JP2004212900A - Method for manufacturing pattern formation body - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a pattern formation body that can form a high-definition pattern at low cost and with good manufacturing efficiency and that can use a non-parallel light source. <P>SOLUTION: For the above purpose, a substrate for a pattern formation body which has a transparent base material, a characteristics variance layer formed on the transparent base material that varies in characteristics by irradiation with light of ≤200 nm in wavelength and a light blocking part formed in a pattern shape are irradiated with the light of ≤200 nm in wavelength from the side of the transparent base material to obtain the pattern formation body having a pattern such that the characteristics variance layer varies. <P>COPYRIGHT: (C)2004,JPO&NCIPI

Description

【００４７】
ただし、ｎは２以上の整数であり、Ｒ^１，Ｒ^２はそれぞれ炭素数１〜１０の置換もしくは非置換のアルキル、アルケニル、アリールあるいはシアノアルキル基であり、モル比で全体の４０％以下がビニル、フェニル、ハロゲン化フェニルである。また、Ｒ^１、Ｒ^２がメチル基のものが表面エネルギーが最も小さくなるので好ましく、モル比でメチル基が６０％以上であることが好ましい。また、鎖末端もしくは側鎖には、分子鎖中に少なくとも１個以上の水酸基等の反応性基を有する。
【００４８】
また、上記のオルガノポリシロキサンとともに、ジメチルポリシロキサンのような架橋反応をしない安定なオルガノシリコーン化合物を混合してもよい。
【００４９】
本発明においては、このようにオルガノポリシロキサン等の種々の材料を濡れ性変化層に用いることができるのであるが、上述したように、濡れ性変化層にフッ素を含有させることが、濡れ性のパターン形成に効果的である。したがって、光の作用により劣化・分解しにくい材料にフッ素を含有させる、具体的にはオルガノポリシロキサン材料にフッ素を含有させて濡れ性変化層とすることが好ましいといえる。
【００５０】
このように、オルガノポリシロキサン材料にフッ素を含有させる方法としては、通常高い結合エネルギーを有する主剤に対し、フッ素化合物を比較的弱い結合エネルギーで結合させる方法、比較的弱い結合エネルギーで結合されたフッ素化合物を濡れ性変化層に混入させる方法等を挙げることができる。このような方法でフッ素を導入することにより、露光された場合に、まず結合エネルギーが比較的小さいフッ素結合部位が分解され、これによりフッ素を濡れ性変化層中から除去することができるからである。
【００５１】
上記第１の方法、すなわち、高い結合エネルギーを有するバインダに対し、フッ素化合物を比較的弱い結合エネルギーで結合させる方法としては、上記オルガノポリシロキサンにフルオロアルキル基を置換基として導入する方法等を挙げることができる。
【００５２】
例えば、オルガノポリシロキサンを得る方法として、上記（１）として記載したように、ゾルゲル反応等によりクロロまたはアルコキシシラン等を加水分解、重縮合して大きな強度を発揮するオルガノポリシロキサンを得ることができる。ここで、この方法においては、上述したように上記一般式：
Ｙ_ｎＳｉＸ_{（４−ｎ）}
（ここで、Ｙはアルキル基、フルオロアルキル基、ビニル基、アミノ基、フェニル基またはエポキシ基を示し、Ｘはアルコキシル基、アセチル基またはハロゲンを示す。ｎは０〜３までの整数である。）
で示されるシラン化合物の１種または２種以上を、加水分解縮合物もしくは共加水分解縮合することによりオルガノポリシロキサンを得るのであるが、この一般式において、置換基Ｙとしてフルオロアルキル基を有するシラン化合物を用いて合成することにより、フルオロアルキル基を置換基として有するオルガノポリシロキサンを得ることができる。このようなフルオロアルキル基を置換基として有するオルガノポリシロキサンをバインダとして用いた場合には、上述したように、上記波長の光の照射により、容易にフルオロアルキル基の炭素結合の部分を分解することができ、効率よく濡れ性変化層表面における露光した部分のフッ素含有量を低減させることができる。
【００５３】
この際用いられるフルオロアルキル基を有するシラン化合物としては、フルオロアルキル基を有するものであれば特に限定されるものではないが、少なくとも１個のフルオロアルキル基を有し、このフルオロアルキル基の炭素数が４から３０、好ましくは６から２０、特に好ましくは６から１６であるシラン化合物が好適に用いられる。このようなシラン化合物の具体例は上述した通りであるが、中でも炭素数が６から８であるフルオロアルキル基を有する上記シラン化合物、すなわちフルオロアルキルシランが好ましい。
【００５４】
本発明においては、このようなフルオロアルキル基を有するシラン化合物を上述したフルオロアルキル基を有さないシラン化合物と混合して用い、これらの共加水分解縮合物を上記オルガノポリシロキサンとして用いてもよいし、このようなフルオロアルキル基を有するシラン化合物を１種または２種以上用い、これらの加水分解縮合物、共加水分解縮合物を上記オルガノポリシロキサンとして用いてもよい。
【００５５】
このようにして得られるフルオロアルキル基を有するオルガノポリシロキサンにおいては、このオルガノポリシロキサンを構成するシラン化合物の内、上記フルオロアルキル基を有するシラン化合物が０．０１モル％以上、好ましくは０．１モル％以上含まれていることが好ましい。
【００５６】
フルオロアルキル基がこの程度含まれることにより、濡れ性変化層上の撥液性を高くすることができ、露光して親液性領域とした部分との濡れ性の差異を大きくすることができるからである。
【００５７】
また、上記（２）に示す方法では、撥液牲に優れた反応性シリコーンを架橋することによりオルガノポリシロキサンを得るのであるが、この場合も同様に、上述した一般式中のＲ^１，Ｒ^２のいずれかもしくは両方をフルオロアルキル基等のフッ素を含有する置換基とすることにより、濡れ性変化層中にフッ素を含ませることが可能であり、また露光された場合に、シロキサン結合より結合エネルギーの小さいフルオロアルキル基の部分が分解されるため、露光により濡れ性変化層表面におけるフッ素の含有量を低下させることができる。
【００５８】
一方、後者の例、すなわち、バインダの結合エネルギーより弱いエネルギーで結合したフッ素化合物を導入させる方法としては、例えば、低分子量のフッ素化合物を導入させる場合は、例えばフッ素系の界面活性剤を混入する方法等を挙げることができ、また高分子量のフッ素化合物を導入させる方法としては、バインダ樹脂との相溶性の高いフッ素樹脂を混合する等の方法を挙げることができる。
【００５９】
本発明における濡れ性変化層には、さらに界面活性剤を含有させることができる。具体的には、日光ケミカルズ（株）製ＮＩＫＫＯＬ ＢＬ、ＢＣ、ＢＯ、ＢＢの各シリーズ等の炭化水素系、デュポン社製ＺＯＮＹＬ ＦＳＮ、ＦＳＯ、旭硝子（株）製サーフロンＳ−１４１、１４５、大日本インキ化学工業（株）製メガファックＦ−１４１、１４４、ネオス（株）製フタージェントＦ−２００、Ｆ２５１、ダイキン工業（株）製ユニダインＤＳ−４０１、４０２、スリーエム（株）製フロラードＦＣ−１７０、１７６等のフッ素系あるいはシリコーン系の非イオン界面活性剤を挙げることができ、また、カチオン系界面活性剤、アニオン系界面活性剤、両性界面活性剤を用いることもできる。
【００６０】
また、濡れ性変化層には上記の界面活性剤の他にも、ポリビニルアルコール、不飽和ポリエステル、アクリル樹脂、ポリエチレン、ジアリルフタレート、エチレンプロピレンジエンモノマー、エポキシ樹脂、フェノール樹脂、ポリウレタン、メラミン樹脂、ポリカーボネート、ポリ塩化ビニル、ポリアミド、ポリイミド、スチレンブタジエンゴム、クロロプレンゴム、ポリプロピレン、ポリブチレン、ポリスチレン、ポリ酢酸ビニル、ポリエステル、ポリブタジエン、ポリベンズイミダゾール、ポリアクリルニトリル、エピクロルヒドリン、ポリサルファイド、ポリイソプレン等のオリゴマー、ポリマー等を含有させることができる。
【００６１】
このような濡れ性変化層は、上述した成分を必要に応じて他の添加剤とともに溶剤中に分散して塗布液を調製し、この塗布液を基板上に塗布することにより形成することができる。使用する溶剤としては、エタノール、イソプロパノール等のアルコール系の有機溶剤が好ましい。塗布はスピンコート、スプレーコート、ディッブコート、ロールコート、ビードコート等の公知の塗布方法により行うことができる。また、紫外線硬化型の成分を含有している場合、紫外線を照射して硬化処理を行うことにより濡れ性変化層を形成することができる。
【００６２】
本発明において、この濡れ性変化層の厚みは、上記の波長の光による作用における濡れ性の変化速度等の関係より、０．００１μｍから１μｍであることが好ましく、特に好ましくは０．０１〜０．１μｍの範囲内である。
【００６３】
本発明において上述した成分の濡れ性変化層を用いることにより、上記光の作用により、上記成分の一部である有機基や添加剤の酸化、分解等の作用を用いて、露光部の濡れ性を変化させて親液性とし、非露光部との濡れ性に大きな差を生じさせることができる。よって、機能性部用組成物、例えば画素部着色用のインク等との受容性（親液性）および反撥性（撥液性）を高めることによって、品質の良好でかつコスト的にも有利なカラーフィルタ等の機能性素子を得ることができるパターン形成体とすることができるのである。
【００６４】
また、本発明に用いられる濡れ性変化層は、表面の濡れ性が光の作用により変化し得る材料で形成されたものであれば、自己支持性を有する材料であってもよく、また自己支持性を有さない材料であってもよい。なお、本発明でいう自己支持性を有するとは、他の支持材無しで有形な状態で存在し得ることをいうこととする。
【００６５】
本発明においては、この自己支持性のない濡れ性変化層であることが好ましい。上述した特性が大幅に変化する材料で形成される濡れ性変化層は、通常自己支持性のある材料が少なく、透明基材上に形成することにより、強度等が増し、様々なパターン形成体として使用することが可能となるからである。
【００６６】
なお、本発明に用いられる濡れ性変化層は、特に、光触媒を含まない層であることが好ましい。このように濡れ性変化層内に光触媒が含まれなければ、その後パターン形成体を機能性素子として用いた場合に、経時的な光触媒の影響を心配する必要がなく、長期間に渡り問題なく使用することが可能だからである。
【００６７】
（分解除去層）
次に本発明に用いられる分解除去層について説明する。本発明に用いられる分解除去層は、上記波長の光の作用により、露光された部分の分解除去層が分解除去される層であれば、特に限定されるものではない。
【００６８】
このように分解除去層は、上記の光の作用により分解除去されることから、現像工程や洗浄工程を行うことなく分解除去層のある部分と無い部分とからなるパターン、すなわち凹凸を有するパターンを形成することができる。
【００６９】
なお、この分解除去層は、露光による光の作用により酸化分解され、気化等されることから、現像・洗浄工程等の特別な後処理なしに除去されるものであるが、分解除去層の材質によっては、洗浄工程等を行ってもよい。
【００７０】
また、本発明に用いられる分解除去層は、凹凸を形成するのみならず、この分解除去層が、上記透明基材表面と比較して、液体との接触角が高いことが好ましい。これにより、分解除去層が分解除去され、透明基材が露出した領域を親液性領域、上記分解除去層が残存する領域を撥液性領域とすることが可能となり、表面の凹凸および濡れ性の差を利用して、種々のパターンを形成することが可能となるからである。
【００７１】
ここで、本発明の分解除去層表面の液体との接触角は、表面張力４０ｍＮ／ｍの液体との接触角が１０゜以上、好ましくは表面張力３０ｍＮ／ｍの液体との接触角が１０゜以上、特に表面張力２０ｍＮ／ｍの液体との接触角が１０゜以上の値を示すことが好ましい。
【００７２】
また、本発明において、特性変化層が分解除去層である場合には、後述する透明基材が親液性であることが好ましく、具体的には、表面張力４０ｍＮ／ｍの液体との接触角として９゜以下であることが好ましく、さらに好ましくは、表面張力４０ｍＮ／ｍの液体との接触角として５゜以下、特に好ましくは１゜以下であることである。
【００７３】
分解除去層および透明基材の濡れ性が、上記範囲内であることにより、透明基材が露出した領域を親液性領域、分解除去層が残存する領域を撥液性領域とすることが可能となり、高精細なパターンの形成が容易となるからである。ここで、液体との接触角は、上述した方法により測定した値である。
【００７４】
この場合、後述する透明基材は表面を親液性となるように、表面処理したものであってもよい。透明基材の表面を親液性となるように表面処理した例としては、アルゴンや水などを利用したプラズマ処理による親液性表面処理が挙げられ、透明基材上に形成する親液性の層としては、例えばテトラエトキシシランのゾルゲル法によるシリカ膜等を挙げることができる。本発明においては、通常透明基材が露出した部分が親液性領域とされる。
【００７５】
また、上記のような分解除去層に用いることができる膜としては、具体的にはフッ素系や炭化水素系の撥液性を有する樹脂等による膜を挙げることができる。これらのフッ素系や炭化水素系の樹脂は、撥液性を有するものであれば、特に限定されるものではないが、本発明においては、中でもフルオロアルキル基を有するものであることが好ましい。上述したように、フルオロアルキル基は、上記波長の光の作用により発生した活性酸素種が作用しやすく、分解除去層の分解除去を効率よく行うことが可能となるからである。本発明の分解除去層は、これらの樹脂を溶媒に溶解させ、例としてスピンコート法等の一般的な成膜方法により形成することが可能である。
【００７６】
また、本発明においては、機能性薄膜、すなわち、自己組織化単分子膜、ラングミュア−ブロケット膜、および交互吸着膜等を用いることにより、欠陥のない膜を形成することが可能であることから、このような成膜方法を用いることがより好ましいといえる。
【００７７】
ここで、本発明に用いられる自己組織化単分子膜、ラングミュア−ブロジェット膜、および交互吸着膜について具体的に説明する。
【００７８】
（ｉ）自己組織化単分子膜
自己組織化単分子膜（Ｓｅｌｆ−Ａｓｓｅｍｂｌｅｄ Ｍｏｎｏｌａｙｅｒ）の公式な定義の存在を発明者らは知らないが、一般的に自己組織化膜として認識されているものの解説文としては、例えばＡｂｒａｈａｍ Ｕｌｍａｎによる総説“Ｆｏｒｍａｔｉｏｎ ａｎｄ Ｓｔｒｕｃｔｕｒｅ ｏｆ Ｓｅｌｆ−Ａｓｓｅｍｂｌｅｄ Ｍｏｎｏｌａｙｅｒｓ”， Ｃｈｅｍｉｃａｌ Ｒｅｖｉｅｗ， ９６， １５３３−１５５４ （１９９６）が優れている。本総説を参考にすれば、自己組織化単分子膜とは、適当な分子が適当な基板表面に吸着・結合（自己組織化）した結果生じた単分子層のことと言える。自己組織化膜形成能のある材料としては、例えば、脂肪酸などの界面活性剤分子、アルキルトリクロロシラン類やアルキルアルコキシド類などの有機ケイ素分子、アルカンチオール類などの有機イオウ分子、アルキルフォスフェート類などの有機リン酸分子などが挙げられる。分子構造の一般的な共通性は、比較的長いアルキル鎖を有し、片方の分子末端に基板表面と相互作用する官能基が存在することである。アルキル鎖の部分は分子同士が２次元的にパッキングする際の分子間力の源である。もっとも、ここに示した例は最も単純な構造であり、分子のもう一方の末端にアミノ基やカルボキシル基などの官能基を有するもの、アルキレン鎖の部分がオキシエチレン鎖のもの、フルオロカーボン鎖のもの、これらが複合したタイプの鎖のものなど様々な分子から成る自己組織化単分子膜が報告されている。また、複数の分子種から成る複合タイプの自己組織化単分子膜もある。また、最近では、デンドリマーに代表されるような粒子状で複数の官能基（官能基が一つの場合もある）を有する高分子や直鎖状（分岐構造のある場合もある）の高分子が一層基板表面に形成されたもの（後者はポリマーブラシと総称される）も自己組織化単分子膜と考えられる場合もあるようである。本発明は、これらも自己組織化単分子膜に含める。
【００７９】
（ｉｉ）ラングミュア−ブロジェット膜
本発明に用いられるラングミュア−ブロジェット膜（Ｌａｎｇｍｕｉｒ−Ｂｌｏｄｇｅｔｔ Ｆｉｌｍ）は、基板上に形成されてしまえば形態上は上述した自己組織化単分子膜との大きな相違はない。ラングミュア−ブロジェット膜の特徴はその形成方法とそれに起因する高度な２次元分子パッキング性（高配向性、高秩序性）にあると言える。すなわち、一般にラングミュア−ブロジェット膜形成分子は気液界面上に先ず展開され、その展開膜がトラフによって凝縮されて高度にパッキングした凝縮膜に変化する。実際は、これを適当な基板に移しとって用いる。ここに概略を示した手法により単分子膜から任意の分子層の多層膜まで形成することが可能である。また、低分子のみならず、高分子、コロイド粒子なども膜材料とすることができる。様々な材料を適用した最近の事例に関しては宮下徳治らの総説“ソフト系ナノデバイス創製のナノテクノロジーへの展望” 高分子 ５０巻 ９月号 ６４４−６４７
（２００１）に詳しく述べられている。
【００８０】
（ｉｉｉ）交互吸着膜
交互吸着膜（Ｌａｙｅｒ−ｂｙ−Ｌａｙｅｒ Ｓｅｌｆ−Ａｓｓｅｍｂｌｅｄ Ｆｉｌｍ）は、一般的には、最低２個の正または負の電荷を有する官能基を有する材料を逐次的に基板上に吸着・結合させて積層することにより形成される膜である。多数の官能基を有する材料の方が膜の強度や耐久性が増すなど利点が多いので、最近ではイオン性高分子（高分子電解質）を材料として用いることが多い。また、タンパク質や金属や酸化物などの表面電荷を有する粒子、いわゆる“コロイド粒子”も膜形成物質として多用される。さらに最近では、水素結合、配位結合、疎水性相互作用などのイオン結合よりも弱い相互作用を積極的に利用した膜も報告されている。比較的最近の交互吸着膜の事例については、静電的相互作用を駆動力にした材料系に少々偏っているがＰａｕｌａ Ｔ． Ｈａｍｍｏｎｄによる総説“Ｒｅｃｅｎｔ Ｅｘｐｌｏｒａｔｉｏｎｓ ｉｎ Ｅｌｅｃｔｒｏｓｔａｔｉｃ Ｍｕｌｔｉｌａｙｅｒ Ｔｈｉｎ Ｆｉｌｍ Ａｓｓｅｍｂｌｙ”Ｃｕｒｒｅｎｔ Ｏｐｉｎｉｏｎ ｉｎ Ｃｏｌｌｏｉｄ ＆ Ｉｎｔｅｒｆａｃｅ Ｓｃｉｅｎｃｅ， ４， ４３０−４４２ （２０００）に詳しい。交互吸着膜は、最も単純なプロセスを例として説明すれば、正（負）電荷を有する材料の吸着−洗浄−負（正）電荷を有する材料の吸着−洗浄のサイクルを所定の回数繰り返すことにより形成される膜である。ラングミュア−ブロジェット膜のように展開−凝縮−移し取りの操作は全く必要ない。また、これら製法の違いより明らかなように、交互吸着膜はラングミュア−ブロジェット膜のような２次元的な高配向性・高秩序性は一般に有さない。しかし、交互吸着膜及びその作製法は、欠陥のない緻密な膜を容易に形成できること、微細な凹凸面やチューブ内面や球面などにも均一に成膜できることなど、従来の成膜法にない利点を数多く有している。
【００８１】
また、分解除去層の膜厚としては、後述する露光工程において照射されるエネルギーにより分解除去される程度の膜厚であれば特に限定されるものではない。具体的な膜厚としては、照射されるエネルギーの種類や分解除去層の材料等により大きく異なるものではあるが、一般的には、０．００１μｍ〜１μｍの範囲内、特に０．０１μｍ〜０．１μｍの範囲内とすることが好ましい。
【００８２】
ｂ．遮光部
次に、本発明に用いられる遮光部について説明する。本発明において、上記波長の光を遮断することが可能な遮光部が、パターン形成体用基板の特性変化層の未露光部とする位置に形成されていることから、後述する透明基材側から全面に露光が行われた場合であっても、遮光部が照射された光を遮蔽し、特性変化層の特性をパターン状に変化させることができるのである。これにより、本発明のパターン形成体の製造方法においては、フォトマスク等を用いる必要がないものとすることができるのである。
【００８３】
本発明に用いられる遮光部は、例として図１に示すように、遮光部３が透明基材１上の特性変化層２表面を未露光部とする位置に相当する部位に、パターン状に形成されていてもよく、また特性変化層が形成された面と反対側の透明基材上に形成されるものであってもよい。本発明においては、上記の中でも、遮光部が上記透明基材上にパターン状に形成されており、さらにその上に上記特性変化層が形成されていることが好ましい。これは、照射される光の乱反射を防止して精度を向上させるために、特性変化層ととなるべく近い位置にパターン状の遮光部を形成することが好ましいからである。
【００８４】
このような遮光部は、スパッタリング法、真空蒸着法等により厚み１０００〜２０００Å程度のクロム等の金属薄膜を形成し、この薄膜をパターニングすることにより形成されてもよい。このパターニングの方法としては、スパッタ等の通常のパターニング方法を用いることができる。
【００８５】
また、本発明における遮光部は、照射される波長２００ｎｍ以下の光を遮蔽するものであれば、その材料等は特に限定されるものではなく、具体的には、樹脂バインダ中にカーボン微粒子、金属酸化物、無機顔料、有機顔料等の遮光性粒子を含有させた層であってもよい。用いられる樹脂バインダとしては、ポリイミド樹脂、アクリル樹脂、エポキシ樹脂、ポリアクリルアミド、ポリビニルアルコール、ゼラチン、カゼイン、セルロース等の樹脂を１種または２種以上混合したものや、感光性樹脂、さらにはＯ／Ｗエマルジョン型の樹脂組成物、例えば、反応性シリコーンをエマルジョン化したもの等を用いることができる。このような樹脂製遮光部の厚みとしては、０．５〜１０μｍの範囲内で設定することができる。このよう樹脂製遮光部のパターニングの方法は、フォトリソ法、印刷法等一般的に用いられている方法を用いることができる。
【００８６】
ｃ．透明基材
次に、本発明に用いられる透明基材について説明する。本発明に用いられる透明基材は、上記遮光部や特性変化層が形成可能であり、かつ、後述する光の照射が透明基材側から行われることから、照射される波長２００ｎｍ以下の光の透過率が高いものであれば、特に限定されるものではない。また、この透明基材は、パターン形成体の用途に応じて、可撓性を有するものであっても、可撓性を有さないものであってもよい。
【００８７】
具体的には、好ましい材質として、例えば無アルカリガラス、石英ガラス、パイレックス（登録商標）、合成石英板等の可撓性のない透明なリジット材、あるいは透明樹脂フィルム、光学用樹脂板等の可撓性を有する透明なフレキシブル材等を挙げることができる。
【００８８】
２．光の照射
本発明においては、上述したようなパターン形成体用基板に、上記透明基材側から、波長２００ｎｍ以下の光の照射が行われる。本発明に用いられる波長２００ｎｍ以下の光は、上述した特性変化層の特性を変化させることが可能なものであれば、その種類等は特に限定されるものではない。本発明においては、上記特性変化層と遮光部とが、近接していることから、照射される光が平行光でない場合であっても、上記特性変化層の特性を高精細に変化させることが可能である。
【００８９】
本発明に用いられる光の波長は、２００ｎｍ以下、中でも１００ｎｍ〜２００ｎｍの範囲内であることが好ましい。これにより、効率よく上記特性変化層の特性を変化させることができるからである。
【００９０】
このような光の照射に用いることができる光源としては、具体的には、アルゴン、クリプトン、キセノン等の紫外エキシマランプ、または低圧水銀ランプ等を挙げることができる。
【００９１】
ここで、２００ｎｍ以下の光とは、２００ｎｍ以下の光を含む光であれば、特に限定されるものではなく、２００ｎｍ以下の光単独であってもよく、また例えば２００ｎｍ以上の光等、波長の異なる光と２００ｎｍ以下の光とを複合した２種類以上の光であってもよい。
【００９２】
また、この際の光の照射量は、露光による特性変化層表面の特性の変化が行われるのに必要な照射量とする。また、本発明における露光方向は、パターン形成用基板の透明基材側から行われ、特に必要がない限り、パターン形成体用基板の全面に露光される。
【００９３】
上述したような光の照射が終了すると、上記遮光部が形成されていない部分の特性変化層の特性が変化したパターン形成体が得られる。
【００９４】
本発明により得られるパターン形成体は、例えば濡れ性や凹凸等の特性の差を利用して、容易に機能性部をパターン状に形成することが可能であり、種々の機能性素子を製造することが可能である。
【００９５】
Ｂ．カラーフィルタ
次に、本発明におけるカラーフィルタについて説明する。本発明におけるカラーフィルタは、上述したパターン形成体の製造方法により製造されたパターン形成体のパターン上に画素部が形成されたことを特徴とするものである。本発明によれば、上述したパターン形成体の製造方法により製造されたパターン形成体は、表面の特性がパターン状に変化しており、例えば濡れ性の差等の特性の差を利用して画素部を形成することにより、高精細な画素部を有するカラーフィルタとすることができるのである。また、上述したパターン形成体は、低コストで効率よく製造することができることから、本発明のカラーフィルタを結果的に低コストで効率よく製造されるものとすることができるのである。
【００９６】
本発明のカラーフィルタにおける画素部は、上述したパターン形成体上に形成することが可能であれば、その形成方法は特に限定されるものではないが、本発明においては、画素部がインクジェットにより形成されたものであることが好ましい。上述したパターン形成体上の親液性領域に、インクジェット装置等によりインク（機能性部用組成物）を付着・硬化させることにより、容易に高精細な画素部（機能性部）を形成することができ、これにより少ない工程数で高精細なカラーフィルタを得ることができるからである。
【００９７】
また、本発明においては、上記パターン形成体の遮光部をそのままカラーフィルタにおけるブラックマトリックスとして用いることが可能である。したがって、上述した本発明のパターン形成体上に機能性部としての画素部（着色層）を形成すれば、別途ブラックマトリックスを形成することなく、カラーフィルタを得ることが可能である。
【００９８】
なお、本発明は上記実施形態に限定されるものではない。上記実施形態は、例示であり、本発明の特許請求の範囲に記載された技術的思想と実質的に同一な構成を有し、同様な作用効果を奏するものは、いかなるものであっても本発明の技術的範囲に包含される。
【００９９】
【実施例】
以下、本発明について、実施例を通じてさらに詳述する。
【０１００】
［実施例１］
＜濡れ性変化層用組成物の調整＞
イソプロピルアルコール３０ｇとフルオロアルキルシラン（ＦＡＳ ＧＥ東芝シリコーン（株）製ＴＳＬ８２３３）とテトラメトキシシラン（ＧＥ東芝シリコーン（株）製ＴＳＬ８１１４）３ｇと０．０５規定塩酸２．５ｇとを混合し８時間攪拌した。これをイソプロピルアルコールにより１００倍に希釈し、濡れ性変化層用組成物を調整した。
【０１０１】
＜塗布＞
２０μｍ幅のクロム膜（厚さ０．２μｍ）が１７０μｍピッチで形成されたブラックマトリックス基板（４００×５００×０．７ｍｍ）上にビードコーターを用いて、前記濡れ性変化層用組成物を塗布し、１５０℃で１０分間加熱することにより厚さ０．０５μｍの濡れ性変化層を得た。
【０１０２】
＜露光＞
前記濡れ性変化層が形成されたブラックマトリックス基板に対して、Ｘｅエキシマ照射装置を用いて照射距離１ｍｍ、１５ｍＷ／ｃｍ^２の照度で前記濡れ性変化層が形成されていない側から１８０秒間露光した。
【０１０３】
その結果、クロム膜により遮光された部位の濡れ性変化層表面は、４１ｍＮ／ｍの濡れ指数標準液の接触角が８０゜であり、遮光されていない部位は、１０゜以下であり、濡れ性パターンを得ることができた。
【０１０４】
＜カラーフィルタ形成＞
前記濡れ性パターンの濡れ性が変化した部位に対して、ピエゾ駆動式インクジェット装置にて熱硬化型赤色カラーフィルタ層用インク（粘度５ｃＰ）を吐出したところ、濡れ性の変化した部位に濡れ広がり、その後の加熱処理によりブラックマトリックス付きガラス基板上に赤色のカラーフィルタ層（１．５μｍ）を得た。
【０１０５】
次いで、青、緑のカラーフィルタ層を同様に形成し、カラーフィルタを形成した。
【０１０６】
［実施例２］
＜濡れ性変化層（単分子膜）の成膜＞
フルオロアルキルシラン（ＦＡＳ ＧＥ東芝シリコーン（株）製ＴＳＬ８２３３）を２４０℃に加熱し、その蒸気を実施例１記載のブラックマトリックス基板に当て、その後、メタノールにて未反応のＦＡＳを洗い流し、ブラックマトリックス基板上に単分子膜を形成した。
【０１０７】
＜露光＞
前記濡れ性変化層（単分子膜）が形成されたブラックマトリックス基板に対して、低圧水銀ランプを用いて１０ｍＷ／ｃｍ^２の照度で膜が形成されていない側から３００秒間露光した。
【０１０８】
その結果、クロム膜により遮光された部位の撥インク性膜表面は、４１ｍＮ／ｍの濡れ指数標準液の接触角が８２゜であり、遮光されていない部位は、１０゜以下であり、濡れ性パターンを得ることができた。
【０１０９】
＜カラーフィルタ形成＞
前記濡れ性パターンの濡れ性が変化した部位に対して、ピエゾ駆動式インクジェット装置にて熱硬化型赤色カラーフィルタ層用インク（粘度５ｃＰ）を吐出したところ、濡れ性の変化した部位に濡れ広がり、その後の加熱処理によりブラックマトリックス付きガラス基板上に赤色のカラーフィルタ層（１．５μｍ）を得た。
【０１１０】
次いで、青、緑のカラーフィルタ層を同様に形成し、カラーフィルタを形成した。
【０１１１】
【発明の効果】
本発明によれば、上記特性変化層が上記光の照射により特性変化するものであることから、上記パターン形成体用基板に、上記特性変化層の形成された面と反対側の透明基材側から上記光を照射することにより、フォトマスク等を用いることなく、遮光部が形成されていない部分の特性変化層の特性が高精細に変化したパターン形成体用基板を製造することが可能となる。また、上記特性変化層と遮光部とが近接していることから、光源は平行光でないものを用いることができ、平行光をつくり出すためのコストが必要ない。さらにフォトマスクを用いる必要がないことから、低コストで製造効率よくパターン形成体を製造することができるのである。
【図面の簡単な説明】
【図１】本発明のパターン形成体の製造方法の一例を示す工程図である。
【符号の説明】
１ … 透明基材
２ … 特性変化層
３ … 遮光部
４ … パターン形成体用基板
５ … 光
６ … 光が照射された部分[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a method for manufacturing a pattern formed body having a pattern with different characteristics on the surface, which can be used for a color filter or the like.
[0002]
[Prior art]
Conventionally, as a method of forming a high-definition pattern such as a color pattern of a color filter, a pattern exposure is performed on a photoresist layer applied on a substrate, and after exposure, the photoresist is developed and further etched. A photolithography method is known in which a target pattern is directly formed by exposing a photoresist to a photoresist by using a functional material.
[0003]
However, the formation of a high-definition pattern by photolithography involves the use of a photoresist and the necessity of developing with a liquid developer or performing etching after exposure. In addition, when a functional substance is used as a photoresist, there is also a problem that the photoresist is deteriorated by an alkali solution or the like used at the time of development.
[0004]
In addition, in the case of performing exposure using a photomask, depending on the type of the photomask, if the photomask is used for multiple exposures, deterioration such as yellowing of the photomask may occur, or the number of steps may be large. There were problems in terms of manufacturing efficiency and cost.
[0005]
On the other hand, in order to solve such problems, a layer whose properties are changed by the action of a photocatalyst is formed on a substrate, and a pattern having a wettability is formed by patternwise exposure. The present inventors have studied a body manufacturing method and the like (Patent Document 1). However, in this method, depending on the composition of the layer containing the photocatalyst, it may be difficult to form the layer containing the photocatalyst smoothly.
[0006]
Further, it is known that when a surface of a plastic or the like is exposed by using an ultraviolet excimer lamp or the like, properties such as wettability of the surface are changed. However, since excimer lamps and the like are difficult to generate parallel light, it is difficult to perform patterning using a photomask, and thus cannot be used to form a high-definition pattern.
[0007]
[Patent Document 1]
JP-A-2001-7428
[0008]
[Problems to be solved by the invention]
From the above, it is desired to provide a method for manufacturing a pattern-formed body that can form a high-definition pattern at low cost with good manufacturing efficiency and that can use a light source that is not parallel light. .
[0009]
[Means for Solving the Problems]
According to the present invention, as described in claim 1, a transparent base material, a characteristic change layer formed on the transparent base material and having characteristics changed by irradiation with light having a wavelength of 200 nm or less, and formed in a pattern. By irradiating light having a wavelength of 200 nm or less from the transparent substrate side to the substrate for a pattern forming body having a light-shielding portion, a pattern forming body having a pattern in which the properties of the property changing layer are changed is obtained. The present invention provides a method for producing a patterned body.
[0010]
According to the present invention, since the property change layer changes its property by irradiation with the light, the pattern forming substrate has a transparent substrate side opposite to a surface on which the property change layer is formed. By irradiating the light from the above, it is possible to manufacture a pattern forming substrate in which the characteristics of the characteristic change layer in the portion where the light-shielding portion is not formed are changed with high definition without using a photomask or the like. . In addition, since the characteristic change layer and the light-shielding portion are close to each other, a non-parallel light source can be used as the light source, and no cost is required for producing the parallel light. Further, since there is no need to use a photomask, a pattern formed body can be manufactured at low cost and with high manufacturing efficiency.
[0011]
Further, in the invention described in claim 1, as described in claim 2, the light shielding portion is formed in a pattern on the transparent base material, and the characteristic change layer is further formed thereon. It is preferred that The position of the light-shielding portion is not particularly limited, but from the viewpoint of preventing irregular reflection of irradiated light and improving accuracy, a pattern-shaped light-shielding portion is formed at a position as close as possible to the characteristic change layer. Is preferred. Therefore, it is preferable to form a patterned light-shielding portion at the above-described position.
[0012]
In the invention described in claim 1 or 2, it is preferable that the irradiation of the light having a wavelength of 200 nm or less is performed using an ultraviolet excimer lamp or a low-pressure mercury lamp as described in claim 3. This is because these lamps can irradiate light having the above-mentioned wavelength, and the characteristics of the above-mentioned characteristic change layer can be changed efficiently.
[0013]
In the invention according to any one of the first to third aspects, as described in the fourth aspect, the property changeable layer changes wettability by irradiation with light having a wavelength of 200 nm or less. It can be a wettability changing layer. According to the present invention, since the property change layer is a wettability change layer, a pattern having a changed surface wettability can be manufactured, and by utilizing this difference in wettability, a pattern can be easily formed. This is because a pattern formed body capable of forming a functional portion can be obtained.
[0014]
In the fourth aspect of the invention, as described in the fifth aspect, the contact angle with the liquid having a surface tension of 40 mN / m on the wettability changing layer is not irradiated with light having a wavelength of 200 nm or less. It is preferable that the angle is 10 ° or more in the portion and 9 ° or less in the portion irradiated with light having a wavelength of 200 nm or less. Thereby, the portion irradiated with the light can be a lyophilic region and the portion not irradiated with the light can be a lyophobic region. When the contact angle with the liquid in the lyophilic region is 10 ° or less, the liquid repellency is insufficient, and when the contact angle with the liquid in the liquid-repellent region is 10 ° or more. May be inferior in the spread of the functional part composition forming the functional part.For example, when a pixel part is formed on the pattern of the pattern forming body, inconvenience such as occurrence of color loss may occur. Because.
[0015]
In the invention described in claim 4 or claim 5, as described in claim 6, the wettability changing layer is preferably a layer having a fluoroalkyl group. This is because, when the wettability changing layer is a layer having a fluoroalkyl group, the wettability of a portion irradiated with energy can be easily changed.
[0016]
In the invention according to any one of claims 4 to 6, as described in claim 7, the wettability changing layer is preferably a layer containing a silane compound. Thereby, the wettability changing layer can be a self-assembled monolayer, the thickness of the wettability changing layer can be reduced, and the wettability can be changed more efficiently.
[0017]
In the invention according to any one of the first to third aspects, as described in the eighth aspect, the characteristic change layer is decomposed and removed by irradiation with light having a wavelength of 200 nm or less. It can be a removal layer. Since the characteristic change layer is a decomposition removal layer, a pattern formed body having irregularities on the surface can be manufactured, and for example, a functional portion can be easily formed in a pattern using the irregularities. This is because it is possible to obtain a simple pattern formed body.
[0018]
In the invention according to claim 8, as described in claim 9, the contact angle of the liquid with respect to the decomposition removal layer is such that the contact angle of the liquid with respect to the transparent substrate exposed when the decomposition removal layer is decomposed and removed. Preferably, it is different from the contact angle. As a result, the liquid-repellent region on the decomposition removal layer and the lyophilic region on the transparent substrate exposed by being decomposed and removed by energy irradiation can be used as the lyophilic region. This is because it can be a formed body.
[0019]
In the invention according to the ninth aspect, as described in the tenth aspect, the contact angle with the liquid having a surface tension of 40 mN / m on the decomposition removal layer is 10 ° or more, and It is preferable that the angle is 9 ° or less. When the contact angle with the liquid in the lyophilic region is 10 ° or less, the lyophobic property is insufficient. When the contact angle with the liquid in the lyophobic region is 10 ° or more, The spread of the functional part composition for forming the functional part may be inferior. For example, when a pixel part is formed on the pattern of the pattern formed body, inconveniences such as color omission may occur. is there.
[0020]
In the invention according to any one of claims 8 to 10, as described in claim 11, the decomposition removal layer is preferably a layer having a fluoroalkyl group. Thereby, the decomposition removal layer can be efficiently decomposed and removed.
[0021]
According to a twelfth aspect of the present invention, a pixel portion is formed on a pattern of a pattern formed body manufactured by the method of manufacturing a pattern formed body according to any one of the first to eleventh aspects. Are provided, and a color filter is provided. According to the present invention, a high-definition pixel portion can be easily formed by using, for example, a difference in surface wettability or unevenness by using a pattern formed body manufactured by the method for manufacturing a pattern formed body. This is because a color filter that is advantageous in terms of manufacturing efficiency and cost can be obtained.
[0022]
In the twelfth aspect of the present invention, as described in the thirteenth aspect, it is preferable that the pixel portion is formed by an inkjet method. Thereby, a higher definition pixel portion can be formed.
[0023]
BEST MODE FOR CARRYING OUT THE INVENTION
The present invention relates to a method for manufacturing a pattern formed body and a color filter. Hereinafter, these will be described separately.
[0024]
A. Method for manufacturing pattern-formed body
First, a method for manufacturing a pattern forming body of the present invention will be described. The method for producing a pattern-formed body according to the present invention includes a transparent substrate, a characteristic change layer formed on the transparent substrate, the characteristic of which changes when irradiated with light having a wavelength of 200 nm or less, and a light-shielding portion formed in a pattern. Irradiating light having a wavelength of 200 nm or less from the transparent base material side to a substrate for a pattern forming body having a pattern forming body having a pattern in which the properties of the property changing layer are changed. It is.
[0025]
The present invention is directed to a pattern forming body having a transparent substrate 1, a property changing layer 2 formed on the transparent substrate 1, and a light shielding portion 3 formed in a pattern, as shown in FIG. 1, for example. The substrate 4 is irradiated with light 5 having a wavelength of 200 nm or less from the transparent substrate 1 side (FIG. 1A). This is a method of forming a pattern formed body (FIG. 1B) in which the characteristics of the characteristic change layer 2 in the portion 6 irradiated with light have changed.
[0026]
According to the present invention, since the characteristics of the characteristic change layer change when irradiated with light having a wavelength of 200 nm or less, a pattern whose surface characteristics are easily changed by irradiating light with the wavelength is formed. can do. In addition, the light shielding portion is formed, and by irradiating light from the transparent base material side, the characteristics of the characteristic change layer can be changed with high definition without using a photomask or the like. Further, since the characteristic change layer and the light-shielding portion are close to each other, the light used for changing the characteristic of the characteristic change layer may not be parallel light, and the cost for producing the parallel light is low. Since it is not necessary, the pattern forming body can be manufactured efficiently at low cost. Hereinafter, each configuration in the method for manufacturing a pattern forming body of the present invention will be described.
[0027]
1. Substrate for pattern formation
First, the pattern forming substrate of the present invention will be described. The substrate for a pattern forming body of the present invention has a transparent base material, a property changing layer formed on the transparent base material, and a light shielding portion. Hereinafter, each configuration will be described.
[0028]
a. Characteristic change layer
First, the characteristic change layer used in the present invention will be described. The property change layer of the present invention is not particularly limited as to the type of property change as long as the property is changed by irradiation with light having a wavelength of 200 nm or less. Is a wettability changing layer in which a pattern with changed wettability is formed by the action of light, and a decomposition removal layer in which the characteristic change layer is decomposed and removed by the action of the light to form a pattern by unevenness. Two cases in some cases are preferred. Thereby, it is possible to easily form the functional portion on the manufactured pattern formed body by utilizing the difference in the characteristics. Hereinafter, the wettability changing layer and the decomposition removal layer will be described.
[0029]
(Wetting change layer)
First, the wettability changing layer used in the present invention will be described. The wettability changing layer of the present invention is not particularly limited as long as it is a layer whose surface wettability changes by irradiation with light having a wavelength of 200 nm or less. It is preferable that the layer has a wettability that changes so that the contact angle with the liquid on the surface of the wettability changing layer decreases. In this way, by forming a wettability changing layer in which the wettability changes so that the contact angle with the liquid is reduced by light irradiation (exposure), the wettability is changed in a pattern by the light irradiation at the above wavelength. It is possible to form a pattern of a lyophilic region having a small contact angle with a liquid. Accordingly, a functional element composition such as a color filter or the like can be formed at low cost and with high production efficiency by adhering a composition for a functional part such as an ink for forming a pixel part or the like to a lyophilic region.
[0030]
Here, the lyophilic region is a region where the contact angle with the liquid is small, and a functional part composition for forming a functional part on the manufactured pattern formed body, for example, a functional element is a color filter. If there is, the ink for coloring the pixel portion (colored layer), and if the functional element is a microlens, it refers to a region having good wettability with the microlens forming composition and the like. Further, the lyophobic region is a region having a large contact angle with the liquid, and is a region having poor wettability to the above-described composition for a functional part.
[0031]
In the present invention, when the contact angle with the liquid is 1 ° or more lower than the contact angle with the liquid in the adjacent region, the lyophilic region, the contact angle with the liquid in the adjacent region is smaller than the contact angle with the liquid in the adjacent region. When the contact angle is higher than 1 °, the liquid repellent region is set.
[0032]
The wettability changing layer has a contact angle of 10 ° or more with a liquid having a surface tension of 40 mN / m, preferably a contact angle with a liquid having a surface tension of 30 mN / m in a portion not exposed to light, that is, in a lyophobic region. Is preferably 10 ° or more, and particularly preferably shows a wettability with a contact angle of 10 ° or more with a liquid having a surface tension of 20 mN / m. This is because the non-exposed portion is a portion requiring liquid repellency in the present invention, so that when the contact angle with the liquid is small, the liquid repellency is not sufficient, and This is because there is a possibility that the composition remains, which is not preferable.
[0033]
In addition, the exposure angle of the wettability changing layer decreases with a contact angle with a liquid having a surface tension of 40 mN / m or less, preferably a contact angle with a liquid having a surface tension of 50 mN / m. It is preferable that the layer has a contact angle of 10 ° or less, especially a liquid having a surface tension of 60 mN / m. When the contact angle with the liquid in the exposed portion, that is, the lyophilic region is high, the spread of the functional portion composition in this portion may be inferior, and a problem such as a lack of the functional portion may occur. Because there is.
[0034]
In addition, the contact angle with the liquid referred to here is a contact angle with a liquid having various surface tensions measured using a contact angle measuring device (CA-Z type manufactured by Kyowa Interface Science Co., Ltd.) (from the micro syringe to the liquid). 30 seconds after dropping) and obtained from the results or as a graph. In this measurement, wetting index standard solutions manufactured by Junsei Chemical Co., Ltd. were used as liquids having various surface tensions.
[0035]
Further, when the wettability changing layer as described above is used in the present invention, fluorine is contained in the wettability changing layer, and the fluorine content of the surface of the wettability changing layer is exposed to the wettability changing layer. In this case, the wettability changing layer may be formed so that the irradiation with light causes the wettability changing layer to be lower than before exposure.
[0036]
In the case of a wettability changing layer having such characteristics, a pattern composed of a portion having a low fluorine content can be easily formed by pattern irradiation with energy. Here, fluorine has an extremely low surface energy, so that the surface of a substance containing a large amount of fluorine has a smaller critical surface tension. Therefore, the critical surface tension of the portion having a small content of fluorine is higher than the critical surface tension of the surface of the portion having a large content of fluorine. This means that a portion having a low fluorine content is a lyophilic region as compared with a portion having a high fluorine content. Therefore, forming a pattern composed of a portion having a smaller fluorine content than the surrounding surface forms a pattern of a lyophilic region in the lyophobic region.
[0037]
Therefore, when such a wettability changing layer is used, the pattern of the lyophilic region can be easily formed in the lyophobic region by pattern irradiation with energy. It is possible to easily form a functional portion only on the functional element, and it is possible to provide a low-cost, high-quality functional element.
[0038]
As described above, as the content of fluorine contained in the wettability changing layer containing fluorine, the fluorine content in the lyophilic region having a low fluorine content formed by exposure, the fluorine content of the unexposed portion When the fluorine content is 100, it is preferably 10 or less, preferably 5 or less, particularly preferably 1 or less.
[0039]
By setting it in such a range, a large difference can be caused in wettability between the exposed portion and the unexposed portion. Therefore, by forming a functional portion in such a wettability changing layer, it becomes possible to accurately form a functional portion only in a lyophilic region in which the fluorine content has been reduced, and a functional element can be accurately formed. Because it can be obtained. In addition, this reduction rate is based on weight.
[0040]
Various commonly used methods can be used for measuring the fluorine content in the wettability changing layer, for example, X-ray photoelectron spectroscopy (ESCA (Electron)). The method is not particularly limited as long as it can quantitatively measure the amount of fluorine on the surface, such as spectroscopy for chemical analysis), fluorescent X-ray analysis, mass spectrometry, and the like.
[0041]
As a material used for such a wettability changing layer, the property of the wettability changing layer described above, that is, a material whose wettability changes by light, and which has a main chain that is hardly degraded and decomposed by the action of light. Although it is not particularly limited as long as it is not limited thereto, for example, (1) an organopolysiloxane which exhibits large strength by hydrolyzing or polycondensing chloro or alkoxysilane by a sol-gel reaction or the like, (2) water repellency And organopolysiloxanes such as organopolysiloxanes obtained by cross-linking a reactive silicone excellent in oil resistance and oil repellency.
[0042]
In the case of the above (1), the general formula:
Y_nSix_(4-n)
(Here, Y represents an alkyl group, a fluoroalkyl group, a vinyl group, an amino group, a phenyl group, or an epoxy group, X represents an alkoxyl group, an acetyl group, or a halogen. N is an integer of 0 to 3. )
Is preferably an organopolysiloxane which is one or more hydrolytic condensates or cohydrolytic condensates of the silane compound represented by Here, the carbon number of the group represented by Y is preferably in the range of 1 to 20, and the alkoxy group represented by X is preferably a methoxy group, an ethoxy group, a propoxy group, or a butoxy group. preferable.
[0043]
In the present invention, an organopolysiloxane containing a fluoroalkyl group is particularly preferably used. This is because the fluorine atom is relatively large, so that the fluoroalkyl group is easily arranged perpendicular to the surface of the wettability changing layer, and easily reacts with the active oxygen species or the like generated by the action of the light having the above wavelength. . Thereby, fluorine on the surface is efficiently removed, and it is easy to change wettability. In addition, such a fluoroalkyl group has a high liquid repellency. For example, in the case where a pixel portion is formed on a pattern formed body and a color filter is formed, adhesion of a functional portion composition such as an ink for coloring a pixel portion is prevented. The effect of hindrance can be increased. Specific examples of the organopolysiloxane having such a fluoroalkyl group include one or more hydrolyzed condensates and co-hydrolyzed condensates of the following fluoroalkylsilanes. What is known as a ring agent can be used.
[0044]
CF₃(CF₂)₃CH₂CH₂Si (OCH₃)₃;
CF₃(CF₂)₅CH₂CH₂Si (OCH₃)₃;
CF₃(CF₂)₇CH₂CH₂Si (OCH₃)₃;
CF₃(CF₂)₉CH₂CH₂Si (OCH₃)₃;
(CF₃)₂CF (CF₂)₄CH₂CH₂Si (OCH₃)₃;
(CF₃)₂CF (CF₂)₆CH₂CH₂Si (OCH₃)₃;
(CF₃)₂CF (CF₂)₈CH₂CH₂Si (OCH₃)₃;
CF₃(C₆H₄) C₂H₄Si (OCH₃)₃;
CF₃(CF₂)₃(C₆H₄) C₂H₄Si (OCH₃)₃;
CF₃(CF₂)₅(C₆H₄) C₂H₄Si (OCH₃)₃;
CF₃(CF₂)₇(C₆H₄) C₂H₄Si (OCH₃)₃;
CF₃(CF₂)₃CH₂CH₂SiCH₃(OCH₃)₂;
CF₃(CF₂)₅CH₂CH₂SiCH₃(OCH₃)₂;
CF₃(CF₂)₇CH₂CH₂SiCH₃(OCH₃)₂;
CF₃(CF₂)₉CH₂CH₂SiCH₃(OCH₃)₂;
(CF₃)₂CF (CF₂)₄CH₂CH₂SiCH₃(OCH₃)₂;
(CF₃)₂CF (CF₂)₆CH₂CH₂SiCH₃(OCH₃)₂;
(CF₃)₂CF (CF₂)₈CH₂CH₂SiCH₃(OCH₃)₂;
CF₃(C₆H₄) C₂H₄SiCH₃(OCH₃)₂;
CF₃(CF₂)₃(C₆H₄) C₂H₄SiCH₃(OCH₃)₂;
CF₃(CF₂)₅(C₆H₄) C₂H₄SiCH₃(OCH₃)₂;
CF₃(CF₂)₇(C₆H₄) C₂H₄SiCH₃(OCH₃)₂;
CF₃(CF₂)₃CH₂CH₂Si (OCH₂CH₃)₃;
CF₃(CF₂)₅CH₂CH₂Si (OCH₂CH₃)₃;
CF₃(CF₂)₇CH₂CH₂Si (OCH₂CH₃)₃;
CF₃(CF₂)₉CH₂CH₂Si (OCH₂CH₃)₃;and
CF₃(CF₂)₇SO₂N (C₂H₅) C₂H₄CH₂Si (OCH₃)₃.
[0045]
Examples of the reactive silicone of the above (2) include compounds having a skeleton represented by the following general formula.
[0046]
Embedded image

[0047]
Here, n is an integer of 2 or more, and R¹, R²Is a substituted or unsubstituted alkyl, alkenyl, aryl or cyanoalkyl group having 1 to 10 carbon atoms, and the vinyl, phenyl or halogenated phenyl accounts for 40% or less of the whole in a molar ratio. Also, R¹, R²Is preferably a group having a methyl group since the surface energy is minimized, and the molar ratio of the methyl group is preferably 60% or more. Further, the chain terminal or the side chain has at least one or more reactive group such as a hydroxyl group in the molecular chain.
[0048]
Further, a stable organosilicone compound which does not undergo a cross-linking reaction, such as dimethylpolysiloxane, may be mixed with the above-mentioned organopolysiloxane.
[0049]
In the present invention, various materials such as an organopolysiloxane can be used for the wettability changing layer as described above. It is effective for pattern formation. Therefore, it can be said that it is preferable to include fluorine in a material that is not easily degraded or decomposed by the action of light, specifically, to form a wettability changing layer by including fluorine in an organopolysiloxane material.
[0050]
As described above, as a method for containing fluorine in the organopolysiloxane material, a method in which a fluorine compound is bonded with a relatively weak binding energy to a base material having a generally high binding energy, a method in which fluorine bonded with a relatively weak binding energy is used. A method of mixing a compound into the wettability changing layer can be used. By introducing fluorine by such a method, when exposed, first, a fluorine bond site having a relatively small binding energy is decomposed, whereby fluorine can be removed from the wettability changing layer. .
[0051]
The first method, that is, a method of binding a fluorine compound with a binder having a high binding energy with relatively weak binding energy, includes a method of introducing a fluoroalkyl group as a substituent into the organopolysiloxane. be able to.
[0052]
For example, as a method for obtaining an organopolysiloxane, as described in (1) above, an organopolysiloxane exhibiting great strength can be obtained by hydrolyzing or polycondensing chloro or alkoxysilane by a sol-gel reaction or the like. . Here, in this method, as described above, the general formula:
Y_nSix_(4-n)
(Here, Y represents an alkyl group, a fluoroalkyl group, a vinyl group, an amino group, a phenyl group, or an epoxy group, X represents an alkoxyl group, an acetyl group, or a halogen. N is an integer of 0 to 3. )
An organopolysiloxane is obtained by hydrolytic condensation or co-hydrolytic condensation of one or more of the silane compounds represented by the following formula. In this general formula, a silane having a fluoroalkyl group as a substituent Y By synthesizing using a compound, an organopolysiloxane having a fluoroalkyl group as a substituent can be obtained. When an organopolysiloxane having such a fluoroalkyl group as a substituent is used as a binder, as described above, the carbon bond portion of the fluoroalkyl group can be easily decomposed by irradiation with light having the above wavelength. Thus, the fluorine content of the exposed portion on the surface of the wettability changing layer can be efficiently reduced.
[0053]
The silane compound having a fluoroalkyl group to be used at this time is not particularly limited as long as it has a fluoroalkyl group, but has at least one fluoroalkyl group and the carbon number of the fluoroalkyl group Is preferably 4 to 30, preferably 6 to 20, and particularly preferably 6 to 16. Specific examples of such a silane compound are as described above. Among them, the silane compound having a fluoroalkyl group having 6 to 8 carbon atoms, that is, a fluoroalkylsilane is preferable.
[0054]
In the present invention, such a silane compound having a fluoroalkyl group may be used as a mixture with the above-described silane compound having no fluoroalkyl group, and a co-hydrolyzed condensate thereof may be used as the organopolysiloxane. One or more of such silane compounds having a fluoroalkyl group may be used, and a hydrolyzed condensate or a co-hydrolyzed condensate thereof may be used as the organopolysiloxane.
[0055]
In the organopolysiloxane having a fluoroalkyl group thus obtained, the silane compound having the fluoroalkyl group is present in an amount of 0.01 mol% or more, preferably 0.1 mol%, of the silane compounds constituting the organopolysiloxane. Preferably, it is contained in an amount of at least mol%.
[0056]
Since the fluoroalkyl group is contained to this extent, the liquid repellency on the wettability changing layer can be increased, and the difference in wettability with the portion that has been exposed to the lyophilic region can be increased. It is.
[0057]
In the method shown in the above (2), an organopolysiloxane is obtained by cross-linking a reactive silicone having excellent liquid repellency.¹, R²By making either or both of them fluorine-containing substituents such as a fluoroalkyl group, it is possible to include fluorine in the wettability changing layer. Since the portion of the fluoroalkyl group having a small value is decomposed, the exposure can reduce the fluorine content on the surface of the wettability variable layer.
[0058]
On the other hand, in the latter example, that is, as a method for introducing a fluorine compound bonded with energy weaker than the binding energy of the binder, for example, when introducing a low molecular weight fluorine compound, for example, a fluorine-based surfactant is mixed. Examples of the method for introducing a high molecular weight fluorine compound include a method of mixing a fluorine resin having high compatibility with a binder resin.
[0059]
The wettability changing layer in the present invention may further contain a surfactant. Specifically, hydrocarbons such as NIKKOL BL, BC, BO, and BB series manufactured by Nikko Chemicals Co., Ltd .; ZONYL FSN and FSO manufactured by DuPont; Surflon S-141, 145 manufactured by Asahi Glass Co., Ltd .; Megafac F-141 and 144 manufactured by Ink Chemical Industry Co., Ltd., Futagent F-200 and F251 manufactured by Neos Co., Ltd., Unidyne DS-401 and 402 manufactured by Daikin Industries, Ltd., and Florad FC-170 manufactured by 3M Corporation. 176 and the like, and a fluorine-based or silicone-based nonionic surfactant, and a cationic surfactant, an anionic surfactant, and an amphoteric surfactant can also be used.
[0060]
Further, in addition to the above surfactant, the wettability changing layer, polyvinyl alcohol, unsaturated polyester, acrylic resin, polyethylene, diallyl phthalate, ethylene propylene diene monomer, epoxy resin, phenol resin, polyurethane, melamine resin, polycarbonate , Polyvinyl chloride, polyamide, polyimide, styrene butadiene rubber, chloroprene rubber, polypropylene, polybutylene, polystyrene, polyvinyl acetate, polyester, polybutadiene, polybenzimidazole, polyacrylonitrile, oligomers such as epichlorohydrin, polysulfide, polyisoprene, polymers, etc. Can be contained.
[0061]
Such a wettability changing layer can be formed by dispersing the above-described components in a solvent together with other additives as necessary to prepare a coating solution, and applying the coating solution on a substrate. . As the solvent to be used, alcohol-based organic solvents such as ethanol and isopropanol are preferable. The coating can be performed by a known coating method such as spin coating, spray coating, dip coating, roll coating, and bead coating. When the composition contains an ultraviolet curable component, the wettability changing layer can be formed by performing a curing treatment by irradiating ultraviolet rays.
[0062]
In the present invention, the thickness of the wettability changing layer is preferably from 0.001 μm to 1 μm, particularly preferably from 0.01 to 0 μm, in consideration of the change rate of the wettability in the action by the light having the above-mentioned wavelength. .1 μm.
[0063]
In the present invention, by using the wettability changing layer of the components described above, by the action of the light, the action of oxidizing or decomposing an organic group or an additive that is a part of the components, the wettability of the exposed portion is used. Can be changed to make it lyophilic, and a large difference in wettability with the non-exposed portion can be caused. Therefore, by improving the receptivity (lyophilic property) and repellency (liquid repellency) with the composition for the functional part, for example, the ink for coloring the pixel part, the quality is good and the cost is advantageous. Thus, a pattern formed body from which a functional element such as a color filter can be obtained can be obtained.
[0064]
The wettability changing layer used in the present invention may be a self-supporting material as long as it is formed of a material whose surface wettability can be changed by the action of light. A material having no property may be used. In the present invention, having the self-supporting property means that it can exist in a tangible state without any other supporting material.
[0065]
In the present invention, it is preferable that the wettability changing layer has no self-supporting property. The wettability changing layer formed of a material whose characteristics are significantly changed as described above generally has a small amount of self-supporting material, and is formed on a transparent substrate, thereby increasing the strength and the like, and as a variety of pattern forming bodies. This is because it can be used.
[0066]
In addition, it is preferable that the wettability changing layer used in the present invention is a layer containing no photocatalyst. If the photocatalyst is not contained in the wettability changing layer in this way, when the pattern forming body is used as a functional element thereafter, there is no need to worry about the effect of the photocatalyst over time, and the pattern forming body can be used for a long time without any problem. Because it is possible.
[0067]
(Decomposition removal layer)
Next, the decomposition removal layer used in the present invention will be described. The decomposition removal layer used in the present invention is not particularly limited as long as the decomposition removal layer in the exposed portion is decomposed and removed by the action of light having the above-mentioned wavelength.
[0068]
As described above, since the decomposition removal layer is decomposed and removed by the action of the light, a pattern including a portion having the decomposition removal layer and a portion having no decomposition removal layer without performing the developing step or the cleaning step, that is, a pattern having irregularities is formed. Can be formed.
[0069]
This decomposed and removed layer is oxidized and decomposed by the action of light due to exposure and is vaporized. Therefore, the decomposed and removed layer is removed without a special post-treatment such as a developing and washing step. Depending on the case, a cleaning step or the like may be performed.
[0070]
In addition, the decomposition removal layer used in the present invention not only forms irregularities but also preferably has a higher contact angle with a liquid than the transparent substrate surface. Thereby, the decomposition removal layer is decomposed and removed, and the area where the transparent substrate is exposed can be made a lyophilic area, and the area where the decomposition removal layer remains can be made a lyophobic area, and the unevenness and wettability of the surface can be obtained. This is because various patterns can be formed by utilizing the difference between.
[0071]
Here, the contact angle of the decomposition removal layer surface of the present invention with a liquid is such that the contact angle with a liquid having a surface tension of 40 mN / m is 10 ° or more, and preferably the contact angle with a liquid having a surface tension of 30 mN / m is 10 °. As described above, it is particularly preferable that the contact angle with a liquid having a surface tension of 20 mN / m shows a value of 10 ° or more.
[0072]
In the present invention, when the property change layer is a decomposition removal layer, a transparent substrate described later is preferably lyophilic, and specifically, a contact angle with a liquid having a surface tension of 40 mN / m. Is preferably 9 ° or less, more preferably 5 ° or less, particularly preferably 1 ° or less as the contact angle with a liquid having a surface tension of 40 mN / m.
[0073]
When the wettability of the decomposition removal layer and the transparent substrate is within the above range, the region where the transparent substrate is exposed can be a lyophilic region, and the region where the decomposition removal layer remains can be a lyophobic region. This makes it easy to form a high-definition pattern. Here, the contact angle with the liquid is a value measured by the method described above.
[0074]
In this case, a transparent substrate described later may be surface-treated so that the surface becomes lyophilic. Examples of surface treatment of the surface of the transparent base material to be lyophilic include lyophilic surface treatment by plasma treatment using argon or water, etc. Examples of the layer include a silica film formed by a sol-gel method of tetraethoxysilane. In the present invention, a portion where the transparent base material is exposed is usually defined as a lyophilic region.
[0075]
Further, as a film that can be used for the decomposition removal layer as described above, specifically, a film made of a fluorine-based or hydrocarbon-based liquid-repellent resin or the like can be given. These fluorine-based and hydrocarbon-based resins are not particularly limited as long as they have liquid repellency. In the present invention, among them, those having a fluoroalkyl group are preferable. As described above, the fluoroalkyl group is easily affected by the active oxygen species generated by the action of the light having the above-mentioned wavelength, so that the decomposition removal layer can be efficiently decomposed and removed. The decomposition removal layer of the present invention can be formed by dissolving these resins in a solvent and using, for example, a general film forming method such as a spin coating method.
[0076]
Further, in the present invention, a functional thin film, that is, a self-assembled monomolecular film, a Langmuir-Brocket film, and by using an alternate adsorption film and the like, it is possible to form a film without defects, It can be said that such a film formation method is more preferably used.
[0077]
Here, the self-assembled monolayer, the Langmuir-Blodgett film, and the alternating adsorption film used in the present invention will be specifically described.
[0078]
(I) Self-assembled monolayer
The inventors do not know the existence of an official definition of a self-assembled monolayer (Self-Assembled Monolayer), but as a commentary on what is generally recognized as a self-assembled monolayer, a review by Abraham Ulman "Formation and Structure of Self-Assembled Monolayers", Chemical Review, 96, 1533-1554 (1996). With reference to this review, a self-assembled monolayer can be said to be a monolayer formed as a result of adsorption and binding (self-assembly) of appropriate molecules to an appropriate substrate surface. Materials capable of forming a self-assembled film include, for example, surfactant molecules such as fatty acids, organic silicon molecules such as alkyltrichlorosilanes and alkylalkoxides, organic sulfur molecules such as alkanethiols, and alkyl phosphates. Organic phosphoric acid molecule. A general commonality of molecular structures is that they have a relatively long alkyl chain and that at one molecular end there is a functional group that interacts with the substrate surface. The portion of the alkyl chain is a source of intermolecular force when the molecules are packed two-dimensionally. However, the example shown here is the simplest structure, having a functional group such as an amino group or a carboxyl group at the other end of the molecule, an alkylene chain having an oxyethylene chain, or a fluorocarbon chain. A self-assembled monolayer composed of various molecules, such as a complex-type chain, has been reported. There is also a composite self-assembled monolayer composed of a plurality of molecular species. Recently, a polymer having a plurality of functional groups (in some cases, one functional group) or a linear (in some cases having a branched structure) polymer in the form of particles, such as a dendrimer, has been developed. It seems that the one formed on the substrate surface (the latter is collectively referred to as a polymer brush) may be considered as a self-assembled monolayer. The present invention also includes these in self-assembled monolayers.
[0079]
(Ii) Langmuir-Blodgett membrane
The Langmuir-Blodgett film used in the present invention does not significantly differ from the above-described self-assembled monomolecular film in form when formed on a substrate. The characteristics of the Langmuir-Blodgett film can be said to be its formation method and the resulting high two-dimensional molecular packing properties (high orientation and high ordering). That is, in general, Langmuir-Blodgett film-forming molecules are first developed on the gas-liquid interface, and the developed film is condensed by the trough and changes into a highly packed condensed film. In practice, this is transferred to an appropriate substrate and used. It is possible to form from a monomolecular film to a multilayer film of an arbitrary molecular layer by the method outlined here. In addition, not only low molecules but also polymers, colloid particles, etc. can be used as the film material. For a review of recent applications of various materials, see Tokuharu Miyashita et al., “Prospects for Nanotechnology for Creating Soft Nanodevices,” Polymer, Vol. 50, September, 644-647.
(2001).
[0080]
(Iii) Alternating adsorption membrane
In general, a layer-by-layer self-assembled film is formed by sequentially adsorbing and bonding materials having at least two functional groups having positive or negative charges onto a substrate. This is a film formed by performing Since a material having a larger number of functional groups has more advantages such as an increase in the strength and durability of the membrane, an ionic polymer (polymer electrolyte) is often used recently as a material. Particles having a surface charge such as proteins, metals and oxides, so-called "colloidal particles" are also frequently used as film-forming substances. More recently, membranes have been reported that actively utilize weaker interactions than ionic bonds, such as hydrogen bonds, coordinate bonds, and hydrophobic interactions. Regarding the case of a relatively recent alternately adsorbed film, it is slightly biased toward a material system using electrostatic interaction as a driving force, but Paula T. et al. Review by Hammond "Recent Explorations in Electrostatic Multilayer Thin Film Assembly" Current Opinion in Colloid & Interface Science, 4, 430-442 (2000). In the alternate adsorption film, taking the simplest process as an example, the cycle of adsorption-washing of a material having a positive (negative) charge-adsorption-washing of a material having a negative (positive) charge is repeated a predetermined number of times. It is a film to be formed. No development-condensation-transfer operations are required at all as with Langmuir-Blodgett membranes. Further, as is apparent from the difference between these production methods, the alternating adsorption film generally does not have a two-dimensional high orientation and high order unlike the Langmuir-Blodgett film. However, the alternate adsorption film and its manufacturing method have advantages over conventional film forming methods, such as being able to easily form a dense film without defects and being able to uniformly form a film on a fine uneven surface, a tube inner surface, a spherical surface, and the like. Have many.
[0081]
The thickness of the decomposition removal layer is not particularly limited as long as it can be decomposed and removed by the energy applied in the exposure step described below. The specific film thickness varies greatly depending on the type of energy to be irradiated, the material of the decomposition removal layer, and the like, but is generally in the range of 0.001 μm to 1 μm, particularly 0.01 μm to 0.1 μm. It is preferable that the thickness be in the range of 1 μm.
[0082]
b. Shading part
Next, the light shielding portion used in the present invention will be described. In the present invention, since the light-shielding portion capable of blocking the light having the above-described wavelength is formed at a position to be an unexposed portion of the characteristic change layer of the pattern forming substrate, from the transparent substrate side described later. Even when the entire surface is exposed, the light-shielding portion shields the irradiated light, so that the characteristics of the characteristic change layer can be changed in a pattern. This makes it unnecessary to use a photomask or the like in the method of manufacturing a pattern-formed body of the present invention.
[0083]
As shown in FIG. 1 as an example, the light shielding portion used in the present invention is formed in a pattern at a position corresponding to a position where the light shielding portion 3 makes the surface of the characteristic change layer 2 on the transparent substrate 1 an unexposed portion. May be formed on the transparent base material opposite to the surface on which the characteristic change layer is formed. In the present invention, among the above, it is preferable that the light-shielding portion is formed in a pattern on the transparent base material, and the characteristic change layer is further formed thereon. This is because it is preferable to form a patterned light-shielding portion as close as possible to the characteristic change layer in order to prevent irregular reflection of irradiated light and improve accuracy.
[0084]
Such a light-shielding portion may be formed by forming a metal thin film of chromium or the like having a thickness of about 1000 to 2000 ° by a sputtering method, a vacuum evaporation method, or the like, and patterning the thin film. As the patterning method, a normal patterning method such as sputtering can be used.
[0085]
The material of the light-shielding portion in the present invention is not particularly limited as long as it blocks light having a wavelength of 200 nm or less. Specifically, carbon fine particles, metal It may be a layer containing light-shielding particles such as oxides, inorganic pigments, and organic pigments. As the resin binder to be used, one or a mixture of two or more resins such as polyimide resin, acrylic resin, epoxy resin, polyacrylamide, polyvinyl alcohol, gelatin, casein, and cellulose, photosensitive resin, and O / O A W emulsion type resin composition, for example, an emulsion of reactive silicone can be used. The thickness of such a resin light-shielding portion can be set within a range of 0.5 to 10 μm. A commonly used method such as a photolithography method and a printing method can be used as a method for patterning the resin light-shielding portion.
[0086]
c. Transparent substrate
Next, the transparent substrate used in the present invention will be described. The transparent substrate used in the present invention is capable of forming the light-shielding portion and the property-changing layer, and since light irradiation described below is performed from the transparent substrate side, the light having a wavelength of 200 nm or less is irradiated. There is no particular limitation as long as the transmittance is high. The transparent substrate may be flexible or non-flexible depending on the use of the pattern forming body.
[0087]
Specifically, preferable materials include, for example, non-flexible transparent rigid materials such as alkali-free glass, quartz glass, Pyrex (registered trademark), and synthetic quartz plates, and transparent resin films and optical resin plates. A transparent flexible material having flexibility may be used.
[0088]
2. Light irradiation
In the present invention, light having a wavelength of 200 nm or less is applied to the above-described substrate for a pattern forming body from the transparent substrate side. The type of light having a wavelength of 200 nm or less used in the present invention is not particularly limited as long as it can change the characteristics of the above-described characteristic change layer. In the present invention, since the property change layer and the light-shielding portion are close to each other, even when the irradiated light is not parallel light, the property of the property change layer can be changed with high definition. It is possible.
[0089]
The wavelength of the light used in the present invention is preferably 200 nm or less, particularly preferably in the range of 100 nm to 200 nm. Thereby, the characteristics of the characteristic change layer can be efficiently changed.
[0090]
Specific examples of the light source that can be used for such light irradiation include an ultraviolet excimer lamp such as argon, krypton, and xenon, and a low-pressure mercury lamp.
[0091]
Here, the light having a wavelength of 200 nm or less is not particularly limited as long as the light includes light having a wavelength of 200 nm or less. The light having a wavelength of 200 nm or less may be used alone. Two or more types of light that combine different light and light of 200 nm or less may be used.
[0092]
In this case, the irradiation amount of light is an irradiation amount necessary for changing the characteristics of the surface of the characteristic change layer by exposure. Further, the exposure direction in the present invention is performed from the transparent substrate side of the pattern forming substrate, and the entire surface of the pattern forming substrate is exposed unless otherwise required.
[0093]
When the light irradiation as described above is completed, a pattern formed body in which the characteristics of the characteristic change layer in the portion where the light-shielding portion is not formed is changed is obtained.
[0094]
The pattern formed body obtained by the present invention can easily form a functional portion in a pattern by utilizing a difference in properties such as wettability and unevenness, and manufacture various functional elements. It is possible.
[0095]
B. Color filter
Next, the color filter according to the present invention will be described. A color filter according to the present invention is characterized in that a pixel portion is formed on a pattern of a pattern formed body manufactured by the method for manufacturing a pattern formed body described above. According to the present invention, in the pattern formed body manufactured by the method for manufacturing a pattern formed body described above, the surface characteristics are changed in a pattern shape, and for example, a pixel is formed by utilizing a difference in characteristics such as a difference in wettability. By forming the portion, a color filter having a high-definition pixel portion can be obtained. Further, since the above-described pattern forming body can be efficiently manufactured at low cost, the color filter of the present invention can be efficiently manufactured at low cost as a result.
[0096]
The pixel portion in the color filter of the present invention is not particularly limited as long as the pixel portion can be formed on the pattern forming body described above, but in the present invention, the pixel portion is formed by inkjet. It is preferred that it is done. A high-definition pixel portion (functional portion) can be easily formed by attaching and curing ink (composition for a functional portion) on the lyophilic region on the pattern formed body by an ink jet device or the like. This makes it possible to obtain a high-definition color filter with a small number of steps.
[0097]
Further, in the present invention, the light shielding portion of the pattern forming body can be used as it is as a black matrix in a color filter. Therefore, when a pixel portion (colored layer) as a functional portion is formed on the above-described pattern formed body of the present invention, a color filter can be obtained without separately forming a black matrix.
[0098]
Note that the present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and has substantially the same configuration as the technical idea described in the claims of the present invention, and any device having the same operation and effect can be realized by the present invention. It is included in the technical scope of the invention.
[0099]
【Example】
Hereinafter, the present invention will be described in more detail through examples.
[0100]
[Example 1]
<Preparation of composition for wettability changing layer>
30 g of isopropyl alcohol, 3 g of fluoroalkylsilane (TSL8233 manufactured by FAS GE Toshiba Silicone Co., Ltd.), 3 g of tetramethoxysilane (TSL8114 manufactured by GE Toshiba Silicone Co., Ltd.) and 2.5 g of 0.05N hydrochloric acid were mixed and stirred for 8 hours. . This was diluted 100-fold with isopropyl alcohol to prepare a composition for a wettability changing layer.
[0101]
<Application>
Using a bead coater, the composition for a wettability changing layer was applied on a black matrix substrate (400 × 500 × 0.7 mm) on which a chromium film (thickness 0.2 μm) having a width of 20 μm was formed at a pitch of 170 μm. Then, the mixture was heated at 150 ° C. for 10 minutes to obtain a wettability changing layer having a thickness of 0.05 μm.
[0102]
<Exposure>
An irradiation distance of 1 mm, 15 mW / cm was applied to the black matrix substrate on which the wettability changing layer was formed, using a Xe excimer irradiation device.²Exposure was performed for 180 seconds from the side where the wettability changing layer was not formed at the illuminance.
[0103]
As a result, the surface of the wettability changing layer at the portion shaded by the chromium film had a contact angle of a wetting index standard solution of 41 mN / m of 80 °, and the portion not shaded at 10 ° or less. I got a pattern.
[0104]
<Color filter formation>
When a thermosetting red color filter layer ink (viscosity: 5 cP) was ejected by a piezo-drive type ink jet device to a portion where the wettability of the wettability pattern was changed, the wettability spread to the portion where the wettability was changed, By the subsequent heat treatment, a red color filter layer (1.5 μm) was obtained on the glass substrate with the black matrix.
[0105]
Next, blue and green color filter layers were similarly formed to form color filters.
[0106]
[Example 2]
<Deposition of wettability changing layer (monomolecular film)>
A fluoroalkylsilane (TSL8233 manufactured by FAS GE Toshiba Silicone Co., Ltd.) was heated to 240 ° C., and the vapor was applied to the black matrix substrate described in Example 1. Thereafter, unreacted FAS was washed away with methanol, and the black matrix substrate was washed. A monomolecular film was formed thereon.
[0107]
<Exposure>
Using a low-pressure mercury lamp, the black matrix substrate on which the wettability changing layer (monomolecular film) was formed was 10 mW / cm.²Exposure was performed for 300 seconds from the side where a film was not formed at an illuminance of.
[0108]
As a result, the surface of the ink-repellent film which was shielded from light by the chromium film had a contact angle of a standard liquid of 41 mN / m with a wetting index standard solution of 82 °, and the portion not shielded from light had a contact angle of 10 ° or less. I got a pattern.
[0109]
<Color filter formation>
When a thermosetting red color filter layer ink (viscosity: 5 cP) was ejected by a piezo-drive type ink jet device to a portion where the wettability of the wettability pattern was changed, the wettability spread to the portion where the wettability was changed, By the subsequent heat treatment, a red color filter layer (1.5 μm) was obtained on the glass substrate with the black matrix.
[0110]
Next, blue and green color filter layers were similarly formed to form color filters.
[0111]
【The invention's effect】
According to the present invention, since the property change layer changes its property by irradiation with the light, the pattern forming substrate has a transparent substrate side opposite to a surface on which the property change layer is formed. By irradiating the light from the above, it is possible to manufacture a pattern forming substrate in which the characteristics of the characteristic change layer in the portion where the light-shielding portion is not formed are changed with high definition without using a photomask or the like. . In addition, since the characteristic change layer and the light-shielding portion are close to each other, a non-parallel light source can be used as the light source, and no cost is required for producing the parallel light. Further, since there is no need to use a photomask, a pattern formed body can be manufactured at low cost and with high manufacturing efficiency.
[Brief description of the drawings]
FIG. 1 is a process chart showing an example of a method for producing a pattern forming body of the present invention.
[Explanation of symbols]
1 ... transparent substrate
2 ... characteristic change layer
3 ... light-shielding part
4 ... substrate for pattern forming body
5 Light
6 ... the part irradiated with light

Claims (13)

A transparent substrate, a characteristic change layer formed on the transparent substrate, the characteristic of which is changed by irradiation with light having a wavelength of 200 nm or less, and a pattern-forming body substrate having a light-shielding portion formed in a pattern. A method for producing a pattern-formed body, comprising irradiating light having a wavelength of 200 nm or less from a transparent substrate side to obtain a pattern-formed body having a pattern in which the characteristics of the characteristic-change layer have changed. 2. The method according to claim 1, wherein the light-shielding portion is formed in a pattern on the transparent base material, and the characteristic change layer is further formed thereon. 3. The method according to claim 1, wherein the irradiation with light having a wavelength of 200 nm or less is performed using an ultraviolet excimer lamp or a low-pressure mercury lamp. 4. 4. The pattern forming body according to claim 1, wherein the property change layer is a wettability change layer whose wettability changes by irradiation with light having a wavelength of 200 nm or less. 5. Manufacturing method. The contact angle with the liquid having a surface tension of 40 mN / m on the wettability changing layer is 10 ° or more in a portion not irradiated with light having a wavelength of 200 nm or less, and 9 ° in a portion irradiated with light having a wavelength of 200 nm or less.゜ The method according to claim 4, wherein: The method according to claim 4, wherein the wettability changing layer is a layer having a fluoroalkyl group. The method according to claim 4, wherein the wettability changing layer is a layer containing a silane compound. 4. The method of claim 1, wherein the characteristic change layer is a decomposition removal layer that is decomposed and removed by irradiation with light having a wavelength of 200 nm or less. 5. Method. 9. The pattern forming method according to claim 8, wherein a contact angle of the liquid with respect to the decomposition removal layer is different from a contact angle of the liquid with a transparent substrate exposed when the decomposition removal layer is decomposed and removed. How to make the body. The pattern forming body according to claim 9, wherein a contact angle with a liquid having a surface tension of 40 mN / m on the decomposition removal layer is 10 ° or more and 9 ° or less on the transparent substrate. Production method. The method according to any one of claims 8 to 10, wherein the decomposition removal layer is a layer having a fluoroalkyl group. A color filter, wherein a pixel portion is formed on a pattern of a pattern formed body manufactured by the method of manufacturing a pattern formed body according to any one of claims 1 to 11. The color filter according to claim 12, wherein the pixel unit is formed by an inkjet method.

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