JP2005054256A - Post treatment liquid for surface of tin or tin alloy plating, and posttreatment method - Google Patents
Post treatment liquid for surface of tin or tin alloy plating, and posttreatment method Download PDFInfo
- Publication number
- JP2005054256A JP2005054256A JP2003288252A JP2003288252A JP2005054256A JP 2005054256 A JP2005054256 A JP 2005054256A JP 2003288252 A JP2003288252 A JP 2003288252A JP 2003288252 A JP2003288252 A JP 2003288252A JP 2005054256 A JP2005054256 A JP 2005054256A
- Authority
- JP
- Japan
- Prior art keywords
- post
- tin
- resin
- treatment
- preparation example
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007747 plating Methods 0.000 title claims abstract description 131
- 239000007788 liquid Substances 0.000 title claims abstract description 95
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 title claims abstract description 47
- 229910001128 Sn alloy Inorganic materials 0.000 title claims abstract description 35
- 238000000034 method Methods 0.000 title claims description 35
- 229920005989 resin Polymers 0.000 claims abstract description 96
- 239000011347 resin Substances 0.000 claims abstract description 96
- 229920000180 alkyd Polymers 0.000 claims abstract description 45
- 229920000178 Acrylic resin Polymers 0.000 claims abstract description 35
- 239000004925 Acrylic resin Substances 0.000 claims abstract description 35
- 239000005011 phenolic resin Substances 0.000 claims abstract description 27
- 239000002253 acid Substances 0.000 claims abstract description 20
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 11
- 229910052718 tin Inorganic materials 0.000 claims description 42
- 239000010949 copper Substances 0.000 claims description 26
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 25
- 229910052802 copper Inorganic materials 0.000 claims description 25
- -1 amine salt Chemical class 0.000 claims description 22
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 18
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 claims description 17
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 16
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 claims description 16
- 239000011976 maleic acid Substances 0.000 claims description 16
- 238000012805 post-processing Methods 0.000 claims description 16
- 150000001412 amines Chemical class 0.000 claims description 9
- 229910021529 ammonia Inorganic materials 0.000 claims description 9
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- 238000009835 boiling Methods 0.000 claims description 6
- 239000011701 zinc Substances 0.000 claims description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 4
- 229910052804 chromium Inorganic materials 0.000 claims description 4
- 239000011651 chromium Substances 0.000 claims description 4
- 239000004065 semiconductor Substances 0.000 claims description 4
- 229910052725 zinc Inorganic materials 0.000 claims description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 3
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 3
- 150000003863 ammonium salts Chemical class 0.000 claims description 3
- 229910052787 antimony Inorganic materials 0.000 claims description 3
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 3
- 229910052797 bismuth Inorganic materials 0.000 claims description 3
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 3
- 239000003990 capacitor Substances 0.000 claims description 3
- 229910052801 chlorine Inorganic materials 0.000 claims description 3
- 239000000460 chlorine Substances 0.000 claims description 3
- 229910017052 cobalt Inorganic materials 0.000 claims description 3
- 239000010941 cobalt Substances 0.000 claims description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 3
- 239000013078 crystal Substances 0.000 claims description 3
- 229910052733 gallium Inorganic materials 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 239000010931 gold Substances 0.000 claims description 3
- 229910052738 indium Inorganic materials 0.000 claims description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- 229910052716 thallium Inorganic materials 0.000 claims description 3
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 claims description 3
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims description 2
- 239000000969 carrier Substances 0.000 claims description 2
- 229920001568 phenolic resin Polymers 0.000 claims description 2
- 229910000679 solder Inorganic materials 0.000 abstract description 50
- 230000006866 deterioration Effects 0.000 abstract description 15
- 230000000670 limiting effect Effects 0.000 abstract description 2
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 238000002360 preparation method Methods 0.000 description 137
- 230000000052 comparative effect Effects 0.000 description 117
- 239000000243 solution Substances 0.000 description 64
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 48
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 36
- 239000010408 film Substances 0.000 description 29
- 239000007787 solid Substances 0.000 description 21
- 238000012360 testing method Methods 0.000 description 20
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 18
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 17
- 235000019198 oils Nutrition 0.000 description 17
- 239000003921 oil Substances 0.000 description 16
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 15
- 239000008096 xylene Substances 0.000 description 15
- 239000000203 mixture Substances 0.000 description 12
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 229910001316 Ag alloy Inorganic materials 0.000 description 10
- 229910001152 Bi alloy Inorganic materials 0.000 description 10
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 10
- 230000002411 adverse Effects 0.000 description 10
- 238000005476 soldering Methods 0.000 description 10
- 229910001297 Zn alloy Inorganic materials 0.000 description 9
- QCEUXSAXTBNJGO-UHFFFAOYSA-N [Ag].[Sn] Chemical compound [Ag].[Sn] QCEUXSAXTBNJGO-UHFFFAOYSA-N 0.000 description 9
- JWVAUCBYEDDGAD-UHFFFAOYSA-N bismuth tin Chemical compound [Sn].[Bi] JWVAUCBYEDDGAD-UHFFFAOYSA-N 0.000 description 9
- 229910000597 tin-copper alloy Inorganic materials 0.000 description 9
- 229910001174 tin-lead alloy Inorganic materials 0.000 description 9
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 8
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 8
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- 150000003839 salts Chemical group 0.000 description 8
- GZCWPZJOEIAXRU-UHFFFAOYSA-N tin zinc Chemical compound [Zn].[Sn] GZCWPZJOEIAXRU-UHFFFAOYSA-N 0.000 description 8
- 239000003960 organic solvent Substances 0.000 description 7
- LFWGYTIGZICTTE-BTJKTKAUSA-N (z)-but-2-enedioic acid;styrene Chemical compound C=CC1=CC=CC=C1.OC(=O)\C=C/C(O)=O LFWGYTIGZICTTE-BTJKTKAUSA-N 0.000 description 6
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 6
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 6
- JALQQBGHJJURDQ-UHFFFAOYSA-L bis(methylsulfonyloxy)tin Chemical compound [Sn+2].CS([O-])(=O)=O.CS([O-])(=O)=O JALQQBGHJJURDQ-UHFFFAOYSA-L 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 238000009713 electroplating Methods 0.000 description 6
- KWIUHFFTVRNATP-UHFFFAOYSA-N glycine betaine Chemical compound C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 6
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 5
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 5
- 230000001133 acceleration Effects 0.000 description 5
- 229920001577 copolymer Polymers 0.000 description 5
- 150000002148 esters Chemical class 0.000 description 5
- 229940098779 methanesulfonic acid Drugs 0.000 description 5
- 150000002989 phenols Chemical class 0.000 description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-N phosphoric acid Substances OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 5
- 239000004094 surface-active agent Substances 0.000 description 5
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 5
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 4
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
- 229910000831 Steel Inorganic materials 0.000 description 4
- 239000004480 active ingredient Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 4
- 239000000944 linseed oil Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 4
- 230000002265 prevention Effects 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 230000035484 reaction time Effects 0.000 description 4
- 239000010959 steel Substances 0.000 description 4
- 150000005846 sugar alcohols Polymers 0.000 description 4
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 3
- 238000010306 acid treatment Methods 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 229960003237 betaine Drugs 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 3
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 3
- 238000009736 wetting Methods 0.000 description 3
- XPALGXXLALUMLE-UHFFFAOYSA-N 2-(dimethylamino)tetradecanoic acid Chemical compound CCCCCCCCCCCCC(N(C)C)C(O)=O XPALGXXLALUMLE-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 239000002280 amphoteric surfactant Substances 0.000 description 2
- 239000003945 anionic surfactant Substances 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 239000003093 cationic surfactant Substances 0.000 description 2
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 2
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 150000004665 fatty acids Chemical class 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 235000011187 glycerol Nutrition 0.000 description 2
- 235000010985 glycerol esters of wood rosin Nutrition 0.000 description 2
- 230000036541 health Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 235000021388 linseed oil Nutrition 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 2
- 239000003607 modifier Substances 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 2
- 239000002736 nonionic surfactant Substances 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- 150000003014 phosphoric acid esters Chemical class 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 150000007519 polyprotic acids Polymers 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 description 2
- 229920003987 resole Polymers 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 239000003549 soybean oil Substances 0.000 description 2
- 235000012424 soybean oil Nutrition 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- XFNJVJPLKCPIBV-UHFFFAOYSA-N trimethylenediamine Chemical compound NCCCN XFNJVJPLKCPIBV-UHFFFAOYSA-N 0.000 description 2
- JNYAEWCLZODPBN-JGWLITMVSA-N (2r,3r,4s)-2-[(1r)-1,2-dihydroxyethyl]oxolane-3,4-diol Chemical class OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O JNYAEWCLZODPBN-JGWLITMVSA-N 0.000 description 1
- JHPBZFOKBAGZBL-UHFFFAOYSA-N (3-hydroxy-2,2,4-trimethylpentyl) 2-methylprop-2-enoate Chemical compound CC(C)C(O)C(C)(C)COC(=O)C(C)=C JHPBZFOKBAGZBL-UHFFFAOYSA-N 0.000 description 1
- PSBDWGZCVUAZQS-UHFFFAOYSA-N (dimethylsulfonio)acetate Chemical compound C[S+](C)CC([O-])=O PSBDWGZCVUAZQS-UHFFFAOYSA-N 0.000 description 1
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
- BYLSIPUARIZAHZ-UHFFFAOYSA-N 2,4,6-tris(1-phenylethyl)phenol Chemical compound C=1C(C(C)C=2C=CC=CC=2)=C(O)C(C(C)C=2C=CC=CC=2)=CC=1C(C)C1=CC=CC=C1 BYLSIPUARIZAHZ-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- RYKLZUPYJFFNRR-UHFFFAOYSA-N 3-hydroxypiperidin-2-one Chemical compound OC1CCCNC1=O RYKLZUPYJFFNRR-UHFFFAOYSA-N 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical compound NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 229910000807 Ga alloy Inorganic materials 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 1
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 1
- IGFHQQFPSIBGKE-UHFFFAOYSA-N Nonylphenol Natural products CCCCCCCCCC1=CC=C(O)C=C1 IGFHQQFPSIBGKE-UHFFFAOYSA-N 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- ULUAUXLGCMPNKK-UHFFFAOYSA-N Sulfobutanedioic acid Chemical compound OC(=O)CC(C(O)=O)S(O)(=O)=O ULUAUXLGCMPNKK-UHFFFAOYSA-N 0.000 description 1
- 229910001007 Tl alloy Inorganic materials 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- UTQZCRVGVCRUED-UHFFFAOYSA-N [Au].[Zn].[Sn] Chemical compound [Au].[Zn].[Sn] UTQZCRVGVCRUED-UHFFFAOYSA-N 0.000 description 1
- QKAJPFXKNNXMIZ-UHFFFAOYSA-N [Bi].[Ag].[Sn] Chemical compound [Bi].[Ag].[Sn] QKAJPFXKNNXMIZ-UHFFFAOYSA-N 0.000 description 1
- ZWFRZGJUJSOHGL-UHFFFAOYSA-N [Bi].[Cu].[Sn] Chemical compound [Bi].[Cu].[Sn] ZWFRZGJUJSOHGL-UHFFFAOYSA-N 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 150000008431 aliphatic amides Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 150000004996 alkyl benzenes Chemical class 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 125000005037 alkyl phenyl group Chemical group 0.000 description 1
- 150000008051 alkyl sulfates Chemical class 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- MNMKEULGSNUTIA-UHFFFAOYSA-K bismuth;methanesulfonate Chemical compound [Bi+3].CS([O-])(=O)=O.CS([O-])(=O)=O.CS([O-])(=O)=O MNMKEULGSNUTIA-UHFFFAOYSA-K 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- UTOVMEACOLCUCK-PLNGDYQASA-N butyl maleate Chemical compound CCCCOC(=O)\C=C/C(O)=O UTOVMEACOLCUCK-PLNGDYQASA-N 0.000 description 1
- 239000004359 castor oil Substances 0.000 description 1
- 235000019438 castor oil Nutrition 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- QDYLMAYUEZBUFO-UHFFFAOYSA-N cetalkonium chloride Chemical class CCCCCCCCCCCCCCCC[N+](C)(C)CC1=CC=CC=C1 QDYLMAYUEZBUFO-UHFFFAOYSA-N 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 229910001430 chromium ion Inorganic materials 0.000 description 1
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 1
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 1
- 229940018557 citraconic acid Drugs 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- WDHWFGNRFMPTQS-UHFFFAOYSA-N cobalt tin Chemical compound [Co].[Sn] WDHWFGNRFMPTQS-UHFFFAOYSA-N 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- BSXVKCJAIJZTAV-UHFFFAOYSA-L copper;methanesulfonate Chemical compound [Cu+2].CS([O-])(=O)=O.CS([O-])(=O)=O BSXVKCJAIJZTAV-UHFFFAOYSA-L 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 125000000853 cresyl group Chemical group C1(=CC=C(C=C1)C)* 0.000 description 1
- 229960002887 deanol Drugs 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- 229940105990 diglycerin Drugs 0.000 description 1
- GPLRAVKSCUXZTP-UHFFFAOYSA-N diglycerol Chemical compound OCC(O)COCC(O)CO GPLRAVKSCUXZTP-UHFFFAOYSA-N 0.000 description 1
- 229940043279 diisopropylamine Drugs 0.000 description 1
- 239000012972 dimethylethanolamine Substances 0.000 description 1
- WEHWNAOGRSTTBQ-UHFFFAOYSA-N dipropylamine Chemical compound CCCNCCC WEHWNAOGRSTTBQ-UHFFFAOYSA-N 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- ZEMPKEQAKRGZGQ-XOQCFJPHSA-N glycerol triricinoleate Natural products CCCCCC[C@@H](O)CC=CCCCCCCCC(=O)OC[C@@H](COC(=O)CCCCCCCC=CC[C@@H](O)CCCCCC)OC(=O)CCCCCCCC=CC[C@H](O)CCCCCC ZEMPKEQAKRGZGQ-XOQCFJPHSA-N 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- MTNDZQHUAFNZQY-UHFFFAOYSA-N imidazoline Chemical compound C1CN=CN1 MTNDZQHUAFNZQY-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 description 1
- 239000005001 laminate film Substances 0.000 description 1
- LLABTCPIBSAMGS-UHFFFAOYSA-L lead(2+);methanesulfonate Chemical compound [Pb+2].CS([O-])(=O)=O.CS([O-])(=O)=O LLABTCPIBSAMGS-UHFFFAOYSA-L 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- DMQSHEKGGUOYJS-UHFFFAOYSA-N n,n,n',n'-tetramethylpropane-1,3-diamine Chemical compound CN(C)CCCN(C)C DMQSHEKGGUOYJS-UHFFFAOYSA-N 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- SNQQPOLDUKLAAF-UHFFFAOYSA-N nonylphenol Chemical compound CCCCCCCCCC1=CC=CC=C1O SNQQPOLDUKLAAF-UHFFFAOYSA-N 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000003002 pH adjusting agent Substances 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 229920001515 polyalkylene glycol Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- GGHDAUPFEBTORZ-UHFFFAOYSA-N propane-1,1-diamine Chemical compound CCC(N)N GGHDAUPFEBTORZ-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000011134 resol-type phenolic resin Substances 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- 229940117986 sulfobetaine Drugs 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000003784 tall oil Substances 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000005809 transesterification reaction Methods 0.000 description 1
- RKBCYCFRFCNLTO-UHFFFAOYSA-N triisopropylamine Chemical compound CC(C)N(C(C)C)C(C)C RKBCYCFRFCNLTO-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- 239000002383 tung oil Substances 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 description 1
- MKRZFOIRSLOYCE-UHFFFAOYSA-L zinc;methanesulfonate Chemical compound [Zn+2].CS([O-])(=O)=O.CS([O-])(=O)=O MKRZFOIRSLOYCE-UHFFFAOYSA-L 0.000 description 1
Images
Landscapes
- Electroplating Methods And Accessories (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
Abstract
Description
本発明はメッキ表面の後処理液、並びに当該後処理液を用いたメッキ表面の後処理方法に関して、経時劣化を起こさずにメッキ表面のハンダ濡れ性を良好に確保するとともに、後処理を迅速・簡便化できるものを提供する。 The present invention relates to a post-treatment liquid for the plating surface and a post-treatment method for the plating surface using the post-treatment liquid, while ensuring good solder wettability of the plating surface without causing deterioration over time, and rapid post-treatment. Provide what can be simplified.
金属の表面は酸化により経時劣化し易く、多湿、高温の状態では特に酸化が促進される。
そこで、従来では、金属表面に有機皮膜を施して、表面を防錆することが行われて来た。
例えば、特許文献1には、スズメッキ鋼板、クロメート皮膜を有する鋼板などのメッキ皮膜を形成した金属素地に、クロム水和酸化物を主体とする皮膜を形成した後、(a)脱水ヒマシ油、アマニ油、大豆油などの油脂に、アルキルフェノール樹脂、エポキシ樹脂などを配合してマレイン化した樹脂、或は、(b)グリセリン、トリメチロールプロパンなどの多価アルコール類と、フタル酸、マレイン酸、コハク酸などの二塩基酸とを反応させたアルキド樹脂、(c)アクリル酸、メタクリル酸と、アクリル酸メチルなどとの共重合体や、アクリル酸、メタクリル酸のアルキルエステルとビニルトルエンの共重合体などのアクリル樹脂などからなる水溶性樹脂の薄膜層を形成することが開示されている(特許請求の範囲参照)が、これは鋼板に塗料を塗布したり、ラミネートフィルムを被覆する際に塗膜密着性等を高めるためのものである。
The surface of the metal easily deteriorates with time due to oxidation, and oxidation is particularly promoted in a humid and high temperature state.
Therefore, conventionally, an organic film is applied to the metal surface to prevent the surface from being rusted.
For example,
一方、金属材料にハンダ付けをする場合、ハンダ濡れ性を確保するため、一般に、予め金属材料にスズ又はスズ合金などのメッキ皮膜を形成するが、上述の金属表面と同様に、このメッキ面も酸化により経時劣化し易く、変色等とともに表面特性が損なわれる。
そこで、この表面特性を改善する目的でメッキ表面を後処理する技術が知られているが、その従来技術を挙げると次のものがある。
先ず、特許文献2には、ハンダ性、ハンダ経時性、耐食性などの向上を目的として、アクリル樹脂、アルキド樹脂、マレイン酸樹脂、不飽和ポリエステル樹脂又はウレタン樹脂からなる水分散性或は水溶性有機樹脂と、6価クロムイオンと、ロジンアミン塩を含有する水溶液により、亜鉛又は亜鉛合金メッキなどを施したメッキ鋼板を後処理する方法が開示されている(特許請求の範囲、段落1と3参照)。
On the other hand, when soldering a metal material, in order to ensure solder wettability, a plating film such as tin or a tin alloy is generally formed in advance on the metal material. Oxidation is likely to cause deterioration over time, and surface properties are impaired along with discoloration and the like.
Therefore, techniques for post-processing the plating surface for the purpose of improving the surface characteristics are known, and the conventional techniques are as follows.
First,
特許文献1〜2に記載されているアクリル樹脂、マレイン酸樹脂、アルキド樹脂などの水溶性又は水分散性樹脂を含有する液でメッキ面を後処理しても、メッキ面のハンダ濡れ性は充分には向上しないうえ、処理した油膜によって塵埃が吸着されたり、他の製品を油膜の油で汚染したりする恐れがある。
本発明は、メッキ表面の後処理において、ハンダ濡れ性の良好な確保と、後処理の迅速・簡便化を技術的課題とする。
Even if the plating surface is post-treated with a solution containing a water-soluble or water-dispersible resin such as acrylic resin, maleic acid resin, alkyd resin, etc. described in
In the post-treatment of the plating surface, the present invention has a technical problem of ensuring good solder wettability and quick and simple post-treatment.
本発明者らは、上記特許文献1〜2にも記載されているアクリル樹脂、アルキド樹脂などを中心に、これらの樹脂をスズ又はスズ合金メッキ面の後処理に適用した場合、ハンダ濡れ性の付与への有効性を鋭意研究した結果、これらの樹脂の平均分子量がメッキ面のハンダ濡れ性を確保するうえで大きく影響すること、次いで、樹脂の酸価、軟化点、水酸基当量、油長などもハンダ濡れ性の付与に重要であること、また、アンモニア又は低沸点アミンにより上記樹脂を塩形態にすると、水溶性を促進して、火災の危険性などがあるアルコール等を溶解目的で用いる必要性も低減できるうえ、後処理に続く乾燥処理時にアンモニア又はアミンが簡単に蒸発して、ハンダ付け作業を良好に担保できることを見出し、本発明を完成した。
When the present inventors apply these resins to the post-treatment of the tin or tin alloy plating surface, mainly the acrylic resin, alkyd resin, etc. described in the
即ち、本発明1は、被メッキ物にスズ又はスズ合金メッキ皮膜を形成した後に、そのメッキ表面を後処理する液であって、
次の(A)〜(C)から選ばれた後処理用樹脂の少なくとも一種を含有し、
(A)各平均分子量が2000〜50000であるアクリル樹脂又はマレイン酸樹脂
(B)平均分子量が500〜5000であるアルキド樹脂
(C)平均分子量が300〜2000であるフェノール樹脂
且つ、塩素及びクロムを含有しないことを特徴とするスズ又はスズ合金メッキ表面の後処理液である。
That is, the
Containing at least one kind of post-treatment resin selected from the following (A) to (C):
(A) Acrylic resin or maleic resin having an average molecular weight of 2000 to 50000
(B) Alkyd resin having an average molecular weight of 500 to 5,000
(C) A phenol resin having an average molecular weight of 300 to 2,000, and a post-treatment liquid for tin or tin alloy plating surface characterized by not containing chlorine and chromium.
本発明2は、上記本発明1において、アクリル樹脂の酸価が100〜500、軟化点が80〜200℃であり、マレイン酸樹脂の酸価が100〜300、軟化点が80〜200℃であり、アルキド樹脂の油長が35〜55%、フェノール樹脂の水酸基当量が130〜1000、軟化点が90〜200℃であることを特徴とするスズ又はスズ合金メッキ表面の後処理液である。
本発明3は、上記本発明1又は2において、後処理用樹脂をアンモニア又は低沸点アミンと反応させてアンモニウム塩又はアミン塩にすることを特徴とするスズ又はスズ合金メッキ表面の後処理液。
本発明4は、上記本発明1〜3のいずれかにおいて、スズ合金が、スズと、ビスマス、銅、亜鉛、ニッケル、銀、金、インジウム、アンチモン、鉛、コバルト、タリウム、ガリウムよりなる群から選ばれた金属の少なくとも一種との合金であることを特徴とするスズ又はスズ合金メッキ表面の後処理液である。
本発明5は、被メッキ物にスズ又はスズ合金メッキ皮膜を形成した後、当該メッキ表面を上記本発明1〜4のいずれかの後処理液に接触させることを特徴とするスズ又はスズ合金メッキ表面の後処理方法である。
The
本発明6は、上記本発明5の後処理方法を施した半導体デバイス、プリント基板、フレキシブルプリント基板、フィルムキャリア、コネクタ、スイッチ、抵抗、可変抵抗、コンデンサ、フィルタ、インダクタ、サーミスタ、水晶振動子、リード線などの電子部品である。
The
冒述したように、電子部品などの金属材料にハンダ付けをする場合、ハンダ濡れ性を確保するために、予めスズ又はスズ合金などのメッキ皮膜を形成しているが、このメッキ面は酸化により経時劣化し易い。
本発明では、特定範囲の平均分子量を有するアクリル樹脂、アルキド樹脂などの特定の後処理用樹脂を含有する液で、スズ又はスズ合金メッキ面を接触処理するため、上記経時劣化を起こすことなく、メッキ面のハンダ濡れ性を良好に維持できる。
その詳細なメカニズムは未だ不明であるが、アクリル樹脂、マレイン酸樹脂又はアルキド樹脂のカルボキシル基、或は、フェノール樹脂の水酸基が、メッキ皮膜に対して何らかの化学的な結合作用を奏するため、樹脂のうちのバルキーな親油部分がメッキ皮膜に強固に固着して、外気や水によってメッキ面が酸化されるのを有効に阻止するため、後処理したメッキ面のハンダ濡れ性が経時劣化しないものと推定される。
As described above, when soldering a metal material such as an electronic component, a plating film such as tin or a tin alloy is formed in advance in order to ensure solder wettability. It tends to deteriorate over time.
In the present invention, a liquid containing a specific post-treatment resin such as an acrylic resin having an average molecular weight in a specific range, an alkyd resin, or the like, so that the tin or tin alloy plating surface is contact-treated, without causing the above-mentioned deterioration over time, Solder wettability of the plated surface can be maintained well.
Although the detailed mechanism is still unclear, the carboxyl group of the acrylic resin, maleic resin or alkyd resin, or the hydroxyl group of the phenol resin exerts some chemical bonding action on the plating film. The solder wettability of the post-processed plated surface does not deteriorate over time in order to effectively prevent the bulky lipophilic part from firmly adhering to the plating film and effectively oxidizing the plated surface with outside air or water. Presumed.
本発明の後処理液は上記有効成分を芳香族炭化水素やアルコールなどの各種溶媒或は水に溶解することにより、有機溶剤液、アルコール溶液、含水アルコール溶液又は水溶液の形態にできる。従って、メッキ面に有効成分を均一に吸着でき、ハンダ濡れ性を良好に維持することができる。
この場合、上記後処理用樹脂をアンモニア又はアミンなどの塩基で塩にすると、後処理液がアルコール又は含水アルコール溶液の形態であっても、水溶性の増大によりアルコールの使用量を低減できるので、引火の危険をなくし、環境保全や労働衛生にも資する。特に、アンモニア又は低沸点アミンを使用すると、後処理してからの加熱乾燥で容易に揮発するので好都合である。
一方、上記後処理用樹脂の軟化点、酸価、油長、或は水酸基当量を特定化すると、ハンダ濡れ性のさらなる経時劣化防止に寄与するうえ、殊に、軟化点を特定範囲内に限定することで、後処理した場合にメッキ面のベタ付きがなく、ハンダ付け時に迅速に揮発するため、ハンダ付け性に優れる。また、温度上昇に伴って起こる流動性の増大により樹脂が保護表面から離脱することもない。
The post-treatment liquid of the present invention can be made into an organic solvent liquid, an alcohol solution, a hydrous alcohol solution, or an aqueous solution by dissolving the above active ingredients in various solvents such as aromatic hydrocarbons and alcohols or water. Therefore, the active ingredient can be uniformly adsorbed on the plated surface, and the solder wettability can be maintained well.
In this case, if the post-treatment resin is made into a salt with a base such as ammonia or amine, the amount of alcohol used can be reduced due to increased water solubility even if the post-treatment liquid is in the form of an alcohol or a hydrous alcohol solution. Eliminates the danger of ignition and contributes to environmental conservation and occupational health. In particular, use of ammonia or a low boiling point amine is advantageous because it is easily volatilized by heat drying after the post-treatment.
On the other hand, specifying the softening point, acid value, oil length, or hydroxyl equivalent of the above-mentioned post-treatment resin contributes to the prevention of further deterioration of solder wettability over time, and in particular, the softening point is limited to a specific range. By doing so, there is no stickiness of the plated surface when post-processing, and since it volatilizes quickly at the time of soldering, it is excellent in solderability. In addition, the resin does not separate from the protective surface due to the increase in fluidity that occurs as the temperature rises.
本発明は、第一に、特定範囲の平均分子量を有するアクリル樹脂、マレイン酸樹脂、アルキド樹脂、フェノール樹脂よりなる群から選ばれた後処理用樹脂を有効成分とするスズ又はスズ合金メッキ表面の後処理液であり、第二に、この後処理液で被メッキ物のメッキ面を後処理する方法であり、第三に、この後処理方法を適用したプリント基板、半導体集積回路などの電子部品である。 In the present invention, first, a tin or tin alloy plating surface containing, as an active ingredient, a post-treatment resin selected from the group consisting of an acrylic resin, a maleic acid resin, an alkyd resin, and a phenol resin having an average molecular weight in a specific range. A post-treatment liquid; second, a method of post-treating the plated surface of the object to be plated with the post-treatment liquid; and third, an electronic component such as a printed circuit board or a semiconductor integrated circuit to which the post-treatment method is applied. It is.
本発明のアクリル樹脂の平均分子量は2000〜50000、好ましくは5000〜30000であり、アクリル樹脂の具体例は次の(1)〜(3)の通りである。
(1)アクリル酸、メタクリル酸、クロトン酸、アクリル酸エステル、メタクリル酸エステル、クロトン酸エステル、アクリルアミド、メタクリルアミド、アクリロニトリルなどを重合又は共重合させて得られるポリマー又はコポリマー
但し、上記アクリル酸エステルなどのエステルは、メチル、エチル、プロピル、イソプロピル、ブチル、sec-ブチル、iso-ブチル、t-ブチル、アミル、エチルヘキシル、オクチルなどのエステル化物をいう(下記の(2)のエステルも、同様)。
(2)アクリル酸、メタクリル酸、クロトン酸、アクリル酸エステル、メタクリル酸エステル、クロトン酸エステル、アクリルアミド、メタクリルアミド、アクリロニトリルなどをウレタンやスチレン、塩化ビニリデンなどと共重合させて得られるコポリマー
(3)上記(1)〜(2)の樹脂をアルキド樹脂、エポキシ樹脂やフェノール樹脂などで変性したアクリル樹脂
上記アクリル樹脂はアクリル酸などの不飽和化合物を、例えば、反応温度70〜150℃、反応時間2〜10時間の条件を初め、公知の方法で反応される。
アクリル樹脂の平均分子量が2000より小さいと充分なハンダ濡れ性が得られず、50000を越えるとハンダ付けの際に皮膜が完全に気化せずに残留し、ハンダ濡れ性に悪影響を及ぼす恐れがある。
本発明2に示すように、ハンダ濡れ性の経時劣化を防止する見地から、アクリル樹脂の酸価は100〜500、好ましくは150〜500、軟化点は80〜200℃、好ましくは110〜200℃である。
後処理用樹脂の酸価はメッキ面におけるハンダ濡れ性の経時劣化防止のメカニズムにも関係するとともに、製造上の理由から上記適正範囲が求められる。また、軟化点が80℃より低いと、表面がべた付いて、後処理に続く加熱乾燥工程で有機物や塵埃などが付着し易く、ハンダ付け性に悪影響を及ぼす恐れがあるうえ、温度上昇に伴う流動性の増大で保護表面から離脱する恐れもある。また、200℃より高いと、ハンダ付け時に溶融し難いうえ、揮発せずに残留してハンダ付けに悪影響を及ぼす恐れがある。
The average molecular weight of the acrylic resin of the present invention is 2000 to 50000, preferably 5000 to 30000. Specific examples of the acrylic resin are as follows (1) to (3).
(1) Polymer or copolymer obtained by polymerizing or copolymerizing acrylic acid, methacrylic acid, crotonic acid, acrylic ester, methacrylic ester, crotonic ester, acrylamide, methacrylamide, acrylonitrile, etc. The ester of is an esterified product such as methyl, ethyl, propyl, isopropyl, butyl, sec-butyl, iso-butyl, t-butyl, amyl, ethylhexyl, octyl, etc. (the same applies to the ester of (2) below).
(2) Copolymers obtained by copolymerizing acrylic acid, methacrylic acid, crotonic acid, acrylic acid ester, methacrylic acid ester, crotonic acid ester, acrylamide, methacrylamide, acrylonitrile, etc. with urethane, styrene, vinylidene chloride, etc.
(3) An acrylic resin obtained by modifying the resin of (1) to (2) with an alkyd resin, an epoxy resin, a phenol resin, or the like. The acrylic resin is an unsaturated compound such as acrylic acid, for example, a reaction temperature of 70 to 150 ° C. The reaction is carried out by a known method starting with a reaction time of 2 to 10 hours.
If the average molecular weight of the acrylic resin is less than 2000, sufficient solder wettability cannot be obtained, and if it exceeds 50000, the film remains without being completely vaporized during soldering, which may adversely affect the solder wettability. .
As shown in the
The acid value of the post-treatment resin is related to a mechanism for preventing deterioration of solder wettability over time on the plated surface, and the above appropriate range is required for manufacturing reasons. If the softening point is lower than 80 ° C., the surface becomes sticky, and organic matter and dust are likely to adhere in the heating and drying process following the post-treatment, which may adversely affect the solderability and increase in temperature. There is also a risk of separation from the protective surface due to increased fluidity. On the other hand, when the temperature is higher than 200 ° C., it is difficult to melt at the time of soldering, and it may remain without volatilizing and adversely affect soldering.
本発明のマレイン酸樹脂は無水マレイン酸又はマレイン酸エステルと、オレフィン、スチレン、酢酸ビニルなどとを共重合させて得られるコポリマーであって、平均分子量2000〜50000、好ましくは5000〜30000を有するものをいう。
上記マレイン酸樹脂は無水マレイン酸などの不飽和化合物を、例えば、反応温度70〜150℃、反応時間2〜10時間の条件を初め、公知の方法で反応させて製造される。
マレイン酸樹脂の平均分子量が小さ過ぎると充分なハンダ濡れ性の経時劣化防止効果が得られず、大き過ぎるとハンダ付けの際に皮膜が完全に気化せずに残留し、ハンダ濡れ性に悪影響を及ぼす恐れがある。
本発明2に示すように、ハンダ濡れ性の経時劣化を防止する見地から、マレイン酸樹脂の酸価は100〜300、好ましくは150〜300、軟化点は80〜200℃、好ましくは110〜200℃である。
The maleic acid resin of the present invention is a copolymer obtained by copolymerizing maleic anhydride or maleic ester with olefin, styrene, vinyl acetate or the like, and has an average molecular weight of 2000 to 50000, preferably 5000 to 30000 Say.
The maleic resin is produced by reacting an unsaturated compound such as maleic anhydride with a known method such as a reaction temperature of 70 to 150 ° C. and a reaction time of 2 to 10 hours.
If the average molecular weight of the maleic resin is too small, sufficient solder wettability cannot be prevented over time, and if it is too large, the film will remain completely vaporized during soldering, which will adversely affect solder wettability. There is a risk.
As shown in the
本発明のアルキド樹脂は多塩基酸と多価アルコールの縮合物、或は、さらに変性剤と反応させた変性物であって、平均分子量500〜5000、好ましくは1000〜3000を有するものをいう。
上記多塩基酸としては、(無水)フタル酸、テレフタル酸、イソフタル酸、(無水)トリメリット酸、アジピン酸、コハク酸、(無水)マレイン酸、フマル酸、イタコン酸、シトラコン酸などが挙げられる。
上記多価アルコールとしては、エチレングリコール、ジエチレングリコール、ネオペンチルグリコール、グリセリン、ジグリセリン、トリメチロールプロパン、ビスフェノールAなどが挙げられる。
上記変性剤としては、大豆油、アマニ油、桐油、ロジン、エステルガム、ステアリン酸、フェノール、スチレン、イソシアネートなどが挙げられる。
上記アルキド樹脂は上記多塩基酸と多価アルコールを用いて脂肪酸法、エステル交換法などの公知の方法で製造される。一般的な反応温度は150〜230℃であり、反応時間は2〜10時間であるが、これに特段限定されるものではない。さらに、この生成物を上記の変性剤と反応させて変性物にできることは上述の通りである。
アルキド樹脂の平均分子量が小さ過ぎると充分なハンダ濡れ性の経時劣化防止効果が得られず、大き過ぎるとハンダ付けの際に皮膜が完全に気化せずに残留し、ハンダ濡れ性に悪影響を及ぼす恐れがある。
本発明2に示すように、ハンダ濡れ性の経時劣化を防止する見地から、アルキド樹脂の油長は35〜55%、好ましくは38〜50%である。
The alkyd resin of the present invention is a polybasic acid-polyhydric alcohol condensate or a modified product further reacted with a modifying agent and has an average molecular weight of 500 to 5,000, preferably 1,000 to 3,000.
Examples of the polybasic acid include (anhydrous) phthalic acid, terephthalic acid, isophthalic acid, (anhydrous) trimellitic acid, adipic acid, succinic acid, (anhydrous) maleic acid, fumaric acid, itaconic acid, citraconic acid and the like. .
Examples of the polyhydric alcohol include ethylene glycol, diethylene glycol, neopentyl glycol, glycerin, diglycerin, trimethylolpropane, and bisphenol A.
Examples of the modifier include soybean oil, linseed oil, tung oil, rosin, ester gum, stearic acid, phenol, styrene, and isocyanate.
The alkyd resin is produced by a known method such as a fatty acid method or a transesterification method using the polybasic acid and a polyhydric alcohol. The general reaction temperature is 150 to 230 ° C., and the reaction time is 2 to 10 hours, but is not particularly limited thereto. Furthermore, as described above, this product can be made into a modified product by reacting with the above-mentioned modifying agent.
If the average molecular weight of the alkyd resin is too small, the effect of preventing sufficient solder wettability over time cannot be obtained, and if it is too large, the film remains without being completely vaporized during soldering, adversely affecting the solder wettability. There is a fear.
As shown in the
本発明のフェノール樹脂はフェノール、クレゾールやキシレノール等のC1〜C12アルキル基が置換したフェノール、レゾルシン、ビスフェノールA、F、B等と、ホルマリン等との付加縮合物(レゾール型、ノボラック型のいずれでも可)、或は、さらに当該縮合物をロジン、エステルガム、乾性油等で変性した変性フェノール樹脂であって、平均分子量300〜2000、好ましくは400〜1200を有するものをいう。
上記フェノール樹脂は、例えば、レゾール型であれば、上記フェノール類とホルマリン等をアルカリ触媒の存在下、反応温度40〜100℃、反応時間1〜10時間の条件で反応させ、その他、公知の方法で製造される。
フェノール樹脂の平均分子量が小さ過ぎると充分なハンダ濡れ性が得られず、大き過ぎるとハンダ付けの際に皮膜が完全に気化せずに残留し、ハンダ濡れ性に悪影響を及ぼす恐れがある。
本発明2に示すように、ハンダ濡れ性の経時劣化を防止する見地から、フェノール樹脂の水酸基当量は130〜1000、好ましくは200〜500、軟化点は90〜200℃、好ましくは110〜200℃である。
Phenolic resins of the present invention is phenol, phenol C 1 -C 12 alkyl groups such as cresol and xylenol were replaced, resorcinol, bisphenol A, F, B, etc. and, addition condensate (resol type with formalin, novolac type Any), or a modified phenolic resin obtained by further modifying the condensate with rosin, ester gum, drying oil or the like and having an average molecular weight of 300 to 2000, preferably 400 to 1200.
For example, if the phenol resin is a resol type, the phenols and formalin are reacted in the presence of an alkali catalyst under the conditions of a reaction temperature of 40 to 100 ° C. and a reaction time of 1 to 10 hours. Manufactured by.
If the average molecular weight of the phenol resin is too small, sufficient solder wettability cannot be obtained, and if it is too large, the film remains without being completely vaporized during soldering, which may adversely affect the solder wettability.
As shown in the
本発明の後処理用樹脂は有機溶剤、水に添加して後処理液として調製される。 上記後処理用樹脂はそのまま、メタノール、エタノール、イソプロピルアルコール、アセトン、メチルエチルケトン、メチルイソブチルケトン、トルエン、キシレン、酢酸エチル、酢酸n−ブチル、クロロホルムなどの有機溶剤に溶解させても良いし、後処理用樹脂のカルボキシル基を部分エステル化して、アルコール、又はアルコールと水の混合物などに溶解させても良い。
この場合、アルコールなどの有機溶剤を使用すると、引火の危険があり、環境保全、労働衛生の面でも問題がある(部分エステルにすると、溶解用のアルコールを減量でき、含水アルコールにも可溶になって、当該弊害をある程度軽減できる)が、上記後処理用樹脂にアンモニア又はアミンを作用させて塩の形態にし、水溶性を増すと、後処理液のハンドリング性が向上する。上記アミンとしては、メチルアミン、ジメチルアミン、トリメチルアミン、エチルアミン、ジエチルアミン、トリエチルアミン、プロピルアミン、ジプロピルアミン、トリプロピルアミン、イソプロピルアミン、ジイソプロピルアミン、トリイソプロピルアミン、ブチルアミン、ピペリジン、エチレンジアミン、1,2−プロパンジアミン、モルホリン、1,3−プロパンジアミン、シクロヘキシルアミン、ピペラジン、テトラメチル−1,3−プロパンジアミン、テトラメチルエチレンジアミン、ジメチルエタノールアミン、エタノールアミン、テトラメチレンジアミンなどが挙げられる。
ちなみに、アルカリ金属塩で塩形態にすることも考えられるが、アルカリ金属塩はアルカリ性であり、メッキ面を腐食させる恐れがあるため、アンモニア又はアミン塩が好ましい。
本発明の後処理を施したメッキ面には、加熱乾燥してからハンダ付けが行われるが、本発明3に示すように、後処理用樹脂にアンモニア又は低沸点アミンを作用させて、アンモニウム塩又は低沸点のアミン塩の形態にすると、この乾燥工程でこれらの塩の部分が円滑に蒸発し、ハンダ濡れ性に悪影響を及ぼす不純成分を排除できる。
さらに、後処理液の形態としては、アルコールなどの有機溶媒や水溶液への溶解液の外に、後処理用樹脂のまま、又は部分エステル化した後に水中に分散させて、後処理液を水性エマルジョンにすることもできる。この際、界面活性剤を添加すると、加熱乾燥時に不純物として残留して、ハンダ濡れ性に悪影響を及ぼす懸念がある反面、液の均一分散性が向上する利点がある。
The post-treatment resin of the present invention is prepared as a post-treatment liquid by adding it to an organic solvent and water. The above post-treatment resin may be dissolved as it is in an organic solvent such as methanol, ethanol, isopropyl alcohol, acetone, methyl ethyl ketone, methyl isobutyl ketone, toluene, xylene, ethyl acetate, n-butyl acetate, chloroform, or post-treatment. The carboxyl group of the resin may be partially esterified and dissolved in alcohol or a mixture of alcohol and water.
In this case, the use of organic solvents such as alcohol presents a risk of ignition, and there are also problems in terms of environmental protection and occupational health (partial esters can reduce the amount of alcohol used for dissolution and are soluble in hydrous alcohols. The adverse effect can be alleviated to some extent). However, when ammonia or amine is allowed to act on the post-treatment resin to form a salt to increase the water solubility, the handling property of the post-treatment liquid is improved. Examples of the amine include methylamine, dimethylamine, trimethylamine, ethylamine, diethylamine, triethylamine, propylamine, dipropylamine, tripropylamine, isopropylamine, diisopropylamine, triisopropylamine, butylamine, piperidine, ethylenediamine, 1,2- Examples include propanediamine, morpholine, 1,3-propanediamine, cyclohexylamine, piperazine, tetramethyl-1,3-propanediamine, tetramethylethylenediamine, dimethylethanolamine, ethanolamine, and tetramethylenediamine.
Incidentally, although it is conceivable to form a salt form with an alkali metal salt, ammonia or an amine salt is preferable because the alkali metal salt is alkaline and may corrode the plated surface.
The plated surface subjected to the post-treatment of the present invention is heat-dried and then soldered. As shown in the
Further, as the form of the post-treatment liquid, in addition to the solution in an organic solvent such as alcohol or an aqueous solution, the post-treatment liquid remains as the post-treatment resin or is partially esterified and dispersed in water. It can also be. At this time, if a surfactant is added, it remains as an impurity during heating and drying, and there is a concern that it may adversely affect the solder wettability, but there is an advantage that the uniform dispersibility of the liquid is improved.
本発明の後処理用樹脂はアクリル樹脂、マレイン酸樹脂、アルキド樹脂、フェノール樹脂であるが、これらの樹脂は夫々単用又は併用しても良いし、アクリル樹脂とアルキド樹脂のように、複数種の樹脂を組み合わせて複用しても良いことはいうまでもない。
本発明の後処理液において、上記後処理用樹脂の含有量は0.001〜10重量%が適量であり、好ましくは0.01〜3重量%である。後処理液としては、0.1〜1重量%前後の濃度がより実用的であり、3重量%以上はかなり濃いレベルとなる。
また、本発明の後処理液には、上記界面活性剤の外に、防錆剤、酸化防止剤、pH調整剤などの各種添加剤を含有することができる。
上記界面活性剤としては、モノアルキルリン酸エステル、ジアルキルリン酸エステルを初め、通常のノニオン系、アニオン系、両性、或はカチオン系などの各種界面活性剤を使用できる。
上記アニオン系界面活性剤としては、アルキル硫酸塩、ポリオキシエチレンアルキルエーテル硫酸塩、ポリオキシエチレンアルキルフェニルエーテル硫酸塩、アルキルベンゼンスルホン酸塩、アルキルナフタレンスルホン酸塩などが挙げられる。カチオン系界面活性剤としては、モノ〜トリアルキルアミン塩、ジメチルジアルキルアンモニウム塩、トリメチルアルキルアンモニウム塩などが挙げられる。ノニオン系界面活性剤としては、C1〜C20アルカノール、フェノール、ナフトール、ビスフェノール類、C1〜C25アルキルフェノール、アリールアルキルフェノール、C1〜C25アルキルナフトール、C1〜C25アルコキシルリン酸(塩)、ソルビタンエステル、ポリアルキレングリコール、C1〜C22脂肪族アミドなどにエチレンオキシド(EO)及び/又はプロピレンオキシド(PO)を2〜300モル付加縮合させたものなどが挙げられる。両性界面活性剤としては、カルボキシベタイン、イミダゾリンベタイン、スルホベタイン、アミノカルボン酸などが挙げられる。
上記界面活性剤には、モノアルキルリン酸エステル、ジアルキルリン酸エステルなどが好ましい。但し、界面活性剤には前記弊害が考えられる。
尚、本発明の後処理液は特定の後処理用樹脂を有効成分とするため、腐食作用をする塩素や、周知の金属表面処理法であるクロム酸処理(クロメート処理)の主剤であるクロムは、当該後処理液には含まれず、当然ながらこの両者は排除されている。
The post-treatment resin of the present invention is an acrylic resin, a maleic acid resin, an alkyd resin, or a phenol resin, but these resins may be used singly or in combination, and a plurality of types such as an acrylic resin and an alkyd resin may be used. Needless to say, these resins may be used in combination.
In the post-treatment liquid of the present invention, the content of the post-treatment resin is appropriately 0.001 to 10% by weight, preferably 0.001 to 3% by weight. As the post-treatment liquid, a concentration of about 0.1 to 1% by weight is more practical, and 3% by weight or more is a considerably high level.
The post-treatment liquid of the present invention may contain various additives such as a rust inhibitor, an antioxidant, and a pH adjuster in addition to the surfactant.
Examples of the surfactant include monoalkyl phosphate esters and dialkyl phosphate esters, as well as various nonionic, anionic, amphoteric, and cationic surfactants.
Examples of the anionic surfactant include alkyl sulfates, polyoxyethylene alkyl ether sulfates, polyoxyethylene alkyl phenyl ether sulfates, alkyl benzene sulfonates, and alkyl naphthalene sulfonates. Examples of the cationic surfactant include mono-trialkylamine salts, dimethyldialkylammonium salts, and trimethylalkylammonium salts. Examples of the nonionic surfactant, C 1 -C 20 alkanols, phenol, naphthol, bisphenol, C 1 -C 25 alkyl phenols, aryl phenols, C 1 -C 25 alkyl naphthol, C 1 -C 25 alkoxyl phosphoric acid (salt ), Sorbitan esters, polyalkylene glycols, C 1 -C 22 aliphatic amides and the like, and 2-300 mol addition-condensation of ethylene oxide (EO) and / or propylene oxide (PO). Examples of amphoteric surfactants include carboxybetaine, imidazoline betaine, sulfobetaine, and aminocarboxylic acid.
As the surfactant, monoalkyl phosphate ester, dialkyl phosphate ester and the like are preferable. However, the above-mentioned adverse effects are considered for the surfactant.
In addition, since the post-treatment liquid of the present invention contains a specific post-treatment resin as an active ingredient, corrosive chlorine and chromium which is a main component of chromic acid treatment (chromate treatment) which is a well-known metal surface treatment method are These are not included in the post-treatment liquid, and naturally both of them are excluded.
本発明5は、上記後処理液を用いたスズ又はスズ合金メッキ表面の後処理方法であり、銅或は銅合金製などの被メッキ物にメッキ皮膜を形成した後、後処理液をこのメッキ面に接触させることにより実施される。尚、本発明の後処理の対象となるメッキ面は、従来用いられているリン酸処理などの後処理を施したメッキ面をも包含するため、リン酸処理などの公知の後処理を施した後に、本発明の後処理を施すことができる。
上記スズ合金は、本発明4に示すように、スズと、ビスマス、銅、亜鉛、ニッケル、銀、金、インジウム、アンチモン、鉛、コバルト、タリウム、ガリウムよりなる群から選ばれた金属の少なくとも一種との合金であり、例えば、スズ−銅合金、スズ−銅−ビスマス合金、スズ−銀合金、スズ−ビスマス合金、スズ−ビスマス−銀合金、スズ−亜鉛合金、スズ−鉛合金、スズ−コバルト合金、スズ−タリウム合金、スズ−ガリウム合金などである。
上記被メッキ物は特に制限されないが、本発明6に示すように、半導体デバイス、プリント基板、フレキシブルプリント基板、フィルムキャリアー、コネクタ、スイッチ、抵抗、可変抵抗、コンデンサ、フィルタ、インダクタ、サーミスタ、水晶振動子、リード線などの電子部品を代表例とする。
The
The tin alloy is at least one metal selected from the group consisting of tin and bismuth, copper, zinc, nickel, silver, gold, indium, antimony, lead, cobalt, thallium, and gallium, as shown in the
The object to be plated is not particularly limited, but as shown in the
上記接触方法は、メッキ材を後処理液に浸漬することを基本とするが、メッキ材に後処理液を塗布しても良いし、噴霧しても良い。
後処理の時間は特に限定しないが、例えば、1秒〜60分であり、液の温度は0℃〜80℃である。好ましい処理時間は1秒〜1分、好ましい温度は室温近辺である。
尚、処理時間は処理温度により適宜増減でき、また、メッキ材の形状や材質に応じて処理時間と温度を適宜選択できる。
The above contact method is based on immersing the plating material in the post-treatment liquid, but the post-treatment liquid may be applied to the plating material or may be sprayed.
Although the time of post-processing is not specifically limited, For example, it is 1 second-60 minutes, and the temperature of a liquid is 0 degreeC-80 degreeC. A preferred treatment time is 1 second to 1 minute, and a preferred temperature is around room temperature.
The processing time can be appropriately increased or decreased depending on the processing temperature, and the processing time and temperature can be appropriately selected according to the shape and material of the plating material.
以下、本発明の後処理液の調製例、当該処理液を用いてスズ又はスズ合金メッキ表面を後処理する実施例、並びに、当該後処理方法を施したメッキ表面のハンダ濡れ性試験例を説明する。
尚、本発明は下記の実施例、試験例に拘束されるものではなく、本発明の技術的思想の範囲内で任意の変形をなし得ることは勿論である。
Hereinafter, preparation examples of the post-treatment liquid of the present invention, examples of post-treatment of the tin or tin alloy plating surface using the treatment liquid, and solder wettability test examples of the plating surface subjected to the post-treatment method will be described. To do.
The present invention is not limited to the following examples and test examples, and it is needless to say that arbitrary modifications can be made within the scope of the technical idea of the present invention.
《後処理液の調製例》
下記の調製例1〜10のうち、調製例1〜3はアクリル樹脂の使用例である。調製例4はマレイン酸樹脂の例である。調製例5〜7はアルキド樹脂を単用した例であり、調製例10はアルキド樹脂の併用例である。調製例8〜9はフェノール樹脂の使用例である。
一方、比較調製例1〜9のうち、比較調製例1は後処理液を調製しないブランク例である。比較調製例2は平均分子量が本発明の特定範囲の上限を越えるアクリル樹脂を使用した例、比較調製例3は平均分子量が同範囲の下限より少ないアクリル樹脂の使用例である。比較調製例4は平均分子量が本発明の特定範囲の上限を越えるマレイン酸樹脂を使用した例、比較調製例5は平均分子量が同範囲の下限より少ないマレイン酸樹脂の使用例である。比較調製例6は平均分子量が本発明の特定範囲の上限を越えるアルキド樹脂を使用した例、比較調製例3は平均分子量が同範囲の下限より少ないアルキド樹脂の使用例である。比較調製例8は平均分子量が本発明の特定範囲の上限を越えるフェノール樹脂を使用した例、比較調製例9は平均分子量が同範囲の下限より少ないフェノール樹脂の使用例である。
<< Preparation example of post-treatment liquid >>
Among the following Preparation Examples 1 to 10, Preparation Examples 1 to 3 are usage examples of acrylic resins. Preparation Example 4 is an example of a maleic acid resin. Preparation Examples 5 to 7 are examples in which an alkyd resin is used alone, and Preparation Example 10 is a combination example of an alkyd resin. Preparation Examples 8 to 9 are examples of using phenol resins.
On the other hand, of Comparative Preparation Examples 1 to 9, Comparative Preparation Example 1 is a blank example in which no post-treatment liquid is prepared. Comparative Preparation Example 2 is an example using an acrylic resin having an average molecular weight exceeding the upper limit of the specific range of the present invention, and Comparative Preparation Example 3 is an example using an acrylic resin having an average molecular weight less than the lower limit of the same range. Comparative Preparation Example 4 is an example using a maleic acid resin whose average molecular weight exceeds the upper limit of the specific range of the present invention, and Comparative Preparation Example 5 is an example of using a maleic resin having an average molecular weight less than the lower limit of the same range. Comparative Preparation Example 6 is an example using an alkyd resin whose average molecular weight exceeds the upper limit of the specific range of the present invention, and Comparative Preparation Example 3 is an example of using an alkyd resin having an average molecular weight less than the lower limit of the same range. Comparative Preparation Example 8 is an example using a phenol resin having an average molecular weight exceeding the upper limit of the specific range of the present invention, and Comparative Preparation Example 9 is an example using a phenol resin having an average molecular weight less than the lower limit of the same range.
(1)調製例1
温度計、滴下漏斗、攪拌機、クーラー及び窒素導入管を取り付けた四つ口フラスコにn-ブタノールを250ml加え、攪拌下105℃に加熱した。次いで、アクリル酸105g、スチレン50g及び過酸化ベンゾイル8gの混合物を滴下漏斗に入れ、4時間で滴下した。同温度にてさらに3時間反応を行って放冷した後、n-ブタノールを400ml加えて、固形分25%、平均分子量7400、酸価350、軟化点150℃のアクリル−スチレン樹脂溶液を得た。
そして、この樹脂溶液をイソプロピルアルコール(IPA)で希釈して、固形分濃度0.1重量%のアクリル−スチレン樹脂のIPA溶液を得た。
(1) Preparation Example 1
250 ml of n-butanol was added to a four-necked flask equipped with a thermometer, a dropping funnel, a stirrer, a cooler, and a nitrogen introduction tube, and heated to 105 ° C. with stirring. Next, a mixture of 105 g of acrylic acid, 50 g of styrene and 8 g of benzoyl peroxide was placed in the dropping funnel and dropped in 4 hours. After further reacting at the same temperature for 3 hours and allowing to cool, 400 ml of n-butanol was added to obtain an acrylic-styrene resin solution having a solid content of 25%, an average molecular weight of 7400, an acid value of 350, and a softening point of 150 ° C. .
This resin solution was diluted with isopropyl alcohol (IPA) to obtain an IPA solution of acrylic-styrene resin having a solid content concentration of 0.1% by weight.
(2)調製例2
上記調製例1に準拠して、モノマー成分としてアクリル酸と塩化ビニリデンを使用し、平均分子量2万、酸価250、軟化点170℃のアクリル−塩化ビニリデン樹脂(塩化ビニリデン40モル%)溶液を得た。
そして、この樹脂溶液をトルエンで希釈して、固形分濃度0.1重量%のアクリル−塩化ビニリデン樹脂のトルエン溶液を得た。
(2) Preparation Example 2
In accordance with Preparation Example 1, acrylic acid and vinylidene chloride are used as monomer components, and an acrylic-vinylidene chloride resin (
This resin solution was diluted with toluene to obtain a toluene solution of acrylic-vinylidene chloride resin having a solid content concentration of 0.1% by weight.
(3)調製例3
上記調製例1に準拠して、モノマー成分としてアクリル酸を使用し、平均分子量3万、酸価500、軟化点200℃のアクリル樹脂溶液を得た。
そして、この樹脂溶液をIPA/水=1/10の含水アルコールで希釈して、固形分濃度0.1重量%のアクリル樹脂のIPA/水混合溶液を得た。
(3) Preparation Example 3
Based on Preparation Example 1, acrylic acid was used as a monomer component, and an acrylic resin solution having an average molecular weight of 30,000, an acid value of 500, and a softening point of 200 ° C. was obtained.
This resin solution was diluted with a hydrous alcohol having IPA / water = 1/10 to obtain an IPA / water mixed solution of acrylic resin having a solid content concentration of 0.1% by weight.
(4)調製例4
マレイン酸モノブチル690g、スチレン340g、ブチルセロソルブ175g,n-ブタノール500g及びアゾビスイソブチロニトリル20gの混合物の1/4を窒素置換したフラスコに仕込み、120〜130℃に加熱し、その温度にて残りの3/4を2時間で滴下した。次いで、アゾビスイソブチロニトリル3g及びブチルセロソルブ50gの混合物を30分間で滴下した。滴下終了後、さらに同温度にて2時間攪拌して、固形分60%、平均分子量8600、酸価215、軟化点130℃のマレイン酸−スチレン樹脂溶液を得た。
そして、この樹脂溶液をIPAで希釈して、固形分濃度0.1重量%のマレイン酸−スチレン樹脂のIPA溶液を得た。
(4) Preparation Example 4
A mixture of 690 g of monobutyl maleate, 340 g of styrene, 175 g of butyl cellosolve, 500 g of n-butanol and 20 g of azobisisobutyronitrile was charged into a nitrogen-substituted flask, heated to 120 to 130 ° C., and left at that temperature. Of 3/4 was added dropwise over 2 hours. Subsequently, a mixture of 3 g of azobisisobutyronitrile and 50 g of butyl cellosolve was added dropwise over 30 minutes. After completion of dropping, the mixture was further stirred at the same temperature for 2 hours to obtain a maleic acid-styrene resin solution having a solid content of 60%, an average molecular weight of 8600, an acid value of 215, and a softening point of 130 ° C.
This resin solution was diluted with IPA to obtain an IPA solution of maleic acid-styrene resin having a solid concentration of 0.1% by weight.
(5)調製例5
後述の調製例7に準拠して、変性油にアマニ油を使用して、平均分子量1000、油長43%のアルキド樹脂を得た。
そして、この樹脂をキシレンで希釈して、固形分濃度0.1重量%のアルキド樹脂のキシレン溶液を得た。
(5) Preparation Example 5
Based on Preparation Example 7 described later, linseed oil was used as the modified oil to obtain an alkyd resin having an average molecular weight of 1000 and an oil length of 43%.
This resin was diluted with xylene to obtain a xylene solution of an alkyd resin having a solid content concentration of 0.1% by weight.
(6)調製例6
後述の調製例7に準拠して、変性剤にフェノールを使用して、平均分子量3000、油長50%のアルキド樹脂溶液を得た。
そして、この樹脂をキシレンで希釈して、固形分濃度0.1重量%のフェノール変性アルキド樹脂のキシレン溶液を得た。
(6) Preparation Example 6
Based on Preparation Example 7 described later, phenol was used as a modifier to obtain an alkyd resin solution having an average molecular weight of 3000 and an oil length of 50%.
Then, this resin was diluted with xylene to obtain a xylene solution of a phenol-modified alkyd resin having a solid content concentration of 0.1% by weight.
(7)調製例7
トール油脂肪酸373g、トリメチロールプロパン197g、ネオペンチルグリコール78g、ビスフェノールA91g、イソフタル酸204g、無水トリメリット酸157g及びキシレン20gを四つ口フラスコに仕込み、攪拌しながら昇温した。次いで、反応温度を180〜210℃に保持し、生成する水を除去しながら5時間反応して、平均分子量2100、油長38%のアルキド樹脂を得た。
そして、この樹脂をキシレンで希釈して、固形分濃度0.1重量%のアルキド樹脂のキシレン溶液を得た。
(7) Preparation Example 7
Tall oil fatty acid 373 g, trimethylolpropane 197 g, neopentyl glycol 78 g, bisphenol A 91 g, isophthalic acid 204 g, trimellitic anhydride 157 g and xylene 20 g were charged into a four-necked flask and heated with stirring. Next, the reaction temperature was maintained at 180 to 210 ° C., and the reaction was performed for 5 hours while removing the generated water to obtain an alkyd resin having an average molecular weight of 2100 and an oil length of 38%.
This resin was diluted with xylene to obtain a xylene solution of an alkyd resin having a solid content concentration of 0.1% by weight.
(8)調製例8
フェノール94g、37%ホルマリン水溶液243g及び25%水酸化ナトリウム水溶液160gを混合し、40℃にて6時間反応させた後、70℃に昇温し、その温度にて1時間反応させた。反応後、塩酸で中和し、酢酸エチル/n-ブタノール=1/1の混合溶媒で抽出して、平均分子量500、水酸基価300、軟化点130℃、固形分80%のレゾール型フェノール樹脂溶液を得た。
そして、この樹脂溶液をトルエンで希釈して、固形分濃度0.1重量%のフェノール樹脂のトルエン溶液を得た。
(8) Preparation Example 8
94 g of phenol, 243 g of 37% aqueous formalin solution and 160 g of 25% aqueous sodium hydroxide solution were mixed and reacted at 40 ° C. for 6 hours, then heated to 70 ° C. and reacted at that temperature for 1 hour. After the reaction, it is neutralized with hydrochloric acid and extracted with a mixed solvent of ethyl acetate / n-butanol = 1/1, and a resol type phenolic resin solution having an average molecular weight of 500, a hydroxyl value of 300, a softening point of 130 ° C., and a solid content of 80%. Got.
And this resin solution was diluted with toluene, and the toluene solution of the phenol resin with a solid content concentration of 0.1 weight% was obtained.
(9)調製例9
上記調製例8に準拠して、変性剤にロジンを使用し、平均分子量1200、水酸基価300、軟化点150℃のロジン変性フェノール樹脂溶液(変性率30%)を得た。
そして、この樹脂溶液をトルエンで希釈して、固形分濃度0.1重量%のロジン変性フェノール樹脂のトルエン溶液を得た。
(9) Preparation Example 9
In accordance with Preparation Example 8 above, rosin was used as a modifying agent to obtain a rosin-modified phenol resin solution (
This resin solution was diluted with toluene to obtain a toluene solution of a rosin-modified phenol resin having a solid concentration of 0.1% by weight.
(10)調製例10
上記調製例7に準拠して、平均分子量2100、油長38%のアルキド樹脂と、平均分子量2500、油長43%のアルキド樹脂を得るとともに、これらのアルキド樹脂の50重量%同士の混合物をキシレンで希釈して、固形分濃度0.1重量%のアルキド樹脂のキシレン溶液を得た。
(10) Preparation Example 10
In accordance with Preparation Example 7, an alkyd resin having an average molecular weight of 2100 and an oil length of 38% and an alkyd resin having an average molecular weight of 2500 and an oil length of 43% were obtained, and a mixture of 50% by weight of these alkyd resins was xylene. To obtain a xylene solution of an alkyd resin having a solid content concentration of 0.1% by weight.
(11)比較調製例1
後処理液を調製しなかった。
(11) Comparative Preparation Example 1
No post-treatment solution was prepared.
(12)比較調製例2
上記調製例1に準拠して、平均分子量6万、酸価80、軟化点140℃のアクリル−スチレン樹脂溶液(スチレン40モル%)を得た。
そして、この樹脂溶液をIPAで希釈して、固形分濃度0.1重量%のアクリル−スチレン樹脂のIPA溶液を得た。
(12) Comparative Preparation Example 2
Based on Preparation Example 1, an acrylic-styrene resin solution (
This resin solution was diluted with IPA to obtain an IPA solution of acrylic-styrene resin having a solid content concentration of 0.1% by weight.
(13)比較調製例3
上記調製例1に準拠して、平均分子量1500、酸価100、軟化点90℃のアクリル−スチレン樹脂溶液(スチレン40モル%)を得た。
そして、この樹脂溶液をIPAで希釈して、固形分濃度0.1重量%のアクリル−スチレン樹脂のIPA溶液を得た。
(13) Comparative Preparation Example 3
Based on Preparation Example 1, an acrylic-styrene resin solution (
This resin solution was diluted with IPA to obtain an IPA solution of acrylic-styrene resin having a solid content concentration of 0.1% by weight.
(14)比較調製例4
上記調製例4に準拠して、平均分子量6万、酸価85、軟化点110℃のマレイン酸−スチレン樹脂溶液(スチレン55モル%)を得た。
そして、この樹脂溶液をIPAで希釈して、固形分濃度0.1重量%のマレイン酸−スチレン樹脂のIPA溶液を得た。
(14) Comparative Preparation Example 4
Based on Preparation Example 4, a maleic acid-styrene resin solution (
This resin solution was diluted with IPA to obtain an IPA solution of maleic acid-styrene resin having a solid concentration of 0.1% by weight.
(15)比較調製例5
上記調製例4に準拠して、平均分子量1350、酸価110、軟化点120℃のマレイン酸−スチレン樹脂溶液(スチレン55モル%)を得た。
そして、この樹脂溶液をIPAで希釈して、固形分濃度0.1重量%のマレイン酸−スチレン樹脂のIPA溶液を得た。
(15) Comparative Preparation Example 5
Based on Preparation Example 4, a maleic acid-styrene resin solution (
This resin solution was diluted with IPA to obtain an IPA solution of maleic acid-styrene resin having a solid concentration of 0.1% by weight.
(16)比較調製例6
上記調製例7に準拠して、平均分子量8000、油長63%のアルキド樹脂溶液を得た。
そして、この樹脂溶液をキシレンで希釈して、固形分濃度0.1重量%のアルキド樹脂のキシレン溶液を得た。
(16) Comparative Preparation Example 6
Based on Preparation Example 7, an alkyd resin solution having an average molecular weight of 8000 and an oil length of 63% was obtained.
This resin solution was diluted with xylene to obtain a xylene solution of an alkyd resin having a solid concentration of 0.1% by weight.
(17)比較調製例7
上記調製例7に準拠して、平均分子量300、油長45%のアルキド樹脂溶液を得た。
そして、この樹脂溶液をキシレンで希釈して、固形分濃度0.1重量%のアルキド樹脂のキシレン溶液を得た。
(17) Comparative Preparation Example 7
Based on Preparation Example 7, an alkyd resin solution having an average molecular weight of 300 and an oil length of 45% was obtained.
This resin solution was diluted with xylene to obtain a xylene solution of an alkyd resin having a solid concentration of 0.1% by weight.
(18)比較調製例8
上記調製例9に準拠して、平均分子量3000、水酸基価100、軟化点165℃のロジン変性フェノール樹脂溶液(変性率30%)を得た。
そして、この樹脂溶液をトルエンで希釈して、固形分濃度0.1重量%のロジン変性フェノール樹脂のトルエン溶液を得た。
(18) Comparative Preparation Example 8
Based on Preparation Example 9, a rosin-modified phenol resin solution (
This resin solution was diluted with toluene to obtain a toluene solution of a rosin-modified phenol resin having a solid concentration of 0.1% by weight.
(19)比較調製例9
上記調製例9に準拠して、平均分子量200、水酸基価120、軟化点80℃のフェノール樹脂溶液を得た。
そして、この樹脂溶液をトルエンで希釈して、固形分濃度0.1重量%のフェノール樹脂のトルエン溶液を得た。
(19) Comparative Preparation Example 9
Based on Preparation Example 9, a phenol resin solution having an average molecular weight of 200, a hydroxyl value of 120, and a softening point of 80 ° C. was obtained.
And this resin solution was diluted with toluene, and the toluene solution of the phenol resin with a solid content concentration of 0.1 weight% was obtained.
そこで、被メッキ物にスズメッキを施した後、上記調製例並びに比較調製例で得られた各後処理液でこのメッキ面を表面処理した。
《スズメッキ表面を後処理する実施例》
(1)実施例1
(a)スズメッキ処理
先ず、下記の組成でスズメッキ浴を建浴した。
メタンスルホン酸第一スズ(Sn2+として) 20g/L
メタンスルホン酸 100g/L
ノニルフェノールポリエトキシレート(EO15モル) 8g/L
ハイドロキノン 1g/L
pH1以下に調整
次いで、25mm角、板厚0.3mmの純銅板を被メッキ物として、上記スズメッキ浴を用いて電気メッキを行い、純銅板上に膜厚5μmでスズメッキ皮膜を形成した。
(b)メッキ表面の後処理
上記(a)のメッキ処理をした純銅板を前記調製例1で得られた後処理液に25℃、10秒の条件で浸漬した後、充分に風燥した。
Then, after tin-plating to the to-be-plated object, this plating surface was surface-treated with each post-processing liquid obtained by the said preparation example and the comparative preparation example.
<< Example of post-processing the tin plating surface >>
(1) Example 1
(a) Tin plating treatment First, a tin plating bath was constructed with the following composition.
Stannous methanesulfonate (as Sn 2+ ) 20g / L
Methanesulfonic acid 100g / L
Nonylphenol polyethoxylate (EO15 mol) 8g / L
Hydroquinone 1g / L
Adjustment to
(b) Post-treatment of the plating surface The pure copper plate subjected to the above-described plating treatment (a) was immersed in the post-treatment liquid obtained in Preparation Example 1 at 25 ° C. for 10 seconds, and then sufficiently dried.
(2)実施例2〜10
上記実施例1を基本として、後処理液を調製例1から別の調製例に変更した以外は、上記実施例1と同様の条件で、メッキ処理と後処理を行った。
実施例2〜10で用いた後処理液の種類は図1に示す通りであり、実施例nでは調製例n(n=2〜10の各整数)の後処理液を用いた(例えば、実施例2では調製例2、実施例3では調製例3を夫々用いた。以下の実施例4〜10も同じ)。尚、図1の実施例欄のカッコ内は調製例の番号を示す(以下のスズ合金の例である図2〜図6も同じ)。
(2) Examples 2 to 10
On the basis of Example 1 described above, plating treatment and post-treatment were performed under the same conditions as in Example 1 except that the post-treatment liquid was changed from Preparation Example 1 to another preparation example.
The types of post-treatment liquids used in Examples 2 to 10 are as shown in FIG. 1. In Example n, the post-treatment liquids of Preparation Example n (n = 2 to 10) are used (for example, implementation). In Example 2, Preparation Example 2 was used, and in Example 3, Preparation Example 3 was used, respectively (the same applies to Examples 4 to 10 below). The numbers in parentheses in the Example column of FIG. 1 indicate the numbers of the preparation examples (the same applies to FIGS. 2 to 6 which are examples of the following tin alloy).
(3)比較例1〜9
上記実施例1を基本として、後処理液を調製例1から比較調製例に変更した以外は、上記実施例1と同様の条件で、メッキ処理と後処理を行った。
比較例1〜9で用いた後処理液の種類は図1に示す通りであり、比較例nでは比較調製例n(n=1〜9の各整数)の後処理液を用いた(例えば、比較例1では比較調製例1、比較例2では比較調製例2を夫々用いた。以下の比較例3〜9も同じ)。尚、図1の比較例欄のカッコ内は比較調製例の番号を示す(以下のスズ合金の例である図2〜図6も同じ)。
尚、比較調製例1は後処理液を調製しないブランク例であるため、比較例1では、純銅板に上記実施例1のスズメッキ処理(a)だけを施し、後処理(b)は行わなかった。
(3) Comparative Examples 1-9
On the basis of Example 1 described above, plating treatment and post-treatment were performed under the same conditions as in Example 1 except that the post-treatment liquid was changed from Preparation Example 1 to Comparative Preparation Example.
The types of post-treatment liquids used in Comparative Examples 1 to 9 are as shown in FIG. 1, and Comparative Example n used post-treatment liquids of Comparative Preparation Example n (n = each integer of 1 to 9) (for example, Comparative Example 1 used Comparative Preparation Example 1 and Comparative Example 2 used Comparative Preparation Example 2. The following Comparative Examples 3 to 9 were also used). The numbers in parentheses in the comparative example column of FIG. 1 indicate the numbers of comparative preparation examples (the same applies to FIGS. 2 to 6 which are examples of the following tin alloy).
Since Comparative Preparation Example 1 is a blank example in which no post-treatment solution is prepared, in Comparative Example 1, only the tin plating process (a) of Example 1 was applied to the pure copper plate, and the post-process (b) was not performed. .
次いで、スズメッキに替えて、被メッキ物にスズ−鉛合金メッキを施した後、上記調製例並びに比較調製例で得られた各後処理液でこのメッキ面を表面処理した。
《スズ−鉛合金メッキ表面を後処理する実施例》
(1)実施例11
(a)スズ−鉛合金メッキ処理
先ず、下記の組成でスズ−鉛合金メッキ浴を建浴した。
メタンスルホン酸第一スズ(Sn2+として) 54g/L
メタンスルホン酸鉛(Pb2+として) 6g/L
メタンスルホン酸 120g/L
スチレン化フェノールポリエトキシレート(EO20モル) 10g/L
ハイドロキノン 1g/L
pH1以下に調整
次いで、25mm角、板厚0.3mmの純銅板を被メッキ物として、上記スズ−鉛合金メッキ浴を用いて電気メッキを行い、膜厚5μmでスズ−鉛合金メッキ皮膜を形成した。
(b)メッキ表面の後処理
上記(a)のメッキ処理をした純銅板を前記調製例1で得られた後処理液に25℃、10秒の条件で浸漬した後充分に風燥した。
Subsequently, instead of tin plating, tin-lead alloy plating was applied to the object to be plated, and then the plated surface was surface-treated with each of the post-treatment liquids obtained in the above preparation examples and comparative preparation examples.
<< Example of post-processing the tin-lead alloy plating surface >>
(1) Example 11
(a) Tin-lead alloy plating treatment First, a tin-lead alloy plating bath was constructed with the following composition.
Stannous methanesulfonate (as Sn 2+ ) 54g / L
Lead methanesulfonate (as Pb2 + ) 6g / L
Methanesulfonic acid 120g / L
Styrenated phenol polyethoxylate (EO20 mol) 10g / L
Hydroquinone 1g / L
Adjust to
(b) Post-treatment of plating surface The pure copper plate subjected to the plating treatment of (a) was dipped in the post-treatment liquid obtained in Preparation Example 1 at 25 ° C. for 10 seconds and then sufficiently dried.
(2)実施例12〜20
上記実施例11を基本として、後処理液を調製例1から別の調製例に変更した以外は、上記実施例11と同様の条件で、メッキ処理と後処理を行った。
実施例12〜20で用いた後処理液の種類は図2に示す通りであり、実施例nでは調製例(n−10)(n=12〜20の各整数)の後処理液を用いた(例えば、実施例12(n=12)では調製例2、実施例13(n=13)では調製例3を夫々用いた。以下の実施例14〜20も同じ)。
(2) Examples 12 to 20
On the basis of Example 11, the plating treatment and the post-treatment were performed under the same conditions as in Example 11 except that the post-treatment liquid was changed from Preparation Example 1 to another preparation example.
The types of post-treatment liquids used in Examples 12 to 20 are as shown in FIG. 2, and in Example n, the post-treatment liquids of Preparation Example (n-10) (n = each integer of 12 to 20) were used. (For example, Preparation Example 2 was used in Example 12 (n = 12) and Preparation Example 3 was used in Example 13 (n = 13). The following Examples 14 to 20 were also used).
(3)比較例10〜18
上記実施例11を基本として、後処理液を調製例1から比較調製例に変更した以外は、上記実施例11と同様の条件で、メッキ処理と後処理を行った。
比較例10〜18で用いた後処理液の種類は図2に示す通りであり、比較例nでは比較調製例(n−9)(n=10〜18の各整数)の後処理液を用いた(例えば、比較例10(n=10)では比較調製例1、比較例11(n=11)では比較調製例2を夫々用いた。以下の比較例12〜18も同じ)。
尚、比較調製例1は後処理液を調製しないブランク例であるため、比較例10では、純銅板に上記実施例11のスズメッキ処理(a)だけを施し、後処理(b)は行わなかった。
(3) Comparative Examples 10-18
On the basis of Example 11, the plating treatment and the post-treatment were performed under the same conditions as in Example 11 except that the post-treatment liquid was changed from Preparation Example 1 to Comparative Preparation Example.
The types of post-treatment liquids used in Comparative Examples 10 to 18 are as shown in FIG. 2, and Comparative Example n uses the post-treatment liquids of Comparative Preparation Example (n-9) (n = each integer of 10 to 18). (For example, Comparative Example 10 (n = 10) used Comparative Preparation Example 1 and Comparative Example 11 (n = 11) used Comparative Preparation Example 2. The same applies to Comparative Examples 12 to 18 below).
Since Comparative Preparation Example 1 is a blank example in which no post-treatment liquid is prepared, in Comparative Example 10, only the tin plating treatment (a) of Example 11 was applied to a pure copper plate, and the post-treatment (b) was not performed. .
次いで、被メッキ物にスズ−銅合金メッキを施した後、上記調製例並びに比較調製例で得られた各後処理液でこのメッキ面を表面処理した。
《スズ−銅合金メッキ表面を後処理する実施例》
(1)実施例21
(a)スズ−銅合金メッキ処理
先ず、下記の組成でスズ−銅合金メッキ浴を建浴した。
メタンスルホン酸第一スズ(Sn2+として) 50g/L
メタンスルホン酸銅(Cu2+として) 1.5g/L
メタンスルホン酸 140g/L
β−ナフトールポリエトキシレート(EO12モル) 7g/L
ラウリルジメチルアミノ酢酸ベタイン 2g/L
pH1以下に調整
次いで、25mm角、板厚0.3mmの純銅板を被メッキ物として、上記スズ−銅合金メッキ浴を用いて電気メッキを行い、膜厚5μmでスズ−銅合金メッキ皮膜を形成した。
(b)メッキ表面の後処理
上記(a)のメッキ処理をした純銅板を前記調製例1で得られた後処理液に25℃、10秒の条件で浸漬した後充分に風燥した。
Subsequently, after tin-copper alloy plating was performed on the object to be plated, the plated surface was surface-treated with each of the post-treatment liquids obtained in the above preparation examples and comparative preparation examples.
<< Example of post-processing the tin-copper alloy plating surface >>
(1) Example 21
(a) Tin-copper alloy plating treatment First, a tin-copper alloy plating bath was constructed with the following composition.
Stannous methanesulfonate (as Sn 2+ ) 50g / L
Copper methanesulfonate (as Cu 2+ ) 1.5g / L
Methanesulfonic acid 140g / L
β-naphthol polyethoxylate (EO12 mol) 7g / L
Lauryldimethylaminoacetic acid betaine 2g / L
Adjust to
(b) Post-treatment of plating surface The pure copper plate subjected to the plating treatment of (a) was dipped in the post-treatment liquid obtained in Preparation Example 1 at 25 ° C. for 10 seconds and then sufficiently dried.
(2)実施例22〜30
上記実施例21を基本として、後処理液を調製例1から別の調製例に変更した以外は、上記実施例21と同様の条件で、メッキ処理と後処理を行った。
実施例22〜30で用いた後処理液の種類は図3に示す通りであり、実施例nでは調製例(n−20)(n=22〜30の各整数)の後処理液を用いた(例えば、実施例22(n=22)では調製例2、実施例23(n=23)では調製例3を夫々用いた。以下の実施例24〜30も同じ)。
(2) Examples 22-30
Plating and post-treatment were performed under the same conditions as in Example 21 except that the post-treatment liquid was changed from Preparation Example 1 to another preparation example based on Example 21.
The types of post-treatment liquids used in Examples 22 to 30 are as shown in FIG. 3, and in Example n, the post-treatment liquids of Preparation Example (n-20) (each integer of n = 22 to 30) were used. (For example, Preparation Example 2 was used in Example 22 (n = 22) and Preparation Example 3 was used in Example 23 (n = 23). The following Examples 24 to 30 were also used).
(3)比較例19〜27
上記実施例21を基本として、後処理液を調製例1から比較調製例に変更した以外は、上記実施例21と同様の条件で、メッキ処理と後処理を行った。
比較例19〜27で用いた後処理液の種類は図3に示す通りであり、比較例nでは比較調製例(n−18)(n=19〜27の各整数)の後処理液を用いた(例えば、比較例19(n=19)では比較調製例1、比較例20(n=20)では比較調製例2を夫々用いた。以下の比較例21〜27も同じ)。
尚、比較調製例1は後処理液を調製しないブランク例であるため、比較例19では、純銅板に上記実施例21のスズメッキ処理(a)だけを施し、後処理(b)は行わなかった。
(3) Comparative Examples 19 to 27
On the basis of Example 21, the plating treatment and the post-treatment were performed under the same conditions as in Example 21 except that the post-treatment liquid was changed from Preparation Example 1 to Comparative Preparation Example.
The types of post-treatment liquids used in Comparative Examples 19 to 27 are as shown in FIG. 3, and Comparative Example n uses the post-treatment liquid of Comparative Preparation Example (n-18) (n = 19 to 27). (For example, Comparative Example 19 (n = 19) used Comparative Preparation Example 1 and Comparative Example 20 (n = 20) used Comparative Preparation Example 2. The following Comparative Examples 21 to 27 were also used).
Since Comparative Preparation Example 1 is a blank example in which no post-treatment solution is prepared, in Comparative Example 19, only the tin plating treatment (a) of Example 21 was applied to a pure copper plate, and the post-treatment (b) was not performed. .
次いで、被メッキ物にスズ−銀合金メッキを施した後、上記調製例並びに比較調製例で得られた各後処理液でこのメッキ面を表面処理した。
《スズ−銀合金メッキ表面を後処理する実施例》
(1)実施例31
(a)スズ−銀合金メッキ処理
先ず、下記の組成でスズ−銀合金メッキ浴を建浴した。
メタンスルホン酸第一スズ(Sn2+として) 20g/L
メタンスルホン酸銀(Ag+として) 0.5g/L
メタンスルホン酸 110g/L
チオ尿素 5g/L
β−ナフトールポリエトキシレート(EO12モル) 7g/L
pH1以下に調整
次いで、25mm角、板厚0.3mmの純銅板を被メッキ物として、上記スズ−銀合金メッキ浴を用いて電気メッキを行い、膜厚5μmでスズ−銀合金メッキ皮膜を形成した。
(b)メッキ表面の後処理
上記(a)のメッキ処理をした純銅板を前記調製例1で得られた後処理液に25℃、10秒の条件で浸漬した後充分に風燥した。
Subsequently, after tin-silver alloy plating was performed on the object to be plated, the plated surface was surface-treated with each of the post-treatment liquids obtained in the preparation examples and the comparative preparation examples.
<< Example of post-processing the tin-silver alloy plating surface >>
(1) Example 31
(a) Tin-silver alloy plating treatment First, a tin-silver alloy plating bath was constructed with the following composition.
Stannous methanesulfonate (as Sn 2+ ) 20g / L
Silver methanesulfonate (as Ag + ) 0.5g / L
Methanesulfonic acid 110g / L
Thiourea 5g / L
β-naphthol polyethoxylate (EO12 mol) 7g / L
Adjust to
(b) Post-treatment of plating surface The pure copper plate subjected to the plating treatment of (a) was dipped in the post-treatment liquid obtained in Preparation Example 1 at 25 ° C. for 10 seconds and then sufficiently dried.
(2)実施例32〜40
上記実施例31を基本として、後処理液を調製例1から別の調製例に変更した以外は、上記実施例31と同様の条件で、メッキ処理と後処理を行った。
実施例32〜40で用いた後処理液の種類は図4に示す通りであり、実施例nでは調製例(n−30)(n=32〜40の各整数)の後処理液を用いた(例えば、実施例32(n=32)では調製例2、実施例33(n=33)では調製例3を夫々用いた。以下の実施例34〜40も同じ)。
(2) Examples 32 to 40
On the basis of Example 31, the plating treatment and the post-treatment were performed under the same conditions as in Example 31 except that the post-treatment liquid was changed from Preparation Example 1 to another preparation example.
The types of post-treatment liquids used in Examples 32 to 40 are as shown in FIG. 4, and in Example n, the post-treatment liquids of Preparation Example (n-30) (n = 32 to 40 each integer) were used. (For example, Preparation Example 2 was used in Example 32 (n = 32) and Preparation Example 3 was used in Example 33 (n = 33). The following Examples 34 to 40 were also used).
(3)比較例28〜36
上記実施例31を基本として、後処理液を調製例1から比較調製例に変更した以外は、上記実施例31と同様の条件で、メッキ処理と後処理を行った。
比較例28〜36で用いた後処理液の種類は図4に示す通りであり、比較例nでは比較調製例(n−27)(n=28〜36の各整数)の後処理液を用いた(例えば、比較例28(n=28)では比較調製例1、比較例29(n=29)では比較調製例2を夫々用いた。以下の比較例30〜36も同じ)。
尚、比較調製例1は後処理液を調製しないブランク例であるため、比較例28では、純銅板に上記実施例31のスズメッキ処理(a)だけを施し、後処理(b)は行わなかった。
(3) Comparative Examples 28-36
On the basis of Example 31, the plating treatment and the post-treatment were performed under the same conditions as in Example 31 except that the post-treatment liquid was changed from Preparation Example 1 to Comparative Preparation Example.
The types of post-treatment liquids used in Comparative Examples 28 to 36 are as shown in FIG. 4. In Comparative Example n, the post-treatment liquids of Comparative Preparation Example (n-27) (n = 28 to 36) are used. (For example, Comparative Example 28 (n = 28) used Comparative Preparation Example 1 and Comparative Example 29 (n = 29) used Comparative Preparation Example 2. The same applies to Comparative Examples 30 to 36 below).
Since Comparative Preparation Example 1 is a blank example in which no post-treatment solution is prepared, in Comparative Example 28, only the tin plating process (a) of Example 31 was applied to a pure copper plate, and the post-process (b) was not performed. .
次いで、被メッキ物にスズ−ビスマス合金メッキを施した後、上記調製例並びに比較調製例で得られた各後処理液でこのメッキ面を表面処理した。
《スズ−ビスマス合金メッキ表面を後処理する実施例》
(1)実施例41
(a)スズ−ビスマス合金メッキ処理
先ず、下記の組成でスズ−ビスマス合金メッキ浴を建浴した。
メタンスルホン酸第一スズ(Sn2+として) 9.5g/L
メタンスルホン酸ビスマス(Bi3+として) 0.5g/L
メタンスルホン酸 100g/L
ビスフェノールAポリエトキシレート(EO17モル) 5g/L
ラウリルジメチルアミノ酢酸ベタイン 2g/L
ハイドロキノン 1g/L
pH1以下に調整
次いで、25mm角、板厚0.3mmの純銅板を被メッキ物として、上記スズ−ビスマス合金メッキ浴を用いて電気メッキを行い、膜厚5μmでスズ−ビスマス合金メッキ皮膜を形成した。
(b)メッキ表面の後処理
上記(a)のメッキ処理をした純銅板を前記調製例1で得られた後処理液に25℃、10秒の条件で浸漬した後充分に風燥した。
Subsequently, after tin-bismuth alloy plating was performed on the object to be plated, the plated surface was surface-treated with each of the post-treatment liquids obtained in the above preparation examples and comparative preparation examples.
<< Example of post-processing the tin-bismuth alloy plating surface >>
(1) Example 41
(a) Tin-bismuth alloy plating treatment First, a tin-bismuth alloy plating bath was constructed with the following composition.
Stannous methanesulfonate (as Sn2 + ) 9.5g / L
Bismuth methanesulfonate (as Bi 3+ ) 0.5g / L
Methanesulfonic acid 100g / L
Bisphenol A polyethoxylate (EO17 mol) 5g / L
Lauryldimethylaminoacetic acid betaine 2g / L
Hydroquinone 1g / L
Adjust to
(b) Post-treatment of plating surface The pure copper plate subjected to the plating treatment of (a) was dipped in the post-treatment liquid obtained in Preparation Example 1 at 25 ° C. for 10 seconds and then sufficiently dried.
(2)実施例42〜50
上記実施例41を基本として、後処理液を調製例1から別の調製例に変更した以外は、上記実施例41と同様の条件で、メッキ処理と後処理を行った。
実施例42〜50で用いた後処理液の種類は図5に示す通りであり、実施例nでは調製例(n−40)(n=42〜50の各整数)の後処理液を用いた(例えば、実施例42(n=42)では調製例2、実施例43(n=43)では調製例3を夫々用いた。以下の実施例44〜50も同じ)。
(2) Examples 42-50
On the basis of Example 41, plating treatment and post-treatment were performed under the same conditions as in Example 41 except that the post-treatment liquid was changed from Preparation Example 1 to another preparation example.
The types of post-treatment liquids used in Examples 42 to 50 are as shown in FIG. 5, and in Example n, the post-treatment liquids of Preparation Example (n-40) (n = 42 to 50) were used. (For example, Preparation Example 2 was used in Example 42 (n = 42) and Preparation Example 3 was used in Example 43 (n = 43). The following Examples 44 to 50 were also used).
(3)比較例37〜45
上記実施例41を基本として、後処理液を調製例1から比較調製例に変更した以外は、上記実施例41と同様の条件で、メッキ処理と後処理を行った。
比較例37〜45で用いた後処理液の種類は図5に示す通りであり、比較例nでは比較調製例(n−36)(n=37〜45の各整数)の後処理液を用いた(例えば、比較例37(n=37)では比較調製例1、比較例38(n=38)では比較調製例2を夫々用いた。以下の比較例39〜45も同じ)。
尚、比較調製例1は後処理液を調製しないブランク例であるため、比較例37では、純銅板に上記実施例41のスズメッキ処理(a)だけを施し、後処理(b)は行わなかった。
(3) Comparative Examples 37-45
On the basis of Example 41, plating treatment and post-treatment were performed under the same conditions as in Example 41 except that the post-treatment liquid was changed from Preparation Example 1 to Comparative Preparation Example.
The types of post-treatment liquids used in Comparative Examples 37 to 45 are as shown in FIG. 5. In Comparative Example n, the post-treatment liquids of Comparative Preparation Example (n-36) (n = 37 to 45) are used. (For example, Comparative Example 37 (n = 37) used Comparative Preparation Example 1 and Comparative Example 38 (n = 38) used Comparative Preparation Example 2. The same applies to Comparative Examples 39 to 45 below).
Since Comparative Preparation Example 1 is a blank example in which no post-treatment liquid is prepared, in Comparative Example 37, only the tin plating process (a) of Example 41 was applied to a pure copper plate, and the post-process (b) was not performed. .
次いで、被メッキ物にスズ−亜鉛合金メッキを施した後、上記調製例並びに比較調製例で得られた各後処理液でこのメッキ面を表面処理した。
《スズ−亜鉛合金メッキ表面を後処理する実施例》
(1)実施例51
(a)スズ−亜鉛合金メッキ処理
先ず、下記の組成でスズ−亜鉛金メッキ浴を建浴した。
メタンスルホン酸第一スズ(Sn2+として) 30g/L
メタンスルホン酸亜鉛(Zn2+として) 6g/L
スルホコハク酸 1.5モル/L
β−ナフトールポリエトキシレート(EO12モル) 5g/L
セチルジメチルベンジルアンモニウム塩 0.05g/L
pH2.5に調整
次いで、25mm角、板厚0.3mmの純銅板を被メッキ物として、上記スズ−亜鉛合金メッキ浴を用いて電気メッキを行い、膜厚5μmでスズ−亜鉛合金メッキ皮膜を形成した。
(b)メッキ表面の後処理
上記(a)のメッキ処理をした純銅板を前記調製例1で得られた後処理液に25℃、10秒の条件で浸漬した後充分に風燥した。
Subsequently, after tin-zinc alloy plating was performed on the object to be plated, the plated surface was surface-treated with each of the post-treatment liquids obtained in the above preparation examples and comparative preparation examples.
<< Example of post-processing the tin-zinc alloy plating surface >>
(1) Example 51
(a) Tin-zinc alloy plating treatment First, a tin-zinc gold plating bath was constructed with the following composition.
Stannous methanesulfonate (as Sn 2+ ) 30g / L
Zinc methanesulfonate (as Zn 2+ ) 6g / L
Sulfosuccinic acid 1.5 mol / L
β-naphthol polyethoxylate (EO12 mol) 5g / L
Cetyldimethylbenzylammonium salt 0.05 g / L
Adjustment to pH 2.5 Subsequently, electroplating was performed using the above-described tin-zinc alloy plating bath using a 25 mm square and 0.3 mm thick pure copper plate as an object to be plated, and a tin-zinc alloy plating film having a thickness of 5 μm was formed. Formed.
(b) Post-treatment of plating surface The pure copper plate subjected to the plating treatment of (a) was dipped in the post-treatment liquid obtained in Preparation Example 1 at 25 ° C. for 10 seconds and then sufficiently dried.
(2)実施例52〜60
上記実施例51を基本として、後処理液を調製例1から別の調製例に変更した以外は、上記実施例51と同様の条件で、メッキ処理と後処理を行った。
実施例52〜60で用いた後処理液の種類は図6に示す通りであり、実施例nでは調製例(n−50)(n=52〜60の各整数)の後処理液を用いた(例えば、実施例52(n=52)では調製例2、実施例53(n=53)では調製例3を夫々用いた。以下の実施例54〜60も同じ)。
(2) Examples 52-60
Based on Example 51 described above, the plating treatment and the post-treatment were performed under the same conditions as in Example 51 except that the post-treatment liquid was changed from Preparation Example 1 to another preparation example.
The types of post-treatment liquids used in Examples 52 to 60 are as shown in FIG. 6, and in Example n, the post-treatment liquids of Preparation Example (n-50) (each integer of n = 52 to 60) were used. (For example, Preparation Example 2 was used in Example 52 (n = 52) and Preparation Example 3 was used in Example 53 (n = 53). The following Examples 54 to 60 were also used).
(3)比較例46〜54
上記実施例51を基本として、後処理液を調製例1から比較調製例に変更した以外は、上記実施例51と同様の条件で、メッキ処理と後処理を行った。
比較例46〜54で用いた後処理液の種類は図6に示す通りであり、比較例nでは比較調製例(n−45)(n=46〜54の各整数)の後処理液を用いた(例えば、比較例46(n=46)では比較調製例1、比較例47(n=47)では比較調製例2を夫々用いた。以下の比較例48〜54も同じ)。
尚、比較調製例1は後処理液を調製しないブランク例であるため、比較例46では、純銅板に上記実施例51のスズメッキ処理(a)だけを施し、後処理(b)は行わなかった。
(3) Comparative Examples 46-54
Based on Example 51 described above, the plating treatment and the post-treatment were performed under the same conditions as in Example 51 except that the post-treatment liquid was changed from Preparation Example 1 to Comparative Preparation Example.
The types of post-treatment liquids used in Comparative Examples 46 to 54 are as shown in FIG. 6. In Comparative Example n, the post-treatment liquids of Comparative Preparation Example (n-45) (n = 46 to 54) are used. (For example, Comparative Example 46 (n = 46) used Comparative Preparation Example 1 and Comparative Example 47 (n = 47) used Comparative Preparation Example 2. The same applies to Comparative Examples 48 to 54 below).
Since Comparative Preparation Example 1 is a blank example in which no post-treatment solution is prepared, in Comparative Example 46, only the tin plating process (a) of Example 51 was applied to the pure copper plate, and the post-process (b) was not performed. .
そこで、上記実施例1〜60及び比較例1〜54の各後処理方法を施した純銅板のメッキ面のハンダ濡れ性を調べた。
《スズ及びスズ合金メッキ面のハンダ濡れ性試験例》
下記のハンダ濡れ性試験では加速試験を加えて、後処理を行ったメッキ表面を苛酷な雰囲気中に置いて、スズメッキ面及び各種スズ合金メッキ面のハンダ濡れ性を夫々評価した。
即ち、上記実施例1〜60及び比較例1〜54の後処理を施した純銅板のメッキ面を下記の条件でハンダ濡れ性試験に供して、ゼロクロスタイム(秒)を測定した。
(A)加速試験
プレッシャークッカーに基づき、温度105℃、相対湿度100%、4時間とした。
(B)濡れ性試験の条件
ハンダ :スズ/鉛=63/37の共晶ハンダ
バス温度 :230℃
浸漬深度 :10mm
浸漬時間 :10秒
浸漬速度 :25mm/秒
フラックス:25%ロジンフラックス
測定方法 :メニスコグラフ法
Then, the solder wettability of the plating surface of the pure copper plate which performed each post-processing method of the said Examples 1-60 and Comparative Examples 1-54 was investigated.
<Example of solder wettability test on tin and tin alloy plating surface>
In the following solder wettability test, an accelerated test was added, and the plated surface subjected to post-treatment was placed in a harsh atmosphere, and the solder wettability of the tin plated surface and various tin alloy plated surfaces was evaluated.
That is, the plated surfaces of the pure copper plates subjected to the post-treatment of Examples 1 to 60 and Comparative Examples 1 to 54 were subjected to a solder wettability test under the following conditions, and the zero cross time (seconds) was measured.
(A) Acceleration test Based on a pressure cooker, the temperature was 105 ° C., the relative humidity was 100%, and the time was 4 hours.
(B) Wetting test conditions Solder: Eutectic solder with tin / lead = 63/37 Bath temperature: 230 ° C
Immersion depth: 10mm
Immersion time: 10 seconds Immersion speed: 25 mm / second Flux: 25% rosin flux Measurement method: Meniscograph method
(1)スズメッキ面の評価
図1はスズメッキ面の試験結果である。
スズメッキ表面を後処理した実施例1〜10では、後処理を行わなかった比較例1に対して、加速試験後の濡れ時間において、明らかにゼロクロスタイムが短く、後処理が加速試験後のハンダ濡れ性の劣化防止に確実に寄与していることが確認できた。後処理用樹脂は、アクリル樹脂、マレイン酸樹脂、アルキド樹脂、又はフェノール樹脂のいずれであっても、ハンダ濡れ性を改善できる点では同様な評価であり、また、後処理液の形態はアルコール溶液、含水アルコール溶液、或は、トルエンやキシレンの有機溶剤溶液のいずれであっても、有効に機能することが判明した。
また、実施例1〜10を相対評価すれば、後処理用樹脂がアクリル樹脂、アルキド樹脂である実施例1〜3、実施例5〜7及び10ではハンダ濡れ性の経時劣化防止効果が大きく、マレイン酸樹脂やフェノール樹脂を使用した実施例4、実施例8〜9では、アクリル樹脂やアルキド樹脂に準じるレベルであった。
(1) Evaluation of tin-plated surface Fig. 1 shows the test results of the tin-plated surface.
In Examples 1 to 10 in which the surface of the tin plating was post-treated, compared to Comparative Example 1 in which the post-treatment was not performed, the zero cross time was clearly short in the wetting time after the acceleration test, and the post-treatment was solder wetting after the acceleration test. It was confirmed that it contributed to the prevention of deterioration of the property. Regardless of whether the post-treatment resin is an acrylic resin, a maleic acid resin, an alkyd resin, or a phenol resin, it is the same evaluation in that the solder wettability can be improved, and the form of the post-treatment liquid is an alcohol solution. It has been found that either a hydroalcoholic solution or an organic solvent solution of toluene or xylene functions effectively.
Moreover, if Examples 1-10 are relatively evaluated, in Examples 1-3, Examples 5-7 and 10 in which the post-processing resin is an acrylic resin and an alkyd resin, the effect of preventing deterioration of solder wettability with time is large. In Example 4 and Examples 8-9 using a maleic acid resin and a phenol resin, it was a level according to an acrylic resin and an alkyd resin.
一方、アクリル樹脂の平均分子量が本発明の特定範囲の上限を越える6万である比較例2、或は、同範囲の下限より少ない1500である比較例3を、アクリル樹脂を使用した実施例1〜3に対比すると、実施例1〜3は優れたハンダ濡れ性を示すのに対して、比較例2〜3の評価は(比較例1より改善されているものの)これらの実施例より大きく後退していたことから、アクリル樹脂の平均分子量が多き過ぎても、小さ過ぎてもハンダ濡れ性の経時劣化防止には寄与せず、アクリル樹脂の平均分子量を適正化することの必要性が確認できた。
また、同様に、(a)平均分子量が適正範囲にあるマレイン酸樹脂を用いた実施例4を、同範囲から上限・下限側に外れたマレイン酸樹脂を用いた比較例4〜5と対比し、(b)平均分子量が適正範囲にあるアルキド樹脂を用いた実施例5〜7及び10を、同範囲から上限・下限側に外れたアルキド樹脂を用いた比較例6〜7と対比し、或は、(c)平均分子量が適正範囲にあるフェノール樹脂を用いた実施例8〜9を、同範囲から上限・下限側に外れたアルキド樹脂を用いた比較例8〜9と対比すると、各比較例ではハンダ濡れ性の経時劣化を防止できないことから、ハンダ濡れ性の維持には、各樹脂の平均分子量を適正範囲内に限定することの重要性が認識できた。
On the other hand, Comparative Example 2 in which the average molecular weight of the acrylic resin is 60,000 exceeding the upper limit of the specific range of the present invention, or Comparative Example 3 in which 1500 is less than the lower limit of the same range is used in Example 1 using the acrylic resin. In contrast to Examples 3 to 3, Examples 1 to 3 exhibit excellent solder wettability, while Comparative Examples 2 to 3 have a greater regression than these Examples (although improved over Comparative Example 1). Therefore, even if the average molecular weight of the acrylic resin is too large or too small, it does not contribute to the prevention of solder wettability over time, and the need to optimize the average molecular weight of the acrylic resin can be confirmed. It was.
Similarly, (a) Example 4 using a maleic acid resin having an average molecular weight within an appropriate range is compared with Comparative Examples 4 to 5 using a maleic resin deviating from the same range to the upper and lower limits. (B) Examples 5 to 7 and 10 using alkyd resins having an average molecular weight in an appropriate range are compared with Comparative Examples 6 to 7 using alkyd resins deviating from the same range to the upper and lower limits, or (C) Examples 8 to 9 using a phenol resin having an average molecular weight in an appropriate range are compared with Comparative Examples 8 to 9 using an alkyd resin deviating from the same range to the upper and lower limits. In the example, the deterioration of the solder wettability with time could not be prevented, so that it was recognized that the importance of limiting the average molecular weight of each resin within an appropriate range for maintaining the solder wettability.
(2)各種スズ合金メッキ面の評価
図2〜6は各種スズ合金メッキ面の試験結果である。
スズ−鉛合金、スズ−銅合金、スズ−銀合金、スズ−ビスマス合金、スズ−亜鉛合金の各メッキ面についても、上記スズメッキ面と同様に、アクリル樹脂、マレイン酸樹脂、アルキド樹脂、フェノール樹脂から選ばれた特定の樹脂で後処理した実施例では、後処理を行わなかった比較例に比べて、明らかに加速試験後のゼロクロスタイムが短く、後処理が加速試験後のハンダ濡れ性の劣化防止に確実に寄与していることが確認できた。この場合、後処理用樹脂はアクリル樹脂、その他の特定の樹脂を使用するかを問わず、また、後処理液の形態もアルコール溶液、含水アルコール溶液、又は有機溶剤液を問わず、いずれもハンダ濡れ性を維持できる点で同様の評価であった。
さらに、アクリル樹脂、アルキド樹脂などの特定の後処理用樹脂を使用しても、各樹脂の平均分子量が適正範囲から外れた比較例ではハンダ濡れ性の経時劣化を防止できないことから、当該各種のスズ合金メッキ面においても、上記スズメッキ面と同様に、ハンダ濡れ性の維持には、後処理用樹脂の平均分子量を各適正範囲に限定することの必要性が確認できた。
(2) Evaluation of various tin alloy plated surfaces FIGS. 2 to 6 show test results of various tin alloy plated surfaces.
Similar to the above tin plating surface, acrylic resin, maleic acid resin, alkyd resin, phenol resin for the plating surfaces of tin-lead alloy, tin-copper alloy, tin-silver alloy, tin-bismuth alloy and tin-zinc alloy In the examples after-treatment with a specific resin selected from the above, compared with the comparative example in which no post-treatment was performed, the zero cross time after the acceleration test was clearly shorter, and the post-treatment deteriorated the solder wettability after the acceleration test. It was confirmed that it contributed to prevention. In this case, regardless of whether the resin for post-treatment uses an acrylic resin or other specific resin, and the form of the post-treatment liquid is an alcohol solution, a hydrous alcohol solution, or an organic solvent liquid, both are solders. It was the same evaluation in the point which can maintain wettability.
Furthermore, even if a specific post-treatment resin such as an acrylic resin or an alkyd resin is used, in the comparative examples in which the average molecular weight of each resin is out of the appropriate range, it is impossible to prevent deterioration of solder wettability with time. On the tin alloy plating surface, similar to the above tin plating surface, it was confirmed that it was necessary to limit the average molecular weight of the post-treatment resin to each appropriate range in order to maintain the solder wettability.
Claims (6)
次の(A)〜(C)から選ばれた後処理用樹脂の少なくとも一種を含有し、
(A)各平均分子量が2000〜50000であるアクリル樹脂又はマレイン酸樹脂
(B)平均分子量が500〜5000であるアルキド樹脂
(C)平均分子量が300〜2000であるフェノール樹脂
且つ、塩素及びクロムを含有しないことを特徴とするスズ又はスズ合金メッキ表面の後処理液。 After forming a tin or tin alloy plating film on the object to be plated, a liquid for post-processing the plating surface,
Containing at least one kind of post-treatment resin selected from the following (A) to (C):
(A) Acrylic resin or maleic resin having an average molecular weight of 2000 to 50000
(B) Alkyd resin having an average molecular weight of 500 to 5,000
(C) A phenol resin having an average molecular weight of 300 to 2,000, and a post-treatment liquid for tin or tin alloy plating surface characterized by not containing chlorine and chromium.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003288252A JP4461296B2 (en) | 2003-08-06 | 2003-08-06 | Post-treatment method for tin or tin alloy plating surface |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003288252A JP4461296B2 (en) | 2003-08-06 | 2003-08-06 | Post-treatment method for tin or tin alloy plating surface |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005054256A true JP2005054256A (en) | 2005-03-03 |
JP4461296B2 JP4461296B2 (en) | 2010-05-12 |
Family
ID=34366969
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003288252A Expired - Fee Related JP4461296B2 (en) | 2003-08-06 | 2003-08-06 | Post-treatment method for tin or tin alloy plating surface |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4461296B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006307343A (en) * | 2005-04-20 | 2006-11-09 | Rohm & Haas Electronic Materials Llc | Dipping method |
KR100778579B1 (en) * | 2006-10-12 | 2007-11-22 | 기아자동차주식회사 | Mounting structure of curtain airbag for automobile |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0347694A (en) * | 1989-07-13 | 1991-02-28 | Shikoku Chem Corp | Preflux for soldering |
JPH09186442A (en) * | 1995-12-28 | 1997-07-15 | Tamura Kaken Kk | Flux for circuit board soldering and circuit board |
JPH09310060A (en) * | 1996-05-23 | 1997-12-02 | Toyo Kohan Co Ltd | Steel plate excellent in solder wettability, aftertreatment solution and aftertreatment |
JPH1075043A (en) * | 1996-08-29 | 1998-03-17 | Toyota Motor Corp | Flux for circuit board soldering and circuit board |
WO1998012362A1 (en) * | 1996-09-20 | 1998-03-26 | Toyo Kohan Co., Ltd. | Post-treating solution of plated steel sheet having improved solderability, post-treated plate and method of production thereof |
JP2001150184A (en) * | 1999-12-01 | 2001-06-05 | Tamura Kaken Co Ltd | Solder paste composition for reflow soldering and circuit board |
JP2002121469A (en) * | 2000-10-11 | 2002-04-23 | Toyota Motor Corp | Water-based coating composition and coated article coated with the composition |
JP2002338881A (en) * | 2001-05-16 | 2002-11-27 | Toyo Seikan Kaisha Ltd | Coating material for metallic package and metallic package using the coating material |
JP2003213454A (en) * | 2002-01-18 | 2003-07-30 | Toyo Kohan Co Ltd | Surface treated steel sheet for electronic component and production method therefor |
-
2003
- 2003-08-06 JP JP2003288252A patent/JP4461296B2/en not_active Expired - Fee Related
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0347694A (en) * | 1989-07-13 | 1991-02-28 | Shikoku Chem Corp | Preflux for soldering |
JPH09186442A (en) * | 1995-12-28 | 1997-07-15 | Tamura Kaken Kk | Flux for circuit board soldering and circuit board |
JPH09310060A (en) * | 1996-05-23 | 1997-12-02 | Toyo Kohan Co Ltd | Steel plate excellent in solder wettability, aftertreatment solution and aftertreatment |
JPH1075043A (en) * | 1996-08-29 | 1998-03-17 | Toyota Motor Corp | Flux for circuit board soldering and circuit board |
WO1998012362A1 (en) * | 1996-09-20 | 1998-03-26 | Toyo Kohan Co., Ltd. | Post-treating solution of plated steel sheet having improved solderability, post-treated plate and method of production thereof |
JP2001150184A (en) * | 1999-12-01 | 2001-06-05 | Tamura Kaken Co Ltd | Solder paste composition for reflow soldering and circuit board |
JP2002121469A (en) * | 2000-10-11 | 2002-04-23 | Toyota Motor Corp | Water-based coating composition and coated article coated with the composition |
JP2002338881A (en) * | 2001-05-16 | 2002-11-27 | Toyo Seikan Kaisha Ltd | Coating material for metallic package and metallic package using the coating material |
JP2003213454A (en) * | 2002-01-18 | 2003-07-30 | Toyo Kohan Co Ltd | Surface treated steel sheet for electronic component and production method therefor |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006307343A (en) * | 2005-04-20 | 2006-11-09 | Rohm & Haas Electronic Materials Llc | Dipping method |
KR100778579B1 (en) * | 2006-10-12 | 2007-11-22 | 기아자동차주식회사 | Mounting structure of curtain airbag for automobile |
Also Published As
Publication number | Publication date |
---|---|
JP4461296B2 (en) | 2010-05-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7396596B2 (en) | Article with a coating of electrically conductive polymer | |
JP4733468B2 (en) | Metal surface treatment aqueous solution and method for preventing discoloration of metal surface | |
TWI386273B (en) | Solder fluxes and solder paste compositions | |
KR20150085542A (en) | Free flux compositions | |
JP6243792B2 (en) | Manufacturing method of circuit board on which solder is solidified, manufacturing method of circuit board on which electronic parts are mounted, and cleaning composition for flux | |
WO2007029589A1 (en) | Aqueous antioxidant for tin or tin alloy | |
KR20180011749A (en) | Solder alloy, solder ball, chip solder, solder paste and solder joint | |
EP1771603B1 (en) | Corrosion resistance enhancement of tin surfaces | |
JP5422558B2 (en) | Solution and method for enhancing solderability and corrosion resistance of metal or metal alloy surface | |
JP2005226082A (en) | Surface treatment agent for metal, printed circuit board, and surface treatment method for metal of printed circuit board | |
JPWO2005085498A1 (en) | Metal surface treatment agent | |
JP4461296B2 (en) | Post-treatment method for tin or tin alloy plating surface | |
JP5649139B2 (en) | Surface coating layer structure on copper surface | |
JP4215235B2 (en) | Surface treatment agent and surface treatment method for Sn alloy | |
WO2018037579A1 (en) | Cleaning composition and cleaning method | |
TW506878B (en) | Water-soluble flux composition and process for producing soldered part | |
WO2020261995A1 (en) | Composition and etching method | |
JPH09293954A (en) | Treatment agent for copper or copper alloy surface | |
JP3981924B2 (en) | Post-treatment method for tin or tin alloy plating surface | |
KR20090009734A (en) | Surface treating agent | |
JP7333755B2 (en) | Etching liquid composition and etching method | |
JP5296115B2 (en) | Pretreatment agent for electroless metal plating and method for manufacturing circuit board using the same | |
JPS62230869A (en) | Electrically conductive coating compound to be soldered | |
JP2013209682A (en) | Surface treatment agent of easily oxidizable metal particle, surface treatment method, and metal particle obtained using the same | |
JP6316713B2 (en) | Circuit board manufacturing method |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20060718 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20060718 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20080410 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090623 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090811 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20091006 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20091203 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20100119 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20100201 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130226 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4461296 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130226 Year of fee payment: 3 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140226 Year of fee payment: 4 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |