JP2004051848A5 - - Google Patents

Download PDF

Info

Publication number
JP2004051848A5
JP2004051848A5 JP2002212992A JP2002212992A JP2004051848A5 JP 2004051848 A5 JP2004051848 A5 JP 2004051848A5 JP 2002212992 A JP2002212992 A JP 2002212992A JP 2002212992 A JP2002212992 A JP 2002212992A JP 2004051848 A5 JP2004051848 A5 JP 2004051848A5
Authority
JP
Japan
Prior art keywords
cage
general formula
rsio
silsesquioxane
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002212992A
Other languages
English (en)
Japanese (ja)
Other versions
JP4033731B2 (ja
JP2004051848A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2002212992A priority Critical patent/JP4033731B2/ja
Priority claimed from JP2002212992A external-priority patent/JP4033731B2/ja
Publication of JP2004051848A publication Critical patent/JP2004051848A/ja
Publication of JP2004051848A5 publication Critical patent/JP2004051848A5/ja
Application granted granted Critical
Publication of JP4033731B2 publication Critical patent/JP4033731B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2002212992A 2002-07-22 2002-07-22 ケイ素化合物の製造法 Expired - Fee Related JP4033731B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002212992A JP4033731B2 (ja) 2002-07-22 2002-07-22 ケイ素化合物の製造法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002212992A JP4033731B2 (ja) 2002-07-22 2002-07-22 ケイ素化合物の製造法

Publications (3)

Publication Number Publication Date
JP2004051848A JP2004051848A (ja) 2004-02-19
JP2004051848A5 true JP2004051848A5 (ru) 2005-10-27
JP4033731B2 JP4033731B2 (ja) 2008-01-16

Family

ID=31935752

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002212992A Expired - Fee Related JP4033731B2 (ja) 2002-07-22 2002-07-22 ケイ素化合物の製造法

Country Status (1)

Country Link
JP (1) JP4033731B2 (ru)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006045516A (ja) * 2004-06-28 2006-02-16 Asahi Kasei Corp 含シルセスキオキサン化合物
CN101151298B (zh) * 2005-03-07 2012-07-11 杂混复合塑料公司 多面体低聚倍半硅氧烷单体组装的方法
US20100081837A1 (en) * 2006-10-05 2010-04-01 Asahi Kasei Chemicals Corporation Process for production of powder of cage silsesquioxane compound
US7619042B2 (en) * 2007-09-07 2009-11-17 Nexolve Corporation Polyimide polymer with oligomeric silsesquioxane
JP5275589B2 (ja) * 2007-08-02 2013-08-28 日本曹達株式会社 シルセスキオキサンを含有する組成物及びシルセスキオキサン含有ヒドロキシアルキルセルロース樹脂組成物
JP5119843B2 (ja) * 2007-10-09 2013-01-16 宇部興産株式会社 カゴ型シルセスキオキサン誘導体の製造方法
WO2009139336A1 (ja) 2008-05-12 2009-11-19 旭化成ケミカルズ株式会社 分子量分布の狭いポリフェニレンエーテル樹脂組成物

Similar Documents

Publication Publication Date Title
US20070178319A1 (en) Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
JP2007520619A5 (ru)
JP2005533341A5 (ru)
JP2006096962A5 (ru)
WO2008045327B1 (en) Silicon polymers, methods of polymerizing silicon compounds, and methods of forming thin films from such silicon polymers
JP2007291061A5 (ru)
JP2004051848A5 (ru)
JP2004051847A5 (ru)
JP2010519375A5 (ru)
JP2007508307A5 (ru)
JP2009504431A5 (ru)
JP2007254671A5 (ru)
JP2005239829A5 (ru)
JP4180417B2 (ja) 多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜、及び半導体装置
JP2014159561A5 (ru)
JP2001233915A5 (ru)
JP2018076394A5 (ru)
JP2007210969A5 (ru)
JP2004002753A5 (ru)
JP2003064306A5 (ru)
JP2008024686A5 (ru)
CN1665861A (zh) 有机聚硅氧烷共聚物及其制备方法
JP4711076B2 (ja) 光安定化基含有かご状シルセスキオキサン及びその製造方法
JP2007092019A (ja) 膜形成用組成物、絶縁膜、およびその製造方法
US7126208B2 (en) Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device