JP2003279318A5 - - Google Patents

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Publication number
JP2003279318A5
JP2003279318A5 JP2002376020A JP2002376020A JP2003279318A5 JP 2003279318 A5 JP2003279318 A5 JP 2003279318A5 JP 2002376020 A JP2002376020 A JP 2002376020A JP 2002376020 A JP2002376020 A JP 2002376020A JP 2003279318 A5 JP2003279318 A5 JP 2003279318A5
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JP
Japan
Prior art keywords
measured
measurement substrate
imaging device
line width
substrate
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Application number
JP2002376020A
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English (en)
Japanese (ja)
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JP3830451B2 (ja
JP2003279318A (ja
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Priority to JP2002376020A priority Critical patent/JP3830451B2/ja
Priority claimed from JP2002376020A external-priority patent/JP3830451B2/ja
Publication of JP2003279318A publication Critical patent/JP2003279318A/ja
Publication of JP2003279318A5 publication Critical patent/JP2003279318A5/ja
Application granted granted Critical
Publication of JP3830451B2 publication Critical patent/JP3830451B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2002376020A 2002-01-21 2002-12-26 線幅測定方法及び線幅測定装置 Expired - Lifetime JP3830451B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002376020A JP3830451B2 (ja) 2002-01-21 2002-12-26 線幅測定方法及び線幅測定装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002-11764 2002-01-21
JP2002011764 2002-01-21
JP2002376020A JP3830451B2 (ja) 2002-01-21 2002-12-26 線幅測定方法及び線幅測定装置

Publications (3)

Publication Number Publication Date
JP2003279318A JP2003279318A (ja) 2003-10-02
JP2003279318A5 true JP2003279318A5 (cg-RX-API-DMAC10.html) 2005-02-03
JP3830451B2 JP3830451B2 (ja) 2006-10-04

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ID=29253044

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002376020A Expired - Lifetime JP3830451B2 (ja) 2002-01-21 2002-12-26 線幅測定方法及び線幅測定装置

Country Status (1)

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JP (1) JP3830451B2 (cg-RX-API-DMAC10.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7113258B2 (en) 2001-01-15 2006-09-26 Asml Netherlands B.V. Lithographic apparatus
US6768539B2 (en) 2001-01-15 2004-07-27 Asml Netherlands B.V. Lithographic apparatus
JP4663334B2 (ja) 2005-01-11 2011-04-06 株式会社日立国際電気 線幅測定方法

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