JP2004006786A5 - - Google Patents
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- JP2004006786A5 JP2004006786A5 JP2003101232A JP2003101232A JP2004006786A5 JP 2004006786 A5 JP2004006786 A5 JP 2004006786A5 JP 2003101232 A JP2003101232 A JP 2003101232A JP 2003101232 A JP2003101232 A JP 2003101232A JP 2004006786 A5 JP2004006786 A5 JP 2004006786A5
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003101232A JP4141307B2 (ja) | 2002-03-15 | 2003-04-04 | 半導体装置の作製方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002071664 | 2002-03-15 | ||
| JP2002080391 | 2002-03-22 | ||
| JP2003101232A JP4141307B2 (ja) | 2002-03-15 | 2003-04-04 | 半導体装置の作製方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003072180A Division JP4141292B2 (ja) | 2002-03-15 | 2003-03-17 | 半導体装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004006786A JP2004006786A (ja) | 2004-01-08 |
| JP2004006786A5 true JP2004006786A5 (no) | 2006-04-20 |
| JP4141307B2 JP4141307B2 (ja) | 2008-08-27 |
Family
ID=30449131
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003101232A Expired - Fee Related JP4141307B2 (ja) | 2002-03-15 | 2003-04-04 | 半導体装置の作製方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4141307B2 (no) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7115947B2 (en) * | 2004-03-18 | 2006-10-03 | International Business Machines Corporation | Multiple dielectric finfet structure and method |
| JP2021197474A (ja) * | 2020-06-16 | 2021-12-27 | 株式会社村田製作所 | 半導体装置 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5856457A (ja) * | 1981-09-30 | 1983-04-04 | Fujitsu Ltd | 半導体装置の製造方法 |
| JPS61241909A (ja) * | 1985-04-19 | 1986-10-28 | Agency Of Ind Science & Technol | Ｓｏｉ結晶形成法 |
| JPH06244207A (ja) * | 1991-03-25 | 1994-09-02 | Fuji Xerox Co Ltd | 半導体装置 |
| JPH0828815A (ja) * | 1994-07-19 | 1996-02-02 | Ishikawajima Harima Heavy Ind Co Ltd | 流動層ボイラの散気装置 |
| JP3754189B2 (ja) * | 1997-08-26 | 2006-03-08 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| JPH11121753A (ja) * | 1997-10-14 | 1999-04-30 | Hitachi Ltd | 半導体装置及びその製造方法 |
| JP2000068520A (ja) * | 1997-12-17 | 2000-03-03 | Matsushita Electric Ind Co Ltd | 半導体薄膜、その製造方法、および製造装置、ならびに半導体素子、およびその製造方法 |
| JP4776773B2 (ja) * | 1999-12-10 | 2011-09-21 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
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2003
- 2003-04-04 JP JP2003101232A patent/JP4141307B2/ja not_active Expired - Fee Related