JP2003292346A5 - - Google Patents
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- JP2003292346A5 JP2003292346A5 JP2003015513A JP2003015513A JP2003292346A5 JP 2003292346 A5 JP2003292346 A5 JP 2003292346A5 JP 2003015513 A JP2003015513 A JP 2003015513A JP 2003015513 A JP2003015513 A JP 2003015513A JP 2003292346 A5 JP2003292346 A5 JP 2003292346A5
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Description
【００１８】
従って、本発明は、以下の大型基板及びその製造方法を提供する。
（Ｉ）平坦度／対角長が６．０×１０-6以下である対角長が５００ｍｍ以上の大型基板、
（ＩＩ）合成石英ガラス基板であることを特徴とする（Ｉ）記載の大型基板、
（ＩＩＩ）大型基板が、大型フォトマスク用基板であることを特徴とする（Ｉ）又は（ＩＩ）記載の大型基板、
（ＩＶ）大型基板が、ＴＦＴ液晶のアレイ側基板であることを特徴とする（Ｉ）乃至（ＩＩＩ）のいずれか１項記載の大型基板、
（Ｖ）予め対角長が５００ｍｍ以上の大型基板の平坦度を大型基板を垂直保持して測定し、そのデータを基に基板の凸部分を加工ツールを用いて部分的に除去して、上記大型基板の平坦度を高めることを特徴とする大型基板の製造方法、
（ＶＩ）予め対角長が５００ｍｍ以上の大型基板の平坦度及び平行度を大型基板を垂直保持して測定し、そのデータを基に基板の凸部分及び厚い部分を加工ツールにより部分的に除去して、上記大型基板の平坦度及び平行度を高めることを特徴とする大型基板の製造方法、
（ＶＩＩ）大型基板が、合成石英ガラス基板であることを特徴とする（Ｖ）又は（ＶＩ）記載の大型基板の製造方法、
（ＶＩＩＩ）部分除去方法が、研削、ラップ及び研磨のいずれか１以上の方法であることを特徴とする（Ｖ）、（ＶＩ）又は（ＶＩＩ）記載の大型基板の製造方法、
（ＩＸ）前記研削、ラップ及び研磨のいずれか１以上の方法が定圧で行われることを特徴とする（ＶＩＩＩ）記載の大型基板の製造方法、
（Ｘ）部分除去方法が、サンドブラストによることを特徴とする（Ｖ）、（ＶＩ）又は（ＶＩＩ）記載の大型基板の製造方法、
（ＸＩ）基板及び／又は加工ツールを移動させて、基板表面の任意の位置を除去することを特徴とする（Ｖ）乃至（Ｘ）のいずれか１項記載の大型基板の製造方法。[0018]
Therefore, the present invention provides the following large-sized substrate and its manufacturing method.
(I) Large-sized substrate with a diagonal length of 500 mm or more, with flatness / diagonal length of 6.0 × 10 -6 or less,
(II) The large-sized substrate according to (I), which is a synthetic quartz glass substrate,
(III) The large-sized substrate according to (I) or (II), wherein the large-sized substrate is a large-sized photomask substrate.
(IV) The large-sized substrate according to any one of (I) to (III), wherein the large-sized substrate is an array side substrate of TFT liquid crystal,
(V) The flatness of a large substrate having a diagonal length of 500 mm or more is measured in advance by vertically holding the large substrate, and the convex portion of the substrate is partially removed using a processing tool based on the data, A method of manufacturing a large substrate characterized by enhancing the flatness of a large substrate,
(VI) The flatness and parallelism of a large substrate having a diagonal length of 500 mm or more are measured in advance by vertically holding the large substrate, and the convex and thick portions of the substrate are partially removed by a processing tool based on the data To increase the flatness and parallelism of the large substrate, and a method of manufacturing the large substrate,
(VII) The method for producing a large-sized substrate according to (V) or (VI), wherein the large-sized substrate is a synthetic quartz glass substrate,
(VIII) The method for producing a large substrate according to (V), (VI) or (VII), wherein the partial removal method is any one or more of grinding, lapping and polishing.
(IX) The method for producing a large-sized substrate according to (VIII), wherein any one or more of the grinding, lapping and polishing is carried out at a constant pressure,
(X) The method for producing a large substrate according to (V), (VI) or (VII), wherein the partial removal method is sandblasting,
(XI) The method for producing a large-sized substrate according to any one of (V) to (X), wherein the substrate and / or the processing tool is moved to remove any position on the substrate surface.
Claims (11)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003015513A JP4267333B2 (en) | 2002-01-31 | 2003-01-24 | Manufacturing method of large synthetic quartz glass substrate |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002023416 | 2002-01-31 | ||
| JP2002-23416 | 2002-01-31 | ||
| JP2003015513A JP4267333B2 (en) | 2002-01-31 | 2003-01-24 | Manufacturing method of large synthetic quartz glass substrate |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004249820A Division JP4340893B2 (en) | 2002-01-31 | 2004-08-30 | Manufacturing method for large substrates |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003292346A JP2003292346A (en) | 2003-10-15 |
| JP2003292346A5 true JP2003292346A5 (en) | 2004-12-16 |
| JP4267333B2 JP4267333B2 (en) | 2009-05-27 |
Family
ID=29253383
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003015513A Expired - Lifetime JP4267333B2 (en) | 2002-01-31 | 2003-01-24 | Manufacturing method of large synthetic quartz glass substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4267333B2 (en) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE602005001710T2 (en) | 2004-02-18 | 2008-04-30 | Shin-Etsu Chemical Co., Ltd. | Method for preparing a large-area substrate |
| JP4362732B2 (en) | 2005-06-17 | 2009-11-11 | 信越化学工業株式会社 | Large glass substrate for photomask and manufacturing method thereof, computer-readable recording medium, and mother glass exposure method |
| US7608542B2 (en) | 2005-06-17 | 2009-10-27 | Shin-Etsu Chemical Co., Ltd. | Large-size glass substrate for photomask and making method, computer-readable recording medium, and mother glass exposure method |
| JP2008151916A (en) | 2006-12-15 | 2008-07-03 | Shin Etsu Chem Co Ltd | Method for recycling large-size photomask substrate |
| CN101681092B (en) * | 2007-05-09 | 2012-07-25 | 株式会社尼康 | Photomask substrate, photomask substrate forming member, photomask substrate manufacturing method, photomask, and exposure method using photomask |
| JP5584884B2 (en) * | 2007-10-01 | 2014-09-10 | シャープ株式会社 | Glass substrate defect correction method, glass substrate manufacturing method |
| JP5365137B2 (en) * | 2008-10-29 | 2013-12-11 | 東ソー株式会社 | Photomask substrate and manufacturing method thereof |
| JP5526895B2 (en) * | 2009-04-01 | 2014-06-18 | 信越化学工業株式会社 | Manufacturing method of large synthetic quartz glass substrate |
| JP5578708B2 (en) * | 2010-04-19 | 2014-08-27 | Ｈｏｙａ株式会社 | Reproduction photomask substrate production method for FPD production, reproduction photomask blank production method, reproduction photomask production method with pellicle, and pattern transfer method |
| JP5937409B2 (en) * | 2011-04-13 | 2016-06-22 | Hoya株式会社 | Photomask substrate, photomask, photomask manufacturing method, and pattern transfer method |
| CN112338644A (en) * | 2020-10-30 | 2021-02-09 | 江苏汇鼎光学眼镜有限公司 | Lens surface treatment process |
-
2003
- 2003-01-24 JP JP2003015513A patent/JP4267333B2/en not_active Expired - Lifetime
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