JP2004257424A5 - - Google Patents
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- JP2004257424A5 JP2004257424A5 JP2003046223A JP2003046223A JP2004257424A5 JP 2004257424 A5 JP2004257424 A5 JP 2004257424A5 JP 2003046223 A JP2003046223 A JP 2003046223A JP 2003046223 A JP2003046223 A JP 2003046223A JP 2004257424 A5 JP2004257424 A5 JP 2004257424A5
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Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003046223A JP4143438B2 (ja) | 2003-02-24 | 2003-02-24 | 支持装置、露光装置、デバイス製造方法 |
US10/782,785 US7383929B2 (en) | 2003-02-24 | 2004-02-23 | Anti-vibration technique |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003046223A JP4143438B2 (ja) | 2003-02-24 | 2003-02-24 | 支持装置、露光装置、デバイス製造方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2004257424A JP2004257424A (ja) | 2004-09-16 |
JP2004257424A5 true JP2004257424A5 (ja) | 2008-02-28 |
JP4143438B2 JP4143438B2 (ja) | 2008-09-03 |
Family
ID=32866528
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003046223A Expired - Fee Related JP4143438B2 (ja) | 2003-02-24 | 2003-02-24 | 支持装置、露光装置、デバイス製造方法 |
Country Status (2)
Country | Link |
---|---|
US (1) | US7383929B2 (ja) |
JP (1) | JP4143438B2 (ja) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005142501A (ja) * | 2003-11-10 | 2005-06-02 | Canon Inc | ステージ装置および露光装置ならびにデバイス製造方法 |
JP5264112B2 (ja) * | 2007-07-11 | 2013-08-14 | キヤノン株式会社 | 露光装置 |
DE102008004762A1 (de) | 2008-01-16 | 2009-07-30 | Carl Zeiss Smt Ag | Projektionsbelichtungsanlage für die Mikrolithographie mit einer Messeinrichtung |
WO2009130645A2 (en) * | 2008-04-23 | 2009-10-29 | Koninklijke Philips Electronics N.V. | Magnetic suspension positioning system |
JP5427000B2 (ja) * | 2009-11-11 | 2014-02-26 | キヤノン株式会社 | 磁気支持機構、露光装置、およびデバイス製造方法 |
NL2005735A (en) * | 2009-12-23 | 2011-06-27 | Asml Netherlands Bv | Imprint lithographic apparatus and imprint lithographic method. |
EP2472139A1 (en) * | 2011-01-03 | 2012-07-04 | Technische Universiteit Eindhoven | Vibration isolator |
US9754711B2 (en) * | 2011-01-03 | 2017-09-05 | Asml Netherlands B.V. | Vibration isolator with displacement structure |
CN102691747A (zh) * | 2012-06-11 | 2012-09-26 | 哈尔滨工业大学 | 磁悬浮隔振平台 |
CN103809384B (zh) * | 2012-11-12 | 2016-03-09 | 上海微电子装备有限公司 | 工件台与掩模台公用的平衡质量系统及光刻机 |
US9689453B2 (en) * | 2014-02-06 | 2017-06-27 | Asm Technology Singapore Pte. Ltd. | Active vibration absorber |
US9837939B1 (en) | 2015-04-01 | 2017-12-05 | Lockheed Martin Corporation | System and method for providing vibration isolation by magnetic levitation |
EP3093965B1 (de) * | 2015-05-12 | 2017-11-22 | Etel S. A.. | Kurzhubiger linearmotor |
DE102016100750A1 (de) * | 2016-01-18 | 2017-07-20 | Airbus Operations Gmbh | Fahrzeugrumpf und Verfahren zur Montage eines Fahrzeugrumpfs |
CN106931065A (zh) * | 2016-09-08 | 2017-07-07 | 中国地震局工程力学研究所 | 包含磁铁装置的三向隔震台座 |
US11073758B2 (en) * | 2018-10-31 | 2021-07-27 | Canon Kabushiki Kaisha | Imprint apparatus control, control method and manufacturing method |
WO2020154816A1 (en) | 2019-02-01 | 2020-08-06 | Zaber Technologies Inc. | Adjustable magnetic counterbalance |
WO2020167939A1 (en) * | 2019-02-14 | 2020-08-20 | Persimmon Technologies Corporation | Magnetically guided material handling robot |
CN113137448B (zh) * | 2021-04-21 | 2022-06-10 | 四川省建筑科学研究院有限公司 | 工业设备用抗振平台 |
CN115881403B (zh) * | 2023-02-23 | 2023-05-16 | 广东南桂起重机械有限公司 | 一种抗摔防震变压器油箱 |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5961132A (ja) * | 1982-09-30 | 1984-04-07 | Fujitsu Ltd | 電子ビ−ム露光装置 |
JPH0427696A (ja) * | 1990-05-21 | 1992-01-30 | Mitsubishi Heavy Ind Ltd | ヘリコプタの防振機構 |
US5157296A (en) * | 1990-12-20 | 1992-10-20 | Massachusetts Institute Of Technology | Bearing for use in high resolution precision control device |
JP3182158B2 (ja) | 1991-02-25 | 2001-07-03 | キヤノン株式会社 | 露光装置用のステージ支持装置 |
US5159219A (en) * | 1991-05-16 | 1992-10-27 | University Of Houston-University Park | Opposed-magnet bearing with interposed superconductor |
US5196745A (en) * | 1991-08-16 | 1993-03-23 | Massachusetts Institute Of Technology | Magnetic positioning device |
JP3036297B2 (ja) * | 1993-06-04 | 2000-04-24 | 神鋼電機株式会社 | 自動搬送車両 |
JPH07115056A (ja) | 1993-10-15 | 1995-05-02 | Canon Inc | 縦型基板ステージ装置 |
JPH07267192A (ja) * | 1994-03-29 | 1995-10-17 | Mitsubishi Heavy Ind Ltd | ヘリコプタ |
JP3363662B2 (ja) | 1994-05-19 | 2003-01-08 | キヤノン株式会社 | 走査ステージ装置およびこれを用いた露光装置 |
JPH08270725A (ja) | 1995-03-28 | 1996-10-15 | Agency Of Ind Science & Technol | 反発型磁気ダンパ、反発型磁気アクチュエータ及び反発型磁気防振台 |
JP3815750B2 (ja) | 1995-10-09 | 2006-08-30 | キヤノン株式会社 | ステージ装置、ならびに前記ステージ装置を用いた露光装置およびデバイス製造方法 |
JPH09289155A (ja) * | 1996-04-19 | 1997-11-04 | Nikon Corp | 走査型露光装置 |
KR980006398A (ko) * | 1996-06-21 | 1998-03-30 | 마에다 시게루 | 진동 감쇄장치 |
US5990587A (en) * | 1997-06-27 | 1999-11-23 | New Jersey Institute Of Technology | Low friction, high precision actuator |
JPH11191585A (ja) | 1997-12-26 | 1999-07-13 | Canon Inc | ステージ装置、およびこれを用いた露光装置、ならびにデバイス製造方法 |
US6082719A (en) * | 1998-05-12 | 2000-07-04 | Trw Inc. | Spacecraft antenna vibration control damper |
US6621556B2 (en) * | 2000-02-28 | 2003-09-16 | Nikon Corporation | Projection exposure apparatus and manufacturing and adjusting methods thereof |
US6496248B2 (en) * | 2000-12-15 | 2002-12-17 | Nikon Corporation | Stage device and exposure apparatus and method |
JP4745556B2 (ja) * | 2001-08-20 | 2011-08-10 | キヤノン株式会社 | 位置決め装置、露光装置、及びデバイス製造方法 |
US7034973B2 (en) * | 2002-03-22 | 2006-04-25 | Ricoh Company, Ltd. | Scanning optical system, optical scanning device, and image forming apparatus |
JP4323759B2 (ja) | 2002-05-27 | 2009-09-02 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
-
2003
- 2003-02-24 JP JP2003046223A patent/JP4143438B2/ja not_active Expired - Fee Related
-
2004
- 2004-02-23 US US10/782,785 patent/US7383929B2/en not_active Expired - Fee Related