JP2004063520A5 - - Google Patents

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Publication number
JP2004063520A5
JP2004063520A5 JP2002216009A JP2002216009A JP2004063520A5 JP 2004063520 A5 JP2004063520 A5 JP 2004063520A5 JP 2002216009 A JP2002216009 A JP 2002216009A JP 2002216009 A JP2002216009 A JP 2002216009A JP 2004063520 A5 JP2004063520 A5 JP 2004063520A5
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JP
Japan
Prior art keywords
wafer
processed
dry cleaning
cleaning apparatus
container
Prior art date
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Granted
Application number
JP2002216009A
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English (en)
Japanese (ja)
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JP3991805B2 (ja
JP2004063520A (ja
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Application filed filed Critical
Priority to JP2002216009A priority Critical patent/JP3991805B2/ja
Priority claimed from JP2002216009A external-priority patent/JP3991805B2/ja
Publication of JP2004063520A publication Critical patent/JP2004063520A/ja
Publication of JP2004063520A5 publication Critical patent/JP2004063520A5/ja
Application granted granted Critical
Publication of JP3991805B2 publication Critical patent/JP3991805B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2002216009A 2002-07-25 2002-07-25 ドライ洗浄装置及びドライ洗浄方法 Expired - Fee Related JP3991805B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002216009A JP3991805B2 (ja) 2002-07-25 2002-07-25 ドライ洗浄装置及びドライ洗浄方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002216009A JP3991805B2 (ja) 2002-07-25 2002-07-25 ドライ洗浄装置及びドライ洗浄方法

Publications (3)

Publication Number Publication Date
JP2004063520A JP2004063520A (ja) 2004-02-26
JP2004063520A5 true JP2004063520A5 (https=) 2005-09-02
JP3991805B2 JP3991805B2 (ja) 2007-10-17

Family

ID=31937882

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002216009A Expired - Fee Related JP3991805B2 (ja) 2002-07-25 2002-07-25 ドライ洗浄装置及びドライ洗浄方法

Country Status (1)

Country Link
JP (1) JP3991805B2 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101971298A (zh) * 2007-11-02 2011-02-09 佳能安内华股份有限公司 表面处理设备和表面处理方法

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