of resist liquid may not be supplied to the coating processing unit 11 during the coating operation due to fluctuations in pressurization or the like. Further, since the operator forgets to close the on-off valve 56 when removing bubbles, the resist solution in the resist solution storage bottle 44 may be wasted to the drain tank 22 in some cases. In addition, since the drain tank 22 is not correctly placed on the weight sensor 28, the weight sensor 28 may not be able to detect the drainage when the tank 22 is full.

However, the resist liquid monitoring section 52 and the drain liquid monitoring section 32 according to the present embodiment function to detect an abnormal situation before reaching such a dangerous state and issue a required alarm. The configuration and operation of the resist monitoring unit 52 and the drain monitoring unit 32 will be described below with reference to FIGS.

In FIG. 2, the resist liquid monitoring section 52
In addition to the weight sensor 48, an A / D converter 60, a remaining resist solution measuring section 62, a counter 64, a remaining resist solution estimating section 66, a setting section 68, a display section 70, a comparison determining section 72, and an alarm section 74 are provided. Have.

The analog weighing signal WA from the weight sensor 48 is converted into a digital signal WA ′ by the A / D converter 60 and then supplied to the remaining resist solution measuring section 62. The resist solution remaining amount measuring section 62 calculates the resist currently contained in the resist solution containing bottle 44 from the value of the input signal WA ′ based on the calibration data regarding the weight of the resist solution containing bottle 44 received from the setting section 68. The measured amount LMa of the liquid amount, that is, the remaining amount is calculated. Then, the calculated remaining amount measurement value LMa is provided to the comparison determination unit 72 and the display unit 70.

The pulse signal PS is supplied from the control unit 54 to the resist liquid monitoring device 52 simultaneously with or in synchronization with the resist liquid discharge signal RS to the opening / closing valve 38 for each coating operation on one wafer 14. The signal PS is input to the counter 64. The counter 64 is reset every time the resist solution storage bottle 44 is replaced, and counts the number of times of generation of the pulse signal PS and the number of times of supply of the resist solution or the number of application operations for the currently installed bottle 44. Then, the counted value RN is used as a resist solution remaining amount estimating unit 6.
6 and the display unit 70. Resist liquid remaining amount estimation unit 66
Calculates the total resist solution supply amount for the current bottle 44 by multiplying the count value RN by the set value of the resist solution supply amount per application operation received from the setting unit 68, and then calculates the total amount of resist solution supply for the bottle 44. By subtracting the total supply amount of the resist solution from the initial value (set value) of the resist solution amount, the amount of the resist solution currently remaining in the bottle 44, that is, an estimated value LMb of the remaining amount is calculated. The estimated remaining amount LMb is provided to the comparison determination unit 72.

The comparison determination section 72 determines whether one of the remaining amount measurement value LMa from the remaining amount of resist solution measuring section 62 and the remaining amount estimation value LMb from the remaining amount of resist solution estimating section 66 is the remaining amount limit value (set value). ) When the value falls to LG, a predetermined signal is given to the alarm unit 74 to generate a remaining amount alarm. Therefore, for example, the resist solution storage bottle 4 is
Even when the weights of the pipes 34 and 40 act extra outside the bottle 4, when the resist solution in the bottle 44 is almost exhausted, the remaining amount estimated value LMb on the resist solution remaining amount estimating unit 66 side becomes the remaining amount limit value first. Since it reaches LG, even in this case, the remaining amount alarm is issued and the operator can be prompted to replace the bottle 44.

Also, the remaining amount measurement value LMa and the remaining amount estimation value LM
When the relative difference from b reaches a predetermined value, for example, 20%, the comparison determination section 72 gives a predetermined signal to the alarm section 74 to output an alarm for an abnormal situation. The causes of such a situation include a failure in the installation of the resist solution storage bottle 44, a failure in the resist solution delivery mechanism 42, a change in the supply amount of the resist solution due to a change in the N2 pressurization of the pipe 46, and a defective ejection of the resist nozzle 18. Or forgetting to close the on-off valve 56 in the bubble removal line. In any case, the alarm for notifying the abnormality is issued from the resist liquid monitoring unit 52, so that the operator performs an inspection and repairs the abnormal part at an early stage.

The display unit 70 displays the initial value of the resist solution in the bottle 44, the set value of the resist solution supply amount per one time, the set number of the resist solution supply times for one bottle, the set value of the number of coating processes, and the like. In addition to displaying various set values, various measured values such as a measured value of the remaining amount of the resist liquid, a measured value of the number of times of supplying the resist liquid or a measured number of times of the coating process regarding the currently installed bottle 44 are displayed. Also, an alarm or an alarm message can be displayed.

Next, in FIG. 3, the drainage monitoring unit 32
In addition to the weight sensor 28, an A / D converter 80, a drainage amount measuring unit 82, a counter 84, a drainage amount estimating unit 86, a setting unit 88, a display unit 90, a comparison determining unit 92, and an alarm unit 94.
Having.

The analog weighing signal WD from the weight sensor 28 is converted into a digital signal WD 'by the A / D converter 80 and then supplied to the drainage measuring unit 82. The resist liquid storage amount measuring unit 82 is based on the calibration data regarding the weight of the drain tank 22 received from the setting unit 88 and the like.
From the value of the input signal WD ′, the measured value KMa of the amount of liquid such as the resist liquid currently contained in the drain tank 22, that is, the accumulated amount KMa
Is calculated. Then, the calculated reservoir amount measurement value KMa is provided to the comparison determination unit 92 and the display unit 90.

The same pulse signal PS as that for the resist liquid monitoring section 52 is also supplied from the control section 54 to the liquid discharge monitoring section 32 for each coating operation on one wafer 14, and this pulse signal PS is supplied to the counter 84. Is input to
The counter 84 is reset every time the drain tank 22 is replaced, and counts the number of times of generation of the pulse signal PS, the number of times of drainage collection or the number of coating processes (coating operation + cleaning operation) for the currently installed drain tank 22. Then, the count value RN is displayed on the drainage reservoir estimation unit 86 and the display unit 9.
0 and given. The drainage pool estimating unit 86 estimates the current drainage pool in the drain tank 22 by multiplying the count value RN by the set value of the drainage collection amount per application process received from the setting unit 88. Calculate the value. This estimated amount of reservoir KMb
Is given to the comparison determination unit 92.

The comparison / determination unit 92 compares the measured amount of water KMa from the drainage amount measuring unit 82 with the estimated remaining amount KMb from the drainage amount estimating unit 86. And both KMa, KMb
When either one of them reaches the storage limit value (set value) HG, a predetermined signal is given to the alarm unit 94 to output a full alarm. Therefore, for example, the drain tank 22
Is not correctly placed on the weight sensor 28 and the drain tank 2
Even if the weight of No. 2 is not accurately transmitted to the sensor 28, when the drainage in the tank 22 is almost full, the drainage reservoir estimating unit 86 changes the reservoir estimated value KMb to the reservoir limit LG first. In this case, an alarm is issued without fail, and the operator can be prompted to replace the tank 22.

In addition, the measured reservoir amount KMa and the estimated reservoir amount KM
When the relative difference from b reaches a predetermined value, for example, 20%, the comparison / determination section 92 gives a predetermined signal to the alarm section 94 to output an alarm for an abnormal situation. The causes of such a situation include, besides the improper installation of the drain tank 22, a change in the resist solution supply amount due to a failure of the resist solution delivery mechanism 42, a change in the N 2 pressurization of the pipe 46, and the like. Poor discharge, poor discharge of the cleaning nozzle 26, forgetting to close the on-off valve 56 in the bubble removal line, and the like are considered. In any case, when the drainage monitoring unit 32 issues an alarm indicating an abnormality, the operator performs an inspection and repairs the abnormal part.

[0390] The display section 90 displays a set limit value HG of the reservoir amount in the tank 22, a set value of the supply amount of the resist solution and a supply amount of the cleaning solution per one coating process, the number of drainage collection times for one tank, or In addition to displaying various set values such as the set value of the number of times of application processing, various measured values such as the measured value of the remaining amount of drainage, the number of times of drainage collection or the number of times of application processing regarding the currently installed tank 22 are displayed. . Also, an alarm or an alarm message can be displayed.

In the above-described embodiment, the number of times of the coating process is counted based on the pulse signal PS from the control unit 54 for giving the resist solution discharge signal RS to the opening / closing valve 38 of the resist solution sending mechanism 42. As a method of counting the number of times of supply or the number of times of drainage collection, various other methods are possible. At the same time when the alarm is issued from the alarm unit 94, the control unit 88 is controlled by the comparison determination units 72 and 92.
May be applied to interrupt the resist coating process. In addition, the number of times of the processing operation and the number of times of supplying the processing liquid or the number of times of collecting the drainage do not have to correspond to one to one. For example, when the processing liquid is intermittently supplied two or more times in one processing. There may be.

Although the above-described embodiment relates to the resist coating apparatus, the present invention supplies a predetermined amount of the processing liquid from the container containing the processing liquid every time the predetermined processing is performed, or collects the discharged liquid. The present invention can be applied to any semiconductor manufacturing apparatus that drains liquid into a container, for example, a developing apparatus for manufacturing a semiconductor, a wafer cleaning apparatus, a wet etching apparatus, and the like.

[0420]

As described above, the semiconductor device of the present invention
According to the manufacturing apparatus , the weight of the container containing the processing liquid is measured to measure the remaining amount of the processing liquid, and based on the number of executions of the processing operation, the number of times the processing liquid is supplied, or the processing liquid supply amount, The remaining amount of the processing liquid in the liquid supply container is estimated, and the remaining amount of the processing liquid in the container or the supply state of the processing liquid from the container is determined based on the measured remaining amount of the processing liquid and the estimated remaining amount of the processing liquid. than was to properly monitor the process liquid supply system
Abnormal situation can be detected at an early stage, and the reliability can be improved.

Further, according to the semiconductor manufacturing apparatus of the present invention,
The weight of the drainage collection container is measured to measure the amount of drainage collected in the container, and the current drainage collection amount is determined based on the number of executions of the processing operation, the number of drainage collections, or the amount of drainage collection. Estimate the amount of drainage in the container, and correctly monitor the amount of drainage in the container or the state of collection of the drainage in the container based on the measured value of the amount of drainage and the estimated value of the amount of drainage. as in the of the to, the abnormal situation of the drainage collection system is detected early, it is possible to improve the reliability.

[Brief description of the drawings]

FIG. 1 is a perspective view showing an overall configuration of a resist coating apparatus according to one embodiment of the present invention.

FIG. 2 is a block diagram showing a configuration of a resist liquid monitoring unit according to one embodiment of the present invention.

FIG. 3 is a block diagram illustrating a configuration of a drainage monitoring unit according to an embodiment of the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 11 Coating processing part 14 Object to be processed (semiconductor wafer) 18 Resist nozzle 22 Drain tank 26 Cleaning nozzle 28 Weight sensor 32 Drainage monitoring part 42 Resist liquid sending mechanism 44 Resist liquid storage bottle 48 Weight sensor 52 Resist liquid monitoring part 54 Control part

Claims (5)

(57) [Claims] 1. A semiconductor manufacturing apparatus configured to supply a predetermined amount of a processing liquid from a container containing a processing liquid to a processing unit for a semiconductor manufacturing process for each processing operation, wherein the container is measured by weighing the container. A processing solution remaining amount measuring unit that measures a remaining amount of the processing solution in the processing solution, a processing solution supply amount setting unit that sets a supply amount of the processing solution in the processing operation, and the processing solution is supplied in the processing operation. Processing control means for generating a predetermined signal every time the processing liquid is supplied from the processing control means, based on the set value of the processing liquid supply amount each time the processing liquid is supplied from the processing control means. Processing solution remaining amount estimating means for estimating the amount, and a processing solution remaining amount measurement value obtained by the processing solution remaining amount measuring means
And the remaining amount of processing liquid obtained by the processing liquid remaining amount estimating means.
When the relative difference with the value increases to a predetermined value, the first
A semiconductor manufacturing apparatus comprising: a first monitoring unit that generates a signal . 2. The method according to claim 1, further comprising the step of:
A remaining limit value setting unit for setting a limit value, and a processing solution remaining amount measurement value obtained from the processing solution remaining amount measuring unit.
Alternatively, the remaining amount of the processing liquid obtained by the processing liquid remaining amount estimating means.
Either one of the estimated values has reached the processing solution remaining amount limit value
A second monitoring means for generating a second signal for alarm at the time.
The semiconductor manufacturing according to claim 1, wherein the semiconductor device comprises:
apparatus. 3. Processing from a processing unit for a semiconductor manufacturing process
Collect a predetermined amount of drainage into a drainage collection container for each operation.
In the semiconductor manufacturing apparatus described above, the weight of the container is weighed and the amount of the drainage stored in the container is measured.
And a drainage amount measuring means for measuring the drainage amount for setting the amount of the drainage collected in the processing operation.
Collection amount setting means for generating a predetermined signal every time the processing operation is executed
Processing control means, and each time the predetermined signal is generated by the processing control means
Based on the set value of the drainage recovery amount in the container
A drainage reservoir estimating means for estimating a drainage reservoir, and a drainage reservoir measured value obtained by the drainage reservoir measuring device,
Phase with the estimated drainage volume obtained by the drainage volume estimation means.
When the difference has expanded to a predetermined value, a first alarm signal is issued.
And a first monitoring means for generating
Conductor manufacturing equipment. 4. A limit of the amount of drainage in the container.
A reservoir limit value setting unit for setting a value, a drainage reservoir measured value obtained from the drainage reservoir measurement unit, or
Is the estimated value of the drainage volume obtained by the drainage volume estimation means.
For alarm when either one of them reaches the limit value
And second monitoring means for generating a second signal.
4. The semiconductor manufacturing apparatus according to claim 3, wherein: 5. A processing solution to be supplied to the processing section.
Connecting the processing liquid supply container and the processing liquid supply container and the waste liquid collecting container.
And a switching valve provided on the piping.
The semiconductor manufacturing apparatus according to claim 3, wherein