JP5828226B2 - Imprint substrate selection system, imprint substrate selection program, imprint system, imprint substrate selection method, and imprint method - Google Patents

Description

  The present invention relates to an imprint substrate selection system, an imprint substrate selection program, an imprint system, an imprint substrate selection method, and an imprint method.

  In recent years, attention has been focused on an imprint method that can form a very fine structure and is a low-cost pattern forming method as a fine processing technique in a manufacturing process of a semiconductor device or the like. In the imprint method, a resin is discretely dropped on a substrate such as a silicon wafer or a glass plate, or is applied by a spin coating method or the like, and a mold is formed on the substrate by forming a fine uneven pattern on the surface of the substrate. This is a pattern forming method in which the concave-convex pattern of the mold is transferred to the resin on the substrate at the same magnification by pressing the resin applied to the resin and curing the resin, and then removing the mold (see Patent Document 1).

US Pat. No. 5,772,905

  Since the substrate used in such an imprint method has at least one surface (transfer surface) polished, the flatness of the transfer surface is good, but the flatness is partially poor. Some areas (including areas having fine irregularities due to the attachment of scratches or foreign matter) exist. For example, when a concavo-convex pattern is transferred to a resin while spreading the resin dropped discretely onto the substrate by pressing the mold, the region having such poor flatness and the concavo-convex pattern of the mold are to be transferred. When the region overlaps, the spread of the resin stagnates in the region with poor flatness, or the pressure applied to the mold becomes non-uniform and the spread of the resin becomes uneven. For this reason, uneven thickness of the resin that presses the mold or incomplete filling of the resin into the concave portion of the mold occurs, and transfer defects such as variations in the height of the transferred concavo-convex pattern occur within the substrate. There is a problem that the throughput of the imprint process is lowered. That is, the flatness of the transfer surface of the substrate can be said to be one of important factors for transferring the concave / convex pattern of the mold with high accuracy in the imprint method.

  On the other hand, in order to transfer the concavo-convex pattern onto the substrate with high accuracy, the entire surface of the transfer surface is not used without using a substrate in which a region with poor flatness exists in a part of the transfer surface. If only a substrate with good flatness is selected and used as a substrate suitable for the imprint process, a substrate that is not used is wasted, resulting in an increase in manufacturing costs of semiconductor devices and the like.

  The present invention has been made in view of the above-described circumstances, and is capable of high-precision transfer processing in an imprint apparatus, even if the substrate has a portion with a poor flatness. Provided are an imprint substrate selection system, an imprint substrate selection method, an imprint substrate selection program, an imprint system using the substrates selected by the imprint substrate selection method, and a method thereof. Objective.

In order to achieve the above object, first, the present invention includes a substrate storage unit that stores a plurality of substrates to be transferred with an uneven shape of an imprint mold by an imprint apparatus, and the substrate storage unit stores the substrate storage unit. and a plurality of control apparatus for selecting a board suitable for transcription in the imprint apparatus from the substrate, wherein the control device, the flatness of the one surface of the substrate accommodated in the substrate storage unit The substrate-related information storage means for storing the flatness information regarding the substrate and the substrate-specific information regarding each substrate stored in the substrate storage unit in association with each other, and the transfer including the region where the uneven shape is formed in the imprint mold a transfer area information storing means for storing information relating to regions, on the basis of the flatness information and the transfer area information, the board that is suitable for transfer of the imprint apparatus Providing a substrate selected system for imprint and having a-option for the substrate selection means (invention 1).

  In the above invention (Invention 1), the flatness information includes information related to a region where the flatness of one surface of the substrate stored in the substrate storage portion is poor, and the control device includes And an overlap determining means for determining whether or not the defective flatness area of the one surface and the transfer area overlap based on the defective flatness area information of the surface and the transfer area information, Preferably, the selection unit selects a substrate that has been determined by the overlap determination unit that the poor flatness region of the one surface and the transfer region do not overlap (Invention 2).

In the said invention (invention 2), the said control apparatus is a rotation related imprint condition regarding whether the transfer in the said imprint apparatus in the state which rotated the said board | substrate and the said transfer area relatively is possible. further comprising an imprint condition information storage means for storing the imprint condition information including information, the overlap determination unit, in a case where it is determined flatness defect region of said one surface and said transfer region and overlaps , When it is determined that transfer in the imprint apparatus in a state in which the substrate and the transfer region are relatively rotated based on the rotation-related imprint condition information is possible . Based on the flatness defect area information and the transfer area information, when the substrate and the transfer area are relatively rotated, the flatness defect area on the one surface and the transfer area are rotated. And the substrate selecting means determines that the flatness defect area of the one surface and the transfer area when the overlap determining means relatively rotates the substrate and the transfer area. It is preferable to select a substrate determined not to overlap with the region (Invention 3).

In the above invention (Invention 2) , the control device includes imprint conditions including movement-related imprint condition information regarding whether or not transfer in the imprint device is possible in a state where the transfer position with respect to the substrate is shifted. further comprising an imprint condition information storage means for storing information, said overlap determination means, wherein in a case where it is determined flatness defect area of one surface and said transfer region and overlaps, the mobile related imprint When it is determined that transfer in the imprint apparatus in a state where the transfer position with respect to the substrate is shifted based on the condition information is based on the flatness defect area information on the one surface and the transfer area information. Whether or not the poor flatness region of the one surface and the transfer region overlap when the transfer region is moved relative to the substrate. Was further determined, the substrate selection means, flatness defect region of said one surface and said transfer region do not overlap when moved relatively the transfer region to the substrate by the overlap determining means It is preferable to select the substrate determined as (Invention 4).

In the above invention (invention 2) , the control device includes imprint condition information including back surface-related imprint condition information regarding whether or not transfer in the imprint device using the other surface side of the substrate is possible. The imprint condition information storage means is further stored, and the flatness defect area information includes other surface-side flatness defect area information relating to an area where the flatness of the other surface of the substrate is defective. is, the overlap judging unit, said in a case where it is determined flatness defect area of one surface and said transfer region and overlap the other side of the substrate on the basis of the back-related imprint condition information when the transfer of the imprint apparatus using is determined to be possible, based on the other side flatness defect area information and the transfer area information, flatness defect territory of the other side And the transfer region is further determined, and the substrate selecting means determines the substrate determined by the overlap determining means that the other flat surface poor flatness region and the transfer region do not overlap. It is preferable to select (Invention 5).

In the above invention (invention 5), the imprint condition information includes rotation-related information relating to whether or not transfer in the imprint apparatus in a state where the substrate and the transfer region are relatively rotated is possible. It contains the imprint condition information, the overlap determination unit, in a case where it is determined with the other side of the flatness defect region and the transfer region and overlap, on the basis of the said rotary connection imprint condition information When it is determined that transfer in the imprint apparatus in a state where the substrate and the transfer region are relatively rotated is possible, based on the other surface-side flatness defect region information and the transfer region information. And further determining whether or not the poor flatness region on the other surface side overlaps with the transfer region when the substrate and the transfer region are relatively rotated, and the substrate selection means Selecting the substrate that is determined not to overlap the flatness defect region on the other surface side and the transfer region when the substrate and the transfer region are relatively rotated by the overlap determining means. Preferred (Invention 6).

In the above inventions (Inventions 5 and 6), the imprint condition information includes movement-related imprint condition information relating to whether or not transfer in the imprint apparatus in a state where the transfer position with respect to the substrate is shifted is possible. include, the overlap judging means is a case where it is determined with the other evenness region and the transfer region of the surface and overlap, the transfer position with respect to the substrate based on the moving-related imprint condition information When it is determined that transfer in the imprint apparatus in a shifted state is possible, based on the flatness defect area information on the other surface and the transfer area information, the transfer area is transferred to the substrate. It is further determined whether or not the poor flatness region of the other surface and the transfer region overlap when moved relative to each other, and the substrate selection unit is configured to detect the overlap. It is preferable to select a substrate that is determined not to overlap the poor flatness region of the other surface and the transfer region when the transfer region is moved relative to the substrate by means (Invention 7). ).

In the above inventions (Inventions 2 to 7), the control device calculates an overlap area calculation for calculating an overlap area between the two areas when the overlap determination unit determines that the flatness defect area and the transfer area overlap. Means, priority information giving means for giving priority information according to the area value calculated by the overlap area calculating means, and one selected based on the priority information given by the priority information giving means. A transfer possibility determination unit that determines whether or not transfer in the imprint apparatus is possible based on the area value, and the substrate selection unit includes the transfer determination unit. It is preferable to select a substrate that is determined to be transferable in the imprint apparatus (Invention 8).

In the said invention (invention 8), it is preferable that the said priority information provision means provides the said priority information based on the minimum value among the area values of each board | substrate calculated by the said overlap area calculation means ( Invention 9).

Secondly, the present invention is an imprint substrate selection program executed in a control device that selects a substrate suitable for transferring an uneven shape of an imprint mold using an imprint device, the control device Is a transfer region including substrate-related information storage means for storing flatness failure region information relating to a region where the flatness of one surface of the substrate is poor, and a region in which an uneven shape is formed in the imprint mold Transfer area information storage means for storing information about the flatness defect area information read from the substrate related information storage means and the transfer area information read from the transfer area information storage means. Based on a first overlap determination step of determining whether or not the poor flatness region of the one surface and the transfer region overlap, and the flatness of the one surface The substrate determined not to overlap good region and the transfer region, characterized in a first substrate selecting step of selecting a substrate that is suitable for transfer of the imprint apparatus be executed on the controller in A printed circuit board selection program is provided (invention 10).

In the said invention (invention 10), the said control apparatus is a rotation related imprint condition regarding whether the transfer in the said imprint apparatus in the state which rotated the said board | substrate and the said transfer area relatively is possible. further comprising an imprint condition information storage means for storing the imprint condition information including information, in the case where the first overlap determination flatness defect region of said one surface in step and said transfer region is determined to overlap there are, can transfer in the imprint apparatus while being relatively rotating the substrate and the transfer region on the basis of the imprint condition information said rotation associated imprint condition information read out from the storage means If it is determined that, based on the substrate related information flatness defect area information is read from the storage means and the transfer area information A second overlap determination step of determining whether the flatness defect region of said one surface and said transfer regions overlap when rotated relative to said substrate and said transfer region, the second The imprint apparatus determines a substrate that has been determined that the flatness defect region on the one surface and the transfer region do not overlap when the substrate and the transfer region are relatively rotated by the overlap determination step. It is preferable to cause the control device to execute a second substrate selection step of selecting a substrate suitable for transfer in (Invention 11).

In the above invention (Invention 10 ) , the control device includes imprint condition information relating to whether or not transfer in the imprint device in a state where the transfer position with respect to the substrate is shifted is possible. further comprising an imprint condition information storage means for storing condition information, even when the flatness defect region of said one surface and said transfer region is determined to overlap by said first overlap determination step, the When it is determined that transfer in the imprint apparatus in a state where the transfer position with respect to the substrate is shifted based on the movement-related imprint condition information read from the imprint condition information storage unit is possible , Based on the post-movement flatness defect area information and the transfer area information read from the substrate related information storage means, A third overlap determination step of determining whether the flatness defect region of said one surface and said transfer regions overlap when the serial transfer area is moved relative to the substrate, the third The imprint determination step determines a substrate that is determined not to overlap the poor flatness region of the one surface and the transfer region when the transfer region is moved relative to the substrate. It is preferable to cause the control device to execute a third substrate selection step for selecting a substrate suitable for transfer in the apparatus (Invention 12).

In the above invention (Invention 10 ) , the control device includes imprint conditions including back surface-related imprint condition information regarding whether or not transfer in the imprint device using the other surface side of the substrate is possible. And further includes imprint condition information storage means for storing information, and the flatness defect area information includes other surface-side flatness defect area information related to an area where the flatness of the other surface side of the substrate is defective. The back surface read from the imprint condition information storage unit when it is determined in the first overlap determination step that the flatness defect region of the one surface and the transfer region overlap. When it is determined that transfer in the imprint apparatus using the other surface side of the substrate is possible based on related imprint condition information , the substrate related information storage means And determining whether or not the other surface-side flatness defect area and the transfer area overlap based on the other surface-side flatness defect area information and the transfer area information read from The substrate determined by the overlap determination step and the fourth overlap determination step that the flatness defect region on the other surface side and the transfer region do not overlap is determined as a substrate suitable for transfer in the imprint apparatus. It is preferable to cause the control device to execute a fourth substrate selection step to be selected (Invention 13).

In the above invention (Invention 13), the imprint condition information includes rotation-related information relating to whether or not transfer in the imprint apparatus in a state where the substrate and the transfer area are relatively rotated. contains the imprint condition information, in a case where the transfer region and the other side of the flatness defect area is determined to overlap by said fourth overlap determination step, read from the imprint condition information storage unit When it is determined that transfer in the imprint apparatus in a state in which the substrate and the transfer region are relatively rotated based on the rotation-related imprint condition information that is issued, the substrate-related Based on the other surface-side flatness defect area information and the transfer area information read from the information storage means, the substrate and the transfer area are relatively rotated. The other side of the flatness defect region and the transfer region and the 5 determines whether overlaps the overlap determination step, by the fifth overlap determination step, the substrate and the transfer area when allowed Is selected as a substrate suitable for transfer in the imprint apparatus. The fifth substrate is a substrate that is determined to be non-overlapping with the flatness defect region on the other surface and the transfer region. It is preferable to cause the control device to execute the substrate selection step (Invention 14).

In the above invention (Invention 13 ) , the imprint condition information includes movement-related imprint condition information relating to whether or not transfer in the imprint apparatus in a state where the transfer position with respect to the substrate is shifted is possible. The movement read out from the imprint condition information storage means is included in the case where it is determined in the fourth overlap determination step that the flatness defect area on the other surface side and the transfer area overlap. When it is determined that the transfer in the previous imprint apparatus in a state where the transfer position with respect to the substrate is shifted based on the related imprint condition information , the other read out from the substrate related information storage means When the transfer area is moved relative to the substrate based on the surface-side flatness defect area information and the transfer area information, A sixth overlap determination step for determining whether or not the flatness defect region on the other surface side overlaps with the transfer region, and the transfer region relative to the substrate by the sixth overlap determination step. A sixth substrate selection step of selecting a substrate that is determined not to overlap the flatness defect region on the other surface and the transfer region when moved to the position as a substrate suitable for transfer in the imprint apparatus It is preferable to perform the door to the control device (invention 15).

In the above inventions (Inventions 10 to 15), when it is determined that the poor flatness region and the transfer region overlap, an overlap area calculation step of calculating an overlap area of both regions and the overlap area calculation step A priority information providing step for assigning priority information based on the area value thus determined, and the one substrate selected based on the priority information given by the priority information providing step based on the area value. A transfer possibility determination step for determining whether or not transfer in the imprint apparatus is possible, and a substrate that is determined to be transferable in the imprint apparatus in the transfer possibility step as the imprint. It is preferable to cause the control device to execute a seventh substrate selection step for selecting a substrate suitable for transfer in the apparatus. Invention 16).

In the said invention (invention 16), it is preferable to give the said priority information in the said priority information provision step based on the minimum value among the area values of each board | substrate calculated by the said overlap area calculation step ( Invention 17).

  Thirdly, the present invention provides a recording medium storing an imprint substrate selection program according to the above inventions (Inventions 10 to 17) (Invention 18).

  Fourthly, the present invention transfers the concavo-convex shape of the imprint mold to the substrate selected by the imprint substrate selection system according to the inventions (Inventions 1 to 9) and the imprint substrate selection system. The imprinting device, and the control device further includes a transferable region setting means for setting a transferable region in the imprinting device based on the flatness information and the transfer region information. The printing apparatus is provided with an imprint system controlled by the control device such that the uneven shape of the imprint mold is transferred to the transferable area set by the transferable area setting unit. (Invention 19)

  Fifth, the present invention is a method for selecting a substrate suitable for transferring the concavo-convex shape of an imprint mold using an imprint apparatus, wherein the flatness of one surface of the substrate is poor. In the first overlap determination step for determining whether or not the transfer region including the region where the uneven shape is formed in the imprint mold, and the first overlap determination step, An imprint substrate selection method comprising: a substrate selection step of selecting a substrate determined not to overlap the poor flatness region and the transfer region (Invention 20).

  In the above invention (Invention 20), in the first overlap determination step, it is determined that the flatness defect region of the one surface and the transfer region overlap, and the substrate and the transfer region are relatively When transfer in the imprint apparatus in a rotated state is possible, when the substrate and the transfer region are relatively rotated, the flatness defect region on the one surface and the transfer region are A second overlap determination step for determining whether or not they overlap, and in the substrate selection step, the first overlap determination step is performed when the substrate and the transfer region are relatively rotated by the second overlap determination step. It is preferable to select a substrate that is determined not to overlap the poor flatness area of the surface and the transfer area (Invention 21).

In the above invention (Invention 20 ) , in the first overlap determination step, it is determined that the flatness defect region of the one surface and the transfer region overlap, and the transfer position with respect to the substrate is shifted. If the imprint apparatus is capable of transferring, whether or not the poorly flat area on the one surface and the transfer area overlap when the transfer area is moved relative to the substrate A third overlap determination step for determining the flatness of the one surface when the transfer region is moved relative to the substrate in the third overlap determination step in the substrate selection step. It is preferable to select a substrate that is determined not to overlap the defective region and the transfer region (Invention 22).

In the above invention (Invention 20 ) , in the first overlap determining step, it is determined that the flatness defect region of the one surface and the transfer region overlap, and the other surface side of the substrate is used. A fourth overlap determination step for determining whether or not the transfer region overlaps with the flatness defect region on the other surface side of the substrate when transfer in the imprint apparatus is possible; In the selection step, it is preferable to select a substrate that has been determined in the fourth overlap determination step that the flatness defect region on the other surface side of the substrate and the transfer region do not overlap (invention 23).

  In the above invention (Invention 23), in the fourth overlap determination step, it is determined that the flatness defect region on the other surface side of the substrate and the transfer region overlap, and the substrate and the transfer region are When transfer in the imprint apparatus in a relatively rotated state is possible, when the substrate and the transfer region are relatively rotated, the flatness failure region on the other surface side and the A fifth overlap determination step for determining whether or not the transfer region overlaps, and in the substrate selection step, when the substrate and the transfer region are relatively rotated by the fifth overlap determination step; In addition, it is preferable to select a substrate that is determined not to overlap the other flat surface poor flatness region and the transfer region (Invention 24).

In the above invention (Invention 23) , in the fourth overlap determination step, it is determined that the flatness defect region on the other surface side of the substrate and the transfer region overlap, and the transfer position with respect to the substrate is shifted. When the transfer in the imprint apparatus in a state of being possible is possible, when the transfer area is moved relative to the substrate, the poor flatness area on the other surface side and the transfer area A sixth overlap determination step for determining whether or not they overlap, and in the substrate selection step, when the transfer region is moved relative to the substrate in the sixth overlap determination step, the other It is preferable to select a substrate that is determined not to overlap the flatness defect region on the surface side and the transfer region (Invention 25).

In the above inventions (Inventions 20 to 25), when it is determined that the poor flatness region and the transfer region overlap, an overlapping area calculating step of calculating an overlapping area of both regions and the overlapping area calculating step Based on the area value, the priority order assigning step for assigning a priority order based on the calculated area value, and the one substrate selected based on the priority order given by the priority order assigning step , A transfer possibility determination step for determining whether transfer in the imprint apparatus is possible. In the substrate selection step, it is determined that transfer in the imprint apparatus is possible in the transfer possibility determination step. It is preferable to select a substrate (Invention 26).

In the above invention (Invention 26), it is preferable that in the priority order assigning step, the priority order is given based on a minimum value among the area values of the respective substrates calculated in the overlap area calculating step (Invention 27). ).

  Sixth, the present invention relates to a step of setting a transferable area in the imprint apparatus for the substrate selected by the imprint substrate selection method according to the above inventions (inventions 20 to 27), and the imprint apparatus. And a step of transferring the uneven shape of the imprint mold to the transferable region (Invention 28).

  According to the present invention, imprint substrate selection that enables high-precision transfer processing in an imprint apparatus and that can effectively utilize the substrate even if the substrate has a region with poor flatness in part. A system, an imprint substrate selection method, an imprint substrate selection program, an imprint system using the substrates selected by them, and a method thereof can be provided.

It is a schematic structure figure showing an imprint system concerning one embodiment of the present invention. It is the schematic which shows the internal structure of the control apparatus in one Embodiment of this invention. It is the schematic which shows the database structure of the board | substrate database in one Embodiment of this invention. It is the schematic which shows an example of the flatness defect area | region of the board | substrate in one Embodiment of this invention. It is the schematic which shows the database structure of the mold database in one Embodiment of this invention. It is the schematic which shows an example of the uneven | corrugated pattern formation area and transfer area | region of the mold for imprint in one Embodiment of this invention. It is the schematic which shows the database structure of the to-be-transferred substrate database in one Embodiment of this invention. It is the schematic which shows the data structure of the to-be-transferred candidate board | substrate database in one Embodiment of this invention. It is a flowchart which shows the imprint condition data generation process in one Embodiment of this invention. 10 is a sub-flowchart illustrating a movement-related imprint condition data generation process in the imprint condition data generation process shown in FIG. 9. 10 is a sub-flowchart showing a rotation-related imprint condition data generation process in the imprint condition data generation process shown in FIG. 9. 10 is a sub-flowchart illustrating a back surface related imprint condition data generation process in the imprint condition data generation process illustrated in FIG. 9. It is a flowchart (the 1) which shows the board | substrate selection process for imprint in one Embodiment of this invention. It is a flowchart (the 2) which shows the board | substrate selection process for imprint in one Embodiment of this invention. It is a flowchart (the 3) which shows the board | substrate selection process for imprint in one Embodiment of this invention. It is a flowchart (the 4) which shows the board | substrate selection process for imprint in one Embodiment of this invention. It is a flowchart (the 5) which shows the board | substrate selection process for imprint in one Embodiment of this invention. It is a flowchart (the 6) which shows the board | substrate selection process for imprint in one Embodiment of this invention. It is a flowchart (the 7) which shows the board | substrate selection process for imprint in one Embodiment of this invention. It is a flowchart (the 8) which shows the board | substrate selection process for imprint in one Embodiment of this invention. It is a flowchart (the 9) which shows the board | substrate selection process for imprint in one Embodiment of this invention. 6 is a flowchart illustrating an imprint process using a batch transfer method according to an embodiment of the present invention.

Hereinafter, embodiments of the present invention will be described with reference to the drawings.
<Apparatus configuration of imprint system>
As shown in FIG. 1, an imprint system 1 according to the present embodiment uses a substrate storage unit 2 that stores a plurality of substrates, and a predetermined imprint mold for the substrates stored in the substrate storage unit 2. An imprint apparatus 3 that can perform one imprint process, a substrate transport apparatus 4 that transports a substrate stored in the substrate storage section 2 to the imprint apparatus 3, and a plurality of sheets stored in the substrate storage section 2 A substrate suitable for imprint processing in the imprint apparatus 3 is selected from the substrates, the substrate transport apparatus 4 is controlled to transport the board to the imprint apparatus 3, and imprint processing in the imprint apparatus 3 is performed. And a control device 5 for controlling.

  The substrate storage unit 2 may be anything that can store at least each substrate in an identifiable manner, and includes a stocker that can store substrates in multiple stages, a substrate case that is assigned a management number, and the like. The substrate stored in the substrate storage unit 2 is not particularly limited as long as it can be used for imprint processing. Examples thereof include a silicon substrate, a quartz substrate, a glass substrate, and an SOI substrate. Further, a substrate on which notches, orientation flats and the like are formed may be used, or a substrate on which they are not formed, or both surfaces (front surface and back surface) of the substrate may be polished. In addition, although both surfaces of the substrate are polished, surface treatment may be performed only on one surface (front surface), and the resin coating characteristics on the other surface (back surface) may be poor. Further, only one surface (surface) may be polished.

  Examples of the imprint apparatus 3 can include a stage having at least a stage on which a substrate is placed and a holding unit for pressing against the substrate on the stage while holding the imprint mold. It may have a mechanism that can rotate the holding part or move it in the XY directions, or may not have the mechanism.

  Examples of the substrate transport device 4 include those having a transport mechanism that holds the substrate stored in the substrate storage unit 2 and transports the substrate to the imprint device 3, with the held substrate being upside down. It may have a mechanism that can be transported to the imprint apparatus 3, a mechanism that can rotate the held substrate and transport it to the imprint apparatus 3, or may not have those mechanisms.

  As shown in FIG. 2, the control device 5 includes a CPU 51, a main storage unit 52 that stores various programs, an auxiliary storage unit 53 that temporarily stores data generated by the CPU 51, and the substrate transfer device 4. And a communication unit 54 for transmitting and receiving data to and from the imprint apparatus 3, a substrate database 55 for storing data relating to the substrates stored in the substrate storage unit 2, and an imprint process in the imprint apparatus 3 Mold database 56 for storing data related to the imprint mold used in the process, a transferred substrate database 57 for storing data related to the substrate selected as the transferred substrate by the imprint substrate selection process, and an imprint substrate selection process In this case, the substrate flatness defect area overlaps the imprint mold transfer area. Transfer candidate substrate database 58 for storing data in which priority is given to the substrate determined to be present, and each device (substrate storage unit 2, imprint device 3, substrate transport device 4) constituting imprint system 1 ) And an imprint system database 59 for storing data relating to imprint processing conditions based on the functions and the like.

The CPU 51 stores various data stored in the substrate database 55, the mold database 56, the transferred substrate database 57, the transferred candidate substrate database 58, the imprint system database 59, various data stored in the auxiliary storage unit 53, and the like. In accordance with instructions of various programs read out and stored in the main storage unit 52, various arithmetic processes and the like are performed.
In the main storage unit 52, an imprint substrate selection program for selecting one substrate suitable for imprint processing in the imprint apparatus 3 from among a plurality of substrates stored in the substrate storage unit 2, a substrate transport device 4, a conveyance control program for controlling the substrate conveyance process 4 and an imprint control program for controlling the imprint process by the imprint apparatus 3 are stored.

  The auxiliary storage unit 53 temporarily stores various data such as input information from the user, imprint condition data generated by the CPU 51 based on the input information from the user, and data acquired from each of the databases 55 to 59. The

The input information from the user stored in the auxiliary storage unit 53 is, for example, information on the number of substrates subjected to imprint processing in the imprint system 1; used for imprint processing in the imprint system 1. Identification information of the imprint mold; information regarding whether or not imprint processing is permitted in a state in which the substrate and the transfer area of the imprint mold are relatively rotated in the imprint system 1; Information on whether imprint processing is permitted with the transfer position on the substrate shifted; Information on whether imprint processing using the back side of the substrate is allowed in the imprint system 1; Information on the transfer position on the substrate (initial transfer position information (for example, When the user desires to transfer to a position shifted from the center of the substrate by a predetermined distance, information input by the user regarding the center of the imprint mold at the desired transfer position, etc.))); Information on the area on the substrate that allows imprint processing; transfer when performing overlap determination processing (see FIGS. 15, 16, 19, and 20) by imprint processing in a state where the transfer position on the substrate is shifted in the substrate selection processing Information on the movement distance (X _pitch , Y _pitch ) of the region in the X direction and the Y direction; even if the transfer region and the flatness poor region overlap, the range of the overlapping area that allows the imprint process Information).

  The imprint condition data generated by the CPU 51 and stored in the auxiliary storage unit 53 includes imprint processing in a state in which the substrate and the transfer area of the imprint mold are relatively rotated in the imprint system 1. Information regarding whether or not printing is possible (rotation-related information including rotation enable information or non-rotatable information), and whether or not imprint processing is possible in a state where the transfer position on the substrate is shifted in the imprint system 1 Information (movement-related information including movable information or immovable information), information on whether imprint processing using the back side of the substrate is possible in the imprint system 1 (back surface usable information or back surface unusable information) Information on the back side including For example, conditions on the apparatus constituting the imprint system 1 (the imprint apparatus 3 has only one imprint mold holding direction with respect to the substrate mounting direction, and the substrate and the uneven pattern forming region are relatively Imprint processing in a rotated state is impossible; the stage for mounting the substrate and the imprint mold holder in the imprint apparatus 3 cannot be moved in the X and Y directions, and the uneven pattern with respect to the substrate Imprint processing in a state where the formation area is shifted is impossible; it is impossible to transport the substrate to the imprint device 3 with the substrate transport device 4 facing upside down; A substrate on which the imprint pattern is transferred) Depending on the conditions on the use of such, imprint condition data may be generated.

  As shown in FIG. 3, in the substrate database 55, the identification information of each substrate stored in the substrate storage unit 2, the storage location information of each substrate, the flatness information of the surface of the substrate measured in advance, Information unique to each board (board-specific information) is stored in association with each other. Information regarding the total number of substrates stored in the substrate database 55 (substrate number information) is also stored.

  The flatness information on the surface of the substrate stored in the substrate database 55 is coordinate data indicating a region having a poor flatness (a flatness failure region) on the surface of the substrate. The flatness defect area on the surface of the substrate is, for example, a predetermined flatness when the flatness of the surface of the substrate is measured and analyzed using a flatness measuring device (for example, Lambda Ace series, manufactured by Dainippon Screen Co., Ltd.). A rectangular frame surrounding at least a region of degree (for example, 10 nm or more) is set, and two points (point A at the lower left corner of the rectangular frame) located at the opposite corner of the rectangular frame when the center of the surface of the substrate is the origin. And the coordinate data of the upper right corner point B) (see FIG. 4). Note that in this specification, an area having poor flatness refers to an area where the substrate itself has poor flatness, an area where the substrate is finely scratched, an area where fine foreign matter is attached to the substrate, and the like. Shall be included.

  The board-specific information stored in the board database 55 is an imprint process that is set according to the shape of the board (notches, orientation flats, etc. are formed), the area on the board where the resin cannot be uniformly applied, etc. Information on the area on the front surface of the substrate that permits the transfer (the area that is set in a circle or rectangle that does not include notches and orientation flats, the front surface transfer permitted area; see FIG. 4), and the imprint process is performed on the back surface side of the substrate (Information related to the back side including back side usable information or back side unusable information) or the like. For example, if the surface is polished only on the surface of the substrate, even if both surfaces of the substrate are polished, only the surface is subjected to surface treatment, so that the resin coating characteristics on the back surface are not good. If it is, the back side unusable information is stored in the board database 55. In addition, regarding the substrate in which the backside availability information is stored in the substrate database 55, information on the backside flatness defect area (backside flatness information) and information on the backside transfer permission area measured in advance are also stored. .

  As shown in FIG. 5, in the mold database 56, the identification information of the imprint mold used for imprint processing in the imprint apparatus 3 and the area of the uneven pattern (the unevenness formed on each imprint mold) are stored. Information on the pattern formation area) and the transfer area information including the concave / convex pattern formation area are stored in association with each other. In the first embodiment, the uneven pattern forming region is described as being rectangular (square or rectangular), but the present invention is not limited to this.

  The uneven pattern formation area information in the imprint mold is coordinate data indicating the area where the uneven pattern is formed. For example, when the uneven pattern formation area is rectangular, the uneven pattern formation area is the imprint mold. Is expressed as coordinate data of two points (point α ′ at the lower left corner and point β ′ at the upper right corner of the concavo-convex pattern formation region) that are diagonally to the concavo-convex pattern formation region when the center is the origin (FIG. 6). The transfer area information is coordinate data (transfer) indicating an area in which the concave / convex pattern forming area is widened in the X-axis direction and the Y-axis direction with a predetermined margin W when the center of the imprint mold is the origin. (The coordinate data of the lower left corner point α and the upper right corner point β) (see FIG. 6).

  As shown in FIG. 7, in the transferred substrate database 57, the identification information of the substrate selected as the transferred substrate by the imprint substrate selection process, the information regarding the storage location of the substrate, and the imprint processing condition information (for example, , Information relating to the rotation angle of the substrate, information relating to the movement distance of the transfer position relative to the substrate, information relating to the use of the back side of the substrate, and the like.

  As shown in FIG. 8, in the transfer target substrate database 58, the identification information of the substrates determined to have overlapped with the imperfect substrate flatness region and the imprint mold transfer region by the imprint substrate selection process. Information relating to the storage location of the substrate, information relating to the area where the poor flatness region of the substrate and the imprint mold transfer region overlap, and information relating to the priority assigned to the substrate are associated with each other. Stored.

  In the imprint system database 59, the transfer area of the substrate and the imprint mold is stored on the basis of the function of each device (the substrate storage unit 2, the imprint device 3, and the substrate transfer device 4) constituting the imprint system 1. Data relating to whether imprint processing is possible in a relatively rotated state (rotation-related data), data relating to whether imprint processing is possible in a state where the transfer position on the substrate is shifted ( Data related to movement), data related to whether imprint processing using the back side of the substrate is possible (back side related data), data related to a region where the transfer position on the substrate is allowed to be shifted (movement allowable region), etc. Is stored. For example, in the imprint apparatus 3, the imprint processing is impossible in a state where the imprint mold is held in only one direction relative to the substrate mounting direction and the substrate and the concavo-convex pattern forming region are relatively rotated. In the case of the imprint apparatus 3, data indicating that rotation is impossible is stored. In addition, the imprint apparatus 3 can not move the stage for placing the substrate and the imprint mold holder in the XY directions, and the imprint processing is performed in a state where the uneven pattern forming region is shifted with respect to the substrate. If this is impossible, data indicating that the movement is impossible is stored. Further, if it is impossible for the substrate transport device 4 to transport the substrate to the imprint device 3 with the front and back sides reversed, data indicating that the back surface cannot be used is stored. Furthermore, if the substrate storage environment 2 in the substrate storage unit 2 makes it difficult for foreign matter or the like to adhere to the back side of the substrate and imprint processing on the back side of the substrate is impossible, data indicating that the back side cannot be used is stored. . On the other hand, the substrate and the imprint mold transfer area were relatively rotated based on the function of each device (substrate storage unit 2, imprint device 3, substrate transfer device 4) constituting the imprint system 1. If the imprint process can be performed in the state, the data “Rotate” is available. If the imprint process is possible in a state where the transfer position on the substrate is shifted, the data “Moveable” is displayed. When the imprint process using the back side of the substrate is possible, data indicating that “back side is available” is stored in the imprint system database 59. Even when data indicating “movable” is stored, imprint processing in the imprint apparatus 3 is allowed due to a region where the holding unit that holds the imprint mold cannot be moved. When the area that can be used is limited, data related to the area that can allow the imprint process (movement allowable area) is stored.

<Processing in imprint system>
Processing operations in the imprint system 1 having such a configuration will be described. 9 to 12 are flowcharts showing the imprint condition data generation processing, FIGS. 13 to 21 are flowcharts showing the imprint substrate selection processing, and FIG. 22 is selected by the imprint substrate selection processing. It is a flowchart which shows the imprint process by the batch transfer system in the imprint system 1 using a board | substrate.

<Imprint condition data generation processing>
First, in performing imprint processing on a predetermined number (N) of substrates using a predetermined imprint mold, imprint condition setting processing is performed in advance. First, information on imprint conditions allowed by the user, information on transfer positions on the substrate desired by the user (initial transfer position information), information on the number of substrates to be imprinted (N sheets), and imprint The identification information of the imprint mold used for the process is input by the user, and each input information is stored in the auxiliary storage unit 53. The CPU 51 performs processing for generating imprint condition data as described later based on information input by the user and stored in the auxiliary storage unit 53.

  As shown in FIG. 9, first, the CPU 51 performs processing for generating imprint condition data related to movement (S01).

  In such imprint condition data generation processing, as shown in FIG. 10, it is determined whether or not the information related to the imprint condition stored in the auxiliary storage unit 53 includes information indicating “move permission” (S011). . If the information regarding the imprint condition does not include the information “Movement Allowed” (No in S011), the CPU 51 generates imprint condition data including the information “Movement Impossible” and stores it in the auxiliary storage unit 53. (S012).

  When the information regarding the imprint condition includes information indicating “move permission” (S011, Yes), the CPU 51 acquires the movement related data from the imprint system database 59 (S013), and the movement related data is “moveable”. It is determined whether or not the data is included (S014).

  When the movement-related data does not include data indicating “moveable” (S014, No), the CPU 51 generates imprint condition data including information indicating “move not possible” and stores it in the auxiliary storage unit 53 (S012). ). When the movement-related data includes information indicating “Moveable” (S014, Yes), the CPU 51 generates imprint condition data including the information “Moveable” and stores it in the auxiliary storage unit 53 (S015). . After generating imprint condition data related to movement in this way, the process returns to the imprint condition data generation process (FIG. 9).

  Next, as shown in FIG. 9, the CPU 51 performs processing for generating imprint condition data related to rotation (S02).

  In such imprint condition data generation processing, as shown in FIG. 11, the CPU 51 determines whether or not the information related to the imprint condition stored in the auxiliary storage unit 53 includes information “rotation permission”. (S021).

  When the information regarding the imprint condition does not include the information “permitted to rotate” (S021, No), the CPU 51 generates imprint condition data including the information “unrotated” and stores it in the auxiliary storage unit 53. (S022).

  When the information regarding the imprint condition includes information indicating “rotation permission” (S021, Yes), the CPU 51 acquires rotation-related data from the imprint system database 59 (S023), and the rotation-related data is “rotatable”. It is determined whether or not the data is included (S024).

  If the rotation-related data does not include “rotation enabled” data (S024, No), the CPU 51 generates imprint condition data including information “rotation disabled” and stores it in the auxiliary storage unit 53 (S022). ).

  When the rotation-related data includes information indicating that “rotation is possible” (S024, Yes), the CPU 51 determines the uneven pattern from the mold database 56 based on the identification information of the imprint mold stored in the auxiliary storage unit 53. Area information is acquired (S025), and it is determined whether or not the center of the concave / convex pattern forming area is coincident with the center of the imprint mold (S026).

  Specifically, the sum of the X coordinate value of the point α ′ and the X coordinate value of the point β ′ in the concavo-convex pattern forming region, and the Y coordinate value of the point α ′ and the Y coordinate value of the point β ′ in the concavo-convex pattern forming region. CPU 51 determines that the center of the concavo-convex pattern forming region and the center of the imprint mold coincide with each other, and if either or both of the sums are not 0, CPU 51 Determines that the center of the uneven pattern forming region and the center of the imprint mold do not match.

  When it is determined that the center of the uneven pattern forming region and the center of the imprinting mall do not coincide with each other (S026, No), the CPU 51 determines that the imprint condition data stored in the auxiliary storage unit 53 is “movable”. It is determined whether or not information is included (S027).

  When the imprint condition data does not include the information “movable” (S027, No), the CPU 51 generates the imprint condition data including the information “unrotated” and stores it in the auxiliary storage unit 53 ( S022).

  If the imprint condition data includes information “movable” (S027, Yes), the CPU 51 generates imprint condition data including information “rotation enabled” and stores it in the auxiliary storage unit 53 (S029). ).

  When it is determined that the center of the concave / convex pattern forming region matches the center of the imprint mold (S026, Yes), the CPU 51 determines the rotational symmetry number of the concave / convex pattern forming region based on the concave / convex pattern region information. Then, it is determined whether or not the concavo-convex pattern forming region has a 4-fold symmetrical shape (S028).

  When it is determined that the concave / convex pattern formation region has a four-fold symmetry shape (S028, Yes), the CPU 51 generates imprint condition data including information “unrotated” and stores it in the auxiliary storage unit 53 (S022). ).

  If it is determined that the uneven pattern formation region is not a four-fold symmetrical shape (No in S028), the CPU 51 generates imprint condition data including information “rotatable” and stores it in the auxiliary storage unit 53 (S029). ). After generating imprint condition data related to rotation in this way, the process returns to the imprint condition data generation process (FIG. 9).

  Subsequently, as shown in FIG. 9, the CPU 51 performs a process of generating imprint condition data related to the back surface (S03).

  In such imprint condition data generation processing, as shown in FIG. 12, the CPU 51 determines whether or not the information related to the imprint condition stored in the auxiliary storage unit 53 includes information “back side permission”. (S031).

  When the information regarding the imprint condition does not include the information “permit on the back side” (S031, No), the CPU 51 generates imprint condition data including the information “unavailable on the back side” and stores it in the auxiliary storage unit 53. (S032).

  When the information regarding the imprint condition includes information indicating “backside permission” (S031, Yes), the CPU 51 acquires backside related data from the imprint system database 59 (S033), and the backside related data is “backside acceptable”. It is determined whether or not the data is included (S034).

  When the back side related data does not include data indicating “back side is acceptable” (S034, No), the CPU 51 generates imprint condition data including information that “back side is impossible” and stores it in the auxiliary storage unit 53 (S032). ).

  When the back side related data includes information that “back side is acceptable” (S034, Yes), the CPU 51 generates imprint condition data including information that “back side is possible” and stores it in the auxiliary storage unit 53 (S035). . After the imprint condition data related to the back surface is generated in this way, the imprint condition data generation process (FIG. 9) ends.

<Imprint substrate selection process-initial transfer position>
Subsequently, an imprint substrate selection process is performed. As shown in FIG. 13, the CPU 51 acquires the transfer area information stored in the mold database 56 based on the imprint mold identification information stored in the auxiliary storage unit 53 and stores it in the auxiliary storage unit 53. Then, the identification information, storage location information and flatness information of one substrate stored in the substrate database 55 are acquired and stored in the auxiliary storage unit 53 (S102), and stored in the auxiliary storage unit 53. It is determined whether or not the flatness information includes information related to the flatness failure area (S103). Specifically, it is determined whether or not the flatness information includes coordinate data of a flatness failure area.

  When it is determined that the flatness information does not include information regarding the flatness failure area (No in S103), the process proceeds to S111 described later.

  If it is determined that the flatness information includes information related to the poor flatness area (S103, Yes), the overlap determination transfer is performed based on the initial transfer position information and the transfer area information stored in the auxiliary storage unit 53. Area information is generated and stored in the auxiliary storage unit 53. Specifically, based on the position (coordinate data) on the substrate of the mold center included in the initial transfer position information, the X coordinate value and the Y coordinate value of the point α and the point β of the transfer region are set to the center of the substrate. Each coordinate value when the origin is set is calculated, and each calculated coordinate data is stored in the auxiliary storage unit 53 as overlap determination transfer area information.

Next, based on the flatness information and the overlap determination transfer area information stored in the auxiliary storage unit 53, the X coordinate value of the point A of the poor flatness area and the X coordinate value of the point α of the transfer area for overlap determination , The Y coordinate value of the point A in the poor flatness region and the Y coordinate value of the point α in the transfer region for overlap determination, the X coordinate value of the point B in the poor flatness region, and the X of the point β in the transfer region for overlap determination The coordinate value and the Y coordinate value of the point B of the poor flatness region and the Y coordinate value of the point β of the transfer region for overlap determination are respectively compared, and a larger value of the coordinate values of the point A and the point α is respectively determined. X _left and Y _low are defined, and small values of the coordinate values of the point B and the point β are respectively defined as X _right and Y _up (S104).

Subsequently, the CPU 51 compares X _left and X _right , determines whether X _left is smaller than X _right (S105), and determines that X _left is larger than X _right (S105, No). Then, it is determined that the poor flatness region and the transfer region do not overlap, and information on the overlapping area between the poor flatness region and the transfer region (area = 0) and initial transfer position information are stored in the auxiliary storage unit 53 (S106). ).

On the other hand, when it is determined that X _left is smaller than X _right (S105, Yes), the CPU 51 compares Y _low and Y _up to determine whether Y _low is smaller than Y _up (S107).

If it is determined that Y _low is greater than Y _up (S107, No), it is determined that the flatness defect region and the transfer region do not overlap, and information on the overlap area between the flatness defect region and the transfer region (area = 0) and initial transfer position information are stored in the auxiliary storage unit 53 (S106).

On the other hand, if it is determined that Y _low is smaller than Y _up (S107, Yes), the CPU 51 determines that the poor flatness region and the transfer region overlap, and the poor flatness region and the transfer region Calculate the area where the concavo-convex pattern formation area and other areas (area set as tolerance, tolerance area) overlap each other, and the total area where the flatness defect area and tolerance area overlap Then, the sum of the overlapping areas of the defective flatness region and the uneven pattern formation region and the sum of all the calculated area values are calculated and stored in the auxiliary storage unit 53 (S108).

  Specifically, the area where the flatness defect region and the concavo-convex pattern formation region overlap can be calculated as follows.

First, the concavo-convex pattern formation region information is acquired from the imprint mold database 56 based on the imprint mold identification information stored in the auxiliary storage unit 53, and the initial transfer position information stored in the auxiliary storage unit 53. Based on the position (coordinate data) of the center of the mold included in the substrate and the information on the concave / convex pattern formation region, the X coordinate value and the Y coordinate value of the point α ′ and the point β ′ of the concave / convex pattern formation region are determined as the center of the substrate. Each coordinate value (each coordinate value of the area calculation concavo-convex pattern formation region) is calculated and stored in the auxiliary storage unit 53 as area calculation concavo-convex pattern formation region information. Next, the X coordinate value of the point A in the poor flatness region and the X coordinate value of the point α ′ in the unevenness pattern forming region for area calculation, the Y coordinate value of the point A in the poor flatness region and the uneven pattern forming region for area calculation Y coordinate value of the point α ′, the X coordinate value of the point B of the poor flatness region, the X coordinate value of the point β ′ of the area calculation uneven pattern forming region, the Y coordinate value of the point B of the flatness poor region, The Y coordinate values of the point β ′ of the area calculation uneven pattern forming region are respectively compared, and the larger values of the coordinate values of the points A and α ′ are defined as X _left and Y _low , respectively. Small values of the coordinate values of β are defined as X _right and Y _up , respectively. Then, from the defined values of X _left , X _right , Y _low and Y _up , the area where the flatness defect region and the concave / convex pattern formation region overlap is calculated by the following equation.
Area = (X _right −X _left ) × (Y _up −Y _low )

On the other hand, the area where the flatness defect area overlaps with the tolerance area overlaps the flatness defect area and the transfer area using the values of X _left , X _right , Y _low and Y _up defined in S104. Can be calculated by subtracting the area value where the poor flatness area and the concavo-convex pattern formation area overlap from the calculated area value.
Area = (X _right −X _left ) × (Y _up −Y _low )

  Next, the CPU 51 determines whether or not other flatness defect area information that has not been determined whether or not it overlaps with the transfer area is stored in the auxiliary storage unit 53 (S109). When it is determined that the information is stored (S109, Yes), the processing of S104 to S108 is performed again, and when it is determined that the other flatness defect area information is not stored (S109, No). ), All area values stored in the auxiliary storage unit 53 (overlap area between the flatness defect area and the uneven pattern formation area, overlap area between the flatness defect area and the tolerance area, and the area stored in S106 ( = 0)) is calculated, and it is determined whether or not the total area value is 0 (S110).

  When determining that the total area value is 0 (S110, Yes), the CPU 51 associates the substrate identification information, the storage location information, and the initial transfer position information and stores them in the transferred substrate database 57 (S111).

  On the other hand, if it is determined that the total area value is not 0 (S110, No), the CPU 51 determines the substrate identification information, storage location information, initial transfer position information, and each area value stored in the auxiliary storage unit 53. Are stored in the transferred candidate substrate database 58 (S112).

<Imprint substrate selection process-rotation>
After associating various types of information in S112 and storing them in the transfer target substrate database 58, as shown in FIG. 14, the imprint condition data stored in the auxiliary storage unit 53 is acquired, and the imprint condition data is stored in the imprint condition data. Based on this, it is determined whether or not the imprint process can be performed with the substrate and the transfer area relatively rotated (S113).

  If it is determined that rotation is not possible (S113, No), the process proceeds to the next overlap determination process (see FIG. 15). On the other hand, when it is determined that the rotation is possible (S113, Yes), the CPU 51 rotates 90 degrees around the axis about the center of the substrate based on the flatness information stored in the auxiliary storage unit 53. The coordinate data of points A and B in the flatness defect area is calculated and stored in the auxiliary storage unit 53 together with information on the number of times the coordinate data is calculated after the substrate is rotated (S114).

Next, based on the overlap determination transfer area information stored in the auxiliary storage unit 53 and the coordinate data of the flatness defect area after the substrate rotation, the CPU 51 determines the X coordinate value of the point A of the flatness defect area and the overlap. X coordinate value of point α in the transfer area for determination, Y coordinate value of point A in the poor flatness area, Y coordinate value of point α in the transfer area for overlap determination, X coordinate value and overlap of point B in the poor flatness area The X coordinate value of the point β in the determination transfer region, the Y coordinate value of the point B in the poor flatness region, and the Y coordinate value of the point β in the overlap determination transfer region are respectively compared, and the respective coordinates of the point A and the point α Large values of the values are defined as X _left and Y _low , respectively, and small values of the coordinate values of the points B and β are defined as X _right and Y _up , respectively (S115).

The CPU 51 compares X _left and X _right and determines whether X _left is smaller than X _right (S116). When it is determined that X _left is greater than X _right (No in S116), it is determined that the flatness defect area and the transfer area do not overlap, and information on the overlap area between the flatness defect area and the transfer area (area = 0) and information on the rotation angle of the substrate as the imprint processing condition information are stored in the auxiliary storage unit 53 (S117).

On the other hand, when it is determined that X _left is smaller than X _right (S116, Yes), the CPU 51 compares Y _low and Y _up to determine whether Y _low is smaller than Y _up (S118).
If it is determined that Y _low is greater than Y _up (S118, No), it is determined that the poor flatness region and the transfer region do not overlap, and information (area = 0) and information on the rotation angle of the substrate as the imprint processing condition information are stored in the auxiliary storage unit 53 (S117).

On the other hand, if it is determined that Y _low is smaller than Y _up (S118, Yes), the CPU 51 determines that the poor flatness region and the transfer region overlap, and the poor flatness region and the transfer region Calculate the area where the concavo-convex pattern formation region and the tolerance region overlap each other, and add up the area where the flatness failure region and the tolerance region overlap, the area of the flatness failure region and the concavo-convex pattern formation region And the total of all the areas are calculated, and information regarding the calculated areas and rotation angles is stored in the auxiliary storage unit 53 (S119).

  Specifically, the area where the flatness defect region and the concavo-convex pattern formation region overlap can be calculated as follows.

First, based on the area calculation uneven pattern forming region information stored in the auxiliary storage unit 53, the X coordinate value of the point A of the poor flatness region and the X coordinate value of the point α ′ of the area calculating uneven pattern forming region The Y coordinate value of the point A in the poor flatness region and the Y coordinate value of the point α ′ in the unevenness pattern forming region for area calculation, the X coordinate value of the point B in the poor flatness region and the point in the uneven pattern forming region for area calculation The X-coordinate value of β ′, the Y-coordinate value of point B in the poor flatness region, and the Y-coordinate value of point β ′ in the area calculation uneven pattern forming region are respectively compared, and each coordinate value of point A and point α ′ is compared. _Are defined as X _left and Y _low , respectively, and small values of the coordinate values of point B and point β are defined as X _right and Y _up , respectively. Then, from the defined values of X _left , X _right , Y _low and Y _up , the area where the flatness defect region and the concave / convex pattern formation region overlap is calculated by the following equation.
Area = (X _right −X _left ) × (Y _up −Y _low )

On the other hand, the area where the flatness defect area overlaps with the tolerance area overlaps the flatness defect area and the transfer area using the values of X _left , X _right , Y _low and Y _up defined in S115. Can be calculated by subtracting the area value where the poor flatness area and the concavo-convex pattern formation area overlap from the calculated area value.
Area = (X _right −X _left ) × (Y _up −Y _low )

  Next, the CPU 51 determines whether or not other flatness defect area information that has not been determined whether or not it overlaps with the transfer area is stored in the auxiliary storage unit 53 (S120). When it is determined that the information is stored (S120, Yes), the processes of S115 to S119 are performed again, and when it is determined that the other flatness defect area information is not stored (S120, No). ), It is determined whether or not the center of the substrate is coincident with the center of the imprint mold (S121).

  If it is determined that the center of the substrate and the center of the imprint mold do not match (No in S121), the coordinate data in S114 is calculated based on the information on the number of times the coordinate data is calculated after rotation. It is determined whether the calculation process has been performed three times (S123). On the other hand, when it is determined that the center of the substrate and the center of the imprint mold are coincident (S121, Yes), whether the center of the uneven pattern forming region is coincident with the center of the imprint mold or not. Is determined (S122).

  When it is determined that the center of the concave / convex pattern forming region and the center of the imprint mold do not match (No in S122), the coordinate data in S114 is based on the information regarding the number of times of calculation processing of the coordinate data after rotation. It is determined whether or not the calculation process is performed three times (S123).

  When it is determined that the coordinate data calculation process has not been performed three times (S123, No), the processes of S114 to S122 are performed again. On the other hand, when it is determined that the center of the concavo-convex pattern formation region and the center of the imprint mold coincide with each other (S122, Yes), or when it is determined that the coordinate data calculation process has been performed three times (S123, Yes), All area values stored in the auxiliary storage unit 53 (overlap area between the poor flatness region and the uneven pattern formation region, overlap area between the poor flatness region and the tolerance region, and the area stored in S117 (= 0) )) Is calculated, and it is determined whether or not the total area value is 0 (S124).

  If it is determined that the total area value is 0 (S124, Yes), the CPU 51 associates the substrate identification information, the storage location information, the initial transfer position information, and the imprint processing condition information with the substrate to be transferred. Store in the database 57 (S125).

  On the other hand, if it is determined that the total area value is not 0 (S124, No), the CPU 51 identifies the substrate identification information, storage location information, initial transfer position information, and each area stored in the auxiliary storage unit 53. The value and the imprint processing condition information are associated with each other and stored in the transfer target substrate database 58 (S126).

<Imprint substrate selection processing-movement>
After associating various information in S126 and storing them in the transfer target substrate database 58, as shown in FIG. 15, the imprint condition data stored in the auxiliary storage unit 53 is acquired, and the imprint condition data is stored in the imprint condition data. Based on this, it is determined whether or not the imprint process is possible with the transfer position relative to the substrate being shifted (S127).

  When it is determined that the movement is impossible (S127, No), the process proceeds to an overlap determination process (see FIG. 17) related to the use of the back surface described later. On the other hand, if it is determined that the movement is possible (S127, Yes), the CPU 51 acquires information related to the transfer permission area on the surface side of the substrate from the substrate database 55 based on the substrate identification information, and from the imprint system database 59. Data relating to the movement-permitted area is acquired (S128), and an area where the transfer-permitted area and the movement-permitted area overlap is set as a movable area (S129).

  The CPU 51 determines whether or not the transfer area of the imprint mold is positioned within the transfer permission area when the center of the transfer area of the imprint mold is aligned with all positions on the outermost periphery of the movable area. (S130). Specifically, the area constituted by the outermost circumference of the locus of the transfer area when the center of the transfer area of the imprint mold is moved once along the outermost circumference of the movable area is more than the transfer permitted area. If it is larger, it can be determined that at least a part of the transfer area is located outside the transfer permission area. If the area constituted by the outermost periphery of the locus of the transfer area is smaller than the transfer permission area, the transfer area is transferred. It can be determined that it is located within the permitted area.

  When it is determined that at least a part of the imprint mold transfer area is located outside the transfer permission area (No in S130), the movable area set in S129 is set to the diagonal of the imprint mold transfer area. An area narrowed by half the length is set as a movement area (S131), and if it is determined that the transfer area of the imprint mold is located within the transfer permission area (S130, Yes), the setting is made in S129. The set movable area is set as a movement area (S132).

Subsequently, based on the initial transfer position information stored in the auxiliary storage unit 53, the CPU 51 transfers the imprint mold when the substrate and the imprint mold are arranged to face each other at the initial transfer position. Auxiliary lines parallel to the X axis and Y axis passing through the center of the area are drawn into the movement area, and each auxiliary line is based on the information (X _pitch , Y _pitch ) regarding the movement distance stored in the auxiliary storage unit 53. Auxiliary lines that are parallel to the line and separated for each movement distance are drawn, and the coordinates of the intersections of the auxiliary lines and the intersections of the auxiliary lines and the outermost periphery of the moving area are calculated and stored in the auxiliary storage unit 53. (S133).

  Next, the coordinate data (coordinate values of the points α and β) of the overlap determination transfer region when the center of the transfer region of the imprint mold is moved to an arbitrary intersection is calculated, and the auxiliary storage unit 53 is calculated. (S134).

Subsequently, based on the flatness information stored in the auxiliary storage unit 53 and the coordinate data of the overlap determination transfer area after movement, the CPU 51 determines the X coordinate value of the point A of the poor flatness area and the overlap determination transfer area. X-coordinate value of point α, Y-coordinate value of point A in the poor flatness region and Y-coordinate value of point α in the overlap determination transfer region, X-coordinate value of point B in the poor flatness region, and overlap determination transfer region X coordinate value of point β, Y coordinate value of point B in the poor flatness area, and Y coordinate value of point β in the overlap determination transfer area are respectively compared, and among the coordinate values of point A and point α, Large values are defined as X _left and Y _low , respectively, and small values of the coordinate values of point B and point β are defined as X _right and Y _up , respectively (S135).

The CPU 51 compares X _left and X _right and determines whether X _left is smaller than X _right (S136). When it is determined that X _left is larger than X _right (No in S136), it is determined that the flatness defect area and the transfer area do not overlap, and information on the overlap area between the flatness defect area and the transfer area (area = 0) and information on the transfer position with respect to the substrate as the imprint processing condition information (information on the movement distance in the X-axis direction and the Y-axis direction from the initial transfer position) are stored in the auxiliary storage unit 53 (S137).

On the other hand, when it is determined that X _left is smaller than X _right (S136, Yes), the CPU 51 compares Y _low and Y _up to determine whether Y _low is smaller than Y _up (S138). If it is determined that Y _low is greater than Y _up (S138, No), it is determined that the flatness defect area and the transfer area do not overlap, and information on the overlap area between the flatness defect area and the transfer area (area = 0) and information regarding the transfer position with respect to the substrate as the imprint processing condition information are stored in the auxiliary storage unit 53 (S137).

On the other hand, when it is determined that Y _low is smaller than Y _up (S138, Yes), the CPU 51 determines that the poor flatness region and the transfer region overlap, and among the poor flatness region and the transfer region, Calculate the area where the concavo-convex pattern formation region and the tolerance region overlap each other, and add up the area where the flatness failure region and the tolerance region overlap, the area of the flatness failure region and the concavo-convex pattern formation region And the total of all the areas are calculated, and information about the calculated areas and transfer positions is stored in the auxiliary storage unit 53 (S139).

  Specifically, the area where the flatness defect region and the concavo-convex pattern formation region overlap can be calculated as follows.

First, based on the area calculation concavo-convex pattern formation region information stored in the auxiliary storage unit 53, the X coordinate value of the point A of the poor flatness region and the point α ′ of the moved area calculation concavo-convex pattern formation region X-coordinate value, Y-coordinate value of point A in the poor flatness area, Y-coordinate value of point α ′ in the uneven pattern forming area for area calculation after movement, X-coordinate value of point B in the poor flatness area and post-movement The X coordinate value of the point β ′ of the area calculation uneven pattern formation region, the Y coordinate value of the point B of the poor flatness region, and the Y coordinate value of the point β ′ of the area calculation uneven pattern formation region after movement are respectively compared. The large values of the coordinate values of the point A and the point α ′ are defined as X _left and Y _low , respectively, and the small values of the coordinate values of the point B and the point β are defined as X _right and Y _up , respectively. Define. Then, from the defined values of X _left , X _right , Y _low and Y _up , the area where the flatness defect region and the concave / convex pattern formation region overlap is calculated by the following equation.
Area = (X _right −X _left ) × (Y _up −Y _low )

On the other hand, the area where the poor flatness region overlaps with the marginal region overlaps the poor flatness region and the transfer region using the values of X _left , X _right , Y _low and Y _up defined in S135. Can be calculated by subtracting the area value where the poor flatness area and the concavo-convex pattern formation area overlap from the calculated area value.
Area = (X _right −X _left ) × (Y _up −Y _low )

  Next, the CPU 51 determines whether or not other flatness defect area information that has not been determined whether or not it overlaps with the transfer area is stored in the auxiliary storage unit 53 (S140). When it is determined that the information is stored (S140, Yes), the processes of S135 to S139 are performed again, and when it is determined that the other flatness defect area information is not stored (S140, No). ), All the area values stored in the auxiliary storage unit 53 (the overlapping area between the defective flatness region and the uneven pattern forming region, the overlapping area between the defective flatness region and the tolerance region, and the area stored in S137 ( = 0)) is calculated, and it is determined whether or not the total area value is 0 (S141).

  If it is determined that the total area value is 0 (S141, Yes), the CPU 51 associates the substrate identification information, the storage location information, the initial transfer position information, and the imprint processing condition information with the substrate to be transferred. Store in the database 57 (S142).

  On the other hand, when determining that the total area value is not 0 (S141, No), the CPU 51 determines whether another total area value is stored in the auxiliary storage unit 53 (S143), and determines the other total area. When it is determined that the value is not stored (S143, No), the total area value calculated in S141 and the information regarding the transfer position with respect to the substrate as the imprint processing condition information are stored in the auxiliary storage unit 53 (S144). .

  If it is determined that another total area value is stored (S143, Yes), whether the other total area value stored in the auxiliary storage unit 53 is larger than the total area value calculated in S141. Is determined (S145).

  When it is determined that the other total area value is large (S145, Yes), the total area value calculated in S141 and information on the transfer position with respect to the substrate as the imprint processing condition information are stored in the auxiliary storage unit 53. When the information is updated (S146) and it is determined that the other total area value is equal to or less than the total area value calculated in S141 (S145, No), the information stored in the auxiliary storage unit 53 is updated. Instead, the process proceeds to S147 and subsequent steps.

  Thereafter, the CPU 51 determines whether or not the overlap determination processing has been performed at all the intersections (S147), and if it is determined that the overlap determination processing has not been performed at all the intersections (S147, No), the processing of S134 to S146 is performed. Repeat the process.

  On the other hand, if it is determined that the overlap determination process has been performed at all intersections (S147, Yes), the substrate identification information, the storage location information, the initial transfer position information, and the area values stored in the auxiliary storage unit 53 And the imprint processing condition information are stored in the transferred candidate substrate database 58 (S148).

<Imprint substrate selection processing-rotation / movement>
After associating various kinds of information in S148 and storing them in the transfer target substrate database 58, as shown in FIG. Based on the condition data, it is determined whether or not imprint processing is possible in a state where the substrate and the transfer region are relatively rotated (S149).

  When it is determined that rotation is not possible (S149, No), the process proceeds to the next overlap determination process (see FIG. 17). On the other hand, when it is determined that the rotation is possible (S149, Yes), the CPU 51 rotates 90 degrees around the axis about the center of the substrate based on the flatness information stored in the auxiliary storage unit 53. The coordinate data of the point A and the point B in the poor flatness region is calculated, and stored in the auxiliary storage unit 53 together with information on the number of times the coordinate data is calculated after the substrate is rotated (S150).

Next, based on the initial transfer position information stored in the auxiliary storage unit 53, the CPU 51 transfers the imprint mold when the substrate and the imprint mold are arranged to face each other at the initial transfer position. An auxiliary line parallel to each of the X axis and the Y axis passing through the center of the region is drawn, and based on the information (X _pitch , Y _pitch ) related to the movement distance stored in the auxiliary storage unit 53, Further, the auxiliary lines separated for each movement distance are rotated 90 degrees around the axis with the movement area on the substrate (the movement area (see FIG. 15) set in S131 or S132 above) as the axis of the substrate. The coordinates of the intersections of the auxiliary lines and the intersections of the auxiliary lines and the outermost periphery of the moving area are calculated and stored in the auxiliary storage unit 53 (S151).

  Then, the coordinate data (coordinate values of the points α and β) of the overlap determination transfer region when the center of the transfer region of the imprint mold is moved to an arbitrary intersection is calculated and stored in the auxiliary storage unit 53. Store (S152).

Subsequently, the CPU 51 determines the X coordinate of the point A of the poor flatness area based on the coordinate data of the poor flatness area after rotation stored in the auxiliary storage unit 53 and the coordinate data of the transfer determination transfer area after movement. Value and the X coordinate value of the point α of the overlap determination transfer region, the Y coordinate value of the point A of the poor flatness region, the Y coordinate value of the point α of the overlap determination transfer region, and the X coordinate of the point B of the flatness poor transfer region The value A and the X coordinate value of the point β of the overlap determination transfer region, the Y coordinate value of the point B of the poor flatness region, and the Y coordinate value of the point β of the overlap determination transfer region are compared, respectively. _Are defined as X _left and Y _low, and small values of the coordinate values of point B and β are defined as X _right and Y _up , respectively (S153).

The CPU 51 compares X _left and X _right and determines whether X _left is smaller than X _right (S154). If it is determined that X _left is greater than X _right (S154, No), it is determined that the flatness defect region and the transfer region do not overlap, and information on the overlap area between the flatness defect region and the transfer region (area = 0), and information on the rotation angle of the substrate and information on the transfer position with respect to the substrate (information on the movement distance in the X-axis direction and the Y-axis direction from the initial transfer position) as the imprint processing condition information in the auxiliary storage unit 53 Store (S155).

On the other hand, when it is determined that X _left is smaller than X _right (S154, Yes), the CPU 51 compares Y _low and Y _up to determine whether Y _low is smaller than Y _up (S156). If it is determined that Y _low is greater than Y _up (S156, No), it is determined that the flatness defect area and the transfer area do not overlap, and information on the overlap area between the flatness defect area and the transfer area (area = 0), and information on the rotation angle of the substrate as the imprint processing condition information and information on the transfer position with respect to the substrate are stored in the auxiliary storage unit 53 (S155).

On the other hand, if it is determined that Y _low is smaller than Y _up (S156, Yes), the CPU 51 determines that the poor flatness region and the transfer region overlap, and among the poor flatness region and the transfer region, Calculate the area where the concavo-convex pattern formation region and the tolerance region overlap each other, and add up the area where the flatness failure region and the tolerance region overlap, the area of the flatness failure region and the concavo-convex pattern formation region And the information regarding the rotation angle of the substrate as the imprint processing condition information and the information regarding the transfer position with respect to the substrate are stored in the auxiliary storage unit 53 (S157).

  Specifically, the area where the flatness defect region and the concavo-convex pattern formation region overlap can be calculated as follows.

First, based on the area calculation uneven pattern forming region information stored in the auxiliary storage unit 53, coordinate data (coordinate values of the points α ′ and β ′) of the area calculating uneven pattern forming region after movement are calculated. Then, the X coordinate value of the point A in the poor flatness area after rotation, the X coordinate value of the point α ′ in the uneven pattern forming area for area calculation after movement, and the Y coordinate value of the point A in the flatness poor area after rotation And the Y coordinate value of the point α ′ of the area calculation uneven pattern formation region after movement, the X coordinate value of the point B of the flatness defect region after rotation, and the point β ′ of the area calculation uneven pattern formation region after movement. The X coordinate value, the Y coordinate value of the point B in the poor flatness region after rotation, and the Y coordinate value of the point β ′ in the area calculation uneven pattern forming region after movement are compared, respectively. larger value was defined as X _left and Y _low, respectively of the respective coordinate values, the points B and β The smaller value ones of coordinate values respectively defined as _{X. Right} and Y _{Stay up-.} Then, from the defined values of X _left , X _right , Y _low and Y _up , the area where the flatness defect region and the concave / convex pattern formation region overlap is calculated by the following equation.
Area = (X _right −X _left ) × (Y _up −Y _low )

On the other hand, the area where the flatness defect area overlaps with the tolerance area overlaps with the flatness defect area and the transfer area using the values of X _left , X _right , Y _low and Y _up defined in S153. Can be calculated by subtracting the area value where the poor flatness area and the concavo-convex pattern formation area overlap from the calculated area value.
Area = (X _right −X _left ) × (Y _up −Y _low )

  Next, the CPU 51 determines whether or not other flatness defect area information that has not been determined whether or not it overlaps with the transfer area is stored in the auxiliary storage unit 53 (S158). When it is determined that the information is stored (S158, Yes), the processes of S153 to S157 are performed again, and when it is determined that the other flatness defect area information is not stored (S158, No). ), All area values stored in the auxiliary storage unit 53 (overlapping area between the poor flatness region and the concavo-convex pattern forming region, overlapping area between the poor flatness region and the tolerance region, and the area stored in S150 ( = 0)) is calculated, and it is determined whether or not the total area value is 0 (S159).

  If it is determined that the total area value is 0 (S159, Yes), the CPU 51 associates the substrate identification information, the storage location information, the initial transfer position information, and the imprint processing condition information with the transferred substrate. Store in the database 57 (S160).

  On the other hand, when determining that the total area value is not 0 (S159, No), the CPU 51 determines whether another total area value is stored in the auxiliary storage unit 53 (S161), and determines the other total area. If it is determined that the value is not stored (S161, No), the total area value calculated in S159, the information about the rotation angle of the substrate as the imprint processing condition information, and the information about the transfer position with respect to the substrate are auxiliary stored. The data is stored in the unit 53 (S162).

  If it is determined that another total area value is stored (S161, Yes), is the other total area value stored in the auxiliary storage unit 53 larger than the total area value calculated in S159? Is determined (S163).

  When it is determined that the other total area value is large (S163, Yes), the total area value calculated in S159, information on the rotation angle of the substrate as the imprint processing condition information, and information on the transfer position with respect to the substrate, The information stored in the auxiliary storage unit 53 is updated (S164), and when it is determined that the other total area value is less than or equal to the total area value calculated in S159 (S163, No), the information is stored in the auxiliary storage unit 53. The process proceeds to S165 and later, which will be described later, without updating the processed information.

  Thereafter, the CPU 51 determines whether or not the overlap determination processing has been performed at all the intersections (S165), and when it is determined that the overlap determination processing has not been performed at all the intersections (S165, No), the processing of S152 to S164 is performed. Repeat the process.

  On the other hand, when it is determined that the overlap determination process has been performed at all the intersections (S165, Yes), it is determined whether the center of the substrate and the center of the imprint mold coincide with each other (S166).

  If it is determined that the center of the substrate and the center of the imprint mold do not coincide with each other (S166, No), the coordinate data in S150 is determined based on the information regarding the number of times of calculation processing of the coordinate data after rotation. It is determined whether the calculation process has been performed three times (S168). On the other hand, if it is determined that the center of the substrate matches the center of the imprint mold (S166, Yes), whether the center of the concave / convex pattern formation region and the center of the imprint mold match each other. Is determined (S167).

  When it is determined that the center of the concave / convex pattern forming region and the center of the imprint mold do not coincide with each other (S167, No), the coordinate data in S150 is based on the information regarding the number of times of calculation processing of the coordinate data after rotation. It is determined whether or not the calculation process is performed three times (S168).

  If it is determined that the coordinate data calculation process has not been performed three times (S168, No), the processes of S150 to S167 are performed again. On the other hand, when it is determined that the center of the concavo-convex pattern formation region and the center of the imprint mold coincide with each other (S167, Yes), or when it is determined that the coordinate data calculation process has been performed three times (S168, Yes), The CPU 51 associates the substrate identification information, the storage location information, the initial transfer position information, each area value stored in the auxiliary storage unit 53, and the imprint processing condition information in the transfer candidate substrate database 58. Store (S169).

<Imprint substrate selection process-back>
After it is determined in S127 that it is impossible to move, or after various information is associated and stored in the transfer target substrate database 58 in S169, the substrate unique information stored in the substrate database 55 as shown in FIG. And the imprint condition data memorize | stored in the auxiliary memory part 53 are acquired, and it is judged whether the imprint process using the back surface side of a board | substrate is possible (S170).

  If it is determined that the back side cannot be used (S170, No), the process proceeds to the subsequent process (see FIG. 21). On the other hand, when it is determined that the back side can be used (S170, Yes), it is determined whether the flatness information stored in the auxiliary storage unit 53 includes information on the flatness defect area on the back side (S171). When it is determined that the flatness information does not include information on the flatness defect area on the back side (S171, No), the process proceeds to S179 described later.

On the other hand, when it is determined that the flatness information includes information related to the poor flatness area on the back side (S171, Yes), the CPU 51 stores the flatness information and the overlap determination transfer area stored in the auxiliary storage unit 53. Based on the information, the X coordinate value of point A in the flatness defect area on the back side and the X coordinate value of point α in the overlap determination transfer area, the Y coordinate value of point A in the flatness defect area on the back side, and overlap determination Y coordinate value of point α in the transfer area, X coordinate value of point B in the poor flatness area on the back side, and X coordinate value of point β in the transfer area for overlap determination, and point B in the flatness defective area on the back side Are compared with the Y coordinate value of the point β of the overlap determination transfer region, and the larger one of the coordinate values of the point A and the point α is defined as X _left and Y _low , respectively. and small values, respectively _{X. right} and Y _{Stay up-ones} of each coordinate value of the point β To righteousness (S172).

The CPU 51 compares X _left and X _right and determines whether X _left is smaller than X _right (S173). When it is determined that X _left is larger than X _right (No in S173), it is determined that the flatness defect area on the back side and the transfer area do not overlap, and information on the overlapping area between the flatness defect area and the transfer area (Area = 0), initial transfer position information, and information on the use of the back surface as imprint processing condition information are stored in the auxiliary storage unit 53 (S174).

On the other hand, when it is determined that X _left is smaller than X _right (S173, Yes), the CPU 51 compares Y _low and Y _up to determine whether Y _low is smaller than Y _up (S175). If it is determined that Y _low is greater than Y _up (S175, No), it is determined that the flatness defect area on the back side and the transfer area do not overlap, and information on the overlapping area between the flatness defect area and the transfer area (Area = 0), initial transfer position information, and information on the use of the back surface as imprint processing condition information are stored in the auxiliary storage unit 53 (S174).

On the other hand, when it is determined that Y _low is smaller than Y _up (S175, Yes), the CPU 51 determines that the flatness defect area on the back surface side and the transfer area overlap with each other, , Calculating the area where the concavo-convex pattern formation area and the tolerance area of the transfer area overlap each other, and the total of the areas where the flatness defect area and the tolerance area on the back side overlap, The sum of the overlapping areas of the defective flatness area and the uneven pattern forming area and the total of all the calculated areas are calculated, and the calculated area and imprint processing condition information (information on the use of the back surface) are stored in the auxiliary storage unit 53. (S176).

  Specifically, the area where the flatness defect region on the back surface side and the concavo-convex pattern formation region overlap can be calculated as follows.

First, based on the area calculation uneven pattern forming area information stored in the auxiliary storage unit 53, the X coordinate value of the point A of the flatness defect area on the back side and the point α ′ of the area calculating uneven pattern forming area X-coordinate value, Y-coordinate value of point A in the flatness defect area on the back surface side, Y-coordinate value of point α ′ in the unevenness pattern forming area for area calculation, X-coordinate value of point B in the flatness defect area on the back surface side, The X coordinate value of the point β ′ of the area calculation uneven pattern formation region, the Y coordinate value of the point B of the flatness defect region on the back side, and the Y coordinate value of the point β ′ of the area calculation uneven pattern formation region are respectively compared. The large values of the coordinate values of the points A and α ′ are defined as X _left and Y _low , respectively, and the small values of the coordinate values of the points B and β are defined as X _right and Y _up , respectively. Define. Then, from the defined values of X _left , X _right , Y _low and Y _up , the area where the flatness defect region and the concave / convex pattern formation region overlap is calculated by the following equation.
Area = (X _right −X _left ) × (Y _up −Y _low )

On the other hand, the area where the poor flatness area and the tolerance area on the back surface side overlap is determined by using the values of X _left , X _right , Y _low and Y _up defined in S172, and the flatness defective area and the transfer area. Can be calculated by subtracting the area value where the flatness defect region and the concave / convex pattern forming region overlap from the calculated area value.
Area = (X _right −X _left ) × (Y _up −Y _low )

  Next, the CPU 51 determines whether or not other information about the flatness defect area information on the back side that has not been determined whether or not it overlaps the transfer area is stored in the auxiliary storage unit 53 (S177). When it is determined that the defective degree area information is stored (S177, Yes), the processing of S172 to S176 is performed again, and when it is determined that the other flatness defective area information is not stored ( S177, No), all area values stored in the auxiliary storage unit 53 (overlap area between the flatness defect area and the uneven pattern formation area, overlap area between the flatness defect area and the tolerance area, stored in S174 above) The total value of the calculated areas (= 0)) is calculated, and it is determined whether or not the total area value is 0 (S178).

  If it is determined that the total area value is 0 (S178, Yes), the CPU 51 associates the substrate identification information, the storage location information, the initial transfer position information, and the imprint processing condition information with the transferred substrate. Store in the database 57 (S179).

  On the other hand, if it is determined that the total area value is not 0 (S178, No), the CPU 51 determines the substrate identification information, storage location information, initial transfer position information, and each area stored in the auxiliary storage unit 53. The value and the imprint processing condition information are associated with each other and stored in the transfer target substrate database 58 (S180).

<Imprint substrate selection process-back side, rotation>
After the substrate identification information, the storage location information, the respective area values stored in the auxiliary storage unit 53 and the imprint processing condition information are associated with each other and stored in the transfer candidate substrate database 58 in S180, as shown in FIG. As described above, the CPU 51 obtains the substrate specific information stored in the substrate database 55 and the imprint condition data stored in the auxiliary storage unit 53, and imprints in a state where the substrate and the transfer region are relatively rotated. It is determined whether print processing is possible (S181).

  When it is determined that rotation is not possible (S181, No), the process proceeds to the next overlap determination process (see FIG. 19). On the other hand, when it is determined that rotation is possible (S181, Yes), the CPU 51 rotates 90 degrees around the axis about the center of the substrate based on the flatness information stored in the auxiliary storage unit 53. The coordinate data of the points A and B of the flatness defect area on the back surface side is calculated and stored in the auxiliary storage unit 53, and information relating to the number of times of calculation processing of the coordinate data after rotation is also stored (S182). .

Next, based on the overlapping determination transfer area information stored in the auxiliary storage unit 53 and the coordinate data of the flatness defect area on the back surface side after the substrate rotation, the CPU 51 sets the point A of the flatness defect area on the back surface side. The X coordinate value and the X coordinate value of the point α of the overlap determination transfer area, the Y coordinate value of the point A of the flatness failure area on the back surface side, the Y coordinate value of the point α of the overlap determination transfer area, and the flatness of the back surface side X coordinate value of point B in the defective area and X coordinate value of point β in the transfer area for overlap determination, Y coordinate value of point B in the flatness defect area on the back side, and Y coordinate of point β in the transfer area for overlap determination The values are compared with each other, the larger values of the coordinate values of the points A and α are defined as X _left and Y _low , respectively, and the smaller values of the coordinate values of the points B and β are respectively X _right and Y _up is defined (S183).

The CPU 51 compares X _left and X _right and determines whether X _left is smaller than X _right (S184). If it is determined that X _left is greater than X _right (No in S184), it is determined that the flatness defect area on the back side and the transfer area do not overlap, and information on the overlapping area between the flatness defect area and the transfer area (Area = 0), information on the backside use as the imprint processing condition information, and information on the rotation angle of the substrate are stored in the auxiliary storage unit 53 (S185).

On the other hand, when it is determined that X _left is smaller than X _right (S184, Yes), the CPU 51 compares Y _low and Y _up to determine whether Y _low is smaller than Y _up (S186). If it is determined that Y _low is greater than Y _up (S186, No), it is determined that the flatness defect area on the back side and the transfer area do not overlap, and information on the overlapping area between the flatness defect area and the transfer area (Area = 0), information on the backside use as the imprint processing condition information, and information on the rotation angle of the substrate are stored in the auxiliary storage unit 53 (S185).

On the other hand, if it is determined that Y _low is smaller than Y _up (S186, Yes), the CPU 51 determines that the flatness defect area on the back side and the transfer area overlap with each other, , Calculating the area where the concavo-convex pattern formation area and the tolerance area of the transfer area overlap each other, and the total of the areas where the flatness defect area and the tolerance area on the back side overlap, The sum of the overlapping areas of the defective flatness region and the uneven pattern forming region and the total of the calculated total areas are calculated, and each area value, information on the back surface use, and information on the rotation angle are stored in the auxiliary storage unit 53. (S187).

  Specifically, the area where the flatness defect region and the concavo-convex pattern formation region overlap can be calculated as follows.

First, based on the area calculation uneven pattern forming region information stored in the auxiliary storage unit 53, the X coordinate value of the point A of the poor flatness region and the X coordinate value of the point α ′ of the area calculating uneven pattern forming region The Y coordinate value of the point A in the poor flatness region and the Y coordinate value of the point α ′ in the unevenness pattern forming region for area calculation, the X coordinate value of the point B in the poor flatness region and the point in the uneven pattern forming region for area calculation The X-coordinate value of β ′, the Y-coordinate value of point B in the poor flatness region, and the Y-coordinate value of point β ′ in the area calculation uneven pattern forming region are respectively compared, and each coordinate value of point A and point α ′ is compared. _Are defined as X _left and Y _low , respectively, and small values of the coordinate values of point B and point β are defined as X _right and Y _up , respectively. Then, from the defined values of X _left , X _right , Y _low and Y _up , the area where the flatness defect region and the concave / convex pattern formation region overlap is calculated by the following equation.
Area = (X _right −X _left ) × (Y _up −Y _low )

On the other hand, the area where the flatness defect area overlaps with the tolerance area overlaps with the flatness defect area and the transfer area using the values of X _left , X _right , Y _low and Y _up defined in S183. Can be calculated by subtracting the area value where the poor flatness area and the concavo-convex pattern formation area overlap from the calculated area value.
Area = (X _right −X _left ) × (Y _up −Y _low )

  Next, the CPU 51 determines whether or not other flatness defect area information that has not been determined whether or not it overlaps with the transfer area is stored in the auxiliary storage unit 53 (S188). When it is determined that the information is stored (S188, Yes), the processes of S183 to S187 are performed again, and when it is determined that the other flatness defect area information is not stored (S188, No) It is determined whether or not the center of the substrate and the center of the imprint mold coincide with each other (S189).

  If it is determined that the center of the substrate and the center of the imprint mold do not match (No in S189), the coordinate data in S182 is calculated based on the information regarding the number of times of calculation processing of the coordinate data after rotation. It is determined whether the calculation process has been performed three times (S191). On the other hand, if it is determined that the center of the substrate and the center of the imprint mold are coincident (S189, Yes), whether the center of the uneven pattern forming region is coincident with the center of the imprint mold or not. Is determined (S190).

  When it is determined that the center of the concave / convex pattern forming region and the center of the imprint mold do not coincide with each other (S190, No), the coordinate data in S182 is based on the information regarding the number of times of calculation processing of the coordinate data after rotation. It is determined whether or not the calculation process is performed three times (S191).

  When it is determined that the coordinate data calculation process has not been performed three times (S191, No), the processes of S182 to S188 are performed again. On the other hand, when it is determined that the center of the concavo-convex pattern formation region and the center of the imprint mold coincide with each other (S190, Yes), or when it is determined that the coordinate data calculation process has been performed three times (S191, Yes), All area values stored in the auxiliary storage unit 53 (overlap area between the flatness defect area and the uneven pattern formation area, overlap area between the flatness defect area and the tolerance area, and the area stored in S188 (= 0) )) Is calculated, and it is determined whether or not the total area value is 0 (S192).

  If it is determined that the total area value is 0 (S192, Yes), the CPU 51 associates the substrate identification information, the storage location information, the initial transfer position information, and the imprint processing condition information with the transferred substrate. Store in the database 57 (S193).

  On the other hand, if it is determined that the total area value is not 0 (S192, No), the CPU 51 identifies the substrate identification information, storage location information, initial transfer position information, and each area stored in the auxiliary storage unit 53. The value and the imprint processing condition information are associated with each other and stored in the transfer target substrate database 58 (S194).

<Imprint substrate selection processing-back side / movement>
After associating and storing various information in the transferred candidate substrate database 58 in S194, the CPU 51 obtains imprint condition data stored in the auxiliary storage unit 53 as shown in FIG. It is determined whether or not imprint processing with the position shifted is possible (S195).

  If it is determined that the movement is impossible (S195, No), the process proceeds to the subsequent process (see FIG. 21). On the other hand, if it is determined that the movement is possible (S195, Yes), the CPU 51 acquires information related to the transfer permission area on the back side of the substrate from the substrate database 55 based on the substrate identification information, and also imprint system database. 59, data relating to the movement-permitted area is acquired from S59 (S196), and an area where the transfer-permitted area and the movement-permitted area overlap is set as a movable area (S197).

  The CPU 51 determines whether or not the transfer area of the imprint mold is positioned within the transfer permission area when the center of the transfer area of the imprint mold is aligned with all positions on the outermost periphery of the movable area. (S198). Specifically, the area constituted by the outermost circumference of the locus of the transfer area when the center of the transfer area of the imprint mold is moved once along the outermost circumference of the movable area is more than the transfer permitted area. If it is larger, it can be determined that at least a part of the transfer area is located outside the transfer permission area. If the area constituted by the outermost periphery of the locus of the transfer area is smaller than the transfer permission area, the transfer area is transferred. It can be determined that it is located within the permitted area.

  When it is determined that at least a part of the transfer area of the imprint mold is located outside the transfer permission area (No in S198), the movable area set in S197 is the diagonal of the transfer area of the imprint mold. An area narrowed by half the length is set as a movement area (S199), and when it is determined that the transfer area of the imprint mold is located within the transfer permission area (S198, Yes), the setting is made in S197. The moved movable area is set as a moving area (S200).

Subsequently, based on the initial transfer position information stored in the auxiliary storage unit 53, the CPU 51 transfers the imprint mold when the substrate and the imprint mold are arranged to face each other at the initial transfer position. Auxiliary lines parallel to the X axis and Y axis passing through the center of the area are drawn into the movement area, and each auxiliary line is based on the information (X _pitch , Y _pitch ) regarding the movement distance stored in the auxiliary storage unit 53. Auxiliary lines that are parallel to the line and separated for each movement distance are drawn, and the coordinates of the intersections of the auxiliary lines and the intersections of the auxiliary lines and the outermost periphery of the moving area are calculated and stored in the auxiliary storage unit 53. (S201).

  Next, the coordinate data (coordinate values of the points α and β) of the overlap determination transfer region when the center of the transfer region of the imprint mold is moved to an arbitrary intersection is calculated, and the auxiliary storage unit 53 is calculated. (S202).

Subsequently, based on the flatness information stored in the auxiliary storage unit 53 and the coordinate data of the overlap determination transfer area after movement, the CPU 51 determines the X coordinate value of the point A of the poor flatness area and the overlap determination transfer area. X-coordinate value of point α, Y-coordinate value of point A in the poor flatness region and Y-coordinate value of point α in the overlap determination transfer region, X-coordinate value of point B in the poor flatness region, and overlap determination transfer region X coordinate value of point β, Y coordinate value of point B in the poor flatness area, and Y coordinate value of point β in the overlap determination transfer area are respectively compared, and among the coordinate values of point A and point α, Large values are defined as X _left and Y _low, and small values of the coordinate values of point B and point β are defined as X _right and Y _up , respectively (S203).

The CPU 51 compares X _left and X _right and determines whether X _left is smaller than X _right (S204). If it is determined that X _left is greater than X _right (S204, No), it is determined that the poor flatness region and the transfer region do not overlap, and information on the overlap area between the flatness poor region and the transfer region (area = 0), information on the use of the back surface as imprint processing condition information, and information on the transfer position with respect to the substrate (information on movement distances in the X-axis direction and Y-axis direction from the initial transfer position) are stored in the auxiliary storage unit 53 (S205).

On the other hand, when it is determined that X _left is smaller than X _right (S204, Yes), the CPU 51 compares Y _low and Y _up to determine whether Y _low is smaller than Y _up (S206). If it is determined that Y _low is greater than Y _up (S206, No), it is determined that the flatness defect region and the transfer region do not overlap, and information on the overlap area between the flatness defect region and the transfer region (area = 0), and information regarding the use of the back surface as imprint processing condition information and information regarding the transfer position with respect to the substrate are stored in the auxiliary storage unit 53 (S205).

On the other hand, if it is determined that Y _low is smaller than Y _up (S206, Yes), the CPU 51 determines that the poor flatness region and the transfer region overlap, and the poor flatness region and the transfer region Calculate the area where the concavo-convex pattern formation region and the tolerance region overlap each other, and add up the area where the flatness failure region and the tolerance region overlap, the area of the flatness failure region and the concavo-convex pattern formation region And the total of all the areas are calculated, and information regarding the calculated areas and transfer positions is stored in the auxiliary storage unit 53 (S207).

  Specifically, the area where the flatness defect region and the concavo-convex pattern formation region overlap can be calculated as follows.

First, based on the area calculation concavo-convex pattern formation region information stored in the auxiliary storage unit 53, the X coordinate value of the point A of the poor flatness region and the point α ′ of the moved area calculation concavo-convex pattern formation region X-coordinate value, Y-coordinate value of point A in the poor flatness area, Y-coordinate value of point α ′ in the uneven pattern forming area for area calculation after movement, X-coordinate value of point B in the poor flatness area and post-movement The X coordinate value of the point β ′ of the area calculation uneven pattern formation region, the Y coordinate value of the point B of the poor flatness region, and the Y coordinate value of the point β ′ of the area calculation uneven pattern formation region after movement are respectively compared. The large values of the coordinate values of the point A and the point α ′ are defined as X _left and Y _low , respectively, and the small values of the coordinate values of the point B and the point β are defined as X _right and Y _up , respectively. Define. Then, from the defined values of X _left , X _right , Y _low and Y _up , the area where the flatness defect region and the concave / convex pattern formation region overlap is calculated by the following equation.
Area = (X _right −X _left ) × (Y _up −Y _low )

On the other hand, the area where the flatness defect area overlaps with the tolerance area overlaps with the flatness defect area and the transfer area using the values of X _left , X _right , Y _low and Y _up defined in S203. Can be calculated by subtracting the area value where the poor flatness area and the concavo-convex pattern formation area overlap from the calculated area value.
Area = (X _right −X _left ) × (Y _up −Y _low )

  Next, the CPU 51 determines whether or not other flatness defect area information that has not been determined whether or not it overlaps with the transfer area is stored in the auxiliary storage unit 53 (S208). If it is determined that the information is stored (S208, Yes), the processes of S203 to S207 are performed again, and if it is determined that no other flatness defect area information is stored (S208, No) ), All area values stored in the auxiliary storage unit 53 (the overlapping area between the defective flatness region and the uneven pattern forming region, the overlapping area between the defective flatness region and the tolerance region, and the area stored in S205 ( = 0)) is calculated, and it is determined whether or not the total area value is 0 (S209).

  If it is determined that the total area value is 0 (S209, Yes), the CPU 51 associates the substrate identification information, the storage location information, the initial transfer position information, and the imprint processing condition information with the substrate to be transferred. Store in the database 57 (S210).

  On the other hand, when determining that the total area value is not 0 (S209, No), the CPU 51 determines whether another total area value is stored in the auxiliary storage unit 53 (S211), and determines the other total area. If it is determined that no value is stored (S211, No), the auxiliary storage unit 53 stores the total area value calculated in S209, information on the backside use as imprint processing condition information, and information on the transfer position with respect to the substrate. (S212).

  When it is determined that another total area value is stored (S211, Yes), whether the other total area value stored in the auxiliary storage unit 53 is larger than the total area value calculated in S209. Is determined (S213).

  When it is determined that the other total area value is large (S213, Yes), the auxiliary area is stored in the total area value calculated in S209, information on the back surface use as imprint processing condition information, and information on the transfer position with respect to the substrate. When the information stored in the unit 53 is updated (S214) and it is determined that the other total area value is equal to or less than the total area value calculated in S209 (S213, No), the information is stored in the auxiliary storage unit 53. Without updating the received information, the process proceeds to S215 and later.

  Thereafter, the CPU 51 determines whether or not the overlap determination processing has been performed at all the intersections (S215), and when it is determined that the overlap determination processing has not been performed at all the intersections (S215, No), the processing of S202 to S214 is performed. Repeat the process.

  On the other hand, if it is determined that the overlap determination process has been performed at all intersections (S215, Yes), the substrate identification information, the storage location information, the initial transfer position information, and the area values stored in the auxiliary storage unit 53 And the imprint processing condition information are stored in the transferred candidate substrate database 58 in association with each other (S216).

<Imprint substrate selection process-back side, rotation, movement>
After associating various types of information and storing them in the transfer target substrate database 58 in S216, the CPU 51 acquires imprint condition data stored in the auxiliary storage unit 53 as shown in FIG. Based on the condition data, it is determined whether or not imprint processing is possible in a state where the substrate and the transfer region are relatively rotated (S217).

  When it is determined that rotation is not possible (S217, No), the process proceeds to the subsequent process (see FIG. 21). On the other hand, when it is determined that the rotation is possible (S217, Yes), the CPU 51 rotates 90 degrees around the axis about the center of the substrate based on the flatness information stored in the auxiliary storage unit 53. The coordinate data of the points A and B in the poor flatness region is calculated, and stored in the auxiliary storage unit 53 together with information on the number of times the coordinate data is calculated after the substrate is rotated (S218).

Next, based on the initial transfer position information stored in the auxiliary storage unit 53, the CPU 51 transfers the imprint mold when the substrate and the imprint mold are arranged to face each other at the initial transfer position. An auxiliary line parallel to each of the X axis and the Y axis passing through the center of the region is drawn, and based on the information (X _pitch , Y _pitch ) related to the movement distance stored in the auxiliary storage unit 53, Further, the auxiliary lines separated for each movement distance are rotated 90 degrees around the axis with the movement area on the substrate (the movement area (see FIG. 19) set in S199 or S200 above) as the axis of the substrate. The coordinates of the intersections of the auxiliary lines and the intersections of the auxiliary lines and the outermost periphery of the moving area are calculated and stored in the auxiliary storage unit 53 (S219).

  Then, the coordinate data (coordinate values of the points α and β) of the overlap determination transfer region when the center of the transfer region of the imprint mold is moved to an arbitrary intersection is calculated and stored in the auxiliary storage unit 53. Store (S220).

Subsequently, the CPU 51 determines the X coordinate of the point A of the poor flatness area based on the coordinate data of the poor flatness area after rotation stored in the auxiliary storage unit 53 and the coordinate data of the transfer determination transfer area after movement. Value and the X coordinate value of the point α of the overlap determination transfer region, the Y coordinate value of the point A of the poor flatness region, the Y coordinate value of the point α of the overlap determination transfer region, and the X coordinate of the point B of the flatness poor transfer region The value A and the X coordinate value of the point β of the overlap determination transfer region, the Y coordinate value of the point B of the poor flatness region, and the Y coordinate value of the point β of the overlap determination transfer region are compared, respectively. _Are defined as X _left and Y _low, and small values of the coordinate values of point B and β are defined as X _right and Y _up , respectively (S221).

The CPU 51 compares X _left and X _right and determines whether X _left is smaller than X _right (S222). If it is determined that X _left is greater than X _right (S222, No), it is determined that the flatness defect area and the transfer area do not overlap, and information on the overlap area between the flatness defect area and the transfer area (area = 0), information regarding the use of the back surface as imprint processing condition information, information regarding the rotation angle of the substrate, and information regarding the transfer position with respect to the substrate (information regarding the movement distance in the X-axis direction and the Y-axis direction from the initial transfer position). The data is stored in the auxiliary storage unit 53 (S223).

On the other hand, when it is determined that X _left is smaller than X _right (S222, Yes), the CPU 51 compares Y _low and Y _up to determine whether Y _low is smaller than Y _up (S224). If it is determined that Y _low is greater than Y _up (S224, No), it is determined that the flatness defect region and the transfer region do not overlap, and information on the overlap area between the flatness defect region and the transfer region (area = 0), information on the use of the back surface as imprint processing condition information, information on the rotation angle of the substrate, and information on the transfer position with respect to the substrate are stored in the auxiliary storage unit 53 (S223).

On the other hand, when it is determined that Y _low is smaller than Y _up (S224, Yes), the CPU 51 determines that the poor flatness region and the transfer region overlap, and among the poor flatness region and the transfer region, Calculate the area where the concavo-convex pattern formation region and the tolerance region overlap each other, and add up the area where the flatness failure region and the tolerance region overlap, the area of the flatness failure region and the concavo-convex pattern formation region And the total of all the areas are calculated, and the calculated area, the information about the backside use as the imprint processing condition information, the information about the rotation angle of the substrate, and the information about the transfer position with respect to the substrate are stored in the auxiliary storage unit 53. (S225).

  Specifically, the area where the flatness defect region and the concavo-convex pattern formation region overlap can be calculated as follows.

First, based on the area calculation uneven pattern forming region information stored in the auxiliary storage unit 53, the X coordinate value of the point A of the flatness defect region after rotation and the point of the area calculating uneven pattern forming region after movement X-coordinate value of α ′, Y-coordinate value of point A of the flatness defect area after rotation, Y-coordinate value of point α ′ of the uneven pattern formation area for area calculation after movement, and points of the poor flatness area after rotation The X coordinate value of B and the X coordinate value of the point β ′ in the uneven pattern forming area for area calculation after movement, the Y coordinate value of the point B in the flatness defect area after rotation, and the formation of the uneven pattern for area calculation after movement The Y coordinate values of the points β ′ of the region are respectively compared, and the larger values of the coordinate values of the points A and α ′ are defined as X _left and Y _low , respectively. The smaller values are defined as X _right and Y _up , respectively. Then, from the defined values of X _left , X _right , Y _low and Y _up , the area where the flatness defect region and the concave / convex pattern formation region overlap is calculated by the following equation.
Area = (X _right −X _left ) × (Y _up −Y _low )

On the other hand, the area where the flatness defect area overlaps with the tolerance area overlaps the flatness defect area and the transfer area using the values of X _left , X _right , Y _low and Y _up defined in S221. Can be calculated by subtracting the area value where the poor flatness area and the concavo-convex pattern formation area overlap from the calculated area value.
Area = (X _right −X _left ) × (Y _up −Y _low )

  Next, the CPU 51 determines whether or not other flatness defect area information that has not been determined whether or not it overlaps with the transfer area is stored in the auxiliary storage unit 53 (S226). When it is determined that the information is stored (S226, Yes), the processing of S221 to S225 is performed again, and when it is determined that the other flatness defect area information is not stored (S226, No) ), All the area values stored in the auxiliary storage unit 53 (the overlapping area between the defective flatness region and the concave / convex pattern forming region, the overlapping area between the defective flatness region and the tolerance region, and the area stored in S223 above) (= 0)) is calculated, and it is determined whether or not the total area value is 0 (S227).

If it is determined that the total area value is 0 (S227, Yes), the CPU 51 associates the substrate identification information, the storage location information, the initial transfer position information, and the imprint processing condition information with the transferred substrate. It stores in the database 57 (S228).
On the other hand, when determining that the total area value is not 0 (S227, No), the CPU 51 determines whether another total area value is stored in the auxiliary storage unit 53 (S229), and determines the other total area. When it is determined that the value is not stored (S229, No), the total area value calculated in S227, the information on the rotation angle of the substrate as the imprint processing condition information, and the information on the transfer position with respect to the substrate are auxiliary stored. The data is stored in the unit 53 (S230).

  If it is determined that another total area value is stored (S229, Yes), whether the other total area value stored in the auxiliary storage unit 53 is larger than the total area value calculated in S227. Is determined (S231).

  When it is determined that the other total area value is large (S231, Yes), the total area value calculated in S227, information on the backside use as imprint processing condition information, information on the rotation angle of the substrate, and transfer to the substrate When the information stored in the auxiliary storage unit 53 is updated to the information related to the position (S232), and it is determined that the other total area value is equal to or less than the total area value calculated in S227 (S231, No), Without updating the information stored in the auxiliary storage unit 53, the process proceeds to the processing after S233 described later.

  Thereafter, the CPU 51 determines whether or not the overlap determination processing has been performed at all the intersections (S233), and when it is determined that the overlap determination processing has not been performed at all the intersections (S233, No), the processing of the above S220 to S232 is performed. Repeat the process.

  On the other hand, when it is determined that the overlap determination process has been performed at all the intersections (S233, Yes), it is determined whether the center of the substrate is coincident with the center of the imprint mold (S234).

  If it is determined that the center of the substrate and the center of the imprint mold do not coincide with each other (S234, No), the calculation of the coordinate data in S218 is performed based on the information regarding the number of times the coordinate data is calculated after the rotation. It is determined whether the process has been performed three times (S236). On the other hand, if it is determined that the center of the substrate and the center of the imprint mold match (S234, Yes), whether or not the center of the concave / convex pattern forming region and the center of the imprint mold match. Is determined (S235).

  When it is determined that the center of the concave / convex pattern forming region and the center of the imprint mold do not coincide with each other (S235, No), the coordinate data in the above S218 is based on the information about the number of times the coordinate data is calculated after the rotation. It is determined whether or not the calculation process is performed three times (S236).

  When it is determined that the coordinate data calculation process has not been performed three times (S236, No), the processes of S218 to S235 are performed again. On the other hand, when it is determined that the center of the concavo-convex pattern formation region and the center of the imprint mold coincide with each other (S235, Yes), or when it is determined that the coordinate data calculation process has been performed three times (S236, Yes), The CPU 51 associates the substrate identification information, the storage location information, the respective area values stored in the auxiliary storage unit 53, the initial transfer position information, and the imprint processing condition information in the transfer candidate substrate database 58. Store (S237).

<Imprint board selection processing-board selection / priority assignment>
When various types of information are stored in the transferred substrate database 57 in the overlap determination process (FIGS. 13 to 20) described above (S111, S125, S142, S160, S179, S193, S210, S228), as shown in FIG. The CPU 51 deletes information related to the substrate stored in the transferred substrate database 57 from the substrate database 55 (S238), and subtracts 1 from the number of substrates based on the number-of-substrates information stored in the auxiliary storage unit 53. To update the number-of-substrates information (S239). Then, based on the scheduled imprint number information (N sheets) stored in the auxiliary storage unit 53, a process of subtracting 1 from the estimated imprint number is performed, and the expected imprint number information (N-1 sheets) is obtained. Update (S240).

  Subsequently, based on the scheduled imprint number information stored in the auxiliary storage unit 53, it is determined whether or not the scheduled imprint number has become zero (S241), and the scheduled imprint number has become zero. In the case (S241, Yes), the imprint substrate selection process is terminated.

  When various types of information are stored in the transfer target substrate database 58 in the overlap determination process (FIGS. 13 to 20) (S112, S126, S148, S169, S180, S194, S216, S237), the information is stored in the auxiliary storage unit 53. Based on the information on the number of substrates, the process of subtracting 1 from the number of substrates is performed to update the information on the number of substrates (S242).

  If it is determined in S241 that the scheduled number of imprints is not zero (S241, No), or after updating the board number information in S242, based on the board number information stored in the auxiliary storage unit 53. Then, it is determined whether or not the number of substrates has become zero (S243).

  When it is determined that the number of substrates is not zero (that is, there is a substrate that has not been subjected to the overlap determination process (FIGS. 13 to 20) in the substrate database 55) (S243, No), the substrate is stored in the substrate database 55. The flatness information of the one substrate that has been processed is acquired, and the process of determining the overlap between the imperfect substrate flatness area and the imprint mold transfer area in the imprint substrate selection process is performed again (FIGS. 13 to 20). reference).

  On the other hand, if it is determined that the number of substrates has become zero (that is, there is no substrate in the substrate database 55 that has not been subjected to the overlap determination process (FIGS. 13 to 20)) (S243, Yes), the transfer candidate substrate It is determined whether or not information on the substrate is stored in the database 58 (S244).

  If it is determined that the information regarding the substrate is not stored in the transfer target substrate database 58 (S244, No), the imprint substrate selection process is terminated. On the other hand, if it is determined that the information about the substrate is stored in the transfer target substrate database 58 (S244, Yes), the flatness failure region and the tolerance of the area values stored in the transfer candidate substrate database 58 Information on substrates stored in the transfer target substrate database 58 is sorted on the basis of the total area overlapped with the region (S245). Next, priority information is assigned to the substrates arranged in ascending order of the total value, and the priority information is stored in association with the substrate identification information (S246).

  Subsequently, the CPU 51 obtains information related to the total value of the overlapping areas of the flatness defect region and the tolerance region of the substrate with the lowest priority from the data relating to the substrate stored in the transfer target substrate database 58. (S247). Then, the CPU 51 determines whether or not the total area value is included in an allowable range that can be imprinted based on the acquired information regarding the total area value (S248).

  When it is determined that the total area value is not included in the allowable range (S248, No), the data regarding all the substrates stored in the transfer target substrate database 58 is deleted (S249), and the imprint substrate selection process is performed. finish.

  On the other hand, when it is determined that the total area value is included in the allowable range (S248, Yes), the CPU 51 stores information on the substrate stored in the transfer target substrate database 58 (substrate identification information, accommodation location information, and in-place information). The print processing condition information) is moved to the transferred substrate database 57 (S250), information on the substrate is deleted from the transfer candidate substrate database 58 (S251), and information on the substrate is deleted from the substrate database (S252). .

  Subsequently, the CPU 51 performs a process of subtracting 1 from the scheduled imprint number based on the scheduled imprint number information stored in the auxiliary storage unit 53, and updates the scheduled imprint number information (S253). Then, the CPU 51 determines whether or not the scheduled imprint number has reached 0 based on the scheduled imprint number information stored in the auxiliary storage unit 53 (S254), and the estimated imprint number becomes 0. When it becomes (S254, Yes), the imprint substrate selection process is terminated.

  On the other hand, if the scheduled imprint number is not zero (S254, No), it is determined whether or not information on the substrate is stored in the transfer target substrate database 58 (S255), and the information on the substrate is stored. If the information has been stored (S255, Yes), the processing of S247 to S254 is performed again. If the information regarding the substrate is not stored (S255, No), the imprint substrate selection processing is terminated.

<Imprint processing>
Subsequently, a substrate transport process selected by the imprint substrate selection process and an imprint process for the substrate are performed.

  As shown in FIG. 22, the control device 5 (CPU 51) obtains information first stored in the transferred substrate database 57 from information related to the substrates stored in the transferred substrate database 57 (SC101). Information on the substrate is transmitted to the substrate transport apparatus 4 via the communication unit 54 (SC102). The substrate transfer device 4 receives the information on the substrate transmitted from the control device 5 (ST101), and takes out the selected substrate from the substrate storage unit 2 based on the storage location information of the substrate (ST102). The substrate is transported to the imprint apparatus 3 and placed on the substrate stage of the imprint apparatus 3 (ST103). When the substrate transfer / placement processing is completed, the substrate transfer device 4 transmits a signal indicating that the transfer / placement processing is completed to the control device 5 (ST104).

  The control device 5 receives the signal transmitted from the substrate transport device 4 (SC103), and transmits information related to the substrate transmitted to the substrate transport device 4 in SC102 to the imprint device 3 (SC104).

  The imprint apparatus 3 on which the substrate has been transported and placed by the substrate transport apparatus 4 receives the information related to the substrate transmitted from the control device 5 (SI101), and based on the imprint processing condition information of the substrate, Print processing is performed (SI102). For example, when the imprint processing condition information includes information indicating that the substrate is transferred to the surface after being rotated 180 degrees, the imprint apparatus 3 has placed the substrate by the substrate transfer device 4. After rotating the substrate stage 180 degrees, or after rotating the holding part for holding the imprint mold 180 degrees, a resin (for example, energy ray curable resin, thermosetting resin, thermoplastic resin, etc.) The resin that can be used for the imprint process is applied and the imprint mold is pressed to spread the resin, and the uneven pattern of the imprint mold is transferred to the resin. Then, after the resin is cured, the imprint mold is peeled off, and the imprint process is terminated. After the imprint process is completed, the imprint apparatus 3 transmits a signal indicating that the imprint process is completed to the control apparatus 5 (SI103), and the control apparatus 5 receives the signal (SC105). The control device 5 that has received the signal acquires information on the next substrate stored in the transferred substrate database 57 and transmits the information to the substrate transport device 4. In this way, the imprint process is repeatedly performed on all the substrates whose data is stored in the transferred substrate database 57.

  In the imprint system 1 according to the present embodiment as described above, the uneven pattern of the imprint mold is transferred to a portion where the flatness of the front surface or the back surface of the substrate selected by the imprint substrate selection process is good. Therefore, when the resin applied on the substrate is spread by pressing the imprint mold, the spread of the resin can be prevented from stagnation, and the pressure applied to the imprint mold can be substantially uniform. Therefore, unevenness in the spread of the resin can be prevented. As a result, it is possible to transfer to the substrate with high accuracy, and it is possible to prevent variations in the height of the transferred concavo-convex pattern within the substrate and to prevent transfer defects such as shape defects. Throughput of the printing process can be improved.

  Further, in consideration of the thickness (residual film thickness) of the residual resin film (resin film existing between the substrate surface and the bottom surface of the concave portion of the concave / convex pattern of the resin) after the transfer, in the imprint system 1 according to the present embodiment. The substrate selection process is effective. For example, when the aim of the remaining film thickness in the imprint process is set to about 10 nm, if the flatness of the transfer position on the substrate subjected to the imprint process is 10 nm or more, the remaining pattern is left in the region where the uneven pattern is transferred. The possibility of uneven film thickness cannot be denied. However, according to the imprint system 1 according to the present embodiment, even if the substrate has a good flatness or a substrate having a poor flatness region, the uneven pattern of the imprint mold is formed on a portion having a good flatness on the substrate. Therefore, the possibility that such a variation in the remaining film thickness occurs can be reduced.

  The embodiment described above is described for facilitating understanding of the present invention, and is not described for limiting the present invention. Therefore, each element disclosed in the above embodiment is intended to include all design changes and equivalents belonging to the technical scope of the present invention.

  In the above embodiment, the coordinate data of the flatness failure area is stored in the board database 55 as the flatness information of the board. However, the present invention is not limited to this, and for example, an area with good flatness. Coordinate data of a predetermined flatness (for example, an area of less than 10 nm) when measuring and analyzing the flatness of the transfer surface (or back surface) of the substrate using a predetermined flatness measuring device is stored in the substrate database 55. It may be stored, or the predetermined flatness when the flatness of the transferred surface (or back surface) of the substrate is measured and analyzed using a predetermined flatness measuring device (for example, 10 mm or more) coordinate data and unfavorable flatness area (predetermined flatness when the flatness of the transfer surface (or back surface) of the substrate is measured and analyzed using a predetermined flatness measuring device. Degrees (for example, 5 nm or more and less than 10 nm) and the coordinate data may be stored in the substrate database 55 areas) of. In the former case, it may be determined whether or not the transfer region is included in a region with good flatness, and the substrate determined to be included may be selected as a substrate suitable for imprint processing. In the latter case, it is determined whether or not the region with the worst flatness and the transfer region overlap, and whether or not the unfavorable flatness and the transfer region overlap with each other. A substrate that is determined not to be suitable may be selected as a substrate that is suitable for imprint processing, or a substrate that is determined not to overlap the worst flatness region and the transfer region (unfavorable flatness property). The substrate determined to overlap the region and the transfer region) may also be selected as a substrate suitable for the imprint process.

  In the above embodiment, the poor flatness region is defined as a region surrounded by a rectangular frame. However, the present invention is not limited to this, for example, the flatness poor region is a circular or elliptical frame. It may be defined as a region surrounded by a polygon or a region surrounded by a polygonal frame. In the former case, a poor flatness area represented by a circle or an ellipse is defined by a mathematical formula, and the coordinate data of the points α and β representing the transfer region is substituted into the mathematical formula, and either the point α or the point β It is only necessary to determine whether or not the poor flatness region and the transfer region overlap each other by determining whether or not is located in the poor flatness region. In the latter case, the flatness defect area represented by the polygon is divided and defined by a plurality of rectangles, and whether or not the flatness defect area represented by each rectangle and the transfer area overlap. Just judge.

  In the above embodiment, the imprint processing is performed after the imprint substrate selection processing is completed. However, the present invention is not limited to this, and the imprint processing is performed in parallel with the imprint substrate selection processing. It may be done. In this case, when information on the substrate is first stored in the transferred substrate database 57, the imprint process may be started using this information as a trigger.

  In the above embodiment, the imprint processing condition information is transmitted to the imprint apparatus 3, and the substrate placed on the substrate stage of the imprint apparatus 3 is rotated based on the imprint processing condition information. The invention is not limited to this, and the substrate may be placed on the substrate stage of the imprint apparatus 3 after the substrate has been rotated in advance. In this case, the control device 5 transmits imprint processing condition information to the substrate transport device 4, and based on the information, the substrate transport device 4 rotates the substrate taken out from the substrate storage unit 2 in advance to imprint the device. The imprint apparatus 3 may perform the imprint process without rotating the holding unit that holds the substrate stage or the imprint mold.

  In the above embodiment, the transfer region includes a concavo-convex pattern forming region and a tolerance region, but the present invention is not limited to this, and the concavo-convex pattern is formed without including the tolerance region in the transfer region. It may be determined whether the concavo-convex pattern forming region and the poor flatness region overlap each other using the region as a transfer region. In this case, only the substrate where the uneven pattern formation region and the flatness defect region do not overlap is selected as a substrate suitable for the imprint process, and priority information is given to the substrate where these regions overlap, and priority is given. It is not necessary to determine whether or not the substrate to which the order information is given is a substrate suitable for the imprint process, and the priority order information is given according to the overlapping area of these areas, and the imprint process is performed. It may be determined whether the substrate is suitable for the above.

  In the above embodiment, the priority order information is given based on the total value of the overlapping area of the tolerance region and the flatness defect region included in the transfer region, but the present invention is not limited to this. For example, priority information may be given on the basis of the total area where the uneven pattern formation region and the flatness defect area overlap, or the total value of the area where the uneven pattern formation area and the flatness defect area overlap The priority information may be given by using the total value of the areas where the tolerance region and the flatness failure region overlap as the second reference as the first reference. In this way, after giving priority information, only the substrate whose total value of the area where the uneven pattern formation region and the flatness defect region overlap is 0 may be selected as the imprint substrate.

  The imprint substrate selection system of the present invention can be applied to imprint processing in the manufacturing process of semiconductor products and the like.

DESCRIPTION OF SYMBOLS 1 ... Imprint system 2 ... Board | substrate storage part 3 ... Imprint apparatus 4 ... Board | substrate conveyance apparatus 5 ... Control apparatus

Claims (28)

Suitable for transfer in the imprint apparatus from among a plurality of substrates stored in the substrate storage section, and a substrate storage section that stores a plurality of substrates to be transferred with the imprint shape of the imprint mold in the imprint apparatus and a control unit for selecting a board,
The controller is
Substrate-related information storage means for storing flatness information related to flatness of one surface of the substrate stored in the substrate storage unit and substrate specific information regarding each substrate stored in the substrate storage unit in association with each other;
Transfer region information storage means for storing information relating to a transfer region including the region where the uneven shape is formed in the imprint mold;
On the basis of the flatness information and the transfer area information, substrate selection system for imprint and having a substrate selecting means for selecting a board suitable for transcription in the imprint apparatus. The flatness information includes information on an area where the flatness of one surface of the substrate stored in the substrate storage unit is poor,
The controller determines whether or not the defective flatness area of the one surface and the transfer area overlap based on the defective flatness area information of the one surface and the transfer area information. Further comprising
2. The imprinting device according to claim 1, wherein the substrate selecting unit selects a substrate that has been determined by the overlap determining unit that the flatness defect region of the one surface and the transfer region do not overlap with each other. Board selection system. The control device stores imprint condition information including rotation-related imprint condition information regarding whether or not transfer in the imprint apparatus is possible in a state where the substrate and the transfer region are relatively rotated. Further comprising imprint condition information storage means for
The overlap determination unit determines that the flatness defect area on the one surface and the transfer area overlap with each other , and relatively compares the substrate and the transfer area based on the rotation-related imprint condition information. When it is determined that transfer in the imprint apparatus in a rotated state is possible, the substrate and the transfer area are determined based on the flatness defect area information on the one surface and the transfer area information. It is further determined whether or not the poor flatness area of the one surface and the transfer area overlap when rotated relatively,
The substrate selecting means selects a substrate that has been determined by the overlap determining means that the poor flatness area of the one surface and the transfer area do not overlap when the substrate and the transfer area are relatively rotated. The imprint substrate selection system according to claim 2, wherein the imprint substrate selection system is selected. The control device stores imprint condition information including imprint condition information including movement-related imprint condition information regarding whether or not transfer in the imprint apparatus in a state where the transfer position with respect to the substrate is shifted is possible. Further comprising means,
The overlap determining unit determines that the flatness defect area on the one surface and the transfer area overlap with each other in a state where the transfer position with respect to the substrate is shifted based on the movement-related imprint condition information. When the transfer in the imprint apparatus is determined to be possible, the transfer area is moved relative to the substrate based on the flatness defect area information on the one surface and the transfer area information. And further determining whether or not the flatness defect area of the one surface and the transfer area overlap,
The substrate selecting means determines that the defective flatness area of the one surface and the transfer area do not overlap when the transfer area is moved relative to the substrate by the overlap determining means. The imprint substrate selection system according to claim 2, wherein: The control device stores imprint condition information including imprint condition information including back surface related imprint condition information regarding whether or not transfer in the imprint apparatus using the other surface side of the substrate is possible. Further comprising
The flatness defect region information includes other surface-side flatness defect region information related to a region where the flatness of the other surface side of the substrate is defective,
Said overlap determination means, wherein in a case where it is determined flatness defect area of one surface and said transfer region and overlap with the other surface side of the substrate on the basis of the back-related imprint condition information When it is determined that transfer in the imprint apparatus is possible, based on the other surface-side flatness defect area information and the transfer area information, the other surface-side flatness defect area and the transfer area And whether or not and overlap,
3. The imprint according to claim 2, wherein the substrate selection unit selects a substrate that has been determined by the overlap determination unit that the flatness defect region on the other surface side and the transfer region do not overlap with each other. Board selection system. The imprint condition information includes rotation-related imprint condition information regarding whether or not transfer in the imprint apparatus in a state in which the substrate and the transfer region are relatively rotated,
The overlap determination means determines that the flatness defect area on the other surface side and the transfer area overlap with each other , and makes the substrate and the transfer area relative to each other based on the rotation-related imprint condition information. And the transfer region based on the other surface-side flatness defect region information and the transfer region information when it is determined that transfer in the imprint apparatus in a state of being rotated is possible. And further determining whether or not the other flat surface poor flatness area and the transfer area overlap,
The substrate selecting means determines that the other flat surface poor flatness area and the transfer area do not overlap when the overlap determining means relatively rotates the substrate and the transfer area. The imprint substrate selection system according to claim 5, wherein: The imprint condition information includes movement-related imprint condition information regarding whether or not transfer in the imprint apparatus in a state where the transfer position with respect to the substrate is shifted,
The overlap determination unit is a case where it is determined that the flatness defect area on the other surface side and the transfer area overlap, and the transfer position with respect to the substrate is shifted based on the movement-related imprint condition information When the imprint apparatus determines that the transfer is possible, the transfer area is relative to the substrate based on the flatness defect area information on the other surface side and the transfer area information. Further determining whether or not the other flat surface poor flatness area and the transfer area overlap when moved to,
The substrate selection means determines that the poor flatness area on the other surface and the transfer area do not overlap when the transfer area is moved relative to the substrate by the overlap determination means. 6. The imprint substrate selection system according to claim 5, wherein a substrate is selected. The control device is calculated by the overlapping area calculating unit, and when the overlapping determining unit determines that the poor flatness region and the transfer region overlap, an overlapping area calculating unit that calculates an overlapping area of both regions is calculated by the overlapping area calculating unit. Priority information providing means for assigning priority information according to the area value, and for one substrate selected based on the priority information given by the priority information giving means, based on the area value , Further comprising a transfer availability determination means for determining whether transfer in the imprint apparatus is possible,
The imprint substrate according to claim 2, wherein the substrate selection unit selects a substrate that is determined to be transferable in the imprint apparatus by the transfer possibility determination unit. Selection system. 9. The imprint according to claim 8, wherein the priority order information assigning unit assigns the priority order information based on a minimum value of the area values of the substrates calculated by the overlapping area calculating unit. Board selection system. An imprint substrate selection program executed in a control device that selects a substrate suitable for transferring the uneven shape of the imprint mold using the imprint device,
The control device includes: a substrate-related information storage unit that stores flatness defect area information related to an area where the flatness of one surface of the substrate is defective; and an area in which the uneven shape is formed in the imprint mold. A transfer region information storage means for storing information about the transfer region including,
Based on the flatness failure area information read from the substrate related information storage means and the transfer area information read from the transfer area information storage means, the flatness failure area of the one surface and the A first overlap determination step for determining whether or not the transfer region overlaps;
A first substrate selection step of selecting, as the substrate suitable for transfer in the imprint apparatus, a first substrate selection step for the control apparatus, which is determined that the flatness defect area on the one surface and the transfer area do not overlap with each other; A program for selecting an imprint substrate, characterized in that: The control device stores imprint condition information including rotation-related imprint condition information regarding whether or not transfer in the imprint apparatus is possible in a state where the substrate and the transfer region are relatively rotated. Further comprising imprint condition information storage means for
Wherein the first overlap determination step in a case where the flatness defect region of said one surface and said transfer region is determined to be overlapped, the imprint condition information said rotation associated read out from the storage means imprint When it is determined that transfer in the imprint apparatus in a state in which the substrate and the transfer region are relatively rotated based on condition information is possible, the information is read from the substrate-related information storage unit Based on the flatness defect area information and the transfer area information, whether or not the flatness defect area of the one surface and the transfer area overlap when the substrate and the transfer area are relatively rotated. A second overlap determination step for determining ;
In the second overlap determination step, the substrate that is determined that the poor flatness region of the one surface and the transfer region do not overlap when the substrate and the transfer region are relatively rotated, A second substrate selection step for selecting as a substrate suitable for transfer in the imprint apparatus;
The imprint substrate selection program according to claim 10, wherein the control device is caused to execute. The control device stores imprint condition information including imprint condition information including movement-related imprint condition information regarding whether or not transfer in the imprint apparatus in a state where the transfer position with respect to the substrate is shifted is possible. Further comprising means,
The movement-related imprint read from the imprint condition information storage unit when it is determined in the first overlap determination step that the flatness defect region of the one surface and the transfer region overlap. The post-movement flatness read from the substrate-related information storage means when it is determined that transfer in the imprint apparatus in a state where the transfer position with respect to the substrate is shifted based on condition information is possible Based on the defective area information and the transfer area information, it is determined whether or not the transfer area is overlapped with the flatness defect area on the one surface when the transfer area is moved relative to the substrate. A third overlap determination step ,
In the third overlap determination step, a substrate that is determined not to overlap the poor flatness region of the one surface and the transfer region when the transfer region is moved relative to the substrate, A third substrate selection step for selecting a substrate suitable for transfer in the imprint apparatus;
The imprint substrate selection program according to claim 10, wherein the control device is caused to execute. The control device stores imprint condition information including imprint condition information including back surface related imprint condition information regarding whether or not transfer in the imprint apparatus using the other surface side of the substrate is possible. Further comprising
The flatness defect region information includes other surface-side flatness defect region information related to a region where the flatness of the other surface side of the substrate is defective,
The back surface-related imprint read from the imprint condition information storage unit when it is determined in the first overlap determination step that the flatness defect region of the one surface and the transfer region overlap. The other surface-side flatness read from the substrate-related information storage means when it is determined that transfer in the imprint apparatus using the other surface side of the substrate is possible based on condition information A fourth overlap determination step for determining whether or not the other surface side flatness defect region and the transfer region overlap based on the defect region information and the transfer region information ;
In the fourth overlap determination step, a substrate that is determined not to overlap the flatness defect region on the other surface side and the transfer region is selected as a substrate suitable for transfer in the imprint apparatus. Board selection step and
The imprint substrate selection program according to claim 10, wherein the control device is caused to execute. The imprint condition information includes rotation-related imprint condition information regarding whether or not transfer in the imprint apparatus in a state in which the substrate and the transfer region are relatively rotated,
The rotation-related imprint read from the imprint condition information storage unit when it is determined in the fourth overlap determination step that the other flat surface poor flatness region and the transfer region overlap. When it is determined that transfer in the imprint apparatus in a state in which the substrate and the transfer region are relatively rotated based on condition information is possible, the information is read from the substrate-related information storage unit Based on the other surface-side flatness defect area information and the transfer area information, when the substrate and the transfer area are relatively rotated, the other surface-side flatness defect area and the transfer area A fifth overlap determination step for determining whether or not the
In the fifth overlap determination step, a substrate that is determined not to overlap the flatness defect region on the other surface side and the transfer region when the substrate and the transfer region are relatively rotated. A fifth substrate selecting step for selecting a substrate suitable for transfer in the imprint apparatus;
14. The imprint substrate selection program according to claim 13, wherein the control device executes the following. The imprint condition information includes movement-related imprint condition information regarding whether or not transfer in the imprint apparatus in a state where the transfer position with respect to the substrate is shifted,
The fourth by the overlap determination step in a case where the transfer region and the other side of the flatness defect region is determined to overlap, the imprint condition information said moving associated read out from the storage means imprint When it is determined that transfer in the previous imprint apparatus in a state where the transfer position with respect to the substrate is shifted based on the condition information is possible, the other surface side flatness read from the substrate related information storage means Whether the transfer area overlaps with the flatness defect area on the other surface side when the transfer area is moved relative to the substrate based on the defect area information and the transfer area information a sixth overlap determination step of determining,
In the sixth overlap determination step, a substrate that is determined not to overlap the transfer region with the flatness defect region on the other surface side when the transfer region is moved relative to the substrate. A sixth substrate selection step of selecting as a substrate suitable for transfer in the imprint apparatus;
14. The imprint substrate selection program according to claim 13, wherein the control device executes the following. An overlapping area calculating step for calculating an overlapping area of both regions when it is determined that the poor flatness region and the transfer region overlap;
A priority information giving step for giving priority information based on the area value calculated by the overlapping area calculating step;
Whether transfer is possible in the imprint apparatus is determined based on the area value for one substrate selected based on the priority information given in the priority information provision step. A determination step;
Causing the control device to execute a seventh substrate selection step of selecting a substrate that is determined to be transferable in the imprint apparatus in the transfer enable / disable step as a substrate suitable for transfer in the imprint apparatus. The imprint substrate selection program according to any one of claims 10 to 15. 17. The imprint according to claim 16, wherein, in the priority order information adding step, the priority order information is given based on a minimum value among the area values of the substrates calculated in the overlapping area calculating step. Board selection program.   A recording medium storing the imprint substrate selection program according to claim 10. The imprint substrate selection system according to any one of claims 1 to 9,
An imprint apparatus that transfers the uneven shape of the imprint mold to the substrate selected by the imprint substrate selection system;
The control device further includes a transferable area setting unit that sets a transferable area in the imprint apparatus based on the flatness information and the transfer area information,
The imprint apparatus is controlled by the control device so that the uneven shape of the imprint mold is transferred to a transferable area set by the transferable area setting unit. . A method for selecting a substrate suitable for transferring an uneven shape of an imprint mold using an imprint apparatus,
A first overlap determination step of determining whether or not a region where the flatness of one surface of the substrate is poor and a transfer region including a region where the uneven shape in the imprint mold is formed overlap;
A substrate selection step for selecting an imprint substrate, wherein the first overlap determination step includes a substrate selection step for selecting a substrate determined not to overlap the flatness defect region of the one surface and the transfer region. Method. In the first overlap determination step, it is determined that the poor flatness region of the one surface and the transfer region overlap, and the imprint in a state where the substrate and the transfer region are relatively rotated. When the transfer in the apparatus is possible, a second judgment is made as to whether or not the poor flatness area of the one surface and the transfer area overlap when the substrate and the transfer area are relatively rotated. Further including an overlap determination step of
In the substrate selection step, when the substrate and the transfer region are relatively rotated in the second overlap determination step, it is determined that the flatness defect region on the one surface and the transfer region do not overlap. 21. The imprint substrate selection method according to claim 20, wherein the selected substrate is selected. In the first overlap determination step, it is determined that the poor flatness area of the one surface and the transfer area overlap, and transfer in the imprint apparatus in a state where the transfer position with respect to the substrate is shifted is possible. In some cases, a third overlap determining step for determining whether or not the poor flatness region of the one surface and the transfer region overlap when the transfer region is moved relative to the substrate. In addition,
In the substrate selection step, when the transfer region is moved relative to the substrate in the third overlap determination step, it is determined that the poor flatness region of the one surface and the transfer region do not overlap. 21. The imprint substrate selection method according to claim 20, wherein the printed substrate is selected. In the first overlap determination step, it is determined that the poor flatness area of the one surface and the transfer area overlap, and transfer in the imprint apparatus using the other surface side of the substrate is possible. A fourth overlap determination step for determining whether or not the flatness defect region on the other surface side of the substrate and the transfer region overlap,
In the substrate selection process, according to claim 20, characterized by selecting the fourth overlap determination process substrate other side of the flatness defect region of the substrate and said transfer region is determined to be not overlapped by The method for selecting an imprint substrate as described in 1. In the fourth overlap determination step, it is determined that the flatness defect region on the other surface side of the substrate and the transfer region overlap, and the substrate and the transfer region are relatively rotated. When transfer in the imprint apparatus is possible, it is determined whether or not the other flat surface poor flatness area and the transfer area overlap when the substrate and the transfer area are relatively rotated. And further including a fifth overlapping determination step for determining,
In the substrate selection step, when the substrate and the transfer region are relatively rotated in the fifth overlap determination step, it is determined that the poor flatness region on the other surface side does not overlap the transfer region. 24. The imprint substrate selection method according to claim 23, wherein the selected substrate is selected. In the fourth overlap determining step, it is determined that the flatness defect region on the other surface side of the substrate and the transfer region overlap, and the transfer in the imprint apparatus in a state where the transfer position with respect to the substrate is shifted. When the transfer area is moved relative to the substrate, the flatness defect area on the other surface side and the transfer area are determined to overlap with each other when the transfer area is moved relative to the substrate. The method further includes an overlap determination step,
In the substrate selection step, when the transfer region is moved relative to the substrate in the sixth overlap determination step, the flatness defect region on the other surface side does not overlap with the transfer region. 24. The imprint substrate selection method according to claim 23, wherein the determined substrate is selected. When it is determined that the flatness defect region and the transfer region overlap, an overlapping area calculation step of calculating an overlapping area of both regions;
A priority order assigning step for assigning priorities based on the area values calculated by the overlap area calculating step;
Transferability determination step of determining whether or not transfer in the imprint apparatus is possible based on the area value for one substrate selected based on the priority order given in the priority order assignment step. And further including
26. The imprint substrate according to claim 20, wherein, in the substrate selection step, a substrate that is determined to be transferable in the imprint apparatus in the transfer possibility determination step is selected. Selection method. 27. The imprint substrate according to claim 26, wherein, in the priority order assigning step, the priority order is assigned based on a minimum value among the area values of the respective substrates calculated in the overlapping area calculating step. Selection method. A step of setting a transferable region in the imprint apparatus for the substrate selected by the imprint substrate selection method according to any one of claims 20 to 27;
Transferring the uneven shape of the imprint mold to the transferable region using the imprint apparatus.

Images