JP2004031461A5 - - Google Patents

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Publication number
JP2004031461A5
JP2004031461A5 JP2002182259A JP2002182259A JP2004031461A5 JP 2004031461 A5 JP2004031461 A5 JP 2004031461A5 JP 2002182259 A JP2002182259 A JP 2002182259A JP 2002182259 A JP2002182259 A JP 2002182259A JP 2004031461 A5 JP2004031461 A5 JP 2004031461A5
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JP
Japan
Prior art keywords
surface treatment
plasma
plasma surface
vacuum vessel
ground potential
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Application number
JP2002182259A
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English (en)
Japanese (ja)
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JP2004031461A (ja
JP4484421B2 (ja
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Priority to JP2002182259A priority Critical patent/JP4484421B2/ja
Priority claimed from JP2002182259A external-priority patent/JP4484421B2/ja
Publication of JP2004031461A publication Critical patent/JP2004031461A/ja
Publication of JP2004031461A5 publication Critical patent/JP2004031461A5/ja
Application granted granted Critical
Publication of JP4484421B2 publication Critical patent/JP4484421B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2002182259A 2002-06-21 2002-06-21 プラズマ表面処理方法及び装置 Expired - Fee Related JP4484421B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002182259A JP4484421B2 (ja) 2002-06-21 2002-06-21 プラズマ表面処理方法及び装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002182259A JP4484421B2 (ja) 2002-06-21 2002-06-21 プラズマ表面処理方法及び装置

Publications (3)

Publication Number Publication Date
JP2004031461A JP2004031461A (ja) 2004-01-29
JP2004031461A5 true JP2004031461A5 (ru) 2005-04-21
JP4484421B2 JP4484421B2 (ja) 2010-06-16

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ID=31178823

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002182259A Expired - Fee Related JP4484421B2 (ja) 2002-06-21 2002-06-21 プラズマ表面処理方法及び装置

Country Status (1)

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JP (1) JP4484421B2 (ru)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20050090904A (ko) * 2004-03-10 2005-09-14 부산대학교 산학협력단 펄스 모듈레이션을 이용한 플라즈마 표면 처리 장치 및 방법
US7396746B2 (en) * 2004-05-24 2008-07-08 Varian Semiconductor Equipment Associates, Inc. Methods for stable and repeatable ion implantation
US8664561B2 (en) * 2009-07-01 2014-03-04 Varian Semiconductor Equipment Associates, Inc. System and method for selectively controlling ion composition of ion sources
CN103928639B (zh) * 2014-04-18 2016-08-24 上海和辉光电有限公司 一种逆构造oled的制备方法

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