JP2003332321A5 - - Google Patents
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- JP2003332321A5 JP2003332321A5 JP2003056181A JP2003056181A JP2003332321A5 JP 2003332321 A5 JP2003332321 A5 JP 2003332321A5 JP 2003056181 A JP2003056181 A JP 2003056181A JP 2003056181 A JP2003056181 A JP 2003056181A JP 2003332321 A5 JP2003332321 A5 JP 2003332321A5
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- JP
- Japan
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003056181A JP4238050B2 (ja) | 2001-09-20 | 2003-03-03 | プラズマ処理装置及び処理方法 |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001286054 | 2001-09-20 | ||
| JP2001-286054 | 2001-09-20 | ||
| JP2002037580 | 2002-02-15 | ||
| JP2002-37580 | 2002-02-15 | ||
| JP2003056181A JP4238050B2 (ja) | 2001-09-20 | 2003-03-03 | プラズマ処理装置及び処理方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002275738A Division JP3898612B2 (ja) | 2001-09-20 | 2002-09-20 | プラズマ処理装置及び処理方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003332321A JP2003332321A (ja) | 2003-11-21 |
| JP2003332321A5 true JP2003332321A5 (zh) | 2005-10-27 |
| JP4238050B2 JP4238050B2 (ja) | 2009-03-11 |
Family
ID=29715866
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003056181A Expired - Fee Related JP4238050B2 (ja) | 2001-09-20 | 2003-03-03 | プラズマ処理装置及び処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4238050B2 (zh) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4778715B2 (ja) * | 2005-02-24 | 2011-09-21 | 株式会社日立ハイテクノロジーズ | 半導体の製造方法 |
| JP6045646B2 (ja) * | 2010-08-23 | 2016-12-14 | 東京エレクトロン株式会社 | プラズマエッチング方法 |
| JP2012138581A (ja) * | 2012-01-10 | 2012-07-19 | Hitachi High-Technologies Corp | プラズマ処理装置およびプラズマ処理方法 |
| JP5894445B2 (ja) * | 2012-01-23 | 2016-03-30 | 東京エレクトロン株式会社 | エッチング方法及びエッチング装置 |
| KR102201886B1 (ko) * | 2013-06-11 | 2021-01-12 | 세메스 주식회사 | 기판 처리 장치 및 플라즈마 발생 방법 |
| KR102399816B1 (ko) * | 2019-08-05 | 2022-05-20 | 주식회사 히타치하이테크 | 플라스마 처리 장치 |
| CN113936985A (zh) * | 2020-07-14 | 2022-01-14 | 东京毅力科创株式会社 | 等离子体处理装置和等离子体处理方法 |
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2003
- 2003-03-03 JP JP2003056181A patent/JP4238050B2/ja not_active Expired - Fee Related