JP2004265916A5 - - Google Patents

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Publication number
JP2004265916A5
JP2004265916A5 JP2003029529A JP2003029529A JP2004265916A5 JP 2004265916 A5 JP2004265916 A5 JP 2004265916A5 JP 2003029529 A JP2003029529 A JP 2003029529A JP 2003029529 A JP2003029529 A JP 2003029529A JP 2004265916 A5 JP2004265916 A5 JP 2004265916A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003029529A
Other versions
JP2004265916A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2003029529A priority Critical patent/JP2004265916A/ja
Priority claimed from JP2003029529A external-priority patent/JP2004265916A/ja
Priority to PCT/JP2004/001122 priority patent/WO2004070815A1/ja
Publication of JP2004265916A publication Critical patent/JP2004265916A/ja
Publication of JP2004265916A5 publication Critical patent/JP2004265916A5/ja
Pending legal-status Critical Current

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JP2003029529A 2003-02-06 2003-02-06 基板のプラズマ酸化処理方法 Pending JP2004265916A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2003029529A JP2004265916A (ja) 2003-02-06 2003-02-06 基板のプラズマ酸化処理方法
PCT/JP2004/001122 WO2004070815A1 (ja) 2003-02-06 2004-02-04 プラズマ酸化処理方法及び半導体基板

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003029529A JP2004265916A (ja) 2003-02-06 2003-02-06 基板のプラズマ酸化処理方法

Publications (2)

Publication Number Publication Date
JP2004265916A JP2004265916A (ja) 2004-09-24
JP2004265916A5 true JP2004265916A5 (ja) 2006-04-06

Family

ID=32844237

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003029529A Pending JP2004265916A (ja) 2003-02-06 2003-02-06 基板のプラズマ酸化処理方法

Country Status (2)

Country Link
JP (1) JP2004265916A (ja)
WO (1) WO2004070815A1 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4149427B2 (ja) * 2004-10-07 2008-09-10 東京エレクトロン株式会社 マイクロ波プラズマ処理装置
JP2006244891A (ja) * 2005-03-04 2006-09-14 Tokyo Electron Ltd マイクロ波プラズマ処理装置
JP5082229B2 (ja) 2005-11-29 2012-11-28 東京エレクトロン株式会社 プラズマ処理装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11279773A (ja) * 1998-03-27 1999-10-12 Tomoo Ueno 成膜方法
JP4713752B2 (ja) * 2000-12-28 2011-06-29 財団法人国際科学振興財団 半導体装置およびその製造方法

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