JP2004088083A5 - - Google Patents
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- JP2004088083A5 JP2004088083A5 JP2003175716A JP2003175716A JP2004088083A5 JP 2004088083 A5 JP2004088083 A5 JP 2004088083A5 JP 2003175716 A JP2003175716 A JP 2003175716A JP 2003175716 A JP2003175716 A JP 2003175716A JP 2004088083 A5 JP2004088083 A5 JP 2004088083A5
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003175716A JP2004088083A (en) | 2002-06-25 | 2003-06-20 | Semiconductor light emitting device, its manufacturing method, and its packaging method |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002183919 | 2002-06-25 | ||
JP2003175716A JP2004088083A (en) | 2002-06-25 | 2003-06-20 | Semiconductor light emitting device, its manufacturing method, and its packaging method |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2004088083A JP2004088083A (en) | 2004-03-18 |
JP2004088083A5 true JP2004088083A5 (en) | 2009-03-12 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003175716A Pending JP2004088083A (en) | 2002-06-25 | 2003-06-20 | Semiconductor light emitting device, its manufacturing method, and its packaging method |
Country Status (1)
Country | Link |
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JP (1) | JP2004088083A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
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US8067269B2 (en) | 2005-10-19 | 2011-11-29 | Tinggi Technologies Private Limted | Method for fabricating at least one transistor |
US8124994B2 (en) | 2006-09-04 | 2012-02-28 | Tinggi Technologies Private Limited | Electrical current distribution in light emitting devices |
US8309377B2 (en) | 2004-04-07 | 2012-11-13 | Tinggi Technologies Private Limited | Fabrication of reflective layer on semiconductor light emitting devices |
US8329556B2 (en) | 2005-12-20 | 2012-12-11 | Tinggi Technologies Private Limited | Localized annealing during semiconductor device fabrication |
US8395167B2 (en) | 2006-08-16 | 2013-03-12 | Tinggi Technologies Private Limited | External light efficiency of light emitting diodes |
Families Citing this family (23)
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US7244628B2 (en) | 2003-05-22 | 2007-07-17 | Matsushita Electric Industrial Co., Ltd. | Method for fabricating semiconductor devices |
WO2005088743A1 (en) | 2004-03-15 | 2005-09-22 | Tinggi Technologies Private Limited | Fabrication of semiconductor devices |
US7064353B2 (en) * | 2004-05-26 | 2006-06-20 | Philips Lumileds Lighting Company, Llc | LED chip with integrated fast switching diode for ESD protection |
JP5138873B2 (en) | 2005-05-19 | 2013-02-06 | 日亜化学工業株式会社 | Nitride semiconductor device |
CN100372137C (en) * | 2005-05-27 | 2008-02-27 | 晶能光电(江西)有限公司 | Indium gallium aluminum nitrogen luminous device with up-down cathode strucure and manufacturing method thereof |
TWI269467B (en) * | 2005-07-01 | 2006-12-21 | Epitech Technology Corp | Light-emitting diode |
SG130975A1 (en) | 2005-09-29 | 2007-04-26 | Tinggi Tech Private Ltd | Fabrication of semiconductor devices for light emission |
AP2008004469A0 (en) | 2005-10-21 | 2008-06-30 | Taylor Biomass Energy Llc | Process and system for gasification with in-situ tar removal |
KR100721150B1 (en) | 2005-11-24 | 2007-05-22 | 삼성전기주식회사 | Vertically structured gan type led device |
US7786491B2 (en) | 2006-02-02 | 2010-08-31 | Panasonic Corporation | Semiconductor light-emitting device comprising a plurality of semiconductor layers |
JP2007243047A (en) * | 2006-03-10 | 2007-09-20 | Matsushita Electric Works Ltd | Method for manufacturing light emitting device |
JP2007258277A (en) * | 2006-03-20 | 2007-10-04 | Matsushita Electric Works Ltd | Semiconductor light emitting device |
DE102006034847A1 (en) | 2006-04-27 | 2007-10-31 | Osram Opto Semiconductors Gmbh | Opto-electronic semiconductor chip e.g. light emitting diode chip, has contact layer, where electrical contact resistance of contact layer to connection layer is smaller than contact layer to barrier layer |
KR100755598B1 (en) * | 2006-06-30 | 2007-09-06 | 삼성전기주식회사 | Nitride semiconductor light emitting diode array |
JP4882611B2 (en) * | 2006-08-30 | 2012-02-22 | 三菱化学株式会社 | Manufacturing method of nitride semiconductor light emitting diode device |
JP2010074122A (en) * | 2008-08-21 | 2010-04-02 | Sumitomo Electric Ind Ltd | Heat sink for led, heat sink precursor for led, led element, method for manufacturing heat sink for led and method for manufacturing led element |
JP2010114405A (en) * | 2008-10-06 | 2010-05-20 | Panasonic Corp | Nitride semiconductor light-emitting diode |
JP2011011366A (en) | 2009-06-30 | 2011-01-20 | Sumitomo Electric Ind Ltd | Method of manufacturing metal laminated structure |
JP5583985B2 (en) | 2010-02-19 | 2014-09-03 | 住友電気工業株式会社 | Metal laminated structure |
GB2541970B (en) * | 2015-09-02 | 2020-08-19 | Facebook Tech Llc | Display manufacture |
GB2549734B (en) | 2016-04-26 | 2020-01-01 | Facebook Tech Llc | A display |
DE102016124646A1 (en) * | 2016-12-16 | 2018-06-21 | Osram Opto Semiconductors Gmbh | Method for producing a semiconductor component |
JP7436772B2 (en) | 2018-12-27 | 2024-02-22 | 日亜化学工業株式会社 | Manufacturing method of semiconductor device |
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2003
- 2003-06-20 JP JP2003175716A patent/JP2004088083A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8309377B2 (en) | 2004-04-07 | 2012-11-13 | Tinggi Technologies Private Limited | Fabrication of reflective layer on semiconductor light emitting devices |
US8067269B2 (en) | 2005-10-19 | 2011-11-29 | Tinggi Technologies Private Limted | Method for fabricating at least one transistor |
US8329556B2 (en) | 2005-12-20 | 2012-12-11 | Tinggi Technologies Private Limited | Localized annealing during semiconductor device fabrication |
US8395167B2 (en) | 2006-08-16 | 2013-03-12 | Tinggi Technologies Private Limited | External light efficiency of light emitting diodes |
US8124994B2 (en) | 2006-09-04 | 2012-02-28 | Tinggi Technologies Private Limited | Electrical current distribution in light emitting devices |