JP2004317431A - Foreign matter inspection method and device - Google Patents
Foreign matter inspection method and device Download PDFInfo
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- JP2004317431A JP2004317431A JP2003114641A JP2003114641A JP2004317431A JP 2004317431 A JP2004317431 A JP 2004317431A JP 2003114641 A JP2003114641 A JP 2003114641A JP 2003114641 A JP2003114641 A JP 2003114641A JP 2004317431 A JP2004317431 A JP 2004317431A
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Abstract
Description
【0001】
【発明の属する技術分野】
本発明は、異物検査方法及び装置に関し、例えば、燃料噴射を行うインジェクタに付着する異物を検出する異物検査方法及び装置に関する。
【0002】
【従来の技術】
従来から、精密で高品質が要求される製品の製造工程において、ゴミやバリのような異物が付着する場合があり、製品の品質上の問題となる場合が多かった。例えば、図5に示す車両のエンジンの燃料噴射を行うインジェクタ40のニードル41のクリアランスは約50μmであり、そこに異物42が詰まるとニードル41が全開状態となり、制御不能になってしまう。このような異物は、製造工程で発生する金属バリや切削粉、インジェクタが載置されるパレットのポリアセタール等のプラスチック屑、作業服の繊維屑あるいは紙類、人体の皮膚や爪など金属や非金属の雑多なものである。従来からインジェクタ製造工程の1工程が終了するごとに異物を洗い流す洗浄工程を介在させ、何回も洗浄を行うようにして、異物が付着しないようにしている。また、工程管理の一環として、どの工程でどのような異物が付着するかを知るために、異物検査が行われ、異物寸法の計測等が行われていた。
【0003】
異物検査では、洗浄工程で洗い流される異物をろ紙のような計測フィルタ上に収集し、顕微鏡により拡大したフィルタ像を撮影し、得られた画像を画像処理して異物を背景から切り出す。この異物を切り出すために画像の2値化処理が行われるが、計測フィルタ上に異物を採集すると、工程ごとにフィルタの背景色が異なることになる。したがって、フィルタ上の異物を2値化する場合、背景に連動して閾値を決定する動的閾値の方法を採用する必要があり、従来次の計算式で閾値を決定していた。
閾値=最小輝度+係数×(最大輝度−最小輝度)
【0004】
背景と異物は区別されればよいので、どちらが輝度が高いか低いかは問わないが、ここでは、異物は背景より輝度が低いものとしている。したがって、最小輝度は、画像内の異物の輝度に相当する。
【0005】
図6は、インジェクタ製造工程の一工程における異物画像における光量度数分布を示すヒストグラムである。図のグラフの横軸は輝度、縦軸はその輝度を有する画素数である。ヒストグラムの山Bは、多数の画素が有する輝度であって、計測フィルタ自体の輝度、すなわち背景の輝度を表わす。異物Aは、背景より暗く数が少ないので、ヒストグラムの山よりも輝度が低い部分にわずかに現われる。ヒストグラム上に、最大輝度M及び最小輝度Lのラインと閾値Hのラインを示した。従来のものにあっては、前記式に従って、最大輝度と最小輝度及び設定された係数により、閾値Hを算出していた。
【0006】
【発明が解決しようとする課題】
しかし、前述のように、異物を採取した計測フィルタの背景色は工程ごとに異なり、背景色に対応させて上記式の係数を変化させる必要があった。すなわち、対象となる異物がどの工程から出たかを知る必要があった。また、計測フィルタ上に異物が存在しない場合には、最大輝度と最小輝度が一致し、背景の輝度が閾値となって、背景を異物と誤って検出してしまうという問題点があった。
【0007】
本発明は、このような問題に鑑み、すべての工程に共通に使用でき、誤検出のない閾値を用いる異物検出方法及び異物検出装置を提供することを目的とする。
【0008】
【課題を解決するための手段】
本発明は、前記目的を達成するために、画像を2値化して異物を検査する異物検査方法又は装置であって、予め異物の輝度と異物を検出するための閾値とから回帰曲線を求め、該回帰曲線に基づいて閾値を得て、前記画像を2値化するための閾値として使用する異物検査方法又は異物検査装置を提供する。
【0009】
この回帰曲線は、一次式により決定されることができ、また、回帰曲線を求めるために、初回に求められた回帰曲線から所定距離はなれたサンプルを除外して、再度回帰曲線を求めるようにしてもよい。
【0010】
このように求められた閾値を使用すると、異物が得られた工程を知る必要はなくなり、また背景を異物と誤って検出することがなくなる。
【0011】
【発明の実施の形態】
発明の実施の形態を図1〜4を参照して説明する。
図1は、本発明の1実施形態である例えばインジェクタ異物等を検査するための異物検査装置の概要を示す図面である。
【0012】
顕微鏡1は、例えば実体顕微鏡で、CCDカメラ11が備えられている。接眼部12は、双眼鏡となっており、対物部13の下には、試料を載置するX−Yテーブル14が備えられている。X−Yテーブル14には、異物を採集した計測フィルタが装着される。例えば計測フィルタを4枚装着可能なテーブルを用いてもよい。顕微鏡1にはその他操作に必要な公知のアタッチメントが装着されることができる。画像解析装置2は、例えばパーソナルコンピュータからなる、顕微鏡1により取得された試料画像を解析するための装置で、本体21、表示装置22及びキーボード23等を備える。本体21にはハードディスク等の記憶装置を備え、図示しないが、その他の公知の入力装置や出力装置を備えることができる。
【0013】
次に、本実施形態の異物検出工程を説明する。
まず、各洗浄工程においてインジェクタを洗浄することにより異物を計測フィルタに集める。使用した計測フィルタの直径は50mmである。
【0014】
次に、各工程から所定数のサンプルを抽出する。例えば、5工程であれば、各工程6〜8個程度のサンプルをとればよい。図3に表示装置22(図1)上のサンプル画像を示す。サンプル画像は、計測フィルタを約60分割したもので、縦横4〜5mmの大きさであり。画素数は640×480であるから、1画素は、7.5μm程度である。図3に示されている異物3は、繊維屑である。
【0015】
このような異物サンプル画像を観察しながら、当該異物を明りょうに判別できる最適な閾値を目視により決定する。この場合、異物は画像内の輝度最小値であることが多く、異物は画像内の輝度最小値で表わされるとしてよい。本実施形態では、輝度は0(暗)〜255(明)の256段階に分かれており、例えば異物の輝度である輝度最小値100で背景と明りょうに分離できる最適閾値が120とすれば、輝度最小値100と閾値120のデータセットが得られることになる。
【0016】
このようにして、輝度最小値と閾値とのデータセットが得られる。このデータを、横軸を輝度最小値、縦軸を閾値とするグラフ上にプロットする。プロットした結果を図4に示す。得られたデータは、データが採取された工程に依存する関係(例えば、各工程毎にまとまってプロットされる等)は認められなかった。すなわち、各工程から採取された異物は、各々グラフ全体にちらばってプロットされた。図3に示すように、このデータから回帰曲線L1(本実施形態では回帰直線)を求め、その係数を決定した。得られた一次式は、
y=0.4961x+93.32
であった。この式は、yは閾値であり、xは輝度最小値であるから、
閾値=係数×輝度最小値+オフセット
と表現することができる。
【0017】
この式を用いて算出された閾値を使用すると、予め計測画像がどこの工程から出たかを知る必要なく、異物を検出することができる。また異物が存在しない画像に対しては、背景の輝度が最小値でありかつ最大値であるということになるが、本発明による閾値は、輝度最小値に係数がかかったものにオフセット部分が足しあわされており、背景を異物として拾うことはない。
【0018】
また、回帰曲線を求めるに当って、図4に示した回帰曲線を求めた後に、得られた回帰曲線からある一定以上離れたサンプルS(図3に破線で囲って示した。)を除外して再度回帰曲線を求めるとよい。図5に、再度得られた回帰曲線を示す。得られた式は、
y=0.6772x+64.185
であった。
【0019】
図4のものでは、特異な値を示した4点を除外して回帰曲線を求めているから、図3のものに比較して相関係数の値が高くなり、より精度よく閾値を決定することができた。
【図面の簡単な説明】
【図1】本発明の一実施形態である異物検出装置を示す図である。
【図2】異物の顕微鏡写真の一例を示す図である。
【図3】本発明による閾値決定手段の一例を示す図である。
【図4】本発明による閾値決定手段の他の例を示す図である。
【図5】インジェクタにおける異物の影響を示す図である。
【図6】異物画像のヒストグラムと閾値を示す図である。
【符号の説明】
1…顕微鏡
11…CCDカメラ
12…接眼レンズ
13…対物レンズ
14…XYテーブル
2…画像解析装置
21…本体
22…表示装置
23…キーボード
3…異物[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a foreign matter inspection method and apparatus, for example, a foreign matter inspection method and apparatus for detecting foreign matter adhering to an injector that performs fuel injection.
[0002]
[Prior art]
2. Description of the Related Art Conventionally, in a manufacturing process of a product requiring high precision and high quality, foreign substances such as dust and burrs may adhere to the product, which often causes a problem in product quality. For example, the clearance of the
[0003]
In the foreign substance inspection, the foreign substances washed out in the cleaning process are collected on a measurement filter such as a filter paper, a filter image enlarged by a microscope is photographed, and the obtained image is subjected to image processing to cut out the foreign substances from the background. The image is binarized in order to cut out the foreign matter. However, when the foreign matter is collected on the measurement filter, the background color of the filter differs for each process. Therefore, when binarizing foreign matter on the filter, it is necessary to adopt a dynamic threshold method in which a threshold is determined in conjunction with the background. Conventionally, the threshold is determined by the following formula.
Threshold = minimum luminance + coefficient × (maximum luminance−minimum luminance)
[0004]
Since the background and the foreign matter only need to be distinguished, it does not matter which one has higher or lower brightness. Here, the foreign matter is assumed to have lower brightness than the background. Therefore, the minimum luminance corresponds to the luminance of the foreign matter in the image.
[0005]
FIG. 6 is a histogram showing a light amount frequency distribution in a foreign matter image in one step of the injector manufacturing process. The horizontal axis of the graph in the figure is the luminance, and the vertical axis is the number of pixels having the luminance. The mountain B of the histogram is the luminance of many pixels, and represents the luminance of the measurement filter itself, that is, the luminance of the background. Since the foreign matter A is darker than the background and has a smaller number, the foreign matter A slightly appears in a portion where the luminance is lower than the peak of the histogram. The lines of the maximum luminance M and the minimum luminance L and the line of the threshold value H are shown on the histogram. In the prior art, the threshold value H was calculated from the maximum luminance and the minimum luminance and the set coefficient according to the above equation.
[0006]
[Problems to be solved by the invention]
However, as described above, the background color of the measurement filter from which the foreign matter has been collected differs for each process, and it is necessary to change the coefficients of the above equation in accordance with the background color. That is, it was necessary to know from which process the target foreign matter came out. In addition, when there is no foreign matter on the measurement filter, the maximum luminance and the minimum luminance match, and the luminance of the background becomes a threshold, and the background is erroneously detected as a foreign matter.
[0007]
In view of such a problem, an object of the present invention is to provide a foreign matter detection method and a foreign matter detection device that can be used in all processes and that use a threshold value without erroneous detection.
[0008]
[Means for Solving the Problems]
The present invention, in order to achieve the above object, a foreign matter inspection method or apparatus for inspecting foreign matter by binarizing an image, in which a regression curve is obtained from the luminance of the foreign matter and a threshold value for detecting the foreign matter in advance, Provided is a foreign substance inspection method or a foreign substance inspection apparatus that obtains a threshold based on the regression curve and uses the threshold as a threshold for binarizing the image.
[0009]
This regression curve can be determined by a linear equation.In addition, in order to obtain a regression curve, a sample at a predetermined distance from the regression curve obtained for the first time is excluded, and the regression curve is obtained again. Is also good.
[0010]
When the threshold value thus obtained is used, it is not necessary to know the process in which the foreign matter is obtained, and the background is not erroneously detected as the foreign matter.
[0011]
BEST MODE FOR CARRYING OUT THE INVENTION
An embodiment of the present invention will be described with reference to FIGS.
FIG. 1 is a diagram showing an outline of a foreign matter inspection apparatus for inspecting, for example, an injector foreign matter, which is one embodiment of the present invention.
[0012]
The
[0013]
Next, a foreign substance detection step of the present embodiment will be described.
First, foreign substances are collected in a measurement filter by cleaning the injector in each cleaning step. The diameter of the measurement filter used is 50 mm.
[0014]
Next, a predetermined number of samples are extracted from each step. For example, in the case of five steps, about 6 to 8 samples may be taken in each step. FIG. 3 shows a sample image on the display device 22 (FIG. 1). The sample image is obtained by dividing the measurement filter by about 60 and has a size of 4 to 5 mm in length and width. Since the number of pixels is 640 × 480, one pixel is about 7.5 μm. The
[0015]
While observing such a foreign substance sample image, an optimal threshold value at which the foreign substance can be clearly identified is visually determined. In this case, the foreign substance often has the minimum luminance value in the image, and the foreign substance may be represented by the minimum luminance value in the image. In the present embodiment, the luminance is divided into 256 levels from 0 (dark) to 255 (bright). For example, if the optimal threshold value which can be clearly separated from the background at the minimum luminance of 100, which is the luminance of a foreign substance, is 120, A data set of the
[0016]
In this way, a data set of the minimum luminance value and the threshold value is obtained. This data is plotted on a graph with the horizontal axis representing the minimum luminance value and the vertical axis representing the threshold value. The plotted result is shown in FIG. The obtained data did not show a relationship depending on the process from which the data was collected (for example, plotted collectively for each process). That is, the foreign substances collected from each step were plotted in a manner scattered throughout the graph. As shown in FIG. 3, a regression curve L1 (regression line in this embodiment) was obtained from this data, and its coefficient was determined. The resulting linear equation is
y = 0.4961x + 93.32
Met. In this equation, since y is a threshold and x is a minimum luminance value,
Threshold = coefficient × minimum luminance value + offset
[0017]
By using the threshold calculated using this equation, it is possible to detect a foreign substance without having to know in advance which process the measurement image has come from. For an image in which no foreign matter is present, the background luminance is the minimum value and the maximum value. However, the threshold value according to the present invention is obtained by adding a coefficient to the minimum luminance value and adding an offset portion. The background is not picked up as foreign matter.
[0018]
Further, in obtaining the regression curve, after obtaining the regression curve shown in FIG. 4, a sample S (shown by a dashed line in FIG. 3) apart from the obtained regression curve by a certain distance or more is excluded. To find the regression curve again. FIG. 5 shows the regression curve obtained again. The resulting equation is
y = 0.6772x + 64.185
Met.
[0019]
In the case of FIG. 4, the regression curve is obtained by excluding the four points showing unique values, so that the value of the correlation coefficient becomes higher than that of FIG. 3, and the threshold value is determined more accurately. I was able to.
[Brief description of the drawings]
FIG. 1 is a diagram showing a foreign object detection device according to an embodiment of the present invention.
FIG. 2 is a diagram showing an example of a micrograph of a foreign substance.
FIG. 3 is a diagram illustrating an example of a threshold value determining unit according to the present invention.
FIG. 4 is a diagram showing another example of the threshold value determining means according to the present invention.
FIG. 5 is a diagram showing the influence of foreign matter on the injector.
FIG. 6 is a diagram showing a histogram of a foreign object image and a threshold.
[Explanation of symbols]
DESCRIPTION OF
Claims (8)
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Cited By (4)
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JP2006153567A (en) * | 2004-11-26 | 2006-06-15 | Anzai Sogo Kenkyusho:Kk | Automatic setting device of sorting set values for wheat grain sorter |
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JP2012159376A (en) * | 2011-01-31 | 2012-08-23 | Jfe Steel Corp | Surface defect detector and surface defect detection method |
WO2012157386A1 (en) * | 2011-05-16 | 2012-11-22 | 株式会社日立ハイテクノロジーズ | Automatic analysis device and automatic analysis program |
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JPH0395444A (en) * | 1989-09-07 | 1991-04-19 | Furukawa Electric Co Ltd:The | Method for automatic discriminating defect |
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Publication number | Priority date | Publication date | Assignee | Title |
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JP2006153567A (en) * | 2004-11-26 | 2006-06-15 | Anzai Sogo Kenkyusho:Kk | Automatic setting device of sorting set values for wheat grain sorter |
EP1850118A1 (en) * | 2006-04-24 | 2007-10-31 | Siemens Aktiengesellschaft | Method for detecting metallic particles |
JP2012159376A (en) * | 2011-01-31 | 2012-08-23 | Jfe Steel Corp | Surface defect detector and surface defect detection method |
WO2012157386A1 (en) * | 2011-05-16 | 2012-11-22 | 株式会社日立ハイテクノロジーズ | Automatic analysis device and automatic analysis program |
US9562917B2 (en) | 2011-05-16 | 2017-02-07 | Hitachi High-Technologies Corporation | Automatic analysis device and automatic analysis program |
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