JP2005132996A - Sulfonic acid group-containing aqueous dispersion - Google Patents
Sulfonic acid group-containing aqueous dispersion Download PDFInfo
- Publication number
- JP2005132996A JP2005132996A JP2003371990A JP2003371990A JP2005132996A JP 2005132996 A JP2005132996 A JP 2005132996A JP 2003371990 A JP2003371990 A JP 2003371990A JP 2003371990 A JP2003371990 A JP 2003371990A JP 2005132996 A JP2005132996 A JP 2005132996A
- Authority
- JP
- Japan
- Prior art keywords
- aqueous dispersion
- weight
- group
- parts
- sulfonic acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000000542 sulfonic acid group Chemical group 0.000 title claims abstract description 82
- 239000006185 dispersion Substances 0.000 title claims abstract description 80
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 47
- 239000002245 particle Substances 0.000 claims abstract description 41
- 229920000642 polymer Polymers 0.000 claims abstract description 39
- 239000012736 aqueous medium Substances 0.000 claims abstract description 10
- 239000000463 material Substances 0.000 claims description 42
- 238000000034 method Methods 0.000 claims description 35
- 239000000178 monomer Substances 0.000 claims description 21
- 238000004519 manufacturing process Methods 0.000 claims description 19
- 239000000839 emulsion Substances 0.000 claims description 17
- 238000000576 coating method Methods 0.000 claims description 16
- 239000011248 coating agent Substances 0.000 claims description 15
- 239000003995 emulsifying agent Substances 0.000 claims description 14
- 125000004432 carbon atom Chemical group C* 0.000 claims description 13
- 239000007787 solid Substances 0.000 claims description 12
- 238000010526 radical polymerization reaction Methods 0.000 claims description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- 239000007870 radical polymerization initiator Substances 0.000 claims description 6
- 239000007784 solid electrolyte Substances 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 5
- 239000003054 catalyst Substances 0.000 claims description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 5
- 125000002252 acyl group Chemical group 0.000 claims description 4
- 238000006482 condensation reaction Methods 0.000 claims description 4
- 230000007062 hydrolysis Effects 0.000 claims description 4
- 238000006460 hydrolysis reaction Methods 0.000 claims description 4
- 238000002156 mixing Methods 0.000 claims description 4
- 125000000962 organic group Chemical group 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 238000001704 evaporation Methods 0.000 claims description 2
- -1 n-octyl group Chemical group 0.000 description 73
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 35
- 239000000047 product Substances 0.000 description 26
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 20
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 20
- 150000001282 organosilanes Chemical class 0.000 description 20
- 239000000203 mixture Substances 0.000 description 18
- 150000001875 compounds Chemical class 0.000 description 16
- 239000003960 organic solvent Substances 0.000 description 15
- 125000000524 functional group Chemical group 0.000 description 13
- 238000005259 measurement Methods 0.000 description 13
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 12
- 150000002902 organometallic compounds Chemical class 0.000 description 12
- 239000003431 cross linking reagent Substances 0.000 description 11
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 10
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 9
- OMNKZBIFPJNNIO-UHFFFAOYSA-N n-(2-methyl-4-oxopentan-2-yl)prop-2-enamide Chemical compound CC(=O)CC(C)(C)NC(=O)C=C OMNKZBIFPJNNIO-UHFFFAOYSA-N 0.000 description 9
- 238000006116 polymerization reaction Methods 0.000 description 9
- 125000003396 thiol group Chemical group [H]S* 0.000 description 9
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 8
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 8
- 239000002253 acid Substances 0.000 description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 8
- 229920001577 copolymer Polymers 0.000 description 8
- 125000003700 epoxy group Chemical group 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- 238000006277 sulfonation reaction Methods 0.000 description 8
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 7
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 7
- 229910052782 aluminium Chemical group 0.000 description 7
- 239000011230 binding agent Substances 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 7
- 229920001296 polysiloxane Polymers 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- 238000003756 stirring Methods 0.000 description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- 210000004027 cell Anatomy 0.000 description 6
- 230000005494 condensation Effects 0.000 description 6
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 6
- 230000002829 reductive effect Effects 0.000 description 6
- 125000005372 silanol group Chemical group 0.000 description 6
- 238000003860 storage Methods 0.000 description 6
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 6
- 229920002554 vinyl polymer Polymers 0.000 description 6
- 229910000859 α-Fe Inorganic materials 0.000 description 6
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 5
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 5
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 description 5
- XCJGLBWDZKLQCY-UHFFFAOYSA-N 2-methylpropane-2-sulfonic acid Chemical compound CC(C)(C)S(O)(=O)=O XCJGLBWDZKLQCY-UHFFFAOYSA-N 0.000 description 5
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 5
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 5
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- IBVAQQYNSHJXBV-UHFFFAOYSA-N adipic acid dihydrazide Chemical compound NNC(=O)CCCCC(=O)NN IBVAQQYNSHJXBV-UHFFFAOYSA-N 0.000 description 5
- 150000001412 amines Chemical class 0.000 description 5
- 239000002585 base Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 238000009833 condensation Methods 0.000 description 5
- 229940060296 dodecylbenzenesulfonic acid Drugs 0.000 description 5
- 238000004945 emulsification Methods 0.000 description 5
- 239000003014 ion exchange membrane Substances 0.000 description 5
- 239000011976 maleic acid Substances 0.000 description 5
- 239000004745 nonwoven fabric Substances 0.000 description 5
- 239000000123 paper Substances 0.000 description 5
- 230000036961 partial effect Effects 0.000 description 5
- 229910052697 platinum Inorganic materials 0.000 description 5
- 229910001220 stainless steel Inorganic materials 0.000 description 5
- 229920003048 styrene butadiene rubber Polymers 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 229920000536 2-Acrylamido-2-methylpropane sulfonic acid Polymers 0.000 description 4
- XHZPRMZZQOIPDS-UHFFFAOYSA-N 2-Methyl-2-[(1-oxo-2-propenyl)amino]-1-propanesulfonic acid Chemical compound OS(=O)(=O)CC(C)(C)NC(=O)C=C XHZPRMZZQOIPDS-UHFFFAOYSA-N 0.000 description 4
- ONIKNECPXCLUHT-UHFFFAOYSA-N 2-chlorobenzoyl chloride Chemical compound ClC(=O)C1=CC=CC=C1Cl ONIKNECPXCLUHT-UHFFFAOYSA-N 0.000 description 4
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 4
- 229920002126 Acrylic acid copolymer Polymers 0.000 description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 239000000446 fuel Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 4
- 239000012528 membrane Substances 0.000 description 4
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- QNILTEGFHQSKFF-UHFFFAOYSA-N n-propan-2-ylprop-2-enamide Chemical compound CC(C)NC(=O)C=C QNILTEGFHQSKFF-UHFFFAOYSA-N 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 239000003973 paint Substances 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- AMUZLNGQQFNPTQ-UHFFFAOYSA-J 3-oxohexanoate zirconium(4+) Chemical compound [Zr+4].CCCC(=O)CC([O-])=O.CCCC(=O)CC([O-])=O.CCCC(=O)CC([O-])=O.CCCC(=O)CC([O-])=O AMUZLNGQQFNPTQ-UHFFFAOYSA-J 0.000 description 3
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 3
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000004809 Teflon Substances 0.000 description 3
- 229920006362 Teflon® Polymers 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 125000005595 acetylacetonate group Chemical group 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 3
- MTAZNLWOLGHBHU-UHFFFAOYSA-N butadiene-styrene rubber Chemical class C=CC=C.C=CC1=CC=CC=C1 MTAZNLWOLGHBHU-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 239000002781 deodorant agent Substances 0.000 description 3
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 3
- 239000003792 electrolyte Substances 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 239000003999 initiator Substances 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 3
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 3
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 3
- 229920001195 polyisoprene Polymers 0.000 description 3
- 239000005518 polymer electrolyte Substances 0.000 description 3
- 229920002223 polystyrene Polymers 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 3
- 239000010936 titanium Chemical group 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- MJYFYGVCLHNRKB-UHFFFAOYSA-N 1,1,2-trifluoroethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(F)(F)CF MJYFYGVCLHNRKB-UHFFFAOYSA-N 0.000 description 2
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- UZKWTJUDCOPSNM-UHFFFAOYSA-N 1-ethenoxybutane Chemical compound CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- FZXRXKLUIMKDEL-UHFFFAOYSA-N 2-Methylpropyl propanoate Chemical compound CCC(=O)OCC(C)C FZXRXKLUIMKDEL-UHFFFAOYSA-N 0.000 description 2
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 2
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 2
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 2
- HCFAJYNVAYBARA-UHFFFAOYSA-N 4-heptanone Chemical compound CCCC(=O)CCC HCFAJYNVAYBARA-UHFFFAOYSA-N 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229910000980 Aluminium gallium arsenide Inorganic materials 0.000 description 2
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 229910004283 SiO 4 Inorganic materials 0.000 description 2
- 229910002808 Si–O–Si Inorganic materials 0.000 description 2
- 229910006404 SnO 2 Inorganic materials 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical group [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical group [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 2
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 150000005215 alkyl ethers Chemical class 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- MQPPCKJJFDNPHJ-UHFFFAOYSA-K aluminum;3-oxohexanoate Chemical compound [Al+3].CCCC(=O)CC([O-])=O.CCCC(=O)CC([O-])=O.CCCC(=O)CC([O-])=O MQPPCKJJFDNPHJ-UHFFFAOYSA-K 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 2
- 230000000844 anti-bacterial effect Effects 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 2
- 125000004063 butyryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000001951 carbamoylamino group Chemical group C(N)(=O)N* 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- 239000012975 dibutyltin dilaurate Substances 0.000 description 2
- 150000001993 dienes Chemical class 0.000 description 2
- ZZNQQQWFKKTOSD-UHFFFAOYSA-N diethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OCC)(OCC)C1=CC=CC=C1 ZZNQQQWFKKTOSD-UHFFFAOYSA-N 0.000 description 2
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 2
- 239000004205 dimethyl polysiloxane Substances 0.000 description 2
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 2
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 229940093499 ethyl acetate Drugs 0.000 description 2
- 235000019439 ethyl acetate Nutrition 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- 239000011790 ferrous sulphate Substances 0.000 description 2
- 235000003891 ferrous sulphate Nutrition 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 2
- NGAZZOYFWWSOGK-UHFFFAOYSA-N heptan-3-one Chemical compound CCCCC(=O)CC NGAZZOYFWWSOGK-UHFFFAOYSA-N 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 239000010954 inorganic particle Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- BAUYGSIQEAFULO-UHFFFAOYSA-L iron(2+) sulfate (anhydrous) Chemical compound [Fe+2].[O-]S([O-])(=O)=O BAUYGSIQEAFULO-UHFFFAOYSA-L 0.000 description 2
- 229910000359 iron(II) sulfate Inorganic materials 0.000 description 2
- MLFHJEHSLIIPHL-UHFFFAOYSA-N isoamyl acetate Chemical compound CC(C)CCOC(C)=O MLFHJEHSLIIPHL-UHFFFAOYSA-N 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 2
- 230000000670 limiting effect Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000003607 modifier Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 2
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000004843 novolac epoxy resin Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- PGMYKACGEOXYJE-UHFFFAOYSA-N pentyl acetate Chemical compound CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 2
- KJFMBFZCATUALV-UHFFFAOYSA-N phenolphthalein Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)C2=CC=CC=C2C(=O)O1 KJFMBFZCATUALV-UHFFFAOYSA-N 0.000 description 2
- 235000021317 phosphate Nutrition 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 229920000570 polyether Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical group CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- 229920002545 silicone oil Polymers 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 230000008719 thickening Effects 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 2
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 2
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 2
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 2
- 125000003774 valeryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000011850 water-based material Substances 0.000 description 2
- 239000002023 wood Substances 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- GIIUJJXXMYYQQD-UHFFFAOYSA-N (2,2,6,6-tetramethylpiperidin-1-yl) prop-2-enoate Chemical compound CC1(C)CCCC(C)(C)N1OC(=O)C=C GIIUJJXXMYYQQD-UHFFFAOYSA-N 0.000 description 1
- YBNMDCCMCLUHBL-UHFFFAOYSA-N (2,5-dioxopyrrolidin-1-yl) 4-pyren-1-ylbutanoate Chemical compound C=1C=C(C2=C34)C=CC3=CC=CC4=CC=C2C=1CCCC(=O)ON1C(=O)CCC1=O YBNMDCCMCLUHBL-UHFFFAOYSA-N 0.000 description 1
- UXOFRFPVWFJROK-UHFFFAOYSA-N (2-ethenylphenyl)methanol Chemical compound OCC1=CC=CC=C1C=C UXOFRFPVWFJROK-UHFFFAOYSA-N 0.000 description 1
- 125000006823 (C1-C6) acyl group Chemical group 0.000 description 1
- YKYIFUROKBDHCY-ONEGZZNKSA-N (e)-4-ethoxy-1,1,1-trifluorobut-3-en-2-one Chemical group CCO\C=C\C(=O)C(F)(F)F YKYIFUROKBDHCY-ONEGZZNKSA-N 0.000 description 1
- BLKRGXCGFRXRNQ-SNAWJCMRSA-N (z)-3-carbonoperoxoyl-4,4-dimethylpent-2-enoic acid Chemical compound OC(=O)/C=C(C(C)(C)C)\C(=O)OO BLKRGXCGFRXRNQ-SNAWJCMRSA-N 0.000 description 1
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 1
- KHXKESCWFMPTFT-UHFFFAOYSA-N 1,1,1,2,2,3,3-heptafluoro-3-(1,2,2-trifluoroethenoxy)propane Chemical compound FC(F)=C(F)OC(F)(F)C(F)(F)C(F)(F)F KHXKESCWFMPTFT-UHFFFAOYSA-N 0.000 description 1
- NHBGHHVQLWQGOI-UHFFFAOYSA-N 1,1,2-trifluoro-2-(2-methoxyethoxy)ethene Chemical compound COCCOC(F)=C(F)F NHBGHHVQLWQGOI-UHFFFAOYSA-N 0.000 description 1
- BLTXWCKMNMYXEA-UHFFFAOYSA-N 1,1,2-trifluoro-2-(trifluoromethoxy)ethene Chemical compound FC(F)=C(F)OC(F)(F)F BLTXWCKMNMYXEA-UHFFFAOYSA-N 0.000 description 1
- VPBZZPOGZPKYKX-UHFFFAOYSA-N 1,2-diethoxypropane Chemical compound CCOCC(C)OCC VPBZZPOGZPKYKX-UHFFFAOYSA-N 0.000 description 1
- LEEANUDEDHYDTG-UHFFFAOYSA-N 1,2-dimethoxypropane Chemical compound COCC(C)OC LEEANUDEDHYDTG-UHFFFAOYSA-N 0.000 description 1
- PVMMVWNXKOSPRB-UHFFFAOYSA-N 1,2-dipropoxypropane Chemical compound CCCOCC(C)OCCC PVMMVWNXKOSPRB-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- QMGJMGFZLXYHCR-UHFFFAOYSA-N 1-(2-butoxypropoxy)butane Chemical compound CCCCOCC(C)OCCCC QMGJMGFZLXYHCR-UHFFFAOYSA-N 0.000 description 1
- NNDGPZZRBGLHGJ-UHFFFAOYSA-N 1-(2-ethoxyethoxy)-1,2,2-trifluoroethene Chemical compound CCOCCOC(F)=C(F)F NNDGPZZRBGLHGJ-UHFFFAOYSA-N 0.000 description 1
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 1
- FUWDFGKRNIDKAE-UHFFFAOYSA-N 1-butoxypropan-2-yl acetate Chemical compound CCCCOCC(C)OC(C)=O FUWDFGKRNIDKAE-UHFFFAOYSA-N 0.000 description 1
- BOVQCIDBZXNFEJ-UHFFFAOYSA-N 1-chloro-3-ethenylbenzene Chemical compound ClC1=CC=CC(C=C)=C1 BOVQCIDBZXNFEJ-UHFFFAOYSA-N 0.000 description 1
- ATJIMRYXCPNUGW-UHFFFAOYSA-N 1-chloro-4-ethenyl-2-methylbenzene Chemical compound CC1=CC(C=C)=CC=C1Cl ATJIMRYXCPNUGW-UHFFFAOYSA-N 0.000 description 1
- OZCMOJQQLBXBKI-UHFFFAOYSA-N 1-ethenoxy-2-methylpropane Chemical compound CC(C)COC=C OZCMOJQQLBXBKI-UHFFFAOYSA-N 0.000 description 1
- WCIOJVGOBKXQPK-UHFFFAOYSA-N 1-ethenoxy-3-propoxypropane Chemical compound CCCOCCCOC=C WCIOJVGOBKXQPK-UHFFFAOYSA-N 0.000 description 1
- NVZWEEGUWXZOKI-UHFFFAOYSA-N 1-ethenyl-2-methylbenzene Chemical compound CC1=CC=CC=C1C=C NVZWEEGUWXZOKI-UHFFFAOYSA-N 0.000 description 1
- JZHGRUMIRATHIU-UHFFFAOYSA-N 1-ethenyl-3-methylbenzene Chemical compound CC1=CC=CC(C=C)=C1 JZHGRUMIRATHIU-UHFFFAOYSA-N 0.000 description 1
- WHFHDVDXYKOSKI-UHFFFAOYSA-N 1-ethenyl-4-ethylbenzene Chemical compound CCC1=CC=C(C=C)C=C1 WHFHDVDXYKOSKI-UHFFFAOYSA-N 0.000 description 1
- UAJRSHJHFRVGMG-UHFFFAOYSA-N 1-ethenyl-4-methoxybenzene Chemical compound COC1=CC=C(C=C)C=C1 UAJRSHJHFRVGMG-UHFFFAOYSA-N 0.000 description 1
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 1
- DMFAHCVITRDZQB-UHFFFAOYSA-N 1-propoxypropan-2-yl acetate Chemical compound CCCOCC(C)OC(C)=O DMFAHCVITRDZQB-UHFFFAOYSA-N 0.000 description 1
- QEDJMOONZLUIMC-UHFFFAOYSA-N 1-tert-butyl-4-ethenylbenzene Chemical compound CC(C)(C)C1=CC=C(C=C)C=C1 QEDJMOONZLUIMC-UHFFFAOYSA-N 0.000 description 1
- ZQUROMIGLUXXNW-UHFFFAOYSA-N 1-triethoxysilylpropan-2-ol Chemical compound CCO[Si](CC(C)O)(OCC)OCC ZQUROMIGLUXXNW-UHFFFAOYSA-N 0.000 description 1
- AFAZQMFMBKQIDW-UHFFFAOYSA-N 1-trimethoxysilylpropan-2-ol Chemical compound CO[Si](OC)(OC)CC(C)O AFAZQMFMBKQIDW-UHFFFAOYSA-N 0.000 description 1
- IGGDKDTUCAWDAN-UHFFFAOYSA-N 1-vinylnaphthalene Chemical compound C1=CC=C2C(C=C)=CC=CC2=C1 IGGDKDTUCAWDAN-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- OMNYXCUDBQKCMU-UHFFFAOYSA-N 2,4-dichloro-1-ethenylbenzene Chemical compound ClC1=CC=C(C=C)C(Cl)=C1 OMNYXCUDBQKCMU-UHFFFAOYSA-N 0.000 description 1
- LCPVQAHEFVXVKT-UHFFFAOYSA-N 2-(2,4-difluorophenoxy)pyridin-3-amine Chemical compound NC1=CC=CN=C1OC1=CC=C(F)C=C1F LCPVQAHEFVXVKT-UHFFFAOYSA-N 0.000 description 1
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 description 1
- ISRGONDNXBCDBM-UHFFFAOYSA-N 2-chlorostyrene Chemical compound ClC1=CC=CC=C1C=C ISRGONDNXBCDBM-UHFFFAOYSA-N 0.000 description 1
- CEYHHQSTMVVZQP-UHFFFAOYSA-N 2-ethenoxyethanamine Chemical compound NCCOC=C CEYHHQSTMVVZQP-UHFFFAOYSA-N 0.000 description 1
- VUIWJRYTWUGOOF-UHFFFAOYSA-N 2-ethenoxyethanol Chemical compound OCCOC=C VUIWJRYTWUGOOF-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- FVTWJXMFYOXOKK-UHFFFAOYSA-N 2-fluoroacetamide Chemical group NC(=O)CF FVTWJXMFYOXOKK-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- AUZRCMMVHXRSGT-UHFFFAOYSA-N 2-methylpropane-1-sulfonic acid;prop-2-enamide Chemical compound NC(=O)C=C.CC(C)CS(O)(=O)=O AUZRCMMVHXRSGT-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- ZHTLMPWATZQGAP-UHFFFAOYSA-N 2-triethoxysilylethanol Chemical compound CCO[Si](CCO)(OCC)OCC ZHTLMPWATZQGAP-UHFFFAOYSA-N 0.000 description 1
- BOSZBTFBHSYELP-UHFFFAOYSA-N 2-trimethoxysilylethanol Chemical compound CO[Si](OC)(OC)CCO BOSZBTFBHSYELP-UHFFFAOYSA-N 0.000 description 1
- CCJXRLHGBZEQIB-UHFFFAOYSA-J 3,5-dioxohexanoate zirconium(4+) Chemical compound [Zr+4].CC(=O)CC(=O)CC([O-])=O.CC(=O)CC(=O)CC([O-])=O.CC(=O)CC(=O)CC([O-])=O.CC(=O)CC(=O)CC([O-])=O CCJXRLHGBZEQIB-UHFFFAOYSA-J 0.000 description 1
- FRIBMENBGGCKPD-UHFFFAOYSA-N 3-(2,3-dimethoxyphenyl)prop-2-enal Chemical compound COC1=CC=CC(C=CC=O)=C1OC FRIBMENBGGCKPD-UHFFFAOYSA-N 0.000 description 1
- HNNQYHFROJDYHQ-UHFFFAOYSA-N 3-(4-ethylcyclohexyl)propanoic acid 3-(3-ethylcyclopentyl)propanoic acid Chemical compound CCC1CCC(CCC(O)=O)C1.CCC1CCC(CCC(O)=O)CC1 HNNQYHFROJDYHQ-UHFFFAOYSA-N 0.000 description 1
- PRNMXSACOXQQRF-UHFFFAOYSA-N 3-amino-3-oxoprop-1-ene-2-sulfonic acid Chemical compound NC(=O)C(=C)S(O)(=O)=O PRNMXSACOXQQRF-UHFFFAOYSA-N 0.000 description 1
- KSCAZPYHLGGNPZ-UHFFFAOYSA-N 3-chloropropyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)CCCCl KSCAZPYHLGGNPZ-UHFFFAOYSA-N 0.000 description 1
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 1
- QOXOZONBQWIKDA-UHFFFAOYSA-N 3-hydroxypropyl Chemical group [CH2]CCO QOXOZONBQWIKDA-UHFFFAOYSA-N 0.000 description 1
- FMGBDYLOANULLW-UHFFFAOYSA-N 3-isocyanatopropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCN=C=O FMGBDYLOANULLW-UHFFFAOYSA-N 0.000 description 1
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 1
- LDMRLRNXHLPZJN-UHFFFAOYSA-N 3-propoxypropan-1-ol Chemical compound CCCOCCCO LDMRLRNXHLPZJN-UHFFFAOYSA-N 0.000 description 1
- NMUBRRLYMADSGF-UHFFFAOYSA-N 3-triethoxysilylpropan-1-ol Chemical compound CCO[Si](OCC)(OCC)CCCO NMUBRRLYMADSGF-UHFFFAOYSA-N 0.000 description 1
- DCQBZYNUSLHVJC-UHFFFAOYSA-N 3-triethoxysilylpropane-1-thiol Chemical compound CCO[Si](OCC)(OCC)CCCS DCQBZYNUSLHVJC-UHFFFAOYSA-N 0.000 description 1
- XDQWJFXZTAWJST-UHFFFAOYSA-N 3-triethoxysilylpropyl prop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C=C XDQWJFXZTAWJST-UHFFFAOYSA-N 0.000 description 1
- LVNLBBGBASVLLI-UHFFFAOYSA-N 3-triethoxysilylpropylurea Chemical compound CCO[Si](OCC)(OCC)CCCNC(N)=O LVNLBBGBASVLLI-UHFFFAOYSA-N 0.000 description 1
- YATIYDNBFHEOFA-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-ol Chemical compound CO[Si](OC)(OC)CCCO YATIYDNBFHEOFA-UHFFFAOYSA-N 0.000 description 1
- LVACOMKKELLCHJ-UHFFFAOYSA-N 3-trimethoxysilylpropylurea Chemical compound CO[Si](OC)(OC)CCCNC(N)=O LVACOMKKELLCHJ-UHFFFAOYSA-N 0.000 description 1
- MKTOIPPVFPJEQO-UHFFFAOYSA-N 4-(3-carboxypropanoylperoxy)-4-oxobutanoic acid Chemical compound OC(=O)CCC(=O)OOC(=O)CCC(O)=O MKTOIPPVFPJEQO-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- AAFBMECIUXRJMV-UHFFFAOYSA-N 4-ethenyl-1,2-diethylbenzene Chemical compound CCC1=CC=C(C=C)C=C1CC AAFBMECIUXRJMV-UHFFFAOYSA-N 0.000 description 1
- PMZXJPLGCUVUDN-UHFFFAOYSA-N 4-ethenyl-1,2-dimethylbenzene Chemical compound CC1=CC=C(C=C)C=C1C PMZXJPLGCUVUDN-UHFFFAOYSA-N 0.000 description 1
- ZOTKGMAKADCEDH-UHFFFAOYSA-N 5-triethoxysilylpentane-1,3-diamine Chemical compound CCO[Si](OCC)(OCC)CCC(N)CCN ZOTKGMAKADCEDH-UHFFFAOYSA-N 0.000 description 1
- GZVHEAJQGPRDLQ-UHFFFAOYSA-N 6-phenyl-1,3,5-triazine-2,4-diamine Chemical compound NC1=NC(N)=NC(C=2C=CC=CC=2)=N1 GZVHEAJQGPRDLQ-UHFFFAOYSA-N 0.000 description 1
- LPEKGGXMPWTOCB-UHFFFAOYSA-N 8beta-(2,3-epoxy-2-methylbutyryloxy)-14-acetoxytithifolin Natural products COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 1
- 102100026788 ATP synthase subunit C lysine N-methyltransferase Human genes 0.000 description 1
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Natural products CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 208000035285 Allergic Seasonal Rhinitis Diseases 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 1
- XPBMWYYSZGVZFD-UHFFFAOYSA-N CCCCCCCCCCCCCCCC[Si](C)(CCCCCCCCCCCCCCCC)CCCCCCCCCCCCCCCC Chemical compound CCCCCCCCCCCCCCCC[Si](C)(CCCCCCCCCCCCCCCC)CCCCCCCCCCCCCCCC XPBMWYYSZGVZFD-UHFFFAOYSA-N 0.000 description 1
- 101100069231 Caenorhabditis elegans gkow-1 gene Proteins 0.000 description 1
- UBWJFFDWMWEDSK-UHFFFAOYSA-N ClC1(C=C)CC=CC=C1Cl Chemical compound ClC1(C=C)CC=CC=C1Cl UBWJFFDWMWEDSK-UHFFFAOYSA-N 0.000 description 1
- 229910020599 Co 3 O 4 Inorganic materials 0.000 description 1
- 229910019001 CoSi Inorganic materials 0.000 description 1
- 229910019974 CrSi Inorganic materials 0.000 description 1
- IEPRKVQEAMIZSS-UHFFFAOYSA-N Di-Et ester-Fumaric acid Natural products CCOC(=O)C=CC(=O)OCC IEPRKVQEAMIZSS-UHFFFAOYSA-N 0.000 description 1
- MQIUGAXCHLFZKX-UHFFFAOYSA-N Di-n-octyl phthalate Natural products CCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC MQIUGAXCHLFZKX-UHFFFAOYSA-N 0.000 description 1
- IEPRKVQEAMIZSS-WAYWQWQTSA-N Diethyl maleate Chemical compound CCOC(=O)\C=C/C(=O)OCC IEPRKVQEAMIZSS-WAYWQWQTSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- 229910000737 Duralumin Inorganic materials 0.000 description 1
- 239000004593 Epoxy Chemical class 0.000 description 1
- XXRCUYVCPSWGCC-UHFFFAOYSA-N Ethyl pyruvate Chemical compound CCOC(=O)C(C)=O XXRCUYVCPSWGCC-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 229910005329 FeSi 2 Inorganic materials 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 101000833848 Homo sapiens ATP synthase subunit C lysine N-methyltransferase Proteins 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910000673 Indium arsenide Inorganic materials 0.000 description 1
- IJMWOMHMDSDKGK-UHFFFAOYSA-N Isopropyl propionate Chemical compound CCC(=O)OC(C)C IJMWOMHMDSDKGK-UHFFFAOYSA-N 0.000 description 1
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 1
- 229910019018 Mg 2 Si Inorganic materials 0.000 description 1
- 229910020068 MgAl Inorganic materials 0.000 description 1
- 229910017028 MnSi Inorganic materials 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- OHLUUHNLEMFGTQ-UHFFFAOYSA-N N-methylacetamide Chemical compound CNC(C)=O OHLUUHNLEMFGTQ-UHFFFAOYSA-N 0.000 description 1
- 229920000557 Nafion® Polymers 0.000 description 1
- IOVCWXUNBOPUCH-UHFFFAOYSA-N Nitrous acid Chemical compound ON=O IOVCWXUNBOPUCH-UHFFFAOYSA-N 0.000 description 1
- 229910018605 Ni—Zn Inorganic materials 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- QVHMSMOUDQXMRS-UHFFFAOYSA-N PPG n4 Chemical compound CC(O)COC(C)COC(C)COC(C)CO QVHMSMOUDQXMRS-UHFFFAOYSA-N 0.000 description 1
- 229910002665 PbTe Inorganic materials 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229910017784 Sb In Inorganic materials 0.000 description 1
- 229910017838 Sb—In Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 229910018956 Sn—In Inorganic materials 0.000 description 1
- 229910002367 SrTiO Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000002174 Styrene-butadiene Substances 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical group [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 229910007657 ZnSb Inorganic materials 0.000 description 1
- 229910007709 ZnTe Inorganic materials 0.000 description 1
- 229910006501 ZrSiO Inorganic materials 0.000 description 1
- RQVFGTYFBUVGOP-UHFFFAOYSA-N [acetyloxy(dimethyl)silyl] acetate Chemical compound CC(=O)O[Si](C)(C)OC(C)=O RQVFGTYFBUVGOP-UHFFFAOYSA-N 0.000 description 1
- RMKZLFMHXZAGTM-UHFFFAOYSA-N [dimethoxy(propyl)silyl]oxymethyl prop-2-enoate Chemical compound CCC[Si](OC)(OC)OCOC(=O)C=C RMKZLFMHXZAGTM-UHFFFAOYSA-N 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 238000002479 acid--base titration Methods 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 150000008360 acrylonitriles Chemical class 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000003905 agrochemical Substances 0.000 description 1
- 238000004887 air purification Methods 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 description 1
- 239000004844 aliphatic epoxy resin Substances 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001346 alkyl aryl ethers Chemical class 0.000 description 1
- 150000008051 alkyl sulfates Chemical class 0.000 description 1
- 239000013566 allergen Substances 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 150000004645 aluminates Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 1
- 239000002280 amphoteric surfactant Substances 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 230000003373 anti-fouling effect Effects 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 235000010323 ascorbic acid Nutrition 0.000 description 1
- 229960005070 ascorbic acid Drugs 0.000 description 1
- 239000011668 ascorbic acid Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
- BSDOQSMQCZQLDV-UHFFFAOYSA-N butan-1-olate;zirconium(4+) Chemical compound [Zr+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] BSDOQSMQCZQLDV-UHFFFAOYSA-N 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- 229940043232 butyl acetate Drugs 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 description 1
- BTMVHUNTONAYDX-UHFFFAOYSA-N butyl propionate Chemical compound CCCCOC(=O)CC BTMVHUNTONAYDX-UHFFFAOYSA-N 0.000 description 1
- XGZGKDQVCBHSGI-UHFFFAOYSA-N butyl(triethoxy)silane Chemical compound CCCC[Si](OCC)(OCC)OCC XGZGKDQVCBHSGI-UHFFFAOYSA-N 0.000 description 1
- SXPLZNMUBFBFIA-UHFFFAOYSA-N butyl(trimethoxy)silane Chemical compound CCCC[Si](OC)(OC)OC SXPLZNMUBFBFIA-UHFFFAOYSA-N 0.000 description 1
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 description 1
- 125000002843 carboxylic acid group Chemical group 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- ATGKAFZFOALBOF-UHFFFAOYSA-N cyclohexyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C1CCCCC1 ATGKAFZFOALBOF-UHFFFAOYSA-N 0.000 description 1
- MEWFSXFFGFDHGV-UHFFFAOYSA-N cyclohexyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C1CCCCC1 MEWFSXFFGFDHGV-UHFFFAOYSA-N 0.000 description 1
- UFULAYFCSOUIOV-UHFFFAOYSA-N cysteamine Chemical compound NCCS UFULAYFCSOUIOV-UHFFFAOYSA-N 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- DGPFXVBYDAVXLX-UHFFFAOYSA-N dibutyl(diethoxy)silane Chemical compound CCCC[Si](OCC)(OCC)CCCC DGPFXVBYDAVXLX-UHFFFAOYSA-N 0.000 description 1
- YPENMAABQGWRBR-UHFFFAOYSA-N dibutyl(dimethoxy)silane Chemical compound CCCC[Si](OC)(OC)CCCC YPENMAABQGWRBR-UHFFFAOYSA-N 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- ZMAPKOCENOWQRE-UHFFFAOYSA-N diethoxy(diethyl)silane Chemical compound CCO[Si](CC)(CC)OCC ZMAPKOCENOWQRE-UHFFFAOYSA-N 0.000 description 1
- NRMUHDACMQEQMT-UHFFFAOYSA-N diethoxy(diheptyl)silane Chemical compound CCCCCCC[Si](OCC)(OCC)CCCCCCC NRMUHDACMQEQMT-UHFFFAOYSA-N 0.000 description 1
- UDFQIGODCFRNJY-UHFFFAOYSA-N diethoxy(dihexyl)silane Chemical compound CCCCCC[Si](OCC)(OCC)CCCCCC UDFQIGODCFRNJY-UHFFFAOYSA-N 0.000 description 1
- YETKAVVSNLUTEQ-UHFFFAOYSA-N diethoxy(dioctyl)silane Chemical compound CCCCCCCC[Si](OCC)(OCC)CCCCCCCC YETKAVVSNLUTEQ-UHFFFAOYSA-N 0.000 description 1
- VDXFKFNGIDWIQQ-UHFFFAOYSA-N diethoxy(dipentyl)silane Chemical compound CCCCC[Si](OCC)(OCC)CCCCC VDXFKFNGIDWIQQ-UHFFFAOYSA-N 0.000 description 1
- HZLIIKNXMLEWPA-UHFFFAOYSA-N diethoxy(dipropyl)silane Chemical compound CCC[Si](CCC)(OCC)OCC HZLIIKNXMLEWPA-UHFFFAOYSA-N 0.000 description 1
- VSYLGGHSEIWGJV-UHFFFAOYSA-N diethyl(dimethoxy)silane Chemical compound CC[Si](CC)(OC)OC VSYLGGHSEIWGJV-UHFFFAOYSA-N 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- DZBCKWWFOPPOCW-UHFFFAOYSA-N diheptyl(dimethoxy)silane Chemical compound CCCCCCC[Si](OC)(OC)CCCCCCC DZBCKWWFOPPOCW-UHFFFAOYSA-N 0.000 description 1
- CYICXDQJFWXGTC-UHFFFAOYSA-N dihexyl(dimethoxy)silane Chemical compound CCCCCC[Si](OC)(OC)CCCCCC CYICXDQJFWXGTC-UHFFFAOYSA-N 0.000 description 1
- TYXIAHKLJMLPIP-UHFFFAOYSA-N dimethoxy(dioctyl)silane Chemical compound CCCCCCCC[Si](OC)(OC)CCCCCCCC TYXIAHKLJMLPIP-UHFFFAOYSA-N 0.000 description 1
- LXAPXYULCIKKNK-UHFFFAOYSA-N dimethoxy(dipentyl)silane Chemical compound CCCCC[Si](OC)(OC)CCCCC LXAPXYULCIKKNK-UHFFFAOYSA-N 0.000 description 1
- JVUVKQDVTIIMOD-UHFFFAOYSA-N dimethoxy(dipropyl)silane Chemical compound CCC[Si](OC)(OC)CCC JVUVKQDVTIIMOD-UHFFFAOYSA-N 0.000 description 1
- LDCRTTXIJACKKU-ARJAWSKDSA-N dimethyl maleate Chemical compound COC(=O)\C=C/C(=O)OC LDCRTTXIJACKKU-ARJAWSKDSA-N 0.000 description 1
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- GVGUFUZHNYFZLC-UHFFFAOYSA-N dodecyl benzenesulfonate;sodium Chemical compound [Na].CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 GVGUFUZHNYFZLC-UHFFFAOYSA-N 0.000 description 1
- KWKXNDCHNDYVRT-UHFFFAOYSA-N dodecylbenzene Chemical compound CCCCCCCCCCCCC1=CC=CC=C1 KWKXNDCHNDYVRT-UHFFFAOYSA-N 0.000 description 1
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000003487 electrochemical reaction Methods 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- DECIPOUIJURFOJ-UHFFFAOYSA-N ethoxyquin Chemical compound N1C(C)(C)C=C(C)C2=CC(OCC)=CC=C21 DECIPOUIJURFOJ-UHFFFAOYSA-N 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 description 1
- IJUHLFUALMUWOM-UHFFFAOYSA-N ethyl 3-methoxypropanoate Chemical compound CCOC(=O)CCOC IJUHLFUALMUWOM-UHFFFAOYSA-N 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- 229940117360 ethyl pyruvate Drugs 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000002783 friction material Substances 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 229910052949 galena Inorganic materials 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- VPVSTMAPERLKKM-UHFFFAOYSA-N glycoluril Chemical compound N1C(=O)NC2NC(=O)NC21 VPVSTMAPERLKKM-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 239000010440 gypsum Substances 0.000 description 1
- 229910052602 gypsum Inorganic materials 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- VRINOTYEGADLMW-UHFFFAOYSA-N heptyl(trimethoxy)silane Chemical compound CCCCCCC[Si](OC)(OC)OC VRINOTYEGADLMW-UHFFFAOYSA-N 0.000 description 1
- ACCCMOQWYVYDOT-UHFFFAOYSA-N hexane-1,1-diol Chemical compound CCCCCC(O)O ACCCMOQWYVYDOT-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- CZWLNMOIEMTDJY-UHFFFAOYSA-N hexyl(trimethoxy)silane Chemical compound CCCCCC[Si](OC)(OC)OC CZWLNMOIEMTDJY-UHFFFAOYSA-N 0.000 description 1
- 229940079826 hydrogen sulfite Drugs 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 230000005661 hydrophobic surface Effects 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- WPYVAWXEWQSOGY-UHFFFAOYSA-N indium antimonide Chemical compound [Sb]#[In] WPYVAWXEWQSOGY-UHFFFAOYSA-N 0.000 description 1
- RPQDHPTXJYYUPQ-UHFFFAOYSA-N indium arsenide Chemical compound [In]#[As] RPQDHPTXJYYUPQ-UHFFFAOYSA-N 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 229910003471 inorganic composite material Inorganic materials 0.000 description 1
- 229910017053 inorganic salt Inorganic materials 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 1
- 229940117955 isoamyl acetate Drugs 0.000 description 1
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 1
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 1
- 229940011051 isopropyl acetate Drugs 0.000 description 1
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-N isovaleric acid Chemical compound CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 description 1
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- 150000003903 lactic acid esters Chemical class 0.000 description 1
- 150000002596 lactones Chemical class 0.000 description 1
- 210000000265 leukocyte Anatomy 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- FSQQTNAZHBEJLS-UPHRSURJSA-N maleamic acid Chemical compound NC(=O)\C=C/C(O)=O FSQQTNAZHBEJLS-UPHRSURJSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 229960003151 mercaptamine Drugs 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- HSDFKDZBJMDHFF-UHFFFAOYSA-N methyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OC HSDFKDZBJMDHFF-UHFFFAOYSA-N 0.000 description 1
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- CWKLZLBVOJRSOM-UHFFFAOYSA-N methyl pyruvate Chemical compound COC(=O)C(C)=O CWKLZLBVOJRSOM-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- ZIUHHBKFKCYYJD-UHFFFAOYSA-N n,n'-methylenebisacrylamide Chemical compound C=CC(=O)NCNC(=O)C=C ZIUHHBKFKCYYJD-UHFFFAOYSA-N 0.000 description 1
- ZKECVHXIVHRIIA-UHFFFAOYSA-N n-(2,2,6,6-tetramethylpiperidin-1-yl)prop-2-enamide Chemical compound CC1(C)CCCC(C)(C)N1NC(=O)C=C ZKECVHXIVHRIIA-UHFFFAOYSA-N 0.000 description 1
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
- 125000006606 n-butoxy group Chemical group 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003506 n-propoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000011146 organic particle Substances 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- JRKICGRDRMAZLK-UHFFFAOYSA-L persulfate group Chemical group S(=O)(=O)([O-])OOS(=O)(=O)[O-] JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920003217 poly(methylsilsesquioxane) Polymers 0.000 description 1
- 229920001515 polyalkylene glycol Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 238000012643 polycondensation polymerization Methods 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006149 polyester-amide block copolymer Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 1
- YLLIGHVCTUPGEH-UHFFFAOYSA-M potassium;ethanol;hydroxide Chemical compound [OH-].[K+].CCO YLLIGHVCTUPGEH-UHFFFAOYSA-M 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- KIWATKANDHUUOB-UHFFFAOYSA-N propan-2-yl 2-hydroxypropanoate Chemical compound CC(C)OC(=O)C(C)O KIWATKANDHUUOB-UHFFFAOYSA-N 0.000 description 1
- BWJUFXUULUEGMA-UHFFFAOYSA-N propan-2-yl propan-2-yloxycarbonyloxy carbonate Chemical compound CC(C)OC(=O)OOC(=O)OC(C)C BWJUFXUULUEGMA-UHFFFAOYSA-N 0.000 description 1
- UMSVPCYSAUKCAZ-UHFFFAOYSA-N propane;hydrochloride Chemical compound Cl.CCC UMSVPCYSAUKCAZ-UHFFFAOYSA-N 0.000 description 1
- ILVGAIQLOCKNQA-UHFFFAOYSA-N propyl 2-hydroxypropanoate Chemical compound CCCOC(=O)C(C)O ILVGAIQLOCKNQA-UHFFFAOYSA-N 0.000 description 1
- FIZASKUCFJIPAW-UHFFFAOYSA-N propyl 3-oxobutaneperoxoate titanium Chemical compound [Ti].C(C)(=O)CC(=O)OOCCC.C(C)(=O)CC(=O)OOCCC FIZASKUCFJIPAW-UHFFFAOYSA-N 0.000 description 1
- DHGFMVMDBNLMKT-UHFFFAOYSA-N propyl 3-oxobutanoate Chemical compound CCCOC(=O)CC(C)=O DHGFMVMDBNLMKT-UHFFFAOYSA-N 0.000 description 1
- NSFXUCGTDFXHRK-UHFFFAOYSA-N propyl 3-oxohexaneperoxoate;titanium Chemical compound [Ti].CCCOOC(=O)CC(=O)CCC.CCCOOC(=O)CC(=O)CCC NSFXUCGTDFXHRK-UHFFFAOYSA-N 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- 229940032159 propylene carbonate Drugs 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 239000012966 redox initiator Substances 0.000 description 1
- XWGJFPHUCFXLBL-UHFFFAOYSA-M rongalite Chemical compound [Na+].OCS([O-])=O XWGJFPHUCFXLBL-UHFFFAOYSA-M 0.000 description 1
- 125000005920 sec-butoxy group Chemical group 0.000 description 1
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 239000010454 slate Substances 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 description 1
- CHQMHPLRPQMAMX-UHFFFAOYSA-L sodium persulfate Substances [Na+].[Na+].[O-]S(=O)(=O)OOS([O-])(=O)=O CHQMHPLRPQMAMX-UHFFFAOYSA-L 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000006228 supernatant Substances 0.000 description 1
- 239000012756 surface treatment agent Substances 0.000 description 1
- OCGWQDWYSQAFTO-UHFFFAOYSA-N tellanylidenelead Chemical compound [Pb]=[Te] OCGWQDWYSQAFTO-UHFFFAOYSA-N 0.000 description 1
- AGRBXKCSGCUXST-UHFFFAOYSA-N tert-butyl 7-amino-3,4-dihydro-1h-isoquinoline-2-carboxylate Chemical compound C1=C(N)C=C2CN(C(=O)OC(C)(C)C)CCC2=C1 AGRBXKCSGCUXST-UHFFFAOYSA-N 0.000 description 1
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 description 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- FAGUFWYHJQFNRV-UHFFFAOYSA-N tetraethylenepentamine Chemical compound NCCNCCNCCNCCN FAGUFWYHJQFNRV-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- HVOGPVOEUNADCC-UHFFFAOYSA-N triethoxy(3,3,3-trifluoropropyl)silane trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F.CCO[Si](OCC)(OCC)CCC(F)(F)F HVOGPVOEUNADCC-UHFFFAOYSA-N 0.000 description 1
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- UDUKMRHNZZLJRB-UHFFFAOYSA-N triethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OCC)(OCC)OCC)CCC2OC21 UDUKMRHNZZLJRB-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- NMEPHPOFYLLFTK-UHFFFAOYSA-N trimethoxy(octyl)silane Chemical compound CCCCCCCC[Si](OC)(OC)OC NMEPHPOFYLLFTK-UHFFFAOYSA-N 0.000 description 1
- HILHCDFHSDUYNX-UHFFFAOYSA-N trimethoxy(pentyl)silane Chemical compound CCCCC[Si](OC)(OC)OC HILHCDFHSDUYNX-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- DOICFEXUJKISKP-UHFFFAOYSA-L triphenylstannyl n-[2-(triphenylstannylsulfanylcarbothioylamino)ethyl]carbamodithioate Chemical class C=1C=CC=CC=1[Sn](C=1C=CC=CC=1)(C=1C=CC=CC=1)SC(=S)NCCNC(=S)S[Sn](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 DOICFEXUJKISKP-UHFFFAOYSA-L 0.000 description 1
- OBROYCQXICMORW-UHFFFAOYSA-N tripropoxyalumane Chemical compound [Al+3].CCC[O-].CCC[O-].CCC[O-] OBROYCQXICMORW-UHFFFAOYSA-N 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 150000003755 zirconium compounds Chemical class 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Graft Or Block Polymers (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
Description
本発明は、分子中に親水性基を有する重合体を含む水系分散体に関するもので、さらに詳細には、バインダー、コーティング材、電池セパレーターへのコーティング材、好ましくは電池用電解質、燃料電池用高分子固体電解質、固体コンデンサー、イオン交換膜、各種センサーなどに利用可能なスルホン酸基含有水系分散体に関する。 The present invention relates to an aqueous dispersion containing a polymer having a hydrophilic group in the molecule. More specifically, the present invention relates to a binder, a coating material, a coating material for a battery separator, preferably a battery electrolyte, a fuel cell The present invention relates to a sulfonic acid group-containing aqueous dispersion that can be used for a molecular solid electrolyte, a solid capacitor, an ion exchange membrane, various sensors, and the like.
従来、スルホン酸基、カルボキシル基(カルボン酸基)、リン酸基などの、親水性基を有する重合体が知られており、界面活性剤、乳化剤、分散剤、高分子固体電解質、イオン交換膜などに利用されている。一方、近年、このような親水性基の分散性、親水性、イオン捕捉性、小さな体積抵抗(以下、小抵抗性ということがある。)、基材への密着性といった特徴を活かして、バインダー樹脂、コーティング材、表面処理剤、電池用電解質への応用が検討されている。特に、スルホン酸基含有ポリマーは、スルホン酸基の有する強イオン性のため、上記の特徴が発現しやすく、その応用性が注目されている。例えば、特許文献1あるいは特許文献2には、アクリルアミドスルホン酸を共重合したポリマーのイオン交換膜あるいは燃料電池用高分子電解質への応用が提案されている。 Conventionally, polymers having hydrophilic groups such as sulfonic acid groups, carboxyl groups (carboxylic acid groups), and phosphoric acid groups are known. Surfactants, emulsifiers, dispersants, polymer solid electrolytes, ion exchange membranes It is used for such as. On the other hand, in recent years, binders have been utilized by taking advantage of such characteristics as dispersibility of hydrophilic groups, hydrophilicity, ion trapping properties, small volume resistance (hereinafter sometimes referred to as small resistance), and adhesion to substrates. Applications to resins, coating materials, surface treatment agents, and battery electrolytes are being studied. In particular, a sulfonic acid group-containing polymer has the strong ionic property of a sulfonic acid group, and thus easily exhibits the above characteristics, and its applicability has been attracting attention. For example, Patent Document 1 or Patent Document 2 proposes application of a polymer copolymerized with acrylamide sulfonic acid to an ion exchange membrane or a polymer electrolyte for a fuel cell.
しかしながら、スルホン酸基などの親水性基含有ポリマーは、その親水性基が有する親水性、換言すれば水溶性という性質上、親水性基の含有量がある程度以上高い場合には、水に対する耐性が大きく低下し、例えば膜材料、バインダー材、あるいはコーティング材として使用した場合に、水の存在下で著しく膨張し、その結果、膜の機械的強度が大幅に低下したり、基材からの剥離が生じやすくなり、耐久性が低下するといったような問題がある。このため親水性基の含有量が制限され、小抵抗性、親水性といった特徴を十分発揮するには至らなかった。 However, a hydrophilic group-containing polymer such as a sulfonic acid group is resistant to water when the content of the hydrophilic group is higher than a certain level due to the hydrophilic property of the hydrophilic group, in other words, water solubility. For example, when used as a film material, binder material, or coating material, the film significantly expands in the presence of water, resulting in a significant decrease in the mechanical strength of the film or peeling from the substrate. There is a problem that it tends to occur and the durability is lowered. For this reason, the content of the hydrophilic group is limited, and the characteristics such as small resistance and hydrophilicity have not been sufficiently exhibited.
また、比較的耐水性の良いスルホン酸基含有材料として有機無機複合系の材料が、特許文献3、特許文献4及び特許文献5に開示されている。しかしながら、これらの材料は、成膜性に劣るという欠点があった。また、近年の環境問題への配慮から有機溶剤を減らすことができる水系材料が求められているものの、有機無機複合体からなるスルホン酸基含有水系材料は工業的に使用できるレベルにまで実用化されていない。
本発明の目的は、十分な耐水性を保持したまま親水性基含有率を高め、体積抵抗が小さく、成膜性が向上したスルホン酸基含有水系分散体を提供することにある。 An object of the present invention is to provide a sulfonic acid group-containing aqueous dispersion in which hydrophilic group content is increased while maintaining sufficient water resistance, volume resistance is small, and film formability is improved.
本発明は、ポリオルガノシロキサンを必須成分として含む重合体粒子および水系媒体を含む水系分散体であって、さらにスルホン酸基を含む水系分散体を提供するものである。
本発明の水系分散体においては、前記重合体粒子の平均粒子径が0.002〜1μmであることが好ましく、また、前記スルホン酸基が0.2〜5mmol/g含まれていることが好ましい。さらに、本発明の水系分散体では、水系媒体を蒸発させて得られる固体の体積抵抗が10-2〜103Ω・cmであることが好ましい。
The present invention provides an aqueous dispersion containing polymer particles containing polyorganosiloxane as essential components and an aqueous medium, and further containing an aqueous dispersion containing a sulfonic acid group.
In the aqueous dispersion of the present invention, the average particle diameter of the polymer particles is preferably 0.002 to 1 μm, and the sulfonic acid group is preferably contained in an amount of 0.2 to 5 mmol / g. . Furthermore, in the aqueous dispersion of the present invention, the volume resistance of the solid obtained by evaporating the aqueous medium is preferably 10 −2 to 10 3 Ω · cm.
また、本発明によれば、下記(A)〜(D)成分を混合し、エマルジョンの平均粒子径を1μm以下に微細化する工程を含み、必要に応じてラジカル重合を行なうことにより水系分散体を得る、水系分散体の製造方法が提供される。
(A)一般式(1)
(R1)n−Si−(OR2)4-n……(1)
(式中、R1は2個存在するときは同一または異なり、フェニル基または炭素数1〜8の1価の有機基、R2は同一または異なり、炭素数1〜5のアルキル基または炭素数1〜6のアシル基を示し、nは0〜2の整数である)
で表されるオルガノシラン、その加水分解物およびその縮合物の群から選ばれた少なくとも1種を1〜100重量部
(B)ラジカル重合性モノマー99〜0重量部[ただし、(A)+(B)=100重量部]
(C)乳化剤0.1〜50重量部[ただし、(A)+(B)=100重量部に対して]
(D)水50〜2,000重量部[ただし、(A)+(B)=100重量部に対して]
上記した水系分散体の製造方法においては、前記(A)〜(D)成分を混合し、エマルジョンの平均粒子径を1μm以下に微細化する前および/または後において、該(A)成分の加水分解・縮合反応を促進する触媒(E)を併用することが好ましく、また、前記(B)成分を用いる場合において、ラジカル重合開始剤(F)を用いることが好ましい。
In addition, according to the present invention, the following (A) to (D) components are mixed, and an aqueous dispersion is obtained by performing radical polymerization as required, including the step of reducing the average particle size of the emulsion to 1 μm or less. A method for producing an aqueous dispersion is provided.
(A) General formula (1)
(R 1) n -Si- (OR 2) 4-n ...... (1)
(Wherein the same or different when R 1 is present twice, a monovalent organic group of the phenyl group or 1 to 8 carbon atoms, R 2 are the same or different, an alkyl group or a carbon number of 1 to 5 carbon atoms An acyl group of 1-6, n is an integer of 0-2)
1 to 100 parts by weight (B) radical polymerizable monomer 99 to 0 parts by weight [provided that (A) + ( B) = 100 parts by weight]
(C) 0.1-50 parts by weight of emulsifier [provided that (A) + (B) = 100 parts by weight]
(D) 50 to 2,000 parts by weight of water [provided that (A) + (B) = 100 parts by weight]
In the above-described method for producing an aqueous dispersion, the components (A) to (D) are mixed and before and / or after the average particle size of the emulsion is reduced to 1 μm or less, The catalyst (E) that promotes the decomposition / condensation reaction is preferably used in combination, and when the component (B) is used, the radical polymerization initiator (F) is preferably used.
本発明の水系分散体によれば、十分な耐水性を保持したまま親水性基含有率を高め、体積抵抗が小さく、成膜性が向上するという優れた効果を奏する。 According to the aqueous dispersion of the present invention, there are excellent effects that the hydrophilic group content is increased while maintaining sufficient water resistance, the volume resistance is small, and the film formability is improved.
以下、本発明について順次説明する。
<ポリオルガノシロキサン>
本発明の水系分散体はポリオルガノシロキサンを必須成分として含む。ポリオルガノシロキサンは、オルガノシランの加水分解物のシラノール基が縮合してSi−O−Si結合を形成したものであるが、本発明では、シラノール基がすべて縮合している必要はなく、一部のシラノール基が縮合したもの、縮合の程度が異なっているものの混合物などをも包含した概念である。
Hereinafter, the present invention will be sequentially described.
<Polyorganosiloxane>
The aqueous dispersion of the present invention contains polyorganosiloxane as an essential component. In the polyorganosiloxane, silanol groups of the hydrolyzate of organosilane are condensed to form Si—O—Si bonds, but in the present invention, it is not necessary that all of the silanol groups are condensed. It is also a concept that includes a mixture of those having a silanol group condensed or a mixture of those having different degrees of condensation.
ポリオルガノシロキサンのポリスチレン換算重量平均分子量(以下「Mw」という)は、好ましくは、800〜1,000,000、さらに好ましくは、1,000〜500,000である。ポリオルガノシロキサンのMwが800未満では水系分散体の貯蔵安定性に劣ることがあり、Mwが1,000,000を超えると成膜性が劣ることがある。なお、Mwは一般的な測定法として既に広く採用されているゲルパーミエーションクロマトグラフィー(GPCと略)法にてポリスチレンを標準物質に用いて測定される。 The polystyrene-converted weight average molecular weight (hereinafter referred to as “Mw”) of the polyorganosiloxane is preferably 800 to 1,000,000, and more preferably 1,000 to 500,000. When the Mw of the polyorganosiloxane is less than 800, the storage stability of the aqueous dispersion may be inferior, and when the Mw exceeds 1,000,000, the film formability may be inferior. Mw is measured using polystyrene as a standard substance by a gel permeation chromatography (abbreviated as GPC) method that has been widely adopted as a general measurement method.
ポリオルガノシロキサンの量は、水系分散体に含まれる全固形分中に、好ましくは1〜100重量%、さらに好ましくは10〜90重量%で含まれる。ポリオルガノシロキサンの量が、1重量%未満では耐水性に劣る。 The amount of the polyorganosiloxane is preferably 1 to 100% by weight, more preferably 10 to 90% by weight, based on the total solid content contained in the aqueous dispersion. When the amount of the polyorganosiloxane is less than 1% by weight, the water resistance is poor.
<平均粒子径>
本発明の水系分散体は、ポリオルガノシロキサンを必須成分として含む、好ましくは平均粒子径が0.002〜0.5μm、さらに好ましくは0.01〜0.2μmの重合体粒子を含有する。なお、本発明において、重合体粒子の平均粒子径は、光散乱法に基づく測定により求められた体積平均粒子径とする。重合体粒子の平均粒子径が0.002μm未満では貯蔵安定性に劣り、0.5μmを超えると耐水性に劣ったり、貯蔵安定性に劣る場合がある。
<Average particle size>
The aqueous dispersion of the present invention contains polymer particles containing polyorganosiloxane as an essential component, preferably having an average particle diameter of 0.002 to 0.5 μm, more preferably 0.01 to 0.2 μm. In the present invention, the average particle diameter of the polymer particles is a volume average particle diameter determined by measurement based on the light scattering method. When the average particle diameter of the polymer particles is less than 0.002 μm, the storage stability is inferior, and when it exceeds 0.5 μm, the water resistance may be inferior or the storage stability may be inferior.
<スルホン酸基>
本発明のスルホン酸基含有水系分散体はスルホン酸基を含む。
水系分散体におけるスルホン酸基の存在場所は、重合体粒子の内部、重合体粒子の表面、水系媒体中などが挙げられる。スルホン酸基の存在形態は、ポリオルガノシロキサンと共有結合した形態、ポリオルガノシロキサン以外のポリマーと共有結合した形態、乳化剤や無機塩などの中に存在する形態が挙げられる。具体的なスルホン酸基の導入方法は後述の製造方法の説明において記載する。
スルホン酸基の量は、固形分中に好ましくは0.2〜5mmol/g、さらに好ましくは0.5〜4mmol/g、最も好ましくは1〜3mmol/gである。0.2mmol/g未満では体積抵抗が大きく、5mmol/gを超えると耐水性に劣る。
<Sulfonic acid group>
The sulfonic acid group-containing aqueous dispersion of the present invention contains a sulfonic acid group.
Examples of the location of the sulfonic acid group in the aqueous dispersion include the inside of the polymer particles, the surface of the polymer particles, and in the aqueous medium. Examples of the existence form of the sulfonic acid group include a form covalently bonded to the polyorganosiloxane, a form covalently bonded to a polymer other than the polyorganosiloxane, and a form present in an emulsifier or an inorganic salt. A specific method for introducing a sulfonic acid group will be described in the description of the production method described later.
The amount of the sulfonic acid group is preferably 0.2 to 5 mmol / g, more preferably 0.5 to 4 mmol / g, and most preferably 1 to 3 mmol / g in the solid content. If it is less than 0.2 mmol / g, the volume resistance is large, and if it exceeds 5 mmol / g, the water resistance is poor.
<水系媒体>
本発明の水系分散体における水系媒体は、本質的に水からなるが、場合により、アルコールなどの有機溶媒が数重量%程度まで含まれていてもよい。具体的な水の量や有機溶媒については後述の製造方法の説明において記載する。
<Aqueous medium>
The aqueous medium in the aqueous dispersion of the present invention consists essentially of water, but in some cases, an organic solvent such as alcohol may be contained up to about several weight percent. Specific amounts of water and organic solvents will be described later in the description of the production method.
<体積抵抗>
本発明の水系分散体は、乾燥後の固体の体積抵抗が好ましくは10-2〜103Ω・cm、さらに好ましくは10-2〜102Ω・cmである。本発明における乾燥後の固体の体積抵抗とは、水系分散体に必要に応じて後述の架橋剤、有機溶剤などを添加し、必要に応じて加熱しながら、水系分散体から水系媒体を蒸発させて得られる、厚みが1mm以下のフィルム状の固体を25℃の水中で24時間養生したときの体積抵抗をいう。本発明における体積抵抗は、25℃で湿潤した状態のフィルムに電極を接触させ、交流インピーダンスを測定することにより得られる。測定電極は電圧の負荷による化学反応を伴わないものが好ましく、例えば、白金が好ましい。抵抗測定器は一般的なインピーダンスメーターであれば、特に限定はなく、測定周波数は、例えば、1kHz程度である。
<Volume resistance>
The aqueous dispersion of the present invention preferably has a solid volume resistance after drying of 10 −2 to 10 3 Ω · cm, more preferably 10 −2 to 10 2 Ω · cm. The volume resistance of the solid after drying in the present invention means that the aqueous medium is evaporated from the aqueous dispersion while adding a crosslinking agent, an organic solvent, etc., which will be described later, to the aqueous dispersion, if necessary, and heating as necessary. This refers to the volume resistance when a film-like solid having a thickness of 1 mm or less is cured in water at 25 ° C. for 24 hours. The volume resistance in the present invention can be obtained by bringing an electrode into contact with a film wet at 25 ° C. and measuring the AC impedance. The measurement electrode is preferably one that does not involve a chemical reaction due to a voltage load, for example, platinum. The resistance measuring device is not particularly limited as long as it is a general impedance meter, and the measurement frequency is, for example, about 1 kHz.
<製造方法および製造方法における各成分について>
本発明の水系分散体は、下記(A)〜(D)成分、さらには必要に応じて(E)成分を混合し、エマルジョンの平均粒子径を1μm以下に微細化する工程を含み、さらに必要に応じて(F)成分を加えてラジカル重合を行なうことにより得られる。
<About each component in a manufacturing method and a manufacturing method>
The aqueous dispersion of the present invention includes the steps of mixing the following components (A) to (D), and further, if necessary, the component (E) to refine the average particle size of the emulsion to 1 μm or less. The component (F) is added according to the above and radical polymerization is performed.
(A)成分
本発明の水系分散体を構成する(A)成分におけるオルガノシラン(以下、「オルガノシラン(i)」ともいう。)は、一般に、下記一般式(1)で表される。
(R1)nSi(OR2)4-n……(1)
(式中、R1は、2個存在するときは同一または異なり、炭素数1〜8の1価の有機基を示し、R2は、同一または異なり、炭素数1〜5のアルキル基または炭素数1〜6のアシル基を示し、nは0〜2の整数である。)
Component (A) The organosilane (hereinafter also referred to as “organosilane (i)”) in the component (A) constituting the aqueous dispersion of the present invention is generally represented by the following general formula (1).
(R 1 ) n Si (OR 2 ) 4-n (1)
(In the formula, R 1, same or different when there are two pieces, a monovalent organic group having 1 to 8 carbon atoms, R 2 are the same or different, 1 to 5 carbon atoms alkyl group or a C An acyl group of 1 to 6 is shown, and n is an integer of 0 to 2.)
上記オルガノシラン(i)の加水分解物は、オルガノシランに2〜4個含まれる上記一般式(1)でいうところのOR2基がすべて加水分解されている必要はなく、例えば、1個だけが加水分解されているもの、2個以上が加水分解されているもの、あるいはこれらの混合物であってもよい。 The hydrolyzate of the organosilane (i) is not necessarily required to have all the OR 2 groups in the general formula (1) contained in the organosilane contained in 2 to 4 hydrolyzed, for example, only one. May be hydrolyzed, two or more may be hydrolyzed, or a mixture thereof.
また、上記オルガノシラン(i)の縮合物は、オルガノシランの加水分解物のシラノール基が縮合してSi−O−Si結合を形成したものであるが、本発明では、シラノール基がすべて縮合している必要はなく、僅かな一部のシラノール基が縮合したもの、縮合の程度が異なっているものの混合物などをも包含した概念である。 The organosilane (i) condensate is formed by condensation of silanol groups of organosilane hydrolyzate to form Si—O—Si bonds. In the present invention, all silanol groups are condensed. It is a concept that includes a mixture of a small part of silanol groups, a mixture of those having different degrees of condensation, and the like.
一般式(1)において、R1の炭素数1〜8の1価の有機基としては、例えば、メチル基、エチル基、n−プロピル基、i−プロピル基、n−ブチル基、i−ブチル基、sec−ブチル基、t−ブチル基、n−ヘキシル基、n−ヘプチル基、n−オクチル基、2−エチルヘキシル基などのアルキル基;アセチル基、プロピオニル基、ブチリル基、バレリル基、ベンゾイル基、トリオイル基、カプロイル基などのアシル基;ビニル基、アリル基、シクロヘキシル基、フェニル基、エポキシ基、グリシジル基、(メタ)アクリルオキシ基、ウレイド基、アミド基、フルオロアセトアミド基、イソシアナート基などのほか、これらの基の置換誘導体などを挙げることができる。 In the general formula (1), examples of the monovalent organic group having 1 to 8 carbon atoms of R 1 include a methyl group, an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group, and an i-butyl group. Group, sec-butyl group, t-butyl group, n-hexyl group, n-heptyl group, n-octyl group, 2-ethylhexyl group and other alkyl groups; acetyl group, propionyl group, butyryl group, valeryl group, benzoyl group Acyl groups such as trioyl group and caproyl group; vinyl group, allyl group, cyclohexyl group, phenyl group, epoxy group, glycidyl group, (meth) acryloxy group, ureido group, amide group, fluoroacetamide group, isocyanate group, etc. In addition to these, substituted derivatives of these groups can be mentioned.
R1の置換誘導体における置換基としては、例えば、ハロゲン原子、置換もしくは非置換のアミノ基、水酸基、メルカプト基、イソシアナート基、グリシドキシ基、3,4−エポキシシクロヘキシル基、(メタ)アクリルオキシ基、ウレイド基、アンモニウム塩基などを挙げることができる。ただし、これらの置換誘導体からなるR1の炭素数は、置換基中の炭素原子を含めて8以下である。 Examples of the substituent in the substituted derivative of R 1 include a halogen atom, a substituted or unsubstituted amino group, a hydroxyl group, a mercapto group, an isocyanate group, a glycidoxy group, a 3,4-epoxycyclohexyl group, and a (meth) acryloxy group. Ureido group, ammonium base and the like. However, the number of carbon atoms in R 1 consisting of substituted derivatives thereof is 8 or less including the carbon atoms in the substituent.
エポキシ基、メルカプト基、ビニル基などスルホン化によってスルホン酸基を導入できる官能基を含むR1を有する(A)成分を選択し、スルホン化することで、体積抵抗の小さい水系分散体を得ることができる。
一般式(1)中に、R1が2個存在するときは、相互に同一でも異なってもよい。
An aqueous dispersion having a small volume resistance is obtained by selecting and sulfonating the component (A) having R 1 containing a functional group capable of introducing a sulfonic acid group by sulfonation, such as an epoxy group, a mercapto group, or a vinyl group. Can do.
In the general formula (1), when two R 1 s are present, they may be the same as or different from each other.
また、R2の炭素数1〜5のアルキル基としては、例えば、メチル基、エチル基、n−プロピル基、i−プロピル基、n−ブチル基、sec−ブチル基、t−ブチル基、n−ペンチル基などを挙げることができ、炭素数1〜6のアシル基としては、例えば、アセチル基、プロピオニル基、ブチリル基、バレリル基、カプロイル基などを挙げることができる。
一般式(1)中に複数個存在するR2は、相互に同一でも異なっていてもよい。
Examples of the alkyl group having 1 to 5 carbon atoms of R 2 include a methyl group, an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group, a sec-butyl group, a t-butyl group, and n. -A pentyl group etc. can be mentioned, As a C1-C6 acyl group, an acetyl group, a propionyl group, a butyryl group, a valeryl group, a caproyl group etc. can be mentioned, for example.
A plurality of R 2 present in the general formula (1) may be the same as or different from each other.
このようなオルガノシランの具体例としては、テトラメトキシシラン、テトラエトキシシラン、テトラ−n−プロポキシシラン、テトラ−i−プロポキシシラン、テトラ−n−ブトキシシランなどのテトラアルコキシシラン類;メチルトリメトキシシラン、メチルトリエトキシシラン、エチルトリメトキシシラン、エチルトリエトキシシラン、n−プロピルトリメトキシシラン、n−プロピルトリエトキシシラン、i−プロピルトリメトキシシラン、i−プロピルトリエトキシシラン、n−ブチルトリメトキシシラン、n−ブチルトリエトキシシラン、n−ペンチルトリメトキシシラン、n−ヘキシルトリメトキシシラン、n−ヘプチルトリメトキシシラン、n−オクチルトリメトキシシラン、ビニルトリメトキシシラン、ビニルトリエトキシシラン、シクロヘキシルトリメトキシシラン、シクロヘキシルトリエトキシシラン、フェニルトリメトキシシラン、フェニルトリエトキシシラン、3−クロロプロピルトリメトキシシラン、3−クロロプロピルトリエトキシシラン、3,3,3−トリフルオロプロピルトリメトキシシラン、3,3,3−トリフルオロプロピルトリエトキシシラン、3−アミノプロピルトリメトキシシラン、3−アミノプロピルトリエトキシシラン、2−ヒドロキシエチルトリメトキシシラン、2−ヒドロキシエチルトリエトキシシラン、2−ヒドロキシプロピルトリメトキシシラン、2−ヒドロキシプロピルトリエトキシシラン、3−ヒドロキシプロピルトリメトキシシラン、3−ヒドロキシプロピルトリエトキシシラン、3−メルカプトプロピルトリメトキシシラン、3−メルカプトプロピルトリエトキシシラン、3−イソシアナートプロピルトリメトキシシラン、3−イソシアナートプロピルトリエトキシシラン、3−グリシドキシプロピルトリメトキシシラン、3−グリシドキシプロピルトリエトキシシラン、2−(3,4−エポキシシクロヘキシル)エチルトリメトキシシラン、2−(3,4−エポキシシクロヘキシル)エチルトリエトキシシラン、3−(メタ)アクリルオキシプロピルトリメトキシシラン、3−(メタ)アクリルオキシプロピルトリエトキシシラン、3−ウレイドプロピルトリメトキシシラン、3−ウレイドプロピルトリエトキシシランなどのトリアルコキシシラン類;ジメチルジメトキシシラン、ジメチルジエトキシシラン、ジエチルジメトキシシラン、ジエチルジエトキシシラン、ジ−n−プロピルジメトキシシラン、ジ−n−プロピルジエトキシシラン、ジ−i−プロピルジメトキシシラン、ジ−i−プロピルジエトキシシラン、ジ−n−ブチルジメトキシシラン、ジ−n−ブチルジエトキシシラン、ジ−n−ペンチルジメトキシシラン、ジ−n−ペンチルジエトキシシラン、ジ−n−ヘキシルジメトキシシラン、ジ−n−ヘキシルジエトキシシラン、ジ−n−ヘプチルジメトキシシラン、ジ−n−ヘプチルジエトキシシラン、ジ−n−オクチルジメトキシシラン、ジ−n−オクチルジエトキシシラン、ジ−n−シクロヘキシルジメトキシシラン、ジ−n−シクロヘキシルジエトキシシラン、ジフェニルジメトキシシラン、ジフェニルジエトキシシランなどのジアルコキシシラン類のほか、メチルトリアセチルオキシシラン、ジメチルジアセチルオキシシランなどを挙げることができる。 Specific examples of such organosilane include tetraalkoxysilanes such as tetramethoxysilane, tetraethoxysilane, tetra-n-propoxysilane, tetra-i-propoxysilane, tetra-n-butoxysilane; methyltrimethoxysilane , Methyltriethoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, n-propyltrimethoxysilane, n-propyltriethoxysilane, i-propyltrimethoxysilane, i-propyltriethoxysilane, n-butyltrimethoxysilane , N-butyltriethoxysilane, n-pentyltrimethoxysilane, n-hexyltrimethoxysilane, n-heptyltrimethoxysilane, n-octyltrimethoxysilane, vinyltrimethoxysilane, vinyltriethoxy Silane, cyclohexyltrimethoxysilane, cyclohexyltriethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, 3-chloropropyltrimethoxysilane, 3-chloropropyltriethoxysilane, 3,3,3-trifluoropropyltrimethoxysilane 3,3,3-trifluoropropyltriethoxysilane, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 2-hydroxyethyltrimethoxysilane, 2-hydroxyethyltriethoxysilane, 2-hydroxypropyl Trimethoxysilane, 2-hydroxypropyltriethoxysilane, 3-hydroxypropyltrimethoxysilane, 3-hydroxypropyltriethoxysilane, 3-mercaptopropyltrime Xysilane, 3-mercaptopropyltriethoxysilane, 3-isocyanatopropyltrimethoxysilane, 3-isocyanatopropyltriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyltriethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltriethoxysilane, 3- (meth) acryloxypropyltrimethoxysilane, 3- (meth) acryloxypropyltriethoxy Trialkoxysilanes such as silane, 3-ureidopropyltrimethoxysilane, 3-ureidopropyltriethoxysilane; dimethyldimethoxysilane, dimethyldiethoxysilane, diethyldimethoxysilane, diethyldi Ethoxysilane, di-n-propyldimethoxysilane, di-n-propyldiethoxysilane, di-i-propyldimethoxysilane, di-i-propyldiethoxysilane, di-n-butyldimethoxysilane, di-n-butyl Diethoxysilane, di-n-pentyldimethoxysilane, di-n-pentyldiethoxysilane, di-n-hexyldimethoxysilane, di-n-hexyldiethoxysilane, di-n-heptyldimethoxysilane, di-n- Heptyldiethoxysilane, di-n-octyldimethoxysilane, di-n-octyldiethoxysilane, di-n-cyclohexyldimethoxysilane, di-n-cyclohexyldiethoxysilane, diphenyldimethoxysilane, diphenyldiethoxysilane, etc. In addition to alkoxysilanes, methyltri Cetyl silane, dimethyl di acetyloxy silane can be exemplified.
これらのうち、好ましく用いられるのは、トリアルコキシシラン類、ジアルコキシシラン類であり、また、トリアルコキシシラン類としては、メチルトリメトキシシラン、メチルトリエトキシシラン、フェニルトリメトキシシラン、フェニルトリエトキシシランが好ましく、さらに、ジアルコキシシラン類としては、ジメチルジメトキシシラン、ジメチルジエトキシシラン、ジフェニルジメトキシシラン、ジフェニルジエトキシシランが好ましい。 Of these, trialkoxysilanes and dialkoxysilanes are preferably used, and examples of trialkoxysilanes include methyltrimethoxysilane, methyltriethoxysilane, phenyltrimethoxysilane, and phenyltriethoxysilane. Further, dialkoxysilanes are preferably dimethyldimethoxysilane, dimethyldiethoxysilane, diphenyldimethoxysilane, and diphenyldiethoxysilane.
(A)成分は、オルガノシラン(i)、該オルガノシランの加水分解物および該オルガノシランの縮合物から選ばれる少なくとも1種である。すなわち、(A)成分は、これら3種のうちの1種だけでもよいし、任意の2種の混合物であってもよいし、3種類すべてを含んだ混合物であっても良い。本発明においては、オルガノシランの縮合物を「ポリオルガノシロキサン」とも呼ぶ。本発明の水系分散体の製造における(A)成分として、ポリオルガノシロキサンを使用するとビニル化合物が重合する際の重合安定性が著しく向上し、高固形分で重合できるために工業化が容易であるという利点がある。 The component (A) is at least one selected from organosilane (i), a hydrolyzate of the organosilane, and a condensate of the organosilane. That is, the component (A) may be only one of these three types, a mixture of any two types, or a mixture including all three types. In the present invention, the condensate of organosilane is also referred to as “polyorganosiloxane”. When polyorganosiloxane is used as the component (A) in the production of the aqueous dispersion of the present invention, the polymerization stability when the vinyl compound is polymerized is remarkably improved, and it can be polymerized at a high solid content, so that it can be industrialized easily. There are advantages.
ポリオルガノシロキサンは、オルガノシランを予め加水分解・縮合させて、オルガノシランの縮合物として使用する。この際、ポリオルガノシロキサンを調製する際に、オルガノシランに適量の水、および必要に応じて、有機溶剤を添加することにより、オルガノシランを加水分解・縮合させることが好ましい。
ここで、水の使用量は、オルガノシラン1モルに対して、通常、1.2〜3.0モル、好ましくは1.3〜2.0モル程度である。
Polyorganosiloxane is used as a condensate of organosilane by previously hydrolyzing and condensing organosilane. At this time, when preparing the polyorganosiloxane, it is preferable to hydrolyze and condense the organosilane by adding an appropriate amount of water to the organosilane and, if necessary, an organic solvent.
Here, the usage-amount of water is 1.2-3.0 mol normally with respect to 1 mol of organosilane, Preferably it is about 1.3-2.0 mol.
また、この際、必要に応じて用いられる有機溶剤としては、ポリオルガノシロキサンや後記(B)成分を均一に混合できるものであれば特に限定されないが、例えば、アルコール類、芳香族炭化水素類、エーテル類、ケトン類、エステル類などを挙げることができる。 In this case, the organic solvent used as necessary is not particularly limited as long as it can uniformly mix the polyorganosiloxane and the later-described component (B). For example, alcohols, aromatic hydrocarbons, There may be mentioned ethers, ketones, esters and the like.
これらの有機溶剤のうち、アルコール類の具体例としては、メタノール、エタノール、n−プロピルアルコール、i−プロピルアルコール、n−ブチルアルコール、sec−ブチルアルコール、t−ブチルアルコール、n−ヘキシルアルコール、n−オクチルアルコール、エチレングリコール、ジエチレングリコール、トリエチレングリコール、エチレングリコールモノブチルエーテル、エチレングリコールモノエチルエーテルアセテート、ジエチレングリコールモノエチルエーテル、プロピレングリコールモノメチルエーテル、プロピレンモノメチルエーテルアセテート、ジアセトンアルコールなどを挙げることができる。 Among these organic solvents, specific examples of alcohols include methanol, ethanol, n-propyl alcohol, i-propyl alcohol, n-butyl alcohol, sec-butyl alcohol, t-butyl alcohol, n-hexyl alcohol, n -Octyl alcohol, ethylene glycol, diethylene glycol, triethylene glycol, ethylene glycol monobutyl ether, ethylene glycol monoethyl ether acetate, diethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene monomethyl ether acetate, diacetone alcohol and the like.
また、芳香族炭化水素類の具体例としては、ベンゼン、トルエン、キシレンなどを、エーテル類の具体例としては、テトラヒドロフラン、ジオキサンなどを、ケトン類の具体例としては、アセトン、メチルエチルケトン、メチルイソブチルケトン、ジイソブチルケトンなどを、エステル類の具体例としては、酢酸エチル、酢酸プロピル、酢酸ブチル、炭酸プロピレンなどを挙げることができる。
これらの有機溶剤は、単独でまたは2種以上を混合して使用することができる。
なお、ポリオルガノシロキサン中に有機溶媒を含む場合には、後記する縮合・重合反応の前に、この有機溶媒を水系分散体から除去しておくこともできる。
Specific examples of aromatic hydrocarbons include benzene, toluene and xylene, specific examples of ethers include tetrahydrofuran and dioxane, and specific examples of ketones include acetone, methyl ethyl ketone, and methyl isobutyl ketone. Specific examples of esters such as diisobutylketone and the like include ethyl acetate, propyl acetate, butyl acetate, and propylene carbonate.
These organic solvents can be used alone or in admixture of two or more.
When the organic solvent is contained in the polyorganosiloxane, the organic solvent can be removed from the aqueous dispersion before the condensation / polymerization reaction described later.
また、ポリオルガノシロキサンの市販品には、三菱化学社製のMKCシリケート、コルコート社製のエチルシリケート、東レ・ダウコーニング・シリコーン社製の変性シリコーンオイル(商品名:SFシリーズ、SHシリーズ)、GE東芝シリコーン社製の変性用シリコーンワニス(商品名:TSRシリーズ)、シリコーンレジン(商品名:TSRシリーズ)、ヒドロキシ末端ジメチルポリシロキサン(商品名:YFシリーズ)、信越化学工業社製のシリコーンアルコキシオリゴマー(商品名:Xシリーズ、KRシリーズ)、ダウコーニング・アジア社製のヒドロキシル基含有ポリジメチルシロキサン、日本ユニカー社製のNUC反応性シリコーンオイル(商品名:FZシリーズ)、昭和電工社製のグラスレジンなどがあり、これらをそのまま、またはさらに縮合させて使用してもよい。 Commercially available products of polyorganosiloxane include MKC silicate manufactured by Mitsubishi Chemical Corporation, ethyl silicate manufactured by Colcoat, modified silicone oils manufactured by Toray Dow Corning Silicone (trade names: SF series, SH series), GE Silicone varnish for modification made by Toshiba Silicone (trade name: TSR series), silicone resin (trade name: TSR series), hydroxy-terminated dimethylpolysiloxane (trade name: YF series), silicone alkoxy oligomer made by Shin-Etsu Chemical Co., Ltd. ( (Product name: X series, KR series), hydroxyl group-containing polydimethylsiloxane manufactured by Dow Corning Asia, NUC-reactive silicone oil (product name: FZ series) manufactured by Nihon Unicar, glass resin manufactured by Showa Denko There are , Or it may be used by further condensation.
(B)ラジカル重合性モノマー
(B)成分としては、ラジカル重合可能な不飽和二重結合を有するモノマーであれば、特に限定されるものではない。
(B) The radically polymerizable monomer (B) is not particularly limited as long as it is a monomer having an unsaturated double bond capable of radical polymerization.
(B)成分としては、例えば、(メタ)アクリル酸;メチル(メタ)アクリレート、 エチル(メタ)アクリレート、プロピル(メタ)アクリレート、n−ブチル(メタ)アクリレート、i−ブチル(メタ)アクリレート、t−ブチル(メタ)アクリルリレート、アミル(メタ)アクリレート、i−アミル(メタ)アクリレート、へキシル(メタ)アクリレート、2−エチルへキシル(メタ)アクリレート、n−オクチル(メタ)アクリレート、シクロヘキシルメタクリレートなどの(メタ)アクリル酸のエステル類;2−ヒドロキシエチル(メタ)アクリレート、2−ヒドロキシプロピル(メタ)アクリレート、3−ヒドロキシプロピル(メタ)アクリレートなどの水酸基含有(メタ)アクリル酸エステル類;エチレングリコールジ(メタ)アクリレート、ジエチレングリコールジ(メタ)アクリレート、トリエチレングリコールジ(メタ)アクリレート、テトラエチレングリコールジ(メタ)アクリレート、プロピレングリコールジ(メタ)アクリレート、ジプロピレングリコールジ(メタ)アクリレート、トリプロピレングリコールジ(メタ)アクリレート、 テトラプロピレングリコールジ(メタ)アクリレート、ブタンジオールジ(メタ)アクリレート、ヘキサンジオールジ(メタ)アクリレート、トリメチロールプロパントリ(メタ)アクリレート、ペンタエリスリトールテトラ(メタ)アクリレートなどの多官能性(メタ)アクリル酸エステル類;トリフルオロエチル(メタ)アクリレート、ヘキサフルオロイソプロピル(メタ)アクリレート、オクタフルオロペンチル(メタ)アクリレート、ペンタデカフルオロオクチル(メタ)アクリレートなどのフッ素原子含有(メタ)アクリルエステル類;2−アミノエチル(メタ)アクリレート、2−アミノプロピル(メタ)アクリレート、3−アミノプロピル(メタ)アクリレート、などのアミノ基含有(メタ)アクリルエステル類;グリシジル(メタ)アクリレートなどのエポキシ基含有(メタ)アクリル酸エステル類などの(メタ)アクリル化合物が挙げられる。 Examples of the component (B) include (meth) acrylic acid; methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, n-butyl (meth) acrylate, i-butyl (meth) acrylate, t -Butyl (meth) acrylylate, amyl (meth) acrylate, i-amyl (meth) acrylate, hexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, n-octyl (meth) acrylate, cyclohexyl methacrylate, etc. (Meth) acrylic acid esters; hydroxyl-containing (meth) acrylic acid esters such as 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, and 3-hydroxypropyl (meth) acrylate; ethylene glycol Di (meta) Acrylate, diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, dipropylene glycol di (meth) acrylate, tripropylene glycol di (meth) ) Acrylate, tetrapropylene glycol di (meth) acrylate, butanediol di (meth) acrylate, hexanediol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, polyfunctionality such as pentaerythritol tetra (meth) acrylate ( (Meth) acrylic acid esters; trifluoroethyl (meth) acrylate, hexafluoroisopropyl (meth) acrylate, octafluoropentyl Fluorine atom-containing (meth) acrylic esters such as (meth) acrylate and pentadecafluorooctyl (meth) acrylate; 2-aminoethyl (meth) acrylate, 2-aminopropyl (meth) acrylate, 3-aminopropyl (meth) Examples include amino group-containing (meth) acrylic esters such as acrylate; and (meth) acrylic compounds such as epoxy group-containing (meth) acrylic esters such as glycidyl (meth) acrylate.
そのほか、(B)成分としては、スチレン、α−メチルスチレン、4−メチルスチレン、2−メチルスチレン、3−メチルスチレン、4−メトキシスチレン、2−ヒドロキシメチルスチレン、4−エチルスチレン、4−エトキシスチレン、3,4−ジメチルスチレン、3,4−ジエチルスチレン、2−クロロスチレン、3−クロロスチレン、4−クロロ−3−メチルスチレン、4−t−ブチルスチレン、2,4−ジクロロスチレン、2,6−ジクロロスチレン、1−ビニルナフタレンなどの芳香族ビニル単量体; In addition, the component (B) includes styrene, α-methylstyrene, 4-methylstyrene, 2-methylstyrene, 3-methylstyrene, 4-methoxystyrene, 2-hydroxymethylstyrene, 4-ethylstyrene, 4-ethoxy. Styrene, 3,4-dimethylstyrene, 3,4-diethylstyrene, 2-chlorostyrene, 3-chlorostyrene, 4-chloro-3-methylstyrene, 4-t-butylstyrene, 2,4-dichlorostyrene, 2 Aromatic vinyl monomers such as 1,6-dichlorostyrene and 1-vinylnaphthalene;
テトラフロロエチレン、ヘキサフロロプロピレン、3,3,3−トリフロロプロピレン、クロロトリフロロエチレン、メチルトリフルオロビニルエーテル、エチルトリフルオロビニルエーテル、メトキシエチルトリフルオロビニルエーテル、エトキシエチルトリフルオロビニルエーテル、パーフロロ(メチルビニルエーテル)、パーフロロ(エチルビニルエーテル)、パーフロロ(プロピルビニルエーテル)、パーフロロ(ブチルビニルエーテル)、パーフロロ(イソブチルビニルエーテル)、パーフロロ(プロポキシプロピルビニルエーテル)などのフルオロオレフィンおよびフルオロオレフィン誘導体;
ジビニルベンゼンなどの上記以外の多官能性単量体;
Tetrafluoroethylene, hexafluoropropylene, 3,3,3-trifluoropropylene, chlorotrifluoroethylene, methyl trifluorovinyl ether, ethyl trifluorovinyl ether, methoxyethyl trifluorovinyl ether, ethoxyethyl trifluorovinyl ether, perfluoro (methyl vinyl ether) Fluoroolefins and fluoroolefin derivatives such as perfluoro (ethyl vinyl ether), perfluoro (propyl vinyl ether), perfluoro (butyl vinyl ether), perfluoro (isobutyl vinyl ether), perfluoro (propoxypropyl vinyl ether);
Other polyfunctional monomers such as divinylbenzene;
(メタ)アクリルアミド、N−メチル(メタ)アクリルアミド、N−エチル(メタ)アクリルアミド、N−ノルマルプロピル(メタ)アクリルアミド、N−イソプロピル(メタ)アクリルアミド、N−ブチル(メタ)アクリルアミド、N−ヘキシル(メタ)アクリルアミド、N−シクロヘキシル(メタ)アクリルアミド、N−2−エチルヘキシル(メタ)アクリルアミド、N−ヒドロキシエチル(メタ)アクリルアミド、N−メチロール(メタ)アクリルアミド、N−メトキシメチル(メタ)アクリルアミド、N−ブトキシメチル(メタ)アクリルアミド、N,N′−メチレンビスアクリルアミド、ダイアセトンアクリルアミド、マレイン酸アミド、マレイミドなどの酸アミド化合物; (Meth) acrylamide, N-methyl (meth) acrylamide, N-ethyl (meth) acrylamide, N-normalpropyl (meth) acrylamide, N-isopropyl (meth) acrylamide, N-butyl (meth) acrylamide, N-hexyl ( (Meth) acrylamide, N-cyclohexyl (meth) acrylamide, N-2-ethylhexyl (meth) acrylamide, N-hydroxyethyl (meth) acrylamide, N-methylol (meth) acrylamide, N-methoxymethyl (meth) acrylamide, N- Acid amide compounds such as butoxymethyl (meth) acrylamide, N, N′-methylenebisacrylamide, diacetone acrylamide, maleic acid amide, maleimide;
アクリロニトリル、メタアクリロニトリルなどのシアン化ビニル化合物;
4−(メタ)アクリロイルオキシ−2,2,6,6−テトラメチルピペリジン、4−(メタ)アクリロイルアミノ−2,2,6,6−テトラメチルピペリジン、4−(メタ)アクリロイルオキシ−1,2,2,6,6−ペンタメチルピペリジンなどのピペリジン系モノマー;
そのほかジカプロラクトンなどが挙げられる。
Vinyl cyanide compounds such as acrylonitrile and methacrylonitrile;
4- (meth) acryloyloxy-2,2,6,6-tetramethylpiperidine, 4- (meth) acryloylamino-2,2,6,6-tetramethylpiperidine, 4- (meth) acryloyloxy-1, Piperidine monomers such as 2,2,6,6-pentamethylpiperidine;
Other examples include dicaprolactone.
さらに、官能基を有する(B)成分として、例えば、クロトン酸、マレイン酸、フマル酸、イタコン酸などの上記以外の不飽和カルボン酸;無水マレイン酸、無水イタコン酸などの不飽和カルボン酸無水物;アクリルアミドt−ブチルスルホン酸などの(メタ)アクリルアミドスルホン酸類;2−(メタ)アクリロイロキシエチルアシッドホスフェートなどのリン酸基含有(メタ)アクリル酸エステル類;2−ヒドロキシエチルビニルエーテルなどの上記以外の水酸基含有ビニル系単量体;2−アミノエチルビニルエーテルなどのアミノ基含有ビニル系単量体;1,1,1−トリメチルアミン(メタ)アクリルイミド、1−メチル−1−エチルアミン(メタ)アクリルイミド、1,1−ジメチル−1−(2−ヒドロキシプロピル)アミン(メタ)アクリルイミド、1,1−ジメチル−1−(2′−フェニル−2′−ヒドロキシエチル)アミン(メタ)アクリルイミド、1,1−ジメチル−1−(2′−ヒドロキシ−2′−フェノキシプロピル)アミン(メタ)アクリルイミドなどのアミンイミド基含有ビニル系単量体;アリルグリシジルエーテルなどの上記以外のエポキシ基含有ビニル系単量体などを挙げることができる。 Furthermore, as the component (B) having a functional group, for example, unsaturated carboxylic acids other than the above, such as crotonic acid, maleic acid, fumaric acid, and itaconic acid; unsaturated carboxylic acid anhydrides such as maleic anhydride and itaconic anhydride ; (Meth) acrylamide sulfonic acids such as acrylamide t-butyl sulfonic acid; phosphoric acid group-containing (meth) acrylic esters such as 2- (meth) acryloyloxyethyl acid phosphate; other than the above such as 2-hydroxyethyl vinyl ether; Hydroxyl group-containing vinyl monomers; amino group-containing vinyl monomers such as 2-aminoethyl vinyl ether; 1,1,1-trimethylamine (meth) acrylimide, 1-methyl-1-ethylamine (meth) acrylimide 1,1-dimethyl-1- (2-hydroxypropyl) amine (me ) Acrylimide, 1,1-dimethyl-1- (2'-phenyl-2'-hydroxyethyl) amine (meth) acrylimide, 1,1-dimethyl-1- (2'-hydroxy-2'-phenoxypropyl) ) Amine imide group-containing vinyl monomers such as amine (meth) acrylimide; Epoxy group-containing vinyl monomers other than the above such as allyl glycidyl ether.
以上の(B)成分のうちでは、(メタ)アクリル酸、(メタ)アクリル化合物、酸アミド化合物、(メタ)アクリルアミドスルホン酸類が好ましく、なかでも、アクリル酸、メタクリル酸、トリフルオロエチル(メタ)アクリレート、ヘキサフルオロイソプロピル(メタ)アクリレート、オクタフルオロペンチル(メタ)アクリレート、ペンタデカフルオロオクチル(メタ)アクリレート、N−イソプロピル(メタ)アクリルアミド、N−ヒドロキシエチル(メタ)アクリルアミド、アクリルアミドt−ブチルスルホン酸が特に好ましい。 Among the above components (B), (meth) acrylic acid, (meth) acrylic compounds, acid amide compounds, and (meth) acrylamide sulfonic acids are preferable, and among them, acrylic acid, methacrylic acid, trifluoroethyl (meth) Acrylate, hexafluoroisopropyl (meth) acrylate, octafluoropentyl (meth) acrylate, pentadecafluorooctyl (meth) acrylate, N-isopropyl (meth) acrylamide, N-hydroxyethyl (meth) acrylamide, acrylamide t-butylsulfonic acid Is particularly preferred.
アクリルアミドt−ブチルスルホン酸などスルホン酸基を有するモノマーを用いることで有機無機複合体に直接スルホン酸基を導入することができ、体積抵抗を小さくすることができる。また、フェニル基、アルコール性水酸基、エポキシ基、メルカプト基などスルホン化によってスルホン酸基を導入できる官能基を含む(B)成分を選択し、スルホン化することでも、体積抵抗を小さくすることができる。
なお、(B)成分中に、酸性官能基を含むラジカル重合性モノマーを使用すると、後述する(E)成分として優れた効果を示すため好ましい。
By using a monomer having a sulfonic acid group such as acrylamide t-butylsulfonic acid, the sulfonic acid group can be directly introduced into the organic-inorganic composite, and the volume resistance can be reduced. In addition, the volume resistance can be reduced by selecting and sulfonating the component (B) containing a functional group capable of introducing a sulfonic acid group by sulfonation, such as a phenyl group, an alcoholic hydroxyl group, an epoxy group, or a mercapto group. .
In addition, when the radically polymerizable monomer containing an acidic functional group is used in (B) component, since the effect excellent as (E) component mentioned later is shown, it is preferable.
本発明の水系分散体における(A)成分と(B)成分との配合割合は、(A)成分の合計量が、好ましくは1〜100重量部、さらに好ましくは1〜95重量部、特に好ましくは10〜90重量部、(B)成分が好ましくは99〜0重量部、さらに好ましくは99〜5重量部、特に好ましくは90〜10重量部〔ただし、(A)+(B)=100重量部〕である。ここで、3−(メタ)アクリルオキシプロピルトリエトキシシランなど(A)成分としても(B)成分としても作用する成分については、その重量を2で除し、(A)成分および(B)成分として扱うものとする。
(B)成分の割合が99重量部を超えると、耐水性の悪化が顕著となり好ましくない。
The mixing ratio of the component (A) and the component (B) in the aqueous dispersion of the present invention is such that the total amount of the component (A) is preferably 1 to 100 parts by weight, more preferably 1 to 95 parts by weight, particularly preferably. 10 to 90 parts by weight, component (B) is preferably 99 to 0 parts by weight, more preferably 99 to 5 parts by weight, particularly preferably 90 to 10 parts by weight [provided that (A) + (B) = 100 parts by weight Part]. Here, about the component which acts as both (A) component and (B) component, such as 3- (meth) acryloxypropyl triethoxysilane, the weight is divided by 2 and (A) component and (B) component Shall be treated as
When the proportion of the component (B) exceeds 99 parts by weight, the deterioration of water resistance becomes remarkable, which is not preferable.
(C)乳化剤
乳化剤として用いられる界面活性剤としては、例えばアルキル硫酸エステル(塩)、アルキルアリール硫酸エステル(塩)、アルキルリン酸エステル(塩)、脂肪酸(塩)などのアニオン系界面活性剤;アルキルアミン塩、アルキル四級アミン塩などのカチオン系界面活性剤;ポリオキシエチレンアルキルエーテル、ポリオキシエチレンアルキルアリールエーテル、ブロック型ポリエーテルなどのノニオン系界面活性剤;カルボン酸型(例えば、アミノ酸型、ベタイン酸型など)、スルホン酸型などの両性界面活性剤、商品名で、ラテムルS−180A〔花王社製〕、エレミノールJS−2〔三洋化成社製〕、アクアロンHS−10、KH−10〔第一工業製薬社製〕、アデカリアソープSE−10N、SR−10〔旭電化工業社製〕、Antox MS−60〔日本乳化剤社製〕などの反応性乳化剤などのいずれでも使用可能である。
(C) As surfactants used as emulsifiers, anionic surfactants such as alkyl sulfates (salts), alkylaryl sulfates (salts), alkyl phosphates (salts), and fatty acids (salts); Cationic surfactants such as alkylamine salts and alkyl quaternary amine salts; Nonionic surfactants such as polyoxyethylene alkyl ethers, polyoxyethylene alkylaryl ethers and block polyethers; Carboxylic acid types (for example, amino acid types) ), Amphoteric surfactants such as sulfonic acid type, etc., under the trade names, Latemul S-180A (manufactured by Kao Corporation), Eleminol JS-2 (manufactured by Sanyo Kasei Co., Ltd.), Aqualon HS-10, KH-10 [Daiichi Kogyo Seiyaku Co., Ltd.], Adekaria soap SE-10N, SR-10 [Asahi Denka Kogyo Ltd.], Antox MS-60 [manufactured by Nippon Emulsifier Co., Ltd.], it is possible to use any of such reactive emulsifier such as.
アルキル硫酸エステル、アルキルアリール硫酸エステルなどのスルホン酸基を有する乳化剤を酸型のまま用いることで体積抵抗を小さくすることができる。
特に、反応性乳化剤を用いると、耐水性に優れ好ましい。
By using an emulsifier having a sulfonic acid group such as an alkyl sulfate ester or an alkylaryl sulfate ester in an acid form, the volume resistance can be reduced.
In particular, use of a reactive emulsifier is preferable because of excellent water resistance.
親水性基を有するポリマーのうち分散機能を有するものも乳化剤として使用することができる。このようなポリマーとしては、スチレン・マレイン酸共重合体、スチレン・アクリル酸共重合体、ポリビニルアルコール、ポリアルキレングリコール、ポリイソプレンのスルホン化物、水添スチレン・ブタジエン共重合体のスルホン化物、スチレン・マレイン酸共重合体のスルホン化物、スチレン・アクリル酸共重合体のスルホン化物などを挙げることができる。特にスルホン酸基を有するポリマーを酸型のまま用いることで体積抵抗を小さくすることができる。このようなポリマーとしては、ポリイソプレンのスルホン化物、水添スチレン・ブタジエン共重合体のスルホン化物、スチレン・マレイン酸共重合体のスルホン化物、スチレン・アクリル酸共重合体のスルホン化物などを挙げることができる。 Among the polymers having a hydrophilic group, those having a dispersing function can also be used as an emulsifier. Examples of such polymers include styrene / maleic acid copolymer, styrene / acrylic acid copolymer, polyvinyl alcohol, polyalkylene glycol, sulfonated polyisoprene, sulfonated hydrogenated styrene / butadiene copolymer, styrene / Examples thereof include a sulfonated product of a maleic acid copolymer and a sulfonated product of a styrene / acrylic acid copolymer. In particular, the volume resistance can be reduced by using a polymer having a sulfonic acid group in an acid form. Examples of such a polymer include a sulfonated product of polyisoprene, a sulfonated product of hydrogenated styrene / butadiene copolymer, a sulfonated product of styrene / maleic acid copolymer, and a sulfonated product of styrene / acrylic acid copolymer. Can do.
これらの乳化剤は、1種単独であるいは2種以上を併用することができる。
乳化剤の使用量は特に限定されるものではないが、(A)成分と(B)成分の合計量100重量部に対し、通常、0.1〜50重量部、好ましくは0.2〜20重量部、さらに好ましくは0.5〜5重量部である。0.1重量部未満では、乳化が充分でなく、また、加水分解・縮合およびラジカル重合時の安定性が低下し好ましくない。一方、50重量部を超えると、泡立ちおよび耐水性が問題となり好ましくない。
These emulsifiers can be used alone or in combination of two or more.
Although the usage-amount of an emulsifier is not specifically limited, 0.1-50 weight part normally with respect to 100 weight part of total amounts of (A) component and (B) component, Preferably it is 0.2-20 weight Parts, more preferably 0.5 to 5 parts by weight. If it is less than 0.1 part by weight, emulsification is not sufficient, and stability during hydrolysis / condensation and radical polymerization is unfavorable. On the other hand, when the amount exceeds 50 parts by weight, foaming and water resistance become problems, which is not preferable.
(D)水
本発明の水系分散体の製造に用いられ水系媒体の主要成分となる水は、あらかじめ添加された(A)成分の水系の混合液中に存在する水であってもよく、あるいは、(A)成分の混合物にさらに(C)乳化剤とともに添加される水であってもよい。
水の使用量は特に限定されるものではないが、(A)成分および(B)成分の合計量100重量部に対し、通常、50〜2,000重量部、好ましくは80〜1,000重量部、さらに好ましく100〜500重量部である。50重量部未満では、乳化が困難であったり、乳化後のエマルジョンの安定性が低下したりするため、好ましくない。一方、2,000重量部を超えると、生産性が低下するため好ましくない。
(D) Water The water used as the main component of the aqueous medium used in the production of the aqueous dispersion of the present invention may be water existing in the aqueous mixture of the component (A) added in advance, or Further, water added together with the emulsifier (C) may be added to the mixture of the component (A).
The amount of water used is not particularly limited, but is usually 50 to 2,000 parts by weight, preferably 80 to 1,000 parts by weight, with respect to 100 parts by weight of the total amount of component (A) and component (B). Parts, more preferably 100 to 500 parts by weight. If it is less than 50 parts by weight, emulsification is difficult or the stability of the emulsion after emulsification is lowered, which is not preferable. On the other hand, when the amount exceeds 2,000 parts by weight, productivity is lowered, which is not preferable.
(E)加水分解触媒
(A)〜(D)成分を混合し、エマルジョンの平均粒子径を1μm以下に微細化する前および/または後で、(A)成分の加水分解・縮合反応を促進する触媒(E)を併用しても良い。
(E)成分を使用することにより、重合安定性を高めるとともに、使用される(A)成分の重縮合反応により生成されるポリシロキサン樹脂の分子量が大きくなり、耐水性に優れた材料を得ることができる。
(E) Hydrolysis catalysts (A) to (D) are mixed, and before and / or after the average particle size of the emulsion is reduced to 1 μm or less, the hydrolysis / condensation reaction of component (A) is promoted. A catalyst (E) may be used in combination.
By using the component (E), the polymerization stability is improved, and the molecular weight of the polysiloxane resin produced by the polycondensation reaction of the component (A) used is increased to obtain a material having excellent water resistance. Can do.
このような(E)成分としては、酸性化合物、アルカリ性化合物、塩化合物、アミン化合物、有機金属化合物および/またはその部分加水分解物(以下、有機金属化合物および/またはその部分加水分解物をまとめて「有機金属化合物等」という)が好ましい。
上記酸性化合物としては、例えば、酢酸、塩酸、硫酸、リン酸、アルキルチタン酸、p−トルエンスルホン酸、ドデシルベンゼンスルホン酸、フタル酸などを挙げることができ、好ましくは、塩酸、硫酸、リン酸、ドデシルベンゼンスルホン酸である。
As such component (E), acidic compounds, alkaline compounds, salt compounds, amine compounds, organometallic compounds and / or partial hydrolysates thereof (hereinafter referred to as organometallic compounds and / or partial hydrolysates thereof) (Referred to as “organometallic compound etc.”).
Examples of the acidic compound include acetic acid, hydrochloric acid, sulfuric acid, phosphoric acid, alkyl titanic acid, p-toluenesulfonic acid, dodecylbenzenesulfonic acid, phthalic acid, etc., preferably hydrochloric acid, sulfuric acid, phosphoric acid , Dodecylbenzenesulfonic acid.
また、上記アルカリ性化合物としては、例えば、水酸化ナトリウム、水酸化カリウムなどを挙げることができるが、体積抵抗が大きくなることがあるので、アルカリ性化合物は使用しないことが好ましい。
また、上記塩化合物としては、例えば、ナフテン酸、オクチル酸、亜硝酸、亜硫酸、アルミン酸、炭酸などのアルカリ金属塩などを挙げることができる。
Examples of the alkaline compound include sodium hydroxide and potassium hydroxide. However, since the volume resistance may increase, it is preferable not to use an alkaline compound.
Examples of the salt compounds include alkali metal salts such as naphthenic acid, octylic acid, nitrous acid, sulfurous acid, aluminate, and carbonic acid.
また、上記アミン化合物としては、例えば、エチレンジアミン、ヘキサメチレンジアミン、ジエチレントリアミン、トリエチレンテトラミン、テトラエチレンペンタミン、ピペリジン、ピペラジン、m−フェニレンジアミン、p−フェニレンジアミン、エタノールアミン、トリエチルアミン、3−アミノプロピル・トリメトキシシラン、3−アミノプロピル・トリエトキシシラン、3−(2−アミノエチル)−アミノプロピル・トリメトキシシラン、3−(2−アミノエチル)−アミノプロピル・トリエトキシシラン、3−(2−アミノエチル)−アミノプロピル・メチル・ジメトキシシラン、3−アニリノプロピル・トリメトキシシランや、アルキルアミン塩類、四級アンモニウム塩類のほか、エポキシ樹脂の硬化剤として用いられる各種変性アミンなどを挙げることができ、好ましくは、3−アミノプロピル・トリメトキシシラン、3−アミノプロピル・トリエトキシシラン、3−(2−アミノエチル)−アミノプロピル・トリメトキシシランである。 Examples of the amine compound include ethylenediamine, hexamethylenediamine, diethylenetriamine, triethylenetetramine, tetraethylenepentamine, piperidine, piperazine, m-phenylenediamine, p-phenylenediamine, ethanolamine, triethylamine, and 3-aminopropyl. Trimethoxysilane, 3-aminopropyl triethoxysilane, 3- (2-aminoethyl) -aminopropyl trimethoxysilane, 3- (2-aminoethyl) -aminopropyl triethoxysilane, 3- (2 -Aminoethyl) -aminopropyl-methyl-dimethoxysilane, 3-anilinopropyl-trimethoxysilane, alkylamine salts, quaternary ammonium salts, as well as various curing agents for epoxy resins Aminopropyl trimethoxysilane - like can be mentioned sex amines, preferably, 3-aminopropyl trimethoxysilane, 3-aminopropyl triethoxysilane, 3- (2-aminoethyl).
また、上記有機金属化合物等としては、例えば、下記一般式(2)で表される化合物(以下「有機金属化合物(2)」という)、同一のスズ原子に結合した炭素数1〜10のアルキル基を1〜2個有する4価スズの有機金属化合物(以下、「有機スズ化合物」という。)、あるいは、これらの化合物の部分加水分解物などを挙げることができる。 Examples of the organometallic compound include a compound represented by the following general formula (2) (hereinafter referred to as “organometallic compound (2)”), an alkyl having 1 to 10 carbon atoms bonded to the same tin atom. Examples thereof include tetravalent tin organometallic compounds having 1 to 2 groups (hereinafter referred to as “organotin compounds”), partial hydrolysates of these compounds, and the like.
M(OR3)r(R4COCHCOR5)s……(2)
〔式中、Mはジルコニウム、チタンまたはアルミニウムを示し、R3およびR4は、同一または異なって、エチル基、n−プロピル基、i−プロピル基、n−ブチル基、sec−ブチル基、t−ブチル基、n−ペンチル基、n−ヘキシル基、シクロヘキシル基、フェニル基などの炭素数1〜6の1価の炭化水素基を示し、R5は、R3およびR4と同様の炭素数1〜6の1価の炭化水素基のほか、メトキシ基、エトキシ基、n−プロポキシ基、i−プロポキシ基、n−ブトキシ基、sec−ブトキシ基、t−ブトキシ基、ラウリルオキシ基、ステアリルオキシ基などの炭素数1〜16のアルコキシル基を示し、rおよびsは0〜4の整数で、(r+s)=(Mの原子価)である。〕
M (OR 3 ) r (R 4 COCHCOR 5 ) s (2)
Wherein, M represents zirconium, titanium or aluminum, R 3 and R 4 are the same or different, an ethyl group, n- propyl group, i- propyl, n- butyl group, sec- butyl group, t -A monovalent hydrocarbon group having 1 to 6 carbon atoms such as a butyl group, an n-pentyl group, an n-hexyl group, a cyclohexyl group, and a phenyl group, and R 5 has the same carbon number as R 3 and R 4 1-6 monovalent hydrocarbon groups, methoxy group, ethoxy group, n-propoxy group, i-propoxy group, n-butoxy group, sec-butoxy group, t-butoxy group, lauryloxy group, stearyloxy Represents an alkoxyl group having 1 to 16 carbon atoms such as a group, and r and s are integers of 0 to 4, and (r + s) = (valence of M). ]
有機金属化合物(2)の具体例としては、
(イ)テトラ−n−ブトキシジルコニウム、トリ−n−ブトキシ・エチルアセトアセテートジルコニウム、ジ−n−ブトキシ・ビス(エチルアセトアセテート)ジルコニウム、n−ブトキシ・トリス(エチルアセトアセテート)ジルコニウム、テトラキス(n−プロピルアセトアセテート)ジルコニウム、テトラキス(アセチルアセトアセテート)ジルコニウム、テトラキス(エチルアセトアセテート)ジルコニウムなどの有機ジルコニウム化合物;
Specific examples of the organometallic compound (2) include
(I) Tetra-n-butoxyzirconium, tri-n-butoxyethylacetoacetatezirconium, di-n-butoxybis (ethylacetoacetate) zirconium, n-butoxytris (ethylacetoacetate) zirconium, tetrakis (n Organic zirconium compounds such as propylacetoacetate) zirconium, tetrakis (acetylacetoacetate) zirconium, tetrakis (ethylacetoacetate) zirconium;
(ロ)テトラ−i−プロポキシチタニウム、ジ−i−プロポキシ・ビス(エチルアセトアセテート)チタニウム、ジ−i−プロポキシ・ビス(アセチルアセテート)チタニウム、ジ−i−プロポキシ・ビス(アセチルアセトン)チタニウムなどの有機チタン化合物;
(ハ)トリ−i−プロポキシアルミニウム、ジ−i−プロポキシ・エチルアセトアセテートアルミニウム、ジ−i−プロポキシ・アセチルアセトナートアルミニウム、i−プロポキシ・ビス(エチルアセトアセテート)アルミニウム、i−プロポキシ・ビス(アセチルアセトナート)アルミニウム、トリス(エチルアセトアセテート)アルミニウム、トリス(アセチルアセトナート)アルミニウム、モノアセチルアセトナート・ビス(エチルアセトアセテート)アルミニウムなどの有機アルミニウム化合物;
などを挙げることができる。
(B) Tetra-i-propoxy titanium, di-i-propoxy bis (ethylacetoacetate) titanium, di-i-propoxy bis (acetylacetate) titanium, di-i-propoxy bis (acetylacetone) titanium, etc. Organic titanium compounds;
(C) Tri-i-propoxyaluminum, di-i-propoxyethyl acetoacetate aluminum, di-i-propoxy acetylacetonate aluminum, i-propoxy bis (ethylacetoacetate) aluminum, i-propoxy bis ( Organoaluminum compounds such as acetylacetonato) aluminum, tris (ethylacetoacetate) aluminum, tris (acetylacetonato) aluminum, monoacetylacetonate bis (ethylacetoacetate) aluminum;
And so on.
これらの有機金属化合物(2)およびその部分加水分解物のうち、トリ−n−ブトキシ・エチルアセトアセテートジルコニウム、ジ−i−プロポキシ・ビス(アセチルアセトナート)チタニウム、ジ−i−プロポキシ・エチルアセトアセテートアルミニウム、トリス(エチルアセトアセテート)アルミニウム、あるいは、これらの化合物の部分加水分解物が好ましい。 Among these organometallic compounds (2) and partial hydrolysates thereof, tri-n-butoxy ethylacetoacetate zirconium, di-i-propoxy bis (acetylacetonato) titanium, di-i-propoxy ethylacetate Acetate aluminum, tris (ethyl acetoacetate) aluminum, or a partial hydrolyzate of these compounds is preferred.
また、有機スズ化合物の具体例としては、
(C4H9)2Sn(OCOC11H23)2、
(C4H9)2Sn(OCOCH=CHCOOCH3)2、
(C4H9)2Sn(OCOCH=CHCOOC4H9)2、
(C8H17)2Sn(OCOC8H17)2、
(C8H17)2Sn(OCOC11H23)2、
(C8H17)2Sn(OCOCH=CHCOOCH3)2、
(C8H17)2Sn(OCOCH=CHCOOC4H9)2、
(C8H17)2Sn(OCOCH=CHCOOC8H17)2、
(C8H17)2Sn(OCOCH=CHCOOC16H33)2、
(C8H17)2Sn(OCOCH=CHCOOC17H35)2、
(C8H17)2Sn(OCOCH=CHCOOC18H37)2、
(C8H17)2Sn(OCOCH=CHCOOC20H41)2、
Moreover, as a specific example of an organotin compound,
(C 4 H 9 ) 2 Sn (OCOC 11 H 23 ) 2 ,
(C 4 H 9) 2 Sn (OCOCH = CHCOOCH 3) 2,
(C 4 H 9) 2 Sn (OCOCH = CHCOOC 4 H 9) 2,
(C 8 H 17 ) 2 Sn (OCOC 8 H 17 ) 2 ,
(C 8 H 17 ) 2 Sn (OCOC 11 H 23 ) 2 ,
(C 8 H 17) 2 Sn (OCOCH = CHCOOCH 3) 2,
(C 8 H 17) 2 Sn (OCOCH = CHCOOC 4 H 9) 2,
(C 8 H 17) 2 Sn (OCOCH = CHCOOC 8 H 17) 2,
(C 8 H 17) 2 Sn (OCOCH = CHCOOC 16 H 33) 2,
(C 8 H 17) 2 Sn (OCOCH = CHCOOC 17 H 35) 2,
(C 8 H 17) 2 Sn (OCOCH = CHCOOC 18 H 37) 2,
(C 8 H 17) 2 Sn (OCOCH = CHCOOC 20 H 41) 2,
(C4H9)2SnOCOCH3
|
O
|
(C4H9)2SnOCOCH3、
(C4H9)Sn(OCOC11H23)3、
(C4H9)Sn(OCONa)3
などのカルボン酸型有機スズ化合物;
(C 4 H 9 ) 2 SnOCOCH 3
|
O
|
(C 4 H 9 ) 2 SnOCOCH 3 ,
(C 4 H 9) Sn ( OCOC 11 H 23) 3,
(C 4 H 9 ) Sn (OCONa) 3
Carboxylic acid type organotin compounds such as;
(C4H9)2Sn(SCH2COOC8H17)2、
(C4H9)2Sn(SCH2CH2COOC8H17)2、
(C8H17)2Sn(SCH2COOC8H17)2、
(C8H17)2Sn(SCH2CH2COOC8H17)2、
(C8H17)2Sn(SCH2COOC12H25)2、
(C8H17)2Sn(SCH2CH2COOC12H25)2、
(C4H9)Sn(SCOCH=CHCOOC8H17)3、
(C8H17)Sn(SCOCH=CHCOOC8H17)3、
(C 4 H 9) 2 Sn (SCH 2 COOC 8 H 17) 2,
(C 4 H 9) 2 Sn (SCH 2 CH 2 COOC 8 H 17) 2,
(C 8 H 17) 2 Sn (SCH 2 COOC 8 H 17) 2,
(C 8 H 17) 2 Sn (SCH 2 CH 2 COOC 8 H 17) 2,
(C 8 H 17) 2 Sn (SCH 2 COOC 12 H 25) 2,
(C 8 H 17) 2 Sn (SCH 2 CH 2 COOC 12 H 25) 2,
(C 4 H 9) Sn ( SCOCH = CHCOOC 8 H 17) 3,
(C 8 H 17) Sn ( SCOCH = CHCOOC 8 H 17) 3,
(C4H9)2Sn(SCH2COOC8H17)
|
O
|
(C4H9)2Sn(SCH2COOC8H17)
などのメルカプチド型有機スズ化合物;
(C 4 H 9) 2 Sn (SCH 2 COOC 8 H 17)
|
O
|
(C 4 H 9 ) 2 Sn (SCH 2 COOC 8 H 17 )
Mercaptide-type organotin compounds such as
(C4H9)2Sn=S、(C8H17)2Sn=S、
(C4H9)2Sn=S
|
S
|
(C4H9)2Sn=S
などのスルフィド型有機スズ化合物;
(C 4 H 9 ) 2 Sn = S, (C 8 H 17 ) 2 Sn = S,
(C 4 H 9 ) 2 Sn = S
|
S
|
(C 4 H 9 ) 2 Sn = S
Sulfide-type organotin compounds such as;
(C4H9)SnCl3、(C4H9)2SnCl2、
(C8H17)2SnCl2、
(C4H9)2Sn−Cl
|
S
|
(C4H9)2Sn−Cl
などのクロライド型有機スズ化合物;
(C 4 H 9) SnCl 3 , (C 4 H 9) 2 SnCl 2,
(C 8 H 17 ) 2 SnCl 2 ,
(C 4 H 9) 2 Sn -Cl
|
S
|
(C 4 H 9) 2 Sn -Cl
Chloride-type organotin compounds such as;
(C4H9)2SnO、(C8H17)2SnOなどの有機スズオキサイドや、これらの有機スズオキサイドとシリケート、マレイン酸ジメチル、マレイン酸ジエチル、フタル酸ジオクチルなどのエステル化合物との反応生成物;
などを挙げることができる。
Reaction of organotin oxides such as (C 4 H 9 ) 2 SnO, (C 8 H 17 ) 2 SnO, and ester compounds such as silicates, dimethyl maleate, diethyl maleate and dioctyl phthalate Product;
And so on.
なお、(E)成分として、アクリル酸、メタクリル酸などのラジカル重合性の酸を含むと、(B)成分として共重合することから、耐水性を劣化させることがないという効果が得られる。
(E)成分の使用量は特に限定されるものではないが、上記(A)成分の100重量部に対して、通常、0.01〜5重量部、好ましくは0.1〜5重量部、さらに好ましくは0.1〜3重量部である。
In addition, when (E) component contains radically polymerizable acids, such as acrylic acid and methacrylic acid, since it copolymerizes as (B) component, the effect that water resistance is not deteriorated is acquired.
(E) Although the usage-amount of a component is not specifically limited, It is 0.01-5 weight part normally with respect to 100 weight part of the said (A) component, Preferably it is 0.1-5 weight part, More preferably, it is 0.1-3 weight part.
(F)ラジカル重合開始剤
(B)成分を用いる場合、ラジカル重合開始剤(F)が用いられる。ラジカル重合開始剤としては、過硫酸カリウム、過硫酸ナトリウム、過硫酸アンモニウムなどの過硫酸塩、過酸化水素、t−ブチルハイドロパーオキサイド、t−ブチルパーオキシマレイン酸、コハク酸パーオキサイド、2,2′−アゾビス〔2−N−ベンジルアミジノ〕プロパン塩酸塩などの水溶性開始剤;ベンゾイルパーオキサイド、クメンハイドロパーオキサイド、ジイソプロピルパーオキシジカーボネート、クミルパーオキシネオデカノエート、クミルパーオキシオクトエート、アゾビスイソブチロニトリルなどの油溶性開始剤;酸性亜硫酸ナトリウム、ロンガリット、アスコルビン酸などの還元剤を併用したレドックス系開始剤などが使用できる。
(F) When the radical polymerization initiator (B) component is used, the radical polymerization initiator (F) is used. As radical polymerization initiators, persulfates such as potassium persulfate, sodium persulfate and ammonium persulfate, hydrogen peroxide, t-butyl hydroperoxide, t-butyl peroxymaleic acid, succinic peroxide, 2,2 Water-soluble initiators such as' -azobis [2-N-benzylamidino] propane hydrochloride; benzoyl peroxide, cumene hydroperoxide, diisopropyl peroxydicarbonate, cumylperoxyneodecanoate, cumylperoxyoctoate, An oil-soluble initiator such as azobisisobutyronitrile; a redox initiator combined with a reducing agent such as acidic sodium sulfite, Rongalite, and ascorbic acid can be used.
これらの(F)成分のなかでも、重合安定性の面から、水溶性開始剤が好ましい。
これらのラジカル重合開始剤の使用量は特に限定されないが、(B)成分の100重量部に対して、0.01〜5重量部、好ましくは0.05〜4重量部、さらに好ましくは0.1重量部〜3重量部である。0.01重量部未満では、ラジカル重合反応が途中で失活することがあり、一方、5重量部を超えると、耐水性に劣る場合がある。
Among these (F) components, a water-soluble initiator is preferable from the viewpoint of polymerization stability.
Although the usage-amount of these radical polymerization initiators is not specifically limited, 0.01-5 weight part with respect to 100 weight part of (B) component, Preferably it is 0.05-4 weight part, More preferably, it is 0.8. 1 to 3 parts by weight. If it is less than 0.01 part by weight, the radical polymerization reaction may be deactivated in the middle, while if it exceeds 5 parts by weight, the water resistance may be inferior.
<水系分散体の製造>
本発明の水系分散体は、上記(A)〜(D)成分を混合し、エマルジョンの平均粒子径を1μm以下に微細化した後、必要に応じて上記(F)成分を加えてラジカル重合を行なうことにより得られる。
また、微細化は、高圧ホモジナイザー、超音波、ホモミキサーなどの機械的手段を用いて、系をミニエマルジョン化する。この際、エマルジョンの平均粒子径を好ましくは1μm以下、さらに好ましくは0.01〜0.5μm、特に好ましくは0.01〜0.2μmとする。エマルジョンの平均粒子径が1μmを超えると、耐水性が劣り好ましくない。
<Production of aqueous dispersion>
In the aqueous dispersion of the present invention, the components (A) to (D) are mixed, the average particle size of the emulsion is refined to 1 μm or less, and then the component (F) is added as necessary to perform radical polymerization. It is obtained by doing.
Further, in the miniaturization, the system is made into a mini-emulsion by using a mechanical means such as a high-pressure homogenizer, an ultrasonic wave, a homomixer or the like. At this time, the average particle size of the emulsion is preferably 1 μm or less, more preferably 0.01 to 0.5 μm, and particularly preferably 0.01 to 0.2 μm. When the average particle diameter of the emulsion exceeds 1 μm, the water resistance is inferior, which is not preferable.
また、ラジカル重合反応の反応条件は、温度が、通常、25〜120℃、好ましくは40〜90℃、反応時間は、通常、0.5〜15時間、好ましくは1〜8時間である。
また、本発明の水系分散体中に、上記(A)成分の調製時に必要に応じて用いられる有機溶媒を含む場合には、この有機溶媒を水系分散体から除去しておくこともできる。
さらに、本発明の水系分散体中には、必要に応じて、(A)成分の調製時に用いられる上記のような各種有機溶媒を添加することもできる。なお、引火性を持たないようにするために、引火性有機溶媒は、加熱・蒸留などの手段で低減させておくことが望ましい。
Moreover, as for the reaction conditions of radical polymerization reaction, temperature is 25-120 degreeC normally, Preferably it is 40-90 degreeC, and reaction time is 0.5 to 15 hours normally, Preferably it is 1 to 8 hours.
In addition, when the aqueous dispersion of the present invention contains an organic solvent used as necessary when preparing the component (A), the organic solvent can be removed from the aqueous dispersion.
Furthermore, in the aqueous dispersion of the present invention, various organic solvents as described above used at the time of preparing the component (A) can be added as necessary. In order to avoid flammability, it is desirable to reduce the flammable organic solvent by means such as heating and distillation.
本発明のスルホン酸基含有水系分散体はスルホン酸基を含む。
スルホン酸基の導入方法を例示すると、
a.エポキシ基、メルカプト基、ビニル基などスルホン化によってスルホン酸基を導入できる官能基を含むR1を有する(A)成分を導入し、スルホン化する方法。
b.アクリルアミドt−ブチルスルホン酸などスルホン酸基を有するモノマーを製造に用いることでスルホン酸基を導入する方法。
c.エポキシ基、メルカプト基などスルホン化によってスルホン酸基を導入できる官能基を含む(B)成分を導入し、スルホン化する方法。
d.アルキル硫酸エステル、アルキルアリール硫酸エステルなどのスルホン酸基を有する乳化剤を酸型のまま用いる方法。
e.スルホン酸基を有するポリマーを添加する方法。
The sulfonic acid group-containing aqueous dispersion of the present invention contains a sulfonic acid group.
Illustrating the method of introducing sulfonic acid groups,
a. Epoxy group, a mercapto group, introducing the component (A) having R 1 containing a functional group capable of introducing a sulfonic acid group by sulfonation such as a vinyl group, a method of sulfonation.
b. A method of introducing a sulfonic acid group by using a monomer having a sulfonic acid group such as acrylamide t-butylsulfonic acid for production.
c. A method in which a component (B) containing a functional group capable of introducing a sulfonic acid group by sulfonation, such as an epoxy group or a mercapto group, is introduced for sulfonation.
d. A method in which an emulsifier having a sulfonic acid group such as an alkyl sulfate ester or an alkylaryl sulfate ester is used in an acid form.
e. A method of adding a polymer having a sulfonic acid group.
上記a、cのスルホン化は公知の方法を用いることができ、例えば、官能基がエポキシ基の場合は硫酸を添加することにより、官能基がメルカプト基の場合は過酸化水素などの酸化剤を添加することにより、官能基がビニル基など不飽和2重結合の場合は亜硫酸水素を添加することによりスルホン化する事ができる。 For the sulfonation of a and c, a known method can be used. For example, when the functional group is an epoxy group, sulfuric acid is added. When the functional group is a mercapto group, an oxidizing agent such as hydrogen peroxide is added. When the functional group is an unsaturated double bond such as a vinyl group, it can be sulfonated by adding hydrogen sulfite.
b.アクリルアミドt−ブチルスルホン酸などスルホン酸基を有するモノマーを製造に用いることでスルホン酸基を導入する方法では、(b−1)(B)成分としてスルホン酸基を有するモノマーを(A)成分と混合して用いる方法、(b−2)微細乳化の後、スルホン酸基を有するモノマーを添加、次いで(F)成分を添加して重合する方法、(b−3)微細乳化の後、(F)成分を添加、次いでスルホン酸基を有するモノマーを添加して重合することもできる。
耐水性の点からbの方法が好ましく、重合安定性の点から(b−2)または(b−3)の方法が好ましい。
b. In the method of introducing a sulfonic acid group by using a monomer having a sulfonic acid group such as acrylamide t-butylsulfonic acid for production, the monomer having a sulfonic acid group as the component (b-1) and (B) is combined with the component (A). Method of mixing, (b-2) Method of adding monomer having sulfonic acid group after fine emulsification, then adding (F) component and polymerizing, (b-3) After fine emulsification, (F ) Component may be added, and then a monomer having a sulfonic acid group may be added for polymerization.
The method b is preferable from the viewpoint of water resistance, and the method (b-2) or (b-3) is preferable from the viewpoint of polymerization stability.
e.スルホン酸基を有するポリマーとしては、特に制限はなく、例えば、ポリブタジエンのスルホン化物、ポリイソプレンのスルホン化物など共役ジエン(共)重合体のスルホン化物;ポリスチレンのスルホン化物、スチレン・ブタジエン共重合体のスルホン化物、水添スチレン・ブタジエン共重合体のスルホン化物、スチレン・マレイン酸共重合体のスルホン化物、スチレン・アクリル酸共重合体のスルホン化物、アセトフェノン系ケトン樹脂のスルホン化物、芳香族ポリイミド樹脂のスルホン化物、ポリエーテルサルホン樹脂のスルホン化物など芳香族系(共)重合体のスルホン化物;イソプレンスルホン酸、アクリルアミド2−メチルプロパンスルホン酸などスルホン酸基含有モノマーの(共)重合体;デュポン社製NAFION(商品名)に代表されるスルホン酸基を有するフッ素系ポリマーが挙げられる。これらスルホン酸基を有するポリマーの量は、水系分散体の固形分100重量%に対して、好ましくは99重量%以下、さらに好ましくは50重量%以下、最も好ましくは30重量%以下である。99重量%を超えると耐水性に劣る。スルホン酸基を有するポリマーの添加は、製造の初期から製造後までのいずれかの工程で実施すればよく、(D)成分の水に溶解または分散して製造の初期に添加する方法、乳化機能を有するスルホン酸基を有するポリマーであれば(C)成分として製造の初期に添加する方法、製造後かつ成膜の直前に添加する方法などが挙げられる。 e. The polymer having a sulfonic acid group is not particularly limited. For example, a sulfonated product of a conjugated diene (co) polymer such as a sulfonated product of polybutadiene or a sulfonated product of polyisoprene; a sulfonated product of polystyrene or a styrene-butadiene copolymer. Sulfonated products, sulfonated products of hydrogenated styrene / butadiene copolymers, sulfonated products of styrene / maleic acid copolymers, sulfonated products of styrene / acrylic acid copolymers, sulfonated products of acetophenone ketone resins, aromatic polyimide resins Sulfonated products, sulfonated products of aromatic (co) polymers such as sulfonated products of polyethersulfone resins; (co) polymers of sulfonic acid group-containing monomers such as isoprenesulfonic acid and acrylamide 2-methylpropanesulfonic acid; DuPont NAFION (Product name Fluorine-based polymer can be cited having a sulfonic acid group represented by. The amount of the polymer having a sulfonic acid group is preferably 99% by weight or less, more preferably 50% by weight or less, and most preferably 30% by weight or less based on 100% by weight of the solid content of the aqueous dispersion. If it exceeds 99% by weight, the water resistance is poor. The addition of the polymer having a sulfonic acid group may be carried out in any step from the initial stage of production to after the production. In the case of a polymer having a sulfonic acid group having, there are a method of adding the component (C) at the initial stage of production, a method of adding it after production and immediately before film formation, and the like.
a〜eの方法は併用することができ、体積抵抗をより小さくする目的においてはこれらの方法を併用することが好ましい。
スルホン酸基の量は、a、cの方法では導入する官能基量とスルホン化剤の量により、bの方法ではスルホン酸基を有するモノマーの量により、dの方法では酸型の乳化剤の量により、eの方法では添加するポリマー中のスルホン酸基の量により調整することができる。
The methods a to e can be used in combination, and these methods are preferably used in combination for the purpose of reducing the volume resistance.
The amount of the sulfonic acid group depends on the amount of the functional group to be introduced and the amount of the sulfonating agent in the methods a and c, the amount of the monomer having a sulfonic acid group in the method b, and the amount of the acid type emulsifier in the method d. Thus, in the method e, the amount of the sulfonic acid group in the polymer to be added can be adjusted.
<添加剤>
本発明のスルホン酸基含有水系分散体は、必要に応じて、架橋剤、溶剤、粒子などの各種添加剤を使用することもできる。
(架橋剤)
(A)成分および/または(B)成分により導入された官能基と反応して硬化物を形成できる化合物を架橋剤として使用することができる。
<Additives>
In the sulfonic acid group-containing aqueous dispersion of the present invention, various additives such as a crosslinking agent, a solvent, and particles can be used as necessary.
(Crosslinking agent)
A compound capable of reacting with the functional group introduced by the component (A) and / or the component (B) to form a cured product can be used as a crosslinking agent.
このような架橋剤としては、たとえば、(ポリ)メチロール化メラミン、(ポリ)メチロール化グリコールウリル、(ポリ)メチロール化ベンゾグアナミン、(ポリ)メチロール化ウレアなどの活性メチロール基の全部または一部をアルキルエーテル化した含窒素化合物;
ノボラック樹脂、ポリヒドロキシスチレンおよびその共重合体、低分子フェノール化合物などのフェノール樹脂;
フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂、脂環式エポキシ樹脂、脂肪族エポキシ樹脂などのエポキシ化合物;
などが挙げられる。
Examples of such a cross-linking agent include all or part of an active methylol group such as (poly) methylolated melamine, (poly) methylolated glycoluril, (poly) methylolated benzoguanamine, (poly) methylolated urea. Etherified nitrogen-containing compounds;
Phenolic resins such as novolak resins, polyhydroxystyrene and copolymers thereof, and low molecular weight phenol compounds;
Epoxy compounds such as phenol novolac epoxy resins, cresol novolac epoxy resins, alicyclic epoxy resins, aliphatic epoxy resins;
Etc.
(B)成分としてジアセトンアクリルアミドを用いた場合など、カルボニル基が水系分散体に導入されている場合、アジピン酸ジヒドラジドなど多価ヒドラジド化合物を架橋剤として用いることができる。
(E)成分は(A)成分の硬化触媒としても働き、後添加する架橋剤としては、特に有機金属化合物が好適に用いられる。
When a carbonyl group is introduced into the aqueous dispersion, such as when diacetone acrylamide is used as the component (B), a polyhydric hydrazide compound such as adipic acid dihydrazide can be used as a crosslinking agent.
The component (E) also functions as a curing catalyst for the component (A), and an organic metal compound is particularly preferably used as a post-added crosslinking agent.
(溶剤)
本発明に用いられる溶剤は、スルホン酸基含有水系分散体の取り扱い性を向上させたり、粘度や保存安定性を調節したりするために添加される。
(solvent)
The solvent used in the present invention is added to improve the handleability of the sulfonic acid group-containing aqueous dispersion and to adjust the viscosity and storage stability.
このような溶剤は、本発明の目的を損なわない有機溶媒であれば特に限定されないが、たとえば、
メタノール、エタノール、イソプロパノール、n-ブタノールなどのアルコール類;
エチレングリコールモノメチルエーテルアセテート、エチレングリコールモノエチルーテルアセテート等のエチレングリコールモノアルキルエーテルアセテート類;
プロピレングリコールモノメチルエーテル、プロピレングリコールモノエチルエーテル、プロピレングリコールモノプロピルエーテル、プロピレングリコールモノブチルエーテル等のプロピレングリコールモノアルキルエーテル類;
Such a solvent is not particularly limited as long as it is an organic solvent that does not impair the object of the present invention.
Alcohols such as methanol, ethanol, isopropanol, n-butanol;
Ethylene glycol monoalkyl ether acetates such as ethylene glycol monomethyl ether acetate and ethylene glycol monoethyl ether acetate;
Propylene glycol monoalkyl ethers such as propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether;
プロピレングリコールジメチルエーテル、プロピレングリコールジエチルエーテル、プロピレングリコールジプロピルエーテル、プロピレングリコールジブチルエーテル等のプロピレングリコールジアルキルエーテル類;
プロピレングリコールモノメチルエーテルアセテート、プロピレングリコールモノエチルエーテルアセテート、プロピレングリコールモノプロピルエーテルアセテート、プロピレングリコールモノブチルエーテルアセテート等のプロピレングリコールモノアルキルエーテルアセテート類;
Propylene glycol dialkyl ethers such as propylene glycol dimethyl ether, propylene glycol diethyl ether, propylene glycol dipropyl ether, propylene glycol dibutyl ether;
Propylene glycol monoalkyl ether acetates such as propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, propylene glycol monobutyl ether acetate;
エチルセロソルブ、ブチルセロソルブ等のセロソルブ類;
ブチルカルビトール等のカルビトール類;
乳酸メチル、乳酸エチル、乳酸n−プロピル、乳酸イソプロピル等の乳酸エステル類;
酢酸エチル、酢酸n−プロピル、酢酸イソプロピル、酢酸n−ブチル、酢酸イソブチル、酢酸n−アミル、酢酸イソアミル、プロピオン酸イソプロピル、プロピオン酸n−ブチル、プロピオン酸イソブチル等の脂肪族カルボン酸エステル類;
3−メトキシプロピオン酸メチル、3−メトキシプロピオン酸エチル、3−エトキシプロピオン酸メチル、3−エトキシプロピオン酸エチル、ピルビン酸メチル、ピルビン酸エチル等のエステル類;
Cellosolves such as ethyl cellosolve and butyl cellosolve;
Carbitols such as butyl carbitol;
Lactic acid esters such as methyl lactate, ethyl lactate, n-propyl lactate and isopropyl lactate;
Aliphatic carboxylic acid esters such as ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, n-amyl acetate, isoamyl acetate, isopropyl propionate, n-butyl propionate, isobutyl propionate;
Esters such as methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, methyl pyruvate, ethyl pyruvate;
トルエン、キシレン等の芳香族炭化水素類;
2−ヘプタノン、3−ヘプタノン、4−ヘプタノン、シクロヘキサノン等のケトン類;
N−ジメチルホルムアミド、N−メチルアセトアミド、N,N−ジメチルアセトアミド、N−メチルピロリドン等のアミド類;
γ−ブチロラクン等のラクトン類が挙げられる。また、必要に応じて、脂肪族炭化水素類などを混合して使用してもよい。
これらの溶媒は、1種単独でまたは2種以上を混合して使用することができる。
Aromatic hydrocarbons such as toluene and xylene;
Ketones such as 2-heptanone, 3-heptanone, 4-heptanone, cyclohexanone;
Amides such as N-dimethylformamide, N-methylacetamide, N, N-dimethylacetamide, N-methylpyrrolidone;
Examples include lactones such as γ-butyrolacun. Moreover, you may mix and use aliphatic hydrocarbons etc. as needed.
These solvents can be used alone or in combination of two or more.
(その他の添加剤)
本発明に係るスルホン酸基含有水系分散体は、無機あるいは有機の粒子、密着助剤、増感剤、レベリング剤、着色剤などその他の添加剤を含有していてもよい。
(Other additives)
The sulfonic acid group-containing aqueous dispersion according to the present invention may contain other additives such as inorganic or organic particles, adhesion aids, sensitizers, leveling agents, and coloring agents.
無機粒子としては、たとえば、SrTiO3、FeTiO3、WO3、SnO2、Bi2O3、In2O3、ZnO、Fe2O3、RuO2、CdO、CdS、CdSe、GaP、GaAs、CdFeO3、MoS2、LaRhO3、GaN、CdP、ZnS、ZnSe、ZnTe、Nb2O5、ZrO2、InP、GaAsP、InGaAlP、AlGaAs、PbS、InAs、PbSe、InSb、SiO2、Al2O3、AlGaAs、Al(OH)3、Sb2O5、Si3N4、Sn−In2O3、Sb−In2O3、MgF、CeF3、CeO2、3Al2O3・2SiO2、BeO、SiC、AlN、Fe、Co、Co−FeOx、CrO2、Fe4N、BaTiO3、BaO−Al2O3−SiO2、Baフェライト、SmCO5、YCO5、CeCO5、PrCO5、Sm2CO17、Nd2Fe14B、Al4O3、α−Si、SiN4、CoO、Sb−SnO2、Sb2O5、MnO2、MnB、Co3O4、Co3B、LiTaO3、MgO、MgAl2O4、BeAl2O4、ZrSiO4、ZnSb、PbTe、GeSi、FeSi2、CrSi2、CoSi2、MnSi1.73、Mg2Si、β−B、BaC、BP、TiB2、ZrB2、HfB2、Ru2Si3、TiO2(ルチル型、アナターゼ型)、TiO3、PbTiO3、Al2TiO5、Zn2SiO4、Zr2SiO4、2MgO2−Al2O3−5SiO2、Nb2O5、Li2O−Al2O3−4SiO2、Mgフェライト、Niフェライト、Ni−Znフェライト、Liフェライト、Srフェライト、Pt、Au、Ag、Fe、Cuなどが挙げられる。このような金属酸化物あるいは金属粒子を使用することにより、スルホン酸基含有水系分散体を硬化して得られる硬化膜の屈折率などの光学特性制御、誘電率や絶縁性、導電性などの電気特性を制御することができる。これら粒子は単独で使用できるが、カーボンブラックや炭酸カルシウムなどの粒子上に担持されたものでもよい。 Examples of the inorganic particles include SrTiO 3 , FeTiO 3 , WO 3 , SnO 2 , Bi 2 O 3 , In 2 O 3 , ZnO, Fe 2 O 3 , RuO 2 , CdO, CdS, CdSe, GaP, GaAs, CdFeO. 3, MoS 2, LaRhO 3, GaN, CdP, ZnS, ZnSe, ZnTe, Nb 2 O 5, ZrO 2, InP, GaAsP, InGaAlP, AlGaAs, PbS, InAs, PbSe, InSb, SiO 2, Al 2 O 3, AlGaAs, Al (OH) 3 , Sb 2 O 5 , Si 3 N 4 , Sn—In 2 O 3 , Sb—In 2 O 3 , MgF, CeF 3 , CeO 2 , 3Al 2 O 3 .2SiO 2 , BeO, SiC, AlN, Fe, Co, Co-FeO x, CrO 2, Fe 4 N, BaTiO 3, BaO-Al 2 O 3 -SiO 2, Ba ferrite, Sm O 5, YCO 5, CeCO 5 , PrCO 5, Sm 2 CO 17, Nd 2 Fe 14 B, Al 4 O 3, α-Si, SiN 4, CoO, Sb-SnO 2, Sb 2 O 5, MnO 2, MnB, Co 3 O 4, Co 3 B, LiTaO 3, MgO, MgAl 2 O 4, BeAl 2 O 4, ZrSiO 4, ZnSb, PbTe, GeSi, FeSi 2, CrSi 2, CoSi 2, MnSi 1.73, Mg 2 Si , Β-B, BaC, BP, TiB 2 , ZrB 2 , HfB 2 , Ru 2 Si 3 , TiO 2 (rutile type, anatase type), TiO 3 , PbTiO 3 , Al 2 TiO 5 , Zn 2 SiO 4 , Zr 2 SiO 4, 2MgO 2 -Al 2 O 3 -5SiO 2, Nb 2 O 5, Li 2 O-Al 2 O 3 -4SiO 2, Mg ferrite, Ni ferrite, Ni-Zn ferrite, Li ferrite, S Examples include r-ferrite, Pt, Au, Ag, Fe, and Cu. By using such metal oxides or metal particles, control of optical properties such as refractive index of a cured film obtained by curing a sulfonic acid group-containing aqueous dispersion, electrical properties such as dielectric constant, insulation, and conductivity. Properties can be controlled. These particles can be used alone, but may be supported on particles such as carbon black and calcium carbonate.
本発明のスルホン酸基含有水系分散体は、コーティング材、特に電池セパレーター用不織布のコーティング材やバインダー樹脂、高分子固体電解質膜など種々用途に応用可能である。また、種々用途に応用する際、物性等を改良するために、他のポリマーを併用することもできる。他のポリマーとしては、例えばウレタン樹脂、アクリル樹脂、ポリエステル樹脂、ポリアミド樹脂、ポリエーテル、ポリスチレン、ポリエステルアミド、ポリカーボネート、ポリ塩化ビニル、SBRやNBRなどのジエン系ポリマーなど公知のものが挙げられる。 The sulfonic acid group-containing aqueous dispersion of the present invention can be applied to various uses such as a coating material, particularly a coating material for a nonwoven fabric for battery separators, a binder resin, and a polymer solid electrolyte membrane. Moreover, when applying to various uses, in order to improve physical properties etc., another polymer can also be used together. Examples of other polymers include known resins such as urethane resins, acrylic resins, polyester resins, polyamide resins, polyethers, polystyrenes, polyester amides, polycarbonates, polyvinyl chloride, and diene polymers such as SBR and NBR.
また、本発明のスルホン酸基含有水系分散体は、キャストフィルム成形などの成形法を用いて精度の良いフィルムを得ることができ、例えば、イオン交換膜などに好適に用いることができる。 Moreover, the sulfonic acid group-containing aqueous dispersion of the present invention can obtain a film with high accuracy by using a molding method such as cast film molding, and can be suitably used for, for example, an ion exchange membrane.
本発明のスルホン酸基含有水系分散体は、通常、単品あるいは各種添加物を加えた配合物として使用される。コーティング材として使用する場合、コーティング方法には特に制限なく、刷毛塗り、スプレー、ロールコーター、フローコーター、バーコーター、ディップコーターなどを使用することができる。塗布膜厚は、用途によって異なるが、乾燥膜厚で、通常、0.01〜1,000μm、好ましくは0.05〜500μmである。 The sulfonic acid group-containing aqueous dispersion of the present invention is usually used as a single product or as a blend containing various additives. When used as a coating material, the coating method is not particularly limited, and brush coating, spraying, roll coater, flow coater, bar coater, dip coater and the like can be used. The coating film thickness varies depending on the use, but is usually a dry film thickness of 0.01 to 1,000 μm, preferably 0.05 to 500 μm.
また、使用される基材には特に制限はなく、例えば、ポリカーボネート樹脂、アクリル樹脂、ABS樹脂、ポリエステル樹脂、ポリエチレン、ポリプロピレン、ナイロンなどの高分子材料、アルミニウム、銅、ジュラルミンなどの非鉄金属、ステンレス、鉄などの鋼板、ガラス、木材、紙、石膏、アルミナ、無機質硬化体などが挙げられる。基材の形状に特に制限はなく、平面状のものから不織布などの多孔質材料などにも使用できる。 Moreover, there is no restriction | limiting in particular in the base material used, For example, non-ferrous metals, such as polycarbonate resin, an acrylic resin, ABS resin, polyester resin, polyethylene, polypropylene, nylon, nonferrous metals, such as aluminum, copper, and duralumin, stainless steel Steel plates such as iron, glass, wood, paper, gypsum, alumina, and hardened inorganic materials. There is no restriction | limiting in particular in the shape of a base material, It can use for porous materials, such as a flat thing, a nonwoven fabric.
本発明のスルホン酸基含有水系分散体は、乾燥膜として燃料電池などの高分子固体電解質や、基材表面の改質剤として使用できる。例えば、疎水性表面にコーティングすることにより、親水性、吸湿性の発現あるいはその維持が可能となる。また、静電気などによる汚れ、埃付着防止が可能である。さらに、不織布などの多孔質材料にコーティングした場合には、例えば空気中あるいは水中に存在するアンモニア、アミンなどの弱塩基、またはイオン性物質の捕捉作用を示す。また、電池用セパレータの表面をコーティング処理することにより、電池用電解質との親和性が向上し、自己放電特性など電池特性の向上に繋がるといった効果も期待できる。加えて、前記の各種粒子を高度に分散させることも特徴の一つであり、粒子がもつ機能性を十分発揮できるという特徴もある。 The sulfonic acid group-containing aqueous dispersion of the present invention can be used as a dry membrane for a solid polymer electrolyte such as a fuel cell or a modifier for a substrate surface. For example, by coating on a hydrophobic surface, it becomes possible to develop or maintain hydrophilicity and hygroscopicity. In addition, it is possible to prevent dirt and dust due to static electricity. Further, when coated on a porous material such as a non-woven fabric, it exhibits an action of capturing weak bases such as ammonia and amines present in air or water, or ionic substances. In addition, by coating the surface of the battery separator, it is possible to expect an effect that the affinity with the battery electrolyte is improved and the battery characteristics such as self-discharge characteristics are improved. In addition, it is one of the characteristics that the various particles are highly dispersed, and the function of the particles can be sufficiently exhibited.
以下、本発明を実施例により説明するが、本発明は、この実施例により何ら限定されるものではない。なお、実施例、比較例における各種の評価、測定は、下記方法により実施した。 EXAMPLES Hereinafter, although an Example demonstrates this invention, this invention is not limited at all by this Example. In addition, various evaluation and measurement in an Example and a comparative example were implemented with the following method.
<評価方法>
(平均粒子径の測定)
得られた分散体について、日機装社製のマイクロトラック粒度分布測定装置(UPA150)を用いて体積平均粒子径を測定した。
<Evaluation method>
(Measurement of average particle size)
About the obtained dispersion, the volume average particle diameter was measured using the Nikkiso Co., Ltd. microtrac particle size distribution measuring apparatus (UPA150).
(貯蔵安定性の測定)
得られた分散体80gを100ccのガラス製スクリュー管に入れて密閉し、25℃で3日間静置してから、分散体の状態を目視観察し、以下の基準で貯蔵安定性を判定した。
○:沈殿も増粘も見られず、初期の状態を維持した。
△:少量の沈殿、または、増粘が観察された。
×:透明な上澄みと白色の沈殿に分離、または、系全体がゲル化した。
(Measurement of storage stability)
80 g of the obtained dispersion was put in a 100 cc glass screw tube, sealed, and allowed to stand at 25 ° C. for 3 days. The state of the dispersion was visually observed, and storage stability was determined according to the following criteria.
○: No precipitation or thickening was observed, and the initial state was maintained.
Δ: A small amount of precipitation or thickening was observed.
X: It isolate | separated into the transparent supernatant and white precipitation, or the whole system gelatinized.
(スルホン酸基量の測定)
得られた分散体について、フェノールフタレインを指示薬、水酸化カリウムエタノール溶液を塩基とした酸塩基滴定でスルホン酸基量を測定した。
(Measurement of the amount of sulfonic acid group)
About the obtained dispersion, the amount of sulfonic acid groups was measured by acid-base titration using phenolphthalein as an indicator and potassium hydroxide ethanol solution as a base.
(耐水性の評価)
得られた分散体を、乾燥後の膜厚が0.2mmとなるように4フッ化エチレン重合体(登録商標:テフロン)製の枠に流し、25℃にて24hr放置して溶媒を揮発させた。次いで150℃で1時間加熱処理した後、温度25℃、相対湿度60%にて24時間養生した。得られた膜を60℃で水中に12時間浸漬した後に乾燥、浸漬前後の重量変化から膜残存率を測定した。
(Evaluation of water resistance)
The obtained dispersion is poured into a frame made of a tetrafluoroethylene polymer (registered trademark: Teflon) so that the film thickness after drying becomes 0.2 mm, and left for 24 hours at 25 ° C. to volatilize the solvent. It was. Subsequently, after heat-treating at 150 ° C. for 1 hour, it was cured at a temperature of 25 ° C. and a relative humidity of 60% for 24 hours. The obtained film was immersed in water at 60 ° C. for 12 hours, dried, and the film remaining rate was measured from the weight change before and after immersion.
(体積抵抗の測定)
得られた分散体を、乾燥後の膜厚が0.2mmとなるように4フッ化エチレン重合体(登録商標:テフロン)製の枠に流し、25℃にて24hr放置して溶媒を揮発させた。次いで150℃で1時間加熱処理した後、温度25℃、相対湿度60%にて24時間養生した。得られた膜を25℃で水中に24時間浸漬した後、白金箔を付けた2つのテフロンブロック間に挟み、四隅を止めて測定セルを作成した。この際、膜に対して垂直方向から見たときに、各白金箔間の間隔が0.5cmとなるように調整した。本セルの白金電極部分に、日置電機社製3532−80ケミカルインピーダンスメータを接続し、両白金電極間の交流インピーダンスを周波数1kHzにて測定して該フィルムの体積抵抗を算出した。
(Measurement of volume resistance)
The obtained dispersion is poured into a frame made of a tetrafluoroethylene polymer (registered trademark: Teflon) so that the film thickness after drying becomes 0.2 mm, and left for 24 hours at 25 ° C. to volatilize the solvent. It was. Subsequently, after heat-treating at 150 ° C. for 1 hour, it was cured at a temperature of 25 ° C. and a relative humidity of 60% for 24 hours. The obtained film was immersed in water at 25 ° C. for 24 hours, and then sandwiched between two Teflon blocks provided with platinum foil, and four corners were stopped to prepare a measurement cell. At this time, the distance between the platinum foils was adjusted to 0.5 cm when viewed from the direction perpendicular to the film. A 3532-80 chemical impedance meter manufactured by Hioki Electric Co., Ltd. was connected to the platinum electrode portion of this cell, and the alternating current impedance between both platinum electrodes was measured at a frequency of 1 kHz to calculate the volume resistance of the film.
実施例1
(スルホン化によってスルホン酸基を導入できる官能基を含むR1を有する(A)成分を導入し、スルホン化する方法)
〔メルカプト基含有エマルジョンの合成〕
(A)ポリオルガノシロキサン(X40−9246:信越シリコーン社製、ジメチルジメトキシシラン50モル%とメチルトリメトキシシラン50モル%からなる平均分子量870の縮合体)45重量部、γ―メルカプトプロピルトリメトキシシラン(KBM−803:信越シリコーン社製)15重量部、γ-メタクリロキシプロピルトリメトキシシラン1重量部、(B)メチルメタクリレート15重量部、2−エチルヘキシルアクリレート10重量部、シクロヘキシルメタクリレート8重量部、ヒドロキシエチルメタクリレート2重量部、ジアセトンアクリルアミド4重量部、(C)ドデシルベンゼンスルホン酸0.8重量部、ポリオキシエチレンアルキルエーテル(エマルゲン147:花王社製)3重量部、(D)水300重量部をビーカーに仕込み、常温にて2時間攪拌を行った後、70MPaの圧力で高圧ホモジナイザー(みずほ工業社製、商品名:マイクロフルイダイザーM110Y)で微細化した。このときの平均粒子径は0.14μmであった。この乳化物をセパラブルフラスコに投入し、撹拌しながら、窒素置換後に、(F)アゾビスイソブチロニトリル0.2重量部を加え、75℃で4時間重合した。
Example 1
(Method of introducing and sulfonating component (A) having R 1 containing a functional group capable of introducing a sulfonic acid group by sulfonation)
(Synthesis of mercapto group-containing emulsion)
(A) Polyorganosiloxane (X40-9246: manufactured by Shin-Etsu Silicone Co., Ltd., condensate having an average molecular weight of 870 consisting of 50 mol% of dimethyldimethoxysilane and 50 mol% of methyltrimethoxysilane), 45 parts by weight, γ-mercaptopropyltrimethoxysilane (KBM-803: manufactured by Shin-Etsu Silicone) 15 parts by weight, 1 part by weight of γ-methacryloxypropyltrimethoxysilane, (B) 15 parts by weight of methyl methacrylate, 10 parts by weight of 2-ethylhexyl acrylate, 8 parts by weight of cyclohexyl methacrylate, hydroxy 2 parts by weight of ethyl methacrylate, 4 parts by weight of diacetone acrylamide, (C) 0.8 part by weight of dodecylbenzenesulfonic acid, 3 parts by weight of polyoxyethylene alkyl ether (Emulgen 147: manufactured by Kao Corporation), (D) 300 parts by weight of water The beaker In charge, after stirred for 2 hours at room temperature, high-pressure homogenizer (Mizuho Industrial Co., Ltd., trade name: Microfluidizer M110Y) at a pressure of 70MPa was fine with. The average particle size at this time was 0.14 μm. This emulsion was put into a separable flask, and after substitution with nitrogen while stirring, 0.2 part by weight of (F) azobisisobutyronitrile was added and polymerized at 75 ° C. for 4 hours.
〔メルカプト基の酸化〕
重合反応終了後、60℃まで冷却し、10%過酸化水素水100重量部および1%硫酸第一鉄水溶液250重量部を添加し、60℃にて1時間攪拌して酸化反応を行なった。冷却後、200メッシュのステンレス金網でろ過し、スルホン酸基含有水系分散体を得た。得られた水系分散体について上記の方法に従って、各種測定、試験を行ない、結果を表1に示した。なお、成膜前に架橋剤として(E)アジピン酸ジヒドラジド2重量部を加えた。
[Oxidation of mercapto group]
After completion of the polymerization reaction, the mixture was cooled to 60 ° C., 100 parts by weight of 10% aqueous hydrogen peroxide and 250 parts by weight of 1% ferrous sulfate aqueous solution were added, and the mixture was stirred at 60 ° C. for 1 hour to carry out an oxidation reaction. After cooling, the mixture was filtered through a 200 mesh stainless steel wire mesh to obtain a sulfonic acid group-containing aqueous dispersion. The obtained aqueous dispersion was subjected to various measurements and tests according to the above-mentioned methods. The results are shown in Table 1. In addition, 2 parts by weight of (E) adipic acid dihydrazide was added as a crosslinking agent before film formation.
実施例2
(スルホン酸基を有するモノマーを製造に用いることでスルホン酸基を導入する方法)
(A)X40−9246 60重量部、γ-メタクリロキシプロピルトリメトキシシラン1重量部、(B−1)イソプロピルアクリルアミド8重量部、2−エチルヘキシルアクリレート4重量部、シクロヘキシルメタクリレート4重量部、ヒドロキシエチルメタクリレート1重量部、ジアセトンアクリルアミド2重量部、(C)ドデシルベンゼンスルホン酸0.8重量部、およびエマルゲン147 3重量部、(D)水300重量部を仕込み、常温にて2時間攪拌を行った後、70MPaの圧力で高圧ホモジナイザー(マイクロフルイダイザーM110Y)で微細化した。このときの平均粒子径は0.10μmであった。この乳化物をセパラブルフラスコに投入し、昇温を開始、反応器内温度60℃にて(F)アゾビスイソブチロニトリル0.2重量部を加え、75℃で30分間重合、さらに水100重量部に(B−2)2-アクリルアミド-2-メチルプロパンスルホン酸20重量部、オクチルチオグリコール0.5重量部を溶解した水溶液70.5重量部を30分間かけて前記セパラブルフラスコに滴下し、75℃に保ちながら3時間攪拌を続けてから冷却した。これを200メッシュのステンレス金網でろ過し、スルホン酸基含有水系分散体を得た。得られた水系分散体について上記の方法に従って、各種測定、試験を行ない、結果を表1に示した。なお、成膜前に架橋剤として(E)アジピン酸ジヒドラジド1重量部とジブチルスズジラウレート1部を加えた。
Example 2
(Method of introducing a sulfonic acid group by using a monomer having a sulfonic acid group for production)
(A) 60 parts by weight of X40-9246, 1 part by weight of γ-methacryloxypropyltrimethoxysilane, (B-1) 8 parts by weight of isopropylacrylamide, 4 parts by weight of 2-ethylhexyl acrylate, 4 parts by weight of cyclohexyl methacrylate, hydroxyethyl methacrylate 1 part by weight, 2 parts by weight of diacetone acrylamide, 0.8 part by weight of (C) dodecylbenzenesulfonic acid, 3 parts by weight of Emulgen 147, and (D) 300 parts by weight of water were charged and stirred at room temperature for 2 hours. Then, it refined | miniaturized with the high pressure homogenizer (microfluidizer M110Y) with the pressure of 70 MPa. The average particle size at this time was 0.10 μm. This emulsion was put into a separable flask, temperature increase was started, 0.2 parts by weight of (F) azobisisobutyronitrile was added at a reactor internal temperature of 60 ° C., polymerization was performed at 75 ° C. for 30 minutes, and water was added. 70.5 parts by weight of an aqueous solution in which 20 parts by weight of (B-2) 2-acrylamido-2-methylpropanesulfonic acid and 0.5 parts by weight of octylthioglycol are dissolved in 100 parts by weight is added to the separable flask over 30 minutes. The solution was added dropwise, and the mixture was stirred for 3 hours while being kept at 75 ° C. and then cooled. This was filtered with a 200 mesh stainless steel wire mesh to obtain a sulfonic acid group-containing aqueous dispersion. The obtained aqueous dispersion was subjected to various measurements and tests according to the above-mentioned methods. The results are shown in Table 1. In addition, (E) 1 part by weight of adipic acid dihydrazide and 1 part of dibutyltin dilaurate were added as a crosslinking agent before film formation.
実施例3
(スルホン酸基を導入できる官能基を含む(B)成分を導入し、スルホン化する方法)
〔前駆体エマルジョンの合成〕
(A)X40−9246 60重量部、γ-メタクリロキシプロピルトリメトキシシラン1重量部、(B)グリシジルメタクリレート33重量部、ヒドロキシエチルメタクリレート2重量部、ジアセトンアクリルアミド4重量部、(C)ドデシルベンゼンスルホン酸ナトリウム1重量部、エマルゲン147 3重量部、(D)水300重量部を仕込み、常温にて2時間攪拌を行った後、70MPaの圧力で高圧ホモジナイザー(マイクロフルイダイザーM110Y)で微細化した。このときの平均粒子径は0.11μmであった。この乳化物をセパラブルフラスコに投入し、撹拌しながら、窒素置換後に、(F)アゾビスイソブチロニトリル0.2重量部を加え、75℃で4時間重合した。
Example 3
(Method of introducing and sulfonating component (B) containing a functional group capable of introducing a sulfonic acid group)
(Synthesis of precursor emulsion)
(A) 60 parts by weight of X40-9246, 1 part by weight of γ-methacryloxypropyltrimethoxysilane, (B) 33 parts by weight of glycidyl methacrylate, 2 parts by weight of hydroxyethyl methacrylate, 4 parts by weight of diacetone acrylamide, (C) dodecylbenzene 1 part by weight of sodium sulfonate, 3 parts by weight of Emulgen 147, and 300 parts by weight of (D) water were added, stirred for 2 hours at room temperature, and then refined with a high-pressure homogenizer (microfluidizer M110Y) at a pressure of 70 MPa. . The average particle size at this time was 0.11 μm. This emulsion was put into a separable flask, and after substitution with nitrogen while stirring, 0.2 part by weight of (F) azobisisobutyronitrile was added and polymerized at 75 ° C. for 4 hours.
〔メルカプト基の導入と酸化)
重合反応終了後、60℃まで冷却し、2−メルカプトエチルアミン18重量部を添加して1時間攪拌、さらに10%過酸化水素水100重量部および1%硫酸第一鉄水溶液250重量部を添加し、60℃にて1時間攪拌して酸化反応を行なった。冷却後、200メッシュのステンレス金網でろ過し、スルホン酸基含有水系分散体を得た。得られた水系分散体について上記の方法に従って、各種測定、試験を行ない、結果を表1に示した。なお、成膜前に架橋剤として(E)アジピン酸ジヒドラジド2重量部を加えた。
[Introduction and oxidation of mercapto group]
After completion of the polymerization reaction, the mixture was cooled to 60 ° C., 18 parts by weight of 2-mercaptoethylamine was added and stirred for 1 hour, and 100 parts by weight of 10% hydrogen peroxide and 250 parts by weight of 1% ferrous sulfate aqueous solution were added. The oxidation reaction was carried out by stirring at 60 ° C. for 1 hour. After cooling, the mixture was filtered through a 200 mesh stainless steel wire mesh to obtain a sulfonic acid group-containing aqueous dispersion. The obtained aqueous dispersion was subjected to various measurements and tests according to the above-mentioned methods. The results are shown in Table 1. In addition, 2 parts by weight of (E) adipic acid dihydrazide was added as a crosslinking agent before film formation.
実施例4
(スルホン酸基を有するポリマーを添加する方法)
(A)X40−9246 60重量部、γ-メタクリロキシプロピルトリメトキシシラン1重量部、(B−1)イソプロピルアクリルアミド8重量部、2−エチルヘキシルアクリレート4重量部、シクロヘキシルメタクリレート4重量部、ヒドロキシエチルメタクリレート1重量部、ジアセトンアクリルアミド2重量部、(C)ドデシルベンゼンスルホン酸ナトリウム1重量部、およびエマルゲン147 3重量部、(D)水300重量部を仕込み、常温にて2時間攪拌を行った後、70MPaの圧力で高圧ホモジナイザー(マイクロフルイダイザーM110Y)で微細化した。このときの平均粒子径は0.10μmであった。この乳化物をセパラブルフラスコに投入し、攪拌・昇温を開始、反応器内温度60℃にてアゾビスイソブチロニトリル0.2重量部を加え、75℃に保ちながら3時間攪拌を続けてから冷却し、スルホン酸基を含有しない水系分散体を得た。
Example 4
(Method of adding a polymer having a sulfonic acid group)
(A) 60 parts by weight of X40-9246, 1 part by weight of γ-methacryloxypropyltrimethoxysilane, (B-1) 8 parts by weight of isopropylacrylamide, 4 parts by weight of 2-ethylhexyl acrylate, 4 parts by weight of cyclohexyl methacrylate, hydroxyethyl methacrylate 1 part by weight, 2 parts by weight of diacetone acrylamide, (C) 1 part by weight of sodium dodecylbenzenesulfonate, 3 parts by weight of Emulgen 147 and (D) 300 parts by weight of water were added and stirred at room temperature for 2 hours. The material was refined with a high-pressure homogenizer (Microfluidizer M110Y) at a pressure of 70 MPa. The average particle size at this time was 0.10 μm. The emulsion was put into a separable flask, stirring and heating were started, 0.2 parts by weight of azobisisobutyronitrile was added at a reactor internal temperature of 60 ° C, and stirring was continued for 3 hours while maintaining the temperature at 75 ° C. After cooling, an aqueous dispersion containing no sulfonic acid group was obtained.
別のセパラブルフラスコに、水100重量部、2-アクリルアミド-2-メチルプロパンスルホン酸20重量部、ジアセトンアクリルアミド2重量部、オクチルチオグリコール0.5部を仕込み、昇温を開始、反応器内温度60℃にて(F)アゾビスイソブチロニトリル0.2重量部を加え、75℃に保ちながら3時間攪拌を続けてから冷却し、スルホン酸基を有するポリマーを得た。 In a separate separable flask, 100 parts by weight of water, 20 parts by weight of 2-acrylamido-2-methylpropanesulfonic acid, 2 parts by weight of diacetone acrylamide, and 0.5 parts of octylthioglycol were charged, and the temperature was raised. At an internal temperature of 60 ° C., 0.2 part by weight of (F) azobisisobutyronitrile was added, and stirring was continued for 3 hours while maintaining at 75 ° C., followed by cooling to obtain a polymer having sulfonic acid groups.
前記スルホン酸基を含有しない水系分散体を攪拌しながら、この中に、前記スルホン酸基を有するポリマーを添加、これを200メッシュのステンレス金網でろ過し、スルホン酸基含有水系分散体を得た。得られた水系分散体について上記の方法に従って、各種測定、試験を行ない、結果を表1に示した。なお、成膜前に架橋剤として(E)アジピン酸ジヒドラジド2重量部とジブチルスズジラウレート1部を加えた。 While stirring the aqueous dispersion containing no sulfonic acid group, the polymer having the sulfonic acid group was added thereto, and this was filtered through a 200-mesh stainless wire mesh to obtain a sulfonic acid group-containing aqueous dispersion. . The obtained aqueous dispersion was subjected to various measurements and tests according to the above-mentioned methods. The results are shown in Table 1. Before film formation, 2 parts by weight of (E) adipic acid dihydrazide and 1 part of dibutyltin dilaurate were added as a crosslinking agent.
実施例5
(平均粒子径が大きな例)
実施例1において(C)成分としてドデシルベンゼンスルホン酸0.05重量部のみを用いた以外は同様の操作を行った。
Example 5
(Example of large average particle size)
The same operation was performed except that only 0.05 part by weight of dodecylbenzenesulfonic acid was used as the component (C) in Example 1.
比較例1
(ポリオルガノシロキサンを含まない例)
実施例2にて、(A)成分を加えず、(B)成分を(B−1)イソプロピルアクリルアミド38重量部、2−エチルヘキシルアクリレート 20重量部、シクロヘキシルメタクリレート19重量部、ヒドロキシエチルメタクリレート1重量部、ジアセトンアクリルアミド2重量部、および(B−2)2-アクリルアミド-2-メチルプロパンスルホン酸20重量部とした以外は同様の操作を行った。
Comparative Example 1
(Example not containing polyorganosiloxane)
In Example 2, component (A) was not added, and component (B) was (B-1) 38 parts by weight of isopropylacrylamide, 20 parts by weight of 2-ethylhexyl acrylate, 19 parts by weight of cyclohexyl methacrylate, and 1 part by weight of hydroxyethyl methacrylate. The same operation was performed except that 2 parts by weight of diacetone acrylamide and 20 parts by weight of (B-2) 2-acrylamido-2-methylpropanesulfonic acid were used.
比較例2
(スルホン酸基を含まない例)
実施例2にて(B−1)イソプロピルアクリルアミド18重量部、2−エチルヘキシルアクリレート9重量部、シクロヘキシルメタクリレート9重量部、ヒドロキシエチルメタクリレート1重量部、ジアセトンアクリルアミド2重量部、(C)ドデシルベンゼンスルホン酸ナトリウム0.8重量部とし、(B−2)2-アクリルアミド-2-メチルプロパンスルホン酸を加えなかった以外は同様の操作を行った。
Comparative Example 2
(Example without sulfonic acid group)
In Example 2, (B-1) 18 parts by weight of isopropylacrylamide, 9 parts by weight of 2-ethylhexyl acrylate, 9 parts by weight of cyclohexyl methacrylate, 1 part by weight of hydroxyethyl methacrylate, 2 parts by weight of diacetone acrylamide, (C) dodecylbenzenesulfone The same operation was carried out except that 0.8 part by weight of sodium acid was added and (B-2) 2-acrylamido-2-methylpropanesulfonic acid was not added.
表1に示すように、実施例1〜5は平均粒子径が本発明の範囲内にあり、スルホン酸基を有するため、耐水性および体積抵抗がともに良好な結果となった。
比較例1は、耐水性を発現するポリオルガノシロキサンが含まれていないため、耐水性が劣る結果となった。
比較例2は、スルホン酸基が含まれていないため、体積抵抗が大きい結果となった。
As shown in Table 1, since Examples 1 to 5 had an average particle diameter within the range of the present invention and had a sulfonic acid group, both water resistance and volume resistance were satisfactory.
Since the comparative example 1 did not contain the polyorganosiloxane which expresses water resistance, it resulted in inferior water resistance.
Since Comparative Example 2 did not contain a sulfonic acid group, the volume resistance was large.
本発明のスルホン酸基含有水系分散体は、コーティング材、特に電池セパレーター用不織布のコーティング材やバインダー樹脂、高分子固体電解質膜など種々用途に適用可能である。また、フィルムにも適用でき、例えば、イオン交換膜などに好適に用いることができる。
本発明のスルホン酸基含有水系分散体は、乾燥膜として燃料電池などの高分子固体電解質や、基材表面の改質剤として使用できる。
The sulfonic acid group-containing aqueous dispersion of the present invention can be applied to various uses such as a coating material, particularly a non-woven fabric coating material for a battery separator, a binder resin, and a polymer solid electrolyte membrane. Moreover, it is applicable also to a film and can be used suitably for an ion exchange membrane etc., for example.
The sulfonic acid group-containing aqueous dispersion of the present invention can be used as a dry membrane for a solid polymer electrolyte such as a fuel cell or a modifier for a substrate surface.
本発明のスルホン酸基含有水系分散体は、種々用途に応用可能である。多孔質材料などに応用した場合には、例えば繊維用カチオン染色助剤、吸水性不織布、防汚材料、イオン交換繊維、電池用セパレータ親水化処理剤、アンモニア、イオン性物質などを除去するための空気清浄フィルター、水清浄フィルターなどのフィルター用途、白血球除去用フィルター、花粉症アレルゲン除去材料、水蒸気透過材料、抗菌材料、消臭繊維、消臭塗料、消臭性紙、防曇材、結露防止材料などの調湿材料、帯電防止材料、防食材料、酸素吸収剤、衛生用品、活性炭の表面改質などが挙げられる。また、フロアポリッシュ用、マスキング材、紙用サイズ材、紙力増強材、接着剤、ハロゲン化銀写真感光材料などの写真材料などへの応用も可能である。 The sulfonic acid group-containing aqueous dispersion of the present invention can be applied to various uses. When applied to porous materials, etc., for example, for removing cation dyeing aids for fibers, water-absorbing nonwoven fabrics, antifouling materials, ion exchange fibers, battery separator hydrophilizing agents, ammonia, ionic substances, etc. Filter applications such as air purification filters, water purification filters, leukocyte removal filters, hay fever allergen removal materials, water vapor permeable materials, antibacterial materials, deodorant fibers, deodorant paints, deodorant paper, antifogging materials, anti-condensation materials Humidity control materials such as antistatic materials, anticorrosion materials, oxygen absorbents, sanitary products, and surface modification of activated carbon. Further, it can be applied to photographic materials such as floor polish, masking material, paper size material, paper strength enhancing material, adhesive, and silver halide photographic light-sensitive material.
また、本発明のスルホン酸基含有水系分散体は、各種機能性粒子を組み合わせることにより、種々用途に適用可能である。例えば、一般塗料、回路基板用塗料、導電性材料、固体電解質のバインダー、あるいは電極物質用バインダーなどの電池材料、電磁波シールド材料、帯電防止塗料、面状発熱体、電気化学的反応電極版、電気接点材料、摩擦材、抗菌材料、摺動材、研磨材料、磁気記録媒体、感熱記録材料、エレクトロクロミック材料、光拡散フィルム、通信ケーブル用遮水材、遮光フィルム、遮音シート、プラスチック磁石、X線増感スクリーン、印刷インキ、農薬粒剤、電子写真トナーなどが挙げられる。また、表面保護用のコーティング材として、例えばステンレス、アルミニウム、銅などの金属、コンクリート、スレートなどの無機物、ポリエチレン、ポリプロピレンなどのポリオレフィン、ポリエチレンテレフタレートなどのポリエステルなどの高分子材料、木材、紙への応用も可能である。 Moreover, the sulfonic acid group-containing aqueous dispersion of the present invention can be applied to various applications by combining various functional particles. For example, battery materials such as general paint, circuit board paint, conductive material, solid electrolyte binder, or electrode material binder, electromagnetic shielding material, antistatic paint, sheet heating element, electrochemical reaction electrode plate, electric Contact materials, friction materials, antibacterial materials, sliding materials, polishing materials, magnetic recording media, thermal recording materials, electrochromic materials, light diffusion films, water shielding materials for communication cables, light shielding films, sound insulation sheets, plastic magnets, X-rays Examples include intensifying screens, printing inks, agricultural chemical granules, and electrophotographic toners. In addition, as a coating material for surface protection, for example, metals such as stainless steel, aluminum and copper, inorganic materials such as concrete and slate, polyolefin materials such as polyethylene and polypropylene, polymer materials such as polyester such as polyethylene terephthalate, wood and paper Application is also possible.
Claims (11)
さらにスルホン酸基を含む水系分散体。 An aqueous dispersion containing polymer particles containing polyorganosiloxane as an essential component and an aqueous medium,
Further, an aqueous dispersion containing sulfonic acid groups.
(A)一般式(1)
(R1)n−Si−(OR2)4-n……(1)
(式中、R1は2個存在するときは同一または異なり、フェニル基または炭素数1〜8の1価の有機基、R2は同一または異なり、炭素数1〜5のアルキル基または炭素数1〜6のアシル基を示し、nは0〜2の整数である)
で表されるオルガノシラン、その加水分解物およびその縮合物の群から選ばれた少なくとも1種を1〜100重量部
(B)ラジカル重合性モノマー99〜0重量部[ただし、(A)+(B)=100重量部]
(C)乳化剤0.1〜50重量部[ただし、(A)+(B)=100重量部に対して]
(D)水50〜2,000重量部[ただし、(A)+(B)=100重量部に対して] The following (A)-(D) component is mixed, and the process of refine | miniaturizing the average particle diameter of an emulsion to 1 micrometer or less is included, Manufacture of an aqueous dispersion which obtains an aqueous dispersion by performing radical polymerization as needed Method.
(A) General formula (1)
(R 1) n -Si- (OR 2) 4-n ...... (1)
(In the formula, when two R 1 exist, they are the same or different, a phenyl group or a monovalent organic group having 1 to 8 carbon atoms, R 2 is the same or different, and an alkyl group or carbon number having 1 to 5 carbon atoms. An acyl group of 1-6, n is an integer of 0-2)
1 to 100 parts by weight (B) radical polymerizable monomer 99 to 0 parts by weight [provided that (A) + ( B) = 100 parts by weight]
(C) 0.1-50 parts by weight of emulsifier [provided that (A) + (B) = 100 parts by weight]
(D) 50 to 2,000 parts by weight of water [provided that (A) + (B) = 100 parts by weight]
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003371990A JP4244782B2 (en) | 2003-10-31 | 2003-10-31 | Aqueous dispersion containing sulfonic acid groups |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003371990A JP4244782B2 (en) | 2003-10-31 | 2003-10-31 | Aqueous dispersion containing sulfonic acid groups |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005132996A true JP2005132996A (en) | 2005-05-26 |
JP4244782B2 JP4244782B2 (en) | 2009-03-25 |
Family
ID=34648492
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003371990A Expired - Lifetime JP4244782B2 (en) | 2003-10-31 | 2003-10-31 | Aqueous dispersion containing sulfonic acid groups |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4244782B2 (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005190813A (en) * | 2003-12-25 | 2005-07-14 | Toyota Motor Corp | Electrolyte material for fuel cell electrode |
WO2005111103A1 (en) * | 2004-05-13 | 2005-11-24 | Mitsubishi Gas Chemical Co., Inc. | Solid polymer electrolyte membrane and fuel cell |
WO2007069596A1 (en) * | 2005-12-13 | 2007-06-21 | Asahi Kasei Chemicals Corporation | Aqueous organic-inorganic hybrid composition |
WO2008004644A1 (en) | 2006-07-04 | 2008-01-10 | Sumitomo Chemical Company, Limited | Polymer electrolyte emulsion and use thereof |
WO2008004645A1 (en) | 2006-07-04 | 2008-01-10 | Sumitomo Chemical Company, Limited | Polymer electrolyte emulsion and use thereof |
WO2008004643A1 (en) | 2006-07-04 | 2008-01-10 | Sumitomo Chemical Company, Limited | Method for producing polymer electrolyte emulsion |
JP2008031464A (en) * | 2006-07-04 | 2008-02-14 | Sumitomo Chemical Co Ltd | Polymer electrolyte emulsion and use thereof |
CN115180884A (en) * | 2022-06-30 | 2022-10-14 | 麦杰祥 | Sound absorption and noise reduction concrete and preparation method thereof |
-
2003
- 2003-10-31 JP JP2003371990A patent/JP4244782B2/en not_active Expired - Lifetime
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005190813A (en) * | 2003-12-25 | 2005-07-14 | Toyota Motor Corp | Electrolyte material for fuel cell electrode |
WO2005111103A1 (en) * | 2004-05-13 | 2005-11-24 | Mitsubishi Gas Chemical Co., Inc. | Solid polymer electrolyte membrane and fuel cell |
JP4785865B2 (en) * | 2005-12-13 | 2011-10-05 | 旭化成イーマテリアルズ株式会社 | Water-based organic / inorganic composite composition |
WO2007069596A1 (en) * | 2005-12-13 | 2007-06-21 | Asahi Kasei Chemicals Corporation | Aqueous organic-inorganic hybrid composition |
US9403950B2 (en) | 2005-12-13 | 2016-08-02 | Asahi Kasei Chemicals Corporation | Aqueous organic-inorganic hybrid composition |
EP2816087A1 (en) * | 2005-12-13 | 2014-12-24 | Asahi Kasei Chemicals Corporation | Aqueous organic-inorganic hybrid composition |
US8013055B2 (en) | 2005-12-13 | 2011-09-06 | Asahi Kasei Chemicals Corporation | Aqueous organic-inorganic hybrid composition |
JPWO2007069596A1 (en) * | 2005-12-13 | 2009-05-21 | 旭化成ケミカルズ株式会社 | Water-based organic / inorganic composite composition |
JP2010280898A (en) * | 2005-12-13 | 2010-12-16 | Asahi Kasei E-Materials Corp | Aqueous organic-inorganic hybrid composition |
CN101331192B (en) * | 2005-12-13 | 2011-06-01 | 旭化成电子材料株式会社 | Aqueous organic-inorganic hybrid composition |
US7972734B2 (en) | 2006-07-04 | 2011-07-05 | Sumitomo Chemical Company, Limited | Process for producing polymer electrolyte emulsion |
JP2008031464A (en) * | 2006-07-04 | 2008-02-14 | Sumitomo Chemical Co Ltd | Polymer electrolyte emulsion and use thereof |
WO2008004644A1 (en) | 2006-07-04 | 2008-01-10 | Sumitomo Chemical Company, Limited | Polymer electrolyte emulsion and use thereof |
WO2008004643A1 (en) | 2006-07-04 | 2008-01-10 | Sumitomo Chemical Company, Limited | Method for producing polymer electrolyte emulsion |
WO2008004645A1 (en) | 2006-07-04 | 2008-01-10 | Sumitomo Chemical Company, Limited | Polymer electrolyte emulsion and use thereof |
CN115180884A (en) * | 2022-06-30 | 2022-10-14 | 麦杰祥 | Sound absorption and noise reduction concrete and preparation method thereof |
CN115180884B (en) * | 2022-06-30 | 2023-11-14 | 中国建筑第二工程局有限公司 | Sound absorption and noise reduction concrete and preparation method thereof |
Also Published As
Publication number | Publication date |
---|---|
JP4244782B2 (en) | 2009-03-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5599134B2 (en) | Organic / inorganic composite composition using polyfunctional silane | |
JP6081929B2 (en) | Coating composition and antireflection film | |
US20070269653A1 (en) | Coating Compositon, Undercoating Composition, Multilayer Body Having Coating Film Made of Such Composition, Photocatalyst Coating Film, and Molded Body | |
JP2006335925A (en) | Polymer containing sulfonic acid group, method for producing the same and polymer composition | |
JP4244782B2 (en) | Aqueous dispersion containing sulfonic acid groups | |
US20020146573A1 (en) | Polymer composition, cured product, laminate and method for producing the cured product | |
JPWO2008035669A1 (en) | Oxide fine particle-containing organic-inorganic hybrid polymer composition and method for producing the same | |
JP2009235326A (en) | Organic-inorganic composite | |
JP2020050808A (en) | Coating composition | |
JP2002022905A (en) | Anttreflection film, laminate including the same, and method for producing the antireflection film | |
JP4811021B2 (en) | Emulsion composition | |
WO2008007649A1 (en) | Oxide particle-containing resin composition and method for producing the same | |
JP2005120198A (en) | Hydrophilic polymer composition | |
JP2017114949A (en) | Hard coat coated film | |
JP2008274261A (en) | Coating liquid for forming hollow silicone particle-based film and substrate with coating | |
JP4016689B2 (en) | Water-based dispersion and painted body | |
JP2016085239A (en) | Coating composition and method of manufacturing optical coating film | |
JP5362416B2 (en) | Organic / inorganic composite composition | |
JP2002302645A (en) | Coating composition, cured product and laminate, and manufacturing process for cured product | |
WO2005006077A1 (en) | Photosensitive fluororesin composition, cured film obtained from the composition, and method of forming pattern | |
JP2003313386A (en) | Aqueous dispersion | |
JP2004161782A (en) | Aqueous dispersion | |
JP2011099017A (en) | Aqueous organic-inorganic composite composition | |
CN107523101B (en) | Coating film, method for producing coating film, and coating composition | |
JP2016219545A (en) | Coating film for solar cell |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20060817 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20080516 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20080603 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20080730 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20080826 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20081022 |
|
A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20081104 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20081216 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20081229 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4244782 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120116 Year of fee payment: 3 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120116 Year of fee payment: 3 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120116 Year of fee payment: 3 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130116 Year of fee payment: 4 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130116 Year of fee payment: 4 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140116 Year of fee payment: 5 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
EXPY | Cancellation because of completion of term |