JP2005060809A - SURFACE-TREATED Al SHEET EXCELLENT IN SOLDERABILITY, ITS PRODUCTION METHOD AND HEAT SINK USING THE SAME - Google Patents
SURFACE-TREATED Al SHEET EXCELLENT IN SOLDERABILITY, ITS PRODUCTION METHOD AND HEAT SINK USING THE SAME Download PDFInfo
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
- C23C28/023—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material only coatings of metal elements only
- C23C28/025—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material only coatings of metal elements only with at least one zinc-based layer
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Abstract
Description
本発明は表面処理Al板に関わり、特にハンダの濡れ性、ハンダ強度に優れるとともに熱伝導率や熱放射率が大きく、ハンダ付けが可能で優れた放熱性が求められるヒートシンクに好適に適用可能な表面処理Al板、それを用いたヒートシンク、およびその表面処理Al板の製造方法に関する。 The present invention relates to a surface-treated Al plate, and is particularly applicable to a heat sink that is excellent in solder wettability and solder strength and has high thermal conductivity and thermal emissivity, and can be soldered and requires excellent heat dissipation. The present invention relates to a surface-treated Al plate, a heat sink using the same, and a method for producing the surface-treated Al plate.
電子機器の小型化や高密度化にともなって、狭い筐体内部や間隙が殆ど無い状態で装填された部品の温度上昇を抑制する必要が生じている。プリント基板においては、部品の温度上昇を抑制するために、放熱用のヒートシンクを取り付けた基板が用いられている。ヒートシンクは、例えば図1に示すように、プリント基板のような発熱体1の少なくとも1面に密着して設けられる。密着した面積が大きいほど熱伝導が大きくなる。ヒートシンクに用いる材料としては発熱体から急速に熱を吸収できるように、熱伝導性に優れた材料を用いることが好ましい。また、図1に示すように、ヒートシンク2を発熱体1から離れた部分まで延ばして設けると、延長部分から放熱するのでヒートシンクの表面は熱放射性に優れ好ましい。なお、図1において、矢印3は熱伝導の方向を示し、矢印4は熱放射の方向を示している。
As electronic devices become smaller and higher in density, it is necessary to suppress the temperature rise of components loaded in a narrow housing or with almost no gap. In a printed circuit board, a board to which a heat sink for heat dissipation is attached is used in order to suppress the temperature rise of components. For example, as shown in FIG. 1, the heat sink is provided in close contact with at least one surface of a heating element 1 such as a printed board. The larger the close contact area, the greater the heat conduction. As a material used for the heat sink, it is preferable to use a material having excellent thermal conductivity so that heat can be rapidly absorbed from the heating element. Further, as shown in FIG. 1, when the
鋼板ベースの材料からなるヒートシンクの場合は、プリント基板に直接ハンダ付けして接合することができる。放熱性がさらに要求される場合は、ヒートシンクとして鋼板よりも熱伝導性に優れたAlをベースとする材料を用いることが好ましいが、プリント基板に直接ハンダ付けして接合することが困難であるので、Alベースのヒートシンクに専用のピンを取り付け、ピンを介してプリント基板にハンダ付けしている。このようなピンを介して接合する場合は、ピンとヒートシンクの強固な密着状態が得られず、またヒートシンクとプリント基板が直接密着する面積が少なくなるために熱伝導性が低下し、高い熱伝導性を有するAlの特性が十分に活かされていない。そのため、良好なハンダ性を有するAl板を得るために、以下に示すような試みが行われている。 In the case of a heat sink made of a steel plate-based material, it can be joined by soldering directly to the printed circuit board. If heat dissipation is further required, it is preferable to use a material based on Al that has better thermal conductivity than the steel plate as the heat sink, but it is difficult to solder and bond directly to the printed circuit board. A dedicated pin is attached to an Al-based heat sink and soldered to the printed circuit board through the pin. When bonding via such pins, the pin and the heat sink cannot be firmly adhered, and the area where the heat sink and the printed circuit board are directly adhered decreases, resulting in a decrease in thermal conductivity and high thermal conductivity. The characteristics of Al having the above are not fully utilized. Therefore, the following attempts have been made to obtain an Al plate having good solderability.
例えば、Al板またはAl系合金金属材にNi系めっき層を介してSnめっき層が形成されたハンダ付け性及びめっき密着性に優れたAl系合金金属板を開示されている(例えば特許文献1参照)。このAl系合金金属板においては、溶融Alめっき鋼板などの基材に真空蒸着法を用いてNiめっきした後、続いてSnめっきを施す。この方法による場合、NiおよびSnをめっきするために真空蒸着法を用いるが、真空装置などの大掛かりな装置が必要であり、また製膜速度が小さく生産性に乏しいため、安価に製造することが困難である。
また、アルミニウム基材上に錫又は錫合金層が、アルミニウム基材と錫又は錫合金層との界面に錫の濃度勾配層を形成して被覆されたことを特徴とする半田付性に優れる錫又は錫合金層を被覆したアルミニウム材料を開示されている(例えば特許文献2参照)。このアルミニウム材料においてはアルミニウム合金板に錫を電気めっきした後に加熱する、または溶融した錫合金中にアルミニウム合金板を通すことにより、アルミニウム基材と錫又は錫合金層との界面に錫の濃度勾配層を形成して錫めっきするが、アルミニウム基材と錫めっき層との密着性が不十分であり、特に曲げ加工を施した場合に、錫めっき被膜がアルミニウム基材から剥離しやすい欠点を有している。
Further, tin excellent in solderability, characterized in that a tin or tin alloy layer is coated on an aluminum base material by forming a tin concentration gradient layer at the interface between the aluminum base material and the tin or tin alloy layer. Or the aluminum material which coat | covered the tin alloy layer is disclosed (for example, refer patent document 2). In this aluminum material, a tin concentration gradient is formed at the interface between the aluminum base and the tin or tin alloy layer by heating after electroplating tin on the aluminum alloy plate or by passing the aluminum alloy plate through a molten tin alloy. Although the layer is formed and tin-plated, the adhesion between the aluminum substrate and the tin-plated layer is insufficient, and the tin-plated film tends to peel off from the aluminum substrate, especially when subjected to bending. doing.
本発明は、めっき層の密着性、ハンダの濡れ性、ハンダ強度に優れるとともに熱伝導率や熱放射率が大きく、ハンダ付けが可能で優れた放熱性を有するヒートシンクに好適に適用可能な表面処理Al板、それを用いたヒートシンク、およびその表面処理Al板を安価に製造する方法を提供することを目的とする。 The present invention is a surface treatment that can be suitably applied to a heat sink that has excellent adhesion to a plating layer, wettability of solder, solder strength, and high thermal conductivity and thermal emissivity, and can be soldered and has excellent heat dissipation. An object is to provide an Al plate, a heat sink using the same, and a method for producing the surface-treated Al plate at a low cost.
上記目的を達成する本発明の表面処理Al板は、Al基板表面に、基板表面側から順にZn層、Ni層を形成させてなることを特徴とする表面処理Al板である。Al基板は、純Al板に限らずAl合金板であってもよい。前記表面処理Al板において、前記Zn層が5〜500mg/m2の皮膜量で設けられてなること、またNi層上にさらに熱放射性を向上させる層を形成させてなることが望ましい。 The surface-treated Al plate of the present invention that achieves the above object is a surface-treated Al plate characterized in that a Zn layer and a Ni layer are formed on an Al substrate surface in this order from the substrate surface side. The Al substrate is not limited to a pure Al plate but may be an Al alloy plate. In the surface-treated Al plate, it is preferable that the Zn layer is provided with a coating amount of 5 to 500 mg / m 2 , and that a layer for further improving thermal radiation is formed on the Ni layer.
また、上記目的を達成する本発明のヒ−トシンクは、Al基板表面に、基板表面側から順にZn層、Ni層を形成させてなる上記表面処理Al板、あるいは該表面処理Al板においてZn層が5〜500mg/m2の皮膜量で設けられている表面処理Al板を用いてなることを特徴とするヒ−トシンクであり、熱伝導率が60W/m・K以上であることが望ましい。
または、本発明の他のヒ−トシンクは、基板表面側から順にZn層、Ni層を形成させてなる表面処理Al板のNi層の上にさらに熱放射性を向上させる層を形成させてなる表面処理Al板を用いてなることを特徴とするヒ−トシンクであり、熱放射率が0.2〜0.9であることが望ましい。
In addition, the heat sink of the present invention that achieves the above object is the above-described surface-treated Al plate in which a Zn layer and an Ni layer are formed in this order on the surface of the Al substrate, or a Zn layer in the surface-treated Al plate Is a heat sink characterized by using a surface-treated Al plate provided with a coating amount of 5 to 500 mg / m 2 , and preferably has a thermal conductivity of 60 W / m · K or more.
Alternatively, another heat sink of the present invention has a surface on which a layer for improving thermal radiation is further formed on a Ni layer of a surface-treated Al plate in which a Zn layer and a Ni layer are formed in this order from the substrate surface side. A heat sink characterized by using a treated Al plate, and preferably has a thermal emissivity of 0.2 to 0.9.
本発明の表面処理Al板の製造方法は、Al基板にZnを置換めっきし、次いでNiめっきすることを特徴とする表面処理Al板の製造方法であり、
Niめっき後、さらに熱放射性を向上させる層を形成させることが望ましい。熱放射性を向上させる層は、例えば前記表面処理Al板に黒色顔料と水溶性ロジンを含有させた水系樹脂を塗布し乾燥させることにより形成することができる。
The method for producing a surface-treated Al plate of the present invention is a method for producing a surface-treated Al plate, characterized in that Zn plating is performed on an Al substrate, and then Ni plating is performed.
After Ni plating, it is desirable to form a layer that further improves thermal radiation. The layer for improving thermal radiation can be formed, for example, by applying a water-based resin containing a black pigment and a water-soluble rosin to the surface-treated Al plate and drying it.
本発明の表面処理Al板は、Al基板表面に置換めっきによりZn層を形成させ、その上にNi層をめっきにより形成させているので、Al基板とめっき層の密着性に優れている。また最表面にNi層を設けているので、ハンダ濡れ性に優れるとともに、高いハンダ強度が得られる。さらに基板がAl板であるので、熱伝導率が大きく、放熱性に優れている。さらにこの本発明の表面処理Al板に、ハンダフラックス性を有し熱放射性を向上させる層を設けることにより、ハンダ性をさらに向上させるとともに放熱性を向上させることができる。そのため、本発明の表面処理Al板は、ハンダ付けが可能な放熱性に優れたヒートシンクとして好適に適用することができる。 The surface-treated Al plate of the present invention is excellent in the adhesion between the Al substrate and the plating layer because the Zn layer is formed on the Al substrate surface by displacement plating and the Ni layer is formed thereon by plating. In addition, since the Ni layer is provided on the outermost surface, the solder wettability is excellent and high solder strength is obtained. Furthermore, since the substrate is an Al plate, the thermal conductivity is large and the heat dissipation is excellent. Furthermore, by providing the surface-treated Al plate of the present invention with a layer having solder flux properties and improving heat radiation properties, it is possible to further improve solderability and heat dissipation. Therefore, the surface-treated Al plate of the present invention can be suitably applied as a heat sink excellent in heat dissipation that can be soldered.
以下、本発明を詳細に説明する。
本発明の表面処理Al板の基板となるAl板としては、純Al板およびJIS規格の1000系、2000系、3000系、5000系、6000系、7000系のいずれのAl合金板も用いることができる。これらのAl合金板を脱脂し、次いで酸性エッチングし、次いでスマットを除去した後、Znを置換めっきする。Znの置換めっきは、硝酸浸漬処理、第一Zn置換処理、硝酸亜鉛剥離処理、第二Zn置換処理の工程を経ておこなう。この場合、各工程の処理後には水洗処理を実施する。この第一Zn置換処理および第二Zn置換処理により形成するZn層は、この置換処理後にNiめっきを施す際にわずかに溶解するので、Zn層の皮膜量としてはNiめっき後の状態で5〜500mg/m2であることが好ましく、30〜300mg/m2であることがより好ましい。皮膜量は処理液中のZnイオンの濃度および第二Zn置換処理において処理液中に浸漬する時間を適宜選択して調整する。皮膜量が5mg/m2未満であるとZn層の上に形成させるNiめっき層との密着性に乏しくなり、曲げ加工を施した際にめっき層が剥離しやすくなる。一方、皮膜量が500mg/m2を超えるとNiめっきが不均一になり、ハンダ強度が低下する。
Hereinafter, the present invention will be described in detail.
As the Al plate used as the substrate of the surface-treated Al plate of the present invention, a pure Al plate and any of JIS standard 1000 series, 2000 series, 3000 series, 5000 series, 6000 series, and 7000 series Al alloy sheets may be used. it can. These Al alloy plates are degreased, then acid-etched, and after removing the smut, Zn is displacement plated. The substitution plating of Zn is performed through the steps of nitric acid immersion treatment, first Zn substitution treatment, zinc nitrate stripping treatment, and second Zn substitution treatment. In this case, the water washing process is implemented after the process of each process. Since the Zn layer formed by the first Zn substitution treatment and the second Zn substitution treatment is slightly dissolved when Ni plating is performed after this substitution treatment, the coating amount of the Zn layer is 5 to 5 in the state after Ni plating. it is preferably 500 mg / m 2, and more preferably 30 to 300 mg / m 2. The coating amount is adjusted by appropriately selecting the concentration of Zn ions in the treatment liquid and the time of immersion in the treatment liquid in the second Zn substitution treatment. When the coating amount is less than 5 mg / m 2 , the adhesion with the Ni plating layer formed on the Zn layer becomes poor, and the plating layer is easily peeled off when bending is performed. On the other hand, when the coating amount exceeds 500 mg / m 2 , the Ni plating becomes non-uniform and the solder strength decreases.
次いで、このようにして形成されたZn層の上にNi層をめっきする。Niめっき層は、電気めっき法または無電解めっき法のいずれのめっき法を用いて形成させてもよい。無電解めっき法を用いる場合は、還元剤としてP化合物やB化合物を用いるので、Niめっき膜はNi−P合金やNi−B合金からなる皮膜として形成するが、電気めっき法による純ニッケルからなる皮膜と同様に、めっき皮膜のAl基板に対する優れた密着性や、優れたハンダ濡れ性およびハンダ強度が得られる。このようにして得られるNi層は、皮膜量として0.2〜50g/m2であることが好ましく、1〜10g/m2であることがより好ましい。皮膜量が0.2g/m2未満であるとNi層がZn層の全面を均一に被覆することができないので十分なハンダ強度が得られない。一方、皮膜量が50g/m2を超えるとハンダ濡れ性およびハンダ強度の向上効果が飽和し、コスト的に有利でなくなる。 Next, a Ni layer is plated on the Zn layer thus formed. The Ni plating layer may be formed using any plating method of electroplating or electroless plating. When the electroless plating method is used, since the P compound or B compound is used as the reducing agent, the Ni plating film is formed as a film made of Ni—P alloy or Ni—B alloy, but is made of pure nickel by electroplating. Similar to the coating, excellent adhesion of the plating coating to the Al substrate, and excellent solder wettability and solder strength can be obtained. Thus Ni layer obtained is preferably 0.2 to 50 g / m 2 as a film weight, and more preferably 1 to 10 g / m 2. If the coating amount is less than 0.2 g / m 2 , the Ni layer cannot uniformly cover the entire surface of the Zn layer, and thus sufficient solder strength cannot be obtained. On the other hand, if the coating amount exceeds 50 g / m 2 , the effect of improving the solder wettability and the solder strength is saturated, which is not advantageous in terms of cost.
この本発明の表面処理Al板は60W/m・K以上の熱伝導率を有しており、熱伝導性に優れたヒートシンクとして発熱体から熱を好適に吸収して放熱することができるが、Ni層上に熱放射性を向上させる層を設けることにより、放熱性をさらに向上させることが可能となる。本発明の表面処理Al板の熱放射率は0.05〜0.1前後であるが、熱放射性を向上させる層を設けることにより、熱放射率は0.2〜0.9程度まで向上させることができる。熱放射性を向上させる層は以下のようにしてNi層上に形成させる。すなわち、Zn層、Ni層を順に形成させた表面処理Al板、またはこの表面処理Al板に上記の加熱拡散処理を施した後、黒色顔料と水溶性ロジンを含有させた水系アクリル樹脂を塗布し、乾燥させて処理皮膜とする。この処理皮膜はフラックス効果を有しており、ハンダ濡れ性も向上させる。これらの水系樹脂の濃度は100〜900g/Lであることが好ましく、黒色顔料は樹脂中に樹脂の固形分に対して50重量%以下で含有させることが好ましい。50重量%を超えて含有させるとハンダ濡れ性およびハンダ強度が不良となる。乾燥後の処理皮膜の厚さは0.05〜10μmであることが好ましい。0.05μm未満では放熱性の向上効果に乏しく、10μmを超えると熱伝導性が損なわれるようになり、放熱性を向上させることが不可能になる。このようにNi層上に熱放射性を向上させる層を設けることにより、ヒートシンクの放熱性を向上させることができる。 This surface-treated Al plate of the present invention has a thermal conductivity of 60 W / m · K or more, and as a heat sink excellent in thermal conductivity, it can absorb heat from a heating element and dissipate heat. By providing a layer that improves thermal radiation on the Ni layer, it is possible to further improve heat dissipation. Although the thermal emissivity of the surface-treated Al plate of the present invention is around 0.05 to 0.1, the thermal emissivity is improved to about 0.2 to 0.9 by providing a layer that improves the thermal emissivity. be able to. The layer for improving thermal radiation is formed on the Ni layer as follows. That is, a surface-treated Al plate in which a Zn layer and a Ni layer are sequentially formed, or the surface-treated Al plate is subjected to the above heat diffusion treatment, and then an aqueous acrylic resin containing a black pigment and a water-soluble rosin is applied. , Dried to form a treated film. This treated film has a flux effect and improves solder wettability. The concentration of these aqueous resins is preferably 100 to 900 g / L, and the black pigment is preferably contained in the resin at 50% by weight or less based on the solid content of the resin. If it exceeds 50% by weight, solder wettability and solder strength will be poor. The thickness of the treated film after drying is preferably 0.05 to 10 μm. If it is less than 0.05 μm, the effect of improving the heat dissipation is poor, and if it exceeds 10 μm, the thermal conductivity is impaired, making it impossible to improve the heat dissipation. Thus, by providing the layer which improves thermal radiation on Ni layer, the heat dissipation of a heat sink can be improved.
(供試板の作成)
Al合金板(JIS 5052H19、板厚0.5mm)をめっき基板として、アルカリ液で脱脂し、次いで硫酸中でエッチング処理を施し、次いで硝酸中で脱スマット処理を施した後、水酸化ナトリウム:150g/L、ロッシェル塩:50g/L、酸化亜鉛:25g/L、塩化第一鉄1.5g/Lを含む処理液中に浸漬して第一Zn置換処理を行い、次いで400g/Lの硝酸水溶液中に浸漬して置換析出したZnを除去した後、第一Zn置換処理で用いたのと同一の処理液中に浸漬して第二Zn置換処理を行った。この第二Zn置換処理において、浸漬する時間を種々変化させ、表1に示す皮膜量のZn層を形成させたZnめっきAl板を得た。
(Create test plate)
An Al alloy plate (JIS 5052H19, plate thickness 0.5 mm) was used as a plating substrate, degreased with an alkaline solution, then etched in sulfuric acid, then desmutted in nitric acid, and then sodium hydroxide: 150 g / L, Rochelle salt: 50 g / L, zinc oxide: 25 g / L, immersed in a treatment solution containing 1.5 g / L of ferrous chloride to perform a first Zn substitution treatment, and then a 400 g / L aqueous nitric acid solution After removing the Zn deposited by immersion by immersion, the second Zn substitution treatment was performed by immersing in the same treatment liquid used in the first Zn substitution treatment. In the second Zn substitution treatment, the immersion time was variously changed to obtain a Zn-plated Al plate on which a Zn layer having a coating amount shown in Table 1 was formed.
次いで、ZnめっきAl板に無電解めっき法により、Zn層上にNi−12重量%P合金めっき皮膜を表1に示す皮膜量で形成させた。また他の一部の供試板については、表2に示す液組成の処理液を用いて熱放射性を向上させる層を形成させた。 Next, a Ni-12 wt% P alloy plating film was formed on the Zn layer with an amount of film shown in Table 1 by electroless plating on a Zn-plated Al plate. Moreover, about the other one part test plate, the layer which improves thermal radiation was formed using the process liquid of the liquid composition shown in Table 2.
また、比較用として、上記のAl合金板にZn置換めっき層を設けずに直接Niめっき層を設けた供試板(試料番号1)、上記のAl合金板にZn置換めっき層を設けたがNiめっき層を設けなかった供試板(試料番号3)、低炭素鋼板(板厚0.5mm)にSnめっき層を5g/m2のみを設けた供試板(試料番号13)を作成した。 For comparison, a test plate (Sample No. 1) in which a Ni plating layer was directly provided without providing a Zn substitution plating layer on the Al alloy plate, and a Zn substitution plating layer was provided on the Al alloy plate. A test plate (sample number 13) in which only 5 g / m 2 of an Sn plating layer was provided on a test plate (sample number 3) without a Ni plating layer and a low carbon steel plate (plate thickness 0.5 mm) was prepared. .
(供試板の特性評価)
上記のようにして得られた供試板を、下記の特性について評価した。
[ハンダ濡れ性]
メニスコグラフ法(MIL−STD−883B)により、SOLDERCHECKER(MODEL SAT−5000、RHESCA製)を使用し、上記の各供試材から切り出した幅7mmの試片をフラックス(CF110VH2A、タムラ化研製)に浸漬し、その後250℃に保持したハンダ浴(JISZ 3282:H60A)に前記のフラックスを塗布した試片を浸漬速度:2mm/秒で2mm浸漬し、ハンダが濡れるまでの時間ゼロクロスタイムを測定し、下記に示す基準でハンダ濡れ性を評価した。短時間であるほどハンダ濡れ性が良好であることを示す。
◎:5秒未満
○:5〜7秒未満
△:7〜10未満
×:10秒以上
(Characteristic evaluation of test plate)
The test plates obtained as described above were evaluated for the following characteristics.
[Solder wettability]
Using a SOLDERCHECKER (MODEL SAT-5000, manufactured by RHESCA) by a meniscograph method (MIL-STD-883B), a specimen having a width of 7 mm cut out from each of the above test materials is immersed in a flux (CF110VH2A, manufactured by Tamura Kaken). After that, a specimen coated with the above-mentioned flux was immersed in a solder bath (JISZ 3282: H60A) maintained at 250 ° C. at a dipping rate of 2 mm / second for 2 mm, and the time until the solder gets wet was measured. The solder wettability was evaluated according to the criteria shown in FIG. The shorter the time, the better the solder wettability.
◎: Less than 5 seconds ○: Less than 5-7 seconds △: Less than 7-10 ×: More than 10 seconds
[ハンダ強度]
上記の各供試材から切り出した幅7mm、長さ50mmの試片をL字型に折り曲げた2つの切り出し片を、評価面を向かい合わせてT字状になるように重ね、T字の縦棒の部分の間に厚さ:0.5mmの鋼板を挟み、T字の縦棒の下部に0.5mmの空隙部を形成させた試片を作成した。この試片の空隙部に上記のハンダ濡れ性の評価に用いたのと同様のフラックスを塗布した後、ソルダーチェッカー(SAT−5000、レスカ製)を用い、250℃に保持したハンダ浴(JISZ 3282:H60A)に試片の空隙部を10mmの深さまで浸漬し5秒間保持して空隙部にハンダを充填させた後取り出し、Tピール試験片とした。次いでテンシロンを用い、Tピール試験片のT字の横棒部をチャックで挟んで引張ってT字の縦棒部のハンダ充填部を引き剥がし、ハンダ強度を測定し、下記に示す基準でハンダ強度を評価した。
◎:4kgf/7mm以上
○:3〜4kgf/7mm未満
△:1〜3kgf/7mm未満
×:1kgf/7mm未満
[Solder strength]
Two cut pieces obtained by bending a specimen having a width of 7 mm and a length of 50 mm cut out from each of the above-mentioned specimens into an L-shape are stacked so that the evaluation surfaces face each other in a T-shape, A steel sheet having a thickness of 0.5 mm was sandwiched between the bar portions, and a test piece was formed in which a 0.5 mm gap was formed at the bottom of the T-shaped vertical bar. After applying the same flux as that used for the evaluation of the solder wettability to the void of the specimen, a solder bath (JISZ 3282) maintained at 250 ° C. using a solder checker (SAT-5000, manufactured by Resuka). : H60A), the void portion of the specimen was immersed to a depth of 10 mm, held for 5 seconds, filled with solder in the void portion, and then taken out to obtain a T peel specimen. Next, using Tensilon, the T-shaped horizontal bar part of the T-peel test piece is sandwiched and pulled to peel off the solder filling part of the T-shaped vertical bar part, and the solder strength is measured. Evaluated.
◎: 4 kgf / 7 mm or more ○: 3-4 kgf / 7 mm or less △: 1-3 kgf / 7 mm or less X: 1 kgf / 7 mm or less
[めっき皮膜の密着性]
上記の各供試材から幅15mm、長さ50mmの試片を切り出し、90°折り曲げ、折り曲げ部にスコッチテープを貼り付け、次いで引き剥がした後、めっき皮膜の剥離の有無を肉眼観察し、下記の基準でめっき皮膜の密着性を評価した。
○:剥離は認められない。
×:剥離が認められる。
[Adhesion of plating film]
A specimen having a width of 15 mm and a length of 50 mm was cut out from each of the above test materials, bent at 90 °, a scotch tape was attached to the bent portion, and then peeled off. The adhesion of the plating film was evaluated based on the above criteria.
○: No peeling is observed.
X: Peeling is recognized.
[放熱性]
上記の各供試材から幅5mm、長さ10mmの試片を切り出し、光交流法熱定数測定装置(PIT−R2型、真空理工製)を用いて熱伝導率を測定した。また、放射率計(Dand S AERD放射率計、京都電子工業製)を用いて熱放射率を測定し、下記に示す基準で放熱性を評価した。
◎:熱伝導率60W/m・K以上でかつ熱放射率0.20以上
○:熱伝導率60W/m・K以上でかつ熱放射率0.05〜0.20未満
△:熱伝導率40〜60W/m・K未満
×:熱伝導率40W/m・K未満
[Heat dissipation]
A specimen having a width of 5 mm and a length of 10 mm was cut out from each of the above test materials, and the thermal conductivity was measured using an optical alternating current method thermal constant measuring apparatus (PIT-R2 type, manufactured by Vacuum Riko). In addition, the thermal emissivity was measured using an emissometer (Dand S AERD emissometer, manufactured by Kyoto Electronics Industry Co., Ltd.), and the heat dissipation was evaluated according to the following criteria.
A: Thermal conductivity 60 W / m · K or more and thermal emissivity 0.20 or more ○: Thermal conductivity 60 W / m · K or more and thermal emissivity 0.05 to less than 0.20 Δ: Thermal conductivity 40 ˜less than 60 W / m · K ×: thermal conductivity less than 40 W / m · K
その結果、 表3に示すように、Al板にZn層、Ni層を形成させた本発明の表面処理Al板はハンダの濡れ性に優れ、ハンダ強度が高く、かつ熱伝導率が大きく放熱性に優れている。また、この表面処理Al板のNi層上に熱放射性を向上させる層を設けることにより、放熱性がさらに向上していることが確認された。そのため、本発明は、ハンダ付けが可能な放熱性に優れたヒートシンクとして好適に適用できる。 As a result, as shown in Table 3, the surface-treated Al plate of the present invention in which a Zn layer and a Ni layer are formed on an Al plate has excellent solder wettability, high solder strength, high thermal conductivity, and high heat dissipation. Is excellent. Moreover, it was confirmed that the heat dissipation was further improved by providing a layer for improving thermal radiation on the Ni layer of the surface-treated Al plate. Therefore, the present invention can be suitably applied as a heat sink excellent in heat dissipation that can be soldered.
本発明の表面処理Al板は、ハンダ特性及び放熱性に優れているので、高密度のプリント基板等の放熱用ヒートシンクとして利用可能であるばかりでなく、ハンダ特性及び放熱性が要求される種々の基板に利用可能である。 Since the surface-treated Al plate of the present invention is excellent in solder characteristics and heat dissipation, it can be used not only as a heat sink for heat dissipation of high-density printed circuit boards, but also in various solderability and heat dissipation requirements. It can be used for a substrate.
1 発熱体
2 ヒートシンク
1
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JP2007154218A (en) * | 2005-11-30 | 2007-06-21 | Matsushita Electric Ind Co Ltd | Film separating method |
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