KR19990015742A - Zoom lens array and exposure device equipped with it - Google Patents

Abstract

The present invention discloses a modified illumination zoom lens array and an exposure apparatus equipped with the same. According to the present invention, a modified illumination zoom lens array includes a zoom lens for focusing light, an opaque plate attached to the outside of the zoom lens and blocking unnecessary light, and attached to the opaque plate of the zoom lens. It characterized in that it comprises a device having a positioning means for adjusting the position and a case for mounting the device, it may further comprise means for moving the case up and down. Meanwhile, the exposure apparatus according to the present invention includes a light source, a lens group for focusing light emitted from the light source, a fly-eye lens for increasing the uniformity of the light passing through the lens group, and light passing through the fly-eye lens. An exposure apparatus having an aperture for blocking unnecessary light, comprising: a zoom lens for focusing light, an opaque plate attached to an outer side of the zoom lens and serving to block unnecessary light, and the opacity It further comprises a device attached to the plate having a positioning means for adjusting the position of the zoom lens and a case for mounting the device, further comprising means for moving the case up and down It may include.

Description

Zoom lens array and exposure device equipped with it

The present invention relates to a modified illumination apparatus, and more particularly, to a modified illumination zoom lens array and an exposure apparatus equipped with the same.

Recently, with the trend of high integration and density of semiconductor devices, various photolithography techniques for forming finer patterns have been developed. In particular, high resolution and moderate depth-of-focus (DOF) are needed to manufacture ultra-high density devices (ULSI) after 256 MDRAM, and therefore, such as off-axis illumination methods. The use of the lighting method is actively being done.

Incidental illumination method installs an aperture between a fly's eye lens and a stepper lens to block the vertical part of incident light by the aperture, and only the inclined part (incident part) is placed on the wafer. It is an illumination method which improves DOF and resolution in a line / space (L / S) pattern by making it reach | attain.

This means that the resolution and DOF depend on the coherence factor σ (σ = ld / (NA), ld is the diameter of the light source image, NA is the numerical aperture of the projection lens), and the actual light source of the stepper is formed by the fly's eye lens. This is because the coherence factor σ is controlled by the aperture since it is the focus.

In order to obtain a resolution beyond the wavelength limit of the current light source, the exposure apparatus is equipped with various shape apertures such as quadrupole aperture, annular aperture, and dipole aperture. Off-axis illumination is widely used. By the way, in the incident illumination method, the aperture of the shape optimized according to the pattern pitch to be exposed is required. To this end, the conventional exposure apparatus employs a method in which several apertures are mounted on a revolver and an appropriate aperture is exchanged as necessary.

However, such a conventional method has a limited number of apertures that can be mounted on the revolver, so that the closest ones of the mounted apertures are used instead of the optimum exposure conditions. If the revolver is equipped with a large number of apertures, the radius of the revolver increases, which takes up a lot of space.

In addition, the conventional projection type exposure apparatus can adjust the coherence factor σ of aperture or implement annular illumination by the zoom function of the lens, but it is difficult to implement quadrupole illumination.

Therefore, when the dead-point lighting is required, a diameter of the required size should be manufactured and used, but there is a problem in that a light intensity drop must be taken because a limited type of aperture is usually used.

Therefore, the technical problem to be achieved by the present invention is to provide a device that can adjust the position and area of the quadrupole (quadrupole) of the dead-point light without lowering the light intensity to solve the above problems.

Another object of the present invention is to provide an exposure apparatus equipped with the apparatus.

1 is a plan view illustrating a modified illumination zoom lens array according to a preferred embodiment of the present invention.

2 shows a cross-sectional view of a zoom lens and an opaque plate in the zoom lens array.

3 is a cross-sectional view showing a case where the positions of the zoom lenses are positioned far from each other in order to adjust the position and size of a quadrupole of four-point lighting.

4 is a schematic diagram of an exposure apparatus equipped with a modified illumination zoom lens array according to a preferred embodiment of the present invention.

FIG. 5 is a conceptual diagram illustrating adjusting the position and size of a quadrupole of four-point light by adjusting the position of the zoom lens of the zoom lens array mounted to the exposure apparatus.

Explanation of symbols for the main parts of the drawings

10: zoom lens 12: opaque plate

14: position adjusting means 16: a case for mounting the zoom lens and the opaque plate

20: light source 22: lens group for light focusing

24 zoom lens array 26 fly-eye lens

28: aperture

30, 32, 34: Quadrupole of 4-point light with its position and size adjusted by adjusting the position of the zoom lens

In order to achieve the above technical problem, the present invention, a zoom lens for focusing light, an opaque plate attached to the outside of the zoom lens and serves to block unnecessary light, attached to the opaque plate and the zoom lens A device having a positioning means for adjusting the position of the device; And a case for mounting the apparatus.

In the present invention, it is preferable to further include a means for moving the case up and down.

In the present invention, the number of the device may be one to four.

The present invention to achieve the above another technical problem, the light source; A lens group for focusing light emitted from the light source; A fly-eye lens for increasing the uniformity of the light passing through the lens group; And an aperture for blocking unnecessary light in the light passing through the fly's eye lens, the exposure apparatus comprising: a zoom lens for focusing light, and an outside of the zoom lens and blocking unnecessary light; An apparatus having an opaque plate and a position adjusting means attached to the opaque plate to adjust the position of the zoom lens; And a case for mounting the apparatus.

In the present invention, it is preferable to further include a means for moving the case up and down.

In the present invention, the number of the device may be one to four.

The exposure apparatus equipped with the modified illumination zoom lens array according to the present invention can adjust the position and area of the quadrupole of the four-point light without degrading the light intensity according to the pattern to be exposed, thereby improving the resolution of the photographic process. Can be. In addition, since the space occupied by the revolver in the exposure apparatus is reduced, the space occupied by the exposure apparatus can be reduced.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to FIGS. 1 to 5.

Zoom lens array

1 is a plan view illustrating a modified illumination zoom lens array according to a preferred embodiment of the present invention.

A zoom lens array according to a preferred embodiment of the present invention is composed of a zoom lens 10, an opaque plate 12, a position adjusting means 14, and a case 16. Specifically, the four zoom lenses 10 focus light to form a quadrupole of four-point illumination, and are attached to the outside of the opaque plate that serves to block unnecessary light. It is integrated with (12). The position adjusting means 14 adjusts the position and area of a quadrupole of four-point lighting by adjusting the position of the zoom lens 10 attached to the opaque plate 12. The case 16 serves to accommodate the zoom lens 10 and the opaque plate 12. The case 16 is provided with means (not shown) which can move the case 16 up and down.

2 shows a cross-sectional view of the zoom lens 10 and the opaque plate 12 mounted to the case 16 of FIG. 2.

FIG. 3 shows a case where the positions of the zoom lens 10 are positioned far from each other by using the position adjusting means (14 in FIG. 2) to adjust the position and size of a quadrupole of four-point lighting. It is a cross section.

At this time, since the opaque plates 12 do not completely separate from each other as shown in the area A even when the zoom lenses 10 are located far from each other, an area through which light can pass except the zoom lens 10. There is no.

Exposure device

4 is a schematic diagram of an exposure apparatus equipped with a modified illumination zoom lens array 24 according to a preferred embodiment of the present invention.

Here, reference numeral 20 denotes a light source, 22 denotes a lens group for focusing light emitted from the light source, 24 denotes a zoom lens array according to a preferred embodiment of the present invention, 26 denotes a fly's eye lens, 28 denotes an aperture each represents an (aperture). Specifically, light emitted from the light source 20 is focused by the lens group 22. Subsequently, the light passing through the lens group 22 forms a quadrupole of four-point illumination by the zoom lens array according to the preferred embodiment of the present invention. Subsequently, the light forming the quadrupole of the four-point light passing through the zoom lens array 24 passes through the fly's eye lens 26 to increase the uniformity of the light. Subsequently, the light forming the quadrupole of the four-point light passing through the fly's eye lens 26 passes through the aperture 28 to expose the wafer. At this time, the aperture 28 serves to block unnecessary light from the light passing through the fly's eye lens 26.

Fig. 5 shows the adjustment of the position and size of a quadrupole of four-point light by adjusting the position of the zoom lens (10 in Fig. 4) of the zoom lens array (24 in Fig. 4) mounted to the exposure apparatus. It is a conceptual diagram showing.

Here, reference numeral 28 denotes an aperture, and 30, 32, and 34 adjust the position of the zoom lens (10 in FIG. 4) up, down, left, and right to change the position and size of the quadrupole of the four-point light. Indicates.

As described above, the exposure apparatus equipped with the modified illumination zoom lens array according to the present invention can adjust the position and area of the quadrupole of the four-point light according to the pattern to be exposed without deteriorating the light intensity. Can improve the resolution. In addition, since the space occupied by the revolver in the exposure apparatus is reduced, the space occupied by the exposure apparatus can be reduced.

The present invention has been described in detail with reference to specific embodiments, but the present invention is not limited thereto, and various modifications may be made by those skilled in the art within the scope of the technical idea of the present invention.

Claims (6)

A zoom lens for focusing light, an opaque plate attached to the outside of the zoom lens and blocking unnecessary light, and a position adjusting means attached to the opaque plate to adjust the position of the zoom lens One device; And And a case for mounting the device. The zoom lens array of claim 1, further comprising means for moving the case up and down. The method of claim 1 or 2, wherein the number of the device, A zoom lens array for modified illumination, characterized in that one to four. Light source; A lens group for focusing light emitted from the light source; A fly-eye lens for increasing the uniformity of the light passing through the lens group; And An exposure apparatus having an aperture for blocking unnecessary light in the light passing through the fly's eye lens, A zoom lens for focusing light, an opaque plate attached to the outside of the zoom lens and blocking unnecessary light, and a position adjusting means attached to the opaque plate to adjust the position of the zoom lens One device; And And a case for mounting the device. 5. An exposure apparatus according to claim 4, further comprising means for moving the case up and down. The method of claim 4 or 5, wherein the number of the device, 1 to 4 exposure apparatuses.