JP2005051186A5 - - Google Patents
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- Publication number
- JP2005051186A5 JP2005051186A5 JP2003284369A JP2003284369A JP2005051186A5 JP 2005051186 A5 JP2005051186 A5 JP 2005051186A5 JP 2003284369 A JP2003284369 A JP 2003284369A JP 2003284369 A JP2003284369 A JP 2003284369A JP 2005051186 A5 JP2005051186 A5 JP 2005051186A5
- Authority
- JP
- Japan
- Prior art keywords
- insulating film
- diffusion layer
- silicon layer
- gate electrode
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000009792 diffusion process Methods 0.000 claims 23
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 18
- 229910052710 silicon Inorganic materials 0.000 claims 18
- 239000010703 silicon Substances 0.000 claims 18
- 239000012535 impurity Substances 0.000 claims 13
- 239000004065 semiconductor Substances 0.000 claims 4
- 239000002184 metal Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003284369A JP4451095B2 (ja) | 2003-07-31 | 2003-07-31 | 半導体記憶装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003284369A JP4451095B2 (ja) | 2003-07-31 | 2003-07-31 | 半導体記憶装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005051186A JP2005051186A (ja) | 2005-02-24 |
| JP2005051186A5 true JP2005051186A5 (https=) | 2006-08-17 |
| JP4451095B2 JP4451095B2 (ja) | 2010-04-14 |
Family
ID=34268996
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003284369A Expired - Fee Related JP4451095B2 (ja) | 2003-07-31 | 2003-07-31 | 半導体記憶装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4451095B2 (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100673016B1 (ko) | 2005-12-06 | 2007-01-24 | 삼성전자주식회사 | 반도체 소자 및 그 형성 방법 |
| JP4664833B2 (ja) * | 2006-02-15 | 2011-04-06 | 株式会社東芝 | 半導体記憶装置 |
| US8648403B2 (en) | 2006-04-21 | 2014-02-11 | International Business Machines Corporation | Dynamic memory cell structures |
| JP2008153567A (ja) * | 2006-12-20 | 2008-07-03 | Elpida Memory Inc | 半導体メモリ及びその製造方法 |
-
2003
- 2003-07-31 JP JP2003284369A patent/JP4451095B2/ja not_active Expired - Fee Related
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