JP2004527650A5 - - Google Patents

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Publication number
JP2004527650A5
JP2004527650A5 JP2001532258A JP2001532258A JP2004527650A5 JP 2004527650 A5 JP2004527650 A5 JP 2004527650A5 JP 2001532258 A JP2001532258 A JP 2001532258A JP 2001532258 A JP2001532258 A JP 2001532258A JP 2004527650 A5 JP2004527650 A5 JP 2004527650A5
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JP
Japan
Prior art keywords
aluminum
grain size
material according
titanium
particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001532258A
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English (en)
Japanese (ja)
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JP2004527650A (ja
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Publication date
Application filed filed Critical
Priority claimed from PCT/US2000/028454 external-priority patent/WO2001029279A1/en
Publication of JP2004527650A publication Critical patent/JP2004527650A/ja
Publication of JP2004527650A5 publication Critical patent/JP2004527650A5/ja
Pending legal-status Critical Current

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JP2001532258A 2000-10-12 2000-10-12 スパッタリングターゲット材の製造方法 Pending JP2004527650A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2000/028454 WO2001029279A1 (en) 1999-10-15 2000-10-12 Process for producing sputtering target materials

Publications (2)

Publication Number Publication Date
JP2004527650A JP2004527650A (ja) 2004-09-09
JP2004527650A5 true JP2004527650A5 (enExample) 2004-12-24

Family

ID=33029228

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001532258A Pending JP2004527650A (ja) 2000-10-12 2000-10-12 スパッタリングターゲット材の製造方法

Country Status (1)

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JP (1) JP2004527650A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8795486B2 (en) 2005-09-26 2014-08-05 Taiwan Semiconductor Manufacturing Company, Ltd. PVD target with end of service life detection capability
JP2009285671A (ja) * 2008-05-27 2009-12-10 Washi Kosan Co Ltd 軽合金製鍛造ホイールとその製造方法
JP7179450B2 (ja) * 2017-09-21 2022-11-29 Ｊｘ金属株式会社 スパッタリング用チタンターゲット及びその製造方法、並びにチタン含有薄膜の製造方法
CN113649509B (zh) * 2021-08-13 2024-03-22 宁波江丰电子材料股份有限公司 一种铜靶材及其制备方法

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