JP2004061491A5 - - Google Patents

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Publication number
JP2004061491A5
JP2004061491A5 JP2003090441A JP2003090441A JP2004061491A5 JP 2004061491 A5 JP2004061491 A5 JP 2004061491A5 JP 2003090441 A JP2003090441 A JP 2003090441A JP 2003090441 A JP2003090441 A JP 2003090441A JP 2004061491 A5 JP2004061491 A5 JP 2004061491A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003090441A
Other languages
Japanese (ja)
Other versions
JP4133509B2 (ja
JP2004061491A (ja
Filing date
Publication date
Priority claimed from KR10-2002-0044716A external-priority patent/KR100516828B1/ko
Application filed filed Critical
Publication of JP2004061491A publication Critical patent/JP2004061491A/ja
Publication of JP2004061491A5 publication Critical patent/JP2004061491A5/ja
Application granted granted Critical
Publication of JP4133509B2 publication Critical patent/JP4133509B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2003090441A 2002-07-29 2003-03-28 光学的検査の誤った検出防止方法及びシステム Expired - Fee Related JP4133509B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR10-2002-0044716A KR100516828B1 (ko) 2002-07-29 2002-07-29 광학적 검사의 과검출 방지 방법 및 이를 수행하기 위한 시스템

Publications (3)

Publication Number Publication Date
JP2004061491A JP2004061491A (ja) 2004-02-26
JP2004061491A5 true JP2004061491A5 (de) 2005-12-22
JP4133509B2 JP4133509B2 (ja) 2008-08-13

Family

ID=30439406

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003090441A Expired - Fee Related JP4133509B2 (ja) 2002-07-29 2003-03-28 光学的検査の誤った検出防止方法及びシステム

Country Status (3)

Country Link
JP (1) JP4133509B2 (de)
KR (1) KR100516828B1 (de)
CN (1) CN100456024C (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102353697B (zh) * 2011-08-31 2015-04-29 上海华虹宏力半导体制造有限公司 在线测评缺陷的方法
CN105865979B (zh) * 2016-03-30 2019-03-12 南京邮电大学 一种测量微液滴电湿效应的装置与方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03160450A (ja) * 1989-11-17 1991-07-10 Fujitsu Ltd マスクの欠陥検査方法
JPH04198742A (ja) * 1990-11-28 1992-07-20 Matsushita Electric Ind Co Ltd 配線パターン検査装置
US5563702A (en) * 1991-08-22 1996-10-08 Kla Instruments Corporation Automated photomask inspection apparatus and method
JP3189500B2 (ja) * 1993-06-25 2001-07-16 松下電器産業株式会社 電子部品の外観検査装置および外観検査方法
JP3812020B2 (ja) * 1996-11-27 2006-08-23 松下電器産業株式会社 電子部品観察装置及び電子部品観察方法
JPH10221041A (ja) * 1997-02-10 1998-08-21 Toppan Printing Co Ltd 欠陥検査方法
WO1998058241A1 (fr) * 1997-06-17 1998-12-23 Yuki Engineering System, Ltd Dispositif de controle de conditionnement feuille
US6282309B1 (en) * 1998-05-29 2001-08-28 Kla-Tencor Corporation Enhanced sensitivity automated photomask inspection system
JP3678007B2 (ja) * 1998-07-10 2005-08-03 松下電器産業株式会社 電子部品実装装置における電子部品認識装置および電子部品認識方法
JP2001208693A (ja) * 2000-01-26 2001-08-03 Dainippon Printing Co Ltd 板状ワークの検査方法及び装置

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