JP2005116626A5 - - Google Patents
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- JP2005116626A5 JP2005116626A5 JP2003345890A JP2003345890A JP2005116626A5 JP 2005116626 A5 JP2005116626 A5 JP 2005116626A5 JP 2003345890 A JP2003345890 A JP 2003345890A JP 2003345890 A JP2003345890 A JP 2003345890A JP 2005116626 A5 JP2005116626 A5 JP 2005116626A5
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- 238000009826 distribution Methods 0.000 claims 38
- 238000001514 detection method Methods 0.000 claims 13
- 238000003384 imaging method Methods 0.000 claims 6
- 238000001228 spectrum Methods 0.000 claims 5
- 230000009466 transformation Effects 0.000 claims 5
- 230000000737 periodic effect Effects 0.000 claims 2
- 238000000034 method Methods 0.000 claims 1
- 230000001131 transforming effect Effects 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003345890A JP2005116626A (ja) | 2003-10-03 | 2003-10-03 | 位置検出装置及び位置検出方法、並びに露光装置 |
| US10/952,765 US7418125B2 (en) | 2003-10-03 | 2004-09-30 | Position detection technique |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003345890A JP2005116626A (ja) | 2003-10-03 | 2003-10-03 | 位置検出装置及び位置検出方法、並びに露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005116626A JP2005116626A (ja) | 2005-04-28 |
| JP2005116626A5 true JP2005116626A5 (https=) | 2006-11-16 |
Family
ID=34386352
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003345890A Withdrawn JP2005116626A (ja) | 2003-10-03 | 2003-10-03 | 位置検出装置及び位置検出方法、並びに露光装置 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US7418125B2 (https=) |
| JP (1) | JP2005116626A (https=) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006005242A (ja) * | 2004-06-18 | 2006-01-05 | Canon Inc | 画像処理装置、画像処理方法、露光装置、およびデバイス製造方法 |
| JP2006216865A (ja) * | 2005-02-04 | 2006-08-17 | Canon Inc | 判別方法及び装置、露光装置、並びにデバイス製造方法 |
| JP4891712B2 (ja) * | 2006-09-05 | 2012-03-07 | 株式会社日立ハイテクノロジーズ | 類似度分布を利用したテンプレートマッチング方法を用いた検査装置 |
| US8086043B2 (en) * | 2007-12-21 | 2011-12-27 | Ati Technologies Ulc | System and method of image correlation based on image structure |
| JP5058002B2 (ja) * | 2008-01-21 | 2012-10-24 | 株式会社豊田中央研究所 | 物体検出装置 |
| US20100166257A1 (en) * | 2008-12-30 | 2010-07-01 | Ati Technologies Ulc | Method and apparatus for detecting semi-transparencies in video |
| KR101914101B1 (ko) | 2011-06-28 | 2018-11-02 | 삼성전자 주식회사 | 척의 제어 장치 및 방법, 노광 장치 및 그 제어 방법 |
| NL2011681C2 (en) | 2012-10-26 | 2014-05-01 | Mapper Lithography Ip Bv | Method of determining a position of a substrate in a lithography system, substrate for use in such method, and lithography system for carrying out such method. |
| WO2015147862A1 (en) | 2014-03-28 | 2015-10-01 | Hewlett-Packard Development Company, L.P. | Determine presence of quasi-periodic two-dimensional object |
| CN105988305B (zh) | 2015-02-28 | 2018-03-02 | 上海微电子装备（集团）股份有限公司 | 硅片预对准方法 |
| US9484188B2 (en) * | 2015-03-11 | 2016-11-01 | Mapper Lithography Ip B.V. | Individual beam pattern placement verification in multiple beam lithography |
| TWI583174B (zh) * | 2016-07-06 | 2017-05-11 | 虹光精密工業股份有限公司 | 具有影像移動及塡補功能的影像處理裝置、複印設備及複印方法 |
| EP3714400A1 (en) * | 2017-11-24 | 2020-09-30 | Ecole Polytechnique Federale De Lausanne (Epfl) | Method of handwritten character recognition confirmation |
| CN110827432B (zh) * | 2019-11-11 | 2021-12-28 | 深圳算子科技有限公司 | 一种基于人脸识别的课堂考勤方法及系统 |
| JP7556234B2 (ja) | 2020-08-26 | 2024-09-26 | セイコーエプソン株式会社 | 回路装置、電子機器及びエラー検出方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07120621B2 (ja) * | 1989-05-08 | 1995-12-20 | キヤノン株式会社 | 位置合せ方法 |
| US5841520A (en) * | 1995-08-09 | 1998-11-24 | Nikon Corporatioin | Exposure apparatus and method that use mark patterns to determine image formation characteristics of the apparatus prior to exposure |
| JPH10242041A (ja) * | 1997-02-26 | 1998-09-11 | Nikon Corp | 位置検出方法及びその装置並びに露光装置 |
| US6225639B1 (en) * | 1999-08-27 | 2001-05-01 | Agere Systems Guardian Corp. | Method of monitoring a patterned transfer process using line width metrology |
| JP4532640B2 (ja) | 2000-01-14 | 2010-08-25 | キヤノン株式会社 | 位置検出装置及びそれを用いた露光装置 |
| US6559953B1 (en) * | 2000-05-16 | 2003-05-06 | Intel Corporation | Point diffraction interferometric mask inspection tool and method |
| US7068833B1 (en) * | 2000-08-30 | 2006-06-27 | Kla-Tencor Corporation | Overlay marks, methods of overlay mark design and methods of overlay measurements |
| JP3486606B2 (ja) * | 2000-09-08 | 2004-01-13 | キヤノン株式会社 | 回折光学素子およびそれを用いた光学系 |
| JP2003315973A (ja) * | 2002-04-19 | 2003-11-06 | Fujitsu Ltd | マスク設計装置、マスク設計方法、プログラムおよび半導体装置製造方法 |
-
2003
- 2003-10-03 JP JP2003345890A patent/JP2005116626A/ja not_active Withdrawn
-
2004
- 2004-09-30 US US10/952,765 patent/US7418125B2/en not_active Expired - Fee Related
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