JP2003302367A - Electrode-cleaning apparatus - Google Patents
Electrode-cleaning apparatusInfo
- Publication number
- JP2003302367A JP2003302367A JP2002109414A JP2002109414A JP2003302367A JP 2003302367 A JP2003302367 A JP 2003302367A JP 2002109414 A JP2002109414 A JP 2002109414A JP 2002109414 A JP2002109414 A JP 2002109414A JP 2003302367 A JP2003302367 A JP 2003302367A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- measurement
- nozzle
- flow path
- fluid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Measuring Volume Flow (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、構成が簡潔に出
来、コストダウンが可能となり、小型安価に出来、メン
テナンス性が向上された電極洗浄装置に関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrode cleaning device having a simple structure, cost reduction, small size and low cost, and improved maintainability.
【0002】[0002]
【従来の技術】図2は、従来より一般に使用されている
従来例の構成説明図で、残留塩素計に使用された例を示
す。2. Description of the Related Art FIG. 2 is a structural explanatory view of a conventional example which has been generally used, showing an example used in a residual chlorine meter.
【0003】従来の残留塩素計101は、図2に示すよ
うに、測定流体が流入する流入口102aとこの測定流
体をオーバーフローさせ排出させる図示しない排出口と
を有する。測定流体を収容する流体収容室(セル)10
2と、この流体収容室102内の測定流体と接触する金
電極本体(指示電極)103と、この金電極本体103
を外周部に有し、ガラスエポキシ樹脂などからなる棒状
の回転電極104と、流体収容室102内に収容され、
セラミックス又はガラスなどからなるビーズ105とを
有する。As shown in FIG. 2, a conventional residual chlorine meter 101 has an inlet 102a into which a measurement fluid flows and an outlet (not shown) through which the measurement fluid overflows and is discharged. Fluid storage chamber (cell) 10 for storing measurement fluid
2, a gold electrode main body (indicating electrode) 103 that comes into contact with the measurement fluid in the fluid storage chamber 102, and the gold electrode main body 103
And a rod-shaped rotary electrode 104 made of glass epoxy resin or the like and housed in the fluid housing chamber 102.
Beads 105 made of ceramics or glass.
【0004】また、流体収容室102内の流体と接触す
る対極(比較電極)106と、回転電極104を回転す
る回転軸107と、この回転軸107を駆動するための
駆動力を発生するモータ108と、このモータ108の
駆動力を回転軸107に伝達するギヤ、ベルト及びプー
リなどによって構成された駆動機構部109とを有す
る。Further, a counter electrode (reference electrode) 106 in contact with the fluid in the fluid storage chamber 102, a rotary shaft 107 for rotating the rotary electrode 104, and a motor 108 for generating a driving force for driving the rotary shaft 107. And a drive mechanism section 109 constituted by a gear, a belt, a pulley and the like for transmitting the driving force of the motor 108 to the rotating shaft 107.
【0005】そして、回転電極104と回転軸107と
を回転自在に連結して支持する軸受110と、金電極本
体103と対極106との間に電圧を印加する電気回路
の一部を構成するコンデンサ111などを備えている。A bearing 110 for rotatably connecting and supporting the rotating electrode 104 and the rotating shaft 107, and a capacitor forming a part of an electric circuit for applying a voltage between the gold electrode body 103 and the counter electrode 106. 111 and the like are provided.
【0006】従来の残留塩素計101では、モータ10
8によって回転電極104を強制的に回転させて流体収
容室102内に水流を形成するとともに、金電極本体1
03と対極104との間に電圧を印可してこれらの電極
間を流れる電流値を測定し、この流体中の残留塩素濃度
を測定していた。In the conventional residual chlorine meter 101, the motor 10
8, the rotating electrode 104 is forcibly rotated to form a water flow in the fluid storage chamber 102, and the gold electrode body 1
A voltage was applied between the electrode 03 and the counter electrode 104 to measure the current value flowing between these electrodes, and the residual chlorine concentration in this fluid was measured.
【0007】また、従来の残留塩素計101では、回転
電極104を強制的に回転させて金電極本体103をビ
ーズ105と接触させ、水垢などが付着した金電極本体
103の表面を洗浄していた。Further, in the conventional residual chlorine meter 101, the rotating electrode 104 is forcibly rotated to bring the gold electrode body 103 into contact with the beads 105 to clean the surface of the gold electrode body 103 on which water stains and the like adhere. .
【0008】[0008]
【発明が解決しようとする課題】従来の残留塩素計10
1では、回転電極104を駆動する回転軸107、モー
タ108、駆動機構部109及び軸受110などの数多
くの回転機構部分を必要とするために、製品が大型化す
るとともに複雑な機械設計が必要になり製品が高価にな
ってしまう問題があった。[Problems to be Solved by the Invention] Conventional residual chlorine meter 10
1 requires a large number of rotary mechanism parts such as the rotary shaft 107 that drives the rotary electrode 104, the motor 108, the drive mechanism part 109, and the bearing 110, so that the product becomes large and a complicated mechanical design is required. There was a problem that the product became expensive.
【0009】また、従来の残留塩素計101では、製品
の性質上連続して運転されるため、モータ108などの
回転機構部の寿命が短くなり、これらの回転機構部分の
交換に必要な部品が高価であるという問題があった。Further, in the conventional residual chlorine meter 101, since the product is continuously operated, the life of the rotating mechanism parts such as the motor 108 is shortened, and the parts necessary for exchanging these rotating mechanism parts are reduced. There was a problem of being expensive.
【0010】本発明の目的は、上記の課題を解決するも
ので、本発明は、構成が簡潔に出来、コストダウンが可
能となり、小型安価に出来、メンテナンス性が向上され
た電極洗浄装置を提供することにある。An object of the present invention is to solve the above-mentioned problems. The present invention provides an electrode cleaning apparatus having a simple structure, cost reduction, small size and low cost, and improved maintainability. To do.
【0011】[0011]
【課題を解決するための手段】このような目的を達成す
るために、本発明では、請求項1記載の電極洗浄装置に
おいて、測定流路内の電極を洗浄する電極洗浄装置にお
いて、鉛直方向に設けられ下方より上方に測定流体が流
れる測定流路と、この測定流路の途中に設けられ測定流
路の下方より上方方向に前記測定流体を噴射するノズル
と、前記測定流路に設けられ前記ノズルの噴射口に電極
面が対向して配置された測定電極と、前記ノズルの噴射
口と前記測定電極の電極面との間に設けられ前記ノズル
からの測定流体の噴射により前記測定電極の電極面に接
触して電極面を洗浄する複数のビーズとを具備した事を
特徴とする。In order to achieve such an object, according to the present invention, in the electrode cleaning device according to claim 1, the electrode cleaning device for cleaning the electrode in the measurement channel is provided with a vertical direction. A measurement channel provided with a measurement fluid flowing upward from below, a nozzle provided in the middle of the measurement channel for ejecting the measurement fluid upward from below the measurement channel, and a nozzle provided in the measurement channel A measurement electrode whose electrode surface is arranged so as to face the ejection port of the nozzle, and an electrode of the measurement electrode which is provided between the ejection port of the nozzle and the electrode surface of the measurement electrode by ejecting the measurement fluid from the nozzle. A plurality of beads contacting the surface and cleaning the electrode surface.
【0012】本発明の請求項2記載の電極洗浄装置にお
いて、前記測定流路に直交して設けられ前記測定電極の
電極表面に面方向に前記測定流体を噴射する水平ノズル
を具備した事を特徴とする請求項1記載の電極洗浄装
置。The electrode cleaning apparatus according to a second aspect of the present invention is characterized by comprising a horizontal nozzle that is provided orthogonal to the measurement flow path and that jets the measurement fluid in the surface direction on the electrode surface of the measurement electrode. The electrode cleaning device according to claim 1.
【0013】本発明の請求項1又は請求項2記載の電極
洗浄装置において、前記流路の前記ノズルの噴射口部分
が漏斗状の形状をしたことを特徴とする。In the electrode cleaning apparatus according to the first or second aspect of the present invention, the injection port portion of the nozzle of the flow path has a funnel shape.
【0014】[0014]
【発明の実施の形態】以下図面を用いて本発明を詳しく
説明する。図1は本発明の一実施例の要部構成説明図
で、残留塩素計に使用された例を示す。図において、図
2と同一記号の構成は同一機能を表す。以下、図2と相
違部分のみ説明する。DETAILED DESCRIPTION OF THE INVENTION The present invention will be described in detail below with reference to the drawings. FIG. 1 is an explanatory view of the main configuration of an embodiment of the present invention, showing an example used in a residual chlorine meter. In the figure, the same symbols as those in FIG. 2 indicate the same functions. Only parts different from FIG. 2 will be described below.
【0015】図において、1は、残留塩素計の本体ブロ
ックである。2は、本体ブロック1に鉛直方向に設けら
れ、下方より上方に測定流体が流れる測定流路である。In the figure, 1 is a main block of the residual chlorine meter. Reference numeral 2 denotes a measurement flow path which is provided in the main body block 1 in the vertical direction and through which the measurement fluid flows from below to above.
【0016】3は、測定流路2の途中に設けられ、測定
流路2の下方より上方方向に測定流体FLを噴射するノ
ズルである。4は、測定流路2に設けられ、ノズルの噴
射口31に電極面41が対向して配置された測定電極で
ある。Reference numeral 3 denotes a nozzle which is provided in the middle of the measurement flow path 2 and injects the measurement fluid FL from below the measurement flow path 2 to above. Reference numeral 4 denotes a measurement electrode which is provided in the measurement flow path 2 and whose electrode surface 41 faces the ejection port 31 of the nozzle.
【0017】5は、ノズルの噴射口31と測定電極の電
極面41との間に設けられ、ノズル4からの測定流体F
Lの噴射により、測定電極の電極面41に接触して電極
面を洗浄する複数のビーズである。The reference numeral 5 is provided between the injection port 31 of the nozzle and the electrode surface 41 of the measuring electrode, and the measuring fluid F from the nozzle 4 is supplied.
These are a plurality of beads that are brought into contact with the electrode surface 41 of the measurement electrode to wash the electrode surface by jetting L.
【0018】6は、本体ブロック1に測定流路2に面し
て設けられた対極(比較電極)である。なお、この場合
は、流路2のノズルの噴射口31が配置された部分21
が、漏斗状の形状をしている。7はリード線、8はOリ
ングである。Reference numeral 6 is a counter electrode (reference electrode) provided on the main body block 1 so as to face the measurement flow path 2. In this case, the portion 21 where the injection port 31 of the nozzle of the flow path 2 is arranged
However, it has a funnel shape. 7 is a lead wire and 8 is an O-ring.
【0019】以上の構成において、測定流体FLが、測
定流路2の下方から流入し、ノズルの噴射口31からの
測定流体FLの噴出により、測定電極4の下方のビーズ
5が流動する。In the above structure, the measurement fluid FL flows in from below the measurement flow path 2, and the ejection of the measurement fluid FL from the injection port 31 of the nozzle causes the beads 5 below the measurement electrode 4 to flow.
【0020】ビーズ5は測定電極4に衝突した後、ノズ
ルの噴射口31に戻り、再び測定流体FLにより噴出さ
れる動作に移行し、上記運動を繰り返す。これらの動作
により、電極面41の表面にビーズ5が常に衝突し、電
極面41の表面を洗浄する。After the beads 5 have collided with the measurement electrode 4, they return to the injection port 31 of the nozzle and again move to the operation of being ejected by the measurement fluid FL, and the above-mentioned movement is repeated. By these operations, the beads 5 constantly collide with the surface of the electrode surface 41 to wash the surface of the electrode surface 41.
【0021】本発明者の実験により、指示値の比較を行
ったところ、本発明装置は有効な洗浄効果が認められ
た。一両日で指示が下がっていた、これまでの洗浄子が
無い試作機と比較すると、明確な洗浄結果が確認されて
いる。As a result of an experiment conducted by the present inventor, the indicated values were compared, and it was confirmed that the apparatus of the present invention had an effective cleaning effect. A clear cleaning result is confirmed in comparison with the conventional prototype without a cleaning element, which had been instructed in one or two days.
【0022】この結果、
(1)強制的に電極面を洗浄する機械的駆動機構が不要
になったので、製品化においては大幅なコストダウンが
可能になる電極洗浄装置が得られる。また、メンテナン
ス等が非常に簡単になる。As a result, (1) a mechanical drive mechanism for forcibly cleaning the electrode surface is not required, so that an electrode cleaning device which can significantly reduce the cost in the commercialization can be obtained. Moreover, maintenance and the like becomes very easy.
【0023】(2)構造自体が簡素化され、コストダウ
ンと小型化が出来、メンテナンスが非常に簡単になる電
極洗浄装置が得られる。(2) An electrode cleaning device having a simplified structure, cost reduction and size reduction, and very easy maintenance can be obtained.
【0024】(3)部品点数が減り、重量も軽減できる
ので、従来製品と比較した場合、地球環境設計において
も貢献できる電極洗浄装置が得られる。(3) Since the number of parts can be reduced and the weight can be reduced, an electrode cleaning device that can contribute to global environment design can be obtained as compared with conventional products.
【0025】(4)流路2のノズルの噴射口31部分が
漏斗状の形状にすれば、ビーズ5がすばやくノズルの噴
射口31に集まり、電極面41を洗浄する効率が更に向
上された電極洗浄装置が得られる。(4) If the nozzle outlet portion 31 of the flow path 2 is formed in a funnel shape, the beads 5 quickly gather at the nozzle outlet portion 31 and the electrode for further cleaning the electrode surface 41 is further improved. A cleaning device is obtained.
【0026】図2は本発明の他の実施例の要部構成説明
図である。本実施例において、11は、測定流路2に直
交して設けられ、測定電極4の電極表面41に面方向に
測定流体FLを噴射する水平ノズルである。FIG. 2 is an explanatory view of the essential structure of another embodiment of the present invention. In the present embodiment, 11 is a horizontal nozzle that is provided orthogonal to the measurement flow path 2 and that jets the measurement fluid FL in the surface direction onto the electrode surface 41 of the measurement electrode 4.
【0027】この結果、水平ノズル11が設けられたの
で、ビーズ5が、測定電極4の電極表面でより積極的に
回転するように促すことが出来るので、電極面41を洗
浄する効率が、更に更に向上された電極洗浄装置が得ら
れる。As a result, since the horizontal nozzle 11 is provided, the beads 5 can be encouraged to rotate more actively on the electrode surface of the measuring electrode 4, so that the efficiency of cleaning the electrode surface 41 is further improved. A further improved electrode cleaning device can be obtained.
【0028】なを、前述の実施例においては、流路2の
ノズルの噴射口31が配置された部分21が、漏斗状の
形状をしていると説明したが、これに限る事は無く、た
とえば、平らな底面をなしても良く、要するに、ビーズ
5が、ノズルの噴射口31からの測定流体FLの噴射に
より、測定電極4の電極面41に接触して電極面41を
洗浄出来る構成で有れば良い。In the above-mentioned embodiment, it has been described that the portion 21 of the flow path 2 where the injection port 31 of the nozzle is arranged has a funnel shape, but the present invention is not limited to this. For example, it may have a flat bottom surface. In short, the bead 5 can contact the electrode surface 41 of the measurement electrode 4 and wash the electrode surface 41 by the ejection of the measurement fluid FL from the ejection port 31 of the nozzle. I wish I had it.
【0029】また、本発明は残留塩素計だけでなく、表
面が平坦な電極を有し、この電極の周辺に測定流体など
が一定流速で流れる構造の装置についてもこの発明を適
用することができることは勿論である。Further, the present invention can be applied not only to the residual chlorine meter but also to an apparatus having an electrode having a flat surface and a structure in which a measuring fluid or the like flows at a constant flow velocity around the electrode. Of course.
【0030】なお、以上の説明は、本発明の説明および
例示を目的として特定の好適な実施例を示したに過ぎな
い。したがって本発明は、上記実施例に限定されること
なく、その本質から逸脱しない範囲で更に多くの変更、
変形をも含むものである。The above description merely shows specific preferred embodiments for the purpose of explaining and exemplifying the present invention. Therefore, the present invention is not limited to the above-mentioned embodiment, and many modifications are made without departing from the essence thereof.
It also includes deformation.
【0031】[0031]
【発明の効果】以上説明したように、本発明の請求項1
によれば、次のような効果がある。測定流路内の電極を
洗浄する電極洗浄装置において、鉛直方向に設けられ下
方より上方に測定流体が流れる測定流路と、この測定流
路の途中に設けられ測定流路の下方より上方方向に前記
測定流体を噴射するノズルと、前記測定流路に設けられ
前記ノズルの噴射口に電極面が対向して配置された測定
電極と、前記ノズルの噴射口と前記測定電極の電極面と
の間に設けられ前記ノズルからの測定流体の噴射により
前記測定電極の電極面に接触して電極面を洗浄する複数
のビーズとを具備した事を特徴とする電極洗浄装置を構
成した。As described above, according to the first aspect of the present invention.
According to the above, there are the following effects. In an electrode cleaning device that cleans the electrodes in the measurement channel, a measurement channel that is provided in the vertical direction and through which the measurement fluid flows from below is provided, and a measurement channel that is provided in the middle of this measurement channel is provided above that below the measurement channel. Between the nozzle that ejects the measurement fluid, the measurement electrode that is provided in the measurement flow path and has the electrode surface facing the ejection port of the nozzle, and between the ejection port of the nozzle and the electrode surface of the measurement electrode. And a plurality of beads for cleaning the electrode surface of the measuring electrode by contacting the electrode surface of the measuring electrode by jetting the measuring fluid from the nozzle.
【0032】この結果、
(1)強制的に電極面を洗浄する機械的駆動機構が不要
になったので、製品化においては大幅なコストダウンが
可能になる電極洗浄装置が得られる。メンテナンス等が
非常に簡単になる。As a result, (1) a mechanical drive mechanism for forcibly cleaning the electrode surface is no longer required, so that an electrode cleaning apparatus which can significantly reduce the cost in commercialization can be obtained. Maintenance is very easy.
【0033】(2)構造自体が簡素化され、コストダウ
ンと小型化が出来、メンテナンスが非常に簡単になる電
極洗浄装置が得られる。(2) An electrode cleaning apparatus having a simplified structure, cost reduction and size reduction, and very easy maintenance can be obtained.
【0034】(3)部品点数が減り、重量も軽減できる
ので、従来製品と比較した場合、地球環境設計において
も貢献できる電極洗浄装置が得られる。(3) Since the number of parts can be reduced and the weight can be reduced, an electrode cleaning device that can contribute to global environment design can be obtained as compared with conventional products.
【0035】本発明の請求項2によれば、次のような効
果がある。水平ノズルが設けられたので、ビーズが、測
定電極の電極表面でより積極的に回転するように促すこ
とが出来るので、電極面を洗浄する効率が、更に更に向
上された電極洗浄装置が得られる。According to the second aspect of the present invention, there are the following effects. Since the horizontal nozzle is provided, the beads can be urged to rotate more actively on the electrode surface of the measurement electrode, so that the electrode cleaning device with further improved efficiency of cleaning the electrode surface can be obtained. .
【0036】本発明の請求項3によれば、次のような効
果がある。流路のノズルの噴射口部分が漏斗状の形状を
したことを特徴としたので、ビーズがすばやくノズルの
噴射口に集まり、電極面を洗浄する効率が更に向上され
た電極洗浄装置が得られる。According to claim 3 of the present invention, the following effects can be obtained. Since the ejection port of the nozzle of the flow path is shaped like a funnel, beads are quickly collected at the ejection port of the nozzle, and an electrode cleaning device with further improved efficiency of cleaning the electrode surface can be obtained.
【0037】従って、本発明によれば、構成が簡潔に出
来、コストダウンが可能となり、小型安価に出来、メン
テナンス性が向上された電極洗浄装置を実現することが
出来る。Therefore, according to the present invention, it is possible to realize an electrode cleaning device having a simple structure, cost reduction, small size and low cost, and improved maintainability.
【図1】本発明の一実施例の要部構成説明図である。FIG. 1 is an explanatory diagram of a main part configuration of an embodiment of the present invention.
【図2】本発明の他の実施例の要部構成説明図である。FIG. 2 is an explanatory diagram of a main part configuration of another embodiment of the present invention.
【図3】従来より一般に使用されている従来例の要部構
成説明図である。FIG. 3 is an explanatory diagram of a main part configuration of a conventional example that is generally used in the past.
1 本体ブロック 2 測定流路 21 流路2のノズルの噴射口31が配置された部分 3 ノズル 31 ノズルの噴射口 4 測定電極 41 測定電極の電極面 5 ビーズ 6 比較電極 11 水平ノズル FL 測定流体 1 body block 2 measurement channels 21 Portion of the flow path 2 in which the injection port 31 of the nozzle is arranged 3 nozzles 31 Nozzle injection port 4 measuring electrodes 41 Electrode surface of measuring electrode 5 beads 6 Reference electrode 11 horizontal nozzles FL measuring fluid
───────────────────────────────────────────────────── フロントページの続き (72)発明者 植田 武志 東京都武蔵野市中町2丁目9番32号 横河 電機株式会社内 (72)発明者 北本 尚 東京都武蔵野市中町2丁目9番32号 横河 電機株式会社内 ─────────────────────────────────────────────────── ─── Continued front page (72) Inventor Takeshi Ueda 2-9-32 Nakamachi, Musashino City, Tokyo Yokogawa Electric Co., Ltd. (72) Inventor Takashi Kitamoto 2-9-32 Nakamachi, Musashino City, Tokyo Yokogawa Electric Co., Ltd.
Claims (3)
において、 鉛直方向に設けられ下方より上方に測定流体が流れる測
定流路と、 この測定流路の途中に設けられ測定流路の下方より上方
方向に前記測定流体を噴射するノズルと、 前記測定流路に設けられ前記ノズルの噴射口に電極面が
対向して配置された測定電極と、 前記ノズルの噴射口と前記測定電極の電極面との間に設
けられ前記ノズルからの測定流体の噴射により前記測定
電極の電極面に接触して電極面を洗浄する複数のビーズ
とを具備した事を特徴とする電極洗浄装置。1. An electrode cleaning apparatus for cleaning an electrode in a measurement flow path, wherein a measurement flow path is provided in a vertical direction and a measurement fluid flows upward from below, and a measurement flow path provided in the middle of this measurement flow path. A nozzle that ejects the measurement fluid in an upward direction from below, a measurement electrode that is provided in the measurement flow path and has an electrode surface facing the ejection port of the nozzle, and the ejection port of the nozzle and the measurement electrode An electrode cleaning apparatus, comprising: a plurality of beads provided between the electrode surface and the electrode surface of the measurement electrode to wash the electrode surface by jetting a measurement fluid from the nozzle.
電極の電極表面に面方向に前記測定流体を噴射する水平
ノズルを具備した事を特徴とする請求項1記載の電極洗
浄装置。2. The electrode cleaning apparatus according to claim 1, further comprising a horizontal nozzle that is provided orthogonal to the measurement flow path and that sprays the measurement fluid in a surface direction on an electrode surface of the measurement electrode.
状の形状をしたことを特徴とする請求項1又は請求項2
記載の電極洗浄装置。3. The injection port portion of the nozzle of the flow path has a funnel shape.
The electrode cleaning device described.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002109414A JP2003302367A (en) | 2002-04-11 | 2002-04-11 | Electrode-cleaning apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002109414A JP2003302367A (en) | 2002-04-11 | 2002-04-11 | Electrode-cleaning apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2003302367A true JP2003302367A (en) | 2003-10-24 |
Family
ID=29392891
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2002109414A Pending JP2003302367A (en) | 2002-04-11 | 2002-04-11 | Electrode-cleaning apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2003302367A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100778237B1 (en) | 2006-06-26 | 2007-11-22 | 한국바이오시스템(주) | On-line analysis system for heavy metals |
CN109916986A (en) * | 2019-04-15 | 2019-06-21 | 国弘环保仪器(昆山)有限公司 | Self-cleaning digital residual chlorine sensor |
-
2002
- 2002-04-11 JP JP2002109414A patent/JP2003302367A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100778237B1 (en) | 2006-06-26 | 2007-11-22 | 한국바이오시스템(주) | On-line analysis system for heavy metals |
CN109916986A (en) * | 2019-04-15 | 2019-06-21 | 国弘环保仪器(昆山)有限公司 | Self-cleaning digital residual chlorine sensor |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US10086495B2 (en) | Dresser disk cleaning brush, cleaning apparatus, and cleaning method | |
KR101319744B1 (en) | Substrate cleaning apparatus | |
KR20160131243A (en) | Substrate cleaning apparatus | |
KR101275760B1 (en) | High-pressure liquid atomisation nozzle for a machine for cleaning optical lenses or other substrates | |
US8679262B2 (en) | Continual flow pin washer | |
JP2007165554A (en) | Substrate processor and substrate processing method | |
KR101055690B1 (en) | Cleaning and sterilizing device using microbubbles | |
JP2003302367A (en) | Electrode-cleaning apparatus | |
CN211437196U (en) | Water-driven scanning type intermittent water spraying mechanism | |
CN112474524A (en) | Wafer QDR groove for semiconductor | |
JP2007061733A (en) | Ultrasonic-wave cleaning nozzle, its design method and ultrasonic-wave cleaning method | |
CN211637488U (en) | Integrated cleaning arm structure | |
JPH09138214A (en) | Sensor cleaning device | |
KR100996557B1 (en) | Nozzle cleaning apparatus of zet valve for dispensing | |
CN212310245U (en) | Coiled material washing case | |
JP2003251285A (en) | Electrode automatic cleaning device | |
CN217726445U (en) | Wafer brushing device | |
CN215466410U (en) | High-efficient belt cleaning device of metal casting | |
JPS62119543A (en) | Apparatus for producing semiconductor | |
JPH09122697A (en) | Sewage concentrator | |
CN110523731A (en) | A kind of optical glass surface cleaning treatment optimization method | |
JPH1187293A (en) | Cleaning equipment for wafer-containing boat | |
JPH09213666A (en) | Method of cleaning and cleaning device | |
JPH09281808A (en) | Toner concentration sensor | |
JP2894450B2 (en) | Jet scrubber |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A977 | Report on retrieval |
Effective date: 20050603 Free format text: JAPANESE INTERMEDIATE CODE: A971007 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20050721 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20050916 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20060622 |