JP2004029736A5 - - Google Patents
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- JP2004029736A5 JP2004029736A5 JP2003089974A JP2003089974A JP2004029736A5 JP 2004029736 A5 JP2004029736 A5 JP 2004029736A5 JP 2003089974 A JP2003089974 A JP 2003089974A JP 2003089974 A JP2003089974 A JP 2003089974A JP 2004029736 A5 JP2004029736 A5 JP 2004029736A5
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- JP
- Japan
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003089974A JP2004029736A (en) | 2002-03-29 | 2003-03-28 | Method for determining flatness of substrate for electronic device, production method and method for producing mask blank and mask for transfer |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002093479 | 2002-03-29 | ||
| JP2003089974A JP2004029736A (en) | 2002-03-29 | 2003-03-28 | Method for determining flatness of substrate for electronic device, production method and method for producing mask blank and mask for transfer |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010024275A Division JP4917156B2 (en) | 2002-03-29 | 2010-02-05 | Mask blank manufacturing method and transfer mask manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2004029736A JP2004029736A (en) | 2004-01-29 |
| JP2004029736A5 true JP2004029736A5 (en) | 2006-05-18 |
Family
ID=31189925
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003089974A Pending JP2004029736A (en) | 2002-03-29 | 2003-03-28 | Method for determining flatness of substrate for electronic device, production method and method for producing mask blank and mask for transfer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2004029736A (en) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006251781A (en) * | 2005-02-09 | 2006-09-21 | Asahi Glass Co Ltd | Mask blank |
| JP2008109060A (en) * | 2005-11-10 | 2008-05-08 | Asahi Glass Co Ltd | Method for depositing reflective multilayer film of reflective mask blank for euv lithography and method for producing reflecting mask blank for euv lithography |
| JP2007279214A (en) * | 2006-04-04 | 2007-10-25 | Shin Etsu Chem Co Ltd | Photomask blank and its manufacturing method, and photomask and its manufacturing method |
| JP4958147B2 (en) * | 2006-10-18 | 2012-06-20 | Ｈｏｙａ株式会社 | Reflective mask blank for exposure, reflective mask for exposure, substrate with multilayer reflective film, and method for manufacturing semiconductor device |
| PL2121242T3 (en) * | 2006-12-28 | 2012-07-31 | Saint Gobain Ceramics | Method of grinding a sapphire substrate |
| KR101680866B1 (en) | 2008-11-26 | 2016-11-29 | 호야 가부시키가이샤 | Mask blank substrate |
| CN101957556B (en) * | 2009-07-16 | 2012-05-23 | 中芯国际集成电路制造(上海)有限公司 | Mask picture modification method, mask manufacturing method and optical proximity correction method |
| JP5828226B2 (en) * | 2011-06-01 | 2015-12-02 | 大日本印刷株式会社 | Imprint substrate selection system, imprint substrate selection program, imprint system, imprint substrate selection method, and imprint method |
| JP5953725B2 (en) * | 2011-12-07 | 2016-07-20 | 大日本印刷株式会社 | Imprint substrate selection system, imprint substrate selection program, imprint system, imprint substrate selection method, and imprint method |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02137323A (en) * | 1988-11-18 | 1990-05-25 | Nec Corp | Method for forming low stress thin film |
| JP2882079B2 (en) * | 1991-04-12 | 1999-04-12 | 三菱電機株式会社 | X-ray mask manufacturing method |
| JPH04320320A (en) * | 1991-04-19 | 1992-11-11 | Fujitsu Ltd | Manufacture of mask for x-ray exposure and device used for the same |
| JPH0536590A (en) * | 1991-07-25 | 1993-02-12 | Toshiba Corp | X-ray mask and manufacture of x-ray mask |
| JPH07181669A (en) * | 1993-02-12 | 1995-07-21 | Mitsubishi Electric Corp | Attenuation type phase shift mask and its production |
| JPH06260397A (en) * | 1993-03-08 | 1994-09-16 | Toppan Printing Co Ltd | Mask for x-ray exposure and manufacture thereof |
| JPH10198018A (en) * | 1997-01-13 | 1998-07-31 | Mitsubishi Electric Corp | Attenuation type phase shift mask and its production |
| JP3588223B2 (en) * | 1997-03-24 | 2004-11-10 | 三菱電機株式会社 | X-ray mask manufacturing method |
| JP3037941B2 (en) * | 1997-12-19 | 2000-05-08 | ホーヤ株式会社 | Halftone type phase shift mask and halftone type phase shift mask blank |
| JP2000003844A (en) * | 1998-06-15 | 2000-01-07 | Fujitsu Ltd | Mask for x-ray exposure and manufacture thereof |
| JP2000347386A (en) * | 1999-06-04 | 2000-12-15 | Sony Corp | Method for correcting defect of mask for exposure, mask for exposure, exposure method, semiconductor device and its production |
| JP3627805B2 (en) * | 2001-04-20 | 2005-03-09 | 信越化学工業株式会社 | Glass substrate for photomask and method for producing the same |
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2003
- 2003-03-28 JP JP2003089974A patent/JP2004029736A/en active Pending