JP2003282608A - Contact heating device - Google Patents

Contact heating device

Info

Publication number
JP2003282608A
JP2003282608A JP2002086761A JP2002086761A JP2003282608A JP 2003282608 A JP2003282608 A JP 2003282608A JP 2002086761 A JP2002086761 A JP 2002086761A JP 2002086761 A JP2002086761 A JP 2002086761A JP 2003282608 A JP2003282608 A JP 2003282608A
Authority
JP
Japan
Prior art keywords
ceramic heater
lead
ceramic
electrode
heating device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002086761A
Other languages
Japanese (ja)
Other versions
JP3628305B2 (en
Inventor
Hiroyuki Arima
裕之 有馬
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2002086761A priority Critical patent/JP3628305B2/en
Publication of JP2003282608A publication Critical patent/JP2003282608A/en
Application granted granted Critical
Publication of JP3628305B2 publication Critical patent/JP3628305B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Resistance Heating (AREA)
  • Die Bonding (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To solve the problem that a ceramic heater employed for a conventional contact heating device raises the temperature of an electrode extraction connection when the heater is used repeatedly at high temperatures to cause a stress in a brazed part upon operating the contact heating device by the difference of a thermal expansion coefficient between the ceramic heater, small in a thermal expansion, and an electrode fitting of large thermal expansion, whereby crack is readily generated in the periphery of the brazed part and the life of the heater is shortened. <P>SOLUTION: The ceramic heater is constituted of a heat generating part a with built-in heat generating resistor, a lead part substantially vertical to the main surface of the ceramic heater connected to the heat generating resistor, and a recessed part surrounded by the heat generating part and the lead part. <P>COPYRIGHT: (C)2004,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、半導体ベアチップ
を基板上に実装する際に用いるダイボンディングヒータ
ー等、被加熱物に接触して加熱する接触加熱装置に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a contact heating device such as a die bonding heater used when a semiconductor bare chip is mounted on a substrate to contact an object to be heated.

【0002】[0002]

【従来の技術】半導体ベアチップを基板上に実装する方
法として、異方性導電膜等の樹脂系の接着材を使用した
ACF(ACF:anisotropic condu
ctive film)接続法、またはマルチチップモ
ジュールに用いるようなAu−Si、Au−Sn等の低
融点ロウ材を使用したフリップチップ接続法が行われて
いる。
2. Description of the Related Art As a method of mounting a semiconductor bare chip on a substrate, an ACF (ACF: anisotropic condu) using a resin adhesive such as an anisotropic conductive film is used.
The active film (cive film) connection method or the flip-chip connection method using a low melting point brazing material such as Au-Si or Au-Sn used in a multi-chip module is used.

【0003】例えば、フリップチップ接続法は、多層パ
ッケージ基板上に半導体チップを載置して、その上面か
らセラミックヒーターを内蔵した接触加熱装置で加熱し
ながら、押圧することによって接合を行っており、この
時、両者に備えたハンダバンプによって接合するととも
に、ワイヤリングを行うことができる。
For example, in the flip chip connection method, a semiconductor chip is placed on a multi-layer package substrate, and the upper surface of the semiconductor chip is heated by a contact heating device having a built-in ceramic heater and pressed to perform bonding. At this time, the wiring can be performed while the solder bumps provided for the both are used for bonding.

【0004】かかる接触加熱装置は、図4、図5
(a)、(b)に示すように被加熱物を押圧するための
セラミックツール21と、該セラミックツール21を加
熱するためのセラミックヒーター22と、セラミックヒ
ーター22から発生した熱がセラミックツール21以外
に伝熱することを防止するための断熱材23と、これら
の部材を統合し他部材に結合するホルダー24とから構
成されており、前記セラミックヒーター22は、セラミ
ック体25中に発熱体26を埋設した発熱部31と、該
発熱部31に一体的に接合され、帯状のセラミック体に
前記発熱体26の両端に接続されるリードパターン27
を埋設させた一対のリード部28と、前記リードパター
ン27の一部を各リード部28の側面より露出させた電
極取り出し部29と、該電極取り出し部29に接続され
るリード端子30とから構成される(特開2001−3
32589号公報参照)。
Such a contact heating device is shown in FIGS.
As shown in (a) and (b), a ceramic tool 21 for pressing an object to be heated, a ceramic heater 22 for heating the ceramic tool 21, and heat generated from the ceramic heater 22 is other than the ceramic tool 21. The ceramic heater 22 is composed of a heat insulating material 23 for preventing heat transfer to and a holder 24 that integrates these members and combines them with other members. An embedded heat generating portion 31 and a lead pattern 27 integrally joined to the heat generating portion 31 and connected to both ends of the heat generating body 26 on a belt-shaped ceramic body.
And a lead terminal 30 connected to the electrode lead-out portion 29. A pair of lead portions 28 in which the lead wires 28 are embedded, an electrode lead-out portion 29 in which a part of the lead pattern 27 is exposed from the side surface of each lead portion 28, and a lead terminal 30 connected to the electrode lead-out portion 29. (Japanese Patent Laid-Open No. 2001-3
No. 32589).

【0005】また、前記リード端子30は、L字状或い
は板状の電極金具30aに、リード線30bが取着され
ており、前記電極金具30aは電極取り出し部29を覆
うようにロウ付けされており、このロウ材にはビッカー
ス硬度2.2GPaのAu−Ni(組成比82重量%:
18重量%)等が用いられ、そのロウ付け面積は15m
2程度であった。
In the lead terminal 30, a lead wire 30b is attached to an L-shaped or plate-shaped electrode fitting 30a, and the electrode fitting 30a is brazed so as to cover the electrode lead-out portion 29. In this brazing material, Au-Ni having a Vickers hardness of 2.2 GPa (composition ratio: 82% by weight:
18% by weight, etc., and the brazing area is 15 m
It was about m 2 .

【0006】[0006]

【発明が解決しようとする課題】近年、生産効率の向上
のため、接触加熱装置の加熱温度、温度分布の向上が要
求されており、従来は約1kWの電力を印加して100
〜300℃間を4秒程度で昇温させていたのに対し、現
在は約2.5kWの電力を印加して100〜500℃間
を5秒以下で急速昇温させることが要求されている。
In recent years, in order to improve the production efficiency, it has been required to improve the heating temperature and temperature distribution of the contact heating device. Conventionally, it has been required to apply a power of about 1 kW to 100.
While the temperature was raised between ~ 300 ° C in about 4 seconds, it is currently required to apply a power of about 2.5 kW to rapidly raise the temperature between 100 ~ 500 ° C in less than 5 seconds. .

【0007】しかしながら、従来の接触加熱装置に用い
られるセラミックヒーター22は、電極取り出し部29
に接合されるリード端子30が、リード部28の一部を
覆うようにロウ付けされており、より高温で繰り返し使
用される場合電極取り出し部29の温度も高温となり熱
膨張の小さいセラミックヒーターと熱膨張の大きい電極
金具30aとの熱膨張率の差により、接触加熱装置の作
動時にロウ付け部に応力が発生し、ロウ付け部の周辺に
クラックが入りやすくヒーター寿命が低下するという欠
点を有していた。
However, the ceramic heater 22 used in the conventional contact heating device has the electrode lead-out portion 29.
The lead terminal 30 joined to the above is brazed so as to cover a part of the lead portion 28, and when it is repeatedly used at a higher temperature, the temperature of the electrode lead-out portion 29 also becomes high, and a ceramic heater and a thermal heater with a small thermal expansion are used. Due to the difference in the coefficient of thermal expansion from the electrode fitting 30a having a large expansion, stress is generated in the brazing part during the operation of the contact heating device, and cracks easily form around the brazing part, which shortens the life of the heater. Was there.

【0008】また、従来の接触加熱装置に用いられる前
記セラミックヒーター22は、電極取り出し部29の温
度を下げるため、リード部28が大きく突き出た構造と
なっていたため、実作業において邪魔な構造となってい
た。
Further, the ceramic heater 22 used in the conventional contact heating device has a structure in which the lead portion 28 is largely protruded in order to lower the temperature of the electrode lead-out portion 29, which is a hindrance structure in actual work. Was there.

【0009】本発明は、上述の欠点に鑑み案出されたも
ので、その目的は、高温での繰り返し使用において、セ
ラミックヒーター22の電極取り出し部29の温度上昇
を防止し、小スペースで作業性の高いコンパクトで高寿
命な接触加熱装置を提供することにある。
The present invention has been devised in view of the above-mentioned drawbacks, and its purpose is to prevent the temperature rise of the electrode lead-out portion 29 of the ceramic heater 22 during repeated use at high temperature and to improve workability in a small space. It is to provide a compact and long-life contact heating device with high efficiency.

【0010】[0010]

【課題を解決するための手段】本発明の接触加熱装置
は、被加熱物を押圧するためのセラミックツールと、該
セラミックツールを加熱するためのセラミックヒーター
と、セラミックヒーターから発生した熱がセラミックツ
ール以外に伝熱することを防止するための断熱材と、こ
れらの部材を他部材に結合するホルダーとから構成され
た接触加熱装置であって、前記セラミックヒーターは、
発熱抵抗体を内蔵した発熱部と、前記発熱抵抗体に接続
しセラミックヒーターの主面に略垂直に延びる導体部を
内蔵したリード部と、該リード部から略垂直に引き出さ
れた導体部を内蔵する電極取り出し部と、前記発熱部と
リード部で囲まれる凹部を有し、前記セラミックヒータ
ーの電極取り出し部を断熱材を介してホルダーに固定し
たことを特徴とする。
A contact heating apparatus of the present invention is a ceramic tool for pressing an object to be heated, a ceramic heater for heating the ceramic tool, and heat generated from the ceramic heater. In addition to a heat insulating material for preventing heat transfer, a contact heating device composed of a holder for joining these members to other members, wherein the ceramic heater is
Built-in heat generating part having a built-in heat generating resistor, lead part having a conductive part connected to the heat generating resistor and extending substantially perpendicularly to the main surface of the ceramic heater, and a conductor part pulled out substantially vertically from the lead part And a recess surrounded by the heat generating part and the lead part, and the electrode extracting part of the ceramic heater is fixed to a holder via a heat insulating material.

【0011】そして、本発明は前記凹部に断熱材が充填
されていることを特徴とする。
The present invention is characterized in that the recess is filled with a heat insulating material.

【0012】また、前記凹部の深さが2〜50mmであ
ることを特徴とする。
The depth of the recess is 2 to 50 mm.

【0013】また、前記電極取り出し部にテーパー部を
有する孔を備え、上記テーパー部に導体部の一部を露出
させるとともに、この露出部にメタライズ部を形成し、
該メタライズ部と接触するように係合部材を備えて電極
部を形成したことを特徴とする。
The electrode lead-out portion is provided with a hole having a tapered portion, a part of the conductor portion is exposed in the tapered portion, and a metallized portion is formed in the exposed portion.
It is characterized in that an electrode member is formed by providing an engaging member so as to come into contact with the metallized portion.

【0014】前記凹部に断熱材が充填されており、前記
凹部の深さが2〜50mmであることを特徴とする。
The recess is filled with a heat insulating material, and the depth of the recess is 2 to 50 mm.

【0015】さらに、本発明は前記電極取り出し部が断
熱材と接触するように形成されていることを特徴とす
る。
Furthermore, the present invention is characterized in that the electrode lead-out portion is formed so as to come into contact with a heat insulating material.

【0016】また、本発明は前記電極取り出し部にテー
パー部を有する凹部が形成され、該テーパー部に導体部
の一部が露出し、この露出部にメタライズ部を形成し、
該メタライズ部が係合部材と接触するように電極部が形
成されていることを特徴とする。
Further, according to the present invention, a recess having a tapered portion is formed in the electrode lead-out portion, a part of the conductor portion is exposed in the tapered portion, and a metallized portion is formed in the exposed portion.
The electrode portion is formed so that the metallized portion contacts the engaging member.

【0017】[0017]

【発明の実施の形態】以下、本発明の実施の形態を図面
に基づいて説明する。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings.

【0018】本発明の接触加熱装置は、図1の斜視図の
ように、被加熱物を押圧するためのセラミックツール1
と、セラミックツール1を加熱するためのセラミックヒ
ーター2と、セラミックヒーター2から発生した熱が前
記セラミックツール1以外に伝熱することを防止するた
めの断熱材3と、これらの部材を統合し他部材に結合す
るためのホルダー4から構成される。
As shown in the perspective view of FIG. 1, the contact heating apparatus of the present invention is a ceramic tool 1 for pressing an object to be heated.
, A ceramic heater 2 for heating the ceramic tool 1, a heat insulating material 3 for preventing heat generated from the ceramic heater 2 from being transferred to a portion other than the ceramic tool 1, and integrating these members with each other. It is composed of a holder 4 for connecting to a member.

【0019】前記セラミックツール1は、炭化珪素質焼
結体、窒化珪素質焼結体、窒化アルミニウム質焼結体等
からなり、その上面に半導体チップを真空吸着するため
の真空引き穴1aが形成されており、その下面に配置さ
れるセラミックヒーター2、断熱材3およびホルダー4
にも同様な真空引き穴が設けられており、これら真空引
き穴は全て貫通しているため、これらを介して真空引き
することによってセラミックツール1の上面の半導体チ
ップを真空吸着する仕組みである。
The ceramic tool 1 is composed of a silicon carbide based sintered body, a silicon nitride based sintered body, an aluminum nitride based sintered body, etc., and a vacuum drawing hole 1a for vacuum-sucking a semiconductor chip is formed on the upper surface thereof. And the ceramic heater 2, the heat insulating material 3, and the holder 4 which are arranged on the lower surface thereof.
Is also provided with a similar vacuum drawing hole, and since all the vacuum drawing holes are penetrated, the semiconductor chip on the upper surface of the ceramic tool 1 is vacuum-sucked by drawing a vacuum through them.

【0020】また、前記セラミックツール1は、その熱
伝導率が100W/m・K以上であることが好ましく、
セラミックツール1の周囲部分の温度が低下するのを防
止するとともに、セラミックヒーター2の熱をセラミッ
クツール1側に効率的に供給し、その上面に載置された
半導体チップの温度分布を一定に保ちハンダチップのボ
ンディングにバラツキが発生するのを有効に防止するこ
とができる。
The ceramic tool 1 preferably has a thermal conductivity of 100 W / m · K or more,
The temperature of the peripheral portion of the ceramic tool 1 is prevented from lowering, the heat of the ceramic heater 2 is efficiently supplied to the ceramic tool 1 side, and the temperature distribution of the semiconductor chip mounted on the upper surface is kept constant. It is possible to effectively prevent variations in the bonding of the solder chips.

【0021】さらに、前記セラミックツール1の下面に
はセラミックヒーター2が形成され、セラミックツール
1の上面に載置された半導体チップを加熱する作用をな
す。
Further, a ceramic heater 2 is formed on the lower surface of the ceramic tool 1 and has a function of heating the semiconductor chip mounted on the upper surface of the ceramic tool 1.

【0022】前記セラミックヒーター2は、図2
(a)、(b)に示すようにセラミック体5に発熱体6
を埋設した発熱部7と、前記発熱体6からセラミックヒ
ーター2の発熱部7側の主面にほぼ垂直な方向に引き出
された導体部8aを内蔵したリード部8と、該リード部
8からほぼ垂直に引き出された導体部9aを有する電極
取り出し部9からなり、前記発熱部7とリード部8で囲
まれた凹部10を有し、前記セラミックヒーター2の電
極取り出し部9は断熱材3を介してホルダー4に固定さ
れている。
The ceramic heater 2 is shown in FIG.
As shown in (a) and (b), a heating element 6 is formed on the ceramic body 5.
And a lead portion 8 having a built-in conductor portion 8a that is drawn out from the heating element 6 in a direction substantially perpendicular to the main surface of the ceramic heater 2 on the side of the heat generating portion 7; It is composed of an electrode lead-out portion 9 having a conductor portion 9a pulled out vertically, and has a recess 10 surrounded by the heat generating portion 7 and the lead portion 8. The electrode lead-out portion 9 of the ceramic heater 2 has a heat insulating material 3 interposed therebetween. Fixed to the holder 4.

【0023】前記凹部10はセラミックヒーター2の熱
容量を抑え急速昇温、急速高温を可能にするとともに、
電極取り出し部9をセラミックヒーター2の発熱部7の
主面と異なる面に配置できるため、電極取り出し部9の
温度上昇を防止できる非常にシンプルな構造とすること
ができる。
The recess 10 suppresses the heat capacity of the ceramic heater 2 to enable rapid temperature rise and rapid temperature rise, and
Since the electrode lead-out portion 9 can be arranged on a surface different from the main surface of the heat generating portion 7 of the ceramic heater 2, a very simple structure capable of preventing the temperature rise of the electrode lead-out portion 9 can be obtained.

【0024】ここで、前記発熱部7とリード部8で囲ま
れた凹部10の深さDは好ましくは5〜50mmに調整
され、さらに該凹部10には断熱材3が充填されてい
る。これは深さDが2mm未満であると発熱部7の熱引
きにより電極取り出し部9の温度が高くなり過ぎ、また
50mmを越えると電極取り出し部9の温度低減効果は
十分でありまた製造コストが高くなり過ぎるためであ
る。前記凹部10の深さDは、さらに好ましくは5〜5
0mmとすることが良い。
Here, the depth D of the recess 10 surrounded by the heat generating portion 7 and the lead portion 8 is preferably adjusted to 5 to 50 mm, and the recess 10 is filled with the heat insulating material 3. This is because if the depth D is less than 2 mm, the temperature of the electrode lead-out portion 9 becomes too high due to heat drawing of the heat generating portion 7, and if it exceeds 50 mm, the temperature reducing effect of the electrode lead-out portion 9 is sufficient and the manufacturing cost is low. This is because it will be too high. The depth D of the recess 10 is more preferably 5-5.
It is preferable to set it to 0 mm.

【0025】前記セラミックヒーター2の発熱部7の厚
みは1〜4mm、リード部8の厚みは1〜5mm、電極
取り出し部9の厚みは1〜10mmが好ましく、上記凹
部10を形成すると同様、ヒーターの熱容量を適正とす
ることでヒーター温度の急速昇降温性能が得られる。さ
らに好ましくは、リード部8の厚みは2〜4mmとする
のが良い。
The thickness of the heating portion 7 of the ceramic heater 2 is preferably 1 to 4 mm, the thickness of the lead portion 8 is preferably 1 to 5 mm, and the thickness of the electrode lead-out portion 9 is preferably 1 to 10 mm. By properly adjusting the heat capacity of the heater, rapid heating and lowering performance of the heater temperature can be obtained. More preferably, the lead portion 8 has a thickness of 2 to 4 mm.

【0026】前記発熱部7の厚みを1mm未満にする
と、セラミックツール1を半導体チップに押圧した際に
発熱部7が変形し、半導体チップへのハンダ付けがばら
ついてしまうからである。また、前記リード部8の厚み
を1mm未満にした場合も同様である。また、前記発熱
部7を4mmを越える厚みにすると、発熱部7の熱容量
が大きくなり過ぎて冷却時の冷却速度が遅くなってしま
うので好ましくない。また、前記リード部8の厚みが5
mmを越えると、リード部8を介する熱伝導が大きくな
り、電極取り出し部9の温度が上昇してしまって電極取
り出し部9にクラックが発生するようになるので、好ま
しくない。
If the thickness of the heat generating portion 7 is less than 1 mm, the heat generating portion 7 is deformed when the ceramic tool 1 is pressed against the semiconductor chip, and the soldering to the semiconductor chip varies. The same applies when the thickness of the lead portion 8 is less than 1 mm. Further, if the thickness of the heat generating portion 7 exceeds 4 mm, the heat capacity of the heat generating portion 7 becomes too large and the cooling rate during cooling becomes slow, which is not preferable. Further, the thickness of the lead portion 8 is 5
If it exceeds mm, heat conduction through the lead portion 8 becomes large, the temperature of the electrode lead-out portion 9 rises, and cracks occur in the electrode lead-out portion 9, which is not preferable.

【0027】また、電極取り出し部9の厚みを1mm未
満にすると、接触加熱装置を固定するための応力が前記
電極取り出し部9に掛かり、しかも昇降温の熱サイクル
が加算されるので、電極取り出し部9が破損しやすくな
るので好ましくない。また、電極取り出し部9の厚みを
10mmを越える厚みにすると、凹部10を形成する加
工費が高くなるので好ましくない。加工費を考えると、
電極取り出し部9の厚みは、2〜5mmにするのが良
い。
If the thickness of the electrode take-out portion 9 is less than 1 mm, the stress for fixing the contact heating device is applied to the electrode take-out portion 9, and the heat cycle of temperature increase / decrease is added. It is not preferable because 9 is easily damaged. Further, if the thickness of the electrode lead-out portion 9 exceeds 10 mm, the processing cost for forming the recess 10 increases, which is not preferable. Considering the processing cost,
The thickness of the electrode lead-out portion 9 is preferably 2 to 5 mm.

【0028】このようなセラミックヒーター2の製造方
法としては、先ず、例えば主成分として90〜92モル
%の窒化珪素に焼結助剤として希土類元素酸化物を2〜
10モル%、酸化アルミニウム、酸化珪素を窒化珪素と
希土類元素酸化物の総量に対して各々0.2〜2.0重
量%、1〜5重量%添加混合して原料粉末を調整した
後、原料粉末をプレス成形法等によって所定形状に成形
し成形体を得、該成形体にタングステンやモリブデン、
レニウム等、或いはこれらの炭化物、窒化物等に適当な
有機溶剤、溶媒を添加混合して導電性ペーストを作り、
これを発熱体6および電極取り出し部9の導体形状にス
クリーン印刷法等によりそれぞれプリントする。さら
に、図2(c)のように、上記二つの成形体の間に、貫
通孔を形成しこの中に導電性ペーストを充填した成形体
を挟み込んで密着させ、約1650〜1800℃の温度
でホットプレス焼成するか、もしくは、10気圧以上の
窒素雰囲気中にて約1700〜1850℃で焼成する。
As a method for manufacturing such a ceramic heater 2, first, for example, 90 to 92 mol% of silicon nitride as a main component and 2 to 2 rare earth element oxides as a sintering aid are used.
10 mol%, aluminum oxide, and silicon oxide are added and mixed in an amount of 0.2 to 2.0% by weight and 1 to 5% by weight, respectively, with respect to the total amount of silicon nitride and rare earth element oxide to prepare a raw material powder. A powder is formed into a predetermined shape by a press forming method or the like to obtain a formed body, and the formed body is made of tungsten or molybdenum,
An appropriate organic solvent or solvent is added to and mixed with rhenium, etc., or their carbides, nitrides, etc. to prepare a conductive paste,
This is printed on the conductor shapes of the heating element 6 and the electrode lead-out portion 9 by screen printing or the like. Further, as shown in FIG. 2 (c), a through-hole is formed between the above-mentioned two molded bodies, and a molded body filled with a conductive paste is sandwiched therein to be in close contact with each other, and at a temperature of about 1650 to 1800 ° C. It is fired by hot press or fired at about 1700 to 1850 ° C. in a nitrogen atmosphere of 10 atm or more.

【0029】得られた焼結体を所定の形状に研削加工し
た後、電極取り出し部9に一対の電極引き出し孔11を
研削加工し、電極取り出し部9の導体部9aの一部を電
極引き出し孔11より露出させ図3に示すように前記電
極引き出し孔11の表面に、主成分としてAu−Ni、
またはAg−Cuを含有したペーストを塗布し、真空中
にて焼成してメタライズ層12を形成し、該メタライズ
層12の上にAu、Pt、Ag、またはNiからなるメ
ッキ層13を施した後、係合部材14でセラミックヒー
ター2、断熱材3を固定するとともに、前記係合部材1
4と前記メタライズ層12が接触することで電極取り出
し部9が形成される。
After grinding the obtained sintered body into a predetermined shape, a pair of electrode lead-out holes 11 are ground in the electrode lead-out portion 9 so that a part of the conductor portion 9a of the electrode lead-out portion 9 is formed into an electrode lead-out hole. And exposed on the surface of the electrode lead-out hole 11 as shown in FIG.
Alternatively, after applying a paste containing Ag-Cu and firing in a vacuum to form a metallized layer 12, and after applying a plating layer 13 made of Au, Pt, Ag, or Ni on the metallized layer 12 The ceramic heater 2 and the heat insulating material 3 are fixed by the engaging member 14, and the engaging member 1
The electrode lead-out portion 9 is formed by the contact between the metallized layer 4 and the metallized layer 12.

【0030】前記メタライズ層12は耐酸化性の高い金
属成分を主成分し、またその表面に耐酸化性の高いメッ
キ層13を形成していることから、電極取り出し部9の
耐熱性を高めることができ、また係合部材14と接触さ
せて電極取り出し部9を形成していることから、高温で
使用時に該電極引き出し部9に大きな応力が発生するこ
とが少なく、クラック等の不具合の発生を防止すること
ができる。
Since the metallized layer 12 contains a metal component having a high oxidation resistance as a main component and the plating layer 13 having a high oxidation resistance is formed on the surface thereof, the heat resistance of the electrode lead-out portion 9 is enhanced. In addition, since the electrode lead-out portion 9 is formed in contact with the engaging member 14, a large stress is less likely to be generated in the electrode lead-out portion 9 at the time of use at high temperature, and a defect such as a crack is not generated. Can be prevented.

【0031】また、前記係合部材14は、熱膨張率が前
記セラミックヒーター2の熱膨張率と前記断熱材3の熱
膨張率の中間となるものを用いれば、温度上昇時の熱膨
張差により各部材のゆるみ、または電気導通の不具合等
を防止することができる。
If the engaging member 14 has a coefficient of thermal expansion intermediate between the coefficient of thermal expansion of the ceramic heater 2 and the coefficient of thermal expansion of the heat insulating material 3, the engaging member 14 may have a difference in coefficient of thermal expansion when the temperature rises. It is possible to prevent loosening of each member, a defect in electrical conduction, and the like.

【0032】前記係合部材14としては熱膨張率が5×
10-6/℃のFe−Ni−Co合金製であることが好ま
しい。
The coefficient of thermal expansion of the engaging member 14 is 5 ×.
It is preferably made of an Fe-Ni-Co alloy of 10 -6 / ° C.

【0033】さらに、前記係合部材14は皿ねじとナッ
トから形成されることで各部材の固定と電極取り出し部
9の電気導通を安価で確実に行うことができる。
Further, since the engaging member 14 is formed of a countersunk screw and a nut, the fixing of each member and the electrical continuity of the electrode lead-out portion 9 can be reliably performed at low cost.

【0034】また、電極取り出し部9の構造として、こ
れまで接触タイプの取り出し構造を説明したが、金具を
ロウ付けするような構造としても構わない。
Further, as the structure of the electrode take-out portion 9, the contact type take-out structure has been described so far, but the metal fitting may be brazed.

【0035】また、前記セラミック体5は、窒化珪素質
焼結体で形成することが好ましく、セラミック体5に発
熱体6及び導体ペーストを埋設させることによって動作
時に発熱体6付近まで空気中の酸素が拡散し、発熱体6
が酸化して断線するのを有効に防止するとともに、高温
強度を極めて高いものとし、電気的な絶縁性、耐久性を
保持する。
The ceramic body 5 is preferably formed of a silicon nitride sintered body, and by embedding the heating element 6 and a conductor paste in the ceramic body 5, oxygen in the air up to the vicinity of the heating element 6 during operation can be obtained. Is diffused and the heating element 6
It effectively prevents oxidization and disconnection, and makes the high temperature strength extremely high to maintain the electrical insulation and durability.

【0036】さらに、前記セラミック体5の熱伝導率を
常温で50W/m・K以上としておくと、発熱体6の熱
をセラミック体5全体に短時間で伝達し、温度むらを防
止することができ、好ましくはその厚みを1〜2mmの
範囲としておくと、セラミックヒーター2の機械的強度
を高いものに維持しつつ熱容量を小さくし、昇温速度を
速くすることができるため、半導体ベアチップを押圧加
熱して配線基板に実装する際、セラミックヒーター2に
割れ等の破損を発生させることなく短時間に実装可能と
なる。
Further, if the thermal conductivity of the ceramic body 5 is set to 50 W / mK or more at room temperature, the heat of the heating element 6 can be transferred to the entire ceramic body 5 in a short time, and the temperature unevenness can be prevented. If the thickness is set within the range of 1 to 2 mm, the heat capacity can be reduced and the temperature rising rate can be increased while maintaining high mechanical strength of the ceramic heater 2, so that the semiconductor bare chip is pressed. When heating and mounting on the wiring board, the ceramic heater 2 can be mounted in a short time without causing damage such as cracking.

【0037】前記セラミックヒーター2の下面に備えら
れた断熱材3は、5〜30%程度の気孔率を有するムラ
イトセラミックスやムライト−コージェライトセラミッ
クスからなり、セラミックヒーター2の熱をセラミック
ツール1側に有効に伝達させる作用をなす。
The heat insulating material 3 provided on the lower surface of the ceramic heater 2 is made of mullite ceramics or mullite-cordierite ceramics having a porosity of about 5 to 30%. The heat of the ceramic heater 2 is transmitted to the ceramic tool 1 side. It acts to effectively transmit.

【0038】断熱材3の構造としては、前記凹部10を
完全に充填するようにしても構わないし、真空引き穴の
周囲だけセラミックヒーター2に接するようにしても構
わない。真空引き穴の周囲をセラミックヒーター2に接
するようにするのは、真空引きを良好にするためであ
る。
As for the structure of the heat insulating material 3, the concave portion 10 may be completely filled, or only the periphery of the vacuum drawing hole may be in contact with the ceramic heater 2. The reason why the periphery of the vacuum suction hole is in contact with the ceramic heater 2 is to improve the vacuum suction.

【0039】また、前記断熱材3の下面には、セラミッ
クツール1を除く各部品を統合し、他部材に結合するた
めのホルダー4が形成されている。該ホルダー4は金
属、またはセラミック製部材等から成るが、好ましくは
低熱伝導性を有するセラミックスから成り、前記セラミ
ックヒーター2を形成するセラミック体5と同程度、も
しくはそれよりも熱伝導率の低いセラミックスであれば
良く、好ましくは常温での熱伝導率が50W/m・K以
下のものを用いる。具体的には、低熱伝導窒化珪素、ア
ルミナ、ジルコニア等のセラミックスから成る。また、
金属製のホルダーの場合その内部にエアー冷却等の冷却
機構を備えたものが好ましい。
On the lower surface of the heat insulating material 3, there is formed a holder 4 for integrating the respective parts except the ceramic tool 1 and connecting them to other members. The holder 4 is made of metal or a ceramic member, but is preferably made of ceramics having a low thermal conductivity, and has the same or lower thermal conductivity as the ceramic body 5 forming the ceramic heater 2. It is sufficient that the thermal conductivity at room temperature is 50 W / m · K or less. Specifically, it is made of ceramics such as low thermal conductive silicon nitride, alumina and zirconia. Also,
In the case of a metal holder, a holder provided with a cooling mechanism such as air cooling is preferable.

【0040】上述のような接触加熱装置は、セラミック
ヒーター2の発熱体6の電気抵抗により電力が印加され
る際、ジュール発熱を起こし、セラミックツール1の上
面に載置された半導体ベアチップを低融点ロウ材を介し
て配線基板上に実装する際、前記低融点ロウ材を溶融さ
せるために必要な温度に発熱する仕組みである。
In the contact heating device as described above, Joule heat is generated when electric power is applied by the electric resistance of the heating element 6 of the ceramic heater 2, and the semiconductor bare chip mounted on the upper surface of the ceramic tool 1 has a low melting point. This is a mechanism for generating heat at a temperature necessary for melting the low melting point brazing material when it is mounted on the wiring board via the brazing material.

【0041】なお、本発明は上述の実施形態に限定され
るものではなく、本発明の要旨を逸脱しない範囲であれ
ば、種々の変更は可能である。
The present invention is not limited to the above-mentioned embodiment, and various modifications can be made without departing from the gist of the present invention.

【0042】[0042]

【実施例】次に本発明の実施例を説明する。EXAMPLES Examples of the present invention will be described below.

【0043】図2に示すような接触加熱装置用のセラミ
ックヒーター2を作製し、その特性を測定した。
A ceramic heater 2 for a contact heating device as shown in FIG. 2 was produced and its characteristics were measured.

【0044】先ず、主成分として90〜92モル%の窒
化珪素に焼結助剤として希土類元素酸化物を2〜10モ
ル%、酸化アルミニウム、酸化珪素を窒化珪素と希土類
元素酸化物の総量に対して各々0.2〜2.0重量%と
1〜5重量%添加混合して原料粉末を調整した後、原料
粉末をプレス成形法等により30mm×50mmの成形
体を得、該成形体の上面にタングステンに適当な有機溶
剤、溶媒を添加混合した発熱体ペーストを作り、これを
発熱部7および電極取り出し部9の導体形状にスクリー
ン印刷法等によりプリントする。さらに、上記二つの成
形体の間に、貫通孔を形成しこの中にタングステンを主
成分とする導電性ペーストを充填した成形体を挟み込ん
で密着させ、約1650〜1800℃の温度でホットプ
レス焼成した後、発熱部7とリード部8で囲まれた凹部
10を有する所定の形状に研削加工し、別途一対の電極
引き出し孔11を研削加工し、導体部の一部を電極引き
出し孔11より露出させ、電極取り出し部9を形成し、
Ag−Cuを含有したペーストを塗布し、真空中で焼成
してメタライズ層12を形成、Niからなるメッキ層1
3を施した後、係合部材でセラミックヒーター2、断熱
材3、ホルダー4を組み付け、その際電極取り出し部9
が断熱材3に接触する形状とした。
First, 90 to 92 mol% of silicon nitride as a main component, 2 to 10 mol% of a rare earth element oxide as a sintering aid, aluminum oxide and silicon oxide to silicon nitride and the total amount of rare earth element oxide as a sintering aid. After adjusting the raw material powder by adding and mixing 0.2 to 2.0 wt% and 1 to 5 wt% respectively, the raw material powder is obtained by a press molding method or the like to obtain a 30 mm × 50 mm compact, and the upper surface of the compact A heating element paste is prepared by mixing tungsten with an appropriate organic solvent and a solvent, and this is printed on the conductor shapes of the heating portion 7 and the electrode lead-out portion 9 by a screen printing method or the like. Further, a through-hole is formed between the above-mentioned two molded bodies, and a molded body filled with a conductive paste containing tungsten as a main component is sandwiched and closely adhered thereto, and hot press firing is performed at a temperature of about 1650 to 1800 ° C. After that, it is ground into a predetermined shape having a concave portion 10 surrounded by the heat generating portion 7 and the lead portion 8, and a pair of electrode lead-out holes 11 is separately ground to expose a part of the conductor portion from the electrode lead-out hole 11. To form the electrode lead-out portion 9,
A plating layer 1 made of Ni is formed by applying a paste containing Ag-Cu and firing it in a vacuum to form a metallized layer 12.
After applying 3, the ceramic heater 2, the heat insulating material 3 and the holder 4 are assembled with the engaging member, and at this time, the electrode take-out portion 9
Is in contact with the heat insulating material 3.

【0045】セラミックヒーター2の加工は平面研削
盤、および超音波加工機を用いて、24mm×24mm
発熱部主面を持つセラミック体5とネジ部直径が3mm
でテーパー部を有する電極引き出し孔11を形成した。
また、セラミックヒーター2の発熱部7の厚みは2m
m、リード部8および電極取り出し部9の厚みが3mm
とし、発熱部7とリード部8で囲まれる凹部10の深さ
Dを表1に示すように1〜50mmとした試料を得た。
The ceramic heater 2 is processed by using a surface grinder and an ultrasonic processing machine, and is 24 mm × 24 mm.
Ceramic body 5 with a heating surface main surface and screw part diameter 3 mm
Then, the electrode lead-out hole 11 having a tapered portion was formed.
Further, the thickness of the heating portion 7 of the ceramic heater 2 is 2 m.
m, the thickness of the lead portion 8 and the electrode lead-out portion 9 is 3 mm
Then, a sample was obtained in which the depth D of the recess 10 surrounded by the heat generating portion 7 and the lead portion 8 was 1 to 50 mm as shown in Table 1.

【0046】また、図5に示す従来構造のセラミックヒ
ーター22は同様にセラミック焼結体を作製した後、2
4mm×24mmの発熱部31と、長さ20〜50mm
のリード部28を形成し、Ag−Cuを含有したメタラ
イズ層を形成しAg−Cuで電極金具30aをろう付け
するとともにリード線30bを接続して試料を得た。
The ceramic heater 22 having the conventional structure shown in FIG.
4 mm x 24 mm heat generating part 31 and length 20 to 50 mm
Was formed, a metallized layer containing Ag—Cu was formed, the electrode fitting 30a was brazed with Ag—Cu, and the lead wire 30b was connected to obtain a sample.

【0047】電極部の温度は熱電対を取り付け測定し、
発熱部温度が500℃付近で飽和するような電力をセラ
ミックヒーター2、22に印加して電極取り出し部9の
温度を測定するとともに、電極取り出し部9のクラック
の有無をセラミックヒーター2、22の常温抵抗値の変
化と外観の双眼のチェックで確認した。
The temperature of the electrode part is measured by attaching a thermocouple.
The temperature of the electrode lead-out portion 9 is measured by applying power to the ceramic heaters 2 and 22 so that the temperature of the heat generating portion is saturated at around 500 ° C. It was confirmed by checking the change in resistance value and the binocular appearance.

【0048】その結果を表1に示す。The results are shown in Table 1.

【0049】[0049]

【表1】 [Table 1]

【0050】表1の結果より、発熱部7とリード部8で
囲まれる凹部10の深さDが1mmであるNo.1は、
電極取出し部9の温度が400℃以上となり、電極取り
出し部9にクラックが発生した。これに対し、発熱部7
とリード部8で囲まれる深さDが2mm以上の凹部10
を形成したNo.2〜9は電極取り出し部9にクラック
が発生しなかった。特に凹部10の深さDが3mm以上
の場合セラミックヒーターの温度が500℃という高温
の場合でも電極取り出し部9の温度を350℃以下にで
きることが判った。また、前記凹部10の深さDを5m
m以上にすれば、電極取り出し部9の温度を300℃以
下にできることがわかった。
From the results shown in Table 1, No. 1 in which the depth D of the recess 10 surrounded by the heat generating portion 7 and the lead portion 8 was 1 mm. 1 is
The temperature of the electrode lead-out portion 9 became 400 ° C. or higher, and cracks were generated in the electrode lead-out portion 9. On the other hand, the heat generating part 7
A recess 10 having a depth D of 2 mm or more surrounded by the lead portion 8
No. In Nos. 2 to 9, no crack was generated in the electrode take-out portion 9. In particular, it has been found that when the depth D of the recess 10 is 3 mm or more, the temperature of the electrode take-out portion 9 can be 350 ° C. or less even when the temperature of the ceramic heater is as high as 500 ° C. Further, the depth D of the recess 10 is 5 m.
It has been found that the temperature of the electrode lead-out portion 9 can be set to 300 ° C. or lower if the temperature is set to m or more.

【0051】[0051]

【発明の効果】本発明の接触加熱装置は、被加熱物を押
圧するためのセラミックツールと、該セラミックツール
を加熱するためのセラミックヒーターと、セラミックヒ
ーターから発生した熱がセラミックツール以外に伝熱す
ることを防止するための断熱材と、これらの部材を他部
材に結合するホルダーとから構成された接触加熱装置で
あって、前記セラミックヒーターは、発熱抵抗体を内蔵
した発熱部と、前記発熱抵抗体に接続しセラミックヒー
ターの主面に略垂直に延びる導体部を内蔵したリード部
と、該リード部から略垂直に引き出された導体部を内蔵
する電極取り出し部と、前記発熱部とリード部で囲まれ
る凹部を有し、前記セラミックヒーターの電極取り出し
部を断熱材を介してホルダーに固定されていることか
ら、高温での繰り返し使用において、セラミックヒータ
ーの電極取り出し部の温度上昇を防止し、小さな占有体
積で作業性の高いコンパクトで高寿命な接触加熱装置が
得られるようになった。
According to the contact heating apparatus of the present invention, a ceramic tool for pressing an object to be heated, a ceramic heater for heating the ceramic tool, and heat generated from the ceramic heater are transferred to other than the ceramic tool. A contact heating device comprising a heat-insulating material for preventing the heat generation and a holder for connecting these members to another member, wherein the ceramic heater includes a heat-generating portion containing a heat-generating resistor and the heat-generating portion. A lead portion that is connected to the resistor and has a built-in conductor portion that extends substantially perpendicularly to the main surface of the ceramic heater, an electrode lead-out portion that has a conductor portion that is pulled out substantially vertically from the lead portion, and the heating portion and the lead portion. Since it has a recess surrounded by, and the electrode extraction part of the ceramic heater is fixed to the holder via a heat insulating material, it can be repeated at high temperatures. In use, to prevent the temperature rise of the electrode extraction portion of the ceramic heater, a high lifetime contact heating apparatus with high operability compact with a small occupied volume came to be obtained.

【0052】また、本発明は前記電極取り出し部にテー
パー部を有する凹部が形成され、該テーパー部に導体部
の一部が露出し、この露出部にメタライズ部を形成し、
該メタライズ部が係合部材と接触するように電極部が形
成されていることから、高温において電極部の耐熱性が
高く電極引き出し部のクラックを防止できる。
Further, according to the present invention, a recess having a tapered portion is formed in the electrode lead-out portion, a part of the conductor portion is exposed in the tapered portion, and a metallized portion is formed in the exposed portion.
Since the electrode portion is formed so that the metallized portion comes into contact with the engaging member, the heat resistance of the electrode portion is high at high temperatures and cracks in the electrode lead portion can be prevented.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の接触加熱装置の一実施形態を示す斜視
図である。
FIG. 1 is a perspective view showing an embodiment of a contact heating device of the present invention.

【図2】(a)は本発明の接触加熱装置に用いられるセ
ラミックヒーターの斜視図であり、(b)は同図(a)
の断面図、(c)は外形加工前の分解斜視図である。
FIG. 2 (a) is a perspective view of a ceramic heater used in the contact heating apparatus of the present invention, and FIG. 2 (b) is the same figure (a).
2C is a cross-sectional view, and FIG. 3C is an exploded perspective view before external processing.

【図3】本発明の接触加熱装置のセラミックヒーター電
極取り出し部の断面図である。
FIG. 3 is a cross-sectional view of a ceramic heater electrode extraction portion of the contact heating device of the present invention.

【図4】従来の接触加熱装置を示す斜視図である。FIG. 4 is a perspective view showing a conventional contact heating device.

【図5】(a)は従来の接触加熱装置に用いられるセラ
ミックヒーターを示す斜視図であり、(b)は同じく分
解斜視図である。
FIG. 5A is a perspective view showing a ceramic heater used in a conventional contact heating device, and FIG. 5B is an exploded perspective view of the same.

【符号の説明】[Explanation of symbols]

1:セラミックツール 2:セラミックヒーター 3:断熱材 4:ホルダー 5:セラミック体 6:発熱体 7:発熱部 8:リード部 9:電極取り出し部 10:凹部 11:電極引き出し孔 12:メタライズ層 13:メッキ層 14:係合部材 1: Ceramic tool 2: Ceramic heater 3: Thermal insulation 4: Holder 5: Ceramic body 6: heating element 7: Heating part 8: Lead section 9: Electrode take-out part 10: Recess 11: Electrode drawing hole 12: Metallized layer 13: plating layer 14: Engagement member

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】被加熱物を押圧するためのセラミックツー
ルと、該セラミックツールを加熱するためのセラミック
ヒーターと、セラミックヒーターから発生した熱がセラ
ミックツール以外に伝熱することを防止するための断熱
材と、これらの部材を他部材に結合するホルダーとから
構成された接触加熱装置であって、前記セラミックヒー
ターは、発熱抵抗体を内蔵した発熱部と、前記発熱抵抗
体に接続しセラミックヒーターの主面に略垂直に延びる
導体部を内蔵したリード部と、該リード部から略垂直に
引き出された導体部を内蔵する電極取り出し部と、前記
発熱部とリード部で囲まれる凹部を有し、前記セラミッ
クヒーターの電極取り出し部を断熱材を介してホルダー
に固定したことを特徴とする接触加熱装置。
1. A ceramic tool for pressing an object to be heated, a ceramic heater for heating the ceramic tool, and heat insulation for preventing heat generated from the ceramic heater from being transferred to other than the ceramic tool. A contact heating device comprising a material and a holder for connecting these members to another member, wherein the ceramic heater includes a heating portion containing a heating resistor and a ceramic heater connected to the heating resistor. A lead portion containing a conductor portion extending substantially vertically to the main surface, an electrode lead-out portion containing a conductor portion pulled out substantially vertically from the lead portion, and a recess surrounded by the heat generating portion and the lead portion, A contact heating device characterized in that the electrode take-out portion of the ceramic heater is fixed to a holder via a heat insulating material.
【請求項2】前記凹部に断熱材が充填されていることを
特徴とする請求項1記載の接触加熱装置。
2. The contact heating apparatus according to claim 1, wherein the recess is filled with a heat insulating material.
【請求項3】前記凹部の深さが2〜50mmであること
を特徴とする請求項1記載の接触加熱装置。
3. The contact heating device according to claim 1, wherein the recess has a depth of 2 to 50 mm.
【請求項4】前記電極取り出し部にテーパー部を有する
孔を備え、上記テーパー部に導体部の一部を露出させる
とともに、この露出部にメタライズ部を形成し、該メタ
ライズ部と接触するように係合部材を備えて電極部を形
成したことを特徴とする請求項1記載の接触加熱装置。
4. A hole having a tapered portion is provided in the electrode lead-out portion, a part of the conductor portion is exposed in the tapered portion, and a metallized portion is formed in the exposed portion so as to come into contact with the metallized portion. The contact heating device according to claim 1, wherein the electrode portion is formed by providing an engaging member.
JP2002086761A 2002-03-26 2002-03-26 Contact heating device Expired - Fee Related JP3628305B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002086761A JP3628305B2 (en) 2002-03-26 2002-03-26 Contact heating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002086761A JP3628305B2 (en) 2002-03-26 2002-03-26 Contact heating device

Publications (2)

Publication Number Publication Date
JP2003282608A true JP2003282608A (en) 2003-10-03
JP3628305B2 JP3628305B2 (en) 2005-03-09

Family

ID=29233250

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002086761A Expired - Fee Related JP3628305B2 (en) 2002-03-26 2002-03-26 Contact heating device

Country Status (1)

Country Link
JP (1) JP3628305B2 (en)

Also Published As

Publication number Publication date
JP3628305B2 (en) 2005-03-09

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