JP2004259778A5 - - Google Patents
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- Publication number
- JP2004259778A5 JP2004259778A5 JP2003046349A JP2003046349A JP2004259778A5 JP 2004259778 A5 JP2004259778 A5 JP 2004259778A5 JP 2003046349 A JP2003046349 A JP 2003046349A JP 2003046349 A JP2003046349 A JP 2003046349A JP 2004259778 A5 JP2004259778 A5 JP 2004259778A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003046349A JP4311711B2 (ja) | 2003-02-24 | 2003-02-24 | 露光装置及びデバイス製造方法 |
| US10/785,804 US7106413B2 (en) | 2003-02-24 | 2004-02-23 | Cooling mechanism |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003046349A JP4311711B2 (ja) | 2003-02-24 | 2003-02-24 | 露光装置及びデバイス製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004259778A JP2004259778A (ja) | 2004-09-16 |
| JP2004259778A5 true JP2004259778A5 (ja) | 2006-04-13 |
| JP4311711B2 JP4311711B2 (ja) | 2009-08-12 |
Family
ID=32866534
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003046349A Expired - Fee Related JP4311711B2 (ja) | 2003-02-24 | 2003-02-24 | 露光装置及びデバイス製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US7106413B2 (ja) |
| JP (1) | JP4311711B2 (ja) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005101537A (ja) * | 2003-08-29 | 2005-04-14 | Canon Inc | 露光装置及びそれを用いたデバイスの製造方法 |
| JP2005109158A (ja) * | 2003-09-30 | 2005-04-21 | Canon Inc | 冷却装置及び方法、それを有する露光装置、デバイスの製造方法 |
| KR20060048937A (ko) * | 2004-08-03 | 2006-05-18 | 가부시키가이샤 에키쇼센탄 기쥬쓰 가이하쓰센타 | 레이저 결정화 장치 |
| JP4817702B2 (ja) * | 2005-04-14 | 2011-11-16 | キヤノン株式会社 | 光学装置及びそれを備えた露光装置 |
| JP2007281142A (ja) * | 2006-04-05 | 2007-10-25 | Canon Inc | 露光装置及び方法、並びに、デバイス製造方法 |
| JP5084558B2 (ja) * | 2008-02-28 | 2012-11-28 | キヤノン株式会社 | 表面形状計測装置、露光装置及びデバイス製造方法 |
| JP5355043B2 (ja) * | 2008-11-10 | 2013-11-27 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
| KR20120003916A (ko) * | 2009-04-02 | 2012-01-11 | 에테하 취리히 | 데브리 완화 및 냉각된 집광기 광학계를 갖는 극자외선 광원 |
| TWI501046B (zh) | 2010-07-30 | 2015-09-21 | 卡爾蔡司Ｓｍｔ有限公司 | 超紫外線曝光裝置 |
| NL2009378A (en) * | 2011-10-07 | 2013-04-09 | Asml Netherlands Bv | Lithographic apparatus and method of cooling a component in a lithographic apparatus. |
| WO2013156041A1 (en) * | 2012-04-18 | 2013-10-24 | Carl Zeiss Smt Gmbh | A microlithographic apparatus and a method of changing an optical wavefront in an objective of such an apparatus |
| TWI646576B (zh) * | 2013-12-22 | 2019-01-01 | 美商應用材料股份有限公司 | 具有夾盤組件之極紫外線微影系統及其製造方法 |
| DE102014216631A1 (de) | 2014-08-21 | 2016-02-25 | Carl Zeiss Smt Gmbh | Mikrolithographische Projektionsbelichtungsanlage, Spiegelmodul hierfür, sowie Verfahren zum Betrieb des Spiegelmoduls |
| JP6872083B2 (ja) * | 2018-09-20 | 2021-05-19 | 富士フイルム株式会社 | 投影装置とその制御方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60158626A (ja) * | 1984-01-30 | 1985-08-20 | Canon Inc | 半導体露光装置 |
| DE69118315T2 (de) * | 1990-11-01 | 1996-08-14 | Canon Kk | Waferhaltebefestigung für Belichtungsgerät |
| US20010016302A1 (en) * | 1999-12-28 | 2001-08-23 | Nikon Corporation | Wafer chucks allowing controlled reduction of substrate heating and rapid substrate exchange |
| JP3870002B2 (ja) * | 2000-04-07 | 2007-01-17 | キヤノン株式会社 | 露光装置 |
| JP4006251B2 (ja) * | 2002-03-20 | 2007-11-14 | キヤノン株式会社 | ミラー装置、ミラーの調整方法、露光装置、露光方法及び半導体デバイスの製造方法 |
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2003
- 2003-02-24 JP JP2003046349A patent/JP4311711B2/ja not_active Expired - Fee Related
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2004
- 2004-02-23 US US10/785,804 patent/US7106413B2/en not_active Expired - Fee Related