JP2004099938A - Barrel plating device and method - Google Patents

Barrel plating device and method Download PDF

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Publication number
JP2004099938A
JP2004099938A JP2002260387A JP2002260387A JP2004099938A JP 2004099938 A JP2004099938 A JP 2004099938A JP 2002260387 A JP2002260387 A JP 2002260387A JP 2002260387 A JP2002260387 A JP 2002260387A JP 2004099938 A JP2004099938 A JP 2004099938A
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JP
Japan
Prior art keywords
barrel
plating
cathode
cathodes
branched
Prior art date
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Pending
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JP2002260387A
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Japanese (ja)
Inventor
Katsumi Matsushita
松下 勝己
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Koa Corp
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Koa Corp
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Filing date
Publication date
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Priority to JP2002260387A priority Critical patent/JP2004099938A/en
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a barrel plating device and a barrel plating method in which plating of high quality and high efficiency can be performed by improving a current density and a current distribution inside a plating bath. <P>SOLUTION: In the barrel plating device where the inside of a plating bath with an anode 14 dipped is provided with a cylindrical barrel 11 housing a stock to be plated together with cathodes 13, and the barrel 11 is rotated to apply plating to the stock, the cathodes 13 are plurally branched inside the barrel 11. Namely, vertical connection electrodes 17 are erected at the tip parts 13c of the cathodes 13, and further, a plurality of branched electrodes 18 parallel to the rotary axis of the barrel 11 are connected to the connection electrodes 17, so that the cathodes 13 are formed so as to be of plurally branched comb teeth shape. <P>COPYRIGHT: (C)2004,JPO

Description

【0001】
【発明の属する技術分野】
本発明は、電子部品を電気メッキするためのバレルメッキ装置およびバレルメッキ方法に係り、詳しくは、メッキ品質やメッキ効率の向上を図るものに関する。
【0002】
【従来の技術】
従来より、導電性を有する材料の表面をメッキすることが行われており、例えば、電子部品では電気接続する端子部をメッキして半田付け性を確保することが行われている。
【0003】
この種のメッキを行う装置としては、図6に示すように、メッキする素材の電子部品を内部に収容して回転軸1aを中心に回転するバレル1と、このバレル1を浸漬させるメッキ液を貯留するメッキ浴2と、バレル1内に電子部品と共に収容される陰極3と、バレル1を間に挟むようにメッキ浴2内のメッキ液中に浸漬させる複数枚の陽極4とを備えているバレルメッキ装置が知られている。
【0004】
このバレルメッキ装置は、バレル1をメッキ浴2内で回転させるとともに陰極3と陽極4との間に電流を流すことにより、バレル1内で電子部品を撹拌しつつ電子部品の端子部を陰極3に対して導電状態にして、その端子部表面をメッキする。
【0005】
また、このようなバレルメッキ装置では、電子部品の端子部に均一なメッキを施すために各種工夫がなされている。例えば、特許文献1に記載のバレルメッキ装置は、図7に示すように、バレル1の陰極3の導入部3aの下方に三角錐形状の整流体5を配置している。この装置では、バレル1の内面につれ回される電子部品6を整流体5が回転軸1a方向に移動させることにより、電子部品6が均等に陰極3に導通状態になるように撹拌して、その端子部に均一なメッキを施すようにしている。なお、このバレルメッキ装置は、陰極3の先端部3bが陰極部として機能するようになっている。
【0006】
なお、均一なメッキを施すことを目的としたバレルメッキ装置は、特許文献2にも記載されており、この装置では、バレルの回転軸と平行な内面に撹拌板を配置することにより撹拌能力を高めている。また、特許文献3に記載のバレルメッキ装置では、大きさの異なる2種類の導電性媒体をバレル内に投入することにより陰極との導通機会や撹拌能力を高めて均一なメッキを施すことを図っている。
【0007】
【特許文献1】
特開平9−119000号公報
【特許文献2】
特開平8−100294号公報
【特許文献3】
特開2000−260612号公報
【0008】
【発明が解決しようとする課題】
しかしながら、このような従来のバレルメッキ装置にあっては、バレル1内に収容された線状の陰極3と、バレル1外に配置された陽極4との間で通電される。このため、メッキ浴2内における位置によって電流の流れ方(電流密度や電流分布)に差が生じてしまい、メッキの膜厚などのメッキ品質がばらつく、という問題があった。
【0009】
また、メッキ効率を上げるために通電量を多くしても、バレル1の回転位置によって電流密度が変動していることから、メッキ品質がばらつく。このため、メッキ時間を短縮することができない、という問題があった。
【0010】
すなわち、バレルメッキ装置において、高品質のメッキ処理を実現するためには、メッキ浴内における電流密度や電流分布をできるだけ均一にして安定させることが重要である。
【0011】
本発明は、上述した事情に鑑みて為されたもので、メッキ浴内における電流密度や電流分布を改善して、高品質で高効率のメッキを行い得るバレルメッキ装置およびバレルメッキ方法を提供することを目的とする。
【0012】
【課題を解決するための手段】
上記課題を解決するバレルメッキ装置の発明は、陽極を浸漬させたメッキ浴内に、陰極と共にメッキする素材を収容する筒形状のバレルを設け、該バレルを回転させて該素材にメッキを施すバレルメッキ装置において、前記陰極を前記バレル内で複数本に分岐したことを特徴とするものである。
【0013】
この発明では、バレル内において複数に分岐した陰極とバレル外の陽極との間で電流を流すことができる。このため、陽極と陰極との間の電流密度を広い範囲で均一にすることができると共に、陽極と陰極との間の電流分布を広い範囲で均等にすることができる。言い換えると、バレル内に収容した素材は、陰極との導通機会が多くなり、その表面にはばらつきの少ないメッキが施される。
【0014】
ここで、前記陰極は、櫛歯形状に形成して複数本に分岐するのが好ましく、また、バレル内の素材の位置を移動・撹拌させるように分岐した陰極の長さを変化させてもよい。
【0015】
【発明の実施の形態】
以下、本発明を図面に基づいて説明する。図1および図2は本発明に係るバレルメッキ方法を実行することのできるバレルメッキ装置の一実施形態を示す図である。
【0016】
図1および図2において、バレルメッキ装置は、メッキする素材の電子部品などを内部に収容しつつ不図示の回転軸を中心に回転する6角柱の筒形状に形成されたバレル11と、このバレル11を浸漬させるメッキ液を貯留するメッキ浴(不図示)と、バレル11内に回転軸に直交する側壁の両側から導入されて収容される一対の陰極13と、バレル11の回転軸方向に互いに離間するとともにそのバレル11を間に挟むようにメッキ浴内のメッキ液中に浸漬・配置される複数枚の陽極14とを備えている。
【0017】
このバレルメッキ装置の陰極13は、バレル11の回転軸に一致する位置からそのバレル11内に導入された導入部13aと、この導入部13aからバレル11の回転軸に直交する側壁と平行になるように屈曲された後に再度その回転軸と平行になるように屈曲された屈曲部13bと、この屈曲部13bに連続してバレル11の回転軸と平行な先端部13cとにより構成されている。
【0018】
この陰極13は、導入部13aおよび屈曲部13bが絶縁被覆される一方、先端部13cが露出されて陰極部として機能するように支持されている。すなわち、陰極13は、先端部13cがメッキ浴のメッキ液中に沈んでバレル11の回転軸と平行な内面に最下の位置で対面するように、そのバレル11と共に回転しないように支持固定されている。
【0019】
また、陰極13の先端部13cには、鉛直に立設されている棒状の連結電極17と、バレル11の回転軸と平行になるようにその連結電極17に一端部を固設されている複数本の棒状の分岐電極18とが設けられている。この連結電極17および分岐電極18は、複数本に分岐された櫛歯形状の陰極部として機能するように軟銅を加工して、陰極13の先端部13cに導通可能に接続されている。
【0020】
このことから、このバレルメッキ装置は、陽極14を浸漬させたメッキ浴内に、複数本に分岐した陰極13と共に電子部品などの素材を収容するバレル11を設けて、その素材表面にメッキを施すバレルメッキ方法を実行することができる。つまり、バレル11をメッキ浴内で回転させるとともに陰極13と陽極14との間に電流を流すと、そのバレル11内に収容されている素材は、撹拌されつつ陰極13と導通状態になってその表面がメッキされる。このとき、陰極13は、先端部13cの連結電極17を介して分岐電極18で分岐されているので、これら先端部13c、連結電極17および分岐電極18により広い電極面積を有することができ、陽極14と先端部13cおよび電極17,18との間で効果的に電流を流すことができる。すなわち、同様な電流密度の電流を広い範囲で流すとともに、電流分布も広い範囲で均等になるので、このバレル11内に収容した素材は、ばらつきの少ないメッキ皮膜が表面に形成される。
【0021】
また、この陰極13の分岐電極18は、上部ほど短くなるように長さをそれぞれ設定されて略三角形の陰極部を形成しており、連結電極17の反対側の他端部の端面が連続してバレル11の内方に向かって傾斜するように設定されている。このため、一対の陰極13の分岐電極18は、互いに近接する方向に延長された状態で位置決め固定されている。
【0022】
このことから、バレル11内に収容された素材は、バレル11の回転に伴ってその内面につれ回されることにより分岐電極18の間を抜けるように移動されつつ撹拌される。また、一対の陰極13の分岐電極18間は下部ほど互いに近接しているので、バレル11内で下部に位置する素材は、上方に移動するように掻き上げられて、より均一に撹拌される。したがって、この撹拌によって、よりばらつきの少ないメッキ皮膜が素材表面に形成される。
【0023】
ここで、陰極13の分岐電極18や連結電極17は、丸棒形状や角棒形状のいずれであってもよく、水平方向に広がる平板形状のものを用いてもよい。また、分岐電極18や連結電極17の材質は、軟銅に限るものではないことは言うまでもなく、導電材料であれば、例えば、ステンレス鋼などで作製して強度を向上させるようにしてもよい。
【0024】
このように本実施形態においては、バレル11内に収容する陰極13を分岐して陽極14との間の電流密度や電流分布を改善することができ、バレル11内の素材表面にばらつきの少ない高品質なメッキを施すことができる。このため、陰極13と陽極14との間に流す通電量を増加させて、メッキ効率を向上させることもできる。
【0025】
本実施形態の他の態様としては、図示することは省略するが、上下を逆にした略三角形の陰極部を形成するように連結電極17と分岐電極18を陰極13の先端部13cに設けてもよく、言い換えると、分岐電極18を下部ほど短くなるように配列してもよい。また、左右を逆にした略三角形の陰極部を形成するように連結電極17と分岐電極18を陰極13の先端部13cに設けてもよく、言い換えると、連結電極17をバレル11の内方に位置させて分岐電極18を互いに離隔する方向に延在させてもよい。
【0026】
また、陰極13の先端部13cには、図3に示すように、長さの異なる複数本の棒状の分岐電極28を鉛直になるように直接立設してもよい。この分岐電極28を設ける場合においては、上記の他の形態と同様に、略三角形の左右が逆になるようにしてもよいことは言うまでもない。
【0027】
さらに、陰極13の先端部13cには、図4に示すように、同じ長さの分岐電極38をバレル11の回転軸と平行になるように連結電極17に接続してもよく、また同様に、図5に示すように、同じ長さの分岐電極48を鉛直になるように直接立設してもよい。
【0028】
尚、上記実施形態は本発明の実施例の一態様を述べたもので、本発明の趣旨を逸脱することなく種々の変形実施例が可能なことは勿論である。
【0029】
【発明の効果】
本発明によれば、バレル内において複数に分岐した陰極とバレル外の陽極との間で電流を流すことができるので、陽極と陰極との間の電流密度を広い範囲で均一にし、また、陽極と陰極との間の電流分布を広い範囲で均等にして、バレル内に収容した素材表面をメッキすることができる。
【0030】
したがって、バレル内の素材は陰極との導通機会が多くなって、ばらつきの少ない高品質なメッキをその素材表面に施すことができるとともに、通電量を増加してメッキ効率を向上させることもできる。
【図面の簡単な説明】
【図1】本発明に係るバレルメッキ方法を実行するバレルメッキ装置の一実施形態を示す図であり、上記バレルの外観を示す斜視図である。
【図2】上記バレルメッキ装置の概略全体構成を示す縦断面図である。
【図3】上記バレルメッキ装置の他の実施形態の概略全体構成を示す縦断面図である。
【図4】上記バレルメッキ装置の他の実施形態の概略全体構成を示す縦断面図である。
【図5】上記バレルメッキ装置の他の実施形態の概略全体構成を示す縦断面図である。
【図6】従来技術のバレルメッキ装置の概略全体構成を示す縦断面図である。
【図7】他の従来技術の概略全体構成を示す縦断面図である。
【符号の説明】
11  バレル
13  陰極
14  陽極
17  連結電極
18,28,38,48  分岐電極
[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a barrel plating apparatus and a barrel plating method for electroplating an electronic component, and more particularly, to a technique for improving plating quality and plating efficiency.
[0002]
[Prior art]
2. Description of the Related Art Conventionally, the surface of a material having conductivity has been plated. For example, in an electronic component, a terminal portion for electrical connection has been plated to ensure solderability.
[0003]
As shown in FIG. 6, an apparatus for performing this type of plating includes a barrel 1 that accommodates an electronic component of a material to be plated and rotates around a rotating shaft 1a, and a plating solution that immerses the barrel 1. It comprises a plating bath 2 to be stored, a cathode 3 housed in a barrel 1 together with electronic components, and a plurality of anodes 4 immersed in a plating solution in the plating bath 2 so as to sandwich the barrel 1 therebetween. Barrel plating equipment is known.
[0004]
This barrel plating apparatus rotates a barrel 1 in a plating bath 2 and allows a current to flow between a cathode 3 and an anode 4 to stir an electronic component in the barrel 1 and to connect a terminal portion of the electronic component to the cathode 3. , And the terminal surface is plated.
[0005]
Further, in such a barrel plating apparatus, various devices have been devised in order to perform uniform plating on the terminal portion of the electronic component. For example, in the barrel plating apparatus described in Patent Literature 1, as shown in FIG. 7, a triangular pyramid-shaped rectifier 5 is disposed below an inlet 3 a of a cathode 3 of a barrel 1. In this device, the rectifier 5 moves the electronic component 6 rotated along the inner surface of the barrel 1 in the direction of the rotation axis 1a, thereby agitating the electronic component 6 so that the electronic component 6 is uniformly connected to the cathode 3. The terminals are evenly plated. In this barrel plating apparatus, the tip 3b of the cathode 3 functions as a cathode.
[0006]
In addition, a barrel plating apparatus for performing uniform plating is also described in Patent Literature 2. In this apparatus, the stirring capacity is increased by arranging a stirring plate on an inner surface parallel to the rotation axis of the barrel. Is increasing. Further, in the barrel plating apparatus described in Patent Document 3, two kinds of conductive media having different sizes are charged into the barrel, thereby increasing the chance of conduction with the cathode and the stirring ability to perform uniform plating. ing.
[0007]
[Patent Document 1]
Japanese Patent Application Laid-Open No. Hei 9-119000 [Patent Document 2]
Japanese Patent Application Laid-Open No. 8-100294 [Patent Document 3]
JP 2000-260612 A
[Problems to be solved by the invention]
However, in such a conventional barrel plating apparatus, electricity is supplied between the linear cathode 3 housed in the barrel 1 and the anode 4 arranged outside the barrel 1. For this reason, there is a problem in that the flow of current (current density and current distribution) differs depending on the position in the plating bath 2 and the plating quality such as the plating film thickness varies.
[0009]
Further, even if the amount of current is increased to increase the plating efficiency, the plating quality varies because the current density varies depending on the rotational position of the barrel 1. For this reason, there was a problem that the plating time could not be reduced.
[0010]
That is, in order to realize high quality plating in a barrel plating apparatus, it is important to make the current density and current distribution in the plating bath as uniform as possible and to stabilize them.
[0011]
The present invention has been made in view of the above circumstances, and provides a barrel plating apparatus and a barrel plating method capable of improving current density and current distribution in a plating bath and performing high-quality and high-efficiency plating. The purpose is to:
[0012]
[Means for Solving the Problems]
The invention of a barrel plating apparatus that solves the above-mentioned problem is provided in a plating bath in which an anode is immersed, a barrel in which a material to be plated is housed together with a cathode, and the barrel is rotated to plate the material. In the plating apparatus, the cathode is branched into a plurality of pieces in the barrel.
[0013]
According to the present invention, a current can flow between the cathode branched into a plurality of parts in the barrel and the anode outside the barrel. Therefore, the current density between the anode and the cathode can be made uniform over a wide range, and the current distribution between the anode and the cathode can be made uniform over a wide range. In other words, the material accommodated in the barrel has more chances of conduction with the cathode, and its surface is plated with less variation.
[0014]
Here, the cathode is preferably formed in a comb shape and branched into a plurality of tubes, and the length of the branched cathode may be changed so as to move and stir the position of the material in the barrel. .
[0015]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, the present invention will be described with reference to the drawings. FIGS. 1 and 2 are views showing one embodiment of a barrel plating apparatus capable of executing the barrel plating method according to the present invention.
[0016]
1 and 2, a barrel plating apparatus includes a barrel 11 formed in a hexagonal cylindrical shape that rotates around a rotation axis (not shown) while accommodating an electronic component or the like of a material to be plated, and the barrel 11. A plating bath (not shown) for storing a plating solution for immersing the barrel 11, a pair of cathodes 13 introduced and housed in the barrel 11 from both sides of the side wall perpendicular to the rotation axis, and a pair of cathodes 13 in the rotation axis direction of the barrel 11. A plurality of anodes 14 which are immersed and arranged in a plating solution in a plating bath so as to be separated and sandwich the barrel 11 therebetween.
[0017]
The cathode 13 of the barrel plating apparatus is parallel to an introduction portion 13a introduced into the barrel 11 from a position coinciding with the rotation axis of the barrel 11 and a side wall orthogonal to the rotation axis of the barrel 11 from the introduction portion 13a. A bent portion 13b bent so as to be parallel to the rotation axis again after being bent as described above, and a tip portion 13c continuous with the bent portion 13b and parallel to the rotation axis of the barrel 11 are constituted.
[0018]
The cathode 13 is supported so that the leading portion 13c is exposed while the introduction portion 13a and the bent portion 13b are insulated, and functions as a cathode portion. That is, the cathode 13 is supported and fixed so as not to rotate with the barrel 11 so that the tip 13c sinks in the plating solution of the plating bath and faces the inner surface parallel to the rotation axis of the barrel 11 at the lowest position. ing.
[0019]
Further, a rod-shaped connecting electrode 17 erected vertically and a plurality of one ends fixed to the connecting electrode 17 so as to be parallel to the rotation axis of the barrel 11 are provided at the tip 13 c of the cathode 13. And a bar-shaped branch electrode 18. The connection electrode 17 and the branch electrode 18 are made of soft copper so as to function as a comb-shaped cathode part branched into a plurality of pieces, and are connected to the leading end 13 c of the cathode 13 in a conductive manner.
[0020]
For this reason, this barrel plating apparatus provides a barrel 11 for accommodating a material such as an electronic component together with a plurality of branched cathodes 13 in a plating bath in which an anode 14 is immersed, and performs plating on the surface of the material. A barrel plating method can be performed. That is, when the barrel 11 is rotated in the plating bath and a current flows between the cathode 13 and the anode 14, the material contained in the barrel 11 is brought into a conductive state with the cathode 13 while being stirred, and The surface is plated. At this time, since the cathode 13 is branched by the branch electrode 18 via the connection electrode 17 of the tip 13c, the tip 13c, the connection electrode 17 and the branch electrode 18 can have a wider electrode area, and A current can be effectively flowed between the tip 14 and the tip 13 c and the electrodes 17 and 18. That is, a current having a similar current density flows in a wide range, and the current distribution becomes uniform over a wide range, so that a plating film with little variation is formed on the surface of the material contained in the barrel 11.
[0021]
Further, the length of each of the branch electrodes 18 of the cathode 13 is set so as to be shorter toward the upper portion to form a substantially triangular cathode portion, and the end face of the other end opposite to the connection electrode 17 is continuous. It is set so as to be inclined toward the inside of the barrel 11. For this reason, the branch electrodes 18 of the pair of cathodes 13 are positioned and fixed in a state of being extended in a direction approaching each other.
[0022]
For this reason, the material accommodated in the barrel 11 is stirred while being moved so as to pass between the branch electrodes 18 by being swung around the inner surface thereof as the barrel 11 rotates. Further, since the lower portion between the branch electrodes 18 of the pair of cathodes 13 is closer to each other, the material located at the lower portion in the barrel 11 is scraped up so as to move upward and is stirred more uniformly. Therefore, by this stirring, a plating film with less variation is formed on the surface of the material.
[0023]
Here, the branch electrode 18 and the connection electrode 17 of the cathode 13 may have any of a round bar shape and a square bar shape, and may have a flat plate shape extending in the horizontal direction. Needless to say, the material of the branch electrode 18 and the connection electrode 17 is not limited to soft copper, and may be made of, for example, stainless steel to improve the strength as long as it is a conductive material.
[0024]
As described above, in the present embodiment, the cathode 13 housed in the barrel 11 can be branched to improve the current density and the current distribution between the anode 14 and the cathode 13. High quality plating can be applied. Therefore, the amount of current flowing between the cathode 13 and the anode 14 can be increased to improve the plating efficiency.
[0025]
As another aspect of the present embodiment, although not shown, the connection electrode 17 and the branch electrode 18 are provided at the tip portion 13c of the cathode 13 so as to form a substantially triangular cathode portion which is turned upside down. Alternatively, in other words, the branch electrodes 18 may be arranged so as to be shorter toward the lower part. Further, the connection electrode 17 and the branch electrode 18 may be provided at the tip portion 13c of the cathode 13 so as to form a substantially triangular cathode portion in which the left and right are inverted. In other words, the connection electrode 17 is provided inside the barrel 11. The branch electrodes 18 may be positioned and extend in a direction away from each other.
[0026]
In addition, as shown in FIG. 3, a plurality of rod-shaped branch electrodes 28 having different lengths may be directly erected on the tip portion 13c of the cathode 13 so as to be vertical. In the case where the branch electrode 28 is provided, it goes without saying that the left and right sides of the substantially triangular shape may be reversed as in the other embodiments described above.
[0027]
Further, a branch electrode 38 of the same length may be connected to the connecting electrode 17 at the tip 13c of the cathode 13 so as to be parallel to the rotation axis of the barrel 11, as shown in FIG. As shown in FIG. 5, the branch electrodes 48 of the same length may be directly erected vertically.
[0028]
It should be noted that the above-described embodiment describes one mode of the embodiment of the present invention, and it is needless to say that various modifications can be made without departing from the spirit of the present invention.
[0029]
【The invention's effect】
According to the present invention, a current can flow between a cathode branched into a plurality of parts in a barrel and an anode outside the barrel, so that the current density between the anode and the cathode is made uniform over a wide range, The surface of the material housed in the barrel can be plated by making the current distribution between the cathode and the cathode uniform over a wide range.
[0030]
Therefore, the material in the barrel has a large number of opportunities for conduction with the cathode, so that high-quality plating with little variation can be applied to the surface of the material, and the amount of electricity can be increased to improve the plating efficiency.
[Brief description of the drawings]
FIG. 1 is a view showing one embodiment of a barrel plating apparatus for executing a barrel plating method according to the present invention, and is a perspective view showing an appearance of the barrel.
FIG. 2 is a vertical sectional view showing a schematic overall configuration of the barrel plating apparatus.
FIG. 3 is a longitudinal sectional view showing a schematic overall configuration of another embodiment of the barrel plating apparatus.
FIG. 4 is a longitudinal sectional view showing a schematic overall configuration of another embodiment of the barrel plating apparatus.
FIG. 5 is a longitudinal sectional view showing a schematic overall configuration of another embodiment of the barrel plating apparatus.
FIG. 6 is a longitudinal sectional view showing a schematic overall configuration of a conventional barrel plating apparatus.
FIG. 7 is a longitudinal sectional view showing a schematic overall configuration of another conventional technique.
[Explanation of symbols]
11 Barrel 13 Cathode 14 Anode 17 Connection electrode 18, 28, 38, 48 Branch electrode

Claims (3)

陽極を浸漬させたメッキ浴内に、陰極と共にメッキする素材を収容する筒形状のバレルを設け、該バレルを回転させて該素材にメッキを施すバレルメッキ装置において、
前記陰極を前記バレル内で複数本に分岐したことを特徴とするバレルメッキ装置。
In a plating bath in which the anode is immersed, a barrel-shaped barrel that accommodates a material to be plated together with the cathode is provided, and a barrel plating apparatus that rotates the barrel to plate the material is provided.
A barrel plating apparatus, wherein the cathode is branched into a plurality of pieces in the barrel.
前記陰極を櫛歯形状に形成して複数本に分岐したことを特徴とする請求項1に記載のバレルメッキ装置。2. The barrel plating apparatus according to claim 1, wherein the cathode is formed in a comb shape and branched into a plurality of pieces. 陽極を浸漬させたメッキ浴内に、陰極と共にメッキする素材を収容する筒形状のバレルを設け、該バレルを回転させて該素材にメッキを施すバレルメッキ方法において、
複数本に分岐した前記陰極を前記バレル内に配置し、前記素材を該陰極に導通させてメッキすることを特徴とするバレルメッキ方法。
In a plating bath in which the anode is immersed, a barrel-shaped barrel for accommodating a material to be plated together with the cathode is provided, and a barrel plating method of rotating the barrel to plate the material.
A barrel plating method, comprising: arranging a plurality of branched cathodes in the barrel and conducting the material to the cathodes to perform plating.
JP2002260387A 2002-09-05 2002-09-05 Barrel plating device and method Pending JP2004099938A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Publications (1)

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