JP2003331698A - Electrode for vacuum circuit breaker and manufacturing method therefor - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a low manufacturing cost electrode for a vacuum circuit breaker, which has a fine structure layer consisting of refractory metal whose grain size is 0.1 to 30 μm as an arc-proof material member, wherein the electrode enables the vacuum circuit breaker to have good circuit breaking characteristic, good withstand voltage and good deposition-proof characteristic. <P>SOLUTION: The electrode for the vacuum circuit breaker is manufactured in such processes that the arc-proof material member is formed on an electrode holding portion which contains the refractory metal using a target material which contains the refractory metal and a highly electrically conductive material; and the electrode holding portion on which the arc-proof material member is formed, is machined in reducing atmosphere or atmosphere which does not oxidize into a shape having blades which are separated by a spiral groove and a convex portion in its center. <P>COPYRIGHT: (C)2004,JPO

Description

Detailed Description of the Invention

[0001]

TECHNICAL FIELD The present invention relates to an electrode for a vacuum circuit breaker and a method for manufacturing the same.

[0002]

2. Description of the Related Art A vacuum circuit breaker is a circuit breaker that uses a vacuum as an insulating / arc-extinguishing medium, and is currently the mainstream of small-capacity circuit breakers due to its advantages such as high safety and easy maintenance and inspection. Has become. Installation places are various buildings, hotels, substations, underground malls, petroleum complex, various factories, stations, vehicles,
It is used in high-voltage power receiving and transforming facilities such as hospitals, halls, and public facilities, and is used together with other power receiving and distributing equipment such as disconnecting switches, grounding switches, lightning arresters, and AC devices.

The vacuum circuit breaker cuts off current and voltage in the vacuum valve. In the valve, a pair of fixed side electrodes and movable side electrodes are arranged correspondingly. Both electrodes have an arc electrode on the side where they contact each other, and have an electrode support portion connected to the back surface thereof, and an electrode rod connected to the electrode support portion extends to the outside and is connected to an external conductor terminal. These arc electrodes,
The electrode supporting portion and the electrode rod are formed of a conductive base material.

The arc electrode is directly exposed to the arc generated when the current and voltage are cut off. Therefore, the characteristics required for the arc electrode are that the breaking capacity is large, the withstand voltage value is high, the contact resistance value is small (excellent in electrical conduction), the welding resistance is excellent, The consumption amount is small and the cutting current value is small.

However, it is difficult to satisfy all of these characteristics, and in general, a material in which particularly important characteristics are emphasized according to the application and other characteristics are sacrificed to some extent is used.

[0006] As a method of manufacturing an arc electrode, a molded body of Cr which is a refractory metal and Cu which is a highly conductive metal is added to Cu.
A manufacturing method of infiltrating a metal is disclosed in JP-A-63-96204, and a refractory metal Cr and a highly conductive metal C are used.
Japanese Patent No. 2874 is a manufacturing method in which Cu is infiltrated into a molded body of u and the remaining portion of the highly conductive metal is processed into an electrode supporting portion and an electrode rod.
Further, Japanese Unexamined Patent Publication No. 5-101749 discloses a manufacturing method in which a molded body of Cr, which is a refractory metal, and Cu, which is a highly conductive metal, is sintered.

[0007]

In Japanese Patent No. 2874522, a porous molded body is placed in a heat resistant container, a highly conductive metal is placed on the molded body, and the heat resistant container is completely filled with alumina powder. After filling, the electrode is manufactured by infiltrating a highly conductive metal. However, in the case of this manufacturing method, if the filling of the alumina powder is not uniform, defects such as insufficient infiltration will occur and the material yield will decrease, and since the time is spent for filling the alumina powder, the production efficiency will decrease. Since the alumina powder was deposited on the surface of the ingot after the immersion, there were problems such as the short life of the cutting tool used for electrode processing.

Further, in JP-A-63-96204,
Place a porous molded body in a heat resistant container coated with a mold release material and dry it, place a highly conductive metal on the molded body, cover the heat resistant container with a heat storage material, and then melt the highly conductive metal. The electrodes are manufactured by dipping. In the case of this manufacturing method,
There is no decrease in production efficiency due to filling with alumina powder, and the life of the cutting tool during machining does not matter. However, since it takes a lot of time to apply and dry the release material, the highly conductive metal installed on the porous molded body also functions as a feeder member, making it difficult to control infiltration and further reducing the material yield. Problems such as occurred.

In Japanese Patent Laid-Open No. 5-101749, an electrode is manufactured by sintering a porous compact. In the case of this manufacturing method, since the molded body is installed in the furnace, the production efficiency is improved, and since the electrode is a sintered body and is soft, the life of the cutting tool during processing is long. However, there were many deformations and variations in shape during sintering, which adversely affected the electrode characteristics such as breaking characteristics, withstand voltage characteristics, and welding resistance characteristics, and the material yield.

On the other hand, no matter which manufacturing method is used to manufacture the electrode, conditioning is required. This is a step of forming a finely textured layer of refractory metal and highly conductive metal, which is called a conditioning layer, on the surface of the electrode, which is quenched and melted to improve and stabilize the electrode characteristics. However, in this step, since the layer thickness cannot be made uniform, it is often impossible to block the conditioning layer at the thinnest point, and the electrode contacts are likely to be point contacts, which also adversely affects the welding resistance.

Therefore, an object of the present invention is to improve the conventional method to reduce the production cost and to provide a vacuum circuit breaker electrode having a fine structure layer on the surface and excellent in breaking, withstanding voltage and welding resistance, and its manufacture. To provide a method.

[0012]

As a first means for achieving the above object, an arc resistant member, an electrode supporting portion,
In the electrode for a vacuum circuit breaker, the arc member is formed by a film forming method using a target material having a refractory metal and a highly conductive metal.

As a second means, the film forming method in the first means is sputtering.

As a third means for achieving the above object, the film forming method in the first means is characterized by ion plating.

Further, as a fourth means, in the first means, the electrode supporting portion is an ingot or a sintered body of a refractory metal and a highly conductive metal. Further, as a fifth means, in the first means, the refractory metal forming the arc resistant member has a particle size of 0.1 μm to 30 μm.

Further, as a sixth means, in the first means, the arc resistant member comprises 20 wt% to 100 wt% of a refractory metal and 0 wt% to 80 wt% of a highly conductive metal. As a seventh means, the arc resistant member in the first means is 0.1 ppm to 1000 ppm Al, 0.1 ppm to 1000 ppm Si and 1 ppm to 500 ppm.
It is characterized by containing ppm O ₂ .

As an eighth means, the arc-resistant member in the first means has a specific resistance of 3.5 μΩcm or more.

As a ninth means, in the first means, the electrode supporting portion is a sintered body of a refractory metal and a highly conductive metal, and 0% to 40% by weight of the refractory metal and 6%
0% to 100% by weight.

As a tenth means, in the first means, the electrode supporting portion is a sintered body of a refractory metal and a highly conductive metal, and 50 ppm to 3000 ppm of Al and 50 ppm to 30 ppm.
Characterized in that it contains O ₂ Si and 500ppm~3000ppm of 00Ppm.

Further, as an eleventh means, in the first means, the electrode supporting portion is a sintered body of a refractory metal and a highly conductive metal, and the particle diameter of the refractory metal constituting the sintered body is 150 μm.
It is characterized by having m or less of 95% by weight or more.

Further, as a twelfth means, in the first means, the electrode supporting portion is a sintered body of a refractory metal and a highly conductive metal, and the particle diameter of the highly conductive metal constituting the sintered body is 106.
It is characterized by containing 50% by weight or more of powder having a particle size of not more than μm.

Further, as a thirteenth means, in the first means, the refractory metal is Cr, W, Mo, Ta, Nb, B.
e, Hf, Ir, Pt, Zr, Ti, Si, Rh and R
It is characterized by comprising one or a mixture of two or more kinds of u.

Further, as a fourteenth means, the high-conductivity metal in the first means is characterized by comprising one kind or a mixture or compound of two or more kinds of Cu, Ag and Au.

Further, as a fifteenth means, there is provided a method of manufacturing an electrode for a vacuum circuit breaker, wherein an arc supporting is performed by using a target material having a refractory metal and a highly conductive metal as an electrode supporting portion containing a refractory metal. A step of forming a member, and the electrode supporting portion on which the arc resistant member is formed are separated from each other by a spiral groove in a reducing atmosphere or a non-oxidizing atmosphere, and have a convex shape at the center. The process of processing,
It is characterized by having.

Further, as a sixteenth means, there is provided a method for manufacturing an electrode for a vacuum circuit breaker, wherein an arc supporting is performed by using a target material having a refractory metal and a highly conductive metal as an electrode supporting portion containing a refractory metal. A step of forming a member, and a step of processing the electrode supporting portion on which the arc resistant member is formed so as to have a circular shape in a reducing atmosphere or a non-oxidizing atmosphere and to have a convex portion in the central portion. Is characterized by.

Further, as a seventeenth means, in the step of forming the arc resistant member in the fifteenth or sixteenth means,
It is characterized by being sputtering.

Further, as an eighteenth means, the step of forming the arc resistant member in the fifteenth or sixteenth means comprises:
It is characterized by being an ion plating.

Further, as a nineteenth means, the step of processing the electrode supporting portion on which the arc resistant member is formed in the fifteenth or sixteenth means is 180 MPa to 800 MPa.
Under a pressure of 900 ° C. to 1080 ° C.

A twentieth means is a method of manufacturing an electrode for a vacuum circuit breaker, which comprises mixing and sintering a refractory metal and a highly conductive metal to form an electrode supporting portion of a sintered body. A step of forming an arc resistant member using a target material having the refractory metal and a highly conductive metal in the electrode supporting portion; and the electrode supporting portion having the arc resistant member formed thereon,
A step of processing in a reducing atmosphere or a non-oxidizing atmosphere so as to have a circular shape and to have a convex portion in the center portion. It is characterized in that it is formed by a film forming method using a target material having a refractory metal and a highly conductive metal for the sintering resistance.

Further, as a twenty-first means, a method of manufacturing an electrode for a vacuum circuit breaker, wherein a step of mixing and sintering a refractory metal and a highly conductive metal to form an electrode supporting portion of a sintered body. A step of forming an arc resistant member using a target material having a refractory metal and a highly conductive metal in the electrode supporting portion, and the electrode supporting portion on which the arc resistant member is formed in a reducing atmosphere or a non-oxidizing state. And a step of processing to have a convex portion at the center, which is a blade type separated by a spiral groove in a natural atmosphere.

Further, as a twelfth means, a fixed side electrode, a movable side electrode arranged to face the fixed side electrode, and an intermediate shield arranged around the fixed side electrode and the movable side electrode. , And at least one of the fixed side electrode and the movable side electrode has an arc resistant member and an electrode supporting portion, and the arc member has a refractory metal and a highly conductive metal. It is characterized in that it is formed by a film forming method using a target material.

In addition, as a twenty-third means, in the twenty-second means, the electrode supporting portion is an ingot or a sintered body of a refractory metal and the high conductivity metal.

[0033]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings.

Example 1 FIG. 1 shows a cross section of an arc electrode 1 produced according to the present invention. FIG. 1 (a) is a cross sectional view and FIG. 1 (b) is a plan view. The arc electrode 1 includes an arc resistant member 2 and an electrode support portion 3.

A specific manufacturing method will be described with reference to FIG.

A Cu plate 4 having a diameter of 40 mm and a thickness of 10 mm was washed with acetone, dried, and set in an RF magnetron sputtering device. In this case, a Cu sintered body may be used instead of the Cu plate 4. Since Cr is deposited as a refractory metal and Cu is deposited as a highly conductive metal, the target is a Cr—Cu alloy target 5 (40Cr-60).
Cu alloy) was set. And Ar gas pressure: 5 × 1
The Cr—Cu film 6 was deposited to a thickness of 4.5 μm under the conditions of 0 ⁻³ Torr, output: 500 W, substrate distance: 50 mm, substrate temperature: room temperature. The result of measuring the specific resistance as an evaluation test is 5.1 μm
Met. The elemental analysis shows that Al is 20 ppm and Si is 3
0 ppm, which contained 250ppm respectively the O _2, Cr-C
The component of u was 39Cr-61Cu. Moreover, as a result of observing the surface of the arc electrode 1 with a scanning electron microscope, the surface was smooth and was a surface with few droplets and pinholes. Furthermore, as a result of observing the cross section in the same manner, the particle diameter of Cr which is the refractory metal of the arc resistant member 2 is 0.1 μm to 30 μm.
was μm.

Next, the arc resistant member 2 and the electrode supporting portion 3 were machined to produce the arc electrode 1 shown in FIG.
The arc electrode 1 has a depth reaching from the arc resistant member 2 to the electrode support portion 3 and a spiral groove 7 having a shape formed from the inner peripheral side to the outer peripheral side of the surface of the arc electrode 1. However, in some cases, the spiral groove 7 may not be provided. The spiral groove 7 is separated at the outer peripheral side end. When the reinforcing plate 8 is provided, the number of spiral grooves may be 3 to
Five is desirable. However, if the reinforcing plate 8 is not provided, it is preferable that the number is three or less in terms of strength. The reinforcing plate 8 and the electrode rod 9 are brazed to the back surface of the electrode supporting portion 3.

Next, a vacuum valve was assembled using the arc electrode 1. The sectional view is shown in FIG.

The vacuum valve is surrounded by a cylinder 10 made of alumina. In the cylinder 10, the arc electrode 1 having the spiral groove 7, the electrode rod 9, and the reinforcing plate 8 (with or without) are metallurgically brazed to be integrated with the fixed electrode 11 and movable. Has a side electrode 12,
They exist in a form of facing each other. An intermediate shield 13 is provided around the fixed electrode 11 and the movable electrode 12. This is for preventing the metal vapor generated during the current interruption from adhering to the cylinder 10 or for electric field relaxation. The movable side electrode 12 has a metal bellows 1
4 exists, and the movable electrode moves the electrode. Further, a seal ring 15 is present so that metal vapor does not adhere to the metal bellows 14. The current interruption is performed by all these functions.

When the vacuum valve was incorporated into a vacuum circuit breaker and a breaking test was conducted, the breaking characteristics and the withstand voltage characteristics were good, and the results of the separately conducted welding resistance test were also good.

(Example 2) C of Cr-Cu as a target
The arc electrode 1 was produced by the same production method while changing the amount of r between 20 and 100% by weight.

As a result of an analysis similar to that of Example 1, the specific resistance also tended to increase as the amount of Cr increased, and the specific resistances were all 3.5 μm or more. The elemental analysis was not related to the change of Cr content, but 0.1 ppm to 1000 ppm of A
l, 0.1ppm-1000ppm Si, 1ppm-500ppm
Of O ₂ was always contain. The particle size of the refractory metal Cr of the arc resistant member 2 was 0.1 μm to 30 μm.

When a vacuum valve was incorporated into a vacuum circuit breaker and a breaking test was conducted in the same manner as in Example 1, the breaking characteristics and the withstand voltage characteristics were good, and the results of the separately conducted welding resistance test were also good.

(Example 3) A method for manufacturing a sintered body will be described with reference to FIG.

25% by weight of Cr powder as a refractory metal,
75% by weight of Cu powder as a highly conductive metal was mixed with a V mixer. The Cr powder used has O ₂ of 50 ppm to 30
00ppm, Al 50ppm-3000ppm, Si 50ppm
It contains trace elements up to 3000ppm. The mixed powder was molded at a pressure of 180 MPa using a mold having a diameter of 40 mm to produce a molded body 16 having a diameter of 40 mm and a thickness of 10 mm.

The molded body 16 was placed on the graphite dish A17, and further the graphite dish B18 was installed so as to cover the molded body for uniform heating, and 6.7 × in a vacuum electric furnace for heating.
It was heated at 1020 ° C. for 60 minutes in a vacuum of 10 ⁻³ Pa or less. When these are taken out from the graphite dish A17 after sintering, a sintered body can be obtained. The trace elements (Al: 50 ppm to 3000 ppm, Si: 50 pp) existing in the molded body 16
m to 3000 ppm) is contained in the sintered body. Further, the graphite plates A17 and B18 can also have the same effect with a plate or a crucible.

The sintered body was washed with acetone, dried, and then subjected to RF.
Example 1 set in a magnetron sputtering apparatus
A Cr-Cu film 6 having a thickness of 4.5 μm was formed in the same manner as in.

Analysis, tests and the like were carried out in the same manner as in Example 1, but similarly good results were obtained.

(Example 4) When the sintered body was produced, the Cr content was set to 0.
Example 3 was prepared by changing the content of the powder to 40% by weight.
A sintered body similar to that was prepared. Then, similarly,
As a result of tests and the like, good results were obtained as in Example 1.

(Example 5) Although the molding conditions for manufacturing the molded body 16 were changed from 180 MPa to 800 MPa, a sintered body similar to that of Example 3 was manufactured. After that, analysis, tests and the like were carried out in the same manner as in Example 1, and similarly good results were obtained.

Example 6 A sintered body similar to that of Example 3 was prepared by changing the sintering conditions at the time of producing the sintered body to a sintering temperature of 900 ° C. to 1080 ° C. and a reducing atmosphere. Was created. After that, analysis, tests and the like were carried out in the same manner as in Example 1, and similarly good results were obtained.

(Embodiment 7) Refractory metals other than Cr are W, Mo, Ta, Nb, Be, Hf, Ir, Pt, Z.
When one or more mixtures or compounds of r, Ti, Si, Rh and Ru are changed, or the kind of highly conductive metal is one or more mixtures or compounds of Ag and Au other than Cu. However, the same results as in Examples 1 to 6 were obtained.

Further, the film forming method of the arc resistant member 2 formed on the electrode supporting portion 3 is not limited to RF sputtering,
Similar results can be obtained by a film forming method using a target material such as a series of sputterings typified by magnetron sputtering and DC sputtering and a series of ion platings typified by arc ion plating.

As described above, according to the present invention, the arc-resistant member having the fixed-side electrode and the movable-side electrode, and the entire surfaces of both electrodes facing each other are made of an alloy containing a refractory metal and a highly conductive metal. In the electrode for vacuum circuit breaker, the arc-resistant member is formed on the ingot of the highly conductive metal or the sintered body made of the refractory metal and the highly conductive metal, which is the electrode supporting portion, by the film forming method using the target material. Since it is manufactured in a vacuum, it has a low production cost, and has a fine structure layer in which the grain size of the refractory metal constituting the arc resistant member is 0.1 μm to 30 μm, and it has excellent withstand voltage and welding resistance. And a method for manufacturing the same can be provided.

[0055]

As described above, it is possible to provide an electrode for a vacuum circuit breaker which has a low production cost and which has a fine structure layer on the surface and is excellent in blocking, withstand voltage and welding resistance, and a manufacturing method thereof.

[Brief description of drawings]

FIG. 1 is an external view of an arc electrode.

FIG. 2 is a diagram showing a method of manufacturing an arc electrode.

FIG. 3 is a view showing a cross section of a vacuum valve.

FIG. 4 is a diagram showing a particle size distribution of a refractory metal.

FIG. 5 is a diagram showing a particle size distribution of a highly conductive metal.

FIG. 6 is a diagram showing a method for manufacturing a sintered body.

[Explanation of symbols]

1 ... Arc electrode, 2 ... Arc resistant member, 3 ... Electrode support,
4 ... Cu plate, 5 ... Cr-Cu alloy target, 6 ... Cr
-Cu film, 7 ... Spiral groove, 8 ... Reinforcing plate, 9 ... Electrode rod, 10 ... Cylinder, 11 ... Fixed side electrode, 12 ... Movable side electrode, 13 ... Intermediate shield, 14 ... Metal bellows, 1
5 ... Seal ring, 16 ... Molded body, 17 ... Graphite dish A,
18 ... Graphite plate B, 19 ... Spacer.

   ─────────────────────────────────────────────────── ─── Continued front page    (72) Inventor Katsuhiro Komuro             7-1-1, Omika-cho, Hitachi-shi, Ibaraki Prefecture             Inside the Hitachi Research Laboratory, Hitachi Ltd. (72) Inventor Noboru Baba             7-1-1, Omika-cho, Hitachi-shi, Ibaraki Prefecture             Inside the Hitachi Research Laboratory, Hitachi Ltd. F-term (reference) 4K029 AA02 BA21 CA03 CA05 DC04                 5G026 BA02 BA04 BB02 BB03 BB04                       BB12 BB14 BB15 BB16 BB17                       BB18 BC03 BC05 BC09

Claims (23)

[Claims] 1. An electrode for a vacuum circuit breaker having an arc resistant member and an electrode supporting portion, wherein the arc member is formed by a film forming method using a target material having a refractory metal and a highly conductive metal. An electrode for a vacuum circuit breaker characterized by being formed. 2. The electrode for a vacuum circuit breaker according to claim 1, wherein the film forming method is sputtering. 3. The electrode for a vacuum circuit breaker according to claim 1, wherein the film forming method is ion plating. 4. The electrode for a vacuum circuit breaker according to claim 1, wherein the electrode supporting portion is an ingot or a sintered body of the refractory metal and the highly conductive metal. 5. The electrode for a vacuum circuit breaker according to claim 1, wherein the refractory metal forming the arc resistant member has a particle size of 0.1 μm to 30 μm. 6. The arc resistant member comprises 20% by weight to 100% by weight.
The electrode for a vacuum circuit breaker according to claim 1, wherein the electrode has a refractory metal of 0 wt% and the highly conductive metal of 0 wt% to 80 wt%. 7. The arc resistant member comprises 0.1 ppm to 1000 ppm.
ppm Al, 0.1 ppm-1000 ppm Si and 1 ppm-
2. The composition according to claim 1, which contains 500 ppm of O _2.
The vacuum circuit breaker electrode described. 8. The specific resistance of the arc resistant member is 3.5 μΩc
The electrode for a vacuum circuit breaker according to claim 1, wherein the electrode is for m or more. 9. The electrode supporting portion is a sintered body of the refractory metal and the high-conductivity metal, and 0% by weight to 40% by weight.
2. The electrode for a vacuum circuit breaker according to claim 1, wherein the refractory metal and 60 wt% to 100 wt% are included. 10. The electrode supporting portion is a sintered body of the refractory metal and the high-conductivity metal, and is 50 ppm to 3000 p.
pm Al, 50ppm-3000ppm Si and 500ppm
The electrode for a vacuum circuit breaker according to claim 1, which contains ˜3000 ppm of O ₂ . 11. The electrode supporting portion is a sintered body of the refractory metal and the high-conductivity metal, and the particle diameter of the refractory metal forming the sintered body is not less than 150 μm and not less than 95% by weight. The electrode for a vacuum circuit breaker according to claim 1, wherein: 12. The electrode supporting portion is a sintered body of the refractory metal and the high-conductivity metal, and the high-conductivity metal forming the sintered body has a particle diameter of 106 μm or less of 50 parts by weight of powder. % Or more, The electrode for a vacuum circuit breaker according to claim 1, wherein 13. The refractory metal is Cr, W, Mo, T.
a, Nb, Be, Hf, Ir, Pt, Zr, Ti, S
The electrode for a vacuum circuit breaker according to claim 1, which is composed of one kind or a mixture or compound of two or more kinds of i, Rh and Ru. 14. The highly conductive metal is Cu, Ag or A.
The electrode for a vacuum circuit breaker according to claim 1, which is composed of one kind or a mixture of two or more kinds of u. 15. A step of forming an arc resistant member on an electrode supporting portion containing a refractory metal by using a target material having the refractory metal and a highly conductive metal; and the step of forming the arc resistant member. A vacuum circuit breaker characterized by comprising: a step of processing the electrode supporting portion in a reducing atmosphere or a non-oxidizing atmosphere so as to have a blade shape separated by a spiral groove and having a convex portion in a central portion. Electrode manufacturing method. 16. A step of forming an arc resistant member on an electrode supporting portion containing a refractory metal by using a target material having the refractory metal and a highly conductive metal, and the step of forming the arc resistant member. And a step of processing the electrode supporting portion so as to have a circular shape in a reducing atmosphere or a non-oxidizing atmosphere and to have a convex portion at a central portion thereof. 17. The method according to claim 15, wherein the step of forming the arc resistant member is sputtering.
6. The method for manufacturing a vacuum circuit breaker electrode according to 6. 18. The step of forming the arc resistant member is ion plating.
Or the manufacturing method of the electrode for vacuum circuit breakers of Claim 16. 19. The process of processing the electrode support portion on which the arc resistant member is formed is performed under a pressure of 180 MPa to 800 MPa and a temperature of 900 ° C. to 1080 ° C. A method of manufacturing an electrode for a vacuum circuit breaker according to claim 1. 20. A step of forming an electrode supporting portion of a sintered body by mixing and sintering a refractory metal and a highly conductive metal, and the refractory metal and the highly conductive metal in the electrode supporting portion. A step of forming an arc resistant member using a target material having, and the electrode support portion on which the arc resistant member is formed is circular in a reducing atmosphere or a non-oxidizing atmosphere and has a convex portion at the center. And a step of processing so as to have a method of manufacturing an electrode for a vacuum circuit breaker. 21. A step of mixing and sintering a refractory metal and a high-conductivity metal to form an electrode supporting portion of a sintered body, the refractory metal and a highly conductive metal in the electrode supporting portion. And a step of forming an arc resistant member using a target material having a blade shape, wherein the electrode supporting portion on which the arc resistant member is formed is separated by a spiral groove in a reducing atmosphere or a non-oxidizing atmosphere. And a step of processing so as to have a convex portion at the center thereof, and a method for manufacturing an electrode for a vacuum circuit breaker. 22. A vacuum valve having a fixed electrode, a movable electrode arranged to face the fixed electrode, and an intermediate shield arranged around the fixed electrode and the movable electrode. At least one of the fixed side electrode and the movable side electrode has an arc resistant member and an electrode supporting portion, and the arc member uses a target material having a refractory metal and a highly conductive metal. A vacuum valve formed by a film forming method. 23. The vacuum valve according to claim 22, wherein the electrode supporting portion is an ingot or a sintered body of the refractory metal and the highly conductive metal.