JP2004126097A - Uv light spot irradiation and exposing device - Google Patents

Uv light spot irradiation and exposing device Download PDF

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Publication number
JP2004126097A
JP2004126097A JP2002288402A JP2002288402A JP2004126097A JP 2004126097 A JP2004126097 A JP 2004126097A JP 2002288402 A JP2002288402 A JP 2002288402A JP 2002288402 A JP2002288402 A JP 2002288402A JP 2004126097 A JP2004126097 A JP 2004126097A
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JP
Japan
Prior art keywords
light
lens
spot
exposure
main body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002288402A
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Japanese (ja)
Inventor
Kazuhiro Hocchi
発知 和広
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
YE Data Inc
Original Assignee
YE Data Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by YE Data Inc filed Critical YE Data Inc
Priority to JP2002288402A priority Critical patent/JP2004126097A/en
Publication of JP2004126097A publication Critical patent/JP2004126097A/en
Pending legal-status Critical Current

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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a UV light spot irradiation and exposure device which improves exposure edge precision by preventing an exposure time from being extended accompanying variation in size of an irradiation spot. <P>SOLUTION: An exposure device main body 1 is provided with a light guide 2 as a light source for UV light at the upper end of a lens frame main body 3 provided with a fixed lens 4, a frame 5 for zooming which is provided with a movable lens and has a projection hole 9 atop is fitted to the lens frame main body 3 to freely slide upward and downward by a zoom adjusting device 5', and the lens frame main body 3 is configured to freely move up and down about a lens fitting plate 8 by a focal length adjusting device 7. <P>COPYRIGHT: (C)2004,JPO

Description

【0001】
本発明はUV光をレンズによりスポット照射する露光装置に関するものである。
【発明の属する技術分野】
【0002】
図2は、従来のUV光をレンズによりスポット照射する従来の露光装置1’の一部縦断測面図を示すもので、スポットサイズを可変させるために可変マスク13を出射孔9’の先端に取り付けている。図中、2’はライトガイド、3’はレンズフレーム、4’,6’はレンズ、8’はレンズ取付プレート、9’は出射孔、10’は照射光、11は露光面、12は漏れ光、14は可変マスク調節装置である。
【0003】
図3は図2に示す従来の露光装置1’の下面図で、可変マスク13を左右に移動することにより照射スポットのサイズを変化することが出来る。しかしこの場合、可変マスク13により照射光を遮蔽するため照射光の光量も減ることになり、十分な露光量を得るためには、その分だけ露光時間を長くしなければならない。
【0004】
従って、照射スポットを小さくする度に露光時間が長くなってしまうので、全ての露光を終了するための製造装置としてのタクトタイムが伸びてしまう。
【0005】
また、可変マスク13により照射光を遮蔽するため、漏れ光12が発生し照射光にエッジぼけが生じるため露光エッジの精度を悪くしている。
【0006】
【発明が解決しようとする課題】
そこで、本発明は、照射スポットのサイズ変更に伴う露光時間の延長を防止し、露光エッジ精度を向上するUV光スポット照射露光装置を提供することを課題とするものである。
【0007】
【課題を解決するための手段】
本発明は、上記の課題を解決するためになされたもので、光源部のUVランプにより発光させたUV光を、X−Yステージに取り付けたレンズにより集光させてスポット照射することで基板上の感光レジストを部分的に露光する装置において、スポット光の径を変倍するズームレンズ機構と、スポット光の焦点距離調節機構を設けたUV光スポット照射露光装置である。
【0008】
【発明の実施の形態】
図1は、本発明の一実施例を示す一部縦断側面図で、1は露光装置本体、2はUV光の光源であるライトガイド、3はレンズフレーム本体、4は固定レンズ、5はレンズフレーム本体3に嵌合し、5’のズーム調節装置により上下自在に摺動可能なズーム用フレーム、6は可動レンズ、7はレンズフレーム本体3をレンズ取付プレート8に対して上下に昇降自在に移動することができる焦点距離調節装置、9はズーム用フレーム先端に設けられた出射孔、10は照射光、11は露光面である。
【0009】
ライトガイド2から照射された照射光は固定レンズ4、可動レンズ6により集光され出射孔9を通して露光面11に照射される。可動レンズ6はズーム用フレーム5と共に上下に昇降して照射光10の径を変化させる。このとき照射光10の焦点距離も変わるため焦点が露光11に合焦するようにレンズフレーム本体3を焦点距離調節装置7により昇降させる。なお、可動レンズ6の上下方向の駆動は手動式でも電動式でもよい。
【0010】
【発明の効果】
本発明は以上のように構成されるので、照射スポットを可変マスクで遮蔽しない為、光量ロスが無く、更に焦点距離を調節することにより単位面積当りの光量が増加するので、露光時間が短縮されて、製造装置のタクトタイムが短くなるため、照射スポット変更に伴う露光時間の延長を防止することが出来る。また、可変マスクで遮蔽しないことで可変マスク部からの漏れ光による露光エッジへの影響が防止される。
【図面の簡単な説明】
【図1】本発明の一実施例を示す一部縦断側面図。
【図2】従来の露光装置を示す一部縦断測面図。
【図3】図2に示す露光装置の下面図。
【符号の説明】
1   露光装置本体
2   ライトガイド
3   レンズフレーム
4   固定レンズ
5   ズーム用フレーム
5’  ズーム調節装置
6   可動レンズ
7   焦点距離調節装置
8   レンズ取付フレーム
9   出射孔
10   照射光
11   露光面
[0001]
The present invention relates to an exposure apparatus that irradiates a spot with UV light.
TECHNICAL FIELD OF THE INVENTION
[0002]
FIG. 2 is a partial vertical cross-sectional view of a conventional exposure apparatus 1 'that irradiates a spot with a conventional UV light by a lens. In order to change a spot size, a variable mask 13 is provided at the tip of an emission hole 9'. Attached. In the figure, 2 'is a light guide, 3' is a lens frame, 4 'and 6' are lenses, 8 'is a lens mounting plate, 9' is an exit hole, 10 'is irradiation light, 11 is an exposure surface, and 12 is leakage. Light 14 is a variable mask adjustment device.
[0003]
FIG. 3 is a bottom view of the conventional exposure apparatus 1 'shown in FIG. 2, and the size of the irradiation spot can be changed by moving the variable mask 13 right and left. However, in this case, since the irradiation light is shielded by the variable mask 13, the light amount of the irradiation light also decreases, and in order to obtain a sufficient exposure amount, the exposure time must be lengthened accordingly.
[0004]
Therefore, the exposure time becomes longer each time the irradiation spot is made smaller, so that the tact time as a manufacturing apparatus for completing all the exposures is extended.
[0005]
Further, since the irradiation light is shielded by the variable mask 13, the leakage light 12 is generated and the irradiation light is blurred, so that the accuracy of the exposure edge is deteriorated.
[0006]
[Problems to be solved by the invention]
Accordingly, it is an object of the present invention to provide a UV light spot irradiation exposure apparatus that prevents an increase in exposure time due to a change in the size of an irradiation spot and improves exposure edge accuracy.
[0007]
[Means for Solving the Problems]
The present invention has been made in order to solve the above-mentioned problems, and a UV light emitted by a UV lamp of a light source unit is condensed by a lens attached to an XY stage and is spot-irradiated on a substrate. Is a UV light spot irradiation exposure apparatus provided with a zoom lens mechanism for changing the diameter of the spot light and a focal length adjustment mechanism for the spot light.
[0008]
BEST MODE FOR CARRYING OUT THE INVENTION
FIG. 1 is a partially longitudinal side view showing an embodiment of the present invention. 1 is an exposure apparatus main body, 2 is a light guide as a light source of UV light, 3 is a lens frame main body, 4 is a fixed lens, and 5 is a lens. A zoom frame that fits into the frame body 3 and can be slid up and down freely by a 5 ′ zoom adjustment device, 6 is a movable lens, and 7 is a lens frame body 3 that can be moved up and down with respect to the lens mounting plate 8. A movable focal length adjusting device, 9 is an emission hole provided at the end of the zoom frame, 10 is irradiation light, and 11 is an exposure surface.
[0009]
Irradiation light emitted from the light guide 2 is condensed by the fixed lens 4 and the movable lens 6 and is emitted to the exposure surface 11 through the emission hole 9. The movable lens 6 moves up and down together with the zoom frame 5 to change the diameter of the irradiation light 10. At this time, since the focal length of the irradiation light 10 also changes, the lens frame main body 3 is moved up and down by the focal length adjusting device 7 so that the focus is focused on the exposure 11. The movable lens 6 may be driven in the vertical direction either manually or electrically.
[0010]
【The invention's effect】
Since the present invention is configured as described above, since the irradiation spot is not shielded by the variable mask, there is no light amount loss, and the light amount per unit area is increased by adjusting the focal length, so that the exposure time is shortened. As a result, the takt time of the manufacturing apparatus is shortened, so that it is possible to prevent the exposure time from being extended due to the change of the irradiation spot. Further, since the light is not shielded by the variable mask, the influence on the exposure edge due to light leaked from the variable mask portion is prevented.
[Brief description of the drawings]
FIG. 1 is a partially longitudinal side view showing one embodiment of the present invention.
FIG. 2 is a partial longitudinal sectional view showing a conventional exposure apparatus.
FIG. 3 is a bottom view of the exposure apparatus shown in FIG. 2;
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Exposure apparatus main body 2 Light guide 3 Lens frame 4 Fixed lens 5 Zoom frame 5 'Zoom adjustment device 6 Movable lens 7 Focal length adjustment device 8 Lens mounting frame 9 Emission hole 10 Irradiation light 11 Exposure surface

Claims (1)

光源部のUVランプにより発光させたUV光を、X−Yステージに取り付けたレンズにより集光させてスポット照射することで基板上の感光レジストを部分的に露光する装置において、スポット光の径を変倍するズームレンズ機構と、スポット光の焦点距離調節機構を設けたことを特徴とするUV光スポット照射露光装置。In an apparatus that partially exposes a photosensitive resist on a substrate by condensing UV light emitted from a UV lamp of a light source unit with a lens attached to an XY stage and irradiating the spot with a spot, the diameter of the spot light is reduced. A UV light spot irradiation exposure apparatus comprising a zoom lens mechanism for changing magnification and a focal length adjusting mechanism for spot light.
JP2002288402A 2002-10-01 2002-10-01 Uv light spot irradiation and exposing device Pending JP2004126097A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002288402A JP2004126097A (en) 2002-10-01 2002-10-01 Uv light spot irradiation and exposing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002288402A JP2004126097A (en) 2002-10-01 2002-10-01 Uv light spot irradiation and exposing device

Publications (1)

Publication Number Publication Date
JP2004126097A true JP2004126097A (en) 2004-04-22

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Family Applications (1)

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JP2002288402A Pending JP2004126097A (en) 2002-10-01 2002-10-01 Uv light spot irradiation and exposing device

Country Status (1)

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JP (1) JP2004126097A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160046131A (en) * 2014-10-20 2016-04-28 임세도 Exposure device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160046131A (en) * 2014-10-20 2016-04-28 임세도 Exposure device
KR101634449B1 (en) 2014-10-20 2016-06-28 임세도 Exposure device

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