JPS5950194A - Method for plating aluminum, aluminum alloy, magnesium, magnesium alloy, zinc or zinc alloy - Google Patents

Method for plating aluminum, aluminum alloy, magnesium, magnesium alloy, zinc or zinc alloy

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Publication number
JPS5950194A
JPS5950194A JP16105482A JP16105482A JPS5950194A JP S5950194 A JPS5950194 A JP S5950194A JP 16105482 A JP16105482 A JP 16105482A JP 16105482 A JP16105482 A JP 16105482A JP S5950194 A JPS5950194 A JP S5950194A
Authority
JP
Japan
Prior art keywords
alloy
plating
zinc
aluminum
magnesium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16105482A
Other languages
Japanese (ja)
Other versions
JPS6136596B2 (en
Inventor
Hidekatsu Kotanino
小谷野 英勝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TOKYO MEKKI KK
Original Assignee
TOKYO MEKKI KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TOKYO MEKKI KK filed Critical TOKYO MEKKI KK
Priority to JP16105482A priority Critical patent/JPS5950194A/en
Publication of JPS5950194A publication Critical patent/JPS5950194A/en
Publication of JPS6136596B2 publication Critical patent/JPS6136596B2/ja
Granted legal-status Critical Current

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  • Chemically Coating (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

PURPOSE:To form uniform Cu plating with high adhesive strength, by cleaning the surface of a material, forming a Zn or Zn alloy film by a Zn substitution method, and carrying out electroplating in a copper cyanide plating soln. contg. water soluble silicate. CONSTITUTION:The surface of a material such as Al, an Al alloy, Mg, an Mg alloy, Zn, or a Zn alloy is cleaned, and a Zn or Zn alloy film is formed on the surface of the material by a Zn substitution method. Electroplating is then carried out to the surface on which Zn or Zn alloy film is formed, or the cleaned surface of Zn or Zn alloy in a copper cyanide plating soln. contg. <=50g/l water soluble silicate to form Cu plating. Sodium ortho- or metasilicate, potassium ortho- or metasilicate, ammonium ortho- or metasilicate or the like is used as the water soluble silicate.

Description

【発明の詳細な説明】[Detailed description of the invention]

本発明はアルミニウム、アルミニウム合金、マグネシウ
ム、マグネシウム合金、又は亜鉛、亜鉛合金にめっきを
職ず方法に門する。 アルミニウム、アルミニウム合金(J〕ξ後アルアルミ
ニウム系合金す)、マグネシウム、マグネシラノ・合金
(以後マグネシウム系合金と略すLtJ密度が小さく、
軽く、しかもt)賊的強1r1゜も十分で、かつ、グル
伝導性及び11f、気(べ導性にも優れているので、各
種構侍1゛h(材、(虎器部材、電子機型部材、電気機
器1’il(+4等に多用されている。 又、亜鉛、亜鉛合金(以後亜鉛系合金と略す)t、t 
m密鋳造が可能で、上記各種(:′−蕗1テ■材471
に多用されて(・る。 しかし、こhもの金目、合金の表面tit大気中で強固
なfil化皮膜で覆われており電気的接触抵抗が犬き(
・口:かりでなく、こり、らの表面に半1−11付けが
しにくい欠点がある。又この酸化度% IL 。 11(熱性を悪くする欠点をも有1−7″しいる。 これらの欠点をtJl’除するため、及び又(」−装飾
上の「1的から、これらの金1や合金の表面にXlも気
めっきを弥ずことが行わノ1できた。 従来、これらの金目や合金に電気めっきを1mすにtJ
1下記の方法がIjVられCきた。 0アルミニウム系合合、マグネシウム系合金;素材、→
脱哨榊水洗→酸洗→水洗→111(鉛置換−tル、その
池の)It気めっき、無電1仔めつき0亜鉛系合金; 素材→脱膓→水洗→酸洗→水洗→シ゛アン化銅IH気め
つき→水洗→ニッケル、その池のflu気M)つき、無
vat Fl’l’めっきしかし、従来のシアン仕組め
つき浴を用℃・る銀tlf、気めつきてQま、脱脂、水
洗、酸洗、水洗及びiff fn置換処理を除すことに
よって、先づ素材面に亜鉛It9膜を形成させたアルミ
ニウム系合金、マグネシウム系合金又(よ01j記前処
1!J!後の亜鉛系合金素材面をシアン化r4電気めっ
き浴中に浸漬すると、り(〕時間、通’X? 、数十性
以内に、素材面の亜鉛皮膜又r、J:I+[鉛系合金の
表面が、シアン化f1.! 、めっき浴中の組成分と置
換反応を起こすので、バレル方式でil−もちろん、引
掛方式でも、米材面が[4さIt、Jべ?りの雷、気め
っきのτ1ri電、にお(・て密着t’、l:の1:
The present invention relates to a method for plating aluminum, aluminum alloys, magnesium, magnesium alloys, or zinc, zinc alloys. Aluminum, aluminum alloy (J]
It is light, yet has enough strength to attack, and also has excellent conductivity, so it can be used for various construction materials, materials, electronic equipment, etc. It is often used for mold parts, electrical equipment 1'il (+4, etc.) Also, zinc, zinc alloy (hereinafter abbreviated as zinc-based alloy) t, t
M-tight casting is possible, and the above various types (:'-Fushi 1 Te■ Material 471
However, the surface of the alloy is covered with a strong filtration film in the atmosphere, and the electrical contact resistance is extremely low.
- Mouth: It has the disadvantage that it is difficult to attach half 1-11 to the surface of the mouth. Also, this oxidation degree %IL. 11 (Also has the disadvantage of worsening heat resistance. In order to eliminate these defects, and also () - from the decorative point of view, Conventionally, electroplating was performed on these metal grains and alloys at a rate of tJ per 1 m.
1 The following method has been tested. 0 Aluminum alloy, magnesium alloy; Material, →
Dessert Sakaki water washing → pickling → water washing → 111 (lead substitution - tru, that pond) It plating, no electroplating 0 zinc alloy; Material → descaling → water washing → pickling → water washing → cyanization Copper IH plating → water washing → nickel, the pond's flu gas M) is applied, no vat Fl'l' plating However, using the conventional cyan system plating bath, the silver tlf is noticed, By removing degreasing, water washing, pickling, water washing, and iff fn substitution treatment, aluminum alloys, magnesium alloys, and magnesium alloys with a zinc It9 film formed on the material surface (first part 1! When the surface of a zinc-based alloy material is immersed in a cyanide r4 electroplating bath, the zinc coating on the material surface or r, J: I + [lead-based alloy Since the surface undergoes a substitution reaction with cyanide f1.! and the components in the plating bath, the surface of the plating material is exposed to the irradiation of [4 It, J Be? τ1ri electric current of plating, close contact t', l: 1:


いyl−な:、ル゛’J ’/j’F ’ICのql・
暖めつき皮fAがれトら〕1なかった。谷Cつで、−テ
、の…d)つき−に[早にf’tt・て行われるニッケ
ルクロノNXIL ’I’u+、金、9艮、白金等の1
((、気めっき、無?Tj l’lY W)つき1−程
によって?’Jられるめっき皮)1りも一段と111悪
、不均一とな、す、不良品の発生率が大きかった。 本発明者tよ均一に、かつ、Vi:着1′1榔自く、銅
、ニッケル、その他のめっきをアルミニウム系合金、マ
グネシウム系合金、又Q、1亜鉛系合金の素イ゛1面に
強す方法を提供するよう研荒し7た結ji4 、下記の
知見金得て本発明を完1j!1するにtつブξ。 11且91)置換法によってアルミ系合金、マグネシウ
ム系合金素+1面に波N2 Lイする;1■鉛又v、■
、11[(鉛合金の皮膜の厚みしL非常に薄く、(+、
 (15〜05μm程度でちる。さらに、亜鉛自体σ)
イメン化傾向が用に比較して犬き−・ため、前記素イ]
面の11i。 鉛又rt、、r+ff鉛合金皮膜、又tユ、亜G)不合
金−4E +1面は、削めつき浴中に浸漬さノ1ろと、
短時間、Jm常、数十性以内で溶出さJl、ろ。l、か
るに銅めつき浴に、シアン化第−銅を主成分とするが、
可溶性け(・酸11+を含有させれば、亜鉛1i!!換
法によって得られた亜鉛又は亜鉛合金の皮膜又Qよ亜鉛
系合金素地のイ′f面は、けい酸1話イオン独白の界面
物理化学的挙動によって保’rj!’!され、めっき浴
に溶出することなく、めっき浴に9滴後のm気めつき通
11.によって、バレル方式であろうと、また、引掛方
式であろうと、常に均一な密着性の良〜・銅 めつきを
可能とすること、さらに、それ以後のニッケル、その他
のめつき工程においても十分均一な密着性の良℃・めっ
きが施され、得るどの知見を碍た。 水溶性けい酸塩が、水?1液中で特殊な溶液構造を取り
、全日との界面にお〜・て独自の挙動を1−でF’l 
覆効果や洗浄効果を現わすことは知られて(・るが、こ
の独白の挙動を積極的にIIt気めっきに応用して、品
物をめっき浴に浸漬してから電析開始までの間の全日表
面挙動の調整に役立たせた新知見によって、本発明は完
成されたものである。すなわち、本発明の要旨は、アル
ミニウム系合金、マグネシラノ・系合金に才)つてV、
1、孝利面を浄化し5、−(表1N+1に+lIj f
iI It1.挽法に1゛つ−し亜鉛又e、1亜鉛合金
皮膜を形1−るL7、え、i′lli船不合金孝tjに
あっては前記前処理を職し、それらの素材面を水溶性り
いn′9.’AKを含I「シアン化イト4めつき浴中で
+L!7 TT71 して銅、めっきを皓Jこと又Cま
さらに?1tられた銅めっき面にニッケル、クロム、銅
、半11J1 金、銀、白金等の無1. I’J’iめ
つき又を71屯気めっきを晧すこと又t、Iそσ)(I
IBの9)(理を寵すものである。 本発明に用(・られるアルミニウム系合金には一般のア
ルミニウム板材、岬イ゛イ又1.1約物資1σ)+1か
、ジュラルミンを始めとしてAl−5i系(シルミンな
ど)、AI−)(u系、AI−MV系、A7−yy−s
i系、hl−au−s1系(ラウタウルなど)、kl−
Ou−MV−Ni系(Y合金など)などノ合金材が示さ
れる。 マグネシウム系合金にはMV−AA’−Mu系、MP−
−Zu−Mu系、M5’−Z u−Z r 系などの合
金が示さり、る。 11i P:′I系合金に(よ一般の純亜鉛素4°(の
ほか、Zu−/1−Gu−)4P系、Zu−A/系など
の合金が示さシする。 そり、ぞり、の素材の処理工程及び亜鉛置換法は次の方
法が一般的である。 0アルミニウム系合金 (水洗)→シアン仕組、銅合金めつき→水洗→ど欠工程 亜鉛1d換処理浴及び条件; 水fat化ナトリウノ、  120〜500 V/1酸
化亜鉛     20〜l 00 f//13塩化第2
鉄    1〜41/l ロツセル塩    lO〜50 F/′111i11 
n?ナトリウム  0〜2fllンl!   度   
20〜25 ℃ 浸漬時間30〜120秒 Oマグネシウム系合金 脱脂−→水洗→11ン洗→水洗→亜鉛ti′i換処理→
水洗→シアンf1.ぐ((1、θ同合金?〆7じ−)き
−亭水i′1.−すと?(工程 餓鉛置換処11[I浴及び条件; 硫酸亜鉛      3 jl〜451−/1ビロリン
酸ナトリウム  、1.20〜2 ]、 Oy/(’。 フッ化ナトリウム      57/l炭酸ナトリウム
       5 y/l濡          バp
(68〜 7 5 ℃浸漬時間    5〜lO分 0亜鉛系合金 脱脂→水洗→r1セ洗→水洗→シアン化絹めつき→水洗
→次工程 本発明によるシアン化銅めっき浴の組成及び電気めっき
条件は下記の1111りで第1るうシアン化第−@  
  25〜100g/lシアン化ナトリウム 35〜1
50g/l炭酸ナトリウム    C)〜J、 0 (
l Y/lJ水溶性けt・【浚塩     〜□ ri
 11  Sl’ / 14pH]、(+−■1.8 温度         40〜・65℃本発明て11“
teI々とするシアン化名・1めつき浴に新成分とし1
配合する水溶fa:けいm1盆Vr、はオルy及びメタ
け℃・riヤナトリウム、オルソ及びメタけ℃・階カリ
ウム、オルソ及びメタけい酔アンモニウムなどが用〜・
られる。 水溶性けい酸(/X r、lニジアン化絹めつき浴に添
加するにつitlそれに伴なう効果を発揮するが、50
’!−713以上ではめつき面がよごれ、電流効率が悪
くなるので好ましくない。 本発明の方法によればアルミニウム系合金、マグネシウ
ム系合金、唾鉛系合金などの素材面に、均一に、密着性
の良し・絹、ニッケル、その他のめっきを弛すことがで
き、かつその不良発生率V」極めて少い。 次に、本発明の実la態様を実籍例によって説明するが
、本発明はこれらによって限定されるものでrJlcい
。 実施例1 厚み1Bの普通のアルミニウム板を5 Q m X10
0−に裁1’7i L、てイjJたアルミニウム小片を
脱(nl 、、  水洗、(’p洗、水洗した後、1)
1■記dlj @目i′tF、。 処理(いわゆるジンク−[lJ1!!理)19行7′C
った。 次に、得られたジンケート処」す1アルミニウノ・小片
を下記の/アン化銅めつき浴’s: III ’−・−
r、F記の条件で引411方式で銅電気めっきを行う)
た。 シアン化frx−銅     35g/7’シアン化ナ
トリウム   51 ’I/IJオルソけい69ナトリ
ウノ、   5’;//1炭酸ナトリウム     5
0f/1fpHIl、(1 温  度        50 C 1[T、流密IK         J−A /(1m
!めつへ時間       5分 さらに、得られた銅電気めっきしたアルミニウム小片を
水洗し、引4[1B式で、ニッケル、ハへめっきを行っ
た。ニッケル電気めっきの組1凡及び条fl’ tよ下
記の1iTiす。 硫(l俊ニッケル   24(lj//lI′ム化ニッ
ケル    45 Y//ホウ酔        30
 W/1 ザツカリン    111−/1 plI       4.5 温  度     50℃ 電流密度     2A/dm’ めっき時間    2分 得られたニッケルめっきのアルミニウム小片から2個を
削び、両りの表面を密着させ、250℃で半Ill (
Jけを行った。半Ill fJけ後両者を半田付は面と
直角の方向に引張り、剥離したところ、剥rifc i
?i+ Ittt半1.11面で才)す、ニッケルめっ
き面、銅めつき面、アルミニウム素地面の露出は詔めら
れなかった。 比較例1 実施例1に用℃・たと同じようなアルミニウム小片を実
施例1と同じように脱脂→水洗→酸洗→水洗→ジンケー
ト処理を行った。 次〜・で、水洗し、オルソは−・酸ナトリウムを添加し
な(・以外は実施例1に用〜・たのと同じ銅電気めっき
浴を川℃・て、実施例1に帛じて前記アルミニウム小片
に銅めっきを行った。 711らhたq4めつきアルミニウノ、小片t、!、 
、I’I−+’1がitヲく、むらが73めらJllふ
く)11発生率が15%モアリ、V!・:an性も1:
t IJrで7’、Cカで、)た。i (7) (!f
らJl、た銅i1.<・(めっきアルミニウノ、小片各
71,411亀fル113に鵡じてニッケルのm <j
tめっきを施した。 得られたニッケルめっきしまたアルミニウム小片はめつ
へ面が不均一であり、蕾着性介欠き、実施例1に亭じて
半ITI f=Jけを1iい゛、同様の引張り試験を行
ったところ、剥M’4 iイii tt、J壓モ地のア
ルミニウム面にあるととか、;3めらハ、た。 ’、+41.IIi例2 アルミニウノ、合金板(Cu4..0%、sit。 2K 、  M  rl  ()、  6 ?i  %
   MS’   (1,696、夕”、  fit:
  A A!   )  を 5  ×20×1門のチ
ップに哉11i L、た。 このチップを’t!:IKa例1に一埠一じ−り洗浄し
、ジンケート処理を行い、下記組成σ】6′刊+(+、
 4パ、めっき浴を川〜・、バレル方式でF記めつき条
イ′1でめっきを行った。 シアン化fr(−削    3(1y/1シアン化ナト
リウム  40 !/7′メタけ℃・r俊カリウム  
■o yiit1=I I+bナトリウム    40
iV/dpH1+1.5 ;]ui      I(J            
    4 5  ℃1if 1jlj iil、 ン
11IF’4’W I(!:            
 0. 5  A / d m 2めっき時fin  
     10分 次(・で水洗し、バレル方式でニッケル11L気めっき
を実’1llj例1に示した浴組成と条件でnL電流密
度、 5 A/dm’ テ行ッfr−0得られたニッケ
ルめりきのアルミニウムチップは、チップ1個1 (i
、’4の均一性が良く、がっ、密着性も良くめっきされ
ており、次(・でニッケルめっきさitたチップから2
個を選び、実施例1に準じて半1[(付面の引張試験を
行ったところ、剥離面Vま半+11而であった。 比較例2 実施例2に月Jいた銅iル気めっき浴にメタけ℃・酸カ
リウムを川(・な〜・以外は、全て実1711m4′A
2で行ったのと同じ条件でアルミニウム合金チップを洗
浄し、銅電気めっきを行い、次(・でニッケルttt 
<・(め・一つき看二行つカー。 ?4Jらノ1.たニッケルめつNj−グiブソノ°il
ブソプどとの表面状態に1、不均一で’+’:’? :
’M 11:をグζき、ふく′J]1発生率をま2〇二
騙に達した。 実強IX・11Ki(「1じて引張試11角を行−)だ
七ころ、剥離面t、j f(iめっき面−素地面でノー
、つた。 実施例 マグネシラノ・合金板(A12. (’i ?6、Z 
I)1.、09g、MnO,2%、残部MP)を5.X
 20 x J門rhチツフ゛に裁((升した。このチ
ップf i)’! ’4己1111処(用工不早で洗浄
し、次の亜鉛置換処」111溶11kにr4漬した。 硫酸亜鉛       40¥/1 ビロリン閑ナトリウム 180111 フツ化ナトリウム    52/l 炭mナトリウム     5y//l 湛  度       7()℃ p清時間        5分 次〜・で水洗し、実施例2に示した氾めつき浴を用〜・
、同一条件でバレル方式で4m、気めつ〜を行った。1
!)られた銅めっきマグネシウム合金チップを水洗し、
実物例2と同一の浴組成、条件でニッケルの電気めっき
を行った。 r+Iられたニッケルめっきチップはチップl II!
l fl;’iの均一性が)1く、かつ密Xf性も良く
めつきされて(・た。次いで、ニッケルめっきされたチ
ップから2 +1.’Hを選び、実物例1に亭じ°を半
田付は間の引りp試験を行ったところ、剥に1を面は半
11面であり、密着性に優れていることが示された。 比較例3 実施例3に用℃・た銅電気めつき浴にメタけい酸カリウ
ムを用℃・な(・以外は全て実施例3で行ったのと同じ
条件でマグネシウム合金チップを前処理し、バレル方式
で銅電気めっきな行った。 得られた帽めっきマグネシウム合金チップはふくれ発生
率が3526に達した。次(・で水洗し実施例3と同一
浴条件でニッケル11モ気めっきを行った。?iJらね
たニッケルめっきチップ#1ふくh発生率469dと畠
<、チップごとの表面状態も非常にイ・均一で密着1′
1が想かった。 実施1’=111に1’<+(して引張試験を行ったと
ころ)剥門I#面&−1…めっき而−麦J111間でカ
・す、t9770’t+ )J非常に悪かった。 実施例 A74.l’6  、  Qu   ]、、  0  
’X  、  M!7  11. 0  5 5115
  、   夕Q  (’tlζznのN鉛ダイカスト
製品ケース(25X l O×5、厚みl、 Q rr
w+ ) ?、前記r)iJ b、l!p un H、
バレル方式でり!施例2に示した方法で6刊及びニッケ
ルσ)電気めっきを行った。得もシまたニッケルめっへ
製品はふくれは全く見られ7゛tかチー〕た。又、実施
例IKQじて半田付けし、引q目試藺を行ったところ、
剥離面は半Il1面に才)す、’7j? ;ヤ′i性L
L優ftていた。 比較例4 実施例2で用(・た銅めっき浴で、メタけ〜・酸カリウ
ムを除℃・た以外#を全て!−7禿を泊i例4と同じ条
件で実施例4と同一の新しく・餓バ)ダイカスト剋晶ケ
−7スに銅及びニッケルの11し・(めっきを行った。 ニッケルめっき製品の4526にふくれを生じ、又、’
Jt”Wtに不均一であった。ふ<il、の生じて(・
な℃・製品2ケを実I11′1例目tべ′(じて半11
1 frけし、引張試験を行ったところ、密着性I/′
、[非常に悪く、そのnlJ H4而は素地−銅めっき
un托あった。 特許用に(1人 株式会社東京鍍金 代理人弁理士 浅 野 豐 司 千  粒  補  if:、f’j イl−11t57年1()月7’Ml ↑穎′「[r長官  若  彰 和 夫 ITす]6小
fl°の表示 昭和57年′1°?訂ド1(第1 (i 1 n 54
叶2、発明の名称 アルミニウム、アルミニウム合金、マグネシウム、マグ
ネシウム合金又[1萌鉛、亜鉛合金へのめつき方法 3、補正をする者 事件との関係  特許出願人 住 所 東京都目黒区下目M2丁「113番7壮名 称
 株式会社東京鍍金  ・ 41代1(1(人 〒 103 自発補正 n豹1t ilEにより増加する発明の倣  07、f
(li正の対象 (1)明細書の発明の詳細なli’と明の(閘8、補正
の内容 (1)  明細占6ページ14行I八交−M u系コケ
1A贋−MTl−名、] と!H’ !l(ずろ。 (2)明イ11旨(シロページF3行1’ M H入−
A l −M uJJ ’(1’M /’!−A 5L
−M n、ij  とn丁+1Eする。 (3)明、1111116ペ一ジF2行r’Mg−Zu
−Mu系、 M tLz tlz r q J  %I
’ M g   z n−Mn系、Mg−Zn−Zr不
J  とfll’ ilEする。 (4)  明細占7ページ2行[Z u−AI−c u
 −M g ;R% Z u” 9− J Jを[zn
−Ai −+3u−Mg系、7.n−A文系」と訂正す
る。
[
Iyl-na:, ql of Ru゛'J'/j'F'IC
There was no warm skin. In the valley C, - Te, of... d) with - [nickel chrono NXIL 'I'u+, gold, 9 barbs, platinum, etc. performed early f'tt.
((Plating, no plating? Tj l'lY W) Plating skin that is damaged by about 1-1?'J) 111 Even worse, non-uniformity, and the incidence of defective products was high. The inventor of the present invention has uniformly applied copper, nickel, or other plating to the bare surface of an aluminum alloy, a magnesium alloy, or a zinc alloy. As a result, I completed the present invention by obtaining the following knowledge! 1 to t bu ξ. 11 and 91) By substitution method, wave N2 is applied to aluminum alloy, magnesium alloy element +1 side; 1 ■ Lead or v, ■
, 11 [(The thickness of the lead alloy film L is very thin, (+,
(Chips at about 15 to 05 μm. Furthermore, zinc itself σ)
Because the tendency to become older is more dog-like than the normal one, the above-mentioned elementary school]
11i of the surface. Lead or rt,, r + ff lead alloy film, tyu, sub-G) non-alloy -4E +1 side is immersed in a scraping bath,
For a short time, Jm usually elutes within several tens of seconds. l.The main component of copper plating bath is cupric cyanide,
If soluble silicic acid (-acid 11+ is included, zinc 1i!! film of zinc or zinc alloy obtained by the conversion method or the A'f surface of the zinc-based alloy substrate will be the interface of the silicic acid 1 story ion monologue. It is preserved by physicochemical behavior and does not elute into the plating bath, and by plating 9 drops into the plating bath, it can be used whether it is a barrel method or a hook method. , it is possible to always perform copper plating with good uniform adhesion, and furthermore, in the subsequent nickel and other plating processes, the plating is applied with good and uniform adhesion. The water-soluble silicate takes a special solution structure in water and exhibits unique behavior at the interface with F'l.
It is known that this behavior has a masking effect and a cleaning effect (・ru), but this behavior can be actively applied to IIt plating to improve The present invention was completed based on new knowledge that was useful for adjusting the surface behavior throughout the day.In other words, the gist of the present invention is to apply V,
1. Purify the filial surface 5. - (+lIj f in Table 1N+1
iI It1. In the case of L7, E, i'lli ship non-alloys, which have a zinc alloy coating and a zinc alloy coating, the above pretreatment is performed and the surface of the material is dissolved in water. Sexuality n'9. Copper was plated in a cyanide 4 plating bath with AK, nickel, chromium, copper, semi-11J1 gold, Silver, platinum, etc. 1. I'J'i plating 71 tons of plating
IB 9) (accommodates theory. The aluminum-based alloys used in the present invention include general aluminum plate materials, 1.1 materials (1σ)+1, duralumin, and other aluminum alloys. -5i series (silmin etc.), AI-) (u series, AI-MV series, A7-yy-s
i series, hl-au-s1 series (Rautaur etc.), kl-
Alloy materials such as Ou-MV-Ni (Y alloy, etc.) are shown. Magnesium alloys include MV-AA'-Mu and MP-
-Zu-Mu series, M5'-Zu-Zr series and other alloys are shown. 11i P:' I-based alloys include alloys such as general pure zinc 4° (in addition to Zu-/1-Gu-), 4P-based, and Zu-A/based. The treatment process and zinc replacement method for materials are generally as follows: 0 Aluminum alloy (water washing) → Cyan system, copper alloy plating → Water washing → Depletion process Zinc 1d replacement treatment bath and conditions; Water fat Sodium chloride, 120-500 V/1 Zinc oxide 20-l 00 f//13 Second chloride
Iron 1~41/l Lotusel salt lO~50 F/'111i11
n? Sodium 0-2flnnl! Every time
20-25°C Immersion time 30-120 seconds O Magnesium alloy degreasing - → Water washing → 11-inch washing → Water washing → Zinc ti'i exchange treatment →
Wash with water → cyan f1. ((1, θ same alloy?〆7ji-) Ki-tei water i'1.-st? (Step starved lead replacement treatment 11 [I bath and conditions; Zinc sulfate 3 jl ~ 451-/1 birophosphoric acid Sodium, 1.20~2], Oy/('. Sodium fluoride 57/l Sodium carbonate 5 y/l wet bap
(68-75°C Immersion time 5-10 minutes 0 Zinc-based alloy degreasing → water washing → r1 cycle washing → water washing → cyanide silk plating → water washing → next step Composition and electroplating conditions of the cyanide copper plating bath according to the present invention is the first step cyanide in the following 1111 -@
25-100g/l Sodium cyanide 35-1
50g/l sodium carbonate C) ~ J, 0 (
l Y/lJ water soluble t・[dred salt ~□ ri
11 Sl' / 14 pH], (+-■1.8 Temperature 40 to 65°C In the present invention 11"
A new ingredient in the cyanide bath.
Water-soluble fa to be blended: water-soluble fa, sodium chloride and metal chloride, potassium chloride and potassium chloride, ammonium ammonium, etc.
It will be done. When water-soluble silicic acid (/
'! If it is -713 or more, the plated surface becomes dirty and current efficiency deteriorates, which is not preferable. According to the method of the present invention, it is possible to uniformly and uniformly loosen plating such as silk, nickel, and other materials on the surface of materials such as aluminum alloys, magnesium alloys, and salivary lead alloys, and to remove defects in the plating. Incidence rate V" is extremely low. Next, practical aspects of the present invention will be explained using practical examples, but the present invention is not limited by these. Example 1 An ordinary aluminum plate with a thickness of 1B is 5 Q m x 10
Remove the small piece of aluminum that was cut into 1'7i L, washed with water, (washed with water, then washed with water, 1)
1 ■ dlj @itei′tF,. Processing (so-called zinc-[lJ1!! logic) line 19 7'C
It was. Next, the obtained zincate solution 1 aluminum piece was subjected to the following copper anhydride plating bath: III '--
Copper electroplating is performed using the 411 method under the conditions described in R and F)
Ta. Cyanide frx-copper 35g/7' Sodium cyanide 51 'I/IJ Ortho Kei 69 Natriuno, 5';//1 Sodium carbonate 5
0f/1fpHIl, (1 temperature 50 C 1 [T, flow density IK J-A / (1m
! Further, the resulting copper electroplated aluminum pieces were washed with water and plated with nickel using the 1B method. Nickel electroplating sets 1 and 1 are shown below. Sulfuric acid nickel 24 (lj//lI' nickel 45 Y//borous 30
W/1 Zatsukarin 111-/1 plI 4.5 Temperature: 50°C Current density: 2A/dm' Plating time: 2 minutes Cut two pieces from the obtained nickel-plated aluminum pieces, bring both surfaces into close contact, Half Ill at °C (
I went to Jke. After soldering both parts, I pulled them in a direction perpendicular to the soldering surface and peeled them off.
? i+ Ittt semi-1.11 surface), the exposure of nickel plated surface, copper plated surface, and aluminum base surface was not criticized. Comparative Example 1 A small aluminum piece similar to that used in Example 1 was subjected to degreasing → water washing → pickling → water washing → zincate treatment in the same manner as in Example 1. The same copper electroplating bath as used in Example 1 was used in Example 1 except for the addition of ortho-acid sodium. Copper plating was performed on the aluminum small piece. 711 et al.
, I'I-+'1 is itwoku, Muraga 73mera Jllfuku) 11 incidence is 15% Moari, V!・:An-ness is also 1:
t 7' in IJr, C in ). i (7) (!f
et Jl, Ta copper i1. <・(Plated aluminum Uno, small pieces each 71,411 pieces, 113 times nickel m <j
T-plated. The resulting nickel-plated aluminum pieces had uneven surfaces and bud adhesion, so a tensile test was conducted in the same manner as in Example 1 using a semi-ITI f=J of 1i. By the way, the peeling M'4 iii tt was on the aluminum surface of the J rim. ', +41. IIi Example 2 Aluminum Uno, alloy plate (Cu4..0%, sit. 2K, M rl (), 6?i%
MS' (1,696, evening", fit:
A A! ) into a 5 x 20 x 1 chip. Don't buy this chip! : IKa Example 1 was washed one by one, treated with zincate, and the following composition σ】6' issue + (+,
4th step: Plating was carried out using a barrel method using a plating bath of 1. Cyanide fr(-cut 3(1y/1 Sodium cyanide 40!/7'Metal ℃・r Shun Potassium
■o yiit1=I I+b Sodium 40
iV/dpH1+1.5 ; ]ui I(J
4 5 ℃1if 1jlj iil, n11IF'4'W I(!:
0. 5 A/dm fin when plating 2
After washing with water for 10 minutes, 11L nickel plating was carried out using the barrel method at a nL current density of 5 A/dm' using the bath composition and conditions shown in Example 1. Riki's aluminum chips are 1 chip 1 (i
, '4 is plated with good uniformity and good adhesion.
A tensile test was performed on the surface according to Example 1, and the peeled surface was V + 11. Comparative Example 2 Copper plating that was similar to Example 2 Pour ℃ ℃ acid potassium into the bath (except for...
The aluminum alloy chip was cleaned under the same conditions as in step 2, copper electroplated, and then nickel ttt
<・(Me・One look two lines car.
1, non-uniform '+': '? :
'M 11: The incidence rate has reached 202. Actual strength IX・11Ki (11 tensile test performed for the first time) 7 rollers, peeled surface t, j f (i plating surface - base surface No, tsuta. Example magnesyrano alloy plate (A12. 'i?6,Z
I)1. , 09g, MnO, 2%, balance MP) in 5. X
20 x J gate rh chip ((I made it. This chip f i)'! '4 The 1111 place (cleaned as soon as possible, then the next zinc replacement treatment) 4 soaked in 111 solution 11k. Zinc sulfate 40 ¥/1 Sodium bilorin 180111 Sodium fluoride 52/l Sodium charcoal 5y//l Flooding degree 7()℃ Purifying time 5 minutes Wash with water and use the flooding bath shown in Example 2. ~・
A 4-meter test was carried out using the barrel method under the same conditions. 1
! ) washed copper-plated magnesium alloy chips with water,
Nickel electroplating was performed using the same bath composition and conditions as in Actual Example 2. The r+I nickel plated chip is the chip l II!
The uniformity of l fl;'i was 1) and the density was also good (. When soldering was conducted a tensile test, it was found that the peeling surface was half 11, indicating excellent adhesion.Comparative Example 3 Magnesium alloy chips were pretreated under the same conditions as in Example 3 except for using potassium metasilicate in the copper electroplating bath, and copper electroplating was performed using a barrel method. The blistering rate of the cap-plated magnesium alloy chip reached 3526.Next, it was washed with water and subjected to nickel-11 plating under the same bath conditions as in Example 3.Nickel-plated chip #1 Fuku h occurrence rate is 469d, and the surface condition of each chip is also very good, uniform and adhesion 1'
I thought of 1. Execution 1' = 111, 1'< + (Tensile test was conducted) Peeling gate I# surface & -1... Plating surface - Barley J111, t9770't+) J was very poor. Example A74. l'6, Qu ],, 0
'X, M! 7 11. 0 5 5115
, Yu Q ('tlζzn's N lead die-casting product case (25X l O x 5, thickness l, Q rr
w+)? , said r)iJ b,l! p un H,
Barrel method available! Electroplating was carried out using the method shown in Example 2. Also, the nickel-plated product showed no blistering at all. In addition, when I soldered the same as Example IKQ and tested the pull-out test, I found that
The peeled surface is half Il1), '7j? ; Ya'i sex L
It was L Yuft. Comparative Example 4 In the copper plating bath used in Example 2, remove metallurgy, remove acid potassium, and remove all ingredients except !-7. Copper and nickel plating was applied to the new die-cast crystal case 7. The nickel-plated product 4526 blistered, and '
Jt”Wt was non-uniform.F<il, occurred (・
I11' 1st example Tbe' (Jitehan11)
When a tensile test was performed on 1 fr poppy, the adhesion was I/'
, [It was very bad that the NlJ H4 was bare-copper-plated. For patent purposes (1 person Tokyo Plating Co., Ltd. Patent Attorney Asano Fyo Tsukasa thousand grains if:, f'j Il-11t January 1, 1957 () 7'Ml ↑Ying' [r Director Aki Kazuo Waka ITsu] 6 small fl° display 1981 '1°? Revised de 1 (1st (i 1 n 54
Kano 2. Name of the invention Aluminum, aluminum alloy, magnesium, magnesium alloy or [1. Method for plating lead and zinc alloys 3. Relationship with the case of the person making the amendment Patent applicant address: Shimome M2, Meguro-ku, Tokyo. Ding ``113 No. 7 Name Tokyo Plating Co., Ltd. ・ 41 generation 1 (1 (person) 103 spontaneous correction n leopard 1t ilE imitation of the invention 07, f
(Li correct object (1) Detailed li' of the invention in the specification and Akira's (8, Contents of amendment (1) Particulars page 6, line 14 I 8 cross-Mu series moss 1A counterfeit-MTl-name ,] and!H' !l (Zuro. (2) Akii 11 effect (Shiro page F3 line 1' M
A l -M uJJ'(1'M/'!-A 5L
-M n, ij and n+1E. (3) Akira, page 1111116, line F2 r'Mg-Zu
-Mu system, M tLz tlz rq J %I
' M g z n-Mn system, Mg-Zn-Zr and full' ilE. (4) Details page 7, 2 lines [Z u-AI-cu
-M g ;R% Z u” 9- J J [zn
-Ai -+3u-Mg system, 7. n-A liberal arts,” he corrected.

Claims (1)

【特許請求の範囲】[Claims] (1)  アルミニウム、アルミニウム合金、マグネシ
ウム、マグネシウム合金又は亜鉛、亜鉛合金の素+4表
面を浄化し、次いで亜鉛置換法により該メ(材面に1F
鉛又は亜鉛合金皮膜を杉成し、その素材面又は素材を浄
化した亜鉛又は川(鉛合金の素材面に対して、水溶性け
(・酸塩を含むシアン化゛銅めつき液中で、電気めっき
通電をし、f)iJ記素材面に錆めっきを怖す方法(2
)  !f!? tt’r 11?J求の範囲第1項二
続イテニッケル、クロム、閂、半11J、金、銀、白金
の無電解めっき又i1 ’d(気めっきを強す方法
(1) Clean the surface of aluminum, aluminum alloy, magnesium, magnesium alloy, zinc, zinc alloy, and then apply 1F to the material surface by zinc substitution method.
A lead or zinc alloy film is formed on the surface of the material or the surface of the material is treated with purified zinc or river (on the surface of the lead alloy material, water-soluble cyanide (containing acid salts) is applied in a copper plating solution. Electroplating is energized, f) A method to avoid rust plating on the iJ marking material surface (2)
)! f! ? tt'r 11? Item 1: Electroless plating of nickel, chromium, bar, semi-11J, gold, silver, and platinum (method of strengthening air plating)
JP16105482A 1982-09-17 1982-09-17 Method for plating aluminum, aluminum alloy, magnesium, magnesium alloy, zinc or zinc alloy Granted JPS5950194A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16105482A JPS5950194A (en) 1982-09-17 1982-09-17 Method for plating aluminum, aluminum alloy, magnesium, magnesium alloy, zinc or zinc alloy

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16105482A JPS5950194A (en) 1982-09-17 1982-09-17 Method for plating aluminum, aluminum alloy, magnesium, magnesium alloy, zinc or zinc alloy

Publications (2)

Publication Number Publication Date
JPS5950194A true JPS5950194A (en) 1984-03-23
JPS6136596B2 JPS6136596B2 (en) 1986-08-19

Family

ID=15727727

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16105482A Granted JPS5950194A (en) 1982-09-17 1982-09-17 Method for plating aluminum, aluminum alloy, magnesium, magnesium alloy, zinc or zinc alloy

Country Status (1)

Country Link
JP (1) JPS5950194A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6230887A (en) * 1985-07-31 1987-02-09 Mitsubishi Cable Ind Ltd Composite aluminum material
JP2002212761A (en) * 2001-01-11 2002-07-31 Honda Motor Co Ltd Plastic working method for nonferrous metallic workpiece
US6669997B2 (en) 2002-03-26 2003-12-30 National Research Council Of Canada Acousto-immersion coating and process for magnesium and its alloy
JP2005060809A (en) * 2003-08-20 2005-03-10 Toyo Kohan Co Ltd SURFACE-TREATED Al SHEET EXCELLENT IN SOLDERABILITY, ITS PRODUCTION METHOD AND HEAT SINK USING THE SAME
JP2009504923A (en) * 2005-08-17 2009-02-05 マクダーミッド インコーポレーテッド Pretreatment of magnesium substrate for electroplating
WO2010072121A1 (en) * 2008-12-26 2010-07-01 Byd Company Limited Electroplating method and electroplated product
JP2010285660A (en) * 2009-06-12 2010-12-24 Taiho Kogyo Co Ltd Tinning method to magnesium alloy, and etching liquid for magnesium alloy

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6230887A (en) * 1985-07-31 1987-02-09 Mitsubishi Cable Ind Ltd Composite aluminum material
JPH0241588B2 (en) * 1985-07-31 1990-09-18
JP2002212761A (en) * 2001-01-11 2002-07-31 Honda Motor Co Ltd Plastic working method for nonferrous metallic workpiece
US6669997B2 (en) 2002-03-26 2003-12-30 National Research Council Of Canada Acousto-immersion coating and process for magnesium and its alloy
JP2005060809A (en) * 2003-08-20 2005-03-10 Toyo Kohan Co Ltd SURFACE-TREATED Al SHEET EXCELLENT IN SOLDERABILITY, ITS PRODUCTION METHOD AND HEAT SINK USING THE SAME
JP2009504923A (en) * 2005-08-17 2009-02-05 マクダーミッド インコーポレーテッド Pretreatment of magnesium substrate for electroplating
JP4857340B2 (en) * 2005-08-17 2012-01-18 マクダーミッド インコーポレーテッド Pretreatment of magnesium substrate for electroplating
WO2010072121A1 (en) * 2008-12-26 2010-07-01 Byd Company Limited Electroplating method and electroplated product
JP2010285660A (en) * 2009-06-12 2010-12-24 Taiho Kogyo Co Ltd Tinning method to magnesium alloy, and etching liquid for magnesium alloy

Also Published As

Publication number Publication date
JPS6136596B2 (en) 1986-08-19

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