JP5953725B2 - Imprint substrate selection system, imprint substrate selection program, imprint system, imprint substrate selection method, and imprint method - Google Patents

Description

  The present invention relates to an imprint substrate selection system, an imprint substrate selection program, an imprint system, an imprint substrate selection method, and an imprint method.

  In recent years, attention has been focused on an imprint method that can form a very fine structure and is a low-cost pattern forming method as a fine processing technique in a manufacturing process of a semiconductor device or the like. In the imprint method, a resin is discretely dropped on a substrate such as a silicon wafer or a glass plate, or is applied by a spin coating method or the like, and a mold is formed on the substrate by forming a fine uneven pattern on the surface of the substrate. This is a pattern forming method in which the concave-convex pattern of the mold is transferred to the resin on the substrate at the same magnification by pressing the resin applied to the resin and curing the resin, and then removing the mold (see Patent Document 1).

US Pat. No. 5,772,905

  Since the substrate used in such an imprint method has at least one surface (transfer surface) polished, the flatness of the transfer surface is good, but the flatness is partially poor. Some regions (including regions having fine irregularities due to adhesion of scratches or foreign matter) exist. For example, when a concavo-convex pattern is transferred to a resin while spreading the resin dropped discretely onto the substrate by pressing the mold, the region having such poor flatness and the concavo-convex pattern of the mold are to be transferred. When the region overlaps, the spread of the resin stagnates in the region with poor flatness, or the pressure applied to the mold becomes non-uniform and the spread of the resin becomes uneven. Therefore, uneven thickness of the resin that presses the mold and poor filling of the resin into the mold recesses occur, and transfer defects such as variations in the height of the transferred concavo-convex pattern occur in the substrate, as a result, There is a problem that the throughput of the imprint process is lowered. That is, the flatness of the transfer surface of the substrate can be said to be one of important factors for transferring the concave / convex pattern of the mold with high accuracy in the imprint method.

  On the other hand, in order to transfer the concavo-convex pattern onto the substrate with high accuracy, the entire surface of the transfer surface is not used without using a substrate in which a region with poor flatness exists in a part of the transfer surface. If only a substrate with good flatness is selected and used as a substrate suitable for the imprint process, a substrate that is not used is wasted, resulting in an increase in manufacturing costs of semiconductor devices and the like.

  The present invention has been made in view of the above-described circumstances, and is capable of high-precision transfer processing in an imprint apparatus, even if the substrate has a portion with a poor flatness. Provided are an imprint substrate selection system, an imprint substrate selection method, an imprint substrate selection program, an imprint system using the substrates selected by the imprint substrate selection method, and a method thereof. Objective.

  In order to achieve the above object, firstly, the present invention is a system for selecting a substrate for transferring a plurality of times while changing the transfer position of the concavo-convex shape of the imprint mold from the plurality of substrates, A substrate storage unit for storing a plurality of substrates; and a control device for selecting a substrate suitable for the transfer from among the plurality of substrates stored in the substrate storage unit. A substrate-related data storage unit that associates and stores flatness data relating to the flatness of one surface of each substrate stored in the unit and substrate-specific data regarding each of the plurality of substrates stored in the substrate storage unit, and the imprint Based on the imprint planned area data and the flatness data related to the imprint planned area in which a plurality of transfer planned areas to which the uneven shape of the mold is transferred are arranged. An imprint substrate selection, comprising: a first substrate selection unit that selects, as a substrate suitable for the transfer, a substrate capable of transferring the same number of times as the number of transfer planned regions included in the imprint scheduled region. A system is provided (Invention 1).

  In the above invention (Invention 1), the flatness data includes flatness defect area data relating to an area where the flatness of one surface of the substrate stored in the substrate storage unit is defective, and the control device , Further comprising an overlap determination unit that determines whether the flatness defect area on one side and the imprint schedule area overlap based on the flatness defect area data and the imprint schedule area data, Preferably, the first substrate selection unit selects the substrate determined by the overlap determination unit if the flatness defect region on the one side and the imprint scheduled region do not overlap (invention 2).

  In the said invention (invention 2), the said control apparatus stores the rotation availability data regarding whether transfer is possible in the state which rotated the said imprint plan area | region relatively with respect to the said board | substrate. A determination unit for determining whether or not the flatness defect area on one side and the imprint scheduled area overlap with each other, the rotation permission data, the flatness defect area data, Based on the imprint planned area data, whether or not the flatness defect area on the one surface and the imprint planned area overlap when the planned imprint area is rotated relative to the substrate. Further, the first substrate selection unit determines that the imperfect flatness region of the one surface and the image when the imprint scheduled region is rotated relative to the substrate. Preferably selected substrates is determined by the overlap determining unit not to overlap the printed region where (invention 3).

In the said invention (invention 2) , the said control apparatus memorize | stores the movement availability data regarding whether transfer is possible in the state which moved the said imprint plan area | region relatively with respect to the said board | substrate. A determination unit that determines whether the flatness defect area on the one surface and the imprint scheduled area overlap with each other; and the movement determination data, the flatness defect area data, Based on the imprint schedule area data, whether or not the imperfect flatness area of the one surface and the imprint schedule area overlap when the imprint schedule area is moved relative to the substrate. Further, the first substrate selection unit determines that the imperfect flatness region on the one surface and the image when the imprint scheduled region is moved relative to the substrate. Preferably selected substrates is determined by the overlap determining unit not to overlap the printed scheduled region (invention 4).

In the said invention (invention 2) , the said control apparatus stores the rotation availability data regarding whether transfer is possible in the state which rotated the said imprint plan area | region relatively with respect to the said board | substrate. An availability data storage unit; and a migration availability data storage unit that stores migration availability data relating to whether transfer is possible in a state where the imprint scheduled area is moved relative to the substrate. When the overlap determining unit determines that the flatness defect area on the one surface and the imprint scheduled area overlap, the rotation permission data, the movement permission data, the flatness defect area data, and the imprint defect data Based on the planned print area data, the imprint planned area is rotated relative to the substrate and moved when the flatness is poor on the one surface. It is further determined whether or not the scheduled imprint area overlaps, and the first substrate selection unit rotates the relative imprint scheduled area relative to the substrate and moves the first imprint area. It is preferable to select a substrate determined by the overlap determining unit so that the flatness poorness area in the direction and the imprint scheduled area do not overlap (invention 5).

In the said invention (invention 2) , the said control apparatus further has the other surface transfer availability data storage part which memorize | stores the other surface transfer availability data regarding whether the transfer to the other surface of the said board | substrate is possible, The flatness defect area data includes the other surface flatness defect area data related to the flatness defect area on the other surface of the substrate, and the overlap determination unit includes the flatness defect area on the one surface and the imprint schedule. When it is determined that the region overlaps, the other surface flatness non-defective region and the imprint planned region data and the imprint planned region data and the imprint scheduled region data are determined based on the other surface transfer availability data, the other surface flatness defective region data, and the imprint scheduled region data. And the first substrate selection unit determines that the overlap determination unit determines that the flatness defect region on the other surface and the imprint scheduled region do not overlap with each other. Preferably selected more determined to be the substrate (invention 6).

  In the above invention (Invention 6), the control device stores rotation availability data related to whether or not transfer is possible in a state where the imprint scheduled area is rotated relative to the substrate. A determination unit that further determines whether or not the flatness defect area on the other surface and the imprint scheduled area overlap with each other; Whether or not the imperfect flatness area on the other surface and the imprint scheduled area overlap when the scheduled imprint area is rotated relative to the substrate based on the data and the imprint planned area data And the first substrate selection unit determines that the imprint scheduled region is rotated relative to the substrate and the flatness failure region on the other surface is Serial preferable to select a substrate that is determined by the overlap determining unit that there is an imprint scheduled region does not overlap (invention 7).

In the said invention (invention 6) , the said control apparatus memorize | stores the movement availability data regarding whether transfer is possible in the state which moved the said imprint plan area | region relatively with respect to the said board | substrate. A movable data storage unit, and the overlap determining unit determines that the flatness defect area on the other side and the imprint scheduled area overlap with each other; Whether or not the imperfect surface flatness area and the imprint scheduled area overlap when the scheduled imprint area is moved relative to the substrate based on the data and the imprint scheduled area data The first substrate selection unit determines that the imprint scheduled region is moved relative to the substrate and the flatness failure region on the other surface is Serial preferable to select a substrate that is determined by the overlap determining unit that there is an imprint scheduled region do not overlap (invention 8).

In the above invention (Invention 6) , the control device stores rotation availability data related to whether or not transfer is possible in a state where the imprint scheduled area is rotated relative to the substrate. An availability data storage unit; and a migration availability data storage unit that stores migration availability data relating to whether transfer is possible in a state where the imprint scheduled area is moved relative to the substrate. When the overlap determining unit determines that the flatness failure area on the other surface and the imprint scheduled area overlap, the rotation availability data, the movement availability data, the other surface flatness failure area data, and Based on the imprint planned area data, the flatness of the other surface is not fixed when the imprint planned area is rotated and moved relative to the substrate. It is further determined whether or not the region and the imprint scheduled region overlap, and the first substrate selection unit rotates and moves the imprint scheduled region relative to the substrate. It is preferable to select a substrate determined by the overlap determining unit so that the flatness defect region on the other surface and the imprint scheduled region do not overlap (invention 9).

In the above invention (Invention 2) , the control device moves partly regarding whether or not transfer is possible in a state in which a part of the plurality of transfer scheduled regions is moved relative to the substrate. An area having the same size as the planned transfer area in the area other than the planned imprint area on the substrate based on the partial movement availability data storage unit for storing the availability data and the partial movement availability data A scheduled movement area group setting unit for setting a planned movement area group including at least one scheduled movement area that can move a part of the plurality of scheduled transfer areas, and a movement schedule included in the planned movement area group Among the areas, the movement schedule for calculating the number of movement scheduled areas that do not overlap with the flatness defect areas other than the flatness defect areas determined to overlap the imprint scheduled area by the overlap determination unit An overlap transfer scheduled area that identifies the scheduled transfer area that overlaps the flatness defect area when the flatness defect area and the imprint scheduled area are determined to overlap with each other by a number calculation unit and the overlap determination unit The first substrate selection unit further includes a specific movement area in which the number of the planned transfer areas specified by the overlapping transfer planned area specification section is calculated by the planned movement area number calculation unit. It is preferable to select a substrate that is less than a few (Invention 10).

  In the above inventions (Inventions 2 to 10), the control device calculates the number of scheduled transfer areas that overlap the poor flatness area among the scheduled transfer areas included in the scheduled imprint area. A number calculation unit, a priority data generation unit that generates priority data in accordance with the number of overlap transfer scheduled regions calculated by the overlap transfer scheduled region number calculation unit, and transfer of the uneven shape of the imprint mold The number-of-manufactured-devices data storage unit for storing data related to the number of devices to be manufactured, and the number of substrates selected by the first substrate selection unit from all the substrates stored in the substrate storage unit And the number of planned transfer areas included in the planned imprint area is less than the number of planned production devices, the priority order data On the basis of this, it may further include a second substrate selection unit that selects one substrate from among substrates that cannot be transferred the same number of times as the number of planned transfer regions included in the planned imprint region ( Invention 11).

  Further, in the above inventions (Inventions 2 to 10), the control device calculates the number of transfer scheduled areas that overlap the poor flatness area among the scheduled transfer areas included in the scheduled imprint area. A planned area number calculation unit, a planned production device number data storage unit that stores data related to the planned production number of devices manufactured by transferring the uneven shape of the imprint mold, and all the storage units stored in the substrate storage unit When the product of the number of substrates selected from the substrates by the first substrate selection unit and the number of planned transfer regions included in the planned imprint region is less than the number of devices scheduled for manufacture, And the number of devices planned to be transferred, the difference in the number of devices scheduled to be manufactured, and the overlap transfer calculated by the overlap transfer scheduled region number calculation unit And a second substrate selection unit that selects one substrate from among the substrates that cannot be transferred the same number of times as the planned number of transfer regions included in the planned imprint region based on the fixed number of regions. (Invention 12).

  Secondly, the present invention is an imprint substrate selection program executed in a control device that selects a substrate to be transferred a plurality of times from among a plurality of substrates while changing the transfer position of the concavo-convex shape of the imprint mold. The control device includes a substrate-related data storage unit that stores flatness defect area data relating to an area where the flatness of one surface of the substrate is poor, and a transfer schedule on which the uneven shape of the imprint mold is transferred. An imprint schedule area data storage unit that stores data relating to an imprint schedule area in which a plurality of areas are arranged, and the imperfectness flat area data read from the board-related data storage unit, and the imprint schedule Based on the imprint scheduled area data read from the area data storage unit, the flatness defect area on the one surface and A first overlap determination step for determining whether or not the imprint scheduled area overlaps, and a first selection of a substrate that can be transferred the same number of times as the number of the planned transfer areas included in the imprint scheduled area A substrate selection step that is executed by the control device; and in the first substrate selection step, the substrate determined by the first overlap determination step that the flatness defect region and the imprint scheduled region do not overlap each other. An imprint substrate selection program is provided, wherein the substrate is selected as a substrate that can be transferred the same number of times as the number of the planned transfer regions included in the planned imprint region (Invention 13).

  In the above invention (Invention 13), the control device stores rotation availability data relating to whether transfer is possible in a state where the imprint scheduled area is rotated relative to the substrate. And a readability data storage unit, and when the first flatness determination step determines that the flatness defect area of the one surface and the imprint scheduled area overlap each other, the readability data storage part is read out. The imprint schedule based on the rotation allowance data, the flatness defect area data read from the substrate-related data storage section, and the imprint schedule area data read from the imprint schedule area data storage section. When the region is rotated relative to the substrate, the poor flatness region on the one surface and the imprint scheduled region overlap. A second overlap determination step for determining whether or not the flatness defect area and the imprint scheduled area overlap in the first substrate selection step by the second overlap determination step. It is preferable to select a substrate that is determined not to be a substrate that can be transferred the same number of times as the number of the planned transfer regions included in the planned imprint region (Invention 14).

In the above invention (Invention 13 ) , the control device stores movement propriety data relating to whether or not transfer in a state where the imprint scheduled area is moved relative to the substrate is possible. A movement availability data storage unit is further included, and when it is determined in the first overlap determination step that the flatness defect area on the one surface and the imprint scheduled area overlap, the movement availability data storage part reads The imprinting possibility data, the flatness defect area data read from the board-related data storage unit, and the imprint scheduled area data read from the imprint scheduled area data storage unit, When the planned print area is moved relative to the substrate, the flatness defect area on the one surface overlaps the planned imprint area. A third overlap determination step for determining whether or not the flatness defect region and the imprint scheduled region are determined by the third overlap determination step in the first substrate selection step. It is preferable to select a substrate that is determined not to overlap as a substrate that can be transferred the same number of times as the number of the scheduled transfer regions included in the planned imprint region (Invention 15).

In the above invention (Invention 13 ) , the control device stores rotation availability data relating to whether transfer is possible in a state where the imprint scheduled area is rotated relative to the substrate. A rotation availability data storage unit; and a movement availability data storage unit that stores movement availability data relating to whether transfer is possible in a state where the imprint scheduled area is moved relative to the substrate. Rotation availability data read from the rotation availability data storage unit when it is determined in the first overlap determination step that the flatness defect area on the one side and the imprint scheduled area overlap. The moveability data read from the moveability data storage unit, the flatness defect area data read from the substrate-related data storage unit, and the imprint schedule area Based on the imprint scheduled area data read from the area data storage unit, the imprint scheduled area is rotated relative to the substrate and moved when the flatness defect area on the one surface is The controller performs a fourth overlap determination step for determining whether or not the imprint scheduled region overlaps, and in the first substrate selection step, the flatness defect region is determined by the fourth overlap determination step. It is preferable to select a substrate that is determined not to overlap with the scheduled imprint area as a substrate that can be transferred the same number of times as the number of the planned transfer areas included in the planned imprint area (Invention 16).

In the above invention (Invention 13 ) , the control device further includes a second surface transfer availability data storage unit that stores other side transfer availability data regarding whether or not transfer to the other surface of the substrate is possible. The flatness defect area data includes the other flatness defect area data relating to the flatness defect area on the other surface of the substrate, and the flatness defect area on the one surface and the flatness defect area data in the first overlap determination step. When it is determined that the area to be imprinted overlaps, the other surface transfer availability data read from the other surface transfer availability data storage unit, and the other surface flatness defect read from the substrate related data storage unit Based on the area data and the imprint scheduled area data read from the imprint scheduled area data storage unit, the flatness defect area on the other surface and the implementation The control device executes a fifth overlap determination step for determining whether or not the scheduled region overlaps, and in the first substrate selection step, the flatness defect region and the It is preferable to select a substrate that has been determined not to overlap the imprint scheduled area as a substrate that can be transferred the same number of times as the number of transfer planned areas included in the imprint planned area (Invention 17).

  In the above invention (Invention 17), the control device stores rotation availability data relating to whether transfer is possible in a state where the imprint scheduled area is rotated relative to the substrate. And a read / write data storage unit, and when the fifth flatness determining step determines that the flatness defect area on the other surface and the imprint scheduled area overlap, the read / write data storage part reads The imprint schedule based on the rotation allowance data, the other-side flatness defect area data read from the board-related data storage section, and the imprint schedule area data read from the imprint schedule area data storage section Whether the flatness defect area on the other surface and the imprint scheduled area overlap when the area is rotated relative to the substrate A sixth overlap determination step for determining whether or not the poor flatness region and the imprint scheduled region are not overlapped by the sixth overlap determination step in the first substrate selection step. It is preferable to select the substrate determined as “a substrate that can be transferred the same number of times as the number of the planned transfer regions included in the planned imprint region” (Invention 18).

In the above invention (Invention 17) , the control device stores movement propriety data relating to whether transfer is possible in a state in which the imprint scheduled area is moved relative to the substrate. A movement availability data storage unit is further included, and when it is determined in the fifth overlap determination step that the flatness defect area on the other surface and the imprint scheduled area overlap, the movement availability data storage part reads The imprinting possibility data, the other surface flatness defect area data read from the board-related data storage unit, and the imprint scheduled area data read from the imprint scheduled area data storage unit, Whether the imperfect flatness area on the other surface and the imprint scheduled area overlap when the planned print area is moved relative to the substrate A seventh overlap determination step for determining whether or not the flatness defect region and the imprint scheduled region overlap each other in the first substrate selection step by the seventh overlap determination step. It is preferable to select a substrate that is determined not to be a substrate that can be transferred the same number of times as the number of the planned transfer regions included in the planned imprint region (Invention 19).

In the above invention (Invention 17) , the control device stores rotation availability data relating to whether transfer is possible in a state where the imprint scheduled area is rotated relative to the substrate. A rotation availability data storage unit; and a movement availability data storage unit that stores movement availability data relating to whether transfer is possible in a state where the imprint scheduled area is moved relative to the substrate. Rotation possibility data read from the rotation availability data storage unit when it is determined in the fifth overlap determination step that the flatness defect area on the other side and the imprint scheduled area overlap. The moveability data read from the moveability data storage unit, the other surface flatness defect area data read from the substrate-related data storage unit, and the imprint Based on the imprint plan area data read from the plan area data storage unit, the imprint plan area is rotated relative to the substrate and moved when the other surface has poor flatness. And the imprint scheduled area are overlapped with each other by causing the control device to execute an eighth overlap determination step. In the first substrate selection step, the flatness defect is caused by the eighth overlap determination step. It is preferable to select a substrate that is determined not to overlap the region and the imprint scheduled region as a substrate that can be transferred the same number of times as the number of the planned transfer regions included in the planned imprint region (Invention 20). .

In the above invention (Invention 13 ) , the control device relates to whether or not transfer is possible in a state where a part of the plurality of transfer scheduled regions is moved relative to the substrate. Further comprising a partial movement availability data storage unit for storing movement availability data, and when it is determined that the flatness defect area and the imprint scheduled area overlap, based on the partial movement availability data, The area other than the area to be imprinted on the substrate includes at least one area to be moved that has the same size as the area to be transferred and can move a part of the areas to be transferred. A planned movement area group setting step for setting a planned movement area group, and the flatness defect determined to overlap the planned imprint area among the planned movement areas included in the planned movement area group If it is determined that the planned movement area number calculating step for calculating the number of planned movement areas that do not overlap with the flatness defect areas other than the areas, and the flatness defect area and the imprint planned area overlap, the flatness The control unit performs an overlap transfer scheduled area specifying step that specifies the transfer scheduled area that overlaps a defective area, and the transfer planned area specified by the overlap transfer scheduled area specifying step in the first substrate selection step. Is selected as a substrate that can be transferred the same number of times as the number of planned transfer areas included in the planned imprint area. (Invention 21)

  In the above inventions (Inventions 13 to 21), the control device further includes a scheduled device number data storage unit that stores data related to the planned number of devices manufactured by transferring the uneven shape of the imprint mold. When the first substrate selection step does not select a substrate that can be transferred the same number of times as the number of the scheduled transfer areas included in the planned imprint area, the scheduled transfer is overlapped with the poor flatness area. An overlapping transfer scheduled area number calculating step for calculating the number of areas, a priority data generating step for generating priority data in accordance with the number of the scheduled transfer areas calculated in the overlapping transfer scheduled area number calculating step, The number of substrates selected in the first substrate selection step and the transfer planned area included in the imprint scheduled area And the number of times of transfer equal to the number of transfer planned areas included in the planned imprint area based on the priority data generated by the priority data generation step. The control device may be caused to execute a second substrate selection step of selecting one substrate from among substrates that cannot be performed (Invention 22).

  Moreover, in the said invention (invention 13-21), the said control apparatus stores the data regarding a production planned device number data storage part which memorize | stores the data regarding the production number of devices manufactured by transcription | transfer of the uneven | corrugated shape of the said imprint mold. And when the first substrate selection step does not select a substrate that can be transferred the same number of times as the number of the scheduled transfer areas included in the scheduled imprint area, and overlaps the poor flatness area. The product of the overlap transfer planned area number calculating step for calculating the number of transfer planned areas, the number of substrates selected in the first substrate selection step, and the number of transfer planned areas included in the imprint scheduled area is When the number of devices to be manufactured is less than the number of devices, the difference between the product of the number of substrates and the number of transfer regions and the number of devices to be manufactured, and One of the substrates that cannot be transferred the same number of times as the planned number of transfer areas included in the planned imprint area based on the number of planned overlap transfer areas calculated in the number of overlapping transfer planned areas calculation step And a second substrate selection step of selecting the control unit (invention 23).

  Thirdly, the present invention provides a recording medium storing the imprint substrate selection program according to the above inventions (Inventions 13 to 23) (Invention 24).

  Fourthly, the present invention transfers the uneven shape of the imprint mold to the substrate selected by the imprint substrate selection system according to the above inventions (inventions 1 to 12) and the imprint substrate selection system. An imprinting device that transfers a plurality of times while changing the position, and the control device transfers the uneven shape of the imprint mold based on the flatness data and the imprint scheduled area data. And an imprint area setting section for setting an area on the printed circuit board. The uneven shape of the imprint mold is transferred a plurality of times while changing the transfer position to the imprint area set by the imprint area setting section. Thus, an imprint system is provided which controls the imprint apparatus (Invention 25).

  Fifth, the present invention is a method of selecting a substrate for transferring the uneven shape of the imprint mold a plurality of times while changing the transfer position from a plurality of substrates, wherein the flatness of one surface of the substrate is A first overlap determination step for determining whether or not a defective area and an imprint planned area in which a plurality of transfer planned areas to which the uneven shape of the imprint mold is transferred are arranged; and the imprint A first substrate selection step of selecting a substrate that can be transferred the same number of times as the number of transfer planned regions included in the planned region. In the first substrate selection step, the first overlap determination step performs the A substrate that has been determined that the flatness defect area on one side and the imprint scheduled area do not overlap can be transferred as many times as the number of the planned transfer areas included in the planned imprint area. Providing an imprinting substrate selection method characterized by selecting as the plate (invention 26).

  In the above invention (Invention 26), it is determined in the first overlap determining step that the flatness defect area on the one surface and the imprint scheduled area overlap with each other, and the imprint scheduled area is defined with respect to the substrate. When transfer in a relatively rotated state is possible, when the imprint scheduled area is rotated relative to the substrate, the flatness defect area on the one surface and the imprint scheduled area And a second overlap determination step for determining whether or not they overlap each other, and in the first substrate selection step, the second overlap determination step determines that the substrate and the imprint scheduled area do not overlap. It is preferable to select the substrate that can be transferred the same number of times as the number of the planned transfer regions included in the planned imprint region (Invention 27).

In the above invention (Invention 26) , in the first overlap determination step, it is determined that the flatness defect region on one surface of the substrate and the imprint scheduled region overlap, and the imprint planned region is defined as the substrate. If the imprint scheduled area is moved relative to the substrate, the imperfect flatness area on the one surface and the imprint are transferred. A third overlap determining step for determining whether or not the print scheduled region overlaps; and in the first substrate selection step, the flatness defect region on the one surface and the in-plane are determined by the third overlap determining step. It is preferable to select a substrate that is determined not to overlap the planned print area as a substrate that can be transferred the same number of times as the number of the planned transfer areas included in the planned imprint area. (Invention 28)

In the above invention (Invention 26) , in the first overlap determination step, it is determined that the flatness defect region on the one surface and the imprint scheduled region overlap, and the imprint scheduled region is defined on the substrate. The flatness of the one surface when the imprint scheduled area is rotated and moved relative to the substrate when transfer in a state of being relatively rotated and moved is possible. It further includes a fourth overlap determining step for determining whether or not the defective region and the imprint scheduled region overlap, and in the first substrate selecting step, the flatness of the one surface is determined by the fourth overlap determining step. A substrate that is determined not to overlap a defective area and the scheduled imprint area is a substrate that can be transferred the same number of times as the number of planned transfer areas included in the planned imprint area. (Invention 29).

In the above invention (Invention 26) , in the first overlap determination step, it is determined that the flatness defect area on the one surface and the imprint scheduled area overlap, and transfer using the other surface of the substrate is performed. If possible, the method further includes a fifth overlap determining step for determining whether or not the flatness defect region on the other surface side of the substrate overlaps each of the plurality of transfer scheduled regions, In the selection step, the number of the planned transfer regions included in the planned imprint region is determined as a substrate determined by the fifth overlap determination step that the flatness defect region on the other surface does not overlap with the planned imprint region. It is preferable to select a substrate capable of transferring the same number of times as (No. 30).

  In the said invention (invention 30), it is determined in the said 5th overlap determination process that the flatness defect area | region of the said other surface and the said imprint plan area | region overlap, and the said imprint plan area | region is set with respect to the said board | substrate. When transfer in a relatively rotated state is possible, when the imprint scheduled area is rotated relative to the substrate, the flatness defect area on the other surface and the imprint scheduled area And a sixth overlap determination step for determining whether or not they overlap each other, and in the first substrate selection step, the imprint scheduled area is relatively set relative to the substrate by the sixth overlap determination step. A substrate that is determined not to overlap the flatness failure area on the other surface and the imprint scheduled area when rotated is included in the imprint scheduled area. Preferably selected as a substrate capable of transcription of the region where the number of the same number (invention 31).

In the above invention (Invention 30 ) , in the fifth overlap determining step, it is determined that the flatness defect region on the other surface and the imprint scheduled region overlap, and the imprint planned region is applied to the substrate. The imprint scheduled area and the imprint scheduled area when the imprint scheduled area is moved relative to the substrate. And a seventh overlap determination step for determining whether or not they overlap each other, and in the first substrate selection step, the imprint scheduled area is relatively set with respect to the substrate by the seventh overlap determination step. The transfer included in the planned imprint area is a substrate that is determined that the flatness defect area on the other surface and the planned imprint area do not overlap when moved. It is preferable to select a substrate capable of transferring the same number of times as the planned number of regions (Invention 32).

In the above invention (Invention 30 ) , in the fifth overlap determination step, it is determined that the flatness defect region on the other surface and the imprint scheduled region overlap each other, and the imprint planned region is defined with respect to the substrate. When the transfer in a state of being relatively rotated and moved is possible, the flatness of the other surface when the imprint scheduled area is rotated and moved relative to the substrate. The method further includes an eighth overlap determination step for determining whether or not the defective region and the imprint scheduled region overlap with each other, and in the first substrate selection step, the flatness of the other surface is determined by the eighth overlap determination step. A substrate that is determined not to overlap a defective area and the scheduled imprint area is a substrate that can be transferred the same number of times as the number of planned transfer areas included in the planned imprint area. (Invention 33).

In the said invention (invention 26) , when it determines with the said flatness defect area | region and the said imprint plan area | region overlapping, the said imprint plan area | region on the said board | substrate based on the said partial movement availability data A movement that sets a movement planned area group that includes at least one movement planned area that has the same size as the transfer planned area and that can move a part of the plurality of transfer planned areas in a region other than A scheduled area group setting step, and a scheduled movement area that does not overlap with a defective flatness area other than the defective flatness area determined to overlap with the scheduled imprint area among the planned movement areas included in the planned movement area group When it is determined that the flatness failure area and the imprint scheduled area overlap with each other, the flatness failure area calculation step for calculating the number overlaps the flatness failure area. An overlapping transfer scheduled area specifying step that specifies the transfer scheduled area, and in the first substrate selection step, the number of the scheduled transfer areas specified by the overlapping transfer scheduled area specifying step is the number of the planned movement areas. It is preferable to select a substrate that is equal to or less than the number of planned movement areas calculated in the calculation step as a substrate that can be transferred the same number of times as the number of planned transfer areas included in the planned imprint area (Invention 34).

  In the above inventions (Inventions 26 to 34), when a substrate capable of transferring the same number of times as the number of transfer planned areas included in the planned imprint area is not selected in the first substrate selection process, Priorities are assigned based on the number of planned overlapping transfer areas for calculating the number of the planned transfer areas that overlap the poor flatness areas, and the number of planned transfer areas calculated by the planned number of planned overlapping transfer areas. The product of the priority assignment step, the number of substrates selected from the plurality of substrates by the first substrate selection step, and the number of scheduled transfer regions included in the scheduled imprint region is the mold for imprinting. When the number of devices manufactured by transferring the concavo-convex shape is less than the planned production number, the above-mentioned priority is given based on the priority given by the priority assignment step. Optionally further include a second substrate selecting step of transfer of the transfer region where the number of the same number of times to select one of the substrate from the substrate can not included in the print region where (invention 35).

  In the above inventions (Inventions 26 to 34), when the first substrate selection step does not select a substrate that can be transferred the same number of times as the number of the scheduled transfer regions included in the planned imprint region. , An overlap transfer scheduled area number calculating step for calculating the number of transfer scheduled areas that overlap the flatness defect area, and the number of substrates selected by the first substrate selecting step from the plurality of substrates When the product of the number of planned transfer areas included in the planned print area is less than the planned number of devices manufactured by transferring the uneven shape of the imprint mold, the number of substrates and the number of planned transfer areas And the difference between the number of devices planned to be manufactured and the number of overlapping transfer scheduled areas calculated in the overlapping transfer scheduled area number calculating step. Also include a second substrate selecting step of transfer of the transfer region where the number of the same number of times contained in the preparative scheduled region selects one substrate out of the substrate can not be (invention 36).

  Sixth, the present invention provides an imprint area setting for setting an area for transferring the uneven shape of the imprint mold on the substrate selected by the imprint substrate selection method according to the above inventions (Inventions 26 to 36). And imprinting using the imprint apparatus to transfer the irregular shape of the imprint mold to the imprint area a plurality of times while changing the transfer position to the imprint area. A printing method is provided (Invention 37).

  According to the present invention, imprint substrate selection that enables high-precision transfer processing in an imprint apparatus and that can effectively utilize the substrate even if the substrate has a region with poor flatness in part. A system, an imprint substrate selection method, an imprint substrate selection program, an imprint system using the substrates selected by them, and a method thereof can be provided.

It is a schematic structure figure showing an imprint system concerning one embodiment of the present invention. It is the schematic which shows the internal structure of the control apparatus in one Embodiment of this invention. It is the schematic which shows an example of the imprint plan area | region in one Embodiment of this invention. It is the schematic which shows the database structure of the board | substrate database in one Embodiment of this invention. It is the schematic which shows an example of the flatness defect area | region of the board | substrate in one Embodiment of this invention. It is the schematic which shows the database structure of the to-be-transferred substrate database in one Embodiment of this invention. It is the schematic which shows the data structure of the to-be-transferred candidate board | substrate database in one Embodiment of this invention. It is a flowchart which shows the imprint condition data generation process in one Embodiment of this invention. FIG. 9 is a sub-flowchart showing a movement related condition data generation process in the imprint condition data generation process shown in FIG. 8. FIG. 9 is a sub-flowchart showing a rotation related condition data generation process in the imprint condition data generation process shown in FIG. 8. FIG. 9 is a sub-flowchart illustrating a back surface related condition data generation process in the imprint condition data generation process illustrated in FIG. 8. It is a flowchart which shows the partial movement related condition data generation process in the imprint condition data generation process shown in FIG. It is a flowchart (the 1) which shows the board | substrate selection process for imprint in one Embodiment of this invention. It is a flowchart (the 2) which shows the board | substrate selection process for imprint in one Embodiment of this invention. It is a flowchart (the 3) which shows the board | substrate selection process for imprint in one Embodiment of this invention. It is a flowchart (the 4) which shows the board | substrate selection process for imprint in one Embodiment of this invention. It is a flowchart (the 5) which shows the board | substrate selection process for imprint in one Embodiment of this invention. It is a flowchart (the 6) which shows the board | substrate selection process for imprint in one Embodiment of this invention. It is a flowchart (the 7) which shows the board | substrate selection process for imprint in one Embodiment of this invention. It is a flowchart (the 8) which shows the board | substrate selection process for imprint in one Embodiment of this invention. It is a flowchart (the 9) which shows the board | substrate selection process for imprint in one Embodiment of this invention. It is a flowchart (the 10) which shows the board | substrate selection process for imprint in one Embodiment of this invention. It is a flowchart (the 11) which shows the board | substrate selection process for imprint in one Embodiment of this invention. It is a flowchart (the 12) which shows the board | substrate selection process for imprint in one Embodiment of this invention. It is a flowchart which shows the imprint process in one Embodiment of this invention. It is the schematic which shows the imprint plan area | region and movement plan area group in one Embodiment of this invention. It is a conceptual diagram which shows the state which moved the transfer plan area | region which overlaps with a flatness defect area | region to the movement plan area | region in one Embodiment of this invention. It is the schematic which shows the other example of the imprint plan area | region in one Embodiment of this invention.

Hereinafter, embodiments of the present invention will be described with reference to the drawings.
<Apparatus configuration of imprint system>
As shown in FIG. 1, an imprint system 1 according to the present embodiment uses a substrate storage unit 2 that stores a plurality of substrates, and a predetermined imprint mold for the substrates stored in the substrate storage unit 2. The imprint apparatus 3 capable of performing imprint processing a plurality of times while changing the transfer position, the substrate transport apparatus 4 that transports the substrate stored in the substrate storage section 2 to the imprint apparatus 3, and the substrate storage section 2 A substrate suitable for imprint processing in the imprint apparatus 3 is selected from the plurality of stored substrates, and the substrate transport apparatus 4 is controlled to transport the board to the imprint apparatus 3, and the imprint apparatus 3 And a control device 5 for controlling the imprint process.

  The substrate storage unit 2 may be anything that can store at least each substrate in an identifiable manner, and includes a stocker that can store substrates in multiple stages, a substrate case that is assigned a management number, and the like. The substrate stored in the substrate storage unit 2 is not particularly limited as long as it can be used for imprint processing. Examples thereof include a silicon substrate, a quartz substrate, a glass substrate, and an SOI substrate. Further, a substrate on which notches, orientation flats and the like are formed may be used, or a substrate on which they are not formed, or both surfaces (front surface and back surface) of the substrate may be polished. In addition, although both surfaces of the substrate are polished, the surface treatment may be performed only on one surface (front surface), and the resin coating characteristics on the other surface (back surface) may not be good. Further, only one surface (surface) may be polished.

  The imprint apparatus 3 includes at least a stage on which a substrate is placed and a holding unit for pressing the substrate against the substrate on the stage while holding the imprint mold. The stage and / or the holding unit is XY. Examples having a mechanism that can be moved in the direction can be exemplified, and the stage and / or the holding unit may be rotated, or may not have the rotation mechanism. There may be.

  Examples of the substrate transport device 4 include those having a transport mechanism that holds the substrate stored in the substrate storage unit 2 and transports the substrate to the imprint device 3, with the held substrate being upside down. It may have a mechanism that can be transported to the imprint apparatus 3, a mechanism that can rotate the held substrate and transport it to the imprint apparatus 3, or may not have those mechanisms.

  As shown in FIG. 2, the control device 5 includes a CPU 51, a main storage unit 52 that stores various programs, an auxiliary storage unit 53 that temporarily stores data generated by the CPU 51, and the substrate transfer device 4. And a communication unit 54 for transmitting and receiving data to and from the imprint apparatus 3, a substrate database (substrate DB) 55 for storing data relating to the substrate stored in the substrate storage unit 2, and an imprint substrate A transferred substrate database (transferred substrate DB) 56 for storing data relating to a substrate (transferred substrate) selected by the selection process, and a substrate flatness defect area and an imprint scheduled area in the imprint substrate selection process. Candidate substrate database to be transferred (candidate substrate DB to be transferred) for storing data in which priority is given to the substrates determined to overlap. 7 and an imprint system database (imprint system) for storing data relating to imprint processing conditions based on the functions of the respective devices (substrate storage unit 2, imprint device 3, substrate transport device 4) constituting the imprint system 1 DB) 58.

  The CPU 51 reads out various data stored in the substrate DB 55, the transferred substrate DB 56, the transferred candidate substrate DB 57, the imprint system DB 58, etc., various data stored in the auxiliary storage unit 53, and stores them in the main storage unit 52. Various arithmetic processes are performed according to the instructions of the various programs.

  In the main storage unit 52, an imprint substrate selection program for selecting one substrate suitable for imprint processing in the imprint apparatus 3 from among a plurality of substrates stored in the substrate storage unit 2, a substrate transport device Various programs such as a conveyance control program for controlling the substrate conveyance process 4 and an imprint control program for controlling the imprint process by the imprint apparatus 3 are stored.

  In the auxiliary storage unit 53, input data from the user; various imprint condition data generated by the CPU 51 based on the input data; data acquired from each of the DBs 55 to 58; each overlap determination process described later (FIGS. 13 to 20) Data related to the scheduled overlapping transfer area specified in (see); data related to the scheduled movement area generated in the partial movement determination process (see FIGS. 21 to 23) described later; generated in the substrate selection process (see FIG. 24) described later. Various data such as data relating to the imprint area composed only of the planned transfer area that does not overlap with the flatness defect area is temporarily stored.

The input data from the user stored in the auxiliary storage unit 53 includes, for example, data relating to the number of devices scheduled to be manufactured by the imprint process in the imprint system 1 (that is, the total number of transfer times); Data related to the imprint scheduled area to be made; in the imprint system 1, the imprint planned area is relative to the substrate in accordance with the type and use of the device manufactured by the imprint process using the imprint system 1. Data regarding whether or not the user allows imprint processing in a state of being rotated to the right (rotation permission / rejection data); in the imprint system 1, imprinting in a state where the imprint scheduled area is moved relative to the substrate Data on whether or not the user allows print processing (movement permission / inhibition Data regarding whether or not the user allows imprint processing using the other side (back side) of the substrate in the imprint system 1 (back side use permission data); included in the imprint scheduled area in the imprint system 1 Related to whether or not the user allows imprint processing in a state where a part of a plurality of transfer scheduled areas is moved relative to the substrate (partial movement permission data); imprint in substrate selection processing In the X direction and the Y direction of the imprint scheduled area and the transfer scheduled area when performing the overlap determination process (see FIGS. 15, 16, 19, and 20) with the planned area moved relative to the substrate. Data relating to the movement distance (X _pitch , Y _pitch ) can be mentioned.

  Note that the imprint scheduled area data input by the user matches the center of the imprint scheduled area and the center of the board when, for example, the imprint scheduled area and the board are rectangular as shown in FIG. And the coordinate data of two points (point α in the lower left corner and point β in the upper right corner) that are located diagonally to the imprint planned area when the center of the substrate is the origin, and are included in the imprint planned area Coordinate data of two points (point α ′ in the lower left corner and point β ′ in the upper right corner) located at the opposite corners of each transfer planned area and position information (data consisting of a row number and a column number, for example). 3 includes the position information “1 (row) -1 (column)”.

  Further, the imprint condition data generated by the CPU 51 and stored in the auxiliary storage unit 53 can be imprinted in a state where the imprint scheduled area is rotated relative to the substrate in the imprint system 1. Data (rotation-related condition data) and data regarding whether imprint processing is possible in a state where the imprint scheduled area is moved relative to the substrate in the imprint system 1 ( Movement-related condition data), data on whether imprint processing using the other side (back side) of the substrate is possible in the imprint system 1 (back side-related condition data), and a partial transfer schedule in the imprint system 1 Whether imprint processing is possible with the region moved relative to the substrate. That data (partial mobile connection condition data) are included.

  For example, the conditions on the apparatus constituting the imprint system 1 (the imprint apparatus 3 has only one imprint mold holding direction relative to the substrate mounting direction in the imprint apparatus 3 and the imprint scheduled area is relative to the substrate. Imprint processing in a state where the substrate is rotated is impossible; it is impossible to transport the substrate to the imprint device 3 with the front and back sides being reversed in the substrate transport device 4; On the other side (back side) of the substrate, imprinting on the other side (back side) of the substrate is impossible) and post-transfer conditions (for example, after transfer) The imprint condition data can be generated in accordance with the dicing apparatus used in the step of cutting (dividing the substrate).

  As shown in FIG. 4, in the substrate DB 55, the identification information (substrate ID) of each substrate stored in the substrate storage unit 2, the storage location data of each substrate, and the flatness of the surface of the substrate measured in advance. Data and data unique to each board (board-specific data) are stored in association with each other. Data relating to the total number of substrates stored in the substrate storage unit 2 (substrate number data) is also stored.

  The flatness data on the surface of the substrate stored in the substrate DB 55 is coordinate data indicating an area with a poor flatness (an area with poor flatness) on the surface of the substrate. The flatness defect area on the surface of the substrate is, for example, a predetermined flatness when the flatness of the surface of the substrate is measured and analyzed using a flatness measuring device (for example, Lambda Ace series, manufactured by Dainippon Screen Co., Ltd.). A rectangular frame surrounding at least a region of degree (for example, 10 nm or more) is set, and two points (point A at the lower left corner of the rectangular frame) located at the opposite corner of the rectangular frame when the center of the surface of the substrate is the origin. And the coordinate data of the upper right corner point B) (refer to region No. F1, etc. in FIG. 4). Note that in this specification, an area having poor flatness refers to an area where the substrate itself has poor flatness, an area where the substrate is finely scratched, an area where fine foreign matter is attached to the substrate, and the like. Shall be included. Further, blank data (blank data) is stored in the substrate DB 55 as flatness data for substrates that do not have a flatness defect region (see substrate ID No. 3 in FIG. 4).

  The board-specific data stored in the board DB 55 includes imprint processing that is set according to the shape of the board (notches, orientation flats, etc.) and the area on the board where the resin cannot be uniformly applied. Data relating to the area on the substrate that permits the above (area set in a circle or rectangle not including notches, orientation flats, etc., front side (back side) transfer permitted area; area surrounded by a two-dot broken line shown in FIG. 3), The data (whether the back side related data including the back side usable data or the back side unusable data) regarding whether or not imprint processing can be performed on the back side of the substrate can be exemplified.

  For example, if the surface is polished only on the surface of the substrate, even if both surfaces of the substrate are polished, only the surface is subjected to surface treatment, so that the resin coating characteristics on the back surface are not good. If it is, the back side unusable data is stored in the board DB 55. In addition, regarding the substrate in which the back surface usable data is stored in the substrate DB 55, data on the back surface flatness defect area (back surface flatness data) and data on the back surface transfer permission area, which are measured in advance, are also stored ( (See area No. B1, etc. in FIG. 4).

  As shown in FIG. 6, the transfer substrate DB 56 includes a substrate ID of the substrate selected as the transfer substrate by the imprint substrate selection process, data on the storage location of the substrate, and imprint processing condition data (for example, Data relating to the rotation of the substrate, data relating to the movement distance of the imprint scheduled region or a part of the transfer scheduled region relative to the substrate, data relating to use of the back side of the substrate, etc.

  As shown in FIG. 7, in the transfer candidate substrate DB 57, the substrate ID of the substrate determined to have overlapped with the imperfect substrate flatness region and the imprint scheduled region by the imprint substrate selection process, Data relating to the storage location, imprint processing condition data, number information and position information of the transfer scheduled area overlapping the flatness defect area of the substrate, and data relating to the priority assigned to the substrate are stored in association with each other. ing.

  The imprint system DB 58 stores the imprint scheduled area relative to the substrate based on the function of each device (the substrate storage unit 2, the imprint device 3, and the substrate transport device 4) constituting the imprint system 1. Data on whether imprint processing in a rotated state is possible (rotation availability data), data on whether imprint processing using the other side (back side) side of the substrate is possible (use of back side (Allowability data) and the like are stored.

  For example, imprint processing is not possible in the imprint apparatus 3 in which the imprint mold is held in only one direction relative to the substrate placement direction and the imprint scheduled area is rotated relative to the substrate. In the case of the imprint apparatus 3 that can be used, rotation enable / disable data of “unrotatable” is stored. Further, if it is impossible for the substrate transport device 4 to transport the substrate to the imprint device 3 with the front and back sides reversed, back side availability data indicating that the back surface cannot be used is stored. Furthermore, if the imprint processing on the back side of the substrate is impossible due to the storage environment of the substrate in the substrate storage unit 2 due to the storage environment of the substrate, the back side availability data indicating that the back side cannot be used is displayed. Stored. On the other hand, in the state where the imprint scheduled area is rotated relative to the substrate based on the function of each device (substrate storage unit 2, imprint device 3, substrate transport device 4) constituting the imprint system 1. Rotation propriety data of “Rotation possible” is possible when the imprint process is possible, and back side availability data is “Possible of back side” when imprint process using the back side of the substrate is possible. Is stored in the imprint system DB 58.

<Processing in imprint system>
Processing operations in the imprint system 1 having such a configuration will be described. 8 to 12 are flowcharts showing the imprint condition data generation processing, FIGS. 13 to 24 are flowcharts showing the imprint substrate selection processing, and FIG. 25 is selected by the imprint substrate selection processing. It is a flowchart which shows the imprint process in the imprint system 1 using a board | substrate.

<Imprint condition data generation processing>
First, a substrate for manufacturing a predetermined number (N) of semiconductor devices is selected by imprint processing, and imprint condition data generation processing is performed in advance when imprint processing is performed on the substrate.

  First, data related to imprint conditions allowed by the user (rotation permission / rejection data, movement permission / rejection data, back surface use permission / rejection data, partial movement permission / rejection data), and data related to an imprint scheduled area formed by arranging a plurality of transfer scheduled areas. In addition, data related to the number of devices to be manufactured (N) by imprint processing is input by the user, and each input data is stored in the auxiliary storage unit 53. The CPU 51 performs a process of generating imprint condition data (see FIG. 8) as described later based on data input by the user and stored in the auxiliary storage unit 53.

As shown in FIG. 8, first, the CPU 51 performs a process of generating movement related condition data (S1).
In the movement related condition data generation processing, as shown in FIG. 9, it is determined whether or not the movement permission / rejection data stored in the auxiliary storage unit 53 includes data “movement permission” (S11). When the movement permission / rejection data does not include data indicating “movement permission” (S11, No), the CPU 51 generates movement related condition data including data indicating “movement not possible” and stores it in the auxiliary storage unit 53 (S12). . On the other hand, when the movement permission / rejection data includes data indicating “movement permission” (S11, Yes), the CPU 51 generates movement related condition data including data indicating “moveable” and stores it in the auxiliary storage unit 53 ( S13). After the movement related condition data is generated in this way, the process returns to the imprint condition data generation process (FIG. 8).

Next, as shown in FIG. 8, the CPU 51 performs processing for generating rotation-related condition data (S2).
In such rotation-related condition data generation processing, as shown in FIG. 10, the CPU 51 determines whether or not the rotation permission / rejection data stored in the auxiliary storage unit 53 includes data “rotation permission” ( S21).

  When the rotation permission / rejection data does not include data indicating “rotation permission” (No in S21), the CPU 51 generates rotation-related condition data including data indicating “rotation disabled” and stores it in the auxiliary storage unit 53 (S22). ).

  When the rotation permission / denial data includes data indicating “rotation permission” (S21, Yes), the CPU 51 acquires the rotation permission data from the imprint system DB 58 (S23), and the rotation permission data is “rotation permission” data. It is determined whether or not it includes (S24).

  When the rotation permission / prohibition data does not include data indicating “rotation enabled” (No in S24), the CPU 51 generates rotation related condition data including data indicating “rotation disabled” and stores it in the auxiliary storage unit 53 (S22). .

  When the rotation permission / prohibition data includes data indicating “rotation enabled” (S24, Yes), the CPU 51 acquires the imprint scheduled area data stored in the auxiliary storage unit 53 (S25), and the imprint scheduled area. Based on the data, the rotational symmetry number of the imprint scheduled area is determined, and it is determined whether or not the imprint scheduled area has a four-fold symmetrical shape such as a square (S26).

  When it is determined that the imprint scheduled area has a four-fold symmetry shape (S26, Yes), the CPU 51 generates rotation-related condition data including data “unrotated” and stores it in the auxiliary storage unit 53 (S22). ).

  When it is determined that the imprint scheduled area has a biaxial symmetry shape such as a rectangle and is not a four-fold symmetry shape (S26, No), the CPU 51 determines rotation-related condition data including data “rotation possible”. Is stored in the auxiliary storage unit 53 (S27). After the rotation-related condition data is generated in this way, the process returns to the imprint condition data generation process (FIG. 8).

Subsequently, as shown in FIG. 8, the CPU 51 performs a process of generating back surface related condition data (S3).
In such back surface related condition data generation processing, as shown in FIG. 11, the CPU 51 determines whether or not the back surface use permission / rejection data stored in the auxiliary storage unit 53 includes data of “back surface permission” ( S31).

  When the back side use permission / rejection data does not include data indicating “back side permission” (S31, No), the CPU 51 generates back side related condition data including data indicating “back side not possible” and stores it in the auxiliary storage unit 53 (S32). ).

  When the back surface use permission / denial data includes data indicating “back surface permission” (S31, Yes), the CPU 51 acquires the back surface use permission data from the imprint system DB 58 (S33), and the back surface use permission data is “back surface ready”. It is determined whether or not data is included (S34).

  When the back surface availability data does not include data indicating “back surface is acceptable” (No in S34), the CPU 51 generates back surface related condition data including data indicating “back surface is unacceptable” and stores it in the auxiliary storage unit 53 (S32). ).

  When the back side availability data includes data indicating “back side acceptable” (Yes in S34), the CPU 51 generates back side related condition data including data “back side acceptable” and stores it in the auxiliary storage unit 53 (S35). ). After generating the back surface related condition data in this way, the process returns to the imprint condition data generation process (FIG. 8).

Finally, as shown in FIG. 8, the CPU 51 performs a process of generating partial movement related condition data (S4).
In the partial movement related condition data generation process, as shown in FIG. 12, the CPU 51 determines whether or not the partial movement permission / rejection data stored in the auxiliary storage unit 53 includes data indicating “partial movement permission”. Is determined (S41).

  If the partial movement permission / rejection data does not include data indicating “partial movement permission” (No in S41), the CPU 51 generates partial movement related condition data including data indicating “partial movement not permitted”, and stores auxiliary data. The data is stored in the unit 53 (S42). On the other hand, when the partial movement permission / inhibition data includes data indicating “partial movement permission” (Yes in S41), the CPU 51 generates partial movement-related condition data including data indicating “partial movement is permitted” to assist It memorize | stores in the memory | storage part 53 (S43). After generating the movement related condition data in this way, the imprint condition data generation process (FIG. 8) is terminated.

<Imprint substrate selection process-normal transfer position>
Subsequently, an imprint substrate selection process is performed.
As shown in FIG. 13, the CPU 51 acquires one substrate ID, storage location data, and flatness data stored in the substrate DB 55, stores them in the auxiliary storage unit 53 (S 001), and stores them in the auxiliary storage unit 53. It is determined whether or not the flatness data thus obtained includes data relating to a flatness defect area (S002). Specifically, it is determined whether or not the flatness data includes coordinate data of a flatness failure area. In step S001, based on the imprint scheduled area data input in advance by the user, a transfer permitted area (front side transfer permitted area, back side transfer permitted area) having a size that can include all the imprint planned areas. ) Is arbitrarily selected, and data relating to the selected substrate is acquired.

  If it is determined that the flatness data does not include data related to the flatness failure area, that is, the flatness data has blank data (blank data) (S002, No), the substrate ID and the storage location data are associated with each other. The data is stored in the transfer substrate DB 56 (S003), and the process proceeds to S901 described later.

If it is determined that the flatness data includes data related to the flatness failure area (S002, Yes), the flatness failure area is based on the flatness data and the imprint scheduled area data stored in the auxiliary storage unit 53. X-coordinate value of point A and X-coordinate value of point α in the imprint scheduled area, Y-coordinate value of point A in imperfect flatness area, Y-coordinate value of point α in imprint improper area, and flatness defective area point The X coordinate value of B and the X coordinate value of the point β in the imprint scheduled area, the Y coordinate value of the point B in the poor flatness area, and the Y coordinate value of the point β in the imprint scheduled area are respectively compared, and the points A and Large values of the coordinate values of the point α are defined as X _left and Y _low , respectively, and small values of the coordinate values of the point B and the point β are defined as X _right and Y _up , respectively (S004).

Next, the CPU 51 compares X _left and X _right , determines whether X _left is smaller than X _right (S005), and determines that X _left is larger than X _right (S005, No). Then, it is determined that the flatness defect area and the imprint scheduled area do not overlap, and the process proceeds to S008 described later.

On the other hand, when it is determined that X _left is smaller than X _right (S005, Yes), the CPU 51 compares Y _low and Y _up to determine whether Y _low is smaller than Y _up (S006).

If it is determined that Y _low is greater than Y _up (S006, No), it is determined that the flatness defect area and the imprint scheduled area do not overlap, and the process proceeds to S008 described later.

When it is determined that Y _low is smaller than Y _up (S006, Yes), the CPU 51 determines that the flatness defect area and the imprint scheduled area overlap, and a plurality of transfer schedules included in the imprint scheduled area. Among the areas, a transfer scheduled area (overlapping transfer scheduled area) overlapping the poor flatness area is specified and stored in the auxiliary storage unit 53 (S007).

  Specifically, the transfer scheduled area overlapping the poor flatness area can be specified as follows.

  First, an area to be transferred in which the X coordinate value and the Y coordinate value of the point α ′ are smaller than the X coordinate value and the Y coordinate value of the point B of the poor flatness area (the X coordinate value of the point α ′ <the point The X coordinate value of B and the Y coordinate value of point α ′ <the Y coordinate value of point B) are extracted. Next, in the extracted transfer planned area, each of the X coordinate value and the Y coordinate value of the point β ′ is larger than each of the X coordinate value and the Y coordinate value of the point A of the poor flatness area. A region (X coordinate value of point β ′> X coordinate value of point A and Y coordinate value of point β ′> Y coordinate value of point A) is further extracted. The transfer planned area extracted in this way can be specified as the overlap transfer planned area.

  Next, the CPU 51 determines whether or not other flatness defect area data that has not been determined whether or not it overlaps with the imprint scheduled area is stored in the auxiliary storage unit 53 (S008). If it is determined that the defective area data is stored (S008, Yes), the processes of S004 to S007 are performed again, and if it is determined that no other flatness defective area data is stored (S008). , No), it is determined whether or not the overlapping transfer scheduled area is specified in S007 (S009).

  If it is determined that the overlapping transfer scheduled area is not specified (S009, No), the CPU 51 associates the substrate ID and the storage location data and stores them in the transferred substrate DB 56 (S003), and proceeds to the processing of S901 described later. .

  On the other hand, if it is determined that the overlapping transfer scheduled area is specified (S009, Yes), the CPU 51 associates the substrate ID, the storage location data, and the overlapping transfer scheduled area data with each other and stores them in the transfer target substrate DB 57. (S010).

<Imprint substrate selection process-rotation>
After the various data are associated and stored in the transfer candidate substrate DB 57 in S010, rotation-related condition data stored in the auxiliary storage unit 53 is acquired as shown in FIG. 14, and based on the rotation-related condition data. Thus, it is determined whether or not the imprint process can be performed in a state where the imprint scheduled area is rotated relative to the substrate (S101).

  If it is determined that rotation is not possible (S101, No), the process proceeds to the next overlap determination process (see FIG. 15). On the other hand, when it is determined that the rotation is possible (S101, Yes), the CPU 51 rotates 90 degrees around the axis about the center of the substrate based on the flatness data stored in the auxiliary storage unit 53. The coordinates of the point A and the point B in the poor flatness area are calculated, and the coordinate data and the data regarding the number of coordinate calculations are stored in the auxiliary storage unit 53 (S102).

Next, the CPU 51 determines the X coordinate value and the imprint of the point A of the poor flatness area based on the imprint scheduled area data stored in the auxiliary storage unit 53 and the coordinate data of the flatness poor area after the substrate rotation. The X coordinate value of the point α in the scheduled area, the Y coordinate value of the point A in the poor flatness area, the Y coordinate value of the point α in the imprint scheduled area, the X coordinate value of the point B in the poor flatness area, and the scheduled imprint area The X coordinate value of the point β of Y, the Y coordinate value of the point B of the poor flatness region, and the Y coordinate value of the point β of the imprint scheduled region are respectively compared, and the larger of the coordinate values of the point A and the point α Values are defined as X _left and Y _low , respectively, and small values of the coordinate values of point B and point β are defined as X _right and Y _up , respectively (S103).

Next, the CPU 51 compares X _left and X _right , determines whether X _left is smaller than X _right (S104), and determines that X _left is larger than X _right (S104, No). Then, it is determined that the flatness defect area and the imprint scheduled area do not overlap, and the process proceeds to S107 described later.

On the other hand, when it is determined that X _left is smaller than X _right (S104, Yes), the CPU 51 compares Y _low and Y _up to determine whether Y _low is smaller than Y _up (S105).

If it is determined that Y _low is greater than Y _up (S105, No), it is determined that the flatness defect area and the imprint scheduled area do not overlap, and the process proceeds to S107 described later.

When it is determined that Y _low is smaller than Y _up (S105, Yes), the CPU 51 determines that the flatness defect area and the imprint scheduled area overlap, and a plurality of transfer schedules included in the imprint scheduled area. Among the areas, a transfer scheduled area (overlapping transfer scheduled area) that overlaps the poor flatness area is specified and stored in the auxiliary storage unit 53 (S106).

  Subsequently, the CPU 51 determines whether or not other flatness defect area data that has not been determined whether or not there is an overlap with the imprint scheduled area is stored in the auxiliary storage unit 53 (S107). When it is determined that the defective area data is stored (S107, Yes), the processes of S103 to S106 are performed again, and when it is determined that the other flatness defective area data is not stored (S107). , No), it is determined whether or not the overlapping transfer scheduled area is specified in S106 (S108).

  If it is determined that the overlapping transfer scheduled area is not specified (S108, No), the CPU 51 associates the substrate ID, the storage location data, and the imprint processing condition data and stores them in the transferred substrate DB 56 (S109). Then, the process proceeds to S901 described later.

  On the other hand, if it is determined that the overlapping transfer scheduled area has been specified (S108, Yes), the CPU 51 correlates the substrate ID, the storage location data, the overlapping transfer scheduled area data, and the imprint processing condition data. The data is stored in the transfer candidate substrate DB 57 (S110).

<Imprint substrate selection processing-movement>
After associating various data in S110 and storing them in the transfer target substrate DB 57, or after determining that rotation is not possible in S101, the movement-related information stored in the auxiliary storage unit 53 as shown in FIG. Condition data is acquired, and based on the movement-related condition data, it is determined whether or not imprint processing is possible in a state where the imprint scheduled area is moved relative to the substrate (S201).

  When it is determined that the movement is impossible (No in S201), the process proceeds to an overlap determination process (see FIG. 17) related to the use of the back surface, which will be described later. On the other hand, if it is determined that the movement is possible (S201, Yes), the CPU 51 acquires transfer-permitted region data on the surface side of the substrate from the substrate DB 55 based on the substrate ID (S202), and the coordinate data of the transfer-permitted region. A rectangular area (moving area) that serves as a reference for moving the scheduled imprint area is set from the coordinate data of the scheduled imprint area, and the coordinate data of the moving area is calculated and stored in the auxiliary storage unit 53 (S203). ).

It should be noted that the coordinate data of the moving area (the coordinate data of the points A ′ and B ′ located at the diagonal of the rectangular area (points A ′ (x _{A ′} , y _{A ′} ), point B ′ (x _{B ′} , y _B )) _' ); See FIG. 3) is obtained from the coordinate data of the point α ″ and the point β ″ of the transfer permitted region and the coordinate data of the point α and the point β of the imprint scheduled region. ).

x _{A ′} = x _{α ″} −x _α (1)
y _{A ′} = y _{α ″} −y _α (2)
x _{B ′} = x _{β ″} −x _β (3)
y _{B ′} = y _{β ″} −y _β (4)

The CPU 51 draws auxiliary lines parallel to the X-axis and the Y-axis passing through the center of the scheduled imprint area into the moving area, and data on the moving distance (X _pitch , Y _pitch ) stored in the auxiliary storage unit 53. Based on the above, draw an auxiliary line parallel to each auxiliary line and separated for each movement distance, calculate the coordinates of the intersection of each auxiliary line and the intersection of each auxiliary line and the outermost periphery of the moving area, The data is stored in the auxiliary storage unit 53 (S204).

  Next, the coordinate data (coordinate values of the points α and β) of the imprint scheduled area when the center of the imprint planned area is moved to any one intersection in the movement area is calculated, and the auxiliary storage unit 53 is calculated. (S205).

Subsequently, based on the flatness data stored in the auxiliary storage unit 53 and the coordinate data of the imprint scheduled area after movement, the CPU 51 determines the X coordinate value of the point A of the poor flatness area and the point of the imprint scheduled area. The X coordinate value of α, the Y coordinate value of the point A in the poor flatness region, the Y coordinate value of the point α in the imprint scheduled region, the X coordinate value of the point B in the poor flatness region, and the point β of the imprint planned region The X coordinate value, the Y coordinate value of the point B of the poor flatness area, and the Y coordinate value of the point β of the imprint scheduled area are respectively compared, and the larger one of the coordinate values of the point A and the point α is set to X. _Left and Y _low are defined, and small values of the coordinate values of the points B and β are defined as X _right and Y _up , respectively. Then, the CPU 51 compares X _left and X _right and determines whether X _left is smaller than X _right (S206).

If it is determined that X _left is greater than X _right (No in S206), it is determined that the flatness defect area and the imprint scheduled area do not overlap, and the process proceeds to S209 described later.

On the other hand, when it is determined that X _left is smaller than X _right (S206, Yes), the CPU 51 compares Y _low and Y _up to determine whether Y _low is smaller than Y _up (S207). If it is determined that Y _low is greater than Y _up (S207, No), it is determined that the flatness defect area and the imprint scheduled area do not overlap, and the process proceeds to S209 described later.

On the other hand, when it is determined that Y _low is smaller than Y _up (S207, Yes), the CPU 51 among the plurality of scheduled transfer areas included in the scheduled imprint area, the scheduled transfer area that overlaps the poor flatness area ( The overlapping transfer scheduled area) is specified and stored in the auxiliary storage unit 53 (S208).

  Subsequently, the CPU 51 determines whether or not other flatness defect area data that has not been determined whether or not there is an overlap with the imprint scheduled area is stored in the auxiliary storage unit 53 (S209). When it is determined that the defective area data is stored (S209, Yes), the processes of S206 to S208 are performed again, and when it is determined that the other flatness defective area data is not stored (S209). , No), it is determined whether or not the overlapping transfer scheduled area is specified in S208 (S210).

  If it is determined that the overlapping transfer scheduled area has not been specified (S210, No), the CPU 51 associates the substrate ID, the storage location data, and the imprint processing condition data with each other and stores them in the transferred substrate DB 56 (S211). Then, the process proceeds to S901 described later.

  On the other hand, if it is determined that the overlap transfer scheduled area has been specified (S210, Yes), the CPU 51 determines whether or not the overlap determination process has been performed at all the intersections (S212), and the overlap determination process at all the intersections. If it is determined that the process is not performed (S212, No), the processes of S205 to S210 are performed again.

  If it is determined that the overlap determination process has been performed at all the intersections (S212, Yes), the CPU 51 associates the substrate ID, the storage location data, the overlap transfer scheduled area data, and the imprint process condition data, and the transfer candidate. It stores in board | substrate DB57 (S213).

<Imprint substrate selection processing-rotation / movement>
After associating various data in the above S213 and storing them in the transfer target substrate DB 57, as shown in FIG. It is determined whether or not the imprint process can be performed in a state where is rotated relative to the substrate (S301).

  When it is determined that rotation is not possible (No in S301), the process proceeds to the next overlap determination process (see FIG. 17). On the other hand, when it is determined that the rotation is possible (S301, Yes), the CPU 51 uses the center of the substrate as an axis based on the flatness data stored in the auxiliary storage unit 53 to rotate 90 degrees around the axis. The coordinates of the point A and the point B in the poor flatness area are calculated, and the coordinate data and data relating to the number of coordinate calculations are stored in the auxiliary storage unit 53 (S302).

  Next, the CPU 51 sets each intersection coordinate of the moving area on the board (the moving area set in S203 above (see FIG. 3)) when the imprint scheduled area is rotated relative to the board. The coordinates of each intersection point of the region rotated 90 degrees around the axis is calculated and stored in the auxiliary storage unit 53 (S303).

  Then, the CPU 51 calculates coordinate data (coordinate values of the points α and β) of the scheduled imprint area when the center of the scheduled imprint area is moved to an arbitrary intersection, and stores the coordinate data in the auxiliary storage unit 53. (S304).

Subsequently, the CPU 51 determines the X coordinate value of the point A of the poor flatness area based on the coordinate data of the flatness defective area after rotation and the coordinate data of the imprint scheduled area after movement stored in the auxiliary storage unit 53. And the X coordinate value of the point α in the imprint scheduled area, the Y coordinate value of the point A in the imperfect flatness area, the Y coordinate value of the point α in the imprint improper area, the X coordinate value of the point B in the imperfect flatness area, and the in The X coordinate value of the point β in the planned print area, the Y coordinate value of the point B in the poor flatness area, and the Y coordinate value of the point β in the imprint planned area are respectively compared, and each coordinate value of the point A and the point α is compared. The larger values are defined as X _left and Y _low , respectively, and the smaller values of the coordinate values of point B and point β are defined as X _right and Y _up , respectively. Then, the CPU 51 compares X _left and X _right and determines whether X _left is smaller than X _right (S305).

If it is determined that X _left is greater than X _right (No in S305), it is determined that the flatness defect area and the imprint scheduled area do not overlap, and the process proceeds to S308 described later.

On the other hand, when it is determined that X _left is smaller than X _right (S305, Yes), the CPU 51 compares Y _low and Y _up to determine whether Y _low is smaller than Y _up (S306). If it is determined that Y _low is greater than Y _up (No in S306), it is determined that the flatness defect area and the imprint scheduled area do not overlap, and the process proceeds to S308 described later.

On the other hand, if it is determined that Y _low is smaller than Y _up (S306, Yes), the CPU 51 among the plurality of scheduled transfer areas included in the scheduled imprint area, the scheduled transfer area (overlapping with the poor flatness area) ( The overlapping transfer scheduled area) is specified and stored in the auxiliary storage unit 53 (S307).

  Subsequently, the CPU 51 determines whether or not other flatness defect area data that has not been determined whether or not there is an overlap with the imprint scheduled area is stored in the auxiliary storage unit 53 (S308). When it is determined that the defective area data is stored (S308, Yes), the processes of S305 to S307 are performed again, and when it is determined that the other flatness defective area data is not stored (S308). , No), it is determined whether or not the overlapping transfer scheduled area is specified in S307 (S309).

  If it is determined that the overlapping transfer scheduled area has not been specified (S309, No), the CPU 51 associates the substrate ID, the storage location data, and the imprint processing condition data with each other and stores them in the transferred substrate DB 56 (S310). Then, the process proceeds to S901 described later.

  On the other hand, if it is determined that the overlap transfer scheduled area has been specified (S309, Yes), the CPU 51 determines whether or not the overlap determination process has been performed at all the intersections (S311), and the overlap determination process at all the intersections. If it is determined that the process is not performed (S311, No), the processes of S304 to S309 are performed again.

  On the other hand, if it is determined that the overlap determination process has been performed at all the intersections (S311, Yes), the CPU 51 associates the substrate ID, the storage location data, the overlap transfer scheduled area data, and the imprint process condition data in association with each other. The data is stored in the transfer candidate substrate DB 57 (S312).

<Imprint substrate selection process-back>
After it is determined that the movement is impossible in S201, after it is determined that the rotation is impossible in S301, or after various data are associated and stored in the transfer target substrate DB 57 in S312, as shown in FIG. The board-specific data stored in the board DB 55 and the back side use-related condition data stored in the auxiliary storage unit 53 are acquired, and it is determined whether imprint processing using the back side of the board is possible (see FIG. S401).

  When it is determined that the back side cannot be used (S401, No), the process proceeds to the subsequent overlap determination process (see FIG. 21). On the other hand, if it is determined that the back surface can be used (S401, Yes), it is determined whether or not the flatness data stored in the auxiliary storage unit 53 includes data on the flatness defect area on the back surface side (S402). If it is determined that the flatness data does not include data related to the flatness defect area on the back side (S402, No), the substrate ID, the storage location data, and the imprint processing condition data are associated with each other and stored in the transferred substrate DB 56. (S403), the process proceeds to S901 described later.

On the other hand, when it is determined that the flatness data includes data regarding the flatness defect area on the back side (S402, Yes), the CPU 51 stores the flatness data and the imprint scheduled area data stored in the auxiliary storage unit 53. , The X coordinate value of the point A of the poor flatness area on the back surface side, the X coordinate value of the point α of the imprint scheduled area, the Y coordinate value of the point A of the flatness defective area on the back surface side, and the imprint scheduled area Y-coordinate value of point α, X-coordinate value of point B in the imperfect flatness area on the back side, X-coordinate value of point β in the imprint scheduled area, and Y-coordinate value of point B in the imperfect flatness area on the back side And the Y coordinate value of the point β of the area to be imprinted are respectively compared, and the larger one of the coordinate values of the point A and the point α is defined as X _left and Y _low , respectively. X smaller values ones of the values respectively _right及It is defined as the Y _up (S404).

The CPU 51 compares X _left and X _right and determines whether X _left is smaller than X _right (S405). If it is determined that X _left is greater than X _right (No in S405), it is determined that the flatness defect area on the back side and the imprint scheduled area do not overlap, and the process proceeds to S408 described later.

On the other hand, when it is determined that X _left is smaller than X _right (S405, Yes), the CPU 51 compares Y _low and Y _up to determine whether Y _low is smaller than Y _up (S406).

If it is determined that Y _low is greater than Y _up (S406, No), it is determined that the flatness defect area on the back side and the imprint scheduled area do not overlap, and the process proceeds to S408 described later.

If it is determined that Y _low is smaller than Y _up (S406, Yes), the CPU 51 determines that the flatness defect area on the back side and the imprint scheduled area overlap, and a plurality of included in the imprint scheduled area are included. Among the scheduled transfer regions, a scheduled transfer region (overlapping transfer scheduled region) that overlaps the flatness defect region on the back side is specified and stored in the auxiliary storage unit 53 (S407).

  Next, the CPU 51 determines whether or not other back side flatness defect area data that has not been determined whether or not there is an overlap with the imprint scheduled area is stored in the auxiliary storage unit 53 (S408). When it is determined that the back side flatness defect area data is stored (S408, Yes), the processes of S404 to S407 are performed again, and it is determined that no other flatness defect area data is stored. (S408, No), it is determined whether or not the overlapping transfer scheduled area is specified in S407 (S409).

  If it is determined that the overlapping transfer scheduled area is not specified (S409, No), the CPU 51 associates the substrate ID, the storage location data, and the imprint processing condition data and stores them in the transferred substrate DB 56 (S403). Then, the process proceeds to S901 described later.

  On the other hand, if it is determined that the overlapping transfer scheduled area has been specified (S409, Yes), the CPU 51 associates the substrate ID, the storage location data, the overlapping transfer scheduled area data, and the imprint processing condition data in association with each other. The data is stored in the transfer candidate substrate DB 57 (S410).

<Imprint substrate selection process-back side, rotation>
In step S410, the substrate ID, the storage location data, the overlapping transfer area data, and the imprint processing condition data are stored in the transfer candidate substrate DB 57 in association with each other, and then the CPU 51 stores the transfer in the substrate DB 55 as shown in FIG. Whether or not imprint processing can be performed in a state in which the imprint scheduled area is relatively rotated with respect to the substrate. Is determined (S501).

  If it is determined that rotation is not possible (S501, No), the process proceeds to the next overlap determination process (see FIG. 19). On the other hand, when it is determined that the rotation is possible (S501, Yes), the CPU 51 rotates 90 degrees around the axis about the center of the substrate based on the flatness data stored in the auxiliary storage unit 53. The coordinates of the point A and the point B of the flatness defect area on the back side are calculated, and the coordinate data and data relating to the number of coordinate calculations are stored in the auxiliary storage unit 53 (S502).

Next, based on the imprint scheduled area data stored in the auxiliary storage unit 53 and the coordinate data of the flatness defect area on the back surface side after the substrate rotation, the CPU 51 determines the X of the point A of the flatness defect area on the back surface side. The coordinate value and the X coordinate value of the point α in the planned imprint area, the Y coordinate value of the point A in the poor flatness area on the back side, the Y coordinate value of the point α in the planned imprint area, and the flatness defective area on the back side The X coordinate value of point B and the X coordinate value of point β in the imprint planned area, the Y coordinate value of point B in the flatness poorness area on the back side, and the Y coordinate value of point β in the imprint planned area are respectively compared. , The larger values of the coordinate values of the points A and α are defined as X _left and Y _low , respectively, and the smaller values of the coordinate values of the points B and β are defined as X _right and Y _up , respectively. (S503).

The CPU 51 compares X _left and X _right and determines whether X _left is smaller than X _right (S504). When it is determined that X _left is greater than X _right (S504, No), it is determined that the flatness defect area on the back side and the imprint scheduled area do not overlap, and the process proceeds to S507 described later.

On the other hand, when it is determined that X _left is smaller than X _right (S504, Yes), the CPU 51 compares Y _low and Y _up to determine whether Y _low is smaller than Y _up (S505). If it is determined that Y _low is greater than Y _up (S505, No), it is determined that the flatness defect area on the back side and the imprint scheduled area do not overlap, and the process proceeds to S507 described later.

On the other hand, when it is determined that Y _low is smaller than Y _up (S505, Yes), the CPU 51 determines that the flatness defect area and the imprint scheduled area overlap with each other, and the plurality of areas included in the imprint scheduled area are determined. Among the scheduled transfer areas, a scheduled transfer area (overlapping transfer scheduled area) that overlaps the flatness defect area on the back side is specified and stored in the auxiliary storage unit 53 (S506).

  Subsequently, the CPU 51 determines whether or not other back side flatness defect area data that has not been determined whether or not there is an overlap with the imprint scheduled area is stored in the auxiliary storage unit 53 (S507). When it is determined that the back side flatness defect area data is stored (S507, Yes), the processes of S503 to S506 are performed again and it is determined that no other flatness defect area data is stored. (S507, No), it is determined whether or not the overlapping transfer scheduled area is specified in S506 (S508).

  If it is determined that the overlapping transfer scheduled area is not specified (S508, No), the CPU 51 associates the substrate ID, the storage location data, and the imprint processing condition data and stores them in the transferred substrate DB 56 (S509). Then, the process proceeds to S901 described later.

  On the other hand, if it is determined that the overlapping transfer scheduled area is specified (S508, Yes), the CPU 51 associates the substrate ID, the storage location data, the overlapping transfer scheduled area data, and the imprint processing condition data in association with each other. The data is stored in the transfer candidate substrate DB 57 (S510).

<Imprint substrate selection processing-back side / movement>
After associating various data in S510 and storing them in the transfer target substrate DB 57, or after determining that rotation is not possible in S501, as shown in FIG. Condition data is acquired, and based on the movement-related condition data, it is determined whether imprint processing can be performed in a state where the imprint scheduled area is moved relative to the substrate (S601).

  When it is determined that the movement is impossible (S601, No), the process proceeds to an overlap determination process (see FIG. 22) described later. On the other hand, if it is determined that the movement is possible (S601, Yes), the CPU 51 acquires transfer permission area data on the back side of the substrate from the substrate DB 55 based on the substrate ID (S602), and the coordinate data of the transfer permission area and A rectangular area (moving area) serving as a reference for moving the scheduled imprint area is set from the coordinate data of the scheduled imprint area, and the coordinate data of the moving area is calculated and stored in the auxiliary storage unit 53 (S603). ).

It should be noted that the coordinate data of the moving area (the coordinate data of the points A ′ and B ′ located at the diagonal of the rectangular area (points A ′ (x _{A ′} , y _{A ′} ), point B ′ (x _{B ′} , y _B )) _' ); See FIG. 3) is obtained from the coordinate data of the point α ″ and the point β ″ of the transfer permitted region and the coordinate data of the point α and the point β of the imprint scheduled region. ).

x _{A ′} = x _{α ″} −x _α (1)
y _{A ′} = y _{α ″} −y _α (2)
x _{B ′} = x _{β ″} −x _β (3)
y _{B ′} = y _{β ″} −y _β (4)

The CPU 51 draws auxiliary lines parallel to the X-axis and the Y-axis passing through the center of the scheduled imprint area into the moving area, and data on the moving distance (X _pitch , Y _pitch ) stored in the auxiliary storage unit 53. Based on the above, draw an auxiliary line parallel to each auxiliary line and separated for each movement distance, calculate the coordinates of the intersection of each auxiliary line and the intersection of each auxiliary line and the outermost periphery of the moving area, The data is stored in the auxiliary storage unit 53 (S604).

  Next, the coordinate data (coordinate values of the points α and β) of the imprint scheduled area when the center of the imprint planned area is moved to any one intersection in the movement area is calculated, and the auxiliary storage unit 53 is calculated. (S605).

Subsequently, based on the flatness data stored in the auxiliary storage unit 53 and the coordinate data of the imprint scheduled area after movement, the CPU 51 determines the X coordinate value of the point A of the poor flatness area and the point of the imprint scheduled area. The X coordinate value of α, the Y coordinate value of the point A in the poor flatness region, the Y coordinate value of the point α in the imprint scheduled region, the X coordinate value of the point B in the poor flatness region, and the point β of the imprint planned region The X coordinate value, the Y coordinate value of the point B of the poor flatness area, and the Y coordinate value of the point β of the imprint scheduled area are respectively compared, and the larger one of the coordinate values of the point A and the point α is set to X. _Left and Y _low are defined, and small values of the coordinate values of the points B and β are defined as X _right and Y _up , respectively. Then, the CPU 51 compares X _left and X _right and determines whether X _left is smaller than X _right (S606).

If it is determined that X _left is larger than X _right (No in S606), it is determined that the flatness defect area and the imprint scheduled area do not overlap, and the process proceeds to S609 described later.

On the other hand, when it is determined that X _left is smaller than X _right (S606, Yes), the CPU 51 compares Y _low and Y _up to determine whether Y _low is smaller than Y _up (S607). If it is determined that Y _low is greater than Y _up (S607, No), it is determined that the flatness defect area and the imprint scheduled area do not overlap, and the process proceeds to S609 described later.

On the other hand, when it is determined that Y _low is smaller than Y _up (S607, Yes), the CPU 51 among the plurality of scheduled transfer areas included in the scheduled imprint area, the scheduled transfer area overlapping the poor flatness area ( The overlap transfer scheduled area) is specified and stored in the auxiliary storage unit 53 (S608).

  Subsequently, the CPU 51 determines whether or not other flatness defect area data that has not been determined whether or not it overlaps with the imprint scheduled area is stored in the auxiliary storage unit 53 (S609). If it is determined that the defective area data is stored (S609, Yes), the processes of S606 to S608 are performed again, and if it is determined that no other flatness defective area data is stored (S609). , No), it is determined in S608 whether or not the overlapping transfer scheduled area is specified (S610).

  If it is determined that the overlapping transfer scheduled area is not specified (S610, No), the CPU 51 associates the substrate ID, the storage location data, and the imprint processing condition data and stores them in the transferred substrate DB 56 (S611). Then, the process proceeds to S901 described later.

  On the other hand, if it is determined that the overlap transfer scheduled area has been specified (S610, Yes), the CPU 51 determines whether or not the overlap determination process has been performed at all the intersections (S612), and the overlap determination process at all the intersections. If it is determined that the process is not performed (S612, No), the processes of S605 to S610 are performed again.

  On the other hand, if it is determined that the overlap determination process has been performed at all the intersections (S612, Yes), the CPU 51 associates the substrate ID, the storage location data, the overlap transfer scheduled area data, and the imprint processing condition data in association with each other. The data is stored in the transfer candidate substrate DB 57 (S613).

<Imprint substrate selection process-back side, rotation, movement>
After associating various data in step S613 and storing them in the transfer target substrate DB 57, as shown in FIG. 20, the CPU 51 acquires imprint condition data stored in the auxiliary storage unit 53, and imprint scheduled area It is determined whether or not the imprint process can be performed in a state where the substrate is rotated relative to the substrate (S701).

  If it is determined that rotation is not possible (S701, No), the process proceeds to the next overlap determination process (see FIG. 22). On the other hand, when it is determined that the rotation is possible (S701, Yes), the CPU 51 uses the center of the substrate as an axis based on the flatness data stored in the auxiliary storage unit 53 to rotate 90 degrees around the axis. The coordinates of the point A and the point B in the poor flatness area are calculated, and the coordinate data and data relating to the number of coordinate calculations are stored in the auxiliary storage unit 53 (S702).

  Next, the CPU 51 sets each intersection coordinate of the movement area on the board (the movement area (see FIG. 3) set in S603 above) when the imprint scheduled area is rotated relative to the board as the board. The coordinates of each intersection point of the region rotated by 90 degrees around the axis is calculated and stored in the auxiliary storage unit 53 (S703).

  Then, the CPU 51 calculates coordinate data (coordinate values of the points α and β) of the scheduled imprint area when the center of the scheduled imprint area is moved to an arbitrary intersection, and stores the coordinate data in the auxiliary storage unit 53. (S704).

Subsequently, the CPU 51 determines the X coordinate value of the point A of the poor flatness area based on the coordinate data of the flatness defective area after rotation and the coordinate data of the imprint scheduled area after movement stored in the auxiliary storage unit 53. And the X coordinate value of the point α in the imprint scheduled area, the Y coordinate value of the point A in the imperfect flatness area, the Y coordinate value of the point α in the imprint improper area, the X coordinate value of the point B in the imperfect flatness area, and the in The X coordinate value of the point β in the planned print area, the Y coordinate value of the point B in the poor flatness area, and the Y coordinate value of the point β in the imprint planned area are respectively compared, and each coordinate value of the point A and the point α is compared. The larger values are defined as X _left and Y _low , respectively, and the smaller values of the coordinate values of point B and point β are defined as X _right and Y _up , respectively. Then, the CPU 51 compares X _left and X _right and determines whether X _left is smaller than X _right (S705).

If it is determined that X _left is larger than X _right (S705, No), it is determined that the flatness defect area and the imprint scheduled area do not overlap, and the process proceeds to S708 described later.

On the other hand, when it is determined that X _left is smaller than X _right (S705, Yes), the CPU 51 compares Y _low and Y _up to determine whether Y _low is smaller than Y _up (S706). If it is determined that Y _low is greater than Y _up (S706, No), it is determined that the flatness defect area and the imprint scheduled area do not overlap, and the process proceeds to S708 described later.

On the other hand, when it is determined that Y _low is smaller than Y _up (S706, Yes), the CPU 51 among the plurality of scheduled transfer areas included in the scheduled imprint area, the scheduled transfer area that overlaps the poor flatness area ( The overlap transfer scheduled area) is specified and stored in the auxiliary storage unit 53 (S707).

  Subsequently, the CPU 51 determines whether or not other flatness defect area data that has not been determined whether or not there is an overlap with the imprint scheduled area is stored in the auxiliary storage unit 53 (S708). If it is determined that the defective area data is stored (S708, Yes), the processes of S705 to S707 are performed again, and if it is determined that no other flatness defective area data is stored (S708). , No), it is determined whether or not the overlapping transfer scheduled area is specified in S707 (S709).

  If it is determined that the overlapping transfer scheduled area is not specified (S709, No), the CPU 51 associates the substrate ID, the storage location data, and the imprint processing condition data with each other and stores them in the transferred substrate DB 56 (S710). Then, the process proceeds to S901 described later.

  On the other hand, when it is determined that the overlap transfer scheduled area has been specified (S709, Yes), the CPU 51 determines whether or not the overlap determination process has been performed at all the intersections (S711), and the overlap determination process at all the intersections. If it is determined that the process is not performed (S711, No), the processes of S704 to S709 are performed again.

  If it is determined that the overlap determination process has been performed at all the intersections (S711, Yes), the CPU 51 associates the substrate ID, the storage location data, the overlap transfer scheduled area data, and the imprint process condition data, and is a candidate for transfer. It stores in board | substrate DB57 (S712).

<Imprint substrate selection process-partial movement (surface only)>
After determining that the back side cannot be used in S401, as shown in FIG. 21, the CPU 51 acquires partial movement related condition data stored in the auxiliary storage unit 53, and includes a part included in the imprint scheduled area. It is determined whether or not the imprint process can be performed in a state where the scheduled transfer area is moved relative to the substrate (S801).

  If it is determined that the partial movement is impossible (S801, No), the process proceeds to the subsequent process (FIG. 24). On the other hand, when it is determined that the partial movement is possible (S801, Yes), the CPU 51 has the same size as the scheduled transfer area in the transfer permitted area on the substrate and in the area other than the scheduled imprint area. It is determined whether or not a scheduled movement area group consisting of at least one planned movement area can be set (S802). Specifically, when the imprint schedule area is set on the board so that the center of the board and the center of the imprint schedule area coincide with each other, the area within the transfer permission area on the board at the outer periphery of the imprint schedule area Then, it is determined whether or not the scheduled movement area can be arranged.

  When it is determined that it is impossible to set the scheduled movement area group (S802, No), the process proceeds to the subsequent process (FIG. 24). On the other hand, when it is determined that the scheduled movement area can be set (S802, Yes), as shown in FIG. 26, the planned movement area group is set in the transfer permission area on the substrate at the outer periphery of the imprint scheduled area. Then, the X coordinate value and the Y coordinate value of two points (lower left corner, upper right corner) located at the diagonal of each planned movement area are stored in the auxiliary storage unit 53 (S803).

  Next, the CPU 51 determines whether or not the flatness defect area on the substrate overlaps each scheduled movement area included in the planned movement area group (S804). Note that the determination of the overlap between the poor flatness area and each scheduled movement area can be performed, for example, in the same manner as S004 to S006 shown in FIG.

  When it is determined that the flatness defect area on the substrate and the planned movement area overlap (S804, Yes), among the planned movement areas included in the planned movement area group, the planned movement area that overlaps with the poor flatness area on the substrate (Scheduled overlapping movement area) is identified (S805), and the number of overlapping planned movement areas is subtracted from the number of planned moving areas included in the planned moving area group, so that the planned moving area that does not overlap with the poor flatness area (non-overlapping movement) The number of (planned areas) is calculated (S806). Then, it is determined whether or not the number of overlapping transfer scheduled areas specified in S007 is equal to or less than the number of non-overlapping moving scheduled areas (S807).

  On the other hand, when it is determined that the flatness defect area on the substrate and the planned movement area do not overlap (No in S804), the number of planned movement areas included in the planned movement area group is set as the number of non-overlapping planned movement areas, and the above S007. It is determined whether or not the number of overlapping transfer scheduled areas specified in step S is equal to or less than the number of non-overlapping scheduled movement areas (S807).

  When it is determined that the number of overlapping transfer scheduled areas specified in S007 is equal to or less than the number of non-overlapping movement scheduled areas (the number of overlapping transfer scheduled areas ≦ the number of non-overlapping movement scheduled areas) (S807, Yes), the CPU 51 Arbitrarily selects the non-overlapping movement scheduled areas as many as the number of overlapping transfer scheduled areas specified in S007, and sets the selected non-overlapping movement scheduled areas as new transfer scheduled areas, and also specifies in S007 Data relating to a new imprint planned area (see FIG. 27) that does not make the overlapped transfer planned area as the transfer planned area is generated (S808), and the board ID, the storage location data, and the new imprint generated in S808 The scheduled area data is stored in the transferred substrate DB 56 in association with it (S809), and the process proceeds to S901 described later.

  On the other hand, if it is determined that the number of overlapping transfer scheduled areas specified in S007 exceeds the number of non-overlapping movement scheduled areas (the number of overlapping transfer scheduled areas> the number of non-overlapping movement scheduled areas) (S807, No). The CPU 51 arbitrarily selects the same number of overlapping transfer scheduled areas as the number of non-overlapping movement scheduled areas, sets the non-overlapping transfer scheduled area as a new scheduled transfer area, and does not set the selected overlapping transfer scheduled area as the scheduled transfer area. Data relating to a new imprint scheduled area is generated (S810), and the board ID, storage location data, data related to the unselected overlapping transfer scheduled area (non-selected overlapping transfer scheduled area data), and generated in S810. The new imprint scheduled area data is associated and stored in the transfer target substrate DB 57 (S811).

<Imprint substrate selection process-partial movement (front and back)>
After it is determined in S601 that the movement is impossible, or in S712, the substrate ID, the storage location data, the overlap transfer scheduled area data, and the imprint processing condition data are associated with each other and stored in the transfer target substrate DB 57. As shown in FIG. 4, the CPU 51 acquires the partial movement related condition data stored in the auxiliary storage unit 53, and moves a part of the scheduled transfer area included in the planned imprint area relative to the substrate. It is determined whether or not imprint processing can be performed in the state (S821).

  If it is determined that the partial movement is not possible (S821, No), the process proceeds to the subsequent process (FIG. 24). On the other hand, when it is determined that the partial movement is possible (S821, Yes), the CPU 51 has the same size as the planned transfer area in the transfer permitted area on the substrate and other than the planned imprint area. It is determined whether or not a scheduled movement area group consisting of at least one planned movement area can be set (S822). Specifically, when the imprint schedule area is set on the board so that the center of the board and the center of the imprint schedule area coincide with each other, the area within the transfer permission area on the board at the outer periphery of the imprint schedule area Then, it is determined whether or not the scheduled movement area can be arranged.

  When it is determined that it is impossible to set the scheduled movement area group (S822, No), the process proceeds to the subsequent process (FIG. 24). On the other hand, when it is determined that the scheduled movement area can be set (S822, Yes), the CPU 51 moves into the transfer permission area on the surface of the substrate on the outer periphery of the scheduled imprint area as shown in FIG. A scheduled area group is set, and the X coordinate value and the Y coordinate value of two points (lower left corner, upper right corner) located at the diagonal of each planned movement area are stored in the auxiliary storage unit 53 (S823).

  Next, the CPU 51 determines whether or not the poor flatness area on the surface of the substrate overlaps each planned movement area included in the planned movement area group (S824). Note that the determination of the overlap between the poor flatness area and each scheduled movement area can be performed, for example, in the same manner as S004 to S006 shown in FIG.

  If it is determined that the flatness defect area on the surface of the substrate and each movement planned area included in the movement scheduled area group overlap (Yes in S824), among the movement planned areas included in the movement scheduled area group, A planned movement area (overlapping movement scheduled area) that overlaps the flatness defect area on the surface is identified (S825), and the number of overlapping planned movement areas is subtracted from the number of planned movement areas included in the planned movement area group to obtain flatness. The number of scheduled movement areas (non-overlapping planned movement areas) that do not overlap with the defective areas is calculated (S826). Then, it is determined whether or not the number of overlapping transfer scheduled areas specified in S007 is equal to or less than the number of non-overlapping moving scheduled areas (S827).

  On the other hand, if it is determined that the flatness defect area on the surface of the substrate does not overlap with each scheduled movement area included in the planned movement area group (No in S824), the number of planned movement areas included in the planned movement area group is calculated. It is determined whether or not the number of non-overlapping movement scheduled areas is equal to or less than the number of non-overlapping movement scheduled areas specified in S007 (S827).

  When it is determined that the number of overlap transfer scheduled areas specified in S007 is equal to or less than the number of non-overlapping movement scheduled areas (the number of overlapping transfer scheduled areas ≦ the number of non-overlapping movement scheduled areas) (S827, Yes), the CPU 51 Arbitrarily selects the non-overlapping movement scheduled areas as many as the number of overlapping transfer scheduled areas specified in S007, and sets the selected non-overlapping movement scheduled areas as new transfer scheduled areas, and also specifies in S007 Data relating to a new imprint planned area (see FIG. 27) that does not make the overlapped transfer planned area as the planned transfer area is generated (S828), the board ID, the storage location data, and the new imprint generated in S828. The scheduled area data is stored in association with the transfer target substrate DB 56 (S829), and the process proceeds to S901 described later.

  On the other hand, if it is determined that the number of overlapping transfer scheduled areas specified in S007 exceeds the number of non-overlapping movement scheduled areas (the number of overlapping transfer scheduled areas> the number of non-overlapping movement scheduled areas) (S827, No). The CPU 51 subtracts the number of non-overlapping planned movement areas from the number of overlapping transfer scheduled areas, and stores data related to the new number of overlapping transfer planned areas in the auxiliary storage unit 53 (S830).

  Next, the CPU 51 sets a movement planned area group in the transfer permission area on the back surface of the substrate on the outer periphery of the imprint scheduled area, and two points (lower left corner, upper right corner) located at the opposite corners of each planned movement area. Are stored in the auxiliary storage unit 53 (S831).

  Subsequently, as shown in FIG. 23, the CPU 51 determines whether or not the flatness defect area on the back surface of the substrate overlaps each scheduled movement area included in the planned movement area group (S832). Note that the determination of the overlap between the poor flatness area and each scheduled movement area can be performed, for example, in the same manner as in S404 to S406 shown in FIG.

  When it is determined that the flatness defect area on the back surface of the substrate overlaps each planned movement area included in the planned movement area group (Yes in S832), among the planned movement areas included in the planned movement area group, A scheduled movement area (overlapping movement scheduled area) that overlaps with the flatness defect area on the surface is specified (S833), and the number of overlapping planned movement areas is subtracted from the number of planned movement areas included in the planned movement area group to obtain flatness. The number of scheduled movement areas (non-overlapping planned movement areas) that do not overlap with the defective areas is calculated (S834). Then, it is determined whether or not the number of overlapping transfer scheduled areas specified in S407 is equal to or less than the number of non-overlapping moving scheduled areas (S835).

  On the other hand, if it is determined that the flatness defect area on the back surface of the substrate does not overlap each movement planned area included in the movement planned area group (S832, No), the number of movement planned areas included in the movement planned area group is calculated. It is determined whether or not the number of non-overlapping movement scheduled areas is equal to or less than the number of non-overlapping movement scheduled areas specified in S407 (S835).

  When it is determined that the number of the overlapping transfer scheduled areas specified in S407 is equal to or less than the number of non-overlapping movement scheduled areas (the number of overlapping transfer scheduled areas ≦ the number of non-overlapping moving scheduled areas) (S835, Yes), the CPU 51 Arbitrarily selects the number of non-overlapping movement scheduled areas as many as the number of overlapping transfer scheduled areas specified in S407, and sets the selected non-overlapping movement scheduled area as a new transfer scheduled area, and also specifies in S407 Data relating to a new imprint planned area (see FIG. 27) that does not make the overlapped transfer planned area as the planned transfer area is generated (S828), the board ID, the storage location data, and the new imprint generated in S828. The scheduled area data is stored in association with the transfer target substrate DB 56 (S829), and the process proceeds to S901 described later.

  On the other hand, when it is determined that the number of the overlapping transfer scheduled areas specified in S407 exceeds the number of non-overlapping movement scheduled areas (the number of overlapping transfer scheduled areas> the number of non-overlapping movement scheduled areas) (S835, No). The CPU 51 subtracts the number of non-overlapping scheduled movement areas from the number of overlapping transfer scheduled areas, and stores data relating to the new number of overlapping transfer scheduled areas in the auxiliary storage unit 53 (S836).

  Thereafter, based on the data on the number of new overlapping transfer areas on the front and back surfaces stored in the auxiliary storage unit 53, the number of new overlapping transfer areas on the front surface is less than or equal to the number of new overlapping transfer scheduled areas on the back surface. It is determined whether or not (S837).

  When it is determined that the number of new overlap transfer scheduled areas on the front side is equal to or less than the number of new overlap transfer scheduled areas on the back side (S837, Yes), the CPU 51 determines the same number of overlap transfer planned areas as the number of non-overlapping movement scheduled areas on the front side. Arbitrarily selected, the non-overlapping movement scheduled area on the surface is set as a new transfer scheduled area, and data on a new imprint scheduled area that does not use the selected overlapping transfer scheduled area as the transfer scheduled area is generated (S838). , The substrate ID, the storage location data, the data related to the unselected overlapping transfer scheduled area (non-selected overlapping transfer scheduled area data), and the new imprint scheduled area data on the surface generated in S838 are associated with each other. The data is stored in the transfer candidate substrate DB 57 (S839).

  On the other hand, when the number of new overlapping transfer scheduled areas on the front surface exceeds the number of new overlapping transfer scheduled areas on the back surface (S837, No), the CPU 51 arbitrarily selects the same number of overlapping transfer scheduled areas as the number of non-overlapping moving scheduled areas on the back surface. The non-overlapping movement scheduled area on the back surface is selected as a new transfer scheduled area, and data relating to a new imprint scheduled area that does not use the selected overlapping transfer scheduled area as the transfer scheduled area is generated (S840). Candidate to be transferred by associating the ID, the storage location data, the data related to the non-selected overlap transfer scheduled area (non-selected overlap transfer scheduled area data), and the new imprint scheduled area data on the back surface generated in S840 It stores in board | substrate DB57 (S841).

<Imprint board selection processing-board selection / priority assignment>
After various data is stored in the transferred substrate DB 56 in the overlap determination process (FIGS. 13 to 23) described above (S003, S109, S211, S310, S403, S509, S611, S710, S809, S829), as shown in FIG. In addition, the CPU 51 deletes the data related to the substrate stored in the transferred substrate DB 56 from the substrate DB 55 (S901), and subtracts 1 from the number of substrates based on the substrate number data stored in the auxiliary storage unit 53. And the number-of-substrates data is updated (S902). Further, based on the number of devices scheduled to be manufactured (N) stored in the auxiliary storage unit 53, the number of times of transfer to one substrate from the number of devices scheduled to be manufactured (M times, transfer scheduled to be included in the imprint scheduled area). The number of areas) is subtracted to update the production planned device number data (NM) (S902).

  Subsequently, based on the production planned device number data stored in the auxiliary storage unit 53, it is determined whether or not the production planned device number has become zero (S903), and the production planned device number has become zero. In the case (S903, Yes), all the data relating to the substrate stored in the transfer candidate substrate DB 57 is deleted, and the imprint substrate selection process is terminated.

  When various data are stored in the transfer candidate substrate DB 57 in the overlap determination process (FIGS. 13 to 23) described above (S010, S110, S213, S312, S410, S510, S613, S712, S811, S839, S841), auxiliary Based on the substrate number data stored in the storage unit 53, a process of subtracting 1 from the number of substrates is performed, and the substrate number data is updated (S904).

  If it is determined in S903 that the number of devices scheduled to be manufactured is not zero (S903, No), or after updating the substrate number data in S904, based on the substrate number data stored in the auxiliary storage unit 53 Then, it is determined whether or not the number of substrates has become zero (S905).

  When it is determined that the number of substrates is not zero (that is, there is substrate data that has not been subjected to the overlap determination process (FIGS. 13 to 23) in the substrate DB 55) (S905, No), the data is stored in the substrate DB 55. The flatness data of the one substrate being acquired is acquired, and the process of determining the presence or absence of the overlap between the imperfect substrate flatness area and the imprint scheduled area in the imprint substrate selection process is performed again (see FIGS. 13 to 23). .

  On the other hand, if it is determined that the number of substrates has become zero (that is, there is no substrate data that has not been subjected to the overlap determination process (FIGS. 13 to 23) in the substrate DB 55) (S905, Yes), a candidate substrate for transfer. It is determined whether data relating to the substrate is stored in the DB 57 (S906).

  When it is determined that the substrate-related data is not stored in the transfer candidate substrate DB 57 (S906, No), the imprint substrate selection process is terminated. On the other hand, when it is determined that the data related to the substrate is stored in the transfer target substrate DB 57 (S906, Yes), the transfer candidate substrate DB 57 stores the data on the transfer candidate substrate DB 57 with reference to the number of overlap transfer scheduled areas stored in the transfer candidate substrate DB 57. Data on the stored boards is sorted (S907). Next, priority order data is assigned to the substrates arranged in ascending order of the number of overlap transfer scheduled areas, and the priority order data is stored in association with the substrate ID (S908).

  Subsequently, the CPU 51 obtains data relating to the number of overlapping transfer scheduled areas of the substrate having the lowest priority from the data relating to the substrates stored in the transfer candidate substrate DB 57 and is stored in the auxiliary storage unit 53. Data regarding the number of devices scheduled to be manufactured is acquired (S909). Then, the CPU 51 calculates the number of transfer areas by subtracting the number of overlapping transfer scheduled areas from the number of scheduled transfer areas included in the scheduled imprint area, and determines whether or not the number of transfer areas is equal to or less than the number of scheduled production devices. Judgment is made (S910).

  If it is determined that the number of transfer areas is equal to or less than the number of devices scheduled for manufacture (S910, Yes), the CPU 51 receives the data (substrate ID, storage location data, and imprint processing condition data) relating to the substrate with the lowest priority. While moving to the substrate DB 56 (S911), data related to the substrate is deleted from the transfer target substrate DB 57 and the substrate DB 55 (S912), and the number of transfer regions is subtracted from the number of devices to be manufactured and stored in the auxiliary storage unit 53. The number of devices scheduled to be manufactured is updated (S913).

  Then, the CPU 51 determines whether or not the number of devices scheduled for manufacture updated in S913 is 0 (S914). If it is determined that the updated number of devices to be manufactured is 0 (S914, Yes), the CPU 51 deletes all the data related to the substrate stored in the transfer candidate substrate DB 57 and ends the imprint substrate selection process. To do.

  On the other hand, if it is determined that the updated number of production is not 0 (S914, No), the CPU 51 determines whether or not data related to the substrate is stored in the transfer candidate substrate DB 57 (S915), and the transfer candidate. When it is determined that the substrate data is stored in the substrate DB 57 (S915, Yes), the processing after the above S909 is performed, and when it is determined that the substrate data is not stored in the transfer candidate substrate DB 57 (S915, S915). No), the imprint substrate selection process is terminated.

  If it is determined that the number of transfer areas is larger than the number of devices scheduled for manufacture (S910, No), the CPU 51 generates data regarding imprint areas having the same number of transfer areas as the number of devices scheduled for manufacture (S916).

  The imprint area is, for example, a case where the initial imprint scheduled area is 10 rows × 10 columns as shown in FIG. 3 and is transferred while changing the transfer position from the upper left to the lower right. If the number of devices to be manufactured is 80, but there are 90 areas to be transferred that do not overlap with the flatness defect area on the substrate, the difference (10) is calculated in order from the lower right of the area to be imprinted. The reduced area can be set as the imprint area.

  After generating the data related to the imprint region in S916, the CPU 51 associates the data related to the imprint region with the data related to the substrate and stores them in the transferred substrate DB 56 (S917). All the data related to the substrate stored in the DB 57 is deleted (S918), and the imprint substrate selection process is terminated.

<Imprint processing>
Subsequently, a substrate transport process selected by the imprint substrate selection process and an imprint process for the substrate are performed.

  As shown in FIG. 25, the control device 5 (CPU 51) acquires data first stored in the transferred substrate DB 56 from data related to the substrate stored in the transferred substrate DB 56 (SC101), and the substrate. Is transmitted to the substrate transport apparatus 4 via the communication unit 54 (SC102). The substrate transfer device 4 receives the data related to the substrate transmitted from the control device 5 (ST101), and takes out the selected substrate from the substrate storage unit 2 based on the storage location data of the substrate (ST102). The substrate is transported to the imprint apparatus 3 and placed on the substrate stage of the imprint apparatus 3 (ST103). When the substrate transfer / placement processing is completed, the substrate transfer device 4 transmits a signal indicating that the transfer / placement processing is completed to the control device 5 (ST104).

  The control device 5 receives the signal transmitted from the substrate transport device 4 (SC103), and transmits data relating to the substrate transmitted to the substrate transport device 4 in SC102 to the imprint device 3 (SC104).

  The imprint apparatus 3 on which the substrate has been transported and placed by the substrate transport apparatus 4 receives the data relating to the substrate transmitted from the control device 5 (SI101), and imprint processing condition data of the substrate is used to perform imprint processing. Print processing is performed (SI102). For example, when the imprint processing condition data includes data indicating that the substrate is transferred to the surface in a rotated state, the imprint apparatus 3 uses the substrate transfer apparatus 4 to place the substrate on the substrate stage. , And then apply a resin (for example, an energy ray curable resin, a thermosetting resin, a resin that can be used for an imprint process such as a thermoplastic resin) to a predetermined position on the substrate, and attach an imprint mold. The resin is spread by pressing, and the uneven pattern of the imprint mold is transferred to the resin. Then, after the resin is cured, the imprint mold is peeled off, and imprint processing is performed on all the other transfer scheduled areas in the imprint scheduled area. After the imprint process for all the transfer scheduled areas is completed, the imprint apparatus 3 transmits a signal indicating that the imprint process is completed to the control apparatus 5 (SI103), and the control apparatus 5 receives the signal. (SC105). The control device 5 that has received the signal acquires data relating to the next substrate stored in the transferred substrate DB 56 and transmits the data to the substrate transfer device 4. In this way, the imprint process is repeatedly performed on all the substrates for which data is stored in the transferred substrate DB 56.

  As described above, in the imprint system 1 according to the present embodiment, the concave / convex pattern of the imprint mold is transferred only to a portion where the flatness of the front surface or back surface of the substrate selected by the imprint substrate selection process is good. In addition, since the flatness of the front surface or the back surface of the substrate is not transferred to a defective portion, when the resin applied on the substrate is spread by pressing an imprint mold, the spread of the resin stagnates. Can be prevented, and the pressure applied to the imprint mold can be made substantially uniform. As a result, it is possible to prevent unevenness in the spread of the resin and poor filling of the resin into the mold recess. Therefore, it is possible to transfer to the substrate with high accuracy, and it is possible to prevent transfer defects such as variations in the height of the transferred concavo-convex pattern in the substrate, and as a result, the throughput of the imprint process can be reduced. Can be improved.

  The embodiment described above is described for facilitating understanding of the present invention, and is not described for limiting the present invention. Therefore, each element disclosed in the above embodiment is intended to include all design changes and equivalents belonging to the technical scope of the present invention.

  In the above embodiment, the coordinate data of the flatness failure area is stored in the board DB 55 as the flatness data of the board. However, the present invention is not limited to this, and for example, an area with good flatness ( Coordinate data of a predetermined flatness (for example, an area of less than 10 nm) when the flatness of the front surface (or back surface) of the substrate is measured and analyzed using a predetermined flatness measuring device is stored in the substrate database 55. Alternatively, the worst flatness region (a predetermined flatness (for example, 10 nm or more) when the flatness of the transfer surface (or back surface) of the substrate is measured and analyzed using a predetermined flatness measuring device) Coordinate data of the flat area and the unfavorable flatness area (predetermined flatness when the flatness of the transfer surface (or back surface) of the substrate is measured and analyzed using a predetermined flatness measuring device (for example, , The coordinate data may be stored in the substrate database 55 areas) of 5nm or more and less than 10 nm). In the former case, it may be determined whether or not the transfer-scheduled region is included in a region with good flatness, and the substrate determined to be included may be selected as a substrate suitable for imprint processing. In the latter case, it is determined whether or not the worst flatness area and the imprint scheduled area overlap, and whether or not the undesirable flatness area and the imprint scheduled area overlap. The substrate determined to be non-overlapping may be selected as a substrate suitable for the imprint process, or an unfavorable flatness region and an imprint scheduled region overlap, but the flatness A substrate for which it is determined that the worst region and the imprint scheduled region do not overlap may be selected as a substrate suitable for the imprint process.

  In the above-described embodiment, the substrate has been described with a rectangular shape as an example (see FIG. 3), but the present invention is not limited to this, for example, as shown in FIG. It may be a substrate. In this case, as shown in FIG. 28, when the imprint scheduled area is set as a polygonal area, the imprint scheduled area is determined as a plurality of rectangles when determining the overlap between the imprint scheduled area and the flatness poor area. What is necessary is just to divide | segment into an area | region and determine the presence or absence of the overlap with each rectangular area | region and a flatness defect area | region.

  In the above embodiment, the poor flatness region is defined as a region surrounded by a rectangular frame. However, the present invention is not limited to this, for example, the flatness poor region is a circular or elliptical frame. It may be defined as a region surrounded by a polygon or a region surrounded by a polygonal frame. In the former case, the flatness failure area represented by a circle or an ellipse is defined by a mathematical formula, and the coordinate data of the points α and β representing the imprint scheduled area is substituted into the mathematical formula, and the points α and β It may be determined whether or not the poor flatness region and the imprint scheduled region overlap each other by determining whether or not one of them is located in the poor flatness region. In the latter case, the flatness defect area represented by the polygon is divided and defined by a plurality of rectangles, and whether or not the flatness defect area represented by each rectangle and the imprint scheduled area overlap. You just have to judge.

  In the above embodiment, the imprint processing is performed after the imprint substrate selection processing is completed. However, the present invention is not limited to this, and the imprint processing is performed in parallel with the imprint substrate selection processing. It may be done. In this case, when data relating to the substrate is stored in the transferred substrate database 57, the imprint process may be started by using it as a trigger.

  In the above embodiment, the imprint processing condition data is transmitted to the imprint apparatus 3 and the substrate placed on the substrate stage of the imprint apparatus 3 is rotated based on the imprint processing condition data. The invention is not limited to this, and the substrate may be placed on the substrate stage of the imprint apparatus 3 after the substrate has been rotated in advance. In this case, the control device 5 transmits imprint processing condition data to the substrate transport device 4, and based on the data, the substrate transport device 4 rotates the substrate taken out from the substrate storage unit 2 in advance to imprint the device. The imprint apparatus 3 may perform the imprint process without rotating the holding unit that holds the substrate stage or the imprint mold.

  In the above-described embodiment, after determining whether or not the imprint scheduled area and the flatness defect area overlap at the normal transfer position on the surface of the substrate (see FIG. 13), the imprint scheduled area is defined with respect to the substrate. Determination is performed in a relatively rotated state (see FIG. 14), determination is performed in a state where the imprint scheduled area is moved relative to the substrate (see FIG. 15), and then the imprint scheduled area is determined. The determination is made by moving the substrate relative to the substrate (see FIG. 16), and then the back surface of the substrate is also determined in the same order (see FIGS. 17 to 20). The order of processing for determining whether or not both areas overlap is not limited to this mode. Further, it is not necessary to perform all of the overlap determination processing (FIGS. 13 to 20), and two or more overlap determination processing can be arbitrarily combined, but at least the overlap determination processing at the normal transfer position on the surface of the substrate ( It is desirable to perform FIG.

  In the above embodiment, the imprint schedule area includes a large number of transfer schedule areas (for example, 100 (10 rows × 10 columns) as shown in FIG. 3). The present invention is not limited, and can be applied as long as the uneven shape of the imprint mold is an imprint system in which the transfer position is changed and transferred to one substrate at least twice.

  In the above embodiment, when one substrate is selected from the substrates (substrate data) given priority according to the number of transfer planned regions that do not overlap with the flatness failure region, the transfer schedule on the selected substrate is selected. When the number of areas is larger than the number of remaining production scheduled devices, a new imprint area (area having the same number of transfer areas as the number of remaining production planned devices) is set on the selected substrate, and the imprint processing is performed. However, the present invention is not limited to such an embodiment. For example, if the updated number of devices to be manufactured is not 0 after selecting all the substrates in which the flatness defect region and the imprint scheduled region do not overlap, the number of devices to be manufactured and the transfer candidate substrate DB 57 are stored. The substrate data stored in the transfer target substrate DB 57 may be selected based on the number of planned transfer regions that do not overlap with the flatness defect region in each of the substrate data. Specifically, after selecting all the substrates in which the flatness defect area and the imprint scheduled area do not overlap, the updated number of devices to be manufactured is 200, and the number of transfer planned areas not overlapping the flatness defect area When the substrate data whose (manufacturable device number) is 98, 97, 80, 70, 52 is stored in the transfer candidate substrate DB 57, the number of manufacturable devices is 80, 70. Alternatively, 52 substrates may be selected and subjected to imprint processing. If a substrate having a large number of devices that can be manufactured is preferentially selected, in the above example, 98, 97, and 80 substrates that can be manufactured are selected. However, when selected in this way, 75 devices are unnecessary and the substrate is wasted even though 80 devices can be manufactured from the last selected substrate. However, by adopting the above-described mode, only two devices are unnecessary, so that the substrate can be selected so as not to waste.

  In the above embodiment, when one substrate is selected from the substrates (substrate data) given priority according to the number of transfer planned regions that do not overlap with the flatness failure region, the transfer schedule on the selected substrate is selected. A new imprint area (an area having the same number of transfer areas as the remaining number of devices to be manufactured) on the selected substrate so that unnecessary devices are not manufactured when the number of areas is larger than the number of remaining devices to be manufactured. However, the present invention is not limited to such an embodiment. For example, when one substrate is selected from the substrates (substrate data) stored in the transfer target substrate DB 57, the number of scheduled transfer regions on the selected substrate is larger than the number of remaining scheduled devices to be manufactured. Alternatively, the concavo-convex shape of the imprint mold may be transferred to all of the transfer scheduled regions on the selected substrate.

  In the above embodiment, after each overlap determination process (FIGS. 13 to 20) is completed, a part of the transfer scheduled area (transfer scheduled area that overlaps the poor flatness area) is moved relative to the substrate. Although it is determined whether or not the same number of times of transfer as the number of areas to be transferred included in the area to be printed can be transferred (see FIGS. 21 to 23), the present invention is not limited to such an embodiment. For example, after the overlap determination processing (FIGS. 13 to 16) for the surface of the substrate is completed, a part of the transfer scheduled area is moved relative to the substrate with respect to the surface, and the transfer included in the imprint scheduled area It is determined whether or not the number of times of transfer can be the same as the number of planned areas, and then an overlap determination process (FIGS. 17 to 20) is performed on the back surface of the substrate. Against the substrate Move-to manner, it may be determined whether it is possible to transfer of the transfer region where the number of the same number of times contained in the imprint scheduled region. Further, in the case of manufacturing a semiconductor chip or the like, it is usual to perform imprint processing by setting an imprint schedule area formed by laying a transfer schedule area on the substrate without a gap. Therefore, even if the imprint scheduled area is rotated or moved relative to the substrate (see FIGS. 14 to 16 and FIGS. 18 to 20), the imprint scheduled area and the transfer scheduled area do not overlap. It is considered difficult to do so. Therefore, in such a case, overlap determination processing (FIGS. 13 and 17) at the normal transfer position on the front surface and the back surface of the substrate, and a part of the transfer scheduled region (flat surface on the front surface and the back surface as desired, if necessary. A process of determining whether or not the same number of times of transfer as the number of scheduled transfer areas included in the scheduled imprint area can be transferred by moving the scheduled transfer area overlapping the defective area) relative to the substrate (see FIG. 21 to 23) and the overlap determination process shown in FIGS. 14 to 16 and FIGS.

  In the above embodiment, when only the scheduled transfer area that overlaps the poor flatness area is moved relative to the substrate, can the number of transfers be the same as the number of scheduled transfer areas included in the scheduled imprint area? However, the present invention is not limited to such an embodiment. For example, one row (one column) including a scheduled transfer region that overlaps with a flatness defect region. Alternatively, whether or not the transfer can be performed the same number of times as the number of scheduled transfer areas included in the scheduled imprint area when the planned transfer areas of two rows (two columns) or more are moved relative to the substrate. You may judge.

  In the above embodiment, it is determined whether or not each overlap determination process shown in FIGS. 14 to 23 can be performed based on pre-generated imprint condition data (S101, S201, S301, and S401). , S501, S601, S701, S801, S821), the present invention is not limited to such an embodiment, and processing flow data including one or more overlap determination processes is generated in advance based on the imprint condition data. Then, the overlap determination process may be performed based on the processing flow data. For example, in the imprint condition data generation process shown in FIG. 8 (FIGS. 9 to 12), the rotation-related condition data “unrotated”, the movement-related condition data “movable”, and the back-side related “back impossible” When the condition data and the partial movement-related condition data of “partially movable” are generated, “(1) Overlap determination processing at the normal transfer position of the surface (see FIG. 13), (2) Overlap in the movement of the surface” Processing flow data including data contents of “determination processing (see FIG. 15), (3) overlap determination processing in partial movement of surface (see FIG. 21)” is generated, and the imprint scheduled area and It is possible to perform an overlap determination with the edge degree defect area or the like.

  The imprint substrate selection system of the present invention can be applied to imprint processing in the manufacturing process of semiconductor products and the like.

DESCRIPTION OF SYMBOLS 1,10 ... Imprint system 2 ... Board | substrate storage part 3 ... Imprint apparatus 4 ... Board | substrate conveyance apparatus 5 ... Control apparatus

Claims (37)

A system for selecting a substrate for transferring a plurality of times while changing the transfer position of the uneven shape of the imprint mold from a plurality of substrates,
A substrate storage portion for storing the plurality of substrates;
A control device for selecting a substrate suitable for the transfer from among a plurality of substrates stored in the substrate storage unit,
The control device associates and stores flatness data related to the flatness of one surface of each substrate stored in the substrate storage unit and substrate specific data related to each of the plurality of substrates stored in the substrate storage unit. A data storage unit;
Based on the imprint schedule area data and the flatness data related to the imprint schedule area in which a plurality of transfer schedule areas to which the uneven shape of the imprint mold is transferred are arranged, the transfer schedule included in the imprint schedule area An imprint substrate selection system comprising: a first substrate selection unit that selects a substrate that can be transferred as many times as the number of regions as a substrate suitable for the transfer. The flatness data includes flatness defect area data related to an area where the flatness of one surface of the substrate stored in the substrate storage unit is defective,
The controller further includes an overlap determination unit that determines whether the flatness defect area on the one surface and the imprint schedule area overlap based on the flatness defect area data and the imprint schedule area data. Have
The said 1st board | substrate selection part selects the board | substrate determined by the said overlap determination part that the flatness defect area | region of the said one surface and the said imprint plan area | region do not overlap. PCB selection system for imprint. The control device further includes a rotation availability data storage unit that stores rotation availability data regarding whether or not transfer in a state where the imprint scheduled area is rotated relative to the substrate is possible,
When the overlap determining unit determines that the flatness defect area on the one surface and the imprint scheduled area overlap, based on the rotation availability data, the flatness defect area data, and the imprint scheduled area data. Determining whether or not the imperfect flatness area of the one surface and the imprint scheduled area overlap when the imprint planned area is rotated relative to the substrate;
The first substrate selection unit determines the overlap if the imperfect flatness region of the one surface and the imprint scheduled region do not overlap when the planned imprint region is rotated relative to the substrate. The imprint substrate selection system according to claim 2, wherein the substrate determined by the unit is selected. The control device further includes a moveability data storage unit that stores moveability data regarding whether transfer is possible in a state where the imprint scheduled area is moved relative to the substrate.
When the overlap determination unit determines that the flatness defect area on the one surface and the imprint scheduled area overlap, based on the moveability data, the flatness defect area data, and the imprint scheduled area data. , Further determining whether or not the imperfect flatness area of the one surface and the imprint scheduled area overlap when the imprint planned area is moved relative to the substrate,
The first substrate selection unit determines the overlap if the imperfect flatness region of the one surface and the imprint scheduled region do not overlap when the planned imprint region is moved relative to the substrate. The imprint substrate selection system according to claim 2, wherein the substrate determined by the unit is selected. The control device includes a rotation availability data storage unit that stores rotation availability data related to whether or not transfer in a state where the imprint scheduled area is rotated relative to the substrate is possible, and the imprint A moveability data storage unit that stores moveability data on whether or not transfer in a state where the planned area is moved relative to the substrate is possible;
When the overlap determination unit determines that the flatness defect area on the one surface and the imprint scheduled area overlap, the rotation availability data, the movement availability data, the flatness failure area data, and the imprint schedule Based on the area data, whether or not the imprint scheduled area and the imprint scheduled area overlap when the imprint scheduled area is rotated and moved relative to the substrate. Judgment further,
When the first substrate selection unit rotates and moves the imprint scheduled region relative to the substrate, the flatness defect region on the one surface and the imprint scheduled region do not overlap each other. The imprint substrate selection system according to claim 2, wherein the substrate determined by the overlap determination unit is selected. The control device further includes a second surface transfer availability data storage unit that stores other side transfer availability data regarding whether or not transfer to the other side of the substrate is possible,
The flatness defect area data includes the other surface flatness defect area data related to the flatness defect area of the other surface of the substrate,
When the overlap determining unit determines that the flatness defect area on the one surface and the imprint scheduled area overlap, the other surface transfer availability data, the other surface flatness defect area data, and the imprint scheduled area Based on the data, further determine whether or not the imperfect flatness area of the other surface and the imprint scheduled area overlap,
It said first substrate selection unit, according to claim 2, characterized by selecting the said overlapping substrate determined by the determination unit and the other surface of the flatness defect region and the imprint scheduled region do not overlap PCB selection system for imprint. The control device further includes a rotation availability data storage unit that stores rotation availability data regarding whether or not transfer in a state where the imprint scheduled area is rotated relative to the substrate is possible,
When the overlap determining unit determines that the flatness defect area on the other surface and the imprint scheduled area overlap, the overlap determination unit adds the rotation availability data, the other surface flatness defect area data, and the imprint planned area data to each other. Based on whether or not the imprint schedule area and the imprint schedule area overlap each other when the imprint schedule area is rotated relative to the substrate,
The first substrate selection unit determines the overlap if the imperfect flatness region of the other surface does not overlap with the imprint scheduled region when the imprint planned region is rotated relative to the substrate. The imprint substrate selection system according to claim 6, wherein the substrate determined by the unit is selected. The control device further includes a moveability data storage unit that stores moveability data regarding whether transfer is possible in a state where the imprint scheduled area is moved relative to the substrate.
When the overlap determination unit determines that the flatness defect area on the other surface and the imprint scheduled area overlap, the overlap determination unit adds the movement availability data, the other surface flatness defect area data, and the imprint planned area data to each other. Based on whether or not the imprint schedule area and the imprint schedule area overlap each other when the imprint schedule area is moved relative to the substrate,
The first substrate selection unit determines the overlap if the imperfect flatness region of the other surface and the imprint scheduled region do not overlap when the planned imprint region is moved relative to the substrate. The imprint substrate selection system according to claim 6, wherein the substrate determined by the unit is selected. The control device includes a rotation availability data storage unit that stores rotation availability data related to whether or not transfer in a state where the imprint scheduled area is rotated relative to the substrate is possible, and the imprint A moveability data storage unit that stores moveability data on whether or not transfer in a state where the planned area is moved relative to the substrate is possible;
When the overlap determination unit determines that the flatness failure area on the other surface and the imprint scheduled area overlap, the rotation availability data, the movement availability data, the other surface flatness failure area data, and the imprinting area data Whether or not the imperfect flatness area of the other surface and the imprint scheduled area overlap when the scheduled imprint area is rotated and moved relative to the substrate based on the planned print area data To further determine
When the first substrate selection unit rotates and moves the imprint scheduled region relative to the substrate, the flatness defect region on the other surface and the imprint scheduled region do not overlap each other. The imprint substrate selection system according to claim 6, wherein the substrate determined by the overlap determination unit is selected. The controller is
A partial movement availability data storage unit for storing partial movement availability data regarding whether or not transfer is possible in a state where a part of the plurality of transfer scheduled areas is moved relative to the substrate;
Based on the partial movement availability data, an area other than the imprint planned area on the substrate is an area having the same size as the transfer planned area, and a part of the plurality of transfer planned areas is A scheduled movement area group setting unit for setting a planned movement area group including at least one planned movement area that can be moved;
Of the planned movement areas included in the planned movement area group, the number of planned movement areas that do not overlap with the poor flatness areas other than the poor flatness areas determined to overlap with the imprint planned area by the overlap determination unit. A planned movement area number calculation unit to be calculated;
When the overlap determining unit determines that the flatness defect area and the imprint scheduled area overlap, the overlap determining unit further includes an overlap transfer scheduled area specifying unit that specifies the transfer planned area overlapping the flatness defect area. And
The first substrate selection unit selects a substrate in which the number of the planned transfer regions specified by the overlap transfer planned region specifying unit is equal to or less than the number of planned movement regions calculated by the planned movement region number calculation unit. The imprint substrate selection system according to claim 2 . The controller is
Among the planned transfer areas included in the planned imprint area, the number of planned overlapping transfer areas that calculates the number of planned transfer areas that overlap the poor flatness area; and
A priority order data generation unit that generates priority order data according to the number of overlap transfer scheduled areas calculated by the overlap transfer scheduled area number calculation unit;
A planned production device number data storage unit for storing data related to the planned production number of devices produced by transferring the uneven shape of the imprint mold;
The product of the number of substrates selected by the first substrate selection unit from all the substrates stored in the substrate storage unit and the number of transfer planned regions included in the imprint planned region is the device to be manufactured. A second substrate that selects one substrate from among the substrates that cannot be transferred the same number of times as the number of scheduled transfer regions included in the scheduled imprint region, based on the priority order data, The imprint substrate selection system according to claim 2, further comprising a selection unit. The controller is
Among the planned transfer areas included in the planned imprint area, the number of planned overlapping transfer areas that calculates the number of planned transfer areas that overlap the poor flatness area; and
A planned production device number data storage unit for storing data related to the planned production number of devices produced by transferring the uneven shape of the imprint mold;
The product of the number of substrates selected by the first substrate selection unit from all the substrates stored in the substrate storage unit and the number of transfer planned regions included in the imprint planned region is the device to be manufactured. When the number of substrates is less than the number, the difference between the product of the number of substrates and the number of planned transfer regions and the number of devices scheduled for manufacture, and the number of planned overlapping transfer regions calculated by the number of planned overlapping transfer regions 3. A second substrate selection unit that selects one substrate from substrates that cannot be transferred the same number of times as the number of transfer scheduled regions included in the imprint scheduled region. The imprint substrate selection system according to any one of 10 to 10. An imprint substrate selection program executed in a control device that selects a substrate for transferring a plurality of times while changing the transfer position of the uneven shape of the imprint mold from a plurality of substrates,
The control device includes: a substrate-related data storage unit that stores flatness defect area data related to an area where the flatness of one surface of the substrate is poor; and a transfer scheduled area to which the uneven shape of the imprint mold is transferred An imprint schedule area data storage unit that stores data related to the imprint schedule area that is arranged in a plurality,
Based on the flatness defect area data read from the substrate-related data storage unit and the imprint schedule area data read from the imprint schedule area data storage unit, the flatness defect of the one surface A first overlap determination step for determining whether or not an area and the imprint scheduled area overlap;
Causing the control device to execute a first substrate selection step of selecting a substrate that can be transferred the same number of times as the number of transfer planned regions included in the imprint scheduled region;
In the first substrate selection step, the transfer schedule included in the imprint schedule region is a substrate determined by the first overlap determination step that the flatness defect area and the imprint schedule area do not overlap. A substrate selection program for imprinting, wherein the substrate is selected as a substrate that can be transferred as many times as the number of regions. The control device further includes a rotation availability data storage unit that stores rotation availability data regarding whether or not transfer in a state where the imprint scheduled area is rotated relative to the substrate is possible,
When it is determined in the first overlap determination step that the flatness defect area on the one surface and the imprint scheduled area overlap, the rotation availability data read from the rotation availability data storage unit, the board related Based on the flatness defect area data read from the data storage unit and the imprint plan area data read from the imprint plan area data storage unit, the imprint plan area is relative to the substrate. The controller performs a second overlap determination step for determining whether or not the poor flatness region of the one surface and the imprint scheduled region overlap when rotated.
In the first substrate selection step, the transfer schedule included in the imprint schedule area is a board determined in the second overlap determination step that the flatness defect area and the imprint schedule area do not overlap. 14. The imprint substrate selection program according to claim 13, wherein the substrate is selected as a substrate that can be transferred the same number of times as the number of regions. The control device further includes a moveability data storage unit that stores moveability data regarding whether transfer is possible in a state where the imprint scheduled area is moved relative to the substrate.
When it is determined in the first overlap determination step that the flatness defect area on the one surface and the imprint scheduled area overlap, the movement availability data read from the movement availability data storage unit, the board related Based on the flatness defect area data read from the data storage unit and the imprint plan area data read from the imprint plan area data storage unit, the imprint plan area is relative to the substrate. The controller performs a third overlap determination step for determining whether or not the imperfect flatness region of the one surface and the imprint scheduled region overlap when moved.
In the first substrate selection step, the transfer plan included in the imprint schedule region is a substrate determined in the third overlap judgment step that the flatness defect region and the imprint plan region do not overlap. 14. The imprint substrate selection program according to claim 13 , wherein the imprint substrate selection program is selected as a substrate capable of transferring the same number of times as the number of regions. The control device includes a rotation availability data storage unit that stores rotation availability data related to whether or not transfer in a state where the imprint scheduled area is rotated relative to the substrate is possible, and the imprint A moveability data storage unit that stores moveability data on whether or not transfer in a state where the planned area is moved relative to the substrate is possible;
When it is determined in the first overlap determination step that the flatness defect area on the one surface and the imprint scheduled area overlap, the rotation availability data read from the rotation availability data storage unit, the movement availability Based on the moveability data read from the data storage unit, the flatness failure area data read from the substrate-related data storage unit, and the imprint scheduled area data read from the imprint scheduled area data storage unit And determining whether or not the imperfect flatness area of the one surface and the imprint scheduled area overlap when the planned imprint area is rotated and moved relative to the substrate. Causing the control device to perform an overlap determination step;
In the first substrate selection step, the transfer schedule included in the imprint schedule area is a board determined in the fourth overlap determination step that the flatness defect area and the imprint schedule area do not overlap. 14. The imprint substrate selection program according to claim 13 , wherein the imprint substrate selection program is selected as a substrate capable of transferring the same number of times as the number of regions. The control device further includes a second surface transfer availability data storage unit that stores other side transfer availability data regarding whether or not transfer to the other side of the substrate is possible,
The flatness defect area data includes the other surface flatness defect area data related to the flatness defect area of the other surface of the substrate,
When it is determined in the first overlap determination step that the flatness defect area on the one surface and the imprint scheduled area overlap, the other surface transfer availability data read from the other surface transfer availability data storage unit. The flatness of the other surface based on the other surface flatness defect area data read from the substrate-related data storage unit and the imprint scheduled area data read from the imprint scheduled area data storage unit Causing the control device to execute a fifth overlap determination step for determining whether or not a defective area and the imprint scheduled area overlap.
In the first substrate selection step, the transfer schedule included in the imprint schedule area is a board determined in the fifth overlap determination step that the flatness defect area and the imprint schedule area do not overlap. 14. The imprint substrate selection program according to claim 13 , wherein the imprint substrate selection program is selected as a substrate capable of transferring the same number of times as the number of regions. The control device further includes a rotation availability data storage unit that stores rotation availability data regarding whether or not transfer in a state where the imprint scheduled area is rotated relative to the substrate is possible,
When it is determined in the fifth overlap determination step that the flatness defect area on the other surface and the imprint scheduled area overlap, the rotation availability data read from the rotation availability data storage unit, the board related Based on the imperfect surface flatness area data read from the data storage unit and the imprint plan area data read from the imprint plan area data storage unit, the imprint plan area is relative to the substrate. The controller performs a sixth overlap determination step for determining whether the flatness defect area on the other surface and the imprint scheduled area overlap each other when rotated on a regular basis,
In the first substrate selection step, the transfer schedule included in the imprint schedule area is a board determined in the sixth overlap determination step that the flatness defect area and the imprint schedule area do not overlap. 18. The imprint substrate selection program according to claim 17, wherein the substrate is selected as a substrate that can be transferred the same number of times as the number of regions. The control device further includes a moveability data storage unit that stores moveability data regarding whether transfer is possible in a state where the imprint scheduled area is moved relative to the substrate.
When it is determined in the fifth overlap determination step that the flatness defect area on the other surface and the imprint scheduled area overlap, the movement availability data read from the movement availability data storage unit, the board related Based on the imperfect surface flatness area data read from the data storage unit and the imprint plan area data read from the imprint plan area data storage unit, the imprint plan area is relative to the substrate. The controller performs a seventh overlap determination step for determining whether or not the flatness defect area on the other surface and the imprint scheduled area overlap each other when moved.
In the first substrate selection step, the transfer plan included in the imprint plan region is a substrate determined in the seventh overlap judgment step that the flatness defect region and the imprint plan region do not overlap. The imprint substrate selection program according to claim 17, wherein the substrate is selected as a substrate that can be transferred the same number of times as the number of regions. The control device includes a rotation availability data storage unit that stores rotation availability data related to whether or not transfer in a state where the imprint scheduled area is rotated relative to the substrate is possible, and the imprint A moveability data storage unit that stores moveability data on whether or not transfer in a state where the planned area is moved relative to the substrate is possible;
When it is determined in the fifth overlap determination step that the flatness defect area on the other surface and the imprint scheduled area overlap, the rotation availability data read from the rotation availability data storage unit, the movement availability The moveability data read from the data storage unit, the other-side flatness defect region data read from the substrate-related data storage unit, and the imprint scheduled region data read from the imprint scheduled region data storage unit Based on whether the imprint scheduled area overlaps with the imprint scheduled area when the imprint scheduled area is rotated and moved relative to the substrate. Causing the control device to execute 8 overlap determination steps;
In the first substrate selection step, the transfer schedule included in the imprint schedule area is a board determined in the eighth overlap determination step that the flatness defect area and the imprint schedule area do not overlap. The imprint substrate selection program according to claim 17, wherein the substrate is selected as a substrate capable of being transferred the same number of times as the number of regions. The control device stores partial movement availability data on whether or not transfer is possible in a state where a part of the plurality of transfer scheduled areas is moved relative to the substrate. A data storage unit;
When it is determined that the poor flatness area and the imprint scheduled area overlap, based on the partial movement availability data, the transfer scheduled area and the area other than the imprint planned area on the substrate A scheduled movement area group setting step for setting a planned movement area group that includes at least one scheduled movement area that has the same size and can move a part of the plurality of scheduled transfer areas;
Of the planned movement areas included in the planned movement area group, the planned movement area for calculating the number of planned movement areas that do not overlap with the flatness defect areas other than the flatness defect areas determined to overlap the imprint planned area. A number calculation step;
When it is determined that the poor flatness area and the imprint scheduled area overlap, the controller performs an overlapping transfer scheduled area specifying step for specifying the planned transfer area overlapping the flatness poor area,
In the first substrate selection step, a substrate in which the number of the planned transfer regions specified in the overlapping transfer planned region specifying step is equal to or less than the number of planned movement regions calculated in the planned movement region number calculating step, the transfer region where the number of the claims 1 3 for imprint board selection program according to, characterized in that the transfer of the same number is selected as a substrate capable included in the imprint scheduled region. The control apparatus further includes a production planned device number data storage unit that stores data related to the production number of devices produced by transferring the uneven shape of the imprint mold.
When the first substrate selection step does not select a substrate that can be transferred the same number of times as the number of transfer planned areas included in the imprint scheduled area, the transfer planned area overlapping the flatness defect area is not selected. A step of calculating the number of overlap transfer scheduled areas for calculating the number;
A priority order data generation step for generating priority order data according to the number of the planned transfer areas calculated in the overlapping transfer planned area number calculating step;
When the product of the number of substrates selected in the first substrate selection step and the number of transfer scheduled regions included in the imprint scheduled region is less than the number of devices scheduled for production, the priority order data generating step A second substrate selection step of selecting one substrate from among substrates that cannot be transferred the same number of times as the number of scheduled transfer regions included in the scheduled imprint region based on the generated priority order data; The imprint substrate selection program according to any one of claims 13 to 21, which is executed by a control device. The control apparatus further includes a production planned device number data storage unit that stores data related to the production number of devices produced by transferring the uneven shape of the imprint mold.
When the first substrate selection step does not select a substrate that can be transferred the same number of times as the number of transfer planned areas included in the imprint scheduled area, the transfer planned area overlapping the flatness defect area is not selected. A step of calculating the number of overlap transfer scheduled areas for calculating the number;
When the product of the number of substrates selected in the first substrate selection step and the number of transfer planned regions included in the imprint scheduled region is less than the number of devices scheduled for manufacture, the number of substrates and the transfer scheduled Based on the product of the number of regions and the difference between the number of devices scheduled to be manufactured, and the number of overlapping transfer scheduled regions calculated in the overlapping transfer scheduled region number calculating step, the number of planned transfer regions included in the planned imprint region The imprint according to any one of claims 13 to 21, wherein the controller executes a second substrate selection step of selecting one substrate from substrates that cannot be transferred the same number of times. Board selection program.   A recording medium storing the imprint substrate selection program according to any one of claims 13 to 23. The imprint substrate selection system according to any one of claims 1 to 12,
An imprint apparatus that transfers the uneven shape of the imprint mold to the substrate selected by the imprint substrate selection system a plurality of times while changing the transfer position;
The control device further includes an imprint area setting unit that sets an area on the selected substrate to which the uneven shape of the imprint mold is transferred based on the flatness data and the imprint scheduled area data. And controlling the imprint apparatus so that the uneven shape of the imprint mold is transferred a plurality of times while changing the transfer position to the imprint area set by the imprint area setting unit. Imprint system to do. A method of selecting a substrate for transferring the uneven shape of the imprint mold a plurality of times while changing the transfer position from a plurality of substrates,
A first determination is made as to whether or not an area where the flatness of one surface of the substrate is poor and an imprint schedule area in which a plurality of transfer schedule areas to which the uneven shape of the imprint mold is transferred are arranged overlap. An overlap judgment step,
A first substrate selection step of selecting a substrate that can be transferred the same number of times as the number of transfer planned regions included in the imprint scheduled region,
In the first substrate selection step, the substrate that is determined by the first overlap determination step that the flatness defect region on the one surface and the imprint scheduled region do not overlap is included in the imprint scheduled region. A substrate selection method for imprinting, wherein the substrate is selected as a substrate capable of being transferred the same number of times as the number of transfer-scheduled regions. In the first overlap determining step, it is determined that the flatness defect area on the one surface and the imprint scheduled area overlap, and the imprint scheduled area is rotated relative to the substrate. When transfer is possible, it is determined whether the imperfect flatness area on the one surface and the imprint scheduled area overlap when the planned imprint area is rotated relative to the substrate. A second overlap determination step,
In the first substrate selection step, the substrate determined in the second overlap determination step that the substrate and the imprint scheduled region do not overlap with each other, and the number of transfer planned regions included in the planned imprint region 27. The imprint substrate selection method according to claim 26, wherein the substrate is selected as a substrate that can be transferred the same number of times. A state in which it is determined in the first overlap determination step that the flatness defect region on one surface of the substrate overlaps the imprint scheduled region and the imprint planned region is moved relative to the substrate. If the imprint scheduled area is moved relative to the substrate, whether the flatness defect area on the one surface and the imprint scheduled area overlap or not is determined. A third overlap determining step for determining,
In the first substrate selection step, the imprint scheduled region includes a substrate determined by the third overlap determining step that the flatness defect region on the one surface does not overlap the imprint scheduled region. 27. The imprint substrate selection method according to claim 26, wherein the substrate is selected as a substrate that can be transferred the same number of times as the number of transfer-scheduled regions. In the first overlap determination step, it is determined that the flatness defect area on the one surface and the imprint scheduled area overlap, and the imprint planned area is rotated and moved relative to the substrate. When imprinting is possible, when the imprint scheduled area is rotated and moved relative to the substrate, the flatness defect area on the one surface and the imprint scheduled area are A fourth overlap determination step for determining whether or not they overlap,
In the first substrate selection step, the imprint scheduled region includes a substrate determined by the fourth overlap determining step that the flatness defect region on the one surface does not overlap the imprint scheduled region. 27. The imprint substrate selection method according to claim 26, wherein the substrate is selected as a substrate that can be transferred the same number of times as the number of transfer-scheduled regions. When it is determined in the first overlap determination step that the flatness defect area on the one surface and the imprint scheduled area overlap and transfer using the other surface of the substrate is possible, And further including a fifth overlap determination step for determining whether or not the flatness defect region on the direction side and each of the plurality of transfer scheduled regions overlap.
In the first substrate selection step, the imprint scheduled region includes a substrate determined by the fifth overlap determining step that the flatness defect region on the other surface does not overlap the imprint scheduled region. 27. The imprint substrate selection method according to claim 26, wherein the substrate is selected as a substrate that can be transferred the same number of times as the number of transfer-scheduled regions. In the fifth overlap determination step, it is determined that the flatness defect area on the other surface and the imprint scheduled area overlap, and the imprint planned area is rotated relative to the substrate. When transfer is possible, it is determined whether or not the imperfect surface flatness area of the other surface and the imprint schedule area overlap when the imprint schedule area is rotated relative to the substrate. A sixth overlap determination step;
In the first substrate selection step, when the imprint scheduled region is rotated relative to the substrate in the sixth overlap determination step, the flatness defect region on the other surface and the imprint planned region 31. The substrate for imprinting according to claim 30, wherein a substrate that is determined not to overlap is selected as a substrate that can be transferred the same number of times as the number of the planned transfer regions included in the planned imprint region. Substrate selection method. Transfer in a state where it is determined in the fifth overlap determination step that the flatness defect area on the other surface and the imprint scheduled area overlap, and the imprint planned area is moved relative to the substrate. When the imprint scheduled area is moved relative to the substrate, it is determined whether the flatness defect area on the other surface and the imprint scheduled area overlap each other. 7 further includes an overlapping determination step,
In the first substrate selection step, when the imprint scheduled region is moved relative to the substrate in the seventh overlap determination step, the flatness defect region on the other surface and the imprint planned region the substrate determined bets do not overlap, the imprint will the transfer region where the number contained in the region and the imprint of claim 3 0, characterized in that the transfer of the same number is selected as a substrate capable Substrate selection method. In the fifth overlap determination step, it is determined that the flatness defect area on the other surface and the imprint scheduled area overlap, and the imprint planned area is rotated and moved relative to the substrate. When imprinting is possible, when the imprint scheduled area is rotated and moved relative to the substrate, the flatness defect area on the other surface and the imprint scheduled area are An 8th overlap determination step for determining whether or not they overlap,
In the first substrate selection step, the substrate that is determined by the eighth overlap determination step that the flatness defect region on the other surface and the imprint scheduled region do not overlap is included in the imprint scheduled region. imprinting substrate selection method of claim 3 0, characterized by selecting as a substrate capable of transcription of the transcribed region where the number of the same number. When it is determined that the poor flatness area and the imprint scheduled area overlap, based on the partial movement availability data, the transfer scheduled area and the area other than the imprint planned area on the substrate A scheduled movement area group setting step for setting a planned movement area group that includes at least one scheduled movement area that has the same size and can move a part of the plurality of planned transfer areas;
Of the planned movement areas included in the planned movement area group, the planned movement area for calculating the number of planned movement areas that do not overlap with the flatness defect areas other than the flatness defect areas determined to overlap the imprint planned area. Number calculation step;
When it is determined that the poor flatness area and the imprint scheduled area overlap, an overlapping transfer scheduled area specifying step that specifies the planned transfer area overlapping the flatness defective area,
In the first substrate selection step, a substrate in which the number of transfer planned regions specified in the overlap transfer scheduled region specifying step is equal to or less than the number of planned movement regions calculated in the planned movement region number calculating step, 27. The substrate selection method according to claim 26, wherein the substrate is selected as a substrate that can be transferred the same number of times as the number of the scheduled transfer regions included in the scheduled imprint region. In the case where a substrate that can be transferred the same number of times as the number of the scheduled transfer areas included in the planned imprint area is not selected in the first substrate selection step, the area of the scheduled transfer area that overlaps the poor flatness area A step for calculating the number of overlap transfer scheduled areas for calculating the number;
A priority order assigning step for assigning a priority order based on the number of the planned transfer regions calculated by the overlapping transfer planned region number calculating step;
The product of the number of substrates selected in the first substrate selection step from the plurality of substrates and the number of transfer planned regions included in the imprint scheduled region is obtained by transferring the uneven shape of the imprint mold. When the number of devices to be manufactured is less than the planned number of manufactured devices, it is impossible to transfer the same number of times as the number of scheduled transfer regions included in the planned imprint region based on the priority order given by the priority order assigning step. 35. The imprint substrate selection method according to claim 26, further comprising a second substrate selection step of selecting one substrate from the substrates. In the case where a substrate that can be transferred the same number of times as the number of the scheduled transfer areas included in the planned imprint area is not selected in the first substrate selection step, the area of the scheduled transfer area that overlaps the poor flatness area A step for calculating the number of overlap transfer scheduled areas for calculating the number;
The product of the number of substrates selected in the first substrate selection step from the plurality of substrates and the number of transfer planned regions included in the imprint scheduled region is obtained by transferring the uneven shape of the imprint mold. When the number of devices to be manufactured is less than the planned number of manufactured devices, the product of the number of substrates and the number of planned transfer regions, the difference between the number of planned devices to be manufactured, and the overlap calculated by the overlapping transfer planned region number calculating step And a second substrate selection step of selecting one substrate from among the substrates that cannot be transferred the same number of times as the number of scheduled transfer regions included in the scheduled imprint region based on the number of planned transfer regions. 35. The method for selecting an imprint substrate according to any one of claims 26 to 34. An imprint area setting step for setting an area for transferring the concavo-convex shape of the imprint mold on the substrate selected by the imprint substrate selection method according to any one of claims 26 to 36;
A transfer step of transferring the uneven shape of the imprint mold onto the selected substrate a plurality of times while changing the transfer position on the selected substrate using an imprint apparatus.

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