JP2004082737A - Substrate with conductor layer and its manufacturing method - Google Patents
Substrate with conductor layer and its manufacturing method Download PDFInfo
- Publication number
- JP2004082737A JP2004082737A JP2003321306A JP2003321306A JP2004082737A JP 2004082737 A JP2004082737 A JP 2004082737A JP 2003321306 A JP2003321306 A JP 2003321306A JP 2003321306 A JP2003321306 A JP 2003321306A JP 2004082737 A JP2004082737 A JP 2004082737A
- Authority
- JP
- Japan
- Prior art keywords
- adhesive
- conductor layer
- manufactured
- parts
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 22
- 239000004020 conductor Substances 0.000 title claims abstract description 18
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 10
- 239000000853 adhesive Substances 0.000 claims abstract description 53
- 230000001070 adhesive effect Effects 0.000 claims abstract description 53
- 229920000459 Nitrile rubber Polymers 0.000 claims abstract description 29
- 239000002245 particle Substances 0.000 claims abstract description 20
- 238000000034 method Methods 0.000 claims description 14
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 11
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 239000011889 copper foil Substances 0.000 claims description 2
- 229920001971 elastomer Polymers 0.000 claims description 2
- 239000005060 rubber Substances 0.000 claims description 2
- NTXGQCSETZTARF-UHFFFAOYSA-N buta-1,3-diene;prop-2-enenitrile Chemical compound C=CC=C.C=CC#N NTXGQCSETZTARF-UHFFFAOYSA-N 0.000 claims 1
- 238000010292 electrical insulation Methods 0.000 abstract description 2
- 238000009413 insulation Methods 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 18
- 239000003822 epoxy resin Substances 0.000 description 17
- 238000007747 plating Methods 0.000 description 17
- 229920000647 polyepoxide Polymers 0.000 description 17
- 239000000654 additive Substances 0.000 description 15
- 230000000996 additive effect Effects 0.000 description 15
- 239000003054 catalyst Substances 0.000 description 12
- 229920005989 resin Polymers 0.000 description 11
- 239000011347 resin Substances 0.000 description 11
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 10
- 229910052802 copper Inorganic materials 0.000 description 9
- 239000010949 copper Substances 0.000 description 9
- 239000000463 material Substances 0.000 description 9
- 238000007788 roughening Methods 0.000 description 7
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 7
- 238000007772 electroless plating Methods 0.000 description 6
- XLSZMDLNRCVEIJ-UHFFFAOYSA-N 4-methylimidazole Chemical compound CC1=CNC=N1 XLSZMDLNRCVEIJ-UHFFFAOYSA-N 0.000 description 5
- 239000012790 adhesive layer Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 239000011521 glass Substances 0.000 description 4
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 229920003051 synthetic elastomer Polymers 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- KLMREMBURZNLTP-UHFFFAOYSA-J [F-].[Na+].S(O)(O)(=O)=O.[Cr+3].[F-].[F-].[F-] Chemical compound [F-].[Na+].S(O)(O)(=O)=O.[Cr+3].[F-].[F-].[F-] KLMREMBURZNLTP-UHFFFAOYSA-J 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- -1 polypropylene Polymers 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229920000298 Cellophane Polymers 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 239000011256 inorganic filler Substances 0.000 description 2
- 229910003475 inorganic filler Inorganic materials 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000002759 woven fabric Substances 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- BJINVQNEBGOMCR-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethyl acetate Chemical compound COCCOCCOC(C)=O BJINVQNEBGOMCR-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- JZULKTSSLJNBQJ-UHFFFAOYSA-N chromium;sulfuric acid Chemical compound [Cr].OS(O)(=O)=O JZULKTSSLJNBQJ-UHFFFAOYSA-N 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 238000007720 emulsion polymerization reaction Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920001748 polybutylene Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- 239000011775 sodium fluoride Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
本発明は、導体層含有基板及びその製造方法に関する。 (4) The present invention relates to a conductor layer-containing substrate and a method for producing the same.
アディティブ法プリント配線板の製造工程を概略説明する。まず、めっき触媒を含有する絶縁基板上に、めっき触媒を含有する接着剤層を形成し、140〜190℃の温度で20〜90分加熱して硬化させる。次いで、回路形成する部分以外の接着剤表面をめっきレジストでマスクし、酸化力のある酸を用いて、マスクされていない接着剤表面を選択的に化学粗化する。そして、無電解めっき液に浸漬して接着剤上に銅を析出させて、配線パターンを形成する。アディティブ法多層プリント配線板は、絶縁基板に代えて、回路形成済の配線板を内層材とし、この内層材の導体層と表面導体層の間の絶縁層を、同様な接着剤で形成する。 Additive method The manufacturing process of a printed wiring board will be schematically described. First, an adhesive layer containing a plating catalyst is formed on an insulating substrate containing a plating catalyst, and cured by heating at a temperature of 140 to 190 ° C. for 20 to 90 minutes. Next, the surface of the adhesive other than the portion where a circuit is to be formed is masked with a plating resist, and the unmasked adhesive surface is selectively chemically roughened using an oxidizing acid. Then, the wiring pattern is formed by immersing in an electroless plating solution to precipitate copper on the adhesive. In the additive multilayer printed wiring board, a circuit board on which a circuit has been formed is used as an inner layer material instead of an insulating substrate, and an insulating layer between a conductor layer and a surface conductor layer of the inner layer material is formed with a similar adhesive.
絶縁基板としては、めっき触媒入りの液状熱硬化性樹脂を繊維基材に含浸後、加熱して含浸した熱硬化性樹脂をBステージまで硬化させたプリプレグを所要枚数重ねて加熱加圧して得られる積層板が用いられる。接着剤は、めっきで形成する回路と絶縁基板との密着力を確保するために用いられている。この接着剤は、アディティブ法プリント配線板では極めて重要な役割を持ち、接着性と耐熱性に優れていることが不可欠である。 The insulating substrate is obtained by impregnating a liquid thermosetting resin containing a plating catalyst into a fibrous base material, heating the impregnated thermosetting resin to the B stage, curing a predetermined number of prepregs, and heating and pressing the prepregs. A laminate is used. The adhesive is used to secure adhesion between the circuit formed by plating and the insulating substrate. This adhesive plays an extremely important role in an additive printed wiring board, and it is essential that the adhesive has excellent adhesiveness and heat resistance.
接着剤の接着成分としては、一般にめっき銅との接着性がよいアクリロニトリルブタジエンゴムを主成分とし、これに、架橋剤としてアルキルフェノール樹脂を、さらに、電気特性を確保するためにエポキシ樹脂を配合したものが用いられている。樹脂成分のほかに、接着剤塗膜の補強や化学粗化時の接着剤表面に凹凸を形成しやすくするために、無機充填剤を配合することもある(特許文献1〜4等参照)。
ところで、近年、電子機器が小型化、多機能化するのに伴い、プリント配線板は、より配線密度を増す必要が生じており、配線幅の細線化が急激に進行している。このような背景から、回路導体と直接接する接着剤は、絶縁性が重要な特性となりつつある。このため、一般的には、絶縁性がエポキシ樹脂などより劣るアクリロニトリルブタジエンゴムの配合量を減らし、エポキシ樹脂の配合量を増すことが行われる。しかしながら、アクリロニトリルブタジエンゴムの配合量を減らし、エポキシ樹脂の配合量を増すと、耐トラッキング性が低下する。本発明は、電気絶縁性を損なうことなく、耐トラッキング特性に優れたプリント配線板用の導体層含有基板及びその製造方法を提供することを目的とする。 In recent years, as electronic devices have become smaller and more multifunctional, it has become necessary to increase the wiring density of printed wiring boards, and wiring widths have been rapidly reduced. From such a background, an adhesive which is in direct contact with a circuit conductor is becoming an important property in terms of insulation. Therefore, in general, the amount of acrylonitrile-butadiene rubber, which is inferior to epoxy resin or the like, is reduced, and the amount of epoxy resin is increased. However, when the amount of the acrylonitrile-butadiene rubber is reduced and the amount of the epoxy resin is increased, the tracking resistance decreases. An object of the present invention is to provide a conductor layer-containing substrate for a printed wiring board excellent in tracking resistance without impairing electrical insulation and a method for producing the same.
本発明の導体層含有基板は、接着成分に加えて、架橋したアクリロニトリルブタジエンゴム粒子を配合した接着剤を用いて、導体層と絶縁層とを接着させて得られることを特徴とする。 導体 The conductor layer-containing substrate of the present invention is characterized by being obtained by bonding a conductor layer and an insulating layer using an adhesive in which crosslinked acrylonitrile butadiene rubber particles are blended in addition to the adhesive component.
本発明で用いる架橋したアクリロニトリルブタジエンゴム粒子は、乳化重合後のエマルジョン状態でアクリロニトリルブタジエンゴムを架橋した1次平均粒子径約50〜100nmの微小高分子量架橋ゴム粒子である。カルボキシル基で変性の有無は問わない。配合量は、接着剤組成中に2〜50重量%である。2重量%以下では、耐トラッキング性の改善に効果がなく、50重量%以上では、接着剤表面の粘着性が増し、後工程でのごみの付着などの問題が生じてくるためである。 The crosslinked acrylonitrile-butadiene rubber particles used in the present invention are fine high molecular weight crosslinked rubber particles having a primary average particle diameter of about 50 to 100 nm obtained by crosslinking acrylonitrile-butadiene rubber in an emulsion state after emulsion polymerization. The presence or absence of modification with a carboxyl group does not matter. The compounding amount is 2 to 50% by weight in the adhesive composition. If the content is 2% by weight or less, there is no effect on the improvement of the tracking resistance. If the content is 50% by weight or more, the tackiness of the adhesive surface increases, and a problem such as adhesion of dust in a later step occurs.
接着剤の基本となる樹脂組成は、アディティブ法プリント配線板用に用いられている接着剤組成であればよく、特に制限はない。耐めっき液性、塗膜形成性、粗化性等を考慮して、エポキシ樹脂、アクリロニトリルブタジエンゴム、レゾール型フェノール樹脂及び無機充填剤の混合物が好ましい。接着剤中に、必要により、無電解銅めっきの析出核となるめっき触媒を含有させる。めっき触媒としては、元素周期表で8族、1B族又は2B族に属する金属の塩又は酸化物がある。例えば、白金、パラジウム、スズなどの化合物が用いられ、固体粒子あるいは有機溶剤に溶解又は他の樹脂とともに溶解分散させた溶液状態として接着剤中に混合する。めっき触媒配合量は、接着剤全量にたいして、2〜15重量%の範囲である。 樹脂 The basic resin composition of the adhesive is not particularly limited as long as it is an adhesive composition used for an additive printed wiring board. A mixture of an epoxy resin, acrylonitrile-butadiene rubber, a resol-type phenol resin, and an inorganic filler is preferable in consideration of plating solution resistance, coating film forming properties, roughening properties, and the like. If necessary, a plating catalyst serving as a deposition nucleus for electroless copper plating is contained in the adhesive. Examples of the plating catalyst include salts or oxides of metals belonging to Group 8, Group 1B or Group 2B in the periodic table. For example, a compound such as platinum, palladium, or tin is used, and is mixed with the adhesive in a solution state of being dissolved in solid particles or an organic solvent or dissolved and dispersed together with another resin. The amount of the plating catalyst is in the range of 2 to 15% by weight based on the total amount of the adhesive.
上記接着剤の各成分は、有機溶媒中で混練り混合され溶液状混合物に調製される。用いる有機溶媒としては、トルエン、メチルエチルケエトン、アセトン、メチルイソブチルケトン、キシレン、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノメチルエーテルアセテート、エトキシプロピオン酸エチル、プロピレングリコールモノメチルエーテル等の単独又は混合系を用いることができる。本発明に係る接着剤を使用する絶縁基板としては、フェノール樹脂系又はエポキシ樹脂系あるいは無機系又は有機複合物からなる基材等を用いることができる。 各 Each component of the adhesive is kneaded and mixed in an organic solvent to prepare a solution mixture. As the organic solvent to be used, a single or mixed system of toluene, methyl ethyl ketone, acetone, methyl isobutyl ketone, xylene, diethylene glycol monomethyl ether, diethylene glycol monomethyl ether acetate, ethoxypropionate ethyl, propylene glycol monomethyl ether and the like can be used. . As the insulating substrate using the adhesive according to the present invention, a substrate made of a phenol resin or epoxy resin, or an inorganic or organic composite, or the like can be used.
前記接着剤は、絶縁基板に10〜50μmの厚みに直接塗布され、120〜190℃の温度で30〜60分加熱硬化が行われる。また、耐熱性ベースフィルムに10〜100μmの厚みに塗布され、120〜190℃の温度で3〜15分加熱硬化して、接着剤シート(ドライフィルム)にすることもできる。前記耐熱性ベースフィルムとしては、ポリプロピレン、ポリブチレン、ポリアミド、ポリカーボネート、ポリエーテルスルホン、ポリエチレンテレフタレート等の有機系;又は銅はく、アルミはく等の金属フィルムの、表面を離型処理したものを用いることができる。この接着剤シートは、所定枚数のプリプレグを重ね、その上の片側又は両側に、接着剤層がプリプレグ側となるように重ね、加熱加圧することによって、アディティブ法プリント配線板用の積層板とする。また、アディティブ法多層プリント配線板とするときには、回路形成済の配線板を内層材とし、この内層材の導体層と表面導体層の間の絶縁層を、前記接着剤で形成する。 The adhesive is applied directly to the insulating substrate to a thickness of 10 to 50 μm, and cured by heating at a temperature of 120 to 190 ° C. for 30 to 60 minutes. Alternatively, the adhesive sheet (dry film) may be applied to a heat-resistant base film in a thickness of 10 to 100 μm and cured by heating at a temperature of 120 to 190 ° C. for 3 to 15 minutes. As the heat-resistant base film, an organic material such as polypropylene, polybutylene, polyamide, polycarbonate, polyethersulfone, or polyethylene terephthalate; or a metal film such as copper foil or aluminum foil, whose surface is subjected to release treatment is used. be able to. The adhesive sheet is formed by laminating a predetermined number of prepregs, laminating on one or both sides thereof such that the adhesive layer is on the prepreg side, and applying heat and pressure to form a laminate for an additive method printed wiring board. . In addition, when forming an additive method multilayer printed wiring board, a wiring board on which a circuit has been formed is used as an inner layer material, and an insulating layer between a conductor layer of the inner layer material and a surface conductor layer is formed with the adhesive.
無電解めっきを析出させるに際しては、接着剤表面を化学的に粗化して接着に適した形状にする。化学的粗化に用いる粗化液は、クロム−硫酸系、クロム−硫酸−フッ化ナトリウム系、アルカリ−過マンガン酸系、ホウフッ化水素酸−重クロム酸系等が使用できる。また、パターン形成は、めっきレジストをスクリーン印刷、あるいはフォトマスクを紫外線硬化し現像して形成する。上記のめっきレジスト形成は、化学的粗化処理工程の前か、あるいは処理した後に行う。 析出 When depositing electroless plating, the surface of the adhesive is chemically roughened to a shape suitable for bonding. As a roughening solution used for chemical roughening, a chromium-sulfuric acid system, a chromium-sulfuric acid-sodium fluoride system, an alkali-permanganate system, a borofluoric acid-bichromic system system, and the like can be used. The pattern is formed by screen-printing a plating resist or by curing and developing a photomask with ultraviolet rays. The plating resist is formed before or after the chemical roughening step.
本発明によれば、絶縁性及びめっき銅接着力を損なうことなく、耐トラッキング性に優れた導体層含有基板、並びにそれを用いたアディティブ法プリント配線板を得ることができる。 According to the present invention, it is possible to obtain a conductive layer-containing substrate excellent in tracking resistance and an additive printed wiring board using the same, without impairing the insulating property and the adhesion of plated copper.
以下、実施例によって、本発明をさらに詳細に説明する。 Hereinafter, the present invention will be described in more detail with reference to examples.
接着剤の調製
架橋したアクリロニトリルブタジエンゴム粒子(日本合成ゴム株式会社製、商品名:XER−91)20部(重量部、以下同じ)、ビスフェノールA型エポキシ樹脂(油化シェル株式会社製、商品名:エピコート1001)20部、アクリロニトリルブタジエンゴム、(日本ゼオン株式会社製、商品名:ニポール1031)20部、アルキルフェノール樹脂(日立化成工業株式会社製、商品名:ヒタノール2400)5部、2−エチル−4−メチルイミダゾール0.1部、ケイ酸ジルコニウム(白水化学株式会社製、商品名:ミクロパックス)10部、及び無電解めっき用触媒(塩化パラジウム付加充填材)(日立化成工業株式会社製、商品名:Cat#11)4部を、溶媒中で混合した。
Preparation of Adhesive Crosslinked acrylonitrile butadiene rubber particles (manufactured by Nippon Synthetic Rubber Co., Ltd., trade name: XER-91) 20 parts (parts by weight, the same applies hereinafter), bisphenol A type epoxy resin (manufactured by Yuka Shell Co., Ltd., trade name) : Epicoat 1001) 20 parts, acrylonitrile butadiene rubber, (manufactured by Nippon Zeon Co., Ltd., trade name: Nipol 1031) 20 parts, alkylphenol resin (manufactured by Hitachi Chemical Co., Ltd., trade name: Hitachinol 2400) 5 parts, 2-ethyl- 0.1 part of 4-methylimidazole, 10 parts of zirconium silicate (manufactured by Hakusui Chemical Co., Ltd., trade name: Micropacks), and a catalyst for electroless plating (addition material for palladium chloride) (manufactured by Hitachi Chemical Co., Ltd.) Name: Cat # 11) 4 parts were mixed in a solvent.
アディティブ法プリント配線板用積層板の製造
得られた接着剤を、ガラス織布基材エポキシ樹脂積層板に、ディップコート法で塗布し、膜厚25μmの接着剤層を両面に形成し、170℃で60分間加熱した。
Production of Laminate for Additive Method Printed Wiring Board The obtained adhesive is applied to a glass woven fabric base epoxy resin laminate by a dip coating method, and an adhesive layer having a thickness of 25 μm is formed on both surfaces. For 60 minutes.
接着剤の調製
架橋したアクリロニトリルブタジエンゴム粒子(日本合成ゴム株式会社製、商品名:XER−91)20部(重量部、以下同じ)、ビスフェノールA型エポキシ樹脂(油化シェル株式会社製、商品名:エピコート1001)50部、アクリロニトリルブタジエンゴム(日本ゼオン株式会社製、商品名:ニポール1031)20部、アルキルフェノール樹脂(日立化成工業株式会社製、商品名:ヒタノール2400)5部、2−エチル−4−メチルイミダゾール0.1部、ケイ酸ジルコニウム(白水化学株式会社製、商品名:ミクロパックス)10部、及び無電解めっき用触媒(塩化パラジウム付加充填材)(日立化成工業株式会社製、商品名:Cat#11)4部を、溶媒中で混合した。
Preparation of Adhesive Crosslinked acrylonitrile butadiene rubber particles (manufactured by Nippon Synthetic Rubber Co., Ltd., trade name: XER-91) 20 parts (parts by weight, the same applies hereinafter), bisphenol A type epoxy resin (manufactured by Yuka Shell Co., Ltd., trade name) : Epicoat 1001) 50 parts, acrylonitrile butadiene rubber (manufactured by Nippon Zeon Co., Ltd., trade name: Nipol 1031), 20 parts, alkylphenol resin (manufactured by Hitachi Chemical Co., Ltd., trade name: Hitachinol 2400) 5 parts, 2-ethyl-4 -0.1 part of methyl imidazole, 10 parts of zirconium silicate (trade name: Micropax, manufactured by Hakusui Chemical Co., Ltd.), and a catalyst for electroless plating (addition material for palladium chloride) (trade name, manufactured by Hitachi Chemical Co., Ltd.) : Cat # 11) 4 parts were mixed in a solvent.
アディティブ法プリント配線板用積層板の製造
得られた接着剤を、離型処理したセパレータフィルム(東京セロファン株式会社製、商品名:トウセロセパレータ)に、厚み50μmに塗布し、150℃で5分間加熱した。めっき触媒入りエポキシ樹脂プリプレグ8枚を重ね、両外側に、接着剤層をプリプレグ側にしてこの接着剤シートを重ね、3MPa、170℃で60分間加熱加圧し、セパレータフィルムを除いた。
Production of Laminated Board for Additive Method Printed Wiring Board The obtained adhesive is applied to a release film of a separator film (manufactured by Tokyo Cellophane Co., Ltd., trade name: Toucero Separator) to a thickness of 50 μm, and then at 150 ° C. for 5 minutes. Heated. Eight epoxy resin prepregs containing a plating catalyst were stacked, and the adhesive sheet was stacked on both outer sides with the adhesive layer being on the prepreg side, and heated and pressed at 3 MPa and 170 ° C. for 60 minutes to remove the separator film.
接着剤の調製
架橋したアクリロニトリルブタジエンゴム粒子(日本合成ゴム株式会社製、商品名:XER−91)40部(重量部、以下同じ)、ビスフェノールA型エポキシ樹脂(油化シェル株式会社製、商品名:エピコート1001)20部、アクリロニトリルブタジエンゴム、(日本ゼオン株式会社製、商品名:ニポール1031)20部、アルキルフェノール樹脂(日立化成工業株式会社製、商品名:ヒタノール2400)5部、2−エチル−4−メチルイミダゾール0.1部、ケイ酸ジルコニウム(白水化学株式会社製、商品名:ミクロパックス)10部、及び無電解めっき用触媒(塩化パラジウム付加充填材)(日立化成工業株式会社製、商品名:Cat#11)4部を、溶媒中で混合した。
Preparation of Adhesive Crosslinked acrylonitrile butadiene rubber particles (manufactured by Nippon Synthetic Rubber Co., Ltd., trade name: XER-91) 40 parts (parts by weight, the same applies hereinafter), bisphenol A type epoxy resin (manufactured by Yuka Shell Co., Ltd., trade name) : Epicoat 1001) 20 parts, acrylonitrile butadiene rubber, (manufactured by Nippon Zeon Co., Ltd., trade name: Nipol 1031) 20 parts, alkylphenol resin (manufactured by Hitachi Chemical Co., Ltd., trade name: Hitachinol 2400) 5 parts, 2-ethyl- 0.1 part of 4-methylimidazole, 10 parts of zirconium silicate (manufactured by Hakusui Chemical Co., Ltd., trade name: Micropax), and a catalyst for electroless plating (addition material for palladium chloride) (manufactured by Hitachi Chemical Co., Ltd.) Name: Cat # 11) 4 parts were mixed in a solvent.
アディティブ法プリント配線板用積層板の製造
得られた接着剤を、ガラス織布基材エポキシ樹脂積層板に、ディップコート法で塗布し、膜厚25μmの接着剤層を両面に形成し、170℃で60分間加熱した。
Production of Laminate for Additive Method Printed Wiring Board The obtained adhesive is applied to a glass woven fabric base epoxy resin laminate by a dip coating method, and an adhesive layer having a thickness of 25 μm is formed on both surfaces. For 60 minutes.
比較例1
接着剤中の架橋したアクリロニトリルブタジエンゴム粒子を除いたほかは、実施例1と同様にして、アディティブ法プリント配線板用積層板を得た。
Comparative Example 1
A laminate for an additive method printed wiring board was obtained in the same manner as in Example 1 except that the crosslinked acrylonitrile-butadiene rubber particles in the adhesive were removed.
比較例2
接着剤中の架橋したアクリロニトリルブタジエンゴム粒子を除いたほかは、実施例2と同様にして、アディティブ法プリント配線板用積層板を得た。
Comparative Example 2
A laminate for an additive method printed wiring board was obtained in the same manner as in Example 2 except that the crosslinked acrylonitrile butadiene rubber particles in the adhesive were removed.
比較例3
接着剤中の架橋したアクリロニトリルブタジエンゴム粒子を除いたほかは、実施例3と同様にして、アディティブ法プリント配線板用積層板を得た。
Comparative Example 3
A laminate for an additive method printed wiring board was obtained in the same manner as in Example 3 except that the crosslinked acrylonitrile butadiene rubber particles in the adhesive were removed.
得られたアディティブ法プリント配線板用積層板に、めっきレジスト(日立化成工業株式会社製、商品名:SR−3000)をラミネートし、必要なパターンのマスクフィルムを置いて紫外線を照射し、現像した。次に、40℃の、クロム−硫酸−フッ化ナトリウム粗化液に5分間浸漬し、中和水洗した。そして、無電解銅めっき液(日立化成工業株式会社製、商品名:CC−41)中に投入して、厚み35μmのめっき銅を析出させ、160℃で60分間アニーリングした。 A plating resist (manufactured by Hitachi Chemical Co., Ltd., trade name: SR-3000) was laminated on the obtained laminate for an additive method printed wiring board, and a mask film having a required pattern was placed thereon and irradiated with ultraviolet rays for development. . Next, it was immersed in a chromium-sulfuric acid-sodium fluoride roughening solution at 40 ° C. for 5 minutes, and washed with neutralized water. Then, it was put into an electroless copper plating solution (trade name: CC-41, manufactured by Hitachi Chemical Co., Ltd.) to deposit plated copper having a thickness of 35 μm and annealed at 160 ° C. for 60 minutes.
得られたプリント配線板について、めっき銅の接着力(単位:kN/m)、85℃−85%RH−100V/75μmにおける耐電食性(単位:h)、及び耐トラッキング性(単位:V/CTI)を調べた。その結果を表1に示す。 About the obtained printed wiring board, the adhesive strength of plated copper (unit: kN / m), the corrosion resistance at 85 ° C.-85% RH-100 V / 75 μm (unit: h), and the tracking resistance (unit: V / CTI) ). Table 1 shows the results.
接着剤の調製
架橋したアクリロニトリルブタジエンゴム粒子(日本合成ゴム株式会社製、商品名:XER−91)10部(重量部、以下同じ)、ビスフェノールA型エポキシ樹脂(油化シェル株式会社製、商品名:エピコート1001)20部、アクリロニトリルブタジエンゴム(日本ゼオン株式会社製、商品名:ニポール1031)20部、フェノールノボラック樹脂(日立化成工業株式会社製、商品名:HP−850N)5部、アルキルフェノール樹脂(日立化成工業株式会社製、商品名:ヒタノール2400)5部、2−エチル−4−メチルイミダゾール0.1部、ケイ酸ジルコニウム(白水化学株式会社製、商品名:ミクロパックス)10部、及び無電解めっき用触媒(塩化パラジウム付加充填材)(日立化成工業株式会社製、商品名:Cat#11)4部を、溶媒中で混合した。得られた接着剤を、離型処理したセパレータフィルム(東京セロファン株式会社製、商品名:トウセロセパレータ)に厚み100μmに塗布し、150℃で5分間加熱した。
Preparation of Adhesive Crosslinked acrylonitrile butadiene rubber particles (manufactured by Nippon Synthetic Rubber Co., Ltd., trade name: XER-91) 10 parts (parts by weight, the same applies hereinafter), bisphenol A type epoxy resin (manufactured by Yuka Shell Co., Ltd., trade name) : Epicoat 1001) 20 parts, acrylonitrile butadiene rubber (manufactured by Zeon Corporation, trade name: Nipol 1031) 20 parts, phenol novolak resin (manufactured by Hitachi Chemical Co., Ltd., trade name: HP-850N) 5 parts, alkylphenol resin ( 5 parts of Hitachi Chemical Co., Ltd., trade name: Hitachinol 2400), 0.1 part of 2-ethyl-4-methylimidazole, 10 parts of zirconium silicate (manufactured by Hakusui Chemical Co., Ltd., trade name: Micropax), and none Electroplating catalyst (addition material for palladium chloride) (manufactured by Hitachi Chemical Co., Ltd.) Name: Cat # 11) 4 parts were mixed in a solvent. The obtained adhesive was applied to a release film of a separator film (manufactured by Tokyo Cellophane Co., Ltd., trade name: Tocello Separator) to a thickness of 100 μm, and heated at 150 ° C. for 5 minutes.
アディティブ法多層プリント配線板の製造
このフィルムを、内層回路を形成した厚み0.8mmのガラス織布基材エポキシ樹脂積層板の両面にロールラミネータでラミネートした。その後、170℃で60分間加熱した。さらに、めっきレジスト(日立化成工業株式会社製、商品名:SR−3000)をラミネートし、紫外線露光し、現像した。次に、40℃に保たれた、クロム−硫酸−フッ化ナトリウム(クロム酸40g/l、濃硫酸300ml/l、フッ化ナトリウム10g/l)粗化液に5分間浸漬して、前記現像によって露出した接着剤表面を選択的に化学粗化し、中和、水洗した。その後、無電解めっき浴(日立化成工業株式会社製、商品名:CC−41)に投入して、厚さ35μmのめっき銅を析出させ、160℃で60分間アニーリングした。
Production of Additive Method Multilayer Printed Wiring Board This film was laminated with a roll laminator on both sides of a 0.8 mm thick glass woven substrate epoxy resin laminate having an inner layer circuit formed thereon. Then, it heated at 170 degreeC for 60 minutes. Further, a plating resist (trade name: SR-3000, manufactured by Hitachi Chemical Co., Ltd.) was laminated, exposed to ultraviolet light, and developed. Next, it was immersed for 5 minutes in a roughening solution of chromium-sulfuric acid-sodium fluoride (chromic acid 40 g / l, concentrated sulfuric acid 300 ml / l, sodium fluoride 10 g / l) kept at 40 ° C. The exposed adhesive surface was selectively chemically roughened, neutralized, and washed with water. Thereafter, the resultant was put into an electroless plating bath (trade name: CC-41, manufactured by Hitachi Chemical Co., Ltd.) to deposit plated copper having a thickness of 35 μm, and annealed at 160 ° C. for 60 minutes.
架橋したアクリロニトリルブタジエンゴム粒子の量を40部としたほかは、実施例4と同様にした。 に The procedure was the same as in Example 4 except that the amount of the crosslinked acrylonitrile-butadiene rubber particles was changed to 40 parts.
ビスフェノールA型エポキシ樹脂の量を50部、フェノールノボラック樹脂の量を13部としたほかは、実施例4と同様にした。 Example 4 was carried out in the same manner as in Example 4 except that the amount of the bisphenol A type epoxy resin was changed to 50 parts and the amount of the phenol novolak resin was changed to 13 parts.
比較例4
架橋したアクリロニトリルブタジエンゴム粒子を除き、アクリロニトリルブタジエンゴムの量を30部としたほかは、実施例4と同様にした。
Comparative Example 4
Except that the crosslinked acrylonitrile-butadiene rubber particles were excluded, and the amount of the acrylonitrile-butadiene rubber was changed to 30 parts, the same procedure as in Example 4 was carried out.
比較例5
接着剤中の架橋したアクリロニトリルブタジエンゴム粒子を除いたほかは、実施例6と同様にした。
Comparative Example 5
Example 6 was repeated except that the crosslinked acrylonitrile-butadiene rubber particles in the adhesive were removed.
内層回路を形成した厚み0.8mmのガラス織布基材エポキシ樹脂積層板の両面に、めっき触媒入りで厚み0.2mmのエポキシ樹脂プリプレグ(日立化成工業株式会社製、商品名:GEA−168N)を重ね、170℃、3MPaで接着して一体化し、その表面に、実施例4と同じ配合で調製した接着剤をカーテンコート法で塗布した。以下、実施例4と同様にした。 A 0.2 mm thick epoxy resin prepreg containing a plating catalyst (manufactured by Hitachi Chemical Co., Ltd., trade name: GEA-168N) on both sides of a 0.8 mm thick glass woven base epoxy resin laminate having an inner layer circuit formed thereon. Were laminated and bonded together at 170 ° C. and 3 MPa, and an adhesive prepared with the same composition as in Example 4 was applied to the surface by curtain coating. Hereinafter, it carried out similarly to Example 4.
得られた多層プリント配線板について、めっき銅の接着力(単位:kN/m)、85℃−85%RH−100V/75μmの耐電食性(単位:h)、及び耐トラッキング性(単位:V/CTI)を調べた。その結果を表2に示す。 About the obtained multilayer printed wiring board, the adhesive strength of plated copper (unit: kN / m), the electric corrosion resistance (unit: h) of 85 ° C.-85% RH-100 V / 75 μm, and the tracking resistance (unit: V / m) CTI). Table 2 shows the results.
Claims (6)
The method for manufacturing a substrate according to any one of claims 1 to 5, comprising a step of applying an adhesive to the insulating layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003321306A JP2004082737A (en) | 1994-12-26 | 2003-09-12 | Substrate with conductor layer and its manufacturing method |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32200294 | 1994-12-26 | ||
JP2003321306A JP2004082737A (en) | 1994-12-26 | 2003-09-12 | Substrate with conductor layer and its manufacturing method |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20410395A Division JP3775824B2 (en) | 1994-12-26 | 1995-08-10 | Additive adhesive for printed wiring board, adhesive sheet and multilayer printed wiring board |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2004082737A true JP2004082737A (en) | 2004-03-18 |
Family
ID=32071442
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003321306A Pending JP2004082737A (en) | 1994-12-26 | 2003-09-12 | Substrate with conductor layer and its manufacturing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2004082737A (en) |
-
2003
- 2003-09-12 JP JP2003321306A patent/JP2004082737A/en active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100970105B1 (en) | Method of laminating circuit board and method of forming insulation layer, multilayer printed wiring board and production method therefor and adhesion film for multilayer printed wiring board | |
JP4957552B2 (en) | Manufacturing method of prepreg with carrier for printed wiring board, prepreg with carrier for printed wiring board, manufacturing method of thin double-sided board for printed wiring board, thin double-sided board for printed wiring board, and manufacturing method of multilayer printed wiring board | |
EP0893474B1 (en) | Epoxy resin composition and a process for manufacturing a multilayer printed-wiring board using it | |
JP2010168470A (en) | Resin composition | |
JP2004025835A (en) | Resin coated metal foil, metal-clad laminate, printed wiring board using the same, and its manufacturing process | |
JPS63199497A (en) | Multilayer printed interconnection board | |
JP4556260B2 (en) | Additive insulation film for printed wiring boards | |
JP4300870B2 (en) | Method for manufacturing printed wiring board | |
JP2011021101A (en) | Resin composition | |
JP2004137478A (en) | Adhesive | |
JP3775824B2 (en) | Additive adhesive for printed wiring board, adhesive sheet and multilayer printed wiring board | |
JP2001102758A (en) | Printed wiring board, insulation resin sheet used therefor and manufacturing method of insulation resin sheet | |
JP2004082737A (en) | Substrate with conductor layer and its manufacturing method | |
JP4556261B2 (en) | Additive adhesive for printed wiring boards | |
JP2004027240A (en) | Adhesive for insulation | |
JP3975984B2 (en) | Insulating substrate in adhesive state with copper | |
JP3697726B2 (en) | Manufacturing method of multilayer wiring board | |
JPH1022639A (en) | Manufacture of plastic flow sheet for multilayer printed wiring board and manufacture of multilayer wiring board using the sheet | |
JP3536937B2 (en) | Additive method adhesive for printed wiring board and method for manufacturing wiring board using the adhesive | |
JP3517996B2 (en) | Additive adhesive for printed circuit boards | |
JP3685507B2 (en) | Manufacturing method of multilayer printed wiring board | |
JP3329915B2 (en) | Adhesive for printed wiring board and method for manufacturing printed wiring board using this adhesive | |
JP2001040069A (en) | Epoxy resin composition, prepreg, metal foil with resin, adhesive sheet, laminate and multi-layer board | |
JP2911778B2 (en) | Manufacturing method of multilayer printed wiring board | |
JP3329917B2 (en) | Adhesive for printed wiring board and method for manufacturing printed wiring board using this adhesive |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20060523 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20060724 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20061003 |