JP2004181369A - Ultrapure water making apparatus - Google Patents

Ultrapure water making apparatus Download PDF

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Publication number
JP2004181369A
JP2004181369A JP2002351846A JP2002351846A JP2004181369A JP 2004181369 A JP2004181369 A JP 2004181369A JP 2002351846 A JP2002351846 A JP 2002351846A JP 2002351846 A JP2002351846 A JP 2002351846A JP 2004181369 A JP2004181369 A JP 2004181369A
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Prior art keywords
hydrogen peroxide
ultrapure water
pure water
water system
use point
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JP2002351846A
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JP4219664B2 (en
Inventor
Yoshitaka Yamaki
由孝 八巻
Toshikazu Abe
俊和 阿部
Koji Takano
浩至 高野
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Nomura Micro Science Co Ltd
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Nomura Micro Science Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide an ultrapure water making apparatus constituted so as to eliminate the mixing with even a very small amount of hydrogen peroxide at a use point. <P>SOLUTION: The ultrapure water making apparatus, which has a pretreatment system, a primary pure water system, a secondary pure water system and a recovery system, has a hydrogen peroxide monitor arranged at an arbitrary place between the primary pure water system and the recovery system to detect hydrogen peroxide up to 10 ppb in ultrapure water and the branch pipe equipped with a changeover valve provided on the downstream side of the hydrogen peroxide monitor. When hydrogen peroxide with a predetermined concentration is detected by the hydrogen peroxide monitor, ultrapure water containing hydrogen peroxide is discharged so as not to go to the use point. <P>COPYRIGHT: (C)2004,JPO&NCIPI

Description

【0001】
【発明の属する技術分野】
本発明は、超純水製造装置に関するものである。
【0002】
【従来の技術】
半導体製造工程等に使用される超純水は、一般に前処理システムと一次純水システムにより精製されて一旦超純水タンクに貯溜され、超純水タンクに貯溜された超純水は二次純水システムを経てユースポイントに供給されて使用される。
【0003】
前処理システムは、凝集沈殿法、砂ろ過法、活性炭吸着法、pH調整等で構成され、一次純水システムは、ろ過分離処理装置、吸着処理装置、逆浸透膜(RO)装置、紫外線酸化装置、脱気装置、イオン交換処理装置等で構成され、二次純水システムは、紫外線酸化装置、イオン交換処理装置、限外濾過装置等から構成されている。
またユ−スポイントで使用した超純水に過酸化水素等の薬品が多量に混入していない場合は、再度超純水製造のための原水として使用するために回収される。回収水は回収ラインにおいて薬品等が除去あるいは分解された後、前処理システムや一次純水システムに返送される。
この回収ラインには、薬品として混入した過酸化水素等を分解するための活性炭処理装置を介挿することも行われている。
【0004】
近時、水素や酸素、オゾン等の活性気体を溶解させた機能水がシリコンウエハの洗浄に有効であることが見出されて、二次純水システムに機能水の製造装置を設けることが行われているが、その濃度管理が非常に難しいという問題があった。
【0005】
本発明者は、この問題について研究を進めたところ、従来回収ラインに介挿されていた活性炭では完全に過酸化水素を分解することができず、回収水中にはppbオーダーで過酸化水素が残存し、この微量残存する過酸化水素が一次純水システムと二次純水システムでも分解されずに末端超純水装置まで到達して、超純水を利用した機能水の濃度を変動させていることを見出した。
【0006】
すなわち、従来の過酸化水素試験紙を用いた検知法、あるいは過マンガン酸法やヨウ素電極法を用いた過酸化水素モニターで0ppmであった超純水がヨウ素電極滴定法を用いた過酸化水素モニターで測定すると5〜30ppbの範囲で過酸化水素が検出され、この微量残存する過酸化水素が機能水の濃度を変動させていたのである。
【0007】
ヨウ素電極滴定法を用いた過酸化水素モニターは、チオ硫酸ナトリウムとヨウ化カリウムを溶解した酸性溶液中に試料の超純水を入れ、ヨウ素イオンを超純水中の過酸化水素で定量的に酸化させ、酸化により生成したヨウ素をチオ硫酸ナトリウムと定量的に反応させて過酸化水素濃度を求めるようにしたものである。
【0008】
過酸化水素は、反応触媒を含む酸性溶液の中で定量的にヨウ素イオンを酸化してヨウ素を生成する。
【0009】
+ 2KI → I + 2KOH
【0010】
生成したヨウ素は、酸性溶液中でチオ硫酸ナトリウムと定量的に反応する。
【0011】
+ 2Na → 2NaI + Na
【0012】
この原理を用いた、5ppbまでの超純水中の過酸化水素を検出可能な市販の過酸化水素モニターとしては、「プロセスタイトレータ AHP−310L 過酸化水素全自動分析計」(平沼産業(株))が挙げられる。
【0013】
【発明が解決しようとする課題】
本発明は、かかる知見に基づいてなされたもので、超純水製造装置の任意の箇所、特に活性炭処理装置の下流側やユースポイントの近辺に、この高精度の微量過酸化水素モニターを配置して、過酸化水素が基準値を越えた場合に、過酸化水素を含む超純水を下流側へ通水させないようにした超純水製造装置を提供することを目的とする。
【0014】
【課題を解決するための手段】
本発明の超純水製造方法は、原水に含まれる懸濁物質を除去する前処理システムと、前記前処理システムの処理水を処理して超純水としこの超純水を超純水タンクに貯溜する一次純水システムと、前記超純水タンクに貯溜された超純水を紫外線酸化装置及びイオン交換装置を含む処理手段で処理してユースポイントに供給し、ユースポイントで使用されなかった超純水を前記超純水タンクに還流させる二次純水システムと、前記ユースポイントで使用された超純水を回収して活性炭処理装置を含む処理手段を介して前記前処理システム又は一次純水システムに還流させる回収ラインとを有する超純水製造装置において、前記一次純水システムから前記回収ラインまでの任意の個所に配置された少なくとも10ppb、好ましくは少なくとも5ppbまでの超純水中の過酸化水素を検出可能な過酸化水素モニターと、前記過酸化水素モニターの下流側に設けられた切替バルブを備えた分岐管とを有することを特徴としている。
【0015】
過酸化水素モニターと分岐管は、二次純水システムのユースポイントの近辺、特に回収ラインの活性炭処理装置の下流側に配置されることが特に好ましい。
【0016】
本発明の超純水製造装置に使用される活性炭処理装置、特に回収ラインに用いられる活性炭処理装置としては、過酸化水素に対する分解能が異なる少なくとも2種の活性炭を、過酸化水素に対する分解能が低い方の活性炭を上流側に、過酸化水素に対する分解能が高い方の活性炭を下流側に配置したものが適している。過酸化水素に対する分解能が低い活性炭は、通常の水処理に用いられているもので、例えば、やし殻活性炭、石炭系活性炭等が例示される。これらの活性炭は、内部に10〜10000A程度(その大半は10〜20Aである)の細孔が無数に形成されており、500〜1500m2 程度の比表面積を有している。なお、本明細書における活性炭の細孔分布及び比表面積は、窒素ガス(N)、アルゴンガス(Ar)等による吸着法もしくは水銀圧入法により測定した値である。
【0017】
これら通常の水処理に用いられている活性炭は、純水中例えば10mg/lの過酸化水素をSV=10h−1で通水したとき処理水中の過酸化水素を0.1〜1mg/l(=×1000μg/l)程度にまで減少させる分解能をもっている。なお、上記のSVは、空間速度(Space Velocity)の意味であり、SV=流速(l(リットル)/h(時間))/充填活性炭量(l)で表される。
【0018】
本発明で用いられる過酸化水素に対する分解能が高い方の活性炭は、20〜1000A(A=10nm)の細孔の割合を10Vol%以上、好ましくは20Vol%以上に高くするか、又は白金、パラジウム、銀のような分解触媒を担持させて過酸化水素に対する分解能を高くしたもので、純水中例えば10mg/lの過酸化水素をSV=10h−1で通水したとき、処理水中の過酸化水素を50μg/l、好ましくは10μg/l、より好ましくは5μg/l未満にまで分解する性能を有るものである。
【0019】
細孔分布を変えて過酸化水素に対する分解能を高めた活性炭としては、例えば、米国カルゴン カーボン コーポレーション(Calgon Carbon Corporation) から販売されているセンタウ(CENTAUR)(商品名)が例示される。また、過酸化水素高分解触媒を担持させた活性炭としては、クラレケミカル株式会社製 T−SB(商品名)が例示される。
【0020】
本発明における過酸化水素に対する分解能が低い方の活性炭としては、従来水処理に用いられている通常の活性炭を用いることができる。
【0021】
本発明のイオン交換処理に用いられるイオン交換装置としては、カチオン・アニオン交換樹脂を用いた混床式イオン交換塔もしくはカチオン交換樹脂を用いた単床塔とアニオン交換樹脂を用いた単床塔の組み合わせ、イオンの吸着と再生を連続的に行う電気式イオン交換樹脂装置が例示される。
【0022】
本発明のイオン交換処理に用いられるイオン交換装置としては、カチオン・アニオン交換樹脂を用いた混床式イオン交換塔もしくはカチオン交換樹脂を用いた単床塔とアニオン交換樹脂を用いた単床塔の組み合わせ、イオンの吸着と再生を連続的に行う電気式イオン交換樹脂装置が例示される。
【0023】
なお、高性能活性炭の過酸化水素分解性能は、被処理水のpHに依存し、酸性よりも中性やアルカリ性のほうが過酸化水素の分解性能が高くなる。従って必要に応じて活性炭通水前にカセイソ−ダ等のアルカリ剤を添加してpHをアルカリ性にしても良い。また半導体製造等で使用された超純水は酸性薬品をふくんでいる。この場合前述のようにアルカリ剤を添加することが考えられるが、過酸化水素30ppm 程度で有ればpHが低くても全く問題無く分解できる。
【0024】
【発明の実施の形態】
次に、本発明の実施例について詳細に説明する。
【0025】
【実施例1】
図1は、本発明の超純水製造装置の実施例を概略的に示した図である。この装置は、一次純水システム1、一次純水システム1で生産された超純水を貯溜する超純水タンク21を含む二次純水システム2とを備えており、一次純水システム1の前段の前処理システムは図示を省略されている。
【0026】
二次純水システム2は、超純水タンク21、紫外線酸化装置22、非再生型イオン交換処理装置23a,23b、限外ろ過膜装置24、ユースポイント25及びリタ−ンライン27′を含む配管27を備えており、限外ろ過膜装置24とユースポイント25の間には、10ppbまでの過酸化水素を測定可能な過酸化水素モニター28が設置されている。また、ユースポイント25に至る配管27には電磁開閉バルブ29aと29bが設けられており、過酸化水素モニター28が所定濃度の過酸化水素を検出したときにはこの電磁開閉バルブ29aが閉じ29bが開いて、この超純水はユ−スポイントに行かないようになっている。
【0027】
図2は、二次純水システム2が正常な状態のときの各部で測定された過酸化水素濃度である。二次純水システ2は循環ラインであるから、非再生型イオン交換処理装置の性能が劣化すると、例えば一次純水システム1から過酸化水素が混入した一次純水が場合流入した場合、図3に示すように二次純水システム全体の過酸化水素濃度が高くなる。同図において、実線は過酸化水素を含まない一次純水流入時(回収水遮断時)を示し、鎖線は過酸化水素を含む一次純水流入時(回収水流入時)を示している。
【0028】
なお、この実施例では、限外ろ過膜装置24とユースポイント25の間に5ppbまで測定可能な過酸化水素モニター28を設置したが、紫外線酸化装置22と非再生型イオン交換処理装置23bとの間や一次純水システム1と二次純水システム2の間に過酸化水素モニター28を設置することも可能である。
【0029】
実施例2
図4は、本発明の他の実施例の要部を模式的に示したもので、供給経路31aは、図示を省略した前処理システムから一次純水システム1へ被処理水を供給する供給経路であり、供給経路31bは、前処理システム以外、例えば回収ラインから一次純水システム1へ被処理水を供給する供給経路である。
【0030】
これらの供給経路31a,31bは、それぞれ一次純水システム1に並列的に被処理水を給水し、一次純水システム1で生成された一次純水は二次純水システム2に給水されている。各供給経路31a,31bと一次純水システム1との間には、それぞれ流量調整バルブ32a,32bが介挿されている。また、一次純水システム1の任意の箇所には、5ppbまでの過酸化水素を測定可能な過酸化水素モニター28が設置され、この過酸化水素モニター28が所定濃度の過酸化水素を検出したときにはこの流量調整バルブ32a,32bの開度が調節されて供給経路31a,31bの供給比率が変わるか、あるいは一方が閉じられるようになっている。
【0031】
この実施例において、例えば供給経路31bが、過酸化水素の混入する可能性のある回収ラインであったとすると、過酸化水素モニター28が所定濃度の過酸化水素を検出したときには、流量調整バルブ32aの開度が大きくされ,流量調整バルブ32bが閉じられるように開閉制御が行われる。
【0032】
過酸化水素モニター28が所定の濃度の過酸化水素を検出した場合には、この過酸化水素は二次純水システム2からの回収水に起因するから、流量調整バルブを調整して供給経路21、22からの給水比率を変えることにより、過酸化水素濃度を基準以下にまで低下させることが可能である。
【0033】
実施例3
この実施例は、図5に示すように、一次純水システム1及び二次純水システム2の任意の箇所に5ppbまでの過酸化水素を測定可能な過酸化水素モニター28a,28bを設置し、前処理システム30と一次純水システム1の間、一次純水システム1と二次純水システム2の間の主配管40にそれぞれ分岐管41a、41bを設け、それぞれ分岐部の下流側に電磁開閉バルブ32a,32b、33a,33bを設置している。
【0034】
この実施例の場合にも過酸化水素モニター28a又は28bが所定濃度の過酸化水素を検出したときには、上流側にある分岐管41a,41bの電磁開閉バルブ32b又は33bを開放し電磁開閉バルブ32a又は32bが閉じて過酸化水素を含有する被処理水が二次純水システム2に流れることを抑制する。
【0035】
実施例4
この実施例は、図6に示すように、前処理システム30と一次純水システム1間に過酸化水素モニター28a,28bを設置し、前処理システム30と一次純水システム1との間、一次純水システム1と二次純水システム2との間の主配管40にそれぞれ分岐管41a、41bを設け、それぞれ分岐部の下流側に電磁開閉バルブ32a,32b、33a,33bを設置したものである。
【0036】
この実施例によれば、実施例3の場合と同様に、一次純水システム1と二次純水システム2へ流入する被処理水の水質を管理することができる。
【0037】
実施例5
この実施例は、図7に示すように、回収ライン50に設けた分岐管51を挟んでその上流側、下流側の配管及び一次純水システム1に過酸化水素モニター28a,28b,28cを設置したものである。この実施例では、いずれの過酸化水素モニター28a,28b,28cからも回収ライン50に設けた電磁開閉バルブ32aと分岐管51に設けた電磁開閉バルブ32bを制御可能とされている。
【0038】
この実施例によれば、複数箇所に設置した過酸化水素モニターにより電磁開閉弁を制御するので、過酸化水素を含む被処理水が二次純水システムまで給水される可能性がさらに小さいものとなる。
【0039】
【発明の効果】
以上の実施例からも明らかなように、本発明によれば、ユースポイントで使用される超純水への過酸化水素の残留をほぼ完全に除去することができ、これによって機能水の濃度管理が容易となる。
【図面の簡単な説明】
【図1】本発明の一実施例の構成を概略的に示す図。
【図2】二次純水システムにおける各部の過酸化水素濃度を示すグラフ。
【図3】本発明の効果を示すグラフ。
【図4】本発明の他の実施例の構成を概略的に示す図。
【図5】本発明の他の施例の構成を概略的に示す図。
【図6】本発明の他の実施例の構成を概略的に示す図。
【図7】本発明の他の実施例の構成を概略的に示す図。
【符号の説明】
1……一次純水システム、2……二次純水システム、21……超純水タンク、22……紫外線酸化装置、23a,23b……非再生型イオン交換処理装置,24……限外ろ過膜装置、25……ユースポイント、27′……リタ−ンライン、28……過酸化水素モニター、29……電磁開閉バルブ
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to an ultrapure water production apparatus.
[0002]
[Prior art]
Ultrapure water used in semiconductor manufacturing processes, etc. is generally purified by a pretreatment system and a primary pure water system, and once stored in an ultrapure water tank, the ultrapure water stored in the ultrapure water tank is secondary pure water. It is supplied to the use point through the water system and used.
[0003]
The pretreatment system is composed of coagulation sedimentation method, sand filtration method, activated carbon adsorption method, pH adjustment, etc. The primary pure water system is filtration separation treatment device, adsorption treatment device, reverse osmosis membrane (RO) device, UV oxidation device The secondary pure water system is composed of an ultraviolet oxidation device, an ion exchange treatment device, an ultrafiltration device, and the like.
If a large amount of chemicals such as hydrogen peroxide is not mixed in the ultrapure water used at the use point, it is recovered for use as raw water for the production of ultrapure water again. The recovered water is returned to the pretreatment system or the primary pure water system after chemicals are removed or decomposed in the recovery line.
An activated carbon treatment apparatus for decomposing hydrogen peroxide and the like mixed as a chemical is also inserted in the recovery line.
[0004]
Recently, it has been found that functional water in which active gases such as hydrogen, oxygen, and ozone are dissolved is effective for cleaning silicon wafers, and it is now possible to install a functional water production device in a secondary pure water system. However, there is a problem that the concentration control is very difficult.
[0005]
As a result of researches on this problem, the present inventor has not been able to completely decompose hydrogen peroxide with the activated carbon inserted in the conventional recovery line, and hydrogen peroxide remains in the ppb order in the recovered water. However, this trace amount of remaining hydrogen peroxide reaches the terminal ultrapure water device without being decomposed in the primary pure water system and the secondary pure water system, and the concentration of functional water using ultrapure water is changed. I found out.
[0006]
In other words, ultrapure water that was 0 ppm by the conventional detection method using hydrogen peroxide test paper or the hydrogen peroxide monitor using permanganic acid method or iodine electrode method is hydrogen peroxide using iodine electrode titration method. When measured with a monitor, hydrogen peroxide was detected in the range of 5 to 30 ppb, and this trace amount of remaining hydrogen peroxide varied the concentration of functional water.
[0007]
The hydrogen peroxide monitor using the iodine electrode titration method puts ultrapure water of a sample in an acidic solution in which sodium thiosulfate and potassium iodide are dissolved, and quantitatively analyzes iodine ions with hydrogen peroxide in ultrapure water. The hydrogen peroxide concentration is obtained by oxidizing and quantitatively reacting iodine produced by the oxidation with sodium thiosulfate.
[0008]
Hydrogen peroxide generates iodine by quantitatively oxidizing iodine ions in an acidic solution containing a reaction catalyst.
[0009]
H 2 O 2 + 2KI → I 2 + 2KOH
[0010]
The produced iodine reacts quantitatively with sodium thiosulfate in acidic solution.
[0011]
I 2 + 2Na 2 O 3 → 2NaI + Na 2 S 4 O 6
[0012]
As a commercially available hydrogen peroxide monitor that can detect hydrogen peroxide in ultrapure water up to 5 ppb using this principle, the “Process Titrator AHP-310L Hydrogen Peroxide Full-Automatic Analyzer” (Hiranuma Sangyo Co., Ltd.) )).
[0013]
[Problems to be solved by the invention]
The present invention has been made on the basis of such knowledge, and this high-accuracy trace hydrogen peroxide monitor is disposed at an arbitrary location of the ultrapure water production apparatus, particularly at the downstream side of the activated carbon treatment apparatus or in the vicinity of the use point. Thus, an object of the present invention is to provide an ultrapure water producing apparatus that prevents ultrapure water containing hydrogen peroxide from flowing downstream when hydrogen peroxide exceeds a reference value.
[0014]
[Means for Solving the Problems]
The ultrapure water production method of the present invention includes a pretreatment system for removing suspended substances contained in raw water, and treating the treated water of the pretreatment system to form ultrapure water. The primary pure water system to be stored and the ultrapure water stored in the ultrapure water tank are processed by a processing means including an ultraviolet oxidizer and an ion exchanger and supplied to the use point. A secondary pure water system that recirculates pure water to the ultrapure water tank, and the pretreatment system or primary pure water through a processing means that collects the ultrapure water used at the use point and includes an activated carbon treatment device. In an ultrapure water production apparatus having a recovery line to be refluxed to the system, at least 10 ppb, preferably at least 5 disposed at any location from the primary pure water system to the recovery line And hydrogen peroxide monitor capable of detecting the ultrapure water of hydrogen peroxide up to pb, is characterized by having a branch pipe provided with a switching valve provided on the downstream side of the hydrogen peroxide monitor.
[0015]
It is particularly preferable that the hydrogen peroxide monitor and the branch pipe are arranged in the vicinity of the use point of the secondary pure water system, particularly on the downstream side of the activated carbon treatment apparatus in the recovery line.
[0016]
As the activated carbon treatment apparatus used in the ultrapure water production apparatus of the present invention, particularly as the activated carbon treatment apparatus used in the recovery line, at least two kinds of activated carbons having different resolutions against hydrogen peroxide are used, and those having lower resolution against hydrogen peroxide. It is suitable to arrange the activated carbon having the higher resolution against hydrogen peroxide on the upstream side. Activated carbon having a low resolution for hydrogen peroxide is used for ordinary water treatment, and examples thereof include coconut shell activated carbon and coal-based activated carbon. These activated carbons have innumerable pores of about 10 to 10000 A (most of which are 10 to 20 A) inside and have a specific surface area of about 500 to 1500 m 2. In addition, the pore distribution and specific surface area of activated carbon in the present specification are values measured by an adsorption method using a nitrogen gas (N 2 ), an argon gas (Ar), or the like, or a mercury intrusion method.
[0017]
The activated carbon used for these normal water treatments is, for example, when hydrogen peroxide of 10 mg / l is passed in pure water at SV = 10 h −1 , the hydrogen peroxide in the treated water is 0.1-1 mg / l ( = × 1000 μg / l). In addition, said SV is the meaning of space velocity (Space Velocity), and is represented by SV = flow velocity (l (liter) / h (hour)) / filled activated carbon amount (l).
[0018]
The activated carbon having a higher resolution with respect to hydrogen peroxide used in the present invention increases the proportion of pores of 20 to 1000 A (A = 10 nm) to 10 Vol% or more, preferably 20 Vol% or more, or platinum, palladium, A decomposition catalyst such as silver is supported to increase the resolution for hydrogen peroxide. When hydrogen peroxide of 10 mg / l, for example, in pure water is passed at SV = 10 h −1 , hydrogen peroxide in the treated water is used. Is capable of degrading to 50 μg / l, preferably 10 μg / l, more preferably less than 5 μg / l.
[0019]
An example of the activated carbon having improved pore resolution and improved resolution against hydrogen peroxide is CENTAUR (trade name) sold by Calgon Carbon Corporation. Moreover, as activated carbon which carried | supported the hydrogen peroxide high decomposition catalyst, Kuraray Chemical Co., Ltd. T-SB (brand name) is illustrated.
[0020]
As the activated carbon having a lower resolution with respect to hydrogen peroxide in the present invention, ordinary activated carbon conventionally used for water treatment can be used.
[0021]
The ion exchange apparatus used for the ion exchange treatment of the present invention includes a mixed bed type ion exchange tower using a cation / anion exchange resin or a single bed tower using a cation exchange resin and a single bed tower using an anion exchange resin. An electric ion exchange resin apparatus that continuously performs combination, ion adsorption and regeneration is exemplified.
[0022]
The ion exchange apparatus used for the ion exchange treatment of the present invention includes a mixed bed type ion exchange tower using a cation / anion exchange resin or a single bed tower using a cation exchange resin and a single bed tower using an anion exchange resin. An electric ion exchange resin apparatus that continuously performs combination, ion adsorption and regeneration is exemplified.
[0023]
The hydrogen peroxide decomposition performance of the high-performance activated carbon depends on the pH of the water to be treated, and the neutral or alkaline decomposition performance of hydrogen peroxide is higher than that of acid. Therefore, if necessary, an alkaline agent such as casisoda may be added to make the pH alkaline before passing the activated carbon. In addition, ultrapure water used in semiconductor manufacturing contains acidic chemicals. In this case, it is conceivable to add an alkali agent as described above, but if it is about 30 ppm hydrogen peroxide, it can be decomposed without any problem even if the pH is low.
[0024]
DETAILED DESCRIPTION OF THE INVENTION
Next, examples of the present invention will be described in detail.
[0025]
[Example 1]
FIG. 1 is a diagram schematically showing an embodiment of the ultrapure water production apparatus of the present invention. The apparatus includes a primary pure water system 1 and a secondary pure water system 2 including an ultrapure water tank 21 that stores ultrapure water produced by the primary pure water system 1. The pre-processing system in the previous stage is not shown.
[0026]
The secondary pure water system 2 includes an ultrapure water tank 21, an ultraviolet oxidation device 22, non-regenerative ion exchange treatment devices 23a and 23b, an ultrafiltration membrane device 24, a use point 25, and a pipe 27 including a return line 27 '. A hydrogen peroxide monitor 28 capable of measuring hydrogen peroxide up to 10 ppb is installed between the ultrafiltration membrane device 24 and the use point 25. The pipe 27 leading to the use point 25 is provided with electromagnetic opening / closing valves 29a and 29b. When the hydrogen peroxide monitor 28 detects a predetermined concentration of hydrogen peroxide, the electromagnetic opening / closing valve 29a is closed and 29b is opened. This ultrapure water does not go to the use point.
[0027]
FIG. 2 shows the hydrogen peroxide concentration measured at each part when the secondary pure water system 2 is in a normal state. Since the secondary pure water system 2 is a circulation line, when the performance of the non-regenerative ion exchange apparatus deteriorates, for example, when primary pure water mixed with hydrogen peroxide flows from the primary pure water system 1 in FIG. As shown in the figure, the concentration of hydrogen peroxide in the entire secondary pure water system becomes high. In the figure, the solid line indicates when primary pure water that does not contain hydrogen peroxide flows (when recovered water is shut off), and the chain line indicates when primary pure water that contains hydrogen peroxide flows (when recovered water flows).
[0028]
In this embodiment, a hydrogen peroxide monitor 28 capable of measuring up to 5 ppb is installed between the ultrafiltration membrane device 24 and the use point 25. However, the ultraviolet oxidation device 22 and the non-regenerative ion exchange treatment device 23b are connected to each other. It is also possible to install a hydrogen peroxide monitor 28 between the primary pure water system 1 and the secondary pure water system 2.
[0029]
Example 2
FIG. 4 schematically shows a main part of another embodiment of the present invention. A supply path 31a is a supply path for supplying water to be treated to the primary pure water system 1 from a pretreatment system (not shown). The supply path 31b is a supply path for supplying the water to be treated to the primary pure water system 1 from the recovery line, for example, other than the pretreatment system.
[0030]
These supply paths 31 a and 31 b supply treated water in parallel to the primary pure water system 1, respectively, and the primary pure water generated in the primary pure water system 1 is supplied to the secondary pure water system 2. . Between the supply paths 31a and 31b and the primary pure water system 1, flow rate adjusting valves 32a and 32b are respectively inserted. In addition, a hydrogen peroxide monitor 28 capable of measuring hydrogen peroxide of up to 5 ppb is installed at an arbitrary location of the primary pure water system 1, and when this hydrogen peroxide monitor 28 detects a predetermined concentration of hydrogen peroxide. The opening ratios of the flow rate adjusting valves 32a and 32b are adjusted to change the supply ratios of the supply paths 31a and 31b, or one of them is closed.
[0031]
In this embodiment, for example, if the supply path 31b is a recovery line in which hydrogen peroxide may be mixed, when the hydrogen peroxide monitor 28 detects a predetermined concentration of hydrogen peroxide, the flow rate adjustment valve 32a Opening / closing control is performed so that the opening degree is increased and the flow rate adjusting valve 32b is closed.
[0032]
When the hydrogen peroxide monitor 28 detects a predetermined concentration of hydrogen peroxide, this hydrogen peroxide is caused by the recovered water from the secondary pure water system 2, so the supply path 21 is adjusted by adjusting the flow rate adjustment valve. , 22 can be changed to reduce the hydrogen peroxide concentration below the standard.
[0033]
Example 3
In this embodiment, as shown in FIG. 5, hydrogen peroxide monitors 28a and 28b capable of measuring hydrogen peroxide of up to 5 ppb are installed at arbitrary locations of the primary pure water system 1 and the secondary pure water system 2, Branch pipes 41a and 41b are provided in the main pipe 40 between the pretreatment system 30 and the primary pure water system 1 and between the primary pure water system 1 and the secondary pure water system 2, respectively, and electromagnetic switching is performed on the downstream side of the branch part. Valves 32a, 32b, 33a, 33b are installed.
[0034]
Also in this embodiment, when the hydrogen peroxide monitor 28a or 28b detects a predetermined concentration of hydrogen peroxide, the electromagnetic open / close valve 32b or 33b of the branch pipes 41a and 41b on the upstream side is opened to open the electromagnetic open / close valve 32a or 32b closes and it suppresses that the to-be-processed water containing hydrogen peroxide flows into the secondary pure water system 2. FIG.
[0035]
Example 4
In this embodiment, as shown in FIG. 6, hydrogen peroxide monitors 28a and 28b are installed between the pretreatment system 30 and the primary pure water system 1, and the primary treatment between the pretreatment system 30 and the primary pure water system 1 is the primary. The main pipe 40 between the pure water system 1 and the secondary pure water system 2 is provided with branch pipes 41a and 41b, respectively, and electromagnetic open / close valves 32a, 32b, 33a and 33b are respectively installed downstream of the branch parts. is there.
[0036]
According to this embodiment, the quality of the water to be treated flowing into the primary pure water system 1 and the secondary pure water system 2 can be managed as in the case of the third embodiment.
[0037]
Example 5
In this embodiment, as shown in FIG. 7, hydrogen peroxide monitors 28 a, 28 b, and 28 c are installed in the upstream and downstream piping and the primary pure water system 1 across the branch pipe 51 provided in the recovery line 50. It is a thing. In this embodiment, the electromagnetic open / close valve 32a provided in the recovery line 50 and the electromagnetic open / close valve 32b provided in the branch pipe 51 can be controlled from any of the hydrogen peroxide monitors 28a, 28b, 28c.
[0038]
According to this embodiment, since the electromagnetic on-off valve is controlled by hydrogen peroxide monitors installed at a plurality of locations, the possibility that the treated water containing hydrogen peroxide will be supplied to the secondary pure water system is further reduced. Become.
[0039]
【The invention's effect】
As is clear from the above examples, according to the present invention, it is possible to almost completely remove the residual hydrogen peroxide in the ultrapure water used at the use point, thereby controlling the concentration of functional water. Becomes easy.
[Brief description of the drawings]
FIG. 1 is a diagram schematically showing the configuration of an embodiment of the present invention.
FIG. 2 is a graph showing the hydrogen peroxide concentration of each part in the secondary pure water system.
FIG. 3 is a graph showing the effect of the present invention.
FIG. 4 is a diagram schematically showing the configuration of another embodiment of the present invention.
FIG. 5 is a diagram schematically showing the configuration of another embodiment of the present invention.
FIG. 6 is a diagram schematically showing the configuration of another embodiment of the present invention.
FIG. 7 is a diagram schematically showing the configuration of another embodiment of the present invention.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 ... Primary pure water system, 2 ... Secondary pure water system, 21 ... Ultrapure water tank, 22 ... Ultraviolet oxidizer, 23a, 23b ... Non-regenerative ion exchange treatment device, 24 ... Ultra Filtration membrane device, 25 ... use point, 27 '... return line, 28 ... hydrogen peroxide monitor, 29 ... electromagnetic on-off valve

Claims (2)

原水に含まれる懸濁物質を除去する前処理システムと、前記前処理システムの処理水を処理して超純水としこの超純水を超純水タンクに貯溜する一次純水システムと、前記超純水タンクに貯溜された超純水を紫外線酸化装置及びイオン交換装置を含む処理手段で処理してユースポイントに供給し、ユースポイントで使用されなかった超純水を前記超純水タンクに還流させる二次純水システムと、前記ユースポイントで使用された超純水を回収して活性炭処理装置を含む処理手段を介して前記前処理システム又は一次純水システムに還流させる回収ラインとを有する超純水製造装置において、
前記一次純水システムから前記回収ラインまでの任意の個所に配置された少なくとも10ppbまでの超純水中の過酸化水素を検出可能な過酸化水素モニターと、前記過酸化水素モニターの下流側又は上流側に設けられた切替バルブを備えた分岐管とを有することを特徴とする超純水製造装置。
A pretreatment system for removing suspended substances contained in raw water; a primary pure water system for treating the treated water of the pretreatment system to form ultrapure water; and storing the ultrapure water in an ultrapure water tank; The ultrapure water stored in the pure water tank is treated with processing means including an ultraviolet oxidizer and an ion exchanger and supplied to the use point, and the ultrapure water not used at the use point is returned to the ultrapure water tank. A secondary pure water system to be recovered, and a recovery line for recovering the ultrapure water used at the use point and returning it to the pretreatment system or the primary pure water system through a processing means including an activated carbon processing apparatus. In pure water production equipment,
A hydrogen peroxide monitor capable of detecting hydrogen peroxide in ultrapure water of at least 10 ppb disposed at any location from the primary pure water system to the recovery line, and downstream or upstream of the hydrogen peroxide monitor An ultrapure water production apparatus comprising: a branch pipe provided with a switching valve provided on the side.
前記過酸化水素モニターと前記分岐管は、前記二次純水システムのユースポイント及び/又は回収ラインの活性炭処理装置の直前に配置されることを特徴とする請求項1記載の超純水製造装置。2. The apparatus for producing ultrapure water according to claim 1, wherein the hydrogen peroxide monitor and the branch pipe are arranged immediately before a use point of the secondary pure water system and / or an activated carbon treatment device of a recovery line. .
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