JP2004238304A5 - - Google Patents
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- Publication number
- JP2004238304A5 JP2004238304A5 JP2003027161A JP2003027161A JP2004238304A5 JP 2004238304 A5 JP2004238304 A5 JP 2004238304A5 JP 2003027161 A JP2003027161 A JP 2003027161A JP 2003027161 A JP2003027161 A JP 2003027161A JP 2004238304 A5 JP2004238304 A5 JP 2004238304A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- general formula
- ring
- different
- same
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 125000000217 alkyl group Chemical group 0.000 claims 4
- 125000003710 aryl alkyl group Chemical group 0.000 claims 4
- 125000003118 aryl group Chemical group 0.000 claims 4
- 125000000753 cycloalkyl group Chemical group 0.000 claims 4
- 150000001875 compounds Chemical class 0.000 claims 3
- 239000002253 acid Substances 0.000 claims 2
- 239000003513 alkali Substances 0.000 claims 2
- 125000002947 alkylene group Chemical group 0.000 claims 2
- 125000005842 heteroatom Chemical group 0.000 claims 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 2
- 125000001424 substituent group Chemical group 0.000 claims 2
- 230000005855 radiation Effects 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003027161A JP4418634B2 (ja) | 2003-02-04 | 2003-02-04 | 化合物、該化合物を含有するポジ型レジスト組成物及び該ポジ型レジスト組成物を用いたパターン形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003027161A JP4418634B2 (ja) | 2003-02-04 | 2003-02-04 | 化合物、該化合物を含有するポジ型レジスト組成物及び該ポジ型レジスト組成物を用いたパターン形成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004238304A JP2004238304A (ja) | 2004-08-26 |
| JP2004238304A5 true JP2004238304A5 (enExample) | 2005-09-22 |
| JP4418634B2 JP4418634B2 (ja) | 2010-02-17 |
Family
ID=32954981
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003027161A Expired - Fee Related JP4418634B2 (ja) | 2003-02-04 | 2003-02-04 | 化合物、該化合物を含有するポジ型レジスト組成物及び該ポジ型レジスト組成物を用いたパターン形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4418634B2 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI368825B (en) | 2004-07-07 | 2012-07-21 | Fujifilm Corp | Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same |
| JP4740666B2 (ja) * | 2004-07-07 | 2011-08-03 | 富士フイルム株式会社 | 液浸露光用ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4181760B2 (ja) * | 2000-06-09 | 2008-11-19 | 富士フイルム株式会社 | ポジ型フォトレジスト組成物 |
| JP2002169293A (ja) * | 2000-12-05 | 2002-06-14 | Fuji Photo Film Co Ltd | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| JP4243029B2 (ja) * | 2001-02-05 | 2009-03-25 | 富士フイルム株式会社 | ポジ型化学増幅レジスト組成物 |
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2003
- 2003-02-04 JP JP2003027161A patent/JP4418634B2/ja not_active Expired - Fee Related