JP2004055843A - 薄膜トランジスタ又は半導体装置及びそれらの設計方法 - Google Patents

薄膜トランジスタ又は半導体装置及びそれらの設計方法 Download PDF

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JP2004055843A
JP2004055843A JP2002211602A JP2002211602A JP2004055843A JP 2004055843 A JP2004055843 A JP 2004055843A JP 2002211602 A JP2002211602 A JP 2002211602A JP 2002211602 A JP2002211602 A JP 2002211602A JP 2004055843 A JP2004055843 A JP 2004055843A
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area
channel formation
gate electrode
region
formation region
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JP2004055843A5 (enExample
Inventor
Masahiko Hayakawa
早川　昌彦
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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  • Thin Film Transistor (AREA)
JP2002211602A 2002-07-19 2002-07-19 薄膜トランジスタ又は半導体装置及びそれらの設計方法 Withdrawn JP2004055843A (ja)

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JP2002211602A JP2004055843A (ja) 2002-07-19 2002-07-19 薄膜トランジスタ又は半導体装置及びそれらの設計方法

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JP2002211602A JP2004055843A (ja) 2002-07-19 2002-07-19 薄膜トランジスタ又は半導体装置及びそれらの設計方法

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JP2004055843A5 JP2004055843A5 (enExample) 2005-10-27

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015130511A (ja) * 2009-07-18 2015-07-16 株式会社半導体エネルギー研究所 半導体装置
CN108496277A (zh) * 2016-01-29 2018-09-04 夏普株式会社 扫描天线

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0997909A (ja) * 1995-09-28 1997-04-08 Sharp Corp 液晶表示装置
JPH11186394A (ja) * 1997-12-19 1999-07-09 Matsushita Electric Ind Co Ltd 半導体集積回路の製造方法
JP2000183169A (ja) * 1998-12-10 2000-06-30 Nec Corp 回路設計方法および装置、情報記憶媒体、集積回路装置
JP2001210716A (ja) * 2000-01-25 2001-08-03 Nec Ic Microcomput Syst Ltd レイアウト設計方法
JP2001223275A (ja) * 2000-02-09 2001-08-17 Nec Corp 半導体装置及びその製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0997909A (ja) * 1995-09-28 1997-04-08 Sharp Corp 液晶表示装置
JPH11186394A (ja) * 1997-12-19 1999-07-09 Matsushita Electric Ind Co Ltd 半導体集積回路の製造方法
JP2000183169A (ja) * 1998-12-10 2000-06-30 Nec Corp 回路設計方法および装置、情報記憶媒体、集積回路装置
JP2001210716A (ja) * 2000-01-25 2001-08-03 Nec Ic Microcomput Syst Ltd レイアウト設計方法
JP2001223275A (ja) * 2000-02-09 2001-08-17 Nec Corp 半導体装置及びその製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015130511A (ja) * 2009-07-18 2015-07-16 株式会社半導体エネルギー研究所 半導体装置
CN108496277A (zh) * 2016-01-29 2018-09-04 夏普株式会社 扫描天线

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