JP2004186327A5 - - Google Patents

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Publication number
JP2004186327A5
JP2004186327A5 JP2002350236A JP2002350236A JP2004186327A5 JP 2004186327 A5 JP2004186327 A5 JP 2004186327A5 JP 2002350236 A JP2002350236 A JP 2002350236A JP 2002350236 A JP2002350236 A JP 2002350236A JP 2004186327 A5 JP2004186327 A5 JP 2004186327A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002350236A
Other versions
JP4174307B2 (ja
JP2004186327A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2002350236A priority Critical patent/JP4174307B2/ja
Priority claimed from JP2002350236A external-priority patent/JP4174307B2/ja
Priority to US10/724,737 priority patent/US6882407B2/en
Publication of JP2004186327A publication Critical patent/JP2004186327A/ja
Publication of JP2004186327A5 publication Critical patent/JP2004186327A5/ja
Application granted granted Critical
Publication of JP4174307B2 publication Critical patent/JP4174307B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2002350236A 2002-12-02 2002-12-02 露光装置 Expired - Fee Related JP4174307B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2002350236A JP4174307B2 (ja) 2002-12-02 2002-12-02 露光装置
US10/724,737 US6882407B2 (en) 2002-12-02 2003-12-02 Exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002350236A JP4174307B2 (ja) 2002-12-02 2002-12-02 露光装置

Publications (3)

Publication Number Publication Date
JP2004186327A JP2004186327A (ja) 2004-07-02
JP2004186327A5 true JP2004186327A5 (ja) 2006-01-19
JP4174307B2 JP4174307B2 (ja) 2008-10-29

Family

ID=32588079

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002350236A Expired - Fee Related JP4174307B2 (ja) 2002-12-02 2002-12-02 露光装置

Country Status (2)

Country Link
US (1) US6882407B2 (ja)
JP (1) JP4174307B2 (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7061586B2 (en) * 2004-03-02 2006-06-13 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP2006041046A (ja) * 2004-07-23 2006-02-09 Canon Inc 光電計測装置及び露光装置
JP2007329432A (ja) * 2006-06-09 2007-12-20 Canon Inc 露光装置
JP4192986B2 (ja) * 2006-10-20 2008-12-10 ソニー株式会社 温度制御装置および方法、並びにプログラム
EP3278353B1 (en) * 2015-03-31 2019-09-11 Tokyo Electron Limited Exposure dose homogenization through rotation, translation, and variable processing conditions
US9939732B2 (en) * 2015-10-27 2018-04-10 Cymer, Llc Controller for an optical system
CN107966882B (zh) 2017-08-10 2020-10-16 上海微电子装备（集团）股份有限公司 曝光设备和曝光方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6078381A (en) * 1993-02-01 2000-06-20 Nikon Corporation Exposure method and apparatus
US5581324A (en) * 1993-06-10 1996-12-03 Nikon Corporation Thermal distortion compensated projection exposure method and apparatus for manufacturing semiconductors
JP3487383B2 (ja) * 1995-07-06 2004-01-19 株式会社ニコン 露光装置及びそれを用いる素子製造方法
JP2001196293A (ja) * 2000-01-14 2001-07-19 Canon Inc 露光装置及びそれを用いたデバイスの製造方法

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