JP2004273482A5 - - Google Patents
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- JP2004273482A5 JP2004273482A5 JP2003057971A JP2003057971A JP2004273482A5 JP 2004273482 A5 JP2004273482 A5 JP 2004273482A5 JP 2003057971 A JP2003057971 A JP 2003057971A JP 2003057971 A JP2003057971 A JP 2003057971A JP 2004273482 A5 JP2004273482 A5 JP 2004273482A5
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Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003057971A JP4266673B2 (ja) | 2003-03-05 | 2003-03-05 | 収差測定装置 |
US10/793,492 US20040174533A1 (en) | 2003-03-05 | 2004-03-03 | Wavefront aberration measuring apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003057971A JP4266673B2 (ja) | 2003-03-05 | 2003-03-05 | 収差測定装置 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2004273482A JP2004273482A (ja) | 2004-09-30 |
JP2004273482A5 true JP2004273482A5 (ja) | 2006-04-13 |
JP4266673B2 JP4266673B2 (ja) | 2009-05-20 |
Family
ID=32923551
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003057971A Expired - Fee Related JP4266673B2 (ja) | 2003-03-05 | 2003-03-05 | 収差測定装置 |
Country Status (2)
Country | Link |
---|---|
US (1) | US20040174533A1 (ja) |
JP (1) | JP4266673B2 (ja) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005522871A (ja) * | 2002-04-15 | 2005-07-28 | カール・ツァイス・エスエムティー・アーゲー | 干渉計測装置および該計測装置からなる投影露光装置 |
EP1387220A3 (en) * | 2002-07-29 | 2007-01-03 | Canon Kabushiki Kaisha | Adjustment method and apparatus of optical system, and exposure apparatus |
US7088458B1 (en) * | 2002-12-23 | 2006-08-08 | Carl Zeiss Smt Ag | Apparatus and method for measuring an optical imaging system, and detector unit |
JP4314040B2 (ja) * | 2003-03-05 | 2009-08-12 | キヤノン株式会社 | 測定装置及び方法 |
JP2005159213A (ja) * | 2003-11-28 | 2005-06-16 | Canon Inc | シアリング干渉を利用した測定方法及び装置、それを利用した露光方法及び装置、並びに、デバイス製造方法 |
US7301646B2 (en) * | 2004-01-21 | 2007-11-27 | Carl Zeiss Smt Ag | Device and method for the determination of imaging errors and microlithography projection exposure system |
JP4666982B2 (ja) * | 2004-09-02 | 2011-04-06 | キヤノン株式会社 | 光学特性測定装置、露光装置及びデバイス製造方法 |
JP4095598B2 (ja) * | 2004-09-16 | 2008-06-04 | キヤノン株式会社 | 二次元波面収差の算出方法 |
JP2006278960A (ja) * | 2005-03-30 | 2006-10-12 | Canon Inc | 露光装置 |
JP2006303370A (ja) * | 2005-04-25 | 2006-11-02 | Canon Inc | 露光装置及びそれを用いたデバイス製造方法 |
JP2006324311A (ja) * | 2005-05-17 | 2006-11-30 | Canon Inc | 波面収差測定装置及びそれを有する露光装置 |
DE102005041203A1 (de) * | 2005-08-31 | 2007-03-01 | Carl Zeiss Sms Gmbh | Vorrichtung und Verfahren zur interferometrischen Messung von Phasenmasken |
JP2007180152A (ja) * | 2005-12-27 | 2007-07-12 | Canon Inc | 測定方法及び装置、露光装置、並びに、デバイス製造方法 |
JP2007335493A (ja) * | 2006-06-13 | 2007-12-27 | Canon Inc | 測定方法及び装置、露光装置、並びに、デバイス製造方法 |
US7733468B2 (en) * | 2007-02-28 | 2010-06-08 | Nidek Co., Ltd. | Lens meter |
EP2184596B1 (en) * | 2007-08-27 | 2018-11-14 | Nikon Corporation | Wavefront aberration measuring device and method and wavefront aberration adjusting method |
JP2009216454A (ja) * | 2008-03-07 | 2009-09-24 | Canon Inc | 波面収差測定装置、波面収差測定方法、露光装置およびデバイス製造方法 |
WO2010077675A2 (en) * | 2008-12-09 | 2010-07-08 | Zygo Corporation | Two grating lateral shearing wavefront sensor |
JP5503193B2 (ja) * | 2009-06-08 | 2014-05-28 | キヤノン株式会社 | 波面収差の測定装置、露光装置及びデバイス製造方法 |
CN102261985B (zh) * | 2011-06-13 | 2012-12-12 | 中国科学院长春光学精密机械与物理研究所 | 光学系统波像差标定装置及该装置测试误差的标定方法 |
CN104101487B (zh) * | 2014-07-31 | 2017-01-18 | 中国科学院光电研究院 | 一种光学系统波像差测量装置与测量方法 |
EP3298446A2 (de) * | 2015-05-20 | 2018-03-28 | Carl Zeiss SMT GmbH | Messverfahren und messanordnung für ein abbildendes optisches system |
NL2021358A (en) * | 2018-01-31 | 2018-08-16 | Asml Netherlands Bv | Method and Apparatus for determining optical aberrations |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6312373B1 (en) * | 1998-09-22 | 2001-11-06 | Nikon Corporation | Method of manufacturing an optical system |
US6118535A (en) * | 1999-06-02 | 2000-09-12 | Goldberg; Kenneth Alan | In Situ alignment system for phase-shifting point-diffraction interferometry |
US6573997B1 (en) * | 2000-07-17 | 2003-06-03 | The Regents Of California | Hybrid shearing and phase-shifting point diffraction interferometer |
TWI221000B (en) * | 2001-02-13 | 2004-09-11 | Nikon Corp | Manufacturing method of exposure apparatus, adjustment method of exposure apparatus, and exposure method |
EP1231514A1 (en) * | 2001-02-13 | 2002-08-14 | Asm Lithography B.V. | Measurement of wavefront aberrations in a lithographic projection apparatus |
US6454382B1 (en) * | 2001-05-11 | 2002-09-24 | Vladimir Galentovski | Malfunctioning nozzle detection apparatus |
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2003
- 2003-03-05 JP JP2003057971A patent/JP4266673B2/ja not_active Expired - Fee Related
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2004
- 2004-03-03 US US10/793,492 patent/US20040174533A1/en not_active Abandoned