JP2005081277A - Ultraviolet ray irradiation apparatus - Google Patents

Ultraviolet ray irradiation apparatus Download PDF

Info

Publication number
JP2005081277A
JP2005081277A JP2003317364A JP2003317364A JP2005081277A JP 2005081277 A JP2005081277 A JP 2005081277A JP 2003317364 A JP2003317364 A JP 2003317364A JP 2003317364 A JP2003317364 A JP 2003317364A JP 2005081277 A JP2005081277 A JP 2005081277A
Authority
JP
Japan
Prior art keywords
ultraviolet
gas
work
nitrogen
workpiece
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003317364A
Other languages
Japanese (ja)
Other versions
JP4452977B2 (en
Inventor
Takashi Asada
隆志 麻田
Nobuo Sugitani
伸夫 杉谷
Yutaka Hasegawa
豊 長谷川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Storage Battery Co Ltd
Original Assignee
Japan Storage Battery Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Storage Battery Co Ltd filed Critical Japan Storage Battery Co Ltd
Priority to JP2003317364A priority Critical patent/JP4452977B2/en
Publication of JP2005081277A publication Critical patent/JP2005081277A/en
Application granted granted Critical
Publication of JP4452977B2 publication Critical patent/JP4452977B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Landscapes

  • Supply, Installation And Extraction Of Printed Sheets Or Plates (AREA)
  • Coating Apparatus (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide an ultraviolet ray irradiation apparatus in which an ultraviolet ray setting resin is efficiently cured by irradiating a transported and moving work with the ultraviolet ray while releasing a relatively small quantity of a gas. <P>SOLUTION: Nitrogen from a releasing port 39 is brought to the down stream side due to the work W transported at a high speed. In this apparatus, the releasing port 39 is provided at a position a little to the upstream side of the irradiation center X in an ultraviolet ray transmitting part of a work side translucent plate 34a. As a result, the nitrogen released from the upstream side is brought to the downstream side due to the movement of the work W and is spread over the whole area below the work side translucent plate 34a to efficiently reduce the concentration of oxygen in the ultraviolet irradiation part of the high speed transported work W. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、搬送されるワークに気体を放出しつつ紫外線を照射する紫外線照射装置に関する。   The present invention relates to an ultraviolet irradiation apparatus that irradiates ultraviolet rays while releasing a gas to a work to be conveyed.

この種の紫外線照射装置としては、例えば、下記特許文献1に示すように、ワークの搬送装置の上方に設けられ、搬送移動するワークに向けて紫外線を照射させることでUV樹脂を硬化させるために使用されるものがある。ところで、UV樹脂は、紫外線を照射しても酸素が含まれる大気雰囲気に曝された状態では、いわゆる酸素阻害により表面硬化不良を起こしてしまうため、通常、窒素や二酸化炭素などの気体雰囲気内で紫外線を照射することが望ましい。図6には、ワーク1に窒素を放出しつつ紫外線照射を行う従来構成が示されている。同図に示すように、紫外線ランプ2を収容するハウジング3には、下面の開口部をガラス板で封鎖してなる照射窓4が設けられ、ここから紫外線ランプ2から出射された紫外線(同図で点線矢印7)をワーク1の加工部位に向けて照射させるようになっている。そして、ハウジング3の両端(搬送経路の上流側及び下流側)にはワーク1の搬送経路上において前記紫外線が照射される領域(以下、「紫外線照射領域」)に向けて同量の窒素を放出する1対のノズル5,5が延設されており、これにより窒素雰囲気内でワーク1に施されたUV樹脂6に紫外線照射を行うようにしている。
特開昭55−1815号公報
As this type of ultraviolet irradiation device, for example, as shown in Patent Document 1 below, in order to cure the UV resin by irradiating ultraviolet rays toward the workpiece that is conveyed and moved, as shown in Patent Document 1 below Some are used. By the way, when UV resin is exposed to an air atmosphere containing oxygen even if it is irradiated with ultraviolet rays, surface curing failure is caused by so-called oxygen inhibition. Therefore, it is usually in a gas atmosphere such as nitrogen or carbon dioxide. It is desirable to irradiate with ultraviolet rays. FIG. 6 shows a conventional configuration in which the workpiece 1 is irradiated with ultraviolet rays while releasing nitrogen. As shown in the figure, the housing 3 that accommodates the ultraviolet lamp 2 is provided with an irradiation window 4 in which the opening on the lower surface is sealed with a glass plate, from which ultraviolet rays emitted from the ultraviolet lamp 2 (see FIG. Then, the dotted line arrow 7) is irradiated toward the machining part of the workpiece 1. Then, the same amount of nitrogen is released toward both ends of the housing 3 (upstream and downstream of the transfer path) toward the area irradiated with the ultraviolet rays (hereinafter referred to as “ultraviolet irradiation area”) on the transfer path of the workpiece 1. A pair of nozzles 5 and 5 are extended so that the UV resin 6 applied to the workpiece 1 is irradiated with ultraviolet rays in a nitrogen atmosphere.
Japanese Patent Laid-Open No. 55-1815

ところが、ワーク1がある程度速い速度で搬送移動されている場合、紫外線照射領域に向けて上流側及び下流側から同量の気体を放出する上述の従来構成では、ノズル5,5から供給された窒素はワーク1によって搬送経路の下流側に引きずられる(図3では実線矢印8)。即ち、上記紫外線照射領域の上流側の窒素濃度が下流側の窒素濃度に比べて低下してしまう。従って、紫外線照射領域の上流側から下流側に亘ってそこを通過するワーク1に対して十分に酸素濃度を低下させた状態で紫外線照射を行うことができないおそれがあった。確かに、各ノズル5,5からの窒素放出量を高めることで上流側の窒素濃度を高めることも考えられるが、これでは、多量の窒素が必要となる他に、その多量の窒素が外部に漏れないようにより密閉性の高い構成が必要となり、コストが高くなるという問題が生じ得る。   However, when the work 1 is transported and moved at a relatively high speed, the nitrogen supplied from the nozzles 5 and 5 is discharged in the above-described conventional configuration in which the same amount of gas is discharged from the upstream side and the downstream side toward the ultraviolet irradiation region. Is dragged downstream of the transport path by the work 1 (solid arrow 8 in FIG. 3). That is, the upstream nitrogen concentration in the ultraviolet irradiation region is lower than the downstream nitrogen concentration. Therefore, there is a possibility that the ultraviolet irradiation cannot be performed in a state where the oxygen concentration is sufficiently lowered with respect to the workpiece 1 passing through the ultraviolet irradiation region from the upstream side to the downstream side. Certainly, it is possible to increase the upstream nitrogen concentration by increasing the amount of nitrogen released from each nozzle 5, 5, but this requires a large amount of nitrogen as well as the large amount of nitrogen to the outside. In order to prevent leakage, a configuration with higher hermeticity is required, which may cause a problem of increased cost.

本発明は上記のような事情に基づいて完成されたものであって、搬送移動されるワークに均等に気体を供給しつつ紫外線を照射できる紫外線照射装置を提供することを目的とする。   The present invention has been completed based on the above circumstances, and an object of the present invention is to provide an ultraviolet irradiation device capable of irradiating ultraviolet rays while supplying gas evenly to a workpiece to be conveyed and moved.

上記の目的を達成するための手段として、請求項1の発明に係る紫外線照射装置は、ワークが通過する搬送経路に向けて紫外線を照射する紫外線ランプと、搬送経路上において紫外線ランプからの紫外線が照射される領域に気体を放出する放出手段とを備えた紫外線照射装置において、次の(a)或いは(b)の構成を備えているところに特徴を有する。
(a)放出手段は、紫外線ランプからの紫外線の照射中心よりも搬送経路の上流側のみから気体を放出する構成。
(b)放出手段は、照射中心に対して上流側及び下流側から気体を放出し、かつ、下流側よりも上流側から多くの気体を放出するようした構成。
なお、「ワーク」は、ある部材に紫外線硬化樹脂が施されたものであっても、また、紫外線硬化樹脂自体であってもよく、或いは紫外線を照射して処理が行われるものであればよい。
As means for achieving the above object, an ultraviolet irradiation apparatus according to the invention of claim 1 includes an ultraviolet lamp that irradiates ultraviolet rays toward a conveyance path through which a workpiece passes, and ultraviolet rays from the ultraviolet lamp on the conveyance path. An ultraviolet irradiation device provided with a discharge means for releasing a gas in an irradiated region is characterized by having the following configuration (a) or (b).
(A) The discharge means discharges gas only from the upstream side of the conveyance path from the irradiation center of the ultraviolet rays from the ultraviolet lamp.
(B) A structure in which the discharge means discharges gas from the upstream side and the downstream side with respect to the irradiation center and releases more gas from the upstream side than the downstream side.
The “workpiece” may be a member in which an ultraviolet curable resin is applied to a certain member, may be an ultraviolet curable resin itself, or may be any material that is treated by irradiating ultraviolet rays. .

請求項2の発明は、請求項1に記載のものにおいて、放出手段の放出口の周囲には、その周りの空気の巻き込みを防止可能な防止壁が設けられているところに特徴を有する。   The invention of claim 2 is characterized in that, in the invention of claim 1, a prevention wall is provided around the discharge port of the discharge means to prevent entrainment of air around the discharge port.

<請求項1の発明>
本構成によれば、放出手段は、(a)紫外線ランプからの紫外線の照射中心よりも搬送経路の上流側のみから気体を放出する構成、或いは、(b)照射中心に対して上流側及び下流側から気体を放出し、かつ、下流側よりも上流側から多くの気体を放出する構成になっている。そうすると、上流側の気体がワークによって気体の放出量が比較的少ない下流側に引きずられることになる。従って、ワークによって紫外線照射領域よりも更に下流側に引きずられる気体の量を極力抑えて、紫外線照射領域内における上流側から下流側に全体に亘って効率よく気体を供給できる。これにより、搬送経路上の紫外線照射領域を移動するワークに対して比較的少量の気体放出量で均等に気体を供給しつつ紫外線を照射することができる。
<Invention of Claim 1>
According to this configuration, the discharge means (a) discharges gas only from the upstream side of the transport path from the irradiation center of ultraviolet rays from the ultraviolet lamp, or (b) upstream and downstream from the irradiation center. Gas is released from the side, and more gas is released from the upstream side than from the downstream side. Then, the upstream gas is dragged by the workpiece to the downstream side where the amount of released gas is relatively small. Therefore, it is possible to efficiently supply the gas from the upstream side to the downstream side in the ultraviolet irradiation region while suppressing the amount of gas dragged further downstream from the ultraviolet irradiation region by the work as much as possible. Thereby, it is possible to irradiate ultraviolet rays while evenly supplying gas with a relatively small amount of released gas to the workpiece moving in the ultraviolet irradiation region on the conveyance path.

<請求項2の発明>
例えば放出手段が環状のノズル先端の開口部から気体を放出するよう構成されている場合、ノズル先端周りの周りの空気が、放出される気体の気流に巻き込まれて搬送経路側に流れ込むおそれがある。
そこで、本構成によれば、放出手段の放出口から放出される気体にその放出口周りの周囲気体が巻き込まれることを防止する防止壁が設けられている。従って、気体に周囲気体が巻き込まれることを防止することができる。
<Invention of Claim 2>
For example, when the discharge means is configured to discharge gas from the opening at the tip of the annular nozzle, the air around the nozzle tip may be caught in the flow of the discharged gas and flow into the conveyance path side. .
So, according to this structure, the prevention wall which prevents that the surrounding gas around the discharge port is caught in the gas discharged from the discharge port of the discharge means is provided. Therefore, it is possible to prevent ambient gas from being caught in the gas.

本発明の一実施形態を図1ないし図4によって説明する。
1.紫外線照射装置の概要
本実施形態に係る紫外線照射装置10は、紫外線硬化樹脂(以下「UV樹脂50」)による各種加工が施されたワークW(例えば床材)を順次搬送する搬送手段52の搬送経路51上に配置され、ワークWに気体としての窒素を吹き付けつつ紫外線を照射させてUV樹脂50を硬化させるものである。なお、ワークWは図3,4において紙面右から左へと所定の速度(例えば分速1〜100m)で高速搬送されるものとする。
An embodiment of the present invention will be described with reference to FIGS.
1. Overview of Ultraviolet Irradiation Apparatus The ultraviolet irradiation apparatus 10 according to the present embodiment is transported by a transport means 52 that sequentially transports a workpiece W (for example, flooring) that has been subjected to various types of processing using an ultraviolet curable resin (hereinafter “UV resin 50”). It arrange | positions on the path | route 51, and it irradiates an ultraviolet-ray, spraying nitrogen as gas to the workpiece | work W, and hardens the UV resin 50. FIG. 3 and 4, the workpiece W is conveyed at a high speed from the right to the left of the drawing at a predetermined speed (for example, 1 to 100 m / min).

2.紫外線照射装置の構成
図1〜図3には、紫外線照射装置10の全体を示した側面図が示されている。紫外線照射装置10は、同図に示すように、紫外線ランプ(以下、「ランプ11」)を収容してなる紫外線出射部12と、その下方に設けられ内部に窒素が供給されるガス供給部30とを備えて構成されている。
2. Configuration of Ultraviolet Irradiation Device FIGS. 1 to 3 are side views showing the entire ultraviolet irradiation device 10. As shown in the figure, the ultraviolet irradiation device 10 includes an ultraviolet emission unit 12 that accommodates an ultraviolet lamp (hereinafter “lamp 11”), and a gas supply unit 30 that is provided below and supplies nitrogen inside. And is configured.

(1)紫外線出射部
紫外線出射部12は、全体として直方体をなし下方の搬送経路51に向けられる一側面が開口した箱状のケース13内に、直管状のランプ11を収容してなる。このランプ11は、両端の径小部がケース13内部の天井から下方に突設された保持片14,14の貫通孔14a,14aにそれぞれ嵌入されることにより保持されている。そして、ランプ11は、ケース13の一端側に設けられた端子部15からケーブル16を介して電圧が印加されて点灯し紫外線を放射状に出射する。なお、この紫外線は、UV樹脂硬化に適した波長(例えば主波長365nm)に設定されている。
(1) Ultraviolet emitting part The ultraviolet emitting part 12 has a rectangular parallelepiped shape as a whole, and a straight tubular lamp 11 is accommodated in a box-shaped case 13 whose one side faced toward the lower conveyance path 51 is open. The lamp 11 is held by fitting small diameter portions at both ends into through holes 14a and 14a of holding pieces 14 and 14 projecting downward from the ceiling inside the case 13 respectively. The lamp 11 is turned on when a voltage is applied from the terminal portion 15 provided on one end side of the case 13 via the cable 16 and emits ultraviolet rays radially. This ultraviolet ray is set to a wavelength suitable for UV resin curing (for example, a main wavelength of 365 nm).

また、ケース13の開口方向(図3において下方)に対するランプ11の略後方には、1対の反射鏡17,17が配置されている。この反射鏡17,17は、ランプ11の上方及び側方を全長に渡って覆う断面円弧の形状をなし、ランプ11から後方に出射された紫外線を反射させて開口側に導く役割を果たす(図3では紫外線の光路を点線矢印Lで図示)。なお、各反射鏡17,17は、下端部分がケース13の開口部13a内側に設けられた溝部13b,13bによって係止されるとともに、上端部分がケース13内部の天井面から下方に突設された固定具20によって部分的に係止されている。そして、固定具20が設けられていない部分については両反射鏡17,17の上端部分同士間に所定間隔の隙間Sが形成されている(図3参照)。   Further, a pair of reflecting mirrors 17 and 17 are arranged substantially rearward of the lamp 11 with respect to the opening direction of the case 13 (downward in FIG. 3). The reflecting mirrors 17 and 17 have a circular arc shape that covers the entire length of the upper side and the side of the lamp 11, and reflect the ultraviolet rays emitted rearward from the lamp 11 to guide them to the opening side (see FIG. 3, the optical path of the ultraviolet ray is indicated by a dotted arrow L). Each of the reflecting mirrors 17 and 17 has a lower end portion locked by grooves 13b and 13b provided inside the opening 13a of the case 13, and an upper end portion protruding downward from the ceiling surface inside the case 13. It is partially locked by the fixed fixture 20. And about the part in which the fixing tool 20 is not provided, the clearance gap S of the predetermined space | interval is formed between the upper end parts of both the reflective mirrors 17 and 17 (refer FIG. 3).

なお、ケース13の上面中央位置には、冷却ファン18を収容した収容室19が設けられており、この冷却ファン18を駆動することで、ランプ11の周囲気体を上記1対の反射鏡17,17間の隙間Sを介して引き込んで収容室19上面に開口した排気口19aから外部に放出するようになっている。   A housing chamber 19 that houses a cooling fan 18 is provided at the center of the upper surface of the case 13. By driving the cooling fan 18, the ambient gas around the lamp 11 is converted into the pair of reflecting mirrors 17, 17. The air is drawn through the gap S between the two holes 17 and discharged to the outside through an exhaust port 19 a opened on the upper surface of the storage chamber 19.

(2)ガス供給部
さて、ガス供給部30は、中央部分がケース13の開口部13a形状に対応して長方形状に開口し、1対の枠体31,31間に封止部材32を挟み込んだ状態で両枠体31,31をネジ33によってネジ止めした構成になっている。そして、各枠体31の開口部31aは、2つの透光板34,34で封鎖されている。具体的には、各透光板34,34は、例えば石英ガラスからなり、全体として枠体31,31の開口部31aよりやや大きめの長方形状をなし、本実施形態では例えば4枚の矩形のガラス板35を並べて構成されている。各透光板34の上には、各枠体31の開口部31aの形状と同形の開口部36aを有する押え板36がそれぞれ被せられる。そして、各透光板34はその周縁部分が、各枠体31の開口部31a周囲部分と、各押え板36の開口部36a周囲部分との間で挟まれ、枠体31と押え板36とがネジ37によって固定されることにより位置決め固定されている。
(2) Gas Supply Unit The gas supply unit 30 has a central portion that opens in a rectangular shape corresponding to the shape of the opening 13a of the case 13 and sandwiches the sealing member 32 between the pair of frame bodies 31 and 31. In this state, both frame bodies 31, 31 are screwed with screws 33. And the opening part 31a of each frame 31 is sealed with the two translucent plates 34 and 34. As shown in FIG. Specifically, each of the translucent plates 34 and 34 is made of, for example, quartz glass and has a rectangular shape that is slightly larger than the opening 31a of the frame bodies 31 and 31 as a whole. In the present embodiment, for example, four rectangular plates are used. The glass plates 35 are arranged side by side. On each translucent plate 34, a pressing plate 36 having an opening 36a having the same shape as the opening 31a of each frame 31 is covered. Each of the translucent plates 34 is sandwiched between a peripheral portion of the opening 31a of each frame 31 and a peripheral portion of the opening 36a of each pressing plate 36. Are fixed by positioning with screws 37.

また、封止部材32の両短辺部分にはそれぞれ2つの導通孔32aが貫通形成され、これらに連なる接続管38が突設されており、この接続管38を介して図示しない窒素供給手段からの窒素が1対の透光板34,34及び封止部材32で囲まれる空間M内に供給されるようになっている。   In addition, two conduction holes 32a are formed through both short side portions of the sealing member 32, and a connecting pipe 38 is provided so as to project from these through the connecting pipe 38 from a nitrogen supply means (not shown). Of nitrogen is supplied into the space M surrounded by the pair of translucent plates 34 and 34 and the sealing member 32.

そして、ガス供給部30は、図1や図3に示すように、紫外線出射部12からの紫外線の出射方向(同図で紙面下方向)の前方において、上下に並ぶ1対の透光板34,34が配置される。そして、ガス供給部30は、ケース13の長手方向の両端部から下方に突設された取付具40を介してケース13に取り付けられている。
更に、1対の透光板34,34のうちワークWの搬送経路51側に向けられる透光板(以下、「ワーク側透光板34a」)には、1対の長辺端のうち一方の長辺端寄りの位置に複数の放出孔39が長辺端に沿って一列状に貫通形成されている。これにより、本発明の「放出手段」が構成されている。
As shown in FIGS. 1 and 3, the gas supply unit 30 includes a pair of translucent plates 34 arranged vertically in front of the emission direction of ultraviolet rays from the ultraviolet emission unit 12 (downward in the drawing in the drawing). , 34 are arranged. The gas supply unit 30 is attached to the case 13 via a fixture 40 that protrudes downward from both longitudinal ends of the case 13.
Further, of the pair of translucent plates 34, 34, the translucent plate (hereinafter referred to as “work side translucent plate 34 a”) directed toward the workpiece W conveyance path 51 side is one of the pair of long side ends. A plurality of discharge holes 39 are formed in a line along the long side end at a position near the long side end. This constitutes the “release means” of the present invention.

なお、本実施形態では、1対の透光板34,34に沿うように配された冷却手段が設けられている。具体的には、封止部材32は、伝熱性の高い部材で形成されるとともに、図2に示すように、その両長辺部分には、長手方向に沿って冷却用液体が流れるU字状の冷却管42が挿通されており、紫外線照射や窒素供給によるガス供給部30の温度上昇を抑制するようにしている。
また、本実施形態では、図3に示すように、ガス供給部30のうち上方に位置する枠体31,31上面の周縁部に紫外線出射部12の開口部13a周りを囲むように規制壁41が起立形成されている。
In the present embodiment, a cooling means is provided so as to be along the pair of translucent plates 34. Specifically, the sealing member 32 is formed of a member having high heat conductivity, and as shown in FIG. 2, a U-shape in which a cooling liquid flows along the longitudinal direction on both long side portions thereof. The cooling pipe 42 is inserted so as to suppress the temperature rise of the gas supply unit 30 due to ultraviolet irradiation or nitrogen supply.
Further, in the present embodiment, as shown in FIG. 3, the regulation wall 41 surrounds the periphery of the opening 13 a of the ultraviolet ray emitting portion 12 at the peripheral portion of the upper surface of the frame bodies 31, 31 positioned above the gas supply portion 30. Is formed upright.

この規制壁41を設けたのは次の理由による。即ち、仮にこの規制壁41がない場合には、冷却ファン18が駆動されることにより、ガス供給部30側方の酸素を含む周囲気体(図3で二点破線矢印G2)が引き込まれ、その一部がワークWの搬送経路51側に流れ込んで酸素濃度を上昇させるおそれがある。しかしながら、本実施形態では、冷却ファン18が駆動されると、上記規制壁41によってガス供給部30の側方の周囲気体の引き込みが規制され、規制壁41の上方から周囲空気が引き込まれ、ランプ11周囲を通って排気口19aから排出される循環路が形成される。従って、冷却ファン18の引き込みによって搬送経路51側の酸素濃度が上昇するといった問題を回避することができる。   This restriction wall 41 is provided for the following reason. That is, if the restriction wall 41 is not provided, the cooling fan 18 is driven, and the surrounding gas containing oxygen on the side of the gas supply unit 30 (two-dot broken line arrow G2 in FIG. 3) is drawn. There is a possibility that a part flows into the transport path 51 side of the workpiece W and raises the oxygen concentration. However, in this embodiment, when the cooling fan 18 is driven, the restriction wall 41 restricts the drawing of the surrounding gas on the side of the gas supply unit 30, and the surrounding air is drawn from above the restriction wall 41, so that the lamp 11, a circulation path is formed through the periphery and discharged from the exhaust port 19a. Therefore, it is possible to avoid the problem that the oxygen concentration on the conveyance path 51 side increases due to the drawing of the cooling fan 18.

3.本実施形態の作用効果
上述した紫外線照射装置10は、図3に示すように、ワークWの搬送経路51上方において、ワーク側透光板34aの放出孔39が当該搬送経路51の上流側に来るようにして配置される。即ち、放出孔39は、紫外線ランプ11から照射される紫外線の照射中心Xよりも搬送経路51の上流側に位置することになる。そして、紫外線照射装置10を起動させると、ランプ11から放射された紫外線は1対の反射鏡17,17によって下方側に反射され、ケース13の開口部13aからガス供給部30に向けて出射されて、このガス供給部30の1対の透光板34,34を透過して搬送経路51上のワークWに照射される。
3. Operational Effects of the Present Embodiment As shown in FIG. 3, the ultraviolet irradiation device 10 described above has the discharge hole 39 of the work-side translucent plate 34 a on the upstream side of the transfer path 51 above the transfer path 51 of the work W. Arranged in this way. In other words, the discharge hole 39 is positioned on the upstream side of the transport path 51 from the irradiation center X of the ultraviolet rays emitted from the ultraviolet lamp 11. When the ultraviolet irradiation device 10 is activated, the ultraviolet rays emitted from the lamp 11 are reflected downward by the pair of reflecting mirrors 17 and 17 and emitted from the opening 13 a of the case 13 toward the gas supply unit 30. The workpiece W on the transport path 51 is irradiated through the pair of translucent plates 34, 34 of the gas supply unit 30.

また、上記接続管38からガス供給部30内部に窒素(図3で実線矢印G1)が供給されワーク側透光板34aの放出孔39から放出される。これにより、搬送経路51を搬送されるワークWに窒素を吹き付けて窒素雰囲気の状態で、ワークWの加工部位に紫外線を照射させることができる。   Further, nitrogen (solid arrow G1 in FIG. 3) is supplied from the connection pipe 38 into the gas supply unit 30 and is discharged from the discharge hole 39 of the work-side light transmitting plate 34a. Thereby, it is possible to irradiate the processing part of the workpiece W with ultraviolet rays in a nitrogen atmosphere by blowing nitrogen onto the workpiece W conveyed through the conveyance path 51.

ここで、ワークWは高速搬送されているから、図4(A)(B)に示すように、放出孔39からの窒素はワークWによって下流側に引きずれることになる。そこで、本実施形態では、放出孔39をワーク側透光板34aの紫外線透過部分において上記照射中心Xよりも上流寄りの位置に設けた構成になっている。そうすると、上流側から放出された窒素はワークWによって下流側に引きずられ、ワーク側透光板34aの下方全域に広がり、高速搬送されるワークWの紫外線照射部位における酸素濃度を効率よく低減させることができる。   Here, since the workpiece | work W is conveyed at high speed, as shown to FIG. 4 (A) (B), the nitrogen from the discharge | release hole 39 will be dragged downstream by the workpiece | work W. FIG. Therefore, in the present embodiment, the discharge hole 39 is provided at a position closer to the upstream side than the irradiation center X in the ultraviolet light transmitting portion of the work side light transmitting plate 34a. Then, nitrogen released from the upstream side is dragged downstream by the workpiece W, spreads over the entire area below the workpiece-side translucent plate 34a, and efficiently reduces the oxygen concentration at the ultraviolet irradiation site of the workpiece W that is conveyed at high speed. Can do.

しかも、本実施形態では、放出孔39は、紫外線出射部12からの紫外線が透過するワーク側透光板34aに貫通形成され、その放出孔39のワーク側開口部の周囲がワーク側透光板34a(または、ワーク側透光板34a及び枠体31)による壁になっている。つまり、放出孔39の周囲に周りの空気の巻込みを防止(抑制)する防止壁となっている。従って、環状のノズル先端の開口部から気体を放出する構成(発明の効果の欄参照)とは異なり、周りの空気の巻き込みを防止できる。しかも、放出孔39から放出された窒素の気流はワークW表面に沿って側方に広がり、この窒素気流によってワークW付近の酸素を含む大気を押し出すことができ、比較的少量の窒素でワークW上のUV樹脂50を効率よく硬化させることできる。なお、ガス供給部30とワークWとの離間距離を極力短くする(例えば30mm以内)ことで、より大きな効果を得ることができる。   In addition, in the present embodiment, the discharge hole 39 is formed through the work side translucent plate 34a through which the ultraviolet rays from the ultraviolet emitting part 12 are transmitted, and the periphery of the work side opening of the discharge hole 39 is the work side translucent plate. It is a wall by 34a (or work side translucent board 34a and frame 31). That is, it is a prevention wall that prevents (suppresses) surrounding air from being entrained around the discharge hole 39. Therefore, unlike the configuration in which gas is discharged from the opening at the tip of the annular nozzle (see the column of the effect of the invention), surrounding air can be prevented from being caught. In addition, the nitrogen stream released from the discharge hole 39 spreads laterally along the surface of the workpiece W, and the nitrogen stream can push out the atmosphere containing oxygen in the vicinity of the workpiece W. The upper UV resin 50 can be efficiently cured. Note that a greater effect can be obtained by shortening the distance between the gas supply unit 30 and the workpiece W as much as possible (for example, within 30 mm).

<他の実施形態>
本発明は上記記述及び図面によって説明した実施形態に限定されるものではなく、例えば次のような実施形態も本発明の技術的範囲に含まれ、さらに、下記以外にも要旨を逸脱しない範囲内で種々変更して実施することができる。
(1)上記実施形態では、紫外線硬化樹脂に紫外線を照射するものであって、気体として窒素を供給する装置に適用した例を示したが、窒素に限らず、希ガスや二酸化炭素であってもよい。また、例えば紫外線を照射して有機物を分解するためのアッシングや洗浄を行うものであって、オゾンや酸素を供給する装置に適用することもできる。
<Other embodiments>
The present invention is not limited to the embodiments described with reference to the above description and drawings. For example, the following embodiments are also included in the technical scope of the present invention, and further, within the scope not departing from the gist of the invention other than the following. Various modifications can be made.
(1) In the above embodiment, the ultraviolet curable resin is irradiated with ultraviolet rays and applied to an apparatus that supplies nitrogen as a gas. However, the present invention is not limited to nitrogen, and is a rare gas or carbon dioxide. Also good. In addition, for example, ashing or cleaning for decomposing organic substances by irradiating ultraviolet rays is performed, and the present invention can be applied to an apparatus for supplying ozone or oxygen.

(2)本実施形態では、放出孔39は、ガラス板35において上流側のみに形成したが、これに限らず、上流側から下流側にかけて徐々に径が小さくなる複数の放出孔を形成してもよい。或いは、下流側よりも上流側の放出孔の数を多くしてもよい。
このような構成であっても、搬送経路51のうち紫外線出射部12からの紫外線照射領域において上流側から下流側に亘って効率よく酸素濃度を低下させた状態でワークWに紫外線を照射することができる。
(2) In the present embodiment, the discharge holes 39 are formed only on the upstream side of the glass plate 35. However, the present invention is not limited to this, and a plurality of discharge holes that gradually decrease in diameter from the upstream side to the downstream side are formed. Also good. Alternatively, the number of discharge holes on the upstream side may be larger than that on the downstream side.
Even in such a configuration, the workpiece W is irradiated with ultraviolet rays in a state where the oxygen concentration is efficiently reduced from the upstream side to the downstream side in the ultraviolet irradiation region from the ultraviolet ray emitting unit 12 in the conveyance path 51. Can do.

(3)更に、図5に示した構成であってもよい。これは、紫外線出射部からの紫外線を透過する透過窓60の上流側の側方に気体G3を放出するノズル61を延設した構成になっている。このような構成であっても上記実施形態と同様の効果を得ることができる。なお、本発明の「防止壁」を設けた構成であってもよい。具体的には、ノズル先端に板状部材62(同図で点線では点線で図示)を嵌着した構成であってもよい。   (3) Further, the configuration shown in FIG. 5 may be used. This has a configuration in which a nozzle 61 that discharges the gas G3 is extended to the side of the upstream side of the transmission window 60 that transmits the ultraviolet rays from the ultraviolet emitting portion. Even if it is such a structure, the effect similar to the said embodiment can be acquired. In addition, the structure which provided the "prevention wall" of this invention may be sufficient. Specifically, a configuration may be adopted in which a plate-like member 62 (shown by a dotted line in the figure) is fitted to the tip of the nozzle.

(4)また、図6に示す構成に対して、下流側のノズル5よりも上流側のノズル5からの窒素放出量を多くする構成であってもよい。なお、上記(3)と同様に各ノズル5,5の先端に板状部材等による防止壁を設けてもよい。   (4) Moreover, the structure which increases the nitrogen discharge | release amount from the upstream nozzle 5 rather than the downstream nozzle 5 with respect to the structure shown in FIG. In addition, you may provide the prevention wall by a plate-shaped member etc. in the front-end | tip of each nozzle 5 and 5 similarly to said (3).

本発明の一実施形態に係る紫外線照射装置全体の部分的断面図The partial sectional view of the whole ultraviolet irradiation device concerning one embodiment of the present invention ワーク搬送経路側から見た下面図Bottom view as seen from workpiece transfer path 図1のX−X破断面における断面図Sectional drawing in the XX fracture surface of FIG. 高速搬送されるワークに吹き付けられた窒素の流れを示した紫外線照射装置の断面図Cross-sectional view of an ultraviolet irradiation device showing the flow of nitrogen sprayed onto a workpiece being conveyed at high speed 変形例を示した紫外線照射装置の断面図Cross-sectional view of an ultraviolet irradiation device showing a modification 従来の紫外線照射装置の断面図Cross-sectional view of a conventional ultraviolet irradiation device

符号の説明Explanation of symbols

10…紫外線照射装置
11…紫外線ランプ
34a…ワーク側透光板(防止壁)
39…放出孔(放出手段)
51…搬送経路
61…ノズル(放出手段)
62…板状部材(防止壁)
G1,G3…窒素(気体)
G2…周囲気体
L…紫外線
W…ワーク
DESCRIPTION OF SYMBOLS 10 ... Ultraviolet irradiation apparatus 11 ... Ultraviolet lamp 34a ... Work side translucent board (prevention wall)
39 ... Release hole (release means)
51 ... Transport route 61 ... Nozzle (discharge means)
62 ... Plate-shaped member (prevention wall)
G1, G3 ... Nitrogen (gas)
G2 ... Ambient gas L ... Ultraviolet light W ... Workpiece

Claims (2)

ワークが通過する搬送経路に向けて紫外線を照射する紫外線ランプと、
前記搬送経路上において前記紫外線ランプからの紫外線が照射される領域に気体を放出する放出手段とを備えた紫外線照射装置において、前記放出手段は、前記紫外線ランプからの紫外線の照射中心よりも前記搬送経路の上流側のみから前記気体を放出、または、前記照射中心の下流側よりも上流側から多くの気体を放出するようにしたことを特徴とする紫外線照射装置。
An ultraviolet lamp that irradiates ultraviolet rays toward the transport path through which the workpiece passes;
In the ultraviolet irradiating apparatus, the irradiating means for emitting gas to a region irradiated with ultraviolet rays from the ultraviolet lamp on the conveying path, the emitting means is more transported than the irradiation center of the ultraviolet rays from the ultraviolet lamp. An ultraviolet irradiation apparatus characterized in that the gas is discharged only from the upstream side of the path, or more gas is discharged from the upstream side than the downstream side of the irradiation center.
前記放出手段の放出口の周囲には、その周りの空気の巻き込みを防止可能な防止壁が設けられていることを特徴とする請求項1記載の紫外線照射装置。 2. The ultraviolet irradiation apparatus according to claim 1, wherein a prevention wall capable of preventing entrainment of air around the discharge port of the discharge means is provided.
JP2003317364A 2003-09-09 2003-09-09 Ultraviolet irradiation device and gas releasing method thereof Expired - Fee Related JP4452977B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003317364A JP4452977B2 (en) 2003-09-09 2003-09-09 Ultraviolet irradiation device and gas releasing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003317364A JP4452977B2 (en) 2003-09-09 2003-09-09 Ultraviolet irradiation device and gas releasing method thereof

Publications (2)

Publication Number Publication Date
JP2005081277A true JP2005081277A (en) 2005-03-31
JP4452977B2 JP4452977B2 (en) 2010-04-21

Family

ID=34416973

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003317364A Expired - Fee Related JP4452977B2 (en) 2003-09-09 2003-09-09 Ultraviolet irradiation device and gas releasing method thereof

Country Status (1)

Country Link
JP (1) JP4452977B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101142012B1 (en) * 2011-10-14 2012-05-17 (주)나이테산기개발 Heating system for printer
WO2017170949A1 (en) * 2016-03-30 2017-10-05 京セラ株式会社 Light irradiating device and printing device
JP2019209651A (en) * 2018-06-07 2019-12-12 コニカミノルタ株式会社 Active energy ray irradiation apparatus and inkjet printer
WO2020022424A1 (en) * 2018-07-27 2020-01-30 京セラ株式会社 Light-irradiating device and printing device
CN111526992A (en) * 2018-01-30 2020-08-11 京瓷株式会社 Light irradiation device and printing device

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101142012B1 (en) * 2011-10-14 2012-05-17 (주)나이테산기개발 Heating system for printer
JP2020015318A (en) * 2016-03-30 2020-01-30 京セラ株式会社 Light irradiation device and printing device
WO2017170949A1 (en) * 2016-03-30 2017-10-05 京セラ株式会社 Light irradiating device and printing device
JPWO2017170949A1 (en) * 2016-03-30 2019-01-17 京セラ株式会社 Light irradiation apparatus and printing apparatus
US10596834B2 (en) 2016-03-30 2020-03-24 Kyocera Corporation Light irradiation device and printer
CN111526992B (en) * 2018-01-30 2021-06-29 京瓷株式会社 Light irradiation device and printing device
CN111526992A (en) * 2018-01-30 2020-08-11 京瓷株式会社 Light irradiation device and printing device
JP2019209651A (en) * 2018-06-07 2019-12-12 コニカミノルタ株式会社 Active energy ray irradiation apparatus and inkjet printer
JP7139700B2 (en) 2018-06-07 2022-09-21 コニカミノルタ株式会社 Active energy ray irradiation device and inkjet printer
WO2020022424A1 (en) * 2018-07-27 2020-01-30 京セラ株式会社 Light-irradiating device and printing device
CN112384369A (en) * 2018-07-27 2021-02-19 京瓷株式会社 Light irradiation device and printing device
JPWO2020022424A1 (en) * 2018-07-27 2021-08-02 京セラ株式会社 Light irradiation device and printing device
JP7034291B2 (en) 2018-07-27 2022-03-11 京セラ株式会社 Light irradiation device and printing device
US11407237B2 (en) 2018-07-27 2022-08-09 Kyocera Corporation Light-irradiating device and printing device

Also Published As

Publication number Publication date
JP4452977B2 (en) 2010-04-21

Similar Documents

Publication Publication Date Title
TWI390552B (en) Excimer lamp device
TWI620231B (en) Exposure device, substrate processing apparatus, exposure method for substrate and substrate processing method
KR100659698B1 (en) Method for decontaminating microlithography projection lighting devices
BRPI0512885A (en) air decontamination method and device
JP2009268974A (en) Ultraviolet irradiation method and ultraviolet irradiation apparatus
JP2002260595A5 (en)
TWI591451B (en) Exposure device and substrate processing apparatus
JP4452977B2 (en) Ultraviolet irradiation device and gas releasing method thereof
KR20130058602A (en) Light irradiation apparatus
WO2016208110A1 (en) Optical treatment device and optical treatment method
JP4380273B2 (en) UV irradiation equipment
US6796664B2 (en) Method and device for decontaminating optical surfaces
JP2005118632A (en) Ultraviolet irradiation device
JP2010147168A (en) Plasma processing apparatus
KR100539403B1 (en) Circulation air cooling system for light illuminating apparatus
JP2024510171A (en) Atomic oxygen and ozone cleaning equipment with temperature control device
US9402317B2 (en) Ashing apparatus
JPH0612766B2 (en) Light irradiation device
JP2021146231A (en) Gas supplying device
JP2017017070A (en) Light processing device and light processing method
JP3176349B2 (en) UV processing equipment
KR20240030195A (en) Apparatus for drying substrate using light
JP2016530553A (en) Hollow optical waveguide assembly
KR20030069626A (en) air sterilizer
JP4626056B2 (en) UV irradiation equipment

Legal Events

Date Code Title Description
A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A712

Effective date: 20051213

RD03 Notification of appointment of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7423

Effective date: 20060112

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20060908

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20070110

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20090914

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20090914

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20090916

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20091001

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20091127

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20100107

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20100120

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130212

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130212

Year of fee payment: 3

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313111

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130212

Year of fee payment: 3

R360 Written notification for declining of transfer of rights

Free format text: JAPANESE INTERMEDIATE CODE: R360

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130212

Year of fee payment: 3

R360 Written notification for declining of transfer of rights

Free format text: JAPANESE INTERMEDIATE CODE: R360

R371 Transfer withdrawn

Free format text: JAPANESE INTERMEDIATE CODE: R371

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313111

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130212

Year of fee payment: 3

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130212

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140212

Year of fee payment: 4

LAPS Cancellation because of no payment of annual fees