JP2003295438A5 - - Google Patents
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- Publication number
- JP2003295438A5 JP2003295438A5 JP2002096410A JP2002096410A JP2003295438A5 JP 2003295438 A5 JP2003295438 A5 JP 2003295438A5 JP 2002096410 A JP2002096410 A JP 2002096410A JP 2002096410 A JP2002096410 A JP 2002096410A JP 2003295438 A5 JP2003295438 A5 JP 2003295438A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- repeating unit
- general formula
- formula
- alkali
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000011347 resin Substances 0.000 claims 3
- 229920005989 resin Polymers 0.000 claims 3
- 239000002253 acid Substances 0.000 claims 2
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 125000005843 halogen group Chemical group 0.000 claims 2
- 125000004435 hydrogen atoms Chemical group [H]* 0.000 claims 2
- 229920002120 photoresistant polymer Polymers 0.000 claims 2
- 125000003342 alkenyl group Chemical group 0.000 claims 1
- 125000003545 alkoxy group Chemical group 0.000 claims 1
- 125000005196 alkyl carbonyloxy group Chemical group 0.000 claims 1
- 125000005278 alkyl sulfonyloxy group Chemical group 0.000 claims 1
- 125000003710 aryl alkyl group Chemical group 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 239000003431 cross linking reagent Substances 0.000 claims 1
- 125000004093 cyano group Chemical group *C#N 0.000 claims 1
- 125000000753 cycloalkyl group Chemical group 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- -1 nitrogen containing basic compound Chemical class 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002096410A JP3841405B2 (ja) | 2002-03-29 | 2002-03-29 | ネガ型レジスト組成物 |
| US10/396,583 US6746813B2 (en) | 2002-03-29 | 2003-03-26 | Negative resist composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002096410A JP3841405B2 (ja) | 2002-03-29 | 2002-03-29 | ネガ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003295438A JP2003295438A (ja) | 2003-10-15 |
| JP2003295438A5 true JP2003295438A5 (US20030203305A1-20031030-C00004.png) | 2005-04-07 |
| JP3841405B2 JP3841405B2 (ja) | 2006-11-01 |
Family
ID=29239480
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002096410A Expired - Lifetime JP3841405B2 (ja) | 2002-03-29 | 2002-03-29 | ネガ型レジスト組成物 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US6746813B2 (US20030203305A1-20031030-C00004.png) |
| JP (1) | JP3841405B2 (US20030203305A1-20031030-C00004.png) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4448705B2 (ja) * | 2004-02-05 | 2010-04-14 | 富士フイルム株式会社 | 感光性組成物及び該感光性組成物を用いたパターン形成方法 |
| CN1930526A (zh) * | 2004-02-19 | 2007-03-14 | 斯蒂茨丁荷兰聚合物学会 | 用于制备聚合物凸起结构的方法 |
| TWI495632B (zh) * | 2004-12-24 | 2015-08-11 | Mitsubishi Gas Chemical Co | 光阻用化合物 |
| JP4396849B2 (ja) * | 2005-01-21 | 2010-01-13 | 信越化学工業株式会社 | ネガ型レジスト材料及びパターン形成方法 |
| JP4866605B2 (ja) * | 2005-12-28 | 2012-02-01 | 富士フイルム株式会社 | 感光性組成物、該感光性組成物を用いたパターン形成方法及び該感光性組成物に用いられる化合物 |
| US8404427B2 (en) * | 2005-12-28 | 2013-03-26 | Fujifilm Corporation | Photosensitive composition, and pattern-forming method and resist film using the photosensitive composition |
| JP2011035173A (ja) * | 2009-07-31 | 2011-02-17 | Fujifilm Corp | ネガ型化学増幅レジスト組成物及びこれを用いたモールドの作成方法 |
| JP2015152669A (ja) * | 2014-02-12 | 2015-08-24 | サンアプロ株式会社 | 光酸発生剤及びフォトリソグラフィー用樹脂組成物 |
| US9872399B1 (en) | 2016-07-22 | 2018-01-16 | International Business Machines Corporation | Implementing backdrilling elimination utilizing anti-electroplate coating |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02253262A (ja) | 1989-03-28 | 1990-10-12 | Tosoh Corp | フォトレジスト組成物 |
| JP2962145B2 (ja) | 1994-05-16 | 1999-10-12 | 信越化学工業株式会社 | ネガ型パターン形成材料 |
| NL1014545C2 (nl) * | 1999-03-31 | 2002-02-26 | Ciba Sc Holding Ag | Oxim-derivaten en de toepassing daarvan als latente zuren. |
| KR100538501B1 (ko) * | 1999-08-16 | 2005-12-23 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 신규한 오늄염, 레지스트 재료용 광산발생제, 레지스트재료 및 패턴 형성 방법 |
| US6338931B1 (en) * | 1999-08-16 | 2002-01-15 | Shin-Etsu Chemical Co., Ltd. | Resist compositions and patterning process |
| US6395446B1 (en) * | 1999-10-06 | 2002-05-28 | Shin-Etsu Chemical Co., Ltd. | Resist compositions and patterning process |
| JP4070393B2 (ja) | 2000-01-17 | 2008-04-02 | 富士フイルム株式会社 | ネガ型レジスト組成物 |
| KR100587452B1 (ko) * | 2001-09-28 | 2006-06-09 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 신규 술포닐디아조메탄 화합물, 광산발생제 및 그것을이용한 레지스트 재료 및 패턴 형성 방법 |
| KR100698444B1 (ko) * | 2002-03-22 | 2007-03-23 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 화학 증폭 레지스트 재료용 광산 발생제, 및 이것을사용한 레지스트 재료 및 패턴 형성 방법 |
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2002
- 2002-03-29 JP JP2002096410A patent/JP3841405B2/ja not_active Expired - Lifetime
-
2003
- 2003-03-26 US US10/396,583 patent/US6746813B2/en not_active Expired - Lifetime
