JP2005108709A5 - - Google Patents
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- Publication number
- JP2005108709A5 JP2005108709A5 JP2003342196A JP2003342196A JP2005108709A5 JP 2005108709 A5 JP2005108709 A5 JP 2005108709A5 JP 2003342196 A JP2003342196 A JP 2003342196A JP 2003342196 A JP2003342196 A JP 2003342196A JP 2005108709 A5 JP2005108709 A5 JP 2005108709A5
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- electrodes
- processed
- exposed
- processing method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 claims 11
- 238000003672 processing method Methods 0.000 claims 7
- 239000007787 solid Substances 0.000 claims 4
- 208000028659 discharge Diseases 0.000 claims 3
- 238000010521 absorption reaction Methods 0.000 claims 2
- 238000001035 drying Methods 0.000 claims 2
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003342196A JP2005108709A (ja) | 2003-09-30 | 2003-09-30 | プラズマ処理方法及びプラズマ処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003342196A JP2005108709A (ja) | 2003-09-30 | 2003-09-30 | プラズマ処理方法及びプラズマ処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005108709A JP2005108709A (ja) | 2005-04-21 |
| JP2005108709A5 true JP2005108709A5 (OSRAM) | 2005-07-14 |
Family
ID=34536561
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003342196A Pending JP2005108709A (ja) | 2003-09-30 | 2003-09-30 | プラズマ処理方法及びプラズマ処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2005108709A (OSRAM) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5103738B2 (ja) * | 2006-01-12 | 2012-12-19 | パナソニック株式会社 | 大気圧プラズマ処理方法及び装置 |
| JP5143498B2 (ja) * | 2006-10-06 | 2013-02-13 | 東京エレクトロン株式会社 | 基板処理方法、基板処理装置、プログラムならびに記録媒体 |
| JP4733615B2 (ja) * | 2006-10-31 | 2011-07-27 | 積水化学工業株式会社 | プラズマ処理方法および処理装置 |
| JP5870794B2 (ja) * | 2012-03-21 | 2016-03-01 | セイコーエプソン株式会社 | 画像記録装置、画像記録方法 |
-
2003
- 2003-09-30 JP JP2003342196A patent/JP2005108709A/ja active Pending
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