JP2004125884A - Device and method for rubbing substrate in electrooptical device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a device and a method for rubbing a substrate in an electrooptical device making the device compact and further carrying out rubbing with excellent efficiency in carrying out rubbing treatment on the surface of an alignment layer formed on the substrate. <P>SOLUTION: The device for rubbing the substrate is provided with a rubbing roll 2 with a rotating shaft 2b fixed and placed in a specified flat surface and carrying out rubbing treatment of the alignment layer of the substrate 3, a stage 10 placing and holding the substrate 3 on the top thereof and moving, a first guide 13 guiding the stage 10 toward the X-axis direction specified on a flat surface in parallel with the above mentioned flat surface over against the rubbing roll 2, a second guide 14 guiding the stage 10 toward the Y-axis direction specified on a flat surface in parallel with the above mentioned flat surface over against the rubbing roll 2, and a controlling means 50 to control the movement of the stage 10. <P>COPYRIGHT: (C)2004,JPO

Description

[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a rubbing device and a rubbing method for a substrate in an electro-optical device.
[0002]
[Prior art]
As is well known, an electro-optical device such as a liquid crystal device has a configuration in which liquid crystal is sealed between two substrates such as a glass substrate and a quartz substrate, and a thin film transistor (Thin Film Transistor, In the following, switching elements such as TFTs) are arranged in a matrix, counter electrodes are arranged on the other substrate, and the optical characteristics of the liquid crystal layer sealed between the two substrates are changed according to image signals. And an image can be displayed.
[0003]
In addition, the TFT substrate on which the TFT is disposed and the opposing substrate disposed opposite to the TFT substrate are manufactured separately, and the two substrates are laminated with high precision in a panel assembling process and then filled with liquid crystal. It is supposed to be.
[0004]
In the panel assembling process, first, the TFT substrate and the opposing substrate manufactured in the manufacturing process of each substrate are opposed to each other, and the liquid crystal molecules are placed on the opposing surface, that is, the surface in contact with the liquid crystal layer of the opposing substrate and the TFT substrate. To form an alignment film for orienting the substrate along the substrate surface. This alignment film is formed, for example, by printing polyimide with a thickness of about several tens of nanometers. After that, baking is performed, and further, a rubbing treatment is performed to determine the arrangement of the liquid crystal molecules when no voltage is applied. Next, a seal portion serving as an adhesive is formed on one edge of one substrate, and the TFT substrate and the opposing substrate are bonded to each other using the seal portion, and pressure-bonded and cured while performing alignment. A method of enclosing a liquid crystal through a notch provided is used.
[0005]
Here, the rubbing treatment is a process in which a rubbing roller having a surface formed of a cloth material such as cloth is linearly slid while rotating on an alignment film formed on the substrate surface, and finely rubbed on the substrate alignment film surface. The alignment film is formed into an alignment anisotropic film by forming a groove, and the alignment of the liquid crystal molecules can be regulated by performing a rubbing process for forming a groove in a certain direction on the alignment film.
[0006]
Conventionally, this rubbing process is performed by a rubbing device 100 having a rubbing roller 101 disposed on a moving table 105 which moves directly to a fixed substrate 150, as shown in FIG. Had been However, in this apparatus 100, if, for example, one scratch or foreign matter 102 adheres to the surface of the rubbing roller 101, the rubbing roller 101 slides while linearly rotating on the alignment film of the substrate 150. However, one stripe 151 is attached to the alignment film, and when a liquid crystal device configured using the substrate having the stripe 151 is projected by using a projector or the like, one stripe is also reflected on the screen. There was a problem.
[0007]
Therefore, as a means for solving such a problem, a bias rubbing device 200 shown in FIG. 7 is generally used. That is, the bias rubbing device 200 arranges the substrate 250 at a position rotated by an angle θ by inclining the central axis 152 at the position where the substrate 150 shown in FIG. The moving table 205 and the rubbing roller 201 that move are also set at a position where the center axis 103 of the arrangement position of the moving table 105 and the rubbing roller 101 shown in FIG. In 201, linear sliding is performed while rotating on the alignment film of the substrate 250, and so-called bias rubbing is performed.
[0008]
According to the bias rubbing device 200, even if, for example, one scratch or a foreign matter 202 adheres to the surface of the rubbing roller 201, the rubbing roller 201 keeps a predetermined angle θ on the alignment film of the substrate 250. Is linearly slid while rotating, so that the scratches on the alignment film do not become a single line, but become blurred scratches 251 having a certain width. Thus, when the substrate is projected using a projector or the like, scars appearing on the screen can be reduced. Various bias rubbing devices used in the bias rubbing are disclosed in Patent Document 1 and the like.
[0009]
[Patent Document 1]
JP, 2002-31803, A
[Problems to be solved by the invention]
However, in such a bias rubbing device, it is necessary to rotate the movable rubbing roller supporting the large rubbing roller to a predetermined angle θ to tilt it. Since the alignment film formed on the substrate is rubbed by the movement, there is a problem that the apparatus becomes large.
[0011]
Further, not only the moving table supporting the rubbing roller, but also the substrate must be rotated at an arbitrary predetermined angle θ, so that the angle accuracy must be obtained for both, and the work efficiency is not good.
[0012]
SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and has as its object to reduce the size of an apparatus when performing a rubbing process on the surface of an alignment film formed on a substrate and to efficiently perform rubbing. An object of the present invention is to provide a rubbing device and a rubbing method for a substrate in an optical device.
[0013]
Means and Action for Solving the Problems
As one mode of the substrate rubbing device in the electro-optical device according to the present invention, the substrate rubbing device in the electro-optical device that performs a rubbing process by bringing a rubbing roller into contact with an alignment film formed on the substrate, A rubbing roller is fixedly arranged, and the substrate is rubbed with respect to the rubbing roller by moving the substrate by controlling a bias angle by two axes of an X axis and a Y axis.
[0014]
Further, as the substrate rubbing device in the electro-optical device of the present invention, a rubbing roller for rubbing the alignment film of the substrate, the rotation axis of which is fixedly arranged in a predetermined plane, and a stage on which the substrate is mounted and moved. A first guide for guiding the stage with respect to the rubbing roller in the X-axis direction defined on a plane parallel to the plane, and defining the stage with respect to the rubbing roller on a plane parallel to the plane; A second guide for guiding in the Y-axis direction and control means for controlling the movement of the stage.
[0015]
According to the substrate rubbing device of the electro-optical device of the present invention, the stage on which the substrate is mounted is controlled by a biaxial control on a plane using the first guide and the second guide to adjust the bias angle. Since the rubbing roller is set and moved and brought into contact with the rubbing roller, the rubbing of the alignment film formed on the substrate can be performed only by moving the substrate alone, and thus the apparatus can be downsized. It has the effect of being able to.
[0016]
Further, as the substrate rubbing device in the electro-optical device according to the present invention, the stage has a rotating table that defines the position of the substrate, and the mounted substrate is rotatable on a plane parallel to the plane. It is characterized by supporting.
[0017]
According to this configuration, the stage supports the mounted substrate rotatably on a plane by the provided rotating table, so that the stage can be pressed against the rubbing roller at the time of bias rubbing. This has the effect that the contact angle can be freely adjusted.
[0018]
In the rubbing device for a substrate in the electro-optical device according to the present invention, the stage defines a circumferential position of the substrate placed on the rotary table.
[0019]
According to this configuration, by defining the position of the mounted substrate in the circumferential direction, even when the number of substrates to be processed is increased, the bias rubbing can always be performed accurately and at the same angle. Having.
[0020]
Further, as a substrate rubbing device in the electro-optical device of the present invention, the stage has a CCD camera for detecting a position of the mounted substrate.
[0021]
According to this configuration, when the substrate is positioned by the positioning notch of the substrate mounted on the stage, it is possible to accurately perform the positioning of the substrate in the circumferential direction by using the CCD camera. Have.
[0022]
In the rubbing device for a substrate in the electro-optical device according to the present invention, the stage may be configured such that a rotation center of a rotating table provided is a center of an axial contact surface of the rubbing roller that rotates during a rubbing process. And moves at least in contact with the object.
[0023]
According to this configuration, the center of rotation of the turntable provided on the stage always comes into contact with the center of the contact surface in the axial direction of the rubbing roller by the two-axis control by the control means. This has the effect that the entire surface can be efficiently bias-rubbed.
[0024]
Further, in the electro-optical device according to the present invention, the substrate on which the alignment film is formed is controlled with respect to a rubbing roller by controlling a bias angle by two axes of an X axis and a Y axis defined on a predetermined plane. And a rubbed substrate.
[0025]
According to this configuration, since the alignment film of the substrate used in the electro-optical device is rubbed by the bias rubbing process, even if, for example, there is one scratch or foreign matter adheres to the surface of the rubbing roller. Since the scratches adhering to the substrate do not become a single streak but become a blurred scratch, when the substrate is used in an electro-optical device and projected by a projector or the like, it is possible to reduce the scratches appearing on the screen. Having.
[0026]
As one aspect of the method of rubbing a substrate in the electro-optical device of the present invention, in a rubbing treatment step of performing a rubbing treatment by bringing a rubbing roller into contact with an alignment film formed on the substrate, The method is characterized in that there is provided a step of controlling a bias angle by two specified axes of the X axis and the Y axis, and advancing the roller to a rubbing step.
[0027]
Further, in the method of rubbing a substrate in the electro-optical device according to the present invention, the step of placing the substrate on a stage, the step of defining the position of the placed substrate in the X-axis direction, and the step of placing the substrate on the stage Detecting the position of the substrate by the CCD camera, and detecting the thickness of the substrate placed on the stage by thickness detecting means, and controlling the rubbing roller and the stage in the height direction of the rubbing roller. A step of moving the substrate placed on the stage to the origin coordinate position of the two axes of the X axis and the Y axis defined on the plane; and placing the substrate on the stage moved to the origin coordinate position of the two axes. Moving the placed substrate to a rubbing start position, and moving the substrate placed on the stage by controlling the bias angle by the two axes to advance the rubbing process. Is brought into contact with La, characterized by comprising the step of performing a rubbing of the substrate placed.
[0028]
According to the method of rubbing a substrate in the electro-optical device of the present invention, the stage on which the substrate is mounted is moved toward the rubbing roller by controlling a bias angle by two axes defined on a plane and brought into contact therewith. By performing the process, the rubbing of the alignment film formed on the substrate can be performed only by controlling the bias of the substrate alone with the two axes, so that the rubbing can be performed efficiently and the apparatus can be downsized. It has the effect of being able to.
[0029]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
FIG. 1 is a plan view showing the configuration of a rubbing device for a substrate in an electro-optical device according to an embodiment of the present invention, and FIG. 2 is an enlarged plan view showing a rubbing operation performed using the rubbing device shown in FIG. FIG. 3 is an enlarged plan view of a main part of the first rotary table 24 in the rubbing device of FIG. 1, and FIG. 4 is an enlarged plan view of a main part of the stage table 10 and the stage rotary table 11 in the rubbing device of FIG. FIG.
[0030]
In the present embodiment, the X-axis direction is a direction parallel to a rotation axis 2b of the rubbing roller 2 described later, and the Y-axis direction is a direction orthogonal to the rotation axis 2b of the rubbing roller 2. is there. Further, in the present embodiment, a liquid crystal panel will be described as an example of the electro-optical device.
[0031]
As shown in FIG. 1, a rubbing device 1 includes a rubbing roller 2 fixed to an upper surface of a base (not shown) (hereinafter, referred to as a reference plane), a substrate 3 placed on a rubbing process, and an X-axis and a Y-axis. A stage 10 that moves on a plane parallel to the reference plane defining an axis, a stage turntable 11 that is disposed on the stage 10 and that holds the substrate 3 rotatably on a plane parallel to the reference plane; , A first guide 13 that guides the stage 10 in the X-axis direction, a second guide 14 that guides the first guide 13 in the Y-axis direction, and movement of the first guide 13 and the second guide 14 , A thickness measuring device 15 for measuring the thickness of the substrate 3 placed on the stage 10, and a first substrate 3 in which a plurality of unrubbed substrates 3 on which an alignment film is formed are stored. The carrier cassette 20 and this second And a pair of first substrate holding arms 23 for extracting the substrates 3 from the carrier cassette 20 one by one into the substrate carrying-in chamber 26, and holding the substrates 3 by the first substrate holding arms 23. A first transfer shuttle 22 for transferring the first transfer shuttle 22 to the stage 10, a first transfer shuttle control mechanism 25 for controlling the movement of the first transfer shuttle 22, and a first positioning of the substrate fixed to the reference plane. And a pair of second substrate holding arms 33. The second substrate holding arm 33 holds the substrate 3 that has been subjected to the rubbing process, and transfers the substrate 3 to a later-described storage hand 31. A second transport shuttle 32 for transport, a second transport shuttle control mechanism 35 for controlling the movement of the second transport shuttle 32, and a substrate 3 fixed to the reference plane and having been rubbed are required. A second rotary table 34 for adjusting the storage direction accordingly, a substrate storage chamber 36 for storing the substrate 3 conveyed from the second rotary table 34, and a second rotatable substrate 3 The main part is constituted by the storage hand 31 for storing in the carrier cassette 30.
[0032]
The rubbing roller 2 has a main part including a roller having a roller peripheral surface 2a formed of a cloth material such as cloth, a rotating shaft 2b, and a pair of bearings 2c. The pair of bearings 2c are rotatably supported on a plane parallel to the reference plane. One end face of each of the pair of bearings 2c is fixed to the reference plane, and has a height adjusting mechanism with respect to the reference plane. The rubbing roller 2 thus configured contacts the alignment film formed on the surface of the substrate 3 while the circumferential surface 2a rotates in one direction around the rotation shaft 2b supported by the bearing 2c, A fine groove is formed on the surface of the alignment film to make the alignment film anisotropically oriented.
[0033]
The position of the stage 10 is controlled by the control means 50 during the rubbing process, and is linearly moved on a plane parallel to the reference plane by a first guide 13 and a second guide 14 using a servo motor and a ball screw (not shown). Then, the placed substrate 3 is brought into contact with the peripheral surface 2a of the rubbing roller 2 and is slid to rub the alignment film formed on the substrate 3.
[0034]
The stage turntable 11 is disposed on the upper surface of the stage 10 and has a CCD camera 11a (see FIG. 4) described later. The CCD camera 11a detects an alignment mark 3b of the mounted substrate 3 described later. Thus, the substrate 3 is rotated on a plane parallel to the reference plane to perform positioning of the substrate 3 in the circumferential direction.
[0035]
The thickness detector 15 detects the thickness of the substrate 3 placed on the stage, and mounts the rubbing roller 2 or the substrate 3 so that the rubbing roller 2 and the substrate 3 abut at an appropriate height during the rubbing process. The height direction of the stage 10 with respect to the reference plane is controlled.
[0036]
The first turntable 24 has a CCD camera 24a (see FIG. 3), which will be described later. The CCD camera 24a detects an alignment mark 3b, which will be described later, of the substrate 3 placed on the first turntable 24, and moves to the reference plane. The board 3 is rotated on a parallel plane, and the substrate 3 is aligned with respect to the X-axis direction.
[0037]
Next, a method of rubbing the substrate 3 using the rubbing apparatus 1 configured as described above will be described.
[0038]
First, as shown in FIG. 1, the substrates 3 are extracted one by one from a first carrier cassette 20 in which a plurality of substrates 3 on which an alignment film is formed is stored into a substrate loading chamber 26 by an unloading hand 21. Next, the first transport shuttle 22, whose movement is controlled by the first transport shuttle control mechanism 25 while holding the substrate 3 with the first substrate holding arm 23, uses the reference plane on which the rubbing roller 2 is fixed. Is transported to the first turntable 24 fixed on the same plane as the above, and is placed on the turntable 24.
[0039]
In the first turntable 24, as shown in FIG. 3, an alignment mark 3b of the placed substrate 3 is detected by a CCD camera 24a disposed on the first turntable 24, and is detected on the reference plane. By rotating on a parallel plane, temporary alignment of the substrate 3 in the circumferential direction is performed.
[0040]
Next, the substrate 3 after the first alignment is held by the first substrate holding arm 23, and the stage 10 is transported to the position A in FIG. The substrate 3 is placed on the table 11. Then, the thickness of the substrate 3 placed on the stage 10 is detected by the thickness measuring device 15 shown in FIG. 1, and the rubbing roller 2 is brought into contact with the rubbing roller 2 at an appropriate height during the rubbing process. Alternatively, the height direction of the stage 10 on which the substrate 3 is placed with respect to the reference plane is adjusted.
[0041]
Thereafter, as shown in FIG. 2, the stage 10 is moved from the position A by the control means 50 in the X-axis direction, that is, in the axial direction of the rubbing roller by the first guide 13, and then in the Y-axis direction by the second guide 14. In other words, the rubbing roller 2 is moved in a direction orthogonal to the rotation axis 2b, moved to a two-axis origin coordinate position (not shown), and the control means 50 is made to recognize the origin coordinates, and then moved to the position B in FIG. .
[0042]
After moving to the position B, on the stage turntable 11 of the stage 10, as shown in FIG. 4, an alignment mark 3b of the placed substrate 3 is detected by a CCD camera 11a disposed on the turntable 11. Then, by rotating on a plane parallel to the reference plane, precise positioning of the substrate 3 in the X-axis direction is performed.
[0043]
After the positioning of the substrate 3 is completed, the stage 10 on which the substrate 3 is placed is brought into contact with the contact surface of the rubbing roller 2 from the position B to the position C in FIG. Is linearly moved on a plane parallel to the reference plane. At this time, in the stage 10, the center of rotation of the stage rotating table 11 provided on the stage 10 is at least located at the center 4 of the axial contact surface of the rubbing roller on which the roller peripheral surface 2a rotates. The first guide 13 and the second guide 14 move stepwise so as to make direct contact with each other. As a result, the alignment film formed on the substrate 3 is so-called bias rubbed in a direction in which the stage 10 has moved directly.
[0044]
After the rubbing, the rubbing roller 2 or the stage 10 is moved in the height direction with respect to the reference plane, and the first guide 13 and the first guide 13 are moved so that the peripheral surface 2a of the rubbing roller does not come into contact with the alignment film of the substrate 3. The stage 10 returns to the position A by the second guide 14.
[0045]
After returning to the position A, as shown in FIG. 1, the substrate 3 is held by the second substrate holding arm 33 and transported by the second transport shuttle 32 moved by the second transport shuttle control mechanism 35. The rubbing roller 2 is mounted on a second turntable 34 fixed on the same plane as the reference plane on which the rubbing roller 2 is fixed. Then, after the rubbing process of the substrate 3 is adjusted to a constant storage direction as necessary, the substrate 3 is again transported to the substrate storage chamber 36 by the second transport shuttle 32, and is stored by the storage hand 31 after the rubbing process. The substrate 3 is stored in the second carrier cassette 30. In this way, the rubbing device 1 rubs the alignment film formed on the substrate 3.
[0046]
As described above, in the substrate rubbing device and the rubbing method in the electro-optical device according to the embodiment of the present invention, the stage table 10 on which the substrate 3 is placed can be placed on a flat surface without controlling the angle of the rubbing roller 2. With only the above two-axis control, it is possible to perform bias rubbing that can prevent a linear streak from being formed on an alignment film formed on a substrate due to a scratch on a rubbing roller or a foreign substance attached thereto. Can be
[0047]
In the present embodiment, the above-described rubbing device 1 performs rubbing at a predetermined bias angle θ. However, the present invention is not limited to this, and the bias angle θ may be set to the first guide 13 and the second It goes without saying that any angle may be used as long as the guide 14 (see FIGS. 1 and 2) can be moved.
[0048]
Also, at the time of bias rubbing, the stage table 10 on which the substrate 3 is placed is moved to the origin coordinate position (not shown) of two axes, the control means 50 is made to recognize the origin coordinates, and then moved to the position B in FIG. It has been described that rubbing is performed by moving directly to C. However, the present invention is not limited to this. After recognition of the origin coordinates, the rubbing is performed by moving to position D shown in FIG. May be. Thus, rubbing in a direction different from that when the stage table 10 is moved to the positions A to C can be performed.
[0049]
Further, in the present embodiment, the first guide 13 moves in a direction parallel to the rotation axis 2b of the rubbing roller 2, and the second guide 14 is orthogonal to the rotation axis 2b of the rubbing roller 2. However, the present invention is not limited to this, and any two axes may be set on a plane parallel to the reference plane on which the rubbing roller 2 is fixed, and the same effects as those of the above-described embodiment can be obtained. Is obtained.
[0050]
Further, as shown in FIG. 5, the stage 10 is directly moved from the position B to the position C or from the position D to the position E, and the stage rotating table provided on the stage 10 is moved as described above. After rubbing the alignment film of the substrate 3 along a path (1) in which the center of rotation of 11 moves linearly so as to at least contact the center 4 of the axial contact surface of the rubbing roller on which the roller peripheral surface 2a rotates, When the next alignment film of the substrate 3 is rubbed, the rubbing is performed in the path (2) shown in FIG. When rubbing the alignment film of the next substrate 3, the rubbing is performed by a route (3) shown in FIG. , Provisional Also the rubbing roller 2 as a foreign matter adheres, because the wound is attached the position of the alignment film of the substrate after the rubbing treatment can be shifted by the substrate, it is possible to improve the product reliability in the manufacturing process.
[Brief description of the drawings]
FIG. 1 is a plan view showing a configuration of a rubbing device according to an embodiment of the present invention;
FIG. 2 is an enlarged plan view of a main part showing a rubbing method by the rubbing device of FIG. 1;
FIG. 3 is an enlarged plan view of a main part of a first turntable in the rubbing device of FIG. 1;
FIG. 4 is an enlarged plan view of a main part of a stage table and a stage rotating table in the rubbing device of FIG. 1;
FIG. 5 is an enlarged plan view of a main part showing a modification of the rubbing method using the rubbing device according to one embodiment of the present invention;
FIG. 6 is a plan view showing an example of a conventional rubbing device.
FIG. 7 is a plan view showing an example of a conventional rubbing device that performs bias rubbing.
[Explanation of symbols]
REFERENCE SIGNS LIST 1 rubbing device 2 rubbing roller 3 substrate 10 stages 11a and 24a CCD camera 13 first guide 14 second guide 50 control means

Claims (9)

A rubbing device for a substrate in an electro-optical device that performs a rubbing process by bringing a rubbing roller into contact with an alignment film formed on the substrate,
A rubbing device for an electro-optical device, wherein the rubbing roller is fixedly arranged, and the substrate is rubbed with respect to the rubbing roller by controlling a bias angle by two axes of an X axis and a Y axis to advance the substrate. . A rubbing roller in which the rotation axis is fixedly arranged in a predetermined plane and rubs the alignment film of the substrate,
A stage on which the substrate is mounted and moved,
A first guide that guides the stage with respect to the rubbing roller in an X-axis direction defined on a plane parallel to the plane,
A second guide for guiding the stage with respect to the rubbing roller in a Y-axis direction defined on a plane parallel to the plane,
Control means for controlling the movement of the stage;
A rubbing device for a substrate in an electro-optical device, comprising: 3. The electro-optical device according to claim 2, wherein the stage has a turntable that defines a position of the substrate, and the stage supports the mounted substrate rotatably on a plane parallel to the plane. Rubbing device for substrates in 4. The rubbing device for a substrate in an electro-optical device according to claim 2, wherein the stage defines a circumferential position of the substrate placed on the turntable. 5. 5. The rubbing device for a substrate in an electro-optical device according to claim 2, wherein the stage has a CCD camera for detecting a position of the mounted substrate. 3. The stage according to claim 2, wherein the rotating center of the rotating table is moved at least in contact with the center of an axial contact surface of the rotating rubbing roller during the rubbing process. A rubbing device for a substrate in the electro-optical device according to Claim. The substrate on which the alignment film is formed is configured by using a substrate that has been subjected to a rubbing process by controlling a bias angle by two axes of an X axis and a Y axis defined on a predetermined plane, transporting the substrate to a rubbing roller, and performing a rubbing process. Electro-optical device. In the rubbing treatment step of performing a rubbing treatment by bringing a rubbing roller into contact with the alignment film formed on the substrate,
A method of rubbing a substrate in an electro-optical device, comprising a step of controlling a bias angle by two axes of an X axis and a Y axis defined on a plane of the substrate and advancing the substrate to a roller to perform rubbing. Placing the substrate on the stage;
Defining a position in the X-axis direction of the position of the mounted substrate;
Detecting the position of the substrate placed on the stage by a CCD camera;
A step of detecting the thickness of the substrate placed on the stage by a thickness detecting means, and controlling the rubbing roller and the stage in a height direction of the rubbing roller;
Moving the substrate placed on the stage to the origin coordinate position of two axes of X axis and Y axis defined on a plane;
Moving the substrate placed on the stage moved to the origin coordinate position of the two axes to a rubbing start position;
Rubbing the substrate placed on the stage by contacting the substrate mounted on the stage with the rubbing roller by controlling the bias angle by the two axes to advance,
A rubbing method for a substrate in an electro-optical device, comprising:

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