JP2004257424A5 - - Google Patents

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Publication number
JP2004257424A5
JP2004257424A5 JP2003046223A JP2003046223A JP2004257424A5 JP 2004257424 A5 JP2004257424 A5 JP 2004257424A5 JP 2003046223 A JP2003046223 A JP 2003046223A JP 2003046223 A JP2003046223 A JP 2003046223A JP 2004257424 A5 JP2004257424 A5 JP 2004257424A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2003046223A
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JP2004257424A (ja
JP4143438B2 (ja
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Priority to JP2003046223A priority Critical patent/JP4143438B2/ja
Priority claimed from JP2003046223A external-priority patent/JP4143438B2/ja
Priority to US10/782,785 priority patent/US7383929B2/en
Publication of JP2004257424A publication Critical patent/JP2004257424A/ja
Publication of JP2004257424A5 publication Critical patent/JP2004257424A5/ja
Application granted granted Critical
Publication of JP4143438B2 publication Critical patent/JP4143438B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2003046223A 2003-02-24 2003-02-24 支持装置、露光装置、デバイス製造方法 Expired - Fee Related JP4143438B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2003046223A JP4143438B2 (ja) 2003-02-24 2003-02-24 支持装置、露光装置、デバイス製造方法
US10/782,785 US7383929B2 (en) 2003-02-24 2004-02-23 Anti-vibration technique

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003046223A JP4143438B2 (ja) 2003-02-24 2003-02-24 支持装置、露光装置、デバイス製造方法

Publications (3)

Publication Number Publication Date
JP2004257424A JP2004257424A (ja) 2004-09-16
JP2004257424A5 true JP2004257424A5 (ja) 2008-02-28
JP4143438B2 JP4143438B2 (ja) 2008-09-03

Family

ID=32866528

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003046223A Expired - Fee Related JP4143438B2 (ja) 2003-02-24 2003-02-24 支持装置、露光装置、デバイス製造方法

Country Status (2)

Country Link
US (1) US7383929B2 (ja)
JP (1) JP4143438B2 (ja)

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JP2005142501A (ja) * 2003-11-10 2005-06-02 Canon Inc ステージ装置および露光装置ならびにデバイス製造方法
JP5264112B2 (ja) * 2007-07-11 2013-08-14 キヤノン株式会社 露光装置
DE102008004762A1 (de) 2008-01-16 2009-07-30 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie mit einer Messeinrichtung
WO2009130645A2 (en) * 2008-04-23 2009-10-29 Koninklijke Philips Electronics N.V. Magnetic suspension positioning system
JP5427000B2 (ja) * 2009-11-11 2014-02-26 キヤノン株式会社 磁気支持機構、露光装置、およびデバイス製造方法
NL2005735A (en) * 2009-12-23 2011-06-27 Asml Netherlands Bv Imprint lithographic apparatus and imprint lithographic method.
EP2472139A1 (en) * 2011-01-03 2012-07-04 Technische Universiteit Eindhoven Vibration isolator
US9754711B2 (en) * 2011-01-03 2017-09-05 Asml Netherlands B.V. Vibration isolator with displacement structure
CN102691747A (zh) * 2012-06-11 2012-09-26 哈尔滨工业大学 磁悬浮隔振平台
CN103809384B (zh) * 2012-11-12 2016-03-09 上海微电子装备有限公司 工件台与掩模台公用的平衡质量系统及光刻机
US9689453B2 (en) * 2014-02-06 2017-06-27 Asm Technology Singapore Pte. Ltd. Active vibration absorber
US9837939B1 (en) 2015-04-01 2017-12-05 Lockheed Martin Corporation System and method for providing vibration isolation by magnetic levitation
EP3093965B1 (de) * 2015-05-12 2017-11-22 Etel S. A.. Kurzhubiger linearmotor
DE102016100750A1 (de) * 2016-01-18 2017-07-20 Airbus Operations Gmbh Fahrzeugrumpf und Verfahren zur Montage eines Fahrzeugrumpfs
CN106931065A (zh) * 2016-09-08 2017-07-07 中国地震局工程力学研究所 包含磁铁装置的三向隔震台座
US11073758B2 (en) * 2018-10-31 2021-07-27 Canon Kabushiki Kaisha Imprint apparatus control, control method and manufacturing method
WO2020154816A1 (en) 2019-02-01 2020-08-06 Zaber Technologies Inc. Adjustable magnetic counterbalance
WO2020167939A1 (en) * 2019-02-14 2020-08-20 Persimmon Technologies Corporation Magnetically guided material handling robot
CN113137448B (zh) * 2021-04-21 2022-06-10 四川省建筑科学研究院有限公司 工业设备用抗振平台
CN115881403B (zh) * 2023-02-23 2023-05-16 广东南桂起重机械有限公司 一种抗摔防震变压器油箱

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JPS5961132A (ja) * 1982-09-30 1984-04-07 Fujitsu Ltd 電子ビ−ム露光装置
JPH0427696A (ja) * 1990-05-21 1992-01-30 Mitsubishi Heavy Ind Ltd ヘリコプタの防振機構
US5157296A (en) * 1990-12-20 1992-10-20 Massachusetts Institute Of Technology Bearing for use in high resolution precision control device
JP3182158B2 (ja) 1991-02-25 2001-07-03 キヤノン株式会社 露光装置用のステージ支持装置
US5159219A (en) * 1991-05-16 1992-10-27 University Of Houston-University Park Opposed-magnet bearing with interposed superconductor
US5196745A (en) * 1991-08-16 1993-03-23 Massachusetts Institute Of Technology Magnetic positioning device
JP3036297B2 (ja) * 1993-06-04 2000-04-24 神鋼電機株式会社 自動搬送車両
JPH07115056A (ja) 1993-10-15 1995-05-02 Canon Inc 縦型基板ステージ装置
JPH07267192A (ja) * 1994-03-29 1995-10-17 Mitsubishi Heavy Ind Ltd ヘリコプタ
JP3363662B2 (ja) 1994-05-19 2003-01-08 キヤノン株式会社 走査ステージ装置およびこれを用いた露光装置
JPH08270725A (ja) 1995-03-28 1996-10-15 Agency Of Ind Science & Technol 反発型磁気ダンパ、反発型磁気アクチュエータ及び反発型磁気防振台
JP3815750B2 (ja) 1995-10-09 2006-08-30 キヤノン株式会社 ステージ装置、ならびに前記ステージ装置を用いた露光装置およびデバイス製造方法
JPH09289155A (ja) * 1996-04-19 1997-11-04 Nikon Corp 走査型露光装置
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US5990587A (en) * 1997-06-27 1999-11-23 New Jersey Institute Of Technology Low friction, high precision actuator
JPH11191585A (ja) 1997-12-26 1999-07-13 Canon Inc ステージ装置、およびこれを用いた露光装置、ならびにデバイス製造方法
US6082719A (en) * 1998-05-12 2000-07-04 Trw Inc. Spacecraft antenna vibration control damper
US6621556B2 (en) * 2000-02-28 2003-09-16 Nikon Corporation Projection exposure apparatus and manufacturing and adjusting methods thereof
US6496248B2 (en) * 2000-12-15 2002-12-17 Nikon Corporation Stage device and exposure apparatus and method
JP4745556B2 (ja) * 2001-08-20 2011-08-10 キヤノン株式会社 位置決め装置、露光装置、及びデバイス製造方法
US7034973B2 (en) * 2002-03-22 2006-04-25 Ricoh Company, Ltd. Scanning optical system, optical scanning device, and image forming apparatus
JP4323759B2 (ja) 2002-05-27 2009-09-02 キヤノン株式会社 露光装置およびデバイス製造方法

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