JP2004110072A5 - - Google Patents

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Publication number
JP2004110072A5
JP2004110072A5 JP2003409608A JP2003409608A JP2004110072A5 JP 2004110072 A5 JP2004110072 A5 JP 2004110072A5 JP 2003409608 A JP2003409608 A JP 2003409608A JP 2003409608 A JP2003409608 A JP 2003409608A JP 2004110072 A5 JP2004110072 A5 JP 2004110072A5
Authority
JP
Japan
Prior art keywords
photomask
image
defect
mask
laser light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003409608A
Other languages
English (en)
Japanese (ja)
Other versions
JP4309752B2 (ja
JP2004110072A (ja
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Publication date
Application filed filed Critical
Priority to JP2003409608A priority Critical patent/JP4309752B2/ja
Priority claimed from JP2003409608A external-priority patent/JP4309752B2/ja
Publication of JP2004110072A publication Critical patent/JP2004110072A/ja
Publication of JP2004110072A5 publication Critical patent/JP2004110072A5/ja
Application granted granted Critical
Publication of JP4309752B2 publication Critical patent/JP4309752B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2003409608A 1997-06-27 2003-12-08 フォトマスク検査方法、フォトマスク検査装置及びフォトマスク製造方法 Expired - Fee Related JP4309752B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003409608A JP4309752B2 (ja) 1997-06-27 2003-12-08 フォトマスク検査方法、フォトマスク検査装置及びフォトマスク製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP17169597 1997-06-27
JP2003409608A JP4309752B2 (ja) 1997-06-27 2003-12-08 フォトマスク検査方法、フォトマスク検査装置及びフォトマスク製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP17830098A Division JPH1172905A (ja) 1997-06-27 1998-06-25 フォトマスク修復方法、検査方法、検査装置及びフォトマスク製造方法

Publications (3)

Publication Number Publication Date
JP2004110072A JP2004110072A (ja) 2004-04-08
JP2004110072A5 true JP2004110072A5 (de) 2005-09-22
JP4309752B2 JP4309752B2 (ja) 2009-08-05

Family

ID=32299943

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003409608A Expired - Fee Related JP4309752B2 (ja) 1997-06-27 2003-12-08 フォトマスク検査方法、フォトマスク検査装置及びフォトマスク製造方法

Country Status (1)

Country Link
JP (1) JP4309752B2 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4309751B2 (ja) * 1997-06-27 2009-08-05 株式会社東芝 フォトマスク修復方法
US6849363B2 (en) 1997-06-27 2005-02-01 Kabushiki Kaisha Toshiba Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device
WO2010037106A2 (en) 2008-09-29 2010-04-01 Kla-Tencor Corporation Illumination subsystems of a metrology system, metrology systems, and methods for illuminating a specimen for metrology measurements
US9080991B2 (en) 2008-09-29 2015-07-14 Kla-Tencor Corp. Illuminating a specimen for metrology or inspection
DK2399098T3 (en) * 2009-02-23 2019-01-21 Dental Imaging Technologies Corp DEVICE FOR HIGH SPEED PHASE SHIFT FOR INTERFEROMETRICAL MEASUREMENT SYSTEMS
US10234402B2 (en) * 2017-01-05 2019-03-19 Kla-Tencor Corporation Systems and methods for defect material classification
CN110673319B (zh) * 2019-09-29 2021-04-09 江苏才道精密仪器有限公司 一种可自动调光源的显微镜激光修复系统及装置
CN112254801B (zh) * 2020-12-21 2021-04-02 浙江中自庆安新能源技术有限公司 一种微小振动视觉测量方法及系统

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63173322A (ja) * 1987-01-13 1988-07-16 Toshiba Corp 半導体露光装置
JPH01114035A (ja) * 1987-10-28 1989-05-02 Hitachi Ltd 露光装置
DE69208413T2 (de) * 1991-08-22 1996-11-14 Kla Instr Corp Gerät zur automatischen Prüfung von Photomaske
US5668887A (en) * 1992-05-29 1997-09-16 Eastman Kodak Company Coating density analyzer and method using non-synchronous TDI camera
JP4309751B2 (ja) * 1997-06-27 2009-08-05 株式会社東芝 フォトマスク修復方法

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