JP2004217986A - Silver alloy for reflection film of optical recording medium - Google Patents
Silver alloy for reflection film of optical recording medium Download PDFInfo
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- JP2004217986A JP2004217986A JP2003005732A JP2003005732A JP2004217986A JP 2004217986 A JP2004217986 A JP 2004217986A JP 2003005732 A JP2003005732 A JP 2003005732A JP 2003005732 A JP2003005732 A JP 2003005732A JP 2004217986 A JP2004217986 A JP 2004217986A
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- silver alloy
- optical recording
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Abstract
Description
【0001】
【発明の属する技術分野】
本発明は、光記録媒体の反射膜の構成材料として好適な銀合金に関する。特に、長期の使用においても反射率の低下を抑制することができる反射膜用の銀合金に関する。
【0002】
【従来の技術】
CD−ROM、DVD−ROM等の光記録媒体は、通常、基板上に記録層、反射膜層、保護層(オーバーコート)とからなる。この反射膜には古くはコスト面、反射率を考慮してアルミニウム合金が用いられてきたが、光記録媒体の主流が追記・書換型の媒体(CD−R/RW、DVD−R/RW/RAM)へ推移するに伴いより高反射率の材料の適用が求められている。これは、追記・書換型媒体の記録層の構成材料として有機色素材料が広く用いられるようなっており、有機色素材料では光ビームの減衰が大きくなるため、反射膜の反射率を向上させることによりこの減衰を補足しようとすることによる。
【0003】
反射率の観点から、光記録媒体の反射膜の材料として適用されているのが銀である。銀は反射率が高い上に、同じく高反射率を有する金よりも安価であることから好適な材料である。しかし、銀は耐酸化性、耐硫化性に乏しく、酸化、硫化により腐食し黒色に変色して反射率を低下させるという問題がある。とりわけ銀は、追記・書換型の光記録媒体の記録層で適用される有機色素材料に対しては耐食性が悪く長期間の使用により反射率の低下がみられるという問題がある。
【0004】
そして、光記録媒体の使用に伴う反射率低下の問題に対応すべく、従来から、反射率を確保しつつ耐食性を向上させた銀合金を反射膜として適用した光記録媒体の開発が行われている。これらの多くは銀を主成分として、これに種々の添加元素を1種又は2種以上添加するものであり、例えば、銀に0.5〜4.9原子%のパラジウム及び又は銅を添加したもの等が開示されている。そして、これらの銀合金は、耐食性が良好で使用環境下でも反射率を維持することができ、反射膜に好適であるとしている(これらの先行技術の詳細については、特許文献1を参照)。
【0005】
【特許文献1】特開2000−109943号公報
【0006】
以上の銀合金については、耐食性について一応の改善はみられる。しかし、光記録媒体のより安定的な使用を実現するためには、より耐食性が高く反射率を維持できる材料が求められる。
【0007】
また、光記録装置の分野では、現在のところ記録用光源としては赤色の半導体レーザー(波長650nm)が適用されているが、最近になって青色レーザー(波長405nm)の実用化の見通しが立ってきている。この青色レーザーを適用すると、現在の光記録装置の5〜6倍の記憶容量が確保できることから、次世代の光記録装置は青色レーザーを適用したものが主流になると考えられている。ここで、本発明者等によれば、反射膜の反射率の変化は照射するレーザーの波長により異なることが確認されており、特に短波長のレーザー照射に対しては腐食の有無に関わらず反射率が低下し、腐食による反射率低下も長波長レーザー照射の場合よりも顕著になることが多いことが確認されている。従って、今後の記録用光源の推移に対応可能な記録媒体を製造する為には、短波長域のレーザー照射に対しても高反射率を有し、更に実用範囲の維持が可能な材料の開発が望まれる。
【0008】
【発明が解決しようとする課題】
本発明は以上のような背景の下になされたものであり、光記録媒体の反射膜を構成する銀合金であって、長期の使用によっても反射率を低下させること無く機能することのできる反射膜用の材料を提供することを目的とする。また、短波長のレーザー光に対しても高い反射率を有する材料を提供する。
【0009】
【課題を解決するための手段】
かかる課題を解決すべく、本発明者等は従来技術と同様、銀を主体とする反射膜用材料を見出すこととした。銀を主成分とするのは、上記のような銀の有する利点(高反射率、低コスト)を考慮したからである。そして、本発明者等は、銀合金に耐食性を付与する手法として、酸化物、硫化物を生成し難い元素を添加元素として添加することとした。この酸化物、硫化物を生成し難い元素としては、硫化物生成自由エネルギー及び酸化物生成自由エネルギーの大きい元素が考えられる。そこで、本発明者等は、各種元素の硫化物生成自由エネルギー及び酸化物生成自由エネルギーの対比検討、及び、それにより好ましいと思われた元素を合金化した銀合金の耐食性の検討を行なった。その結果、本発明者等は、銀を主成分とし、第1及び第2の添加元素を含む以下の銀合金が反射膜用の材料として好適であることを見出した。
【0010】
即ち、本願第1の銀合金は、第1の添加元素としてアンチモンを、第2の添加元素として錫を含んでなる反射膜用の銀合金である。また、本願第2の銀合金は、第1の添加元素として金を、第2添加元素としてイットリウムを含んでなる反射膜用の銀合金である。更に、本願第3の銀合金は、第1の添加元素として金を、第2の添加元素としてアルミニウムを含んでなる反射膜用の銀合金である。
【0011】
本発明で添加元素として添加されるアンチモン、錫、金、イットリウム、アルミニウムは、耐硫化性及び/又は耐酸化性において優れた特性を発揮する元素である。これらの添加元素を含む銀合金より反射膜を形成する場合、これらの添加元素は、反射膜表面及び内部に広範に均一分散し、これが主成分たる銀の腐食を抑制することとなる。また、添加元素のうち、金を除くアンチモン、錫、イットリウム、アルミニウムは、耐酸化性を有しているとはいえ全く酸化しないわけではない。しかし、これら添加元素のわずかな酸化は、反射膜表面の保護膜として作用するため、これによっても銀の腐食を抑制することとなる。
【0012】
ここで、本発明において添加元素の含有量は、各添加元素いずれも0.1〜5重量%の濃度とするのが好ましい。0.1未満の添加量では、耐食性向上の効果がなく、また、添加元素濃度が5%を超えると、成膜直後の反射率が20%以上も低下することがあるからである。
【0013】
本発明に係る反射膜材料用の銀合金は、いずれも溶解鋳造法により製造可能である。この溶解鋳造法による製造においては特段に困難な点はなく、各原料を秤量し、溶融混合して鋳造する一般的な方法により製造可能である。
【0014】
本発明に係る銀合金は、反射膜として好ましい特性を有し、使用過程において反射率の低下が抑制されている。また、後述のように、短波長のレーザー光照射下においても、従来の反射膜用材料よりも良好な反射率及びその維持を示す。そして、上記のように光記録媒体の反射膜の製造においてはスパッタリング法が一般に適用されている。従って、本発明に係る銀合金からなるスパッタリングターゲットは好ましい特性を有する反射膜を備える光記録媒体を製造することができる。
【0015】
【発明の実施の形態】
以下、本発明の好適な実施形態を比較例と共に説明する。
【0016】
実施例1:ここでは、銀合金としてAg−1.1重量%Sb−0.6重量%Sn組成のターゲットを製造して、これをもとにスパッタリング法にて薄膜を形成した。そして、この薄膜について種々の環境下での腐食試験(加速試験)を行い、腐食試験後の反射率の変化について検討した。
【0017】
銀合金の製造は、各金属を所定濃度になるように秤量し、高周波溶解炉中で溶融させて混合して合金とする。そして、これを鋳型に鋳込んで凝固させインゴットとし、これを鍛造、圧延、熱処理した後、成形してスパッタリングターゲットとした。
【0018】
薄膜の製造は、基板(ホウ珪酸ガラス)及びターゲットをスパッタリング装置に設置し、装置内を5.0×10−3Paまで真空に引いた後、アルゴンガスを5.0×10−1Paまで導入した。スパッタリング条件は、直流1kWで1分間の成膜を行ない、膜厚を1000Åとした。尚、膜厚分布は±10%以内であった。
【0019】
実施例2:この実施例では、銀合金としてAg−0.7重量%Au−0.8重量%Y組成のターゲットを製造し、この組成の薄膜を形成した。そして、この薄膜についての腐食試験を行い、腐食試験後の反射率の変化について検討した。尚、銀合金の製造工程、薄膜の製造工程については実施例1と同様である。
【0020】
実施例3:この実施例では、銀合金としてAg−0.4重量%Au−1.0重量%Al組成のターゲットを製造し、この組成の薄膜を形成した。そして、この薄膜についての腐食試験を行い、腐食試験後の反射率の変化について検討した。銀合金の製造工程、薄膜の製造工程については実施例1、2と同様である。
【0021】
比較例:各実施例に係る銀合金に対する比較として、上記特許文献1記載の銀合金であるAg−1.0重量%Pd−1.0重量%Cu、及び、本発明と同様の目的で開発されているAg−1.0重量%Au−1.0重量%Znの2種類の銀合金金からなるターゲットから薄膜を製造して腐食試験を行い、同じく反射率の変化を測定した。
【0022】
薄膜の腐食試験は、薄膜を下記の各環境中に暴露し、分光光度計にて波長を変化させつつ試験後の薄膜の反射率を測定することにより行い、成膜直後の銀の反射率を基準としてその変化を検討した。
【0023】
▲1▼大気中で250℃で2時間加熱
薄膜をホットプレート上に載置し、上記温度、時間にて加熱した。この試験環境は、薄膜の耐酸化性を検討するためのものである。
▲2▼高湿度環境中で暴露
薄膜を80℃−湿度90%の高湿度環境中に暴露した。この試験環境は、薄膜の耐湿性を検討するためのものである。
▲3▼アルカリ溶液中に浸漬
薄膜を3%水酸化ナトリウム溶液(温度30℃)に10分間浸漬した。この試験環境は、薄膜の耐アルカリ性を検討するためのものである。
▲4▼硫化物溶液中に浸漬
薄膜を0.01%の硫化ナトリウムを含有する水溶液中(温度25℃)に1時間浸漬した。この試験は、薄膜の耐硫化性を検討するためのものである。
【0024】
この実施例の腐食試験の結果を表1〜表3に示す。これらの表で示す反射率は、銀の成膜直後の反射率を100とした相対値である。また、各測定値は、波長650nm、560nm、400nm(各々、赤色、黄色、青色レーザーの波長に相当する。)における反射率である。
【0025】
【表1】
【0026】
【表2】
【0027】
【表3】
【0028】
この結果から、まず、全体的な傾向として、入射光波長が短くなると反射率の低下がみられ、これは成膜直後の腐食試験なしの薄膜についても同様となっている。そして、反射膜としての合否判断の基準として一般に用いられている数値である60(銀の反射率を100とする)を基準としてみると、各実施例に係る銀合金よりなる薄膜はいずれの環境下においてもこの基準をクリアしている。一方、比較例として検討した従来の銀合金薄膜は、概ねこの基準をクリアしているが、腐食環境によってはこの基準を下回ることがある。また、実施例2(Ag−Au−Y合金)、実施例3(Ag−Au−Al合金)と比較すると全体的に低めの数値(反射率)となっている。以上から、各実施形態に係る銀合金薄膜は反射膜として適性を有することが確認された。
【0029】
【発明の効果】
以上説明したように、本発明に係る銀合金は、各種の腐食環境下においても従来技術より耐食性に優れている。本発明により製造される反射膜は、使用過程における反射率の低下が抑制されており、これにより光記録媒体の寿命を長期化できる。また、本発明に係る銀合金は、短波長のレーザー光照射下においても、従来の反射膜用材料よりも良好な反射率及びその維持を示す。従って、今後の主流となるであろう短波長レーザーを光源とする光記録装置用の記録媒体にも対応可能である。[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a silver alloy suitable as a constituent material of a reflection film of an optical recording medium. In particular, the present invention relates to a silver alloy for a reflective film that can suppress a decrease in reflectance even in long-term use.
[0002]
[Prior art]
An optical recording medium such as a CD-ROM or a DVD-ROM usually includes a recording layer, a reflective layer, and a protective layer (overcoat) on a substrate. Aluminum alloys have long been used for this reflective film in consideration of cost and reflectivity, but the mainstream of optical recording media is write-once / rewritable media (CD-R / RW, DVD-R / RW / With the transition to RAM), application of materials having higher reflectivity is required. This is because an organic dye material is widely used as a constituent material of a recording layer of a write-once / rewritable medium, and the attenuation of a light beam is increased in the organic dye material. By trying to supplement this attenuation.
[0003]
From the viewpoint of reflectance, silver is used as a material of the reflective film of the optical recording medium. Silver is a preferred material because it has a high reflectivity and is less expensive than gold, which also has a high reflectivity. However, silver has poor oxidation resistance and sulfidation resistance, and has a problem in that it is corroded by oxidation and sulfidation, changes color to black, and lowers the reflectance. In particular, silver has a problem that the organic dye material used in the recording layer of the write-once / rewritable type optical recording medium has poor corrosion resistance, and the reflectance is reduced after long-term use.
[0004]
In order to respond to the problem of a decrease in reflectance due to the use of an optical recording medium, an optical recording medium in which a silver alloy having improved corrosion resistance while securing the reflectance is applied as a reflective film has been developed. I have. Many of them contain silver as a main component and one or two or more kinds of additional elements added thereto. For example, 0.5 to 4.9 atomic% of palladium and / or copper is added to silver. And others are disclosed. These silver alloys are said to have good corrosion resistance and to be able to maintain reflectivity even in a use environment, and are suitable for a reflective film (see Patent Document 1 for details of these prior arts).
[0005]
[Patent Document 1] Japanese Patent Application Laid-Open No. 2000-109943
For the silver alloys described above, there is some improvement in corrosion resistance. However, in order to realize more stable use of the optical recording medium, a material that has higher corrosion resistance and can maintain the reflectance is required.
[0007]
In the field of optical recording devices, a red semiconductor laser (wavelength: 650 nm) is currently used as a recording light source, but the prospect of practical use of a blue laser (wavelength: 405 nm) has recently emerged. ing. When this blue laser is applied, a storage capacity 5 to 6 times as large as that of the current optical recording device can be secured. Therefore, it is considered that the next-generation optical recording device using the blue laser will be the mainstream. Here, according to the present inventors, it has been confirmed that the change in the reflectivity of the reflective film differs depending on the wavelength of the laser to be irradiated, and particularly in the case of short-wavelength laser irradiation, the reflection does not depend on the presence or absence of corrosion. It has been confirmed that the reflectance decreases, and the decrease in reflectance due to corrosion often becomes more remarkable than in the case of long-wavelength laser irradiation. Therefore, in order to manufacture a recording medium that can respond to changes in the recording light source in the future, it is necessary to develop a material that has a high reflectance even with laser irradiation in a short wavelength range and can maintain a practical range. Is desired.
[0008]
[Problems to be solved by the invention]
The present invention has been made under the above background, and is a silver alloy constituting a reflective film of an optical recording medium, which can function without reducing the reflectance even after long-term use. An object is to provide a material for a membrane. Further, the present invention provides a material having a high reflectance with respect to short-wavelength laser light.
[0009]
[Means for Solving the Problems]
In order to solve this problem, the present inventors have found a material for a reflective film mainly composed of silver as in the prior art. The reason why silver is used as a main component is that the above advantages (high reflectance and low cost) of silver are considered. Then, the present inventors have decided to add an element which hardly generates oxides and sulfides as an additive element as a technique for imparting corrosion resistance to the silver alloy. As the element which hardly generates oxides and sulfides, an element having large sulfide generation free energy and oxide generation free energy can be considered. Thus, the present inventors conducted a comparative study of the free energy of sulfide formation and the free energy of oxide formation of various elements, and also studied the corrosion resistance of a silver alloy obtained by alloying elements considered to be preferable. As a result, the present inventors have found that the following silver alloys containing silver as a main component and containing the first and second additional elements are suitable as materials for the reflection film.
[0010]
That is, the first silver alloy of the present application is a silver alloy for a reflective film containing antimony as a first additive element and tin as a second additive element. The second silver alloy of the present application is a silver alloy for a reflection film containing gold as a first additive element and yttrium as a second additive element. Further, the third silver alloy of the present application is a silver alloy for a reflective film containing gold as a first additive element and aluminum as a second additive element.
[0011]
Antimony, tin, gold, yttrium, and aluminum added as additional elements in the present invention are elements exhibiting excellent characteristics in sulfuration resistance and / or oxidation resistance. When a reflective film is formed from a silver alloy containing these additional elements, these additional elements are widely and uniformly dispersed on the surface and inside of the reflective film, thereby suppressing corrosion of silver as a main component. Of the additional elements, antimony, tin, yttrium, and aluminum, excluding gold, are not oxidized at all even though they have oxidation resistance. However, slight oxidation of these additional elements acts as a protective film on the surface of the reflective film, which also suppresses silver corrosion.
[0012]
Here, in the present invention, the content of the additional element is preferably set to a concentration of 0.1 to 5% by weight for each of the additional elements. If the addition amount is less than 0.1, there is no effect of improving the corrosion resistance, and if the addition element concentration exceeds 5%, the reflectivity immediately after film formation may decrease by 20% or more.
[0013]
Any of the silver alloys for a reflective film material according to the present invention can be manufactured by a melt casting method. There is no particular difficulty in the production by the melting and casting method, and it is possible to produce by a general method of weighing each material, mixing and casting.
[0014]
The silver alloy according to the present invention has preferable characteristics as a reflective film, and a decrease in reflectance during use is suppressed. In addition, as described later, even under irradiation with a short-wavelength laser beam, it shows a better reflectivity than a conventional reflective film material and maintains the same. As described above, the sputtering method is generally applied in the production of the reflection film of the optical recording medium. Therefore, the sputtering target made of the silver alloy according to the present invention can manufacture an optical recording medium having a reflective film having preferable characteristics.
[0015]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, preferred embodiments of the present invention will be described together with comparative examples.
[0016]
Example 1 Here, a target having a composition of Ag-1.1% by weight Sb-0.6% by weight Sn was manufactured as a silver alloy, and a thin film was formed based on the target by a sputtering method. The thin film was subjected to a corrosion test (accelerated test) under various environments, and the change in reflectance after the corrosion test was examined.
[0017]
In the production of a silver alloy, each metal is weighed so as to have a predetermined concentration, melted in a high-frequency melting furnace and mixed to form an alloy. Then, this was cast into a mold and solidified to form an ingot, which was forged, rolled, and heat-treated, and then formed into a sputtering target.
[0018]
For the production of a thin film, a substrate (borosilicate glass) and a target are placed in a sputtering apparatus, and the inside of the apparatus is evacuated to 5.0 × 10 −3 Pa, and then argon gas is supplied to 5.0 × 10 −1 Pa. Introduced. The sputtering conditions were such that a film was formed at a direct current of 1 kW for 1 minute, and the film thickness was 1000 °. In addition, the film thickness distribution was within ± 10%.
[0019]
Example 2 In this example, a target having a composition of Ag-0.7% by weight, Au-0.8% by weight, and Y was manufactured as a silver alloy, and a thin film of this composition was formed. Then, a corrosion test was performed on the thin film, and a change in reflectance after the corrosion test was examined. Note that the manufacturing process of the silver alloy and the manufacturing process of the thin film are the same as those in the first embodiment.
[0020]
Example 3 In this example, a target having a composition of Ag-0.4 wt% Au-1.0 wt% Al was manufactured as a silver alloy, and a thin film of this composition was formed. Then, a corrosion test was performed on the thin film, and a change in reflectance after the corrosion test was examined. The manufacturing steps of the silver alloy and the thin film are the same as in the first and second embodiments.
[0021]
Comparative Example : As a comparison with the silver alloy according to each example, Ag-1.0% by weight Pd-1.0% by weight Cu, which is a silver alloy described in Patent Document 1, and developed for the same purpose as the present invention. Thin films were manufactured from targets made of two types of silver alloy gold, Ag-1.0% by weight, Au-1.0% by weight, and a corrosion test was performed, and a change in reflectance was measured in the same manner.
[0022]
The corrosion test of the thin film is performed by exposing the thin film to the following environments and measuring the reflectance of the thin film after the test while changing the wavelength with a spectrophotometer. The change was examined as a criterion.
[0023]
{Circle around (1)} The thin film was heated at 250 ° C. in the atmosphere for 2 hours, placed on a hot plate, and heated at the above temperature and time. This test environment is for examining the oxidation resistance of the thin film.
{Circle around (2)} Exposure in a high humidity environment The thin film was exposed in a high humidity environment of 80 ° C. and 90% humidity. This test environment is for examining the moisture resistance of the thin film.
{Circle around (3)} Immersion in alkaline solution The thin film was immersed in a 3% sodium hydroxide solution (temperature: 30 ° C.) for 10 minutes. This test environment is for examining the alkali resistance of the thin film.
(4) Immersion in sulfide solution The thin film was immersed in an aqueous solution containing 0.01% sodium sulfide (at a temperature of 25 ° C.) for 1 hour. This test is for examining the sulfidation resistance of the thin film.
[0024]
Tables 1 to 3 show the results of the corrosion test of this example. The reflectances shown in these tables are relative values with the reflectance immediately after silver film formation being 100. Each measured value is a reflectance at a wavelength of 650 nm, 560 nm, and 400 nm (corresponding to the wavelengths of red, yellow, and blue lasers, respectively).
[0025]
[Table 1]
[0026]
[Table 2]
[0027]
[Table 3]
[0028]
From this result, first, as a general tendency, a decrease in the reflectance is observed when the wavelength of the incident light is shortened, and the same is true for the thin film immediately after film formation without a corrosion test. When the value of 60 (the reflectance of silver is assumed to be 100), which is generally used as a criterion for judging the pass / fail of the reflective film, is used as a reference, the thin film made of the silver alloy according to each embodiment can be used in any environment. We have cleared this standard below. On the other hand, the conventional silver alloy thin film studied as a comparative example generally satisfies this criterion, but may fall below this criterion depending on the corrosive environment. In addition, compared to Example 2 (Ag-Au-Y alloy) and Example 3 (Ag-Au-Al alloy), the numerical value (reflectance) was lower as a whole. From the above, it was confirmed that the silver alloy thin film according to each embodiment was suitable as a reflective film.
[0029]
【The invention's effect】
As described above, the silver alloy according to the present invention has better corrosion resistance than the related art even under various corrosive environments. In the reflective film manufactured according to the present invention, a decrease in the reflectance during the use process is suppressed, whereby the life of the optical recording medium can be prolonged. In addition, the silver alloy according to the present invention shows better reflectance than a conventional material for a reflective film and maintains the same even under irradiation with a short-wavelength laser beam. Therefore, the present invention can be applied to a recording medium for an optical recording apparatus using a short wavelength laser as a light source, which will be the mainstream in the future.
Claims (5)
第1の添加元素としてアンチモンを、第2の添加元素として錫を含んでなる光記録媒体の反射膜用の銀合金。A silver alloy for a reflective film of an optical recording medium containing silver as a main component and containing a first additive element and a second additive element,
A silver alloy for a reflection film of an optical recording medium, comprising antimony as a first additive element and tin as a second additive element.
第1の添加元素として金を、第2の添加元素としてイットリウムを含んでなる光記録媒体の反射膜用の銀合金。A silver alloy for a reflective film of an optical recording medium containing silver as a main component and containing a first additive element and a second additive element,
A silver alloy for a reflective film of an optical recording medium, comprising gold as a first additive element and yttrium as a second additive element.
第1の添加元素として金を、第2の添加元素としてアルミニウムを含んでなる光記録媒体の反射膜用の銀合金。A silver alloy for a reflective film of an optical recording medium containing silver as a main component and containing a first additive element and a second additive element,
A silver alloy for a reflective film of an optical recording medium, comprising gold as a first additive element and aluminum as a second additive element.
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7713608B2 (en) * | 2005-07-22 | 2010-05-11 | Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) | Silver alloy reflective films for optical information recording media, silver alloy sputtering targets therefor, and optical information recording media |
JP2014005503A (en) * | 2012-06-25 | 2014-01-16 | Mitsubishi Materials Corp | Ag ALLOY CONDUCTIVE FILM AND SPUTTERING TARGET FOR FORMING FILM |
CN103958727A (en) * | 2012-01-13 | 2014-07-30 | 三菱综合材料株式会社 | Silver-alloy sputtering target for conductive-film formation, and method for producing same |
JP2016184507A (en) * | 2015-03-26 | 2016-10-20 | 三菱マテリアル株式会社 | Ag ALLOY FILM AND MANUFACTURING METHOD OF Ag ALLOY FILM |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7713608B2 (en) * | 2005-07-22 | 2010-05-11 | Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) | Silver alloy reflective films for optical information recording media, silver alloy sputtering targets therefor, and optical information recording media |
CN103958727A (en) * | 2012-01-13 | 2014-07-30 | 三菱综合材料株式会社 | Silver-alloy sputtering target for conductive-film formation, and method for producing same |
JP2014005503A (en) * | 2012-06-25 | 2014-01-16 | Mitsubishi Materials Corp | Ag ALLOY CONDUCTIVE FILM AND SPUTTERING TARGET FOR FORMING FILM |
JP2016184507A (en) * | 2015-03-26 | 2016-10-20 | 三菱マテリアル株式会社 | Ag ALLOY FILM AND MANUFACTURING METHOD OF Ag ALLOY FILM |
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