JP2003282774A - Wiring board and its manufacturing method - Google Patents

Wiring board and its manufacturing method

Info

Publication number
JP2003282774A
JP2003282774A JP2002083566A JP2002083566A JP2003282774A JP 2003282774 A JP2003282774 A JP 2003282774A JP 2002083566 A JP2002083566 A JP 2002083566A JP 2002083566 A JP2002083566 A JP 2002083566A JP 2003282774 A JP2003282774 A JP 2003282774A
Authority
JP
Japan
Prior art keywords
metal frame
insulating base
adhesive layer
glass fiber
wiring board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002083566A
Other languages
Japanese (ja)
Inventor
Ryuji Maruyama
龍二 丸山
Kenji Nakamura
憲志 中村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2002083566A priority Critical patent/JP2003282774A/en
Publication of JP2003282774A publication Critical patent/JP2003282774A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector

Landscapes

  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a wiring board which enables an electronic component mounted on an insulating base to operate normally and stably for a long term by firmly bonding the insulating base and a metal frame together with an adhesive layer which is nearly uniform in thickness. <P>SOLUTION: The wiring board is equipped with the insulating base 1 provided with a mounting area A where the electronic component 4 is mounted on its top surface and a plurality of wiring conductors 5 extending from the undersurface of the mounting area A, and the metal frame 2 bonded to the top surface of the insulating base 1 through the intermediary of the adhesive layer 3 so as to surround the mounting area A. The adhesive layer 3 is a glass fiber fabric impregnated with a thermosetting resin, and the insulating base 1 and the metal frame 2 are bonded together under the condition in which the insulating base 1 and the metal frame 2 are pressure-welded to the glass fiber fabric of the adhesive layer 3. <P>COPYRIGHT: (C)2004,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、上面に電子部品が
搭載される搭載部を有する絶縁基体の上面に、前記搭載
部を取り込むようにして金属枠体を、接着層を介して接
合して成る配線基板に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an upper surface of an insulating substrate having a mounting portion on which an electronic component is mounted, and a metal frame body bonded to the upper surface of the insulating substrate via an adhesive layer so as to take in the mounting portion. The present invention relates to a wiring board.

【0002】[0002]

【従来の技術】従来、配線基板として、例えば上面に半
導体素子等の電子部品がフリップチップ接続により搭載
される搭載部およびこの搭載部から下面にかけて導出
し、前記電子部品の電極に電気的に接続される銅から成
る配線導体を有する有機材料系の絶縁基体と、この絶縁
基体の上面に前記搭載部を取り囲むようにしてエポキシ
樹脂等の熱硬化性樹脂から成る接着層を介して接合され
た銅から成る金属枠体とを具備して成る配線基板が知ら
れている。
2. Description of the Related Art Conventionally, as a wiring board, for example, a mounting portion on which an electronic component such as a semiconductor element is mounted on the upper surface by flip-chip connection and is led out from this mounting portion to the lower surface and electrically connected to an electrode of the electronic component. And an organic material-based insulating base having a wiring conductor made of copper, and a copper bonded to the upper surface of the insulating base via an adhesive layer made of a thermosetting resin such as epoxy resin so as to surround the mounting portion. There is known a wiring board including a metal frame body made of.

【0003】この配線基板は、絶縁基体の搭載部に半導
体素子等の電子部品をその各電極が半田バンプや金バン
プを介して搭載部の配線導体に電気的に接続されるよう
にしてフリップチップ接続により搭載し、しかる後、金
属枠体の上面に金属蓋体をその下面が熱伝導性のグリス
を介して電子部品の上面に熱的に結合されるようにして
気密に接合することによって製品としての電子装置とな
り、この電子装置は、その絶縁基体の下面に導出した配
線導体を外部電気回路基板の配線導体に半田を介して接
続することにより外部電気回路基板に実装されるととも
に搭載する電子部品の電極が外部電気回路に電気的に接
続されることとなる。そして、電子部品がその作動時に
発生する熱は、熱伝導性のグリスを介して金属蓋体およ
び金属枠体に伝達され、そこから外部に放散される。
This wiring board is a flip chip in which electronic components such as semiconductor elements are electrically connected to a mounting portion of an insulating substrate so that respective electrodes thereof are electrically connected to wiring conductors of the mounting portion through solder bumps or gold bumps. The product is mounted by connection, and then the metal lid is airtightly joined to the upper surface of the metal frame body so that the lower surface is thermally coupled to the upper surface of the electronic component through the thermally conductive grease. The electronic device is mounted on the external electric circuit board and is mounted on the external electric circuit board by connecting the wiring conductor led out on the lower surface of the insulating substrate to the wiring conductor of the external electric circuit board via solder. The electrodes of the component will be electrically connected to the external electrical circuit. Then, the heat generated when the electronic component operates is transferred to the metal lid and the metal frame via the heat conductive grease, and is radiated to the outside from there.

【0004】なお、このような配線基板において、絶縁
基体と金属枠体とを接合するには、絶縁基体と金属枠体
とを両者の間に半硬化の熱硬化性樹脂から成る接着シー
トを挟んで重ねるとともに、これらを上下から0.3M
Pa程度の圧力を印加しながら加熱して接着シートの熱
硬化性樹脂を硬化させることにより接合する方法が採用
されていた。
In such a wiring board, in order to bond the insulating base and the metal frame, an adhesive sheet made of a semi-cured thermosetting resin is sandwiched between the insulating base and the metal frame. And stack them with 0.3M from the top and bottom.
A method of bonding by applying a pressure of about Pa and heating to cure the thermosetting resin of the adhesive sheet has been adopted.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、この従
来の配線基板によると、絶縁基体と金属枠体とを接着層
を介して接着する際の加圧により接着層の厚みに大きな
ばらつきが発生しやすく、そのため絶縁基体の搭載部に
搭載される電子部品と金属蓋体との間隔がばらつき、そ
のため両者を熱伝導性のグリスを介して熱的に良好に結
合することが困難となり、その結果、電子部品が作動時
に発生する熱が金属蓋体および金属枠体を介して外部に
良好に放散されずに、搭載する電子部品を安定して作動
させることができないという問題点を有していた。ま
た、絶縁基体と金属枠体とを接着層を介して接合する際
に接着層の熱硬化性樹脂が外部にはみ出しやすいので接
着層に大きな圧力を印加することができず、そのため絶
縁基体および金属枠体と接着層との間にボイドが残って
絶縁基体と金属枠体との接合強度が弱いものとなり、電
子部品が作動時に発生する熱が絶縁基体と金属枠体との
間に繰り返し印加されると、両者の熱膨張係数の相違に
起因して発生する熱応力により絶縁基体と金属枠体との
間で剥離が発生し、その結果、絶縁基体と金属枠体との
間の気密性が破れて搭載する電子部品を正常に作動させ
ることができなくなってしまうという問題点を有してい
た。
However, according to this conventional wiring board, a large variation in the thickness of the adhesive layer is likely to occur due to the pressure applied when the insulating base body and the metal frame body are bonded via the adhesive layer. Therefore, the gap between the electronic component mounted on the mounting portion of the insulating base and the metal lid varies, which makes it difficult to thermally and satisfactorily bond the both with each other via the thermally conductive grease. There is a problem in that the heat generated during the operation of the component is not well dissipated to the outside through the metal lid and the metal frame, and the mounted electronic component cannot be stably operated. Further, when the insulating base and the metal frame are joined together via the adhesive layer, the thermosetting resin of the adhesive layer is likely to protrude to the outside, so that a large pressure cannot be applied to the adhesive layer. A void remains between the frame and the adhesive layer, and the bonding strength between the insulating base and the metal frame becomes weak, and the heat generated during operation of the electronic component is repeatedly applied between the insulating base and the metal frame. Then, peeling occurs between the insulating base and the metal frame due to thermal stress generated due to the difference in thermal expansion coefficient between the two, and as a result, the airtightness between the insulating base and the metal frame is reduced. There has been a problem that the electronic parts to be mounted are torn and cannot be operated normally.

【0006】本発明は、かかる従来の問題点に鑑み案出
されたものであり、その目的は、絶縁基体と金属枠体と
を接着する接着層の厚みに大きなばらつきが発生するこ
とがなく、絶縁基体の搭載部に搭載される電子部品と金
属蓋体との間隔を一定として両者を熱伝導性のグリスを
介して熱的に良好に結合することができるとともに、絶
縁基体と金属枠体とを接着層を介して強固に接着させ、
それにより絶縁基体に搭載する電子部品を長期間にわた
り正常かつ安定に作動させることが可能な配線基板を提
供することにある。
The present invention has been devised in view of the above conventional problems, and an object thereof is to prevent a large variation in the thickness of an adhesive layer for adhering an insulating substrate and a metal frame, The electronic component mounted on the mounting portion of the insulating base and the metal lid can be fixed at a constant distance, and both can be thermally excellently coupled through the thermally conductive grease, and the insulating base and the metal frame can be connected to each other. Firmly adhered via the adhesive layer,
Accordingly, it is an object of the present invention to provide a wiring board capable of operating electronic components mounted on an insulating substrate normally and stably for a long period of time.

【0007】[0007]

【課題を解決するための手段】本発明の配線基板は、上
面に電子部品が搭載される搭載部および該搭載部から下
面にかけて導出する複数の配線導体を有する絶縁基体
と、前記絶縁基体の上面に前記搭載部を取り囲むように
して接着層を介して接合された金属枠体とを具備して成
る配線基板であって、前記接着層はガラス繊維織物に熱
硬化性樹脂を含浸させて成り、かつ前記絶縁基体と前記
金属枠体とは前記ガラス繊維織物に圧接された状態で接
合されていることを特徴とするものである。
A wiring board according to the present invention includes an insulating base having an upper surface on which an electronic component is mounted and a plurality of wiring conductors extending from the mounting surface to a lower surface, and an upper surface of the insulating base. A wiring board comprising a metal frame joined to the mounting portion via an adhesive layer so as to surround the mounting portion, wherein the adhesive layer is formed by impregnating a glass fiber woven fabric with a thermosetting resin, Further, the insulating base and the metal frame are joined to each other in a state of being pressed against the glass fiber woven fabric.

【0008】また、本発明の配線基板の製造方法は、上
面に電子部品が搭載される搭載部および該搭載部から下
面にかけて導出する複数の配線導体を有する絶縁基体
と、前記搭載部を取り囲む開口を有する金属枠体と、該
金属枠体に対応する大きさの枠状のガラス繊維織物に未
硬化の熱硬化性樹脂を含浸させて成る接着シートとを準
備する工程と、前記絶縁基体の上に前記接着シートと前
記金属枠体とを前記搭載部を取り囲むようにして順次重
ねるとともに、これらを上下から0.5MPa以上の圧
力を印加しながら加熱して前記ガラス繊維織物と前記絶
縁基体および前記金属枠体とを圧接させるとともに前記
熱硬化性樹脂を熱硬化させて前記絶縁基体と前記金属枠
体とを前記接着シートの前記熱硬化性樹脂が硬化して成
る接着層を介して接合する工程とから成ることを特徴と
するものである。
Further, in the method for manufacturing a wiring board of the present invention, an insulating base having a mounting portion on which an electronic component is mounted and a plurality of wiring conductors extending from the mounting portion to the lower surface, and an opening surrounding the mounting portion. A step of preparing a metal frame body having: and an adhesive sheet obtained by impregnating an uncured thermosetting resin into a frame-shaped glass fiber woven fabric having a size corresponding to the metal frame body; And the adhesive sheet and the metal frame are sequentially stacked so as to surround the mounting portion, and these are heated from above and below while applying a pressure of 0.5 MPa or more to the glass fiber woven fabric, the insulating substrate, and the The insulating frame and the metal frame are brought into contact with each other via an adhesive layer formed by curing the thermosetting resin of the adhesive sheet by pressing the metal frame with the thermosetting resin. It is characterized in that comprising a step of.

【0009】本発明の配線基板によれば、絶縁基体と金
属枠体とを接合する接着層は、ガラス繊維織物に熱硬化
性樹脂を含浸させて成り、かつ前記絶縁基体と前記金属
枠体とは前記ガラス繊維織物に圧接された状態で接合さ
れていることから、絶縁基体と金属枠体とを接合する接
着層の厚みはガラス繊維織物の厚みにより略一定の厚み
に制御されるとともに、絶縁基体と金属枠体とが接着層
を介して強固に接合される。
According to the wiring board of the present invention, the adhesive layer for joining the insulating base and the metal frame is formed by impregnating a glass fiber woven fabric with a thermosetting resin, and the insulating base and the metal frame. Is bonded to the glass fiber woven fabric in a pressure-contact state, the thickness of the adhesive layer for bonding the insulating substrate and the metal frame is controlled to a substantially constant thickness by the thickness of the glass fiber woven fabric. The base body and the metal frame body are firmly bonded via the adhesive layer.

【0010】また、本発明の配線基板の製造方法によれ
ば、絶縁基体上に、ガラス繊維織物に未硬化の熱硬化性
樹脂を含浸させて成る接着シートと金属枠体とを順次重
ねるとともに、これらを上下から0.5MPa以上の圧
力を印加しながら加熱して前記ガラス繊維織物と前記絶
縁基体および前記金属枠体とを圧接させるとともに前記
熱硬化性樹脂を熱硬化させて前記絶縁基体と前記金属枠
体とを前記接着シートの前記熱硬化性樹脂が硬化して成
る接着層を介して接合することから、接着層の厚みが前
記ガラス繊維織物の厚みにより略一定に制御されるとと
もに絶縁基体と金属枠体とが接着層を介して強固に接合
された配線基板を得ることができる。
Further, according to the method for manufacturing a wiring board of the present invention, an adhesive sheet made by impregnating a glass fiber woven fabric with an uncured thermosetting resin and a metal frame are sequentially stacked on the insulating substrate, and These are heated from above and below while applying a pressure of 0.5 MPa or more to bring the glass fiber woven fabric into pressure contact with the insulating substrate and the metal frame, and at the same time to thermoset the thermosetting resin to produce the insulating substrate and the above. Since the metal frame and the metal frame are joined via the adhesive layer formed by curing the thermosetting resin of the adhesive sheet, the thickness of the adhesive layer is controlled to be substantially constant by the thickness of the glass fiber woven fabric and the insulating substrate is formed. It is possible to obtain a wiring board in which the metal frame body and the metal frame body are firmly bonded to each other via the adhesive layer.

【0011】[0011]

【発明の実施の形態】次に、本発明の配線基板を添付の
図面に基づき詳細に説明する。図1は本発明の配線基板
の実施の形態の一例を示す断面図であり、1は絶縁基
体、2は金属枠体、3は接着層であり、主としてこれら
で本発明の配線基板が構成されている。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, a wiring board of the present invention will be described in detail with reference to the accompanying drawings. FIG. 1 is a cross-sectional view showing an example of an embodiment of a wiring board of the present invention, in which 1 is an insulating substrate, 2 is a metal frame, 3 is an adhesive layer, and these mainly constitute the wiring board of the present invention. ing.

【0012】絶縁基体1は、例えばガラス繊維を縦横に
織り込んだガラス繊維織物にエポキシ樹脂やビスマレイ
ミドトリアジン樹脂等の熱硬化性樹脂を含浸させて成る
板状の芯体1aの上下面にエポキシ樹脂やビスマレイミ
ドトリアジン樹脂等の熱硬化性樹脂から成る絶縁層1b
をそれぞれ複数層ずつ積層して成る有機材料系の多層板
であり、その上面中央部には半導体素子等の電子部品4
が搭載される搭載部Aを有しており、その搭載部Aから
下面にかけては銅箔や銅めっき膜等から成る複数の配線
導体5が形成されている。そして、搭載部Aには半導体
素子等の電子部品4がその各電極と配線導体5とが半田
バンプ6を介して電気的に接続されるフリップチップ接
続により搭載される。
The insulating substrate 1 is formed by impregnating a glass fiber woven fabric in which glass fibers are woven longitudinally and transversely with a thermosetting resin such as epoxy resin or bismaleimide triazine resin. Layer 1b made of thermosetting resin such as or bismaleimide triazine resin
Is a multi-layered plate of an organic material system in which a plurality of layers are laminated, and an electronic component 4 such as a semiconductor element is provided at the center of the upper surface.
Is mounted, and a plurality of wiring conductors 5 made of a copper foil, a copper plating film, or the like are formed from the mounting portion A to the lower surface. Then, the electronic component 4 such as a semiconductor element is mounted on the mounting portion A by flip-chip connection in which the respective electrodes thereof and the wiring conductors 5 are electrically connected via the solder bumps 6.

【0013】絶縁基体1を構成する芯体1aは、厚みが
0.3〜1.5mm程度であり、その上面から下面にか
けて直径が0.1〜1mm程度の複数の貫通孔7を有し
ている。そして、その上下面および各貫通孔7の内壁に
は配線導体5の一部が被着されており、上下面の配線導
体5が貫通孔7を介して電気的に接続されている。
The core body 1a constituting the insulating substrate 1 has a thickness of about 0.3 to 1.5 mm and has a plurality of through holes 7 having a diameter of about 0.1 to 1 mm from its upper surface to its lower surface. There is. A part of the wiring conductor 5 is attached to the upper and lower surfaces and the inner wall of each through hole 7, and the upper and lower wiring conductors 5 are electrically connected through the through hole 7.

【0014】このような芯体1aは、ガラス織物に未硬
化の熱硬化性樹脂を含浸させたシートを熱硬化させた
後、これに上面から下面にかけてドリル加工を施すこと
により製作される。なお、芯体1aの上下面の配線導体
5は、芯体1a用のシートの上下全面に厚みが3〜50
μm程度の銅箔を貼着しておくとともにこの銅箔をシー
トの硬化後にエッチング加工することにより所定のパタ
ーンに形成される。また、貫通孔7の内壁の配線導体5
は、芯体1aに貫通孔7を設けた後に、この貫通孔7の
内壁に無電解めっき法および電解めっき法により厚みが
3〜50μm程度の銅めっき膜を析出させることにより
形成される。
Such a core 1a is manufactured by heat-curing a sheet in which a glass fabric is impregnated with an uncured thermosetting resin, and then performing a drilling process from the upper surface to the lower surface. The wiring conductors 5 on the upper and lower surfaces of the core 1a have a thickness of 3 to 50 on the entire upper and lower surfaces of the sheet for the core 1a.
A copper foil having a thickness of about μm is attached, and the copper foil is etched to form a predetermined pattern after being cured. In addition, the wiring conductor 5 on the inner wall of the through hole 7
Is formed by forming a through hole 7 in the core body 1a and then depositing a copper plating film having a thickness of about 3 to 50 μm on the inner wall of the through hole 7 by an electroless plating method and an electrolytic plating method.

【0015】さらに、芯体1aは、その貫通孔7の内部
にエポキシ樹脂やビスマレイミドトリアジン樹脂等の熱
硬化性樹脂から成る樹脂柱8が充填されている。樹脂柱
8は、貫通孔7を塞ぐことにより貫通孔7の直上および
直下に絶縁層1bを形成可能とするためのものであり、
未硬化のペースト状の熱硬化性樹脂を貫通孔7内にスク
リーン印刷法により充填し、これを熱硬化させた後、そ
の上下面を略平坦に研磨することにより形成される。そ
して、この樹脂柱8を含む芯体1aの上下面に絶縁層1
bが積層されている。
Further, the core 1a is filled with a resin column 8 made of a thermosetting resin such as an epoxy resin or a bismaleimide triazine resin inside the through hole 7. The resin column 8 is for closing the through hole 7 so that the insulating layer 1b can be formed immediately above and below the through hole 7.
It is formed by filling an uncured pasty thermosetting resin into the through holes 7 by a screen printing method, thermally curing the resin, and polishing the upper and lower surfaces thereof to be substantially flat. The insulating layer 1 is formed on the upper and lower surfaces of the core body 1a including the resin columns 8.
b are stacked.

【0016】芯体1aの上下面に積層された絶縁層1b
は、それぞれの厚みが20〜60μm程度であり、各層
の上面から下面にかけて直径が30〜100μm程度の
複数の貫通孔9を有している。これらの絶縁層1bは、
配線導体5を高密度に配線するための絶縁間隔を提供す
るためのものである。そして、上層の配線導体5と下層
の配線導体5とを貫通孔9を介して電気的に接続するこ
とにより高密度配線を立体的に形成可能としている。こ
のような絶縁層1bは、厚みが20〜60μm程度の未
硬化の熱硬化性樹脂フィルムを芯体1aの上下面に貼着
し、これを熱硬化させるとともにレーザー加工により貫
通孔9を穿孔し、さらにその上に同様にして次の絶縁層
1bを順次積み重ねることによって形成される。なお、
各絶縁層1bの表面および貫通孔9内に被着された配線
導体5は、各絶縁層1bを形成する毎に各絶縁層1bの
表面および貫通孔9内に5〜50μm程度の厚みの銅め
っき膜を公知のセミアディティブ法やサブトラクティブ
法等のパターン形成法により所定のパターンに被着させ
ることによって形成される。
Insulating layer 1b laminated on the upper and lower surfaces of the core 1a
Has a thickness of about 20 to 60 μm and has a plurality of through holes 9 having a diameter of about 30 to 100 μm from the upper surface to the lower surface of each layer. These insulating layers 1b are
The purpose is to provide an insulating space for wiring the wiring conductors 5 at high density. Then, the upper layer wiring conductor 5 and the lower layer wiring conductor 5 are electrically connected to each other through the through holes 9, so that high-density wiring can be three-dimensionally formed. For such an insulating layer 1b, an uncured thermosetting resin film having a thickness of about 20 to 60 μm is adhered to the upper and lower surfaces of the core body 1a, which is heat cured, and the through holes 9 are punched by laser processing. Further, it is formed by successively stacking the next insulating layer 1b thereon in the same manner. In addition,
The wiring conductor 5 deposited on the surface of each insulating layer 1b and in the through hole 9 has a thickness of copper of about 5 to 50 μm on the surface of each insulating layer 1b and in the through hole 9 each time the insulating layer 1b is formed. It is formed by depositing the plating film in a predetermined pattern by a known pattern forming method such as a semi-additive method or a subtractive method.

【0017】また、絶縁基体1の搭載部Aから下面にか
けて形成された配線導体5は、電子部品4の各電極を外
部電気回路基板に接続するための導電路として機能し、
絶縁基体1の搭載部Aに設けられた部位の一部が電子部
品4の各電極に半田バンプ6を介して接合される電子部
品接続パッド5aを、絶縁基体1の下面に露出した部位
の一部が外部電気回路基板に半田ボール10を介して接
続される外部接続パッド5bを形成している。このよう
な電子部品接続パッド5aおよび外部パッド5bは、配
線導体5に接続された略円形のパターンの外周部をソル
ダーレジストと呼ばれる最外層の絶縁層1bにより15
〜150μm程度の幅で被覆してその外周縁を画定する
ことによりその直径が、電子部品接続パッド5aであれ
ば約70〜200μm程度に、外部接続パッド5bであ
れば約0.5〜2.5mm程度になるように形成されて
いる。なお、このようなソルダーレジスト1bにより電
子部品接続パッド5a同士あるいは外部接続パッド5b
同士の半田による電気的な短絡が有効に防止されるとと
もに電子部品接続パッド5aおよび外部接続パッド5b
の絶縁基体1に対する接合強度が高いものとなってい
る。
The wiring conductor 5 formed from the mounting portion A to the lower surface of the insulating substrate 1 functions as a conductive path for connecting each electrode of the electronic component 4 to an external electric circuit board,
A part of the part provided on the mounting portion A of the insulating base 1 is exposed on the lower surface of the insulating base 1 with the electronic part connecting pad 5a joined to each electrode of the electronic part 4 via the solder bump 6. The portion forms an external connection pad 5b which is connected to the external electric circuit board via the solder ball 10. In the electronic component connection pad 5a and the external pad 5b, the outer peripheral portion of the substantially circular pattern connected to the wiring conductor 5 is formed by the outermost insulating layer 1b called a solder resist.
By covering with a width of about 150 μm to define the outer peripheral edge, the diameter is about 70 to 200 μm for the electronic component connection pad 5a, and about 0.5 to 2 for the external connection pad 5b. It is formed to be about 5 mm. The solder resist 1b is used to connect the electronic component connection pads 5a to each other or to the external connection pads 5b.
Electrical short circuit due to mutual soldering is effectively prevented, and electronic component connection pad 5a and external connection pad 5b
The bonding strength with respect to the insulating substrate 1 is high.

【0018】また、絶縁基体1の上面外周部には、銅や
ステンレス等の金属から成る金属枠体2が搭載部Aを取
り囲むようにして接着層3を介して接合されており、こ
の金属枠体2上には銅やアルミニウム等の良熱伝導性の
金属から成る金属蓋体11がエポキシ樹脂等の接着剤を
介して接合される。この金属枠体2は、厚みが0.5〜
2mm程度の四角や六角、八角、あるいは円形の枠状で
あり、絶縁基体1に金属蓋体11を接合させるための台
座として機能するとともに、絶縁基体1の剛性を高めて
絶縁基体1に反りや変形が発生することを防止する補強
部材として、さらには電子部品4が作動時に発生する熱
を外部に放散するための放熱部材として機能する。この
ような金属枠体2は、銅等から成る金属板に打ち抜き加
工や切断加工あるいはエッチング加工等を施すことによ
り枠状に形成される。
Further, a metal frame body 2 made of a metal such as copper or stainless steel is joined to the outer peripheral portion of the upper surface of the insulating substrate 1 via an adhesive layer 3 so as to surround the mounting portion A. A metal lid 11 made of a metal having good thermal conductivity such as copper or aluminum is bonded onto the body 2 via an adhesive such as an epoxy resin. The metal frame 2 has a thickness of 0.5 to
It has a square, hexagonal, octagonal, or circular frame shape of about 2 mm, and functions as a pedestal for joining the metal lid 11 to the insulating base body 1, and increases the rigidity of the insulating base body 1 to warp the insulating base body 1. It functions as a reinforcing member that prevents the occurrence of deformation, and also as a heat dissipation member that dissipates the heat generated during operation of the electronic component 4 to the outside. Such a metal frame body 2 is formed into a frame shape by subjecting a metal plate made of copper or the like to punching, cutting, etching or the like.

【0019】また、絶縁基体1と金属枠体2とを接合す
る接着層3は、直径が5〜7μmのガラス繊維を数十本
まとめたものを0.5〜2mm間隔で編んだガラス繊維
織物にエポキシ樹脂等の熱硬化性樹脂を含浸させて成
り、金属枠体2に対応した形状のガラス繊維織物に未硬
化の熱硬化性樹脂を含浸させた接着シートを絶縁基体1
と金属枠体2との間に挟むとともにそれらを上下から加
圧しながら加熱して接着シート中の熱硬化性樹脂を熱硬
化させることにより形成される。このような接着層3
は、その厚みが0.05〜0.15mm程度である。
The adhesive layer 3 for joining the insulating substrate 1 and the metal frame 2 to each other is a glass fiber woven fabric in which several tens of glass fibers having a diameter of 5 to 7 μm are put together and woven at intervals of 0.5 to 2 mm. Insulating base 1 is obtained by impregnating a thermosetting resin such as epoxy resin with a glass fiber woven fabric having a shape corresponding to metal frame 2 and impregnating the uncured thermosetting resin.
It is formed by sandwiching it between the metal frame 2 and the metal frame body 2 and heating them while pressurizing them from above and below to thermoset the thermosetting resin in the adhesive sheet. Such an adhesive layer 3
Has a thickness of about 0.05 to 0.15 mm.

【0020】そして、本発明の配線基板においては、絶
縁基体1と金属枠体2とは接着層3中のガラス繊維織物
に圧接された状態で接合されており、そのことが重要で
ある。このように、絶縁基体1と金属枠体2とが接着層
3中のガラス繊維織物に圧接された状態で接合されてい
ることから、接着層3の厚みがその中のガラス繊維織物
の厚みにより略一定の厚みに制御されるとともに、絶縁
基体1と金属枠体2とを接着層3を介して接合する際に
接着層3中の熱硬化性樹脂がはみ出しにくいので、これ
らの間に大きな圧力を印加することができ、その結果、
絶縁基体1および金属枠体2と接着層3との間にボイド
が形成されにくく、両者が極めて強固に接合される。し
たがって、本発明の配線基板によれば、絶縁基体1と金
属枠体2とを接着する接着層3の厚みに大きなばらつき
が発生することがなく、絶縁基体1の搭載部Aに搭載さ
れる電子部品4と金属蓋体2との間隔を一定として両者
を熱伝導性のグリスを介して熱的に良好に結合すること
ができるとともに、絶縁基体1と金属枠体2とを接着層
3を介して強固に接着させ、それにより絶縁基体1に搭
載する電子部品4を長期間にわたり正常かつ安定に作動
させることができる。
In the wiring board of the present invention, the insulating substrate 1 and the metal frame 2 are bonded to the glass fiber woven fabric in the adhesive layer 3 under pressure, which is important. In this way, since the insulating substrate 1 and the metal frame body 2 are bonded to the glass fiber woven fabric in the adhesive layer 3 while being pressed, the thickness of the adhesive layer 3 depends on the thickness of the glass fiber woven fabric therein. The thermosetting resin in the adhesive layer 3 is controlled to a substantially constant thickness, and when the insulating substrate 1 and the metal frame body 2 are bonded via the adhesive layer 3, it is difficult for the thermosetting resin to squeeze out. Can be applied, and as a result,
Voids are unlikely to be formed between the insulating base 1 and the metal frame 2 and the adhesive layer 3, and the two are bonded extremely firmly. Therefore, according to the wiring board of the present invention, the thickness of the adhesive layer 3 for adhering the insulating base 1 and the metal frame body 2 does not vary greatly, and the electronic components mounted on the mounting portion A of the insulating base 1 are prevented. The component 4 and the metal lid body 2 can be thermally bonded to each other with a constant gap between them through the thermally conductive grease, and the insulating base body 1 and the metal frame body 2 can be joined together via the adhesive layer 3. By firmly adhering, the electronic component 4 mounted on the insulating substrate 1 can be operated normally and stably for a long period of time.

【0021】かくして、本発明の配線基板によれば、絶
縁基体1の搭載部Aに電子部品4を、その各電極が配線
導体5に半田バンプ6を介して電気的に接続されるよう
にしてフリップチップ接続で搭載し、しかる後、金属枠
体2の上面に金属蓋体11を、その下面が電子部品の上
面に熱伝導性のグリスを介して熱的に結合されるように
して、エポキシ樹脂等の接着剤を介して気密に接合する
ことにより製品としての電子装置となる。
Thus, according to the wiring board of the present invention, the electronic component 4 is electrically connected to the mounting portion A of the insulating substrate 1 and each electrode thereof is electrically connected to the wiring conductor 5 via the solder bump 6. It is mounted by flip-chip connection, and then the metal lid 11 is attached to the upper surface of the metal frame body 2, and the lower surface of the metal lid body 11 is thermally coupled to the upper surface of the electronic component through the thermally conductive grease, so that the epoxy resin is applied. An electronic device as a product is obtained by air-tightly bonding with an adhesive such as a resin.

【0022】次に、上述した本発明の配線基板の製造方
法について、図2および図3を基に説明する。
Next, a method for manufacturing the above-described wiring board of the present invention will be described with reference to FIGS.

【0023】まず、図2に断面図で示すように、上述し
た絶縁基体1と、金属枠体2と、接着層3用の接着シー
ト3aとを準備する。なお、接着シート3aは、例えば
ポリエチレンテレフタレート製の離型フィルムの上にガ
ラス繊維織物を載置するとともに、そのガラス繊維織物
中に、エポキシ樹脂等から成る未硬化の熱硬化性樹脂を
メチルエチルケトン等の有機溶剤に溶解させた液状ワニ
スを含浸させた後、それを60〜100℃の温度で乾燥
させることによりシート状に成形し、さらにこれを打抜
き加工により放熱板3と対応する大きさに打ち抜くこと
により製作される。このとき、接着シート3aはその内
周および外周が金属枠体2の内周および外周よりも0.
1〜1mm程度内側となる大きさとしておくと、絶縁基
体1と金属枠体2とを接合する際に接着シート3aに含
有される熱硬化性樹脂のはみ出しを有効に防止すること
ができる。したがって、接着シート3aの内周および外
周は金属枠体2の内周および外周よりも0.1〜1mm
程度内側としておくことが好ましい。
First, as shown in the sectional view of FIG. 2, the above-mentioned insulating substrate 1, the metal frame 2, and the adhesive sheet 3a for the adhesive layer 3 are prepared. The adhesive sheet 3a includes, for example, a glass fiber woven fabric placed on a release film made of polyethylene terephthalate, and an uncured thermosetting resin made of epoxy resin or the like in the glass fiber woven fabric such as methyl ethyl ketone. After impregnating a liquid varnish dissolved in an organic solvent, it is dried at a temperature of 60 to 100 ° C. to form a sheet, and this is punched into a size corresponding to the heat sink 3. It is produced by. At this time, the inner and outer peripheries of the adhesive sheet 3a are smaller than those of the inner and outer peripheries of the metal frame body 2.
By setting the size to be about 1 to 1 mm inside, it is possible to effectively prevent the thermosetting resin contained in the adhesive sheet 3a from protruding when the insulating substrate 1 and the metal frame 2 are joined. Therefore, the inner and outer circumferences of the adhesive sheet 3a are 0.1 to 1 mm larger than the inner and outer circumferences of the metal frame body 2.
It is preferable to set it to the inside.

【0024】次に、図3に断面図で示すように、絶縁基
体1上に接着シート3aと金属枠体2とを搭載部Aを取
り囲むようにして順次重ねるとともに、これらを加圧治
具21により上下から約0.5〜1MPaの圧力で加圧
しながら、約150〜200℃の温度で数分〜数時間加
熱して接着シート3a中のガラス繊維織物と絶縁基体1
および金属枠体2とを圧接させるとともに接着シート3
a中の熱硬化性樹脂を熱硬化させることにより、絶縁基
体1と金属枠体2とを接着シート3a中の熱硬化性樹脂
が硬化してなる接着層3を介して接合する。このとき、
絶縁基体1の上に、ガラス繊維織物に未硬化の熱硬化性
樹脂を含浸させて成る接着シート3aと金属枠体2とを
順次重ねるとともに、これらを上下から0.5〜1MP
aの圧力を印加しながら加熱して接着シート3a中のガ
ラス繊維織物と絶縁基体1および金属枠体2とを圧接さ
せるとともに接着シート3a中の熱硬化性樹脂を熱硬化
させて絶縁基体1と金属枠体2とを接着シート3a中の
熱硬化性樹脂が硬化して成る接着層3を介して接合する
ことから、接着層3の厚みがその中のガラス繊維織物の
厚みにより略一定に制御されるとともに加圧により絶縁
基体1および金属枠体2と接着層3との間にボイドが発
生することが有効に防止され、その結果、絶縁基体1と
金属枠体2とが接着層3を介して強固に接合された本発
明の配線基板を得ることができる。
Next, as shown in the sectional view of FIG. 3, the adhesive sheet 3a and the metal frame 2 are successively stacked on the insulating substrate 1 so as to surround the mounting portion A, and these are pressed together by the pressing jig 21. While being pressurized from above and below with a pressure of about 0.5 to 1 MPa, the glass fiber woven fabric in the adhesive sheet 3a and the insulating substrate 1 are heated at a temperature of about 150 to 200 ° C. for several minutes to several hours.
And the metal sheet 2 and the adhesive sheet 3
By thermosetting the thermosetting resin in a, the insulating substrate 1 and the metal frame body 2 are joined via the adhesive layer 3 formed by curing the thermosetting resin in the adhesive sheet 3a. At this time,
On the insulating substrate 1, an adhesive sheet 3a made of glass fiber woven fabric impregnated with an uncured thermosetting resin and a metal frame 2 are sequentially stacked, and these are placed from the top to the bottom at 0.5 to 1 MP.
The glass fiber woven fabric in the adhesive sheet 3a is brought into pressure contact with the insulating substrate 1 and the metal frame body 2 while applying the pressure a, and the thermosetting resin in the adhesive sheet 3a is thermally cured to form the insulating substrate 1. Since the metal frame body 2 and the metal frame body 2 are joined via the adhesive layer 3 formed by curing the thermosetting resin in the adhesive sheet 3a, the thickness of the adhesive layer 3 is controlled to be substantially constant by the thickness of the glass fiber fabric therein. At the same time, the generation of voids between the insulating substrate 1 and the metal frame 2 and the adhesive layer 3 due to the pressure is effectively prevented, and as a result, the insulating substrate 1 and the metal frame 2 form the adhesive layer 3. It is possible to obtain the wiring board of the present invention that is strongly bonded via the above.

【0025】なお、絶縁基体1と金属枠体2とを接合す
る際に絶縁基体1と接着シート3aと金属枠体2とを上
下から加圧する圧力が0.5MPa未満の場合、得られ
る配線基板において絶縁基体1と金属枠体2とを接合す
る接着層3の厚みのばらつきが大きいものとなるととも
に、絶縁基体1と金属枠体2との接合強度が小さいもの
となる傾向にある。したがって、絶縁基体1と金属枠体
2とを接合する際に絶縁基体1と接着シート3aと金属
枠体2とを上下から加圧する圧力は0.5MPa以上に
特定される。また、絶縁基体1と金属枠体2とを接合す
る際に絶縁基体1と接着シート3aと金属枠体2とを上
下から加圧する圧力が1MPaを超える場合、それ以上
の圧力を印加しても接着層3の厚みのばらつきを更に著
しく小さくすることができないとともに、絶縁基体1と
金属枠体2との接合強度を更に著しく大きなものとする
ことができない。したがって、絶縁基体1と金属枠体2
とを接合する際に絶縁基体1と接着シート3aと金属枠
体2とを上下から加圧する圧力は0.5〜1MPaの範
囲が好ましい。
When the pressure for pressing the insulating base 1, the adhesive sheet 3a and the metal frame 2 from above and below when the insulating base 1 and the metal frame 2 are joined is less than 0.5 MPa, a wiring board obtained. In the above, the thickness of the adhesive layer 3 for joining the insulating base body 1 and the metal frame body 2 tends to be large, and the bonding strength between the insulating base body 1 and the metal frame body 2 tends to be small. Therefore, when the insulating base 1 and the metal frame 2 are joined together, the pressure for pressing the insulating base 1, the adhesive sheet 3a and the metal frame 2 from above and below is specified to be 0.5 MPa or more. Further, when the pressure for pressing the insulating substrate 1, the adhesive sheet 3a and the metal frame body 2 from above and below when the insulating substrate 1 and the metal frame body 2 are joined exceeds 1 MPa, even if a higher pressure is applied. The variation in the thickness of the adhesive layer 3 cannot be further remarkably reduced, and the bonding strength between the insulating substrate 1 and the metal frame 2 cannot be further remarkably increased. Therefore, the insulating substrate 1 and the metal frame 2
The pressure for pressing the insulating substrate 1, the adhesive sheet 3a, and the metal frame body 2 from above and below when joining and is preferably in the range of 0.5 to 1 MPa.

【0026】ところで、上述の加圧治具21は、ステン
レス製であり、積み重ねられた絶縁基体1および接着シ
ート3aおよび金属枠体2を載置する平板状の載置台2
2と、積み重ねられた絶縁基体1および接着シート3a
および金属枠体2を上から押圧する押圧板23とを備え
ている。押圧板23はガイドポスト24により上下に可
動な状態で支持されており、さらにコイルばね25によ
り下方に付勢されている。そして、これらの載置台22
と押圧板23との間に絶縁基体1および接着シート3a
および金属枠体2を重ねて挟むとともにコイルばね25
の力により圧力を印加するようになっている。
By the way, the pressing jig 21 is made of stainless steel, and is a flat plate-shaped mounting table 2 on which the stacked insulating base 1, adhesive sheet 3a and metal frame 2 are mounted.
2, stacked insulating substrate 1 and adhesive sheet 3a
And a pressing plate 23 for pressing the metal frame body 2 from above. The pressing plate 23 is supported by a guide post 24 in a vertically movable state, and is further urged downward by a coil spring 25. And these mounting tables 22
Between the insulating substrate 1 and the adhesive sheet 3a
And the metal frame body 2 are overlapped and sandwiched, and the coil spring 25
The pressure is applied by the force of.

【0027】なお、本発明は、上述の実施形態の一例に
限定されるものではなく、本発明の要旨を逸脱しない範
囲であれば種々の変更が可能であることはいうまでもな
い。
It is needless to say that the present invention is not limited to the above-described example of the embodiment, and various modifications can be made without departing from the scope of the present invention.

【0028】[0028]

【実施例】まず、ガラス繊維織物にエポキシ樹脂を含浸
させて成る厚みが1mmの芯体の上下面に厚みが60μ
mのエポキシ樹脂から成る絶縁層をそれぞれ3層ずつ積
層して成る一辺が35mmの略正方形の絶縁基体と、外
周の一辺が34mm、厚みが0.65mmで各辺の幅が
6mmの略正方形枠状の銅から成る金属枠体と、ガラス
繊維織物に未硬化のエポキシ樹脂を含浸させて成る厚み
が140μmで外周および内周が金属枠体の外周および
内周より0.5mmずつ内側となる大きさの正方形枠状
の接着シートとを準備した。
EXAMPLE First, a glass fiber woven fabric impregnated with epoxy resin and having a thickness of 1 mm has a thickness of 60 μm on the upper and lower surfaces thereof.
m, each of which is formed by laminating three insulating layers made of epoxy resin, and has a substantially square insulating base with a side of 35 mm, and a substantially square frame with a peripheral side of 34 mm, a thickness of 0.65 mm, and a width of 6 mm on each side. -Shaped metal frame made of copper and glass fiber woven fabric impregnated with uncured epoxy resin, the thickness is 140 μm, and the outer and inner circumferences are 0.5 mm inward from the outer and inner circumferences of the metal frame, respectively. A square frame-shaped adhesive sheet was prepared.

【0029】次いで、絶縁基体の上面に接着シートおよ
び金属枠体を順次重ねるとともに、これらを加圧治具に
より上下から0.3〜1MPaの圧力を印加しながら、
加熱して接着シート中の熱硬化性樹脂を熱硬化させるこ
とにより絶縁基体と金属枠体とを接着シート中の熱硬化
性樹脂が熱硬化して成る接着層を介して接合して本発明
および比較のための評価用の5種類の試料をそれぞれ1
0個ずつ得た。
Next, while the adhesive sheet and the metal frame are sequentially stacked on the upper surface of the insulating substrate, and a pressure of 0.3 to 1 MPa is applied from above and below by a pressure jig,
By heating the thermosetting resin in the adhesive sheet to cure it, the insulating substrate and the metal frame are joined together via an adhesive layer formed by thermosetting the thermosetting resin in the adhesive sheet. 1 for each of 5 types of samples for evaluation for comparison
I got 0 each.

【0030】次に、これらの評価用の試料を金属枠体を
横断するように切断して、その切断面における接着層の
厚みのばらつきを測定するとともに、接着層中のガラス
繊維織物と絶縁基体および金属枠体との接触の度合いを
観察した。また、切断された金属枠体の一辺の一端を垂
直に引っ張って金属枠体が絶縁基体から剥離したときの
力を測定し、その最小値を絶縁基体と金属枠体との接合
強度とした。さらに剥離した金属枠体の下面にガラス繊
維が付着しているかどうかを確認した。その結果を表1
に示す。
Next, these samples for evaluation were cut so as to traverse the metal frame, the variation in the thickness of the adhesive layer on the cut surface was measured, and the glass fiber woven fabric and the insulating substrate in the adhesive layer were measured. And the degree of contact with the metal frame was observed. Further, the force when the metal frame body was peeled from the insulating base body was measured by pulling one end of one side of the cut metal frame body vertically, and the minimum value was defined as the bonding strength between the insulating base body and the metal frame body. Furthermore, it was confirmed whether glass fibers were attached to the lower surface of the peeled metal frame. The results are shown in Table 1.
Shown in.

【0031】[0031]

【表1】 [Table 1]

【0032】なお、表1において試料番号1、2は本発
明の範囲外の比較のための試料である。また、接着層の
厚みばらつきの許容範囲は3μm以下であり、絶縁基体
と金属枠体との接合強度は25N以上あることが要求さ
れる。
In Table 1, sample numbers 1 and 2 are samples for comparison outside the scope of the present invention. Further, the allowable range of thickness variation of the adhesive layer is 3 μm or less, and the bonding strength between the insulating base and the metal frame is required to be 25 N or more.

【0033】表1に示すように、本発明の範囲外である
試料番号1、2の試料では接着層の厚みばらつきが3.
5μm以上と大きく、かつ絶縁基体と金属枠体との接合
強度が25N以下と小さいのに対して、本発明の範囲内
にある試料番号3、4、5の試料では、接着層の厚みば
らつきが許容範囲内の2.5μm以下と小さいものであ
るとともに、絶縁基体と金属枠体との接合強度が27.
5N以上と十分に大きなものであることが分かる。ま
た、本発明の試料では、いずれも接着層中のガラス繊維
織物と絶縁基体および金属枠体とが全面的に接触してい
るとともに、絶縁基体から剥離した後の金属枠体の下面
にガラス繊維の付着が認められ、ガラス繊維織物と絶縁
基体および金属枠体とが強固に圧接されていることが分
かる。
As shown in Table 1, in the samples of sample numbers 1 and 2 which are out of the scope of the present invention, the variation in the thickness of the adhesive layer is 3.
The bonding strength between the insulating substrate and the metal frame is as small as 25 N or less, while the sample Nos. 3, 4, and 5 within the scope of the present invention show variation in the thickness of the adhesive layer. It is as small as 2.5 μm or less within the allowable range, and the bonding strength between the insulating base and the metal frame is 27.
It can be seen that it is a sufficiently large value of 5 N or more. Further, in each of the samples of the present invention, the glass fiber woven fabric in the adhesive layer was in full contact with the insulating substrate and the metal frame body, and the glass fiber was formed on the lower surface of the metal frame body after peeling from the insulating substrate. It can be seen that the glass fiber woven fabric, the insulating substrate and the metal frame are firmly pressed against each other.

【0034】[0034]

【発明の効果】本発明の配線基板によれば、絶縁基体と
金属枠体とを接合する接着層は、ガラス繊維織物に熱硬
化性樹脂を含浸させて成り、かつ前記絶縁基体と前記金
属枠体とは前記ガラス繊維織物に圧接された状態で接合
されていることから、絶縁基体と金属枠体とを接合する
接着層の厚みはガラス繊維織物の厚みにより略一定の厚
みに制御されるとともに、絶縁基体と金属枠体とが接着
層を介して強固に接合される。したがって、絶縁基体に
搭載する電子部品を長期間にわたり正常かつ安定に作動
させることが可能である。
According to the wiring board of the present invention, the adhesive layer for joining the insulating base and the metal frame is formed by impregnating a glass fiber woven fabric with a thermosetting resin, and the insulating base and the metal frame. Since the body is bonded to the glass fiber woven fabric while being pressed, the thickness of the adhesive layer for bonding the insulating substrate and the metal frame body is controlled to a substantially constant thickness by the thickness of the glass fiber woven fabric. The insulating base and the metal frame are firmly joined together via the adhesive layer. Therefore, it is possible to operate the electronic component mounted on the insulating substrate normally and stably for a long period of time.

【0035】また、本発明の配線基板の製造方法によれ
ば、絶縁基体上に、ガラス繊維織物に未硬化の熱硬化性
樹脂を含浸させて成る接着シートと金属枠体とを順次重
ねるとともに、これらを上下から0.5MPa以上の圧
力を印加しながら加熱して前記ガラス繊維織物と前記絶
縁基体および前記金属枠体とを圧接させるとともに前記
熱硬化性樹脂を熱硬化させて前記絶縁基体と前記金属枠
体とを前記接着シートの前記熱硬化性樹脂が硬化して成
る接着層を介して接合することから、接着層の厚みが前
記ガラス繊維織物の厚みにより略一定に制御されるとと
もに絶縁基体と金属枠体とが接着層を介して強固に接合
された配線基板を得ることができる。
Further, according to the method of manufacturing a wiring board of the present invention, an adhesive sheet formed by impregnating a glass fiber woven fabric with an uncured thermosetting resin and a metal frame are sequentially stacked on the insulating substrate, and These are heated from above and below while applying a pressure of 0.5 MPa or more to bring the glass fiber woven fabric into pressure contact with the insulating substrate and the metal frame, and at the same time to thermoset the thermosetting resin to produce the insulating substrate and the above. Since the metal frame and the metal frame are joined via the adhesive layer formed by curing the thermosetting resin of the adhesive sheet, the thickness of the adhesive layer is controlled to be substantially constant by the thickness of the glass fiber woven fabric and the insulating substrate is formed. It is possible to obtain a wiring board in which the metal frame body and the metal frame body are firmly bonded to each other via the adhesive layer.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の配線基板の実施の形態の一例を示す断
面図である。
FIG. 1 is a cross-sectional view showing an example of an embodiment of a wiring board of the present invention.

【図2】本発明の配線基板の製造方法を説明するための
断面図である。
FIG. 2 is a cross-sectional view for explaining the method for manufacturing a wiring board according to the present invention.

【図3】本発明の配線基板の製造方法を説明するための
断面図である。
FIG. 3 is a cross-sectional view for explaining the method for manufacturing a wiring board according to the present invention.

【符号の説明】[Explanation of symbols]

1・・・・・・絶縁基体 2・・・・・・金属枠体 3・・・・・・接着層 4・・・・・・電子部品 5・・・・・・配線導体 A・・・・・・搭載部 1 ... Insulating substrate 2 ... Metal frame 3 ... Adhesive layer 4 ・ ・ Electronic parts 5 ... Wiring conductor A ・ ・ ・ ・ Mounting part

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 上面に電子部品が搭載される搭載部およ
び該搭載部から下面にかけて導出する複数の配線導体を
有する絶縁基体と、前記絶縁基体の上面に前記搭載部を
取り囲むようにして接着層を介して接合された金属枠体
とを具備して成る配線基板であって、前記接着層はガラ
ス繊維織物に熱硬化性樹脂を含浸させて成り、かつ前記
絶縁基体と前記金属枠体とは前記ガラス繊維織物に圧接
された状態で接合されていることを特徴とする配線基
板。
1. An insulating base having a mounting portion on which an electronic component is mounted and a plurality of wiring conductors extending from the mounting portion to a lower surface, and an adhesive layer surrounding the mounting portion on the upper surface of the insulating base. A wiring board comprising: a metal frame body bonded via a metal frame body, wherein the adhesive layer is formed by impregnating a glass fiber woven fabric with a thermosetting resin, and the insulating substrate and the metal frame body are A wiring board, wherein the wiring board is bonded to the glass fiber woven fabric while being pressed.
【請求項2】 上面に電子部品が搭載される搭載部およ
び該搭載部から下面にかけて導出する複数の配線導体を
有する絶縁基体と、前記搭載部を取り囲む開口を有する
金属枠体と、該金属枠体に対応する大きさの枠状のガラ
ス繊維織物に未硬化の熱硬化性樹脂を含浸させて成る接
着シートとを準備する工程と、前記絶縁基体の上に前記
接着シートと前記金属枠体とを前記搭載部を取り囲むよ
うにして順次重ねるとともに、これらを上下から0.5
MPa以上の圧力を印加しながら加熱して前記ガラス繊
維織物と前記絶縁基体および前記金属枠体とを圧接させ
るとともに前記熱硬化性樹脂を熱硬化させて前記絶縁基
体と前記金属枠体とを前記接着シートの前記熱硬化性樹
脂が硬化して成る接着層を介して接合する工程とから成
ることを特徴とする配線基板の製造方法。
2. An insulating base having a mounting portion on which an electronic component is mounted and a plurality of wiring conductors extending from the mounting portion to a lower surface, a metal frame body having an opening surrounding the mounting portion, and the metal frame. A step of preparing an adhesive sheet formed by impregnating an uncured thermosetting resin into a frame-shaped glass fiber woven fabric having a size corresponding to the body, and the adhesive sheet and the metal frame body on the insulating substrate. Are sequentially stacked so as to surround the mounting part, and these are placed on top of each other by 0.5
The glass fiber fabric is heated while applying a pressure of MPa or more to bring the glass fiber woven fabric into pressure contact with the insulating base and the metal frame, and the thermosetting resin is thermoset to heat the insulating base and the metal frame. A method of manufacturing a wiring board, comprising the steps of: joining via an adhesive layer formed by curing the thermosetting resin of the adhesive sheet.
JP2002083566A 2002-03-25 2002-03-25 Wiring board and its manufacturing method Pending JP2003282774A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002083566A JP2003282774A (en) 2002-03-25 2002-03-25 Wiring board and its manufacturing method

Publications (1)

Publication Number Publication Date
JP2003282774A true JP2003282774A (en) 2003-10-03

Family

ID=29231292

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002083566A Pending JP2003282774A (en) 2002-03-25 2002-03-25 Wiring board and its manufacturing method

Country Status (1)

Country Link
JP (1) JP2003282774A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009260347A (en) * 2008-04-14 2009-11-05 General Electric Co <Ge> Interconnect structure including hybrid frame panel
JP2010245439A (en) * 2009-04-09 2010-10-28 Renesas Electronics Corp Semiconductor device
JP2016092220A (en) * 2014-11-05 2016-05-23 日立化成株式会社 Silicon-containing substrate, semiconductor device using the same and semiconductor device manufacturing method
KR20160087176A (en) 2015-01-13 2016-07-21 삼성전기주식회사 Printed circuit board and method of manufacturing the same

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009260347A (en) * 2008-04-14 2009-11-05 General Electric Co <Ge> Interconnect structure including hybrid frame panel
JP2014187406A (en) * 2008-04-14 2014-10-02 General Electric Co <Ge> Interconnect structure including hybrid frame panel
KR20160040161A (en) * 2008-04-14 2016-04-12 제너럴 일렉트릭 캄파니 Interconnect structure including hybrid frame panel
KR101697045B1 (en) * 2008-04-14 2017-01-16 제너럴 일렉트릭 캄파니 Interconnect structure including hybrid frame panel
JP2010245439A (en) * 2009-04-09 2010-10-28 Renesas Electronics Corp Semiconductor device
JP2016092220A (en) * 2014-11-05 2016-05-23 日立化成株式会社 Silicon-containing substrate, semiconductor device using the same and semiconductor device manufacturing method
KR20160087176A (en) 2015-01-13 2016-07-21 삼성전기주식회사 Printed circuit board and method of manufacturing the same

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