JP2005187596A5 - - Google Patents
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- Publication number
- JP2005187596A5 JP2005187596A5 JP2003429650A JP2003429650A JP2005187596A5 JP 2005187596 A5 JP2005187596 A5 JP 2005187596A5 JP 2003429650 A JP2003429650 A JP 2003429650A JP 2003429650 A JP2003429650 A JP 2003429650A JP 2005187596 A5 JP2005187596 A5 JP 2005187596A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- viscosity
- carbon atoms
- solvent
- polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 125000004432 carbon atom Chemical group C* 0.000 claims description 11
- 125000000962 organic group Chemical group 0.000 claims description 10
- 239000002904 solvent Substances 0.000 claims description 10
- 229920000642 polymer Polymers 0.000 claims description 7
- 239000007983 Tris buffer Substances 0.000 claims description 6
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims description 6
- -1 triethylsilyl group Chemical group 0.000 claims description 6
- 239000011342 resin composition Substances 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 125000003368 amide group Chemical group 0.000 claims description 3
- 125000003277 amino group Chemical group 0.000 claims description 3
- 238000009835 boiling Methods 0.000 claims description 3
- 125000001033 ether group Chemical group 0.000 claims description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 3
- 125000006340 pentafluoro ethyl group Chemical group FC(F)(F)C(F)(F)* 0.000 claims description 3
- 125000000101 thioether group Chemical group 0.000 claims description 3
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 3
- 125000002306 tributylsilyl group Chemical group C(CCC)[Si](CCCC)(CCCC)* 0.000 claims description 3
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims description 3
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- DQFMPTUTAAIXAN-UHFFFAOYSA-N 4,4-dimethyl-1h-imidazol-5-one Chemical compound CC1(C)NC=NC1=O DQFMPTUTAAIXAN-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 150000002596 lactones Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003429650A JP4419565B2 (ja) | 2003-12-25 | 2003-12-25 | 樹脂組成物及びこれを用いた絶縁層の形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003429650A JP4419565B2 (ja) | 2003-12-25 | 2003-12-25 | 樹脂組成物及びこれを用いた絶縁層の形成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005187596A JP2005187596A (ja) | 2005-07-14 |
| JP2005187596A5 true JP2005187596A5 (enrdf_load_stackoverflow) | 2007-02-01 |
| JP4419565B2 JP4419565B2 (ja) | 2010-02-24 |
Family
ID=34788243
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003429650A Expired - Lifetime JP4419565B2 (ja) | 2003-12-25 | 2003-12-25 | 樹脂組成物及びこれを用いた絶縁層の形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4419565B2 (enrdf_load_stackoverflow) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4946105B2 (ja) * | 2006-03-15 | 2012-06-06 | 東レ株式会社 | 樹脂組成物、それを用いたレリーフパターンの形成方法 |
| JP2008065012A (ja) * | 2006-09-07 | 2008-03-21 | Future Vision:Kk | 液晶表示パネル |
| WO2008056808A1 (fr) * | 2006-11-10 | 2008-05-15 | Ube Industries, Ltd. | Polyimide, composé diamine et leur procédé de production |
| KR101656541B1 (ko) * | 2008-12-26 | 2016-09-09 | 닛산 가가쿠 고교 가부시키 가이샤 | 액정 배향제, 액정 배향막 및 액정 표시 소자 |
| JP5287532B2 (ja) * | 2009-06-16 | 2013-09-11 | 大日本印刷株式会社 | 耐候性を有する透明蒸着フィルム及びそれを使用した積層体 |
| JP5899605B2 (ja) * | 2010-01-12 | 2016-04-06 | Jnc株式会社 | 熱硬化性組成物 |
| CN104246591B (zh) * | 2012-02-03 | 2017-08-08 | 日产化学工业株式会社 | 液晶取向处理剂、液晶取向膜及液晶显示元件 |
| JP6286834B2 (ja) * | 2013-02-22 | 2018-03-07 | 東レ株式会社 | 耐熱性樹脂組成物および耐熱性樹脂膜の製造方法 |
| KR101588870B1 (ko) * | 2014-12-17 | 2016-01-26 | 에스 티(주) | 쉴드 캔의 내면에 절연을 구현하는 제조방법 및 내면에 절연층이 형성된 전자기기의 쉴드 캔 |
-
2003
- 2003-12-25 JP JP2003429650A patent/JP4419565B2/ja not_active Expired - Lifetime
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